CN101310970B - Aluminum/aluminum oxide diffusion blocking layer for titanium-aluminum alloy - Google Patents
Aluminum/aluminum oxide diffusion blocking layer for titanium-aluminum alloy Download PDFInfo
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- CN101310970B CN101310970B CN200710011396XA CN200710011396A CN101310970B CN 101310970 B CN101310970 B CN 101310970B CN 200710011396X A CN200710011396X A CN 200710011396XA CN 200710011396 A CN200710011396 A CN 200710011396A CN 101310970 B CN101310970 B CN 101310970B
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- alloy
- coating
- mcraly
- diffusion impervious
- impervious layer
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- 238000009792 diffusion process Methods 0.000 title claims abstract description 33
- 229910052782 aluminium Inorganic materials 0.000 title description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title description 4
- 229910000838 Al alloy Inorganic materials 0.000 title description 2
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 title 1
- 230000000903 blocking effect Effects 0.000 title 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 title 1
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 60
- 239000000956 alloy Substances 0.000 claims abstract description 60
- 229910004349 Ti-Al Inorganic materials 0.000 claims abstract description 33
- 229910004692 Ti—Al Inorganic materials 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 238000007733 ion plating Methods 0.000 claims abstract description 17
- 238000002360 preparation method Methods 0.000 claims abstract description 8
- 239000010410 layer Substances 0.000 claims description 36
- 238000000151 deposition Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 12
- 229910006281 γ-TiAl Inorganic materials 0.000 claims description 11
- 239000011229 interlayer Substances 0.000 claims description 8
- 238000004062 sedimentation Methods 0.000 claims description 7
- 229910021325 alpha 2-Ti3Al Inorganic materials 0.000 claims description 5
- 230000009977 dual effect Effects 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 abstract description 38
- 238000000576 coating method Methods 0.000 abstract description 38
- 229910052759 nickel Inorganic materials 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 5
- 239000011253 protective coating Substances 0.000 abstract description 5
- 230000008901 benefit Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 5
- 229910052593 corundum Inorganic materials 0.000 abstract 5
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 5
- 230000002401 inhibitory effect Effects 0.000 abstract 1
- 239000010936 titanium Substances 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- 238000005275 alloying Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000012720 thermal barrier coating Substances 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000005422 blasting Methods 0.000 description 2
- 230000007850 degeneration Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010406 interfacial reaction Methods 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000601 superalloy Inorganic materials 0.000 description 2
- 229910000952 Be alloy Inorganic materials 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910000905 alloy phase Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005474 detonation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000016507 interphase Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000004942 thermal barrier coating method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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Abstract
The invention relates to the coating technique, in particular to an Al/Al2O3 diffusion impervious layer used in the high-temperature protection of Ti-Al alloy and a preparation method thereof. The diffusion impervious layer comprises an Al film and an Al2O3 film which are deposited on the substrate of the alloy in sequence. In order to inhibit the interdiffusion of alloy elements between an MCrAlY coating and the Ti-Al alloy, the MCrAlY coating which succeeds in the protection of the nickel-base high-temperature alloy is used for the high-temperature protection of the Ti-Al alloy, and the Al/Al2O3 diffusion impervious layer and the MCrAlY (M indicates Ni, Co or Ni plus Co) protective coating are combined in the application. The arc ion plating technique is adopted to deposit the Al/Al2O3 diffusion impervious layer and then the MCrAlY coating on the substrate of the Ti-Al alloy. The Al/Al2O3 diffusion impervious layer of the invention has the advantages of good capability for inhibiting the inter-diffusion of the elements between the MCrAlY coating and the Ti-Al alloy as well as good bonding strength and high-temperature stability and can ensure that the MCrAlY coating can be successfully applied to the high-temperature protection of the Ti-Al alloy without being influenced by the non-matching of the substrates of the coating in chemical.
Description
Technical field
The present invention relates to coat preparing technology, the specifically a kind of Ti-Al of being used for alloy and MCrAlY are coated with the Al/Al of interlayer
2O
3Diffusion impervious layer.
Background technology
Ti-Al series intermetallic compound base alloy (α
2-Ti
3Al, γ-TiAl and O-Ti
2AlNb) become one of new type high temperature material that has wide application prospect at present because of its low-density, high elastic modulus and excellent high-temperature behavior, be considered to Aero-Space and auto industry with desirable light-duty high-temperature structural material.Ti-Al is that the common problem that alloy exists in application is the problem of non-oxidizability deficiency, α
2-Ti
3The oxidation limit temperature of Al alloy is 600-650 ℃, and the oxidation limiting temperature of gamma-TiAl alloy is 800-900 ℃, O-Ti
2AlNb alloy oxidation limiting temperature is between between the two, and about 650-700 ℃, all be lower than the creep limit temperature of alloy, the mechanical property of alloy can not be not fully exerted.The high temperature protection that present Ti-Al is an alloy is still a still unsolved difficult problem.
