JPH04252021A - Evacuation system for semiconductor manufacturing apparatus - Google Patents
Evacuation system for semiconductor manufacturing apparatusInfo
- Publication number
- JPH04252021A JPH04252021A JP137091A JP137091A JPH04252021A JP H04252021 A JPH04252021 A JP H04252021A JP 137091 A JP137091 A JP 137091A JP 137091 A JP137091 A JP 137091A JP H04252021 A JPH04252021 A JP H04252021A
- Authority
- JP
- Japan
- Prior art keywords
- valve
- degassing
- semiconductor manufacturing
- pressure control
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 239000004065 semiconductor Substances 0.000 title claims description 3
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000007872 degassing Methods 0.000 claims abstract description 10
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004904 shortening Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は半導体製造装置の排気シ
ステムに関し、特にプロセスチャンバーの真空排気シス
テムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust system for semiconductor manufacturing equipment, and more particularly to a vacuum exhaust system for a process chamber.
【０００２】0002
【従来の技術】従来この種の排気システムは、図２に示
すように、プロセスチャンバー１の真空排気を行なう際
、排気ライン８を通してポンプ３にて排気を行なう構成
になっていた。2. Description of the Related Art Conventionally, this type of evacuation system has a structure in which a pump 3 is used to evacuate a process chamber 1 through an evacuation line 8, as shown in FIG.
【０００３】0003
【発明が解決しようとする課題】この従来の排気システ
ムでは、プロセスチャンバーより圧力制御用排気ライン
をそのまま使用してポンプにて排気を行なっている。こ
の圧力制御用排気ラインの途中にはバタフライバルブが
介在しているため、プロセス終了後のガス抜きに時間が
かかるという問題点があった。In this conventional exhaust system, exhaust is performed by a pump using the pressure control exhaust line from the process chamber. Since a butterfly valve is interposed in the middle of this pressure control exhaust line, there is a problem in that it takes time to vent gas after the process is completed.
【０００４】0004
【課題を解決するための手段】本発明の排気システムは
、プロセスチャンバーの圧力制御を行なう真空排気ライ
ンとは別にガス抜き用の真空排気ラインを備えている。[Means for Solving the Problems] The exhaust system of the present invention includes a vacuum exhaust line for degassing, separate from the vacuum exhaust line for controlling the pressure of the process chamber.
【０００５】[0005]
【実施例】次に本発明について図面を参照して説明する
。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained with reference to the drawings.
【０００６】図１は本発明の一実施例の排気システム図
である。チャンバープロセス中はバルブ５を開け、バタ
フライバルブ４を介して圧力制御ライン２よりポンプ３
にて真空排気を行なう。また、プロセス終了後にチャン
バー１のガス抜きを行なう場合は、バルブ５を閉め、バ
ルブ７を開ける事によりバタフライバルブ４を介さずガ
ス抜き用排気ライン６を介してポンプ６により真空排気
を行なう。FIG. 1 is a diagram of an exhaust system according to an embodiment of the present invention. During the chamber process, valve 5 is opened and pump 3 is supplied from pressure control line 2 through butterfly valve 4.
Perform vacuum evacuation. Further, when degassing the chamber 1 after the process is completed, the valve 5 is closed and the valve 7 is opened to perform vacuum evacuation by the pump 6 through the gas degassing exhaust line 6 without using the butterfly valve 4.
【０００７】[0007]
【発明の効果】以上説明したように本発明は、圧力制御
用排気ラインとは別に専用のガス抜き用排気ラインを設
置する事により、バタフライバルブを介さなくて済むた
めガス抜き時間を短縮できるという効果を有する。[Effects of the Invention] As explained above, the present invention is capable of shortening the degassing time by installing a dedicated degassing exhaust line separately from the pressure control exhaust line, thereby eliminating the need for a butterfly valve. have an effect.
【図１】本発明の一実施例の排気システム図である。FIG. 1 is a diagram of an exhaust system according to an embodiment of the present invention.
【図２】従来の排気システム図である。FIG. 2 is a diagram of a conventional exhaust system.
１ チャンバー ２ 圧力制御用排気ライン ３ ポンプ ４ バタフライバルブ ５ バルブ ６ ガス抜き用排気ライン ７ バルブ ８ 排気ライン 1 Chamber 2 Pressure control exhaust line 3 Pump 4 Butterfly valve 5 Valve 6 Exhaust line for degassing 7 Valve 8 Exhaust line
Claims (1)
装置の排気システムにおいて、プロセスチャンバーに圧
力制御用排気ラインとは別にガス抜き用排気ラインを設
けた事を特徴とする半導体製造装置の排気システム。1. An exhaust system for semiconductor manufacturing equipment having a vacuum evacuation system, characterized in that a process chamber is provided with an exhaust line for degassing in addition to an exhaust line for pressure control.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP137091A JPH04252021A (en) | 1991-01-10 | 1991-01-10 | Evacuation system for semiconductor manufacturing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP137091A JPH04252021A (en) | 1991-01-10 | 1991-01-10 | Evacuation system for semiconductor manufacturing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04252021A true JPH04252021A (en) | 1992-09-08 |
Family
ID=11499613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP137091A Pending JPH04252021A (en) | 1991-01-10 | 1991-01-10 | Evacuation system for semiconductor manufacturing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04252021A (en) |
-
1991
- 1991-01-10 JP JP137091A patent/JPH04252021A/en active Pending
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