JPH0422984B2 - - Google Patents
Info
- Publication number
- JPH0422984B2 JPH0422984B2 JP59182712A JP18271284A JPH0422984B2 JP H0422984 B2 JPH0422984 B2 JP H0422984B2 JP 59182712 A JP59182712 A JP 59182712A JP 18271284 A JP18271284 A JP 18271284A JP H0422984 B2 JPH0422984 B2 JP H0422984B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- base coat
- metal thin
- parts
- top coat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 claims description 43
- 239000002184 metal Substances 0.000 claims description 43
- 239000010409 thin film Substances 0.000 claims description 30
- 239000010410 layer Substances 0.000 claims description 28
- 239000003973 paint Substances 0.000 claims description 20
- 239000004033 plastic Substances 0.000 claims description 19
- 229920003023 plastic Polymers 0.000 claims description 19
- 229920000178 Acrylic resin Polymers 0.000 claims description 17
- 239000004925 Acrylic resin Substances 0.000 claims description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 14
- 238000004544 sputter deposition Methods 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 9
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 8
- 239000011651 chromium Substances 0.000 claims description 7
- 229910001220 stainless steel Inorganic materials 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 239000011247 coating layer Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 238000009501 film coating Methods 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 3
- 229910001369 Brass Inorganic materials 0.000 claims description 2
- 239000010951 brass Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- -1 etc. Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 230000001588 bifunctional effect Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 3
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 3
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000010422 painting Methods 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- UAHAMNBFDHWCPU-UHFFFAOYSA-N 3-tributoxysilylpropan-1-amine Chemical compound CCCCO[Si](CCCN)(OCCCC)OCCCC UAHAMNBFDHWCPU-UHFFFAOYSA-N 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- NXBXJOWBDCQIHF-UHFFFAOYSA-N 2-[hydroxy-[2-(2-methylprop-2-enoyloxy)ethoxy]phosphoryl]oxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(=O)OCCOC(=O)C(C)=C NXBXJOWBDCQIHF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical group CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- UXWSUTBOOHDZIL-UHFFFAOYSA-N bis(1-hydroxycyclohexyl)methanone Chemical compound C1CCCCC1(O)C(=O)C1(O)CCCCC1 UXWSUTBOOHDZIL-UHFFFAOYSA-N 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical group OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical group COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- LGYTZKPVOAIUKX-UHFFFAOYSA-N kebuzone Chemical compound O=C1C(CCC(=O)C)C(=O)N(C=2C=CC=CC=2)N1C1=CC=CC=C1 LGYTZKPVOAIUKX-UHFFFAOYSA-N 0.000 description 1
- 229960000194 kebuzone Drugs 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000007592 spray painting technique Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、金属薄膜被覆層を有するプラスチツ
ク成型品の製造方法に関し、更に詳しくは、金属
薄膜被覆層にクラツクが発生せず、高い光輝性表
面を有するプラスチツク成型品の提供を目的とす
る。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a method for producing a plastic molded product having a metal thin film coating layer, and more specifically, a method for manufacturing a plastic molded product having a metal thin film coating layer, which does not generate cracks and has high brightness. The purpose is to provide a plastic molded product with a surface.
(従来の技術)
従来、金属薄膜を有するプラスチツク成型品
は、プラスチツク成型品の表面に真空蒸着、ホツ
トスタンプ、メツキ等の方法により金属薄膜を形
成することにより得られているが、例えば、真空
蒸着法では比較的低融点の金属、例えば、アルミ
ニウム、スズ、アンチモン等しか使用出来ない
為、表面性質に優れた製品は得られず、又、ホツ
トスタンプ法やメツキ法等は、工程上煩雑であり
経済的ではなかつた。この様な問題点を解決する
方法として、スパツタリング法が開発されている
が、この方法による金属薄膜は、その基材との関
係でクラツクが生じ易く、又、その表面に設ける
トツプコート層との接着性が劣り、実用化が困難
であつた。(Prior art) Conventionally, plastic molded products having a metal thin film have been obtained by forming a metal thin film on the surface of the plastic molded product by methods such as vacuum evaporation, hot stamping, plating, etc. Since this method can only use metals with relatively low melting points, such as aluminum, tin, and antimony, products with excellent surface properties cannot be obtained, and hot stamping and plating methods are complicated in terms of process. It wasn't economical. A sputtering method has been developed as a method to solve these problems, but the metal thin film produced by this method is prone to cracks due to its relationship with the base material, and also has difficulty adhesion to the top coat layer provided on its surface. It had poor performance and was difficult to put into practical use.