MCrAlY (M=Ni, Co or Ni+Co) coating obtains good effect in the protection of nickel base superalloy, and composition and thickness can be controlled on request, therefore satisfy the requirement of different applying working condition conditions, be widely used in the high temperature protection of gas turbine blades as high-temperature protection coating and thermal barrier coating bond coating.The document of related application is as 1. Chinese invention patent, and a kind of detonation flame spraying prepares the method for thermal barrier coating, application number 01133423.1; 2. Chinese invention patent, a kind of oxidation-inhibited thermal barrier coating and preparation method, application number 02133193.6; 3. Chinese invention patent, a kind of preparation method of heat shock resistance thermal barrier coating, application number 03133344.3; 4. Chinese invention patent, a kind of NiCoCrAlYSiB corrosion and heat resistant coating and preparation method thereof, application number 03111363.X; Or the like.But this coating is used for the TiAl alloy runs into serious issue of inter-diffusion, the intermetallic compound that Ti in the coating in Ni, Co and the Ti-Al alloy substrate and Al reaction generate some fragility mutually, cause the quick degeneration of the uphill diffusion and the coating of element, and the fragility that generates on coating and the alloy interface will influence the mechanical property of alloy mutually.Therefore, the MCrAlY coating successfully is used for the Ti-Al alloy, must add the material that one deck can stop the alloying element counterdiffusion, i.e. diffusion impervious layer in the centre.Diffusion impervious layer can make high-temperature protection coating design not worry the influence of alloy substrate, from the aspect design coating of the high temperature protection of optimum, can original and MCrAlY coating seriously chemical unmatched Ti-Al be alloy (α
2-Ti
3Al, O-Ti
2AlNb, γ-TiAl base alloy) applies the MCrAlY coating on, no longer consider the degeneration of coating-substrate interphase interaction acceleration coating system.So far being used for Ti-Al alloy and MCrAlY is coated with the diffusion impervious layer that interlayer successfully stops the alloying element counterdiffusion and does not appear in the newspapers as yet.
Summary of the invention
In order to suppress alloying element counterdiffusion serious between MCrAlY coating and the Ti-Al alloy, the MCrAlY coating that will obtain immense success in nickel base superalloy protection is used for the high temperature protection of Ti-Al alloy, the invention provides a kind of novel Al/Al that Ti-Al alloy and MCrAlY are coated with interlayer that is used for
2O
3Diffusion impervious layer.
Technical scheme of the present invention is:
A kind of Ti-Al of being used for alloy and MCrAlY are coated with the Al/Al of interlayer
2O
3Diffusion impervious layer comprises the Al film and the Al that are deposited on successively on the alloy substrate
2O
3Film, Al film, Al
2O
3Thickness between the film is than being (1～5): (1～5).
Adopt arc ion plating (aip) depositing Al/Al on Ti-Al alloy substrate surface
2O
3Diffusion impervious layer.Wherein,
Arc ion plating (aip) prepares the Al layer parameter: depositing Al layer on the Ti-Al alloy after sandblast is cleaned; Vacuum chamber base vacuum degree 2 * 10
-3～1 * 10
-2A; In vacuum chamber, feed Ar gas, P
Ar=5 * 10
-23 * 10
-1Pa; Target-substrate distance 200～300mm, base material temperature are 300～400 ℃; Pulsed bias-100～300V, dutycycle 20～40%; Arc voltage 20～40V, arc current 60～70A; Sedimentation time 2～10min;
Arc ion plating (aip) prepares Al
2O
3Layer parameter is: depositing Al on the Al layer
2O
3Layer; Base vacuum degree 2 * 10
-3～1 * 10
-2Pa; In vacuum chamber, feed Ar gas, P
Ar=5 * 10
-2～3 * 10
-1Pa, logical O
2Be 200～300sccm; Target-substrate distance 200～300mm, base material temperature are 300～400 ℃; Pulsed bias-100～-300V, dutycycle 20～40%; Arc voltage 20～40V, arc current 60～70A; Sedimentation time 5～30min.
Deposition process is: deposit the thick Al film of 1～5 μ m, sedimentation time 2～10min earlier; Deposit the thick Al of 1～5 μ m again
2O
3Film, sedimentation time 5～30min.
Al/Al of the present invention
2O
3Diffusion impervious layer and MCrAlY (M=Ni, Co or Ni+Co) protective coating is in conjunction with application.At Al/Al
2O
3On the diffusion impervious layer, further adopt MCrAlY (M=Ni, Co or Ni+Co) the protective coating MCrAlY coating of arc ion plating (aip) deposition 20～50 μ m.Sample carries out vacuum heat after the coating, heats up with＜8 ℃/minute speed, is incubated 5～20 hours down at 550～650 ℃, with the stove cool to room temperature; Be incubated 4～8 hours down at 700～900 ℃ then, sample cools off with stove, vacuum＜1 * 10
-1Pa.
The present invention has the following advantages:
1. stop that the alloying element diffusion is excellent.Many elements are at α-Al
2O
3Diffusion coefficient in the crystal is very low, than at other ceramic phases and the medium and small 4-6 of an alloy phase order of magnitude or more.The present invention is with Al/Al
2O
3Diffusion impervious layer and MCrAlY (M=Ni, Co or Ni+Co) protective coating is in conjunction with application, Al/Al
2O
3Diffusion impervious layer has the good ability that stops element counterdiffusion between MCrAlY coating and Ti-Al alloy, and have good binding intensity and a high-temperature stability, can guarantee that the MCrAlY coating successfully is used for the high temperature protection of Ti-Al alloy, not be subjected to the unmatched restriction of coated substrate chemistry.
2. good binding intensity.Arc ion plating (AIP) method has the advantage of high ionization level, high ion energy, the Al/Al of preparation
2O
3Diffusion impervious layer and MCrAlY protective coating bond strength height.
3. high-temperature stability is good.α
2-Ti
3Al and O-Ti
2AlNb etc. contain higher alloy of Ti and Al
2O
3At the chemical reaction＜Al that can take place at the interface
2O
3＞=2＜Al＞+3[O] ([O] is the oxygen atom that is dissolved in the alloy lattice).Interfacial reaction influences the stability on barrier layer, and dissolves in oxygen in the Ti-Al alloy and cause alloy to become fragile, and the interface is combined with adverse influence.γ-TiAl that the Al layer at high temperature generates rich Al with the Ti-Al alloy reaction mutually, oxygen solubility therein is very little, thereby avoids bad interfacial reaction, makes it have good high-temperature stability.
4. the present invention is applicable to the high temperature protection of Ti-Al alloy under 700-900 ℃, and the Ti-Al alloy comprises α
2-Ti
3Al, γ-TiAl and O-Ti
2The AlNb dual alloy billet also is applicable to high-temperature titanium alloy in addition.
Description of drawings
Fig. 1 is the X ray diffracting spectrum of arc ion plating (aip) depositing Al film.
Fig. 2 is the arc ion plating (aip) depositing Al
2O
3The X ray diffracting spectrum of film.
Fig. 3 (a)-(b) is the section S EM pattern of gamma-TiAl alloy and coating alloy sample behind 900 ℃ of following oxidation 100h, (a) γ-TiAl/NiCoCrAlY; (b) γ-TiAl/Al/Al
2O
3/ NiCoCrAlY.
Fig. 4 (a)-(b) is O-Ti
2NiCoCrAlY on the AlNb alloy (a) and Al/Al
2O
3The cross section pattern of 800 ℃ of following isothermal oxidations of/NiCoCrAlY (b) coating sample after 100 hours.
The specific embodiment
Below by embodiment the present invention is described in further detail.
Embodiment 1:
Present embodiment is depositing Al and Al on the 1Cr18Ni9Ti stainless steel base
2O
3Film, specimen size are 15 * 10 * 2mm
3Matrix grinds through abrasive paper for metallograph, cleans and polishing.
Depositing Al film on homemade MIP-8-800 type arc ion plating apparatus, cathode targets be metallic aluminium (99%, wt.%), the vacuum of vacuum chamber is evacuated to 7 * 10
-3Behind the Pa, feed Ar gas, make the interior pressure of stove rise to 7 * 10
-2Pa adds-the high impulse bias voltage of 800～1000V, dutycycle 30%, and 2～3min is cleaned in bombardment to the specimen surface arc light, reduces bias voltage depositing Al film.Pressure remains 5 * 10 with Ar gas in the stove
-2～3 * 10
-1Pa; Pulsed bias-100～-300V, dutycycle 30%; The about 240mm of target-substrate distance; About 300～400 ℃ of base material temperature; Arc voltage 20～25V, arc current 60A.