(問題点を解決する為の手段)
本発明者は、上述の如き従来技術の欠点を解決
すべく鋭意研究の結果、プラスチツク成型品にス
パツタリングにより金属薄膜を形成するに際し、
特定のベースコートを設け、該ベースコート層上
に特定の条件で、金属をスパツタリングし、次に
形成された金属薄膜上に特定のトツプコート層を
設けることにより、金属薄膜のクラツクが発生せ
ず、しかも金属薄膜とトツプコート層との密着性
が良好で、半永久的に優れた光輝性を保持するプ
ラスチツク成型品が提供出来ることを見出し、本
発明を完成した。(Means for Solving the Problems) As a result of intensive research in order to solve the above-mentioned drawbacks of the conventional technology, the inventor of the present invention found that when forming a metal thin film on a plastic molded product by sputtering,
By providing a specific base coat, sputtering metal on the base coat layer under specific conditions, and then providing a specific top coat layer on the formed metal thin film, cracks in the metal thin film do not occur, and metal The present invention was completed based on the discovery that it is possible to provide a plastic molded product that has good adhesion between the thin film and the top coat layer and retains excellent shine semi-permanently.
即ち、本発明は、
(a) 金属薄膜被覆層を形成すべきプラスチツク成
型品の表面に、紫外線硬化型アクリル樹脂系ベ
ースコート塗料を塗布し、紫外線により硬化さ
せて、鉛筆硬度がH以上のベースコート層を形
成する工程、
(b) 真空度1×10-3〜6×10-5Torr、アルゴン
圧5×10-3〜1×10-4Torr、電圧200〜600V、
電流密度20〜500A/m2の条件下で、スパツタ
リングにより、クロム、ニツケル等の金属、黄
銅、ステンレススチール等の各種合金の300〜
2000Åの厚さの薄膜を上記のベースコート層上
に形成する工程、
(c) 反応性アルコキシシラン化合物を含有する酸
価が5〜50である紫外線硬化型アクリル樹脂系
トツプコート塗料を上記金属薄膜面に塗布し、
紫外線により硬化させる工程、
からなることを特徴とする金属薄膜被覆層を有す
るプラスチツク成型品の製造方法である。 That is, the present invention provides the following methods: (a) Applying an ultraviolet curable acrylic resin base coat paint to the surface of a plastic molded product on which a metal thin film coating layer is to be formed, and curing it with ultraviolet rays to form a base coat layer having a pencil hardness of H or higher. (b) Vacuum degree 1×10 -3 to 6×10 -5 Torr, argon pressure 5×10 -3 to 1×10 -4 Torr, voltage 200 to 600V,
Various alloys such as metals such as chromium and nickel, brass, and stainless steel are heated by sputtering at a current density of 20 to 500 A/ m2 .
(c) forming a thin film with a thickness of 2000 Å on the above base coat layer; (c) applying an ultraviolet curable acrylic resin top coat paint containing a reactive alkoxysilane compound and having an acid value of 5 to 50 on the surface of the above metal thin film; Apply,
A method for producing a plastic molded product having a metal thin film coating layer, comprising the steps of curing with ultraviolet rays.
本発明を詳細に説明すると、本発明方法におい
て使用するプラスチツク成型品の素材は、熱膨張
係数が大きいと金属薄膜の造膜時或いは使用時、
金属薄膜がクラツクを発生する原因となる。従つ
て熱膨張係数の小さいことが望ましく、実用的に
は20×10-5cm/cm/℃であることが好ましい。 To explain the present invention in detail, if the material of the plastic molded product used in the method of the present invention has a large coefficient of thermal expansion, it will be difficult to form a metal thin film or use it.
The metal thin film causes cracks. Therefore, it is desirable that the coefficient of thermal expansion be small, and practically it is preferably 20×10 -5 cm/cm/°C.
特に好ましいプラスチツク成型品の素材を具体
的に挙げると、ポリエステル樹脂、アクリロニト
リル−ブタジエン−スチレン共重合物、アクリロ
ニトリル−スチレン、アクリル樹脂、ポリカーボ
ネート樹脂、PVC等或はこれらのを被覆又は積
層したもの等が挙げられる。 Specifically, particularly preferred materials for plastic molded products include polyester resin, acrylonitrile-butadiene-styrene copolymer, acrylonitrile-styrene, acrylic resin, polycarbonate resin, PVC, etc., or materials coated or laminated with these materials. Can be mentioned.
本発明でベースコートの形成に使用する紫外線
硬化型アクリル樹脂組成物は、既に公知の材料で
あり、紫外線硬化型アクリル樹脂、増感剤及びそ
の他の任意成分からなるものである。 The ultraviolet curable acrylic resin composition used to form the base coat in the present invention is a known material, and consists of an ultraviolet curable acrylic resin, a sensitizer, and other optional components.