Depositing Al on homemade MIP-8-800 type arc ion plating apparatus
2O
3Film, cathode targets be metallic aluminium (99%, wt.%), the vacuum of vacuum chamber is evacuated to 7 * 10
-3Behind the Pa, feed Ar gas, make the interior pressure of stove rise to 7 * 10
-2Pa, add-800～-the high impulse bias voltage of 1000V, dutycycle 30%, 2～5min is cleaned in bombardment to the specimen surface arc light, reduces bias voltage depositing Al film.Logical then O
2Depositing Al
2O
3Film changes oxygen flow in 200～300sccm scope; Pulsed bias-100～-300V, dutycycle 30%; The about 240mm of target-substrate distance; About 300～400 ℃ of base material temperature; Arc voltage 20～40V, arc current 60A.
Fig. 1 and Fig. 2 are depositing Al and Al
2O
3The X ray diffracting spectrum of film, as can be seen, arc ion plating (aip) depositing Al and Al
2O
3The technology stability of film is fine.In 200～300sccm scope, change oxygen flow, can prepare the Al of same structure
2O
3Film, film is interior with α-Al
2O
3Xiang Weizhu.Therefore can in the process parameters range of broad, deposit Al and α-Al
2O
3Film, technological parameter good reproducibility and control easily.
Embodiment 2:
Present embodiment is Al/Al
2O
3The application of diffusion impervious layer on gamma-TiAl alloy.Base material component is Ti-48Al-2Cr-2Nb (at.%), and specimen size is 15 * 10 * 2mm
3Matrix grinds through abrasive paper for metallograph, cleans and blasting treatment (220 order glass balls, wet shot).Depositing Al, Al on homemade MIP-8-800 type arc ion plating apparatus
2O
3With the NiCoCrAlY coating, cathode targets be respectively metallic aluminium (99%, wt.%) and Ni32Co20Cr8Al0.5Y (wt.%) alloy, vacuum chamber base vacuum degree 7 * 10
-3Pa, the about 240mm of target-substrate distance, base material temperature are 300～400 ℃; The thick Al film of deposition 2～3 μ m deposits the thick Al of 2～3 μ m more earlier
2O
3Film deposits the NiCoCrAlY coating of 20～30 μ m at last, and deposition process parameters sees Table 1.Sample carries out vacuum heat after the coating, heats up with＜8 ℃/minute speed, is incubated 20 hours down at 600 ℃, is incubated 4 hours down at 900 ℃ then, and sample cools off with stove, vacuum＜1 * 10
-1Pa.
Table 1 embodiment 1 and embodiment 2 arc ion plating technological parameters
| Technological parameter | Ar(Pa) | O 2Throughput (sccm) | Pulsed bias (V) | Dutycycle (%) | Arc voltage (V) | Arc current (A) | Depositing temperature (℃) | Sedimentation time (min) |
| Al | 7×10 -2 | 0 | -300 | 30 | 20-25 | 60 | 300-350 | 5～10 |
| Al 2O 3 | 7×10 -2 | 200～300 | -150 | 30 | 25-40 | 60 | 300-350 | 15～20 |
| NiCoCrAlY | 7×10 -2 | 0 | -300 | 30 | 20-25 | 65 | 300-400 | 300～500 |
The Al/Al of preparation
2O
3Diffusion impervious layer can successfully stop the element counterdiffusion between NiCoCrAlY coating and gamma-TiAl alloy, as Fig. 3 (a)-(b) and table 2.And the coating that contains diffusion impervious layer has good stable under 900 ℃.
Micro-area composition analysis among table 2 Fig. 1 (EDX, at%)
| Element | O | Al | Ti | Cr | Co | Ni | Nb |
| Position 1 | 55.5 | 13.07 | 6.04 | 19.87 | 4.14 | 1.39 | -- |
| |
-- | 24.29 | 24.73 | 0.85 | 25.4 | 23.97 | 0.75 |
| Position 3 | -- | 33.75 | 39.73 | 3.51 | 4.45 | 16.13 | 1.77 |
Embodiment 3
Present embodiment is Al/Al
2O
3Diffusion impervious layer is at O-Ti
2Application on the AlNb alloy.Base material component is Ti-22Al-26Nb (at.%), and specimen size is 15 * 10 * 2mm
3Matrix grinds through abrasive paper for metallograph, cleans and blasting treatment (220 order glass balls, wet shot).The coating deposition parameter is with embodiment 2, and sample carries out vacuum heat after the coating, heats up with＜8 ℃/minute speed, is incubated 20 hours down at 600 ℃, is incubated 4 hours down at 800 ℃ then, and sample cools off with stove, vacuum＜1 * 10
-1Pa.