その紫外線硬化型アクリル樹脂の代表例として
は、その分子構造中にラジカル重合可能な不飽和
二重結合を有する比較的低分子量のポリエステル
(メタ)アクリレート樹脂、ポリエーテル(メタ)
アクリレート樹脂、アクリル(メタ)アクリレー
ト樹脂、エポキシ(メタ)アクリレート樹脂、ウ
レタン(メタ)アクリレート樹脂、多価アルコー
ル等の多官能化合物の(メタ)アクリレート等の
オリゴマー又はプレポリマー、及びスチレン、メ
チルスチレン、ジビニルベンゼン、(メタ)アク
リル酸エステル等の付加重合性化合物を包含し、
これらの成分を単独又は混合物として含有するも
のである。 Typical examples of UV-curable acrylic resins include relatively low molecular weight polyester (meth)acrylate resins that have radically polymerizable unsaturated double bonds in their molecular structures, and polyether (meth)acrylate resins.
Acrylate resins, acrylic (meth)acrylate resins, epoxy (meth)acrylate resins, urethane (meth)acrylate resins, oligomers or prepolymers such as (meth)acrylates of polyfunctional compounds such as polyhydric alcohols, and styrene, methylstyrene, Including addition polymerizable compounds such as divinylbenzene and (meth)acrylic acid ester,
It contains these components alone or as a mixture.
本発明においては、これらの紫外線硬化型アク
リル又はオリゴマー樹脂として、その約5〜100
重量%、好ましくは約30重量%以上が、トリ(メ
タ)アクリレート、ソルビトールトリグリシジル
(メタ)アクリレート等の3官能以上のポリ(メ
タ)アクリレートを使用するのが望ましく、この
様なポリ(メタ)アクリレート等が、5重量%以
下であるときは十分な表面硬度の被膜を形成する
ことが出来ず、金属薄膜のクラツク発生を防止す
ることが出来ない。 In the present invention, about 5 to 100 of these ultraviolet curable acrylic or oligomer resins are used.
It is desirable to use trifunctional or higher functional poly(meth)acrylates such as tri(meth)acrylate, sorbitol triglycidyl(meth)acrylate, etc., in which the weight percent, preferably about 30% by weight or more, of such poly(meth)acrylates. When the amount of acrylate or the like is less than 5% by weight, it is not possible to form a film with sufficient surface hardness, and it is not possible to prevent the occurrence of cracks in the metal thin film.
又、必要な増感剤とは、紫外線のエネルギーに
よりフリーラジカルを発生する化合物であつて、
ベンゾイン、ベンゾフエノン或はそれらのエステ
ル等のカルボニル化合物、過酸化ベンゾイル等の
有機過酸化物、アゾビスイソブチロニトリル等の
アゾ化合物、ジフエニルジサルフアイド等のイオ
ウ化合物がある。 In addition, the necessary sensitizer is a compound that generates free radicals by the energy of ultraviolet rays,
Examples include carbonyl compounds such as benzoin, benzophenone, or their esters, organic peroxides such as benzoyl peroxide, azo compounds such as azobisisobutyronitrile, and sulfur compounds such as diphenyl disulfide.
その他の任意成分としては少量の有機溶剤、染
料、顔料等の着色剤、ワツクスその他の各種添加
剤がある。 Other optional ingredients include small amounts of organic solvents, coloring agents such as dyes and pigments, wax, and various other additives.
この様な紫外線硬化型アクリル樹脂系ベースコ
ート塗料は、脱脂処理したプラスチツク成型品表
面に、通常のハケ塗り、スプレー塗装、デイツプ
塗装、カーテンフローコーター、ロール塗装等に
より塗布し、低〜高圧水銀灯、アーク灯、キセノ
ンランプ等により紫外線を照射し硬化させる。 Such UV-curable acrylic resin base coat paints are applied to the surface of degreased plastic moldings using conventional methods such as brush painting, spray painting, dip painting, curtain flow coating, roll painting, etc. It is cured by irradiating it with ultraviolet light using a lamp, xenon lamp, etc.
紫外線硬化型アクリル樹脂系ベースコート塗料
の乾燥膜厚は、通常1〜50μm、好ましくは3〜
30μm程度が適当である。 The dry film thickness of the UV-curable acrylic resin base coat paint is usually 1 to 50 μm, preferably 3 to 50 μm.
Approximately 30 μm is appropriate.