The Al/Al of preparation
2O
3Diffusion impervious layer 800 ℃ and 900 ℃ etc. can successfully stop NiCoCrAlY coating and O-Ti under the gentle cyclic oxidation condition
2Element counterdiffusion between the AlNb alloy is 800 ℃ of situations under the isothermal oxidation as Fig. 4 (a)-(b).And the coating that contains diffusion impervious layer has good stable under 900 ℃, near O-Ti
2The operating temperature limit of AlNb alloy.
Claims (3)
1. one kind is used for the Al/Al that Ti-Al alloy and MCrAlY are coated with interlayer
2O
3Diffusion impervious layer is characterized in that: comprise the Al film and the Al that are deposited on successively on the alloy substrate
2O
3Film, Al film, Al
2O
3Thickness between the film is than being (1～5): (1～5);
Adopt arc ion plating (aip) on the Ti-Al alloy substrate, to prepare Al/Al
2O
3Diffusion impervious layer, wherein,
Arc ion plating (aip) prepares the Al layer parameter: depositing Al layer on the Ti-Al alloy after sandblast is cleaned; Vacuum chamber base vacuum degree 2 * 10
-3～1 * 10
-2Pa; In vacuum chamber, feed Ar gas, P
Ar=5 * 10
-2～3 * 10
-1Pa; Target-substrate distance 200～300mm, base material temperature are 300～400 ℃; Pulsed bias-100～-300V, dutycycle 20～40%; Arc voltage 20～40V, arc current 60～70A; Sedimentation time 2～10min;
Arc ion plating (aip) prepares Al
2O
3Layer parameter is: depositing Al on the Al layer
2O
3Layer; Base vacuum degree 2 * 10
-3～1 * 10
-2Pa; In vacuum chamber, feed Ar gas, P
Ar=5 * 10
-2～3 * 10
-1Pa, logical O
2Be 200～300sccm; Target-substrate distance 200～300mm, base material temperature are 300～400 ℃; Pulsed bias-100～-300V, dutycycle 20～40%; Arc voltage 20～40V, arc current 60～70A; Sedimentation time 5～30min.
2. be coated with the Al/Al of interlayer according to the described Ti-Al of being used for alloy of claim 1 and MCrAlY
2O
3Diffusion impervious layer is characterized in that: described Ti-Al alloy comprises α
2-Ti
3Al, γ-TiAl or O-Ti
2The AlNb dual alloy billet.
3. be coated with the Al/Al of interlayer according to the described Ti-Al of being used for alloy of claim 1 and MCrAlY
2O
3Diffusion impervious layer is characterized in that: the Al and the Al that adopt the arc ion plating (aip) preparation
2O
3Layer thickness is 1～5 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710011396XA CN101310970B (en) | 2007-05-23 | 2007-05-23 | Aluminum/aluminum oxide diffusion blocking layer for titanium-aluminum alloy |
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|---|---|---|---|
| CN200710011396XA CN101310970B (en) | 2007-05-23 | 2007-05-23 | Aluminum/aluminum oxide diffusion blocking layer for titanium-aluminum alloy |
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| CN101310970B true CN101310970B (en) | 2010-12-22 |
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| CN103590008B (en) * | 2013-11-28 | 2015-08-05 | 铜陵学院 | One is coated with interlayer in TiAl alloy and MCrAlY and prepares Al 2o 3the method of diffusion barrier |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1431338A (en) * | 2002-01-10 | 2003-07-23 | 北京航空航天大学 | Method for preparing coat of aluminide with chrome modified for enhancing performance of high heat oxidation resistance of TiAl alloy |
| EP1645661A1 (en) * | 2002-08-21 | 2006-04-12 | United Technologies Corporation | Thermal barrier coatings with low thermal conductivity comprising lanthanide sesquioxides |
| CN101050515A (en) * | 2007-05-23 | 2007-10-10 | 中国民航大学 | Method for raising service life of coat layer of heat barrier by surface modification of metal binder course |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1431338A (en) * | 2002-01-10 | 2003-07-23 | 北京航空航天大学 | Method for preparing coat of aluminide with chrome modified for enhancing performance of high heat oxidation resistance of TiAl alloy |
| EP1645661A1 (en) * | 2002-08-21 | 2006-04-12 | United Technologies Corporation | Thermal barrier coatings with low thermal conductivity comprising lanthanide sesquioxides |
| CN101050515A (en) * | 2007-05-23 | 2007-10-10 | 中国民航大学 | Method for raising service life of coat layer of heat barrier by surface modification of metal binder course |
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