この様にして得られるベースコート層は、金属
膜にクラツクを発生させない様にする為、硬度が
H以上(JIS KB5400に基づく測定方法による)、
特に好ましくは2H以上であることが必要である。 The base coat layer obtained in this way has a hardness of H or higher (according to the measurement method based on JIS KB5400) in order to prevent cracks from occurring in the metal film.
Particularly preferably, it needs to be 2H or more.
本発明の方法において特に紫外線硬化型アクリ
ル樹脂系ベースコート塗料を使用するのは、冷エ
ネルギー乾燥なのでプラスチツク成型品の劣化損
傷を招かず、プラスチツク成型品の表面を平滑に
し、しかもプラスチツク成型品の金属薄膜間のス
トレスを緩和し、プラスチツク成型品と金属薄膜
との密着性を向上する為である。 In the method of the present invention, the UV-curable acrylic resin base coat paint is particularly used for cold energy drying, which does not cause deterioration or damage to the plastic molded product, smooths the surface of the plastic molded product, and makes it possible to form a thin metal film on the plastic molded product. This is to alleviate the stress between them and improve the adhesion between the plastic molded product and the metal thin film.
次にベースコート層表面にスパツタリング法に
よりクロム等の金属又はステンレス等の合金の金
属薄膜を形成させる。 Next, a metal thin film of a metal such as chromium or an alloy such as stainless steel is formed on the surface of the base coat layer by sputtering.
金属薄膜を形成させる方法は、例えば、直流二
極マグネツトロンスパツタリング装置を用い、陰
極ターゲツトをクロム等の金属又はステンレス等
の合金として、1×10-3〜6×10-5Torr真空引
きしたベルジヤーにアルゴンガスを封入し、アル
ゴン圧として、5×10-3〜1×10-4Torrにした
後、直流二極間に電圧200〜600V、電流密度20〜
500Å/m2にて放電を起こさせる。 A method for forming a metal thin film is, for example, using a DC dipole magnetron sputtering device, using a metal such as chromium or an alloy such as stainless steel as a cathode target, and vacuuming at 1×10 -3 to 6×10 -5 Torr. After filling the bell jar with argon gas and setting the argon pressure to 5 × 10 -3 to 1 × 10 -4 Torr, a voltage of 200 to 600 V and a current density of 20 to 20
A discharge is caused at 500 Å/m 2 .
放電により生成したアルゴンイオンは陰極ター
ゲツトのクロム等の金属又はステンレス等の合金
を衝撃してクロム又はステンレス等の金属原子を
放出する。この金属原子はベルジヤー内を直進
し、ベースコート層表面に到達し、凝縮してベー
スコート層表面に薄い金属皮膜を形成する。 Argon ions generated by the discharge impact a metal such as chromium or an alloy such as stainless steel of the cathode target to release metal atoms such as chromium or stainless steel. These metal atoms travel straight through the bell gear, reach the surface of the base coat layer, and condense to form a thin metal film on the surface of the base coat layer.
スパツタリングの条件として、二極間の電圧を
200〜600Vにすることによりスパツタリング現象
を起こす。電圧が200V以下であると放電されて
もスパツタリング現象を起こさず、一方、600V
で以下になると工業的に各種難点が現れる。 As a condition for sputtering, the voltage between the two poles is
A sputtering phenomenon occurs when the voltage is set to 200 to 600V. If the voltage is below 200V, sputtering will not occur even if it is discharged;
When the following happens, various industrial difficulties appear.
又、電流密度は20〜500A/m2が適当で、この
範囲以下になるとスパツタリツング現象が起こら
ず、一方、この範囲以上になると温度上昇により
プラスチツク成型品が変形したり、或は金属薄膜
にクラツクが生じ易くなり好ましくない。 In addition, the appropriate current density is 20 to 500 A/ m2 ; below this range, the spatter phenomenon will not occur; on the other hand, above this range, the plastic molded product may be deformed due to temperature rise, or the metal thin film may be cracked. This is not preferable because it tends to occur.
又、真空度1×10-3〜6×10-5Torr、アルゴ
ン圧5×10-3〜1×10-4Torrの範囲においてク
ラツクを生じ難い金属薄膜が得られる。 Further, a metal thin film that is less likely to cause cracks can be obtained at a vacuum degree of 1×10 -3 to 6×10 -5 Torr and an argon pressure of 5×10 -3 to 1×10 -4 Torr.
真空度及びアルゴン圧がこの範囲外になると、
スパツタリング現象を起こさないか或は金属薄膜
を形成してもクラツクが生じ易い。 If the degree of vacuum and argon pressure are outside this range,
Even if sputtering does not occur or a thin metal film is formed, cracks are likely to occur.
本発明においての金属薄膜の膜厚は通常300〜
2000Åが適当である。それ以下になると光沢のあ
る金属膜が得られない。 The thickness of the metal thin film in the present invention is usually 300~
2000 Å is appropriate. If it is less than that, a shiny metal film cannot be obtained.
以上の如く形成された金属薄膜上に、次にトツ
プコート層を形成するが、このトツプコート上塗
塗料の基本的組成は前記のベースコート様塗料と
同様であるが、先ず第1の特徴として、その組成
物としての酸価が、5〜50の範囲にコントロール
されていることが必要である。この様な酸価のコ
ントロールは、(メタ)アクリル酸を用いて、紫
外線硬化型アクリル樹脂を製造する際に容易に行
うことが出来る。この様な範囲の酸価の紫外線硬
化型アクリル樹脂を使用することによつて、金属
薄膜等に対する密着性が非常に優れると共に、機
械的・化学的物性の非常に優れたトツプコート層
が形成出来る。 A top coat layer is then formed on the metal thin film formed as described above, and the basic composition of this top coat top coat paint is the same as that of the base coat-like paint described above. It is necessary that the acid value is controlled within the range of 5 to 50. Such acid value control can be easily performed when producing an ultraviolet curable acrylic resin using (meth)acrylic acid. By using an ultraviolet curable acrylic resin having an acid value within this range, a top coat layer can be formed which has excellent adhesion to metal thin films and the like, as well as excellent mechanical and chemical properties.
更に第2の特徴は、この様なトツプコート剤が
アクリル樹脂に対してその0.1〜5重量%の反応
性アルコキシシラン化合物を含有していることで
ある。 A second feature is that such top coating agents contain a reactive alkoxysilane compound in an amount of 0.1 to 5% by weight based on the acrylic resin.
この様な反応性アルコキシシランとして好まし
いものは、N−(2−アミノエチル)3−アミノ
プロピルメチルジメトキシシラン、3−アミノプ
ロピルトリブトキシシラン等のアミノアルコキシ
シラン類、3−グリシドキシプロピルメチルジメ
トキシシラン等のエポキシアルコキシシラン、3
−クロロプロピルメチルジメトキシシラン等のク
ロルアルコキシシラン類、ビニルトリス(2−メ
トキシエトキシ)シラン、3−メタクリキシプロ
ピルトリメトキシシラン等のビニル基やメタクリ
ロキシ基含有アルコキシシラン類であり、これら
の中で特に好ましいものは紫外線硬化型アクリル
樹脂の酸部分と反応性の高いアミノ、エポキシ、
メルカプト基含有のアルコキシシラン類であり、
又、安定性の面では分子量の大きなものが好まし
い。 Preferred examples of such reactive alkoxysilanes include aminoalkoxysilanes such as N-(2-aminoethyl)3-aminopropylmethyldimethoxysilane and 3-aminopropyltributoxysilane, and 3-glycidoxypropylmethyldimethoxysilane. Epoxyalkoxysilane such as silane, 3
-Chloroalkoxysilanes such as chloropropylmethyldimethoxysilane, alkoxysilanes containing vinyl groups or methacryloxy groups such as vinyltris(2-methoxyethoxy)silane, and 3-methacryloxypropyltrimethoxysilane, and among these, particularly preferred are These include amino, epoxy, and other materials that are highly reactive with the acid part of UV-curable acrylic resin.
It is an alkoxysilane containing a mercapto group,
Moreover, from the viewpoint of stability, those having a large molecular weight are preferable.
この様な反応性アルコキシシランを上記の範囲
の量で添加することによつて、反応性アルコキシ
シランが金属表面と紫外線硬化型アクリル樹脂と
の双方に作用して、金属表面とトツープコート層
の優れた密着性を与える。 By adding such a reactive alkoxysilane in the amount within the above range, the reactive alkoxysilane acts on both the metal surface and the ultraviolet curable acrylic resin, resulting in excellent formation of the metal surface and the top coat layer. Provides adhesion.
以上の如きトツプコート剤の塗布方法及び乾燥
方法は、前記のベースコート層の形成と同様であ
り、約1〜50μm、好ましくは5〜20μm程度の
トツプコート層を形成するのが好ましい。 The method of applying and drying the top coat agent as described above is the same as that for forming the base coat layer, and it is preferable to form a top coat layer with a thickness of about 1 to 50 .mu.m, preferably about 5 to 20 .mu.m.
(作用・効果)
本発明方法では、上記の如き構成をとることに
よつて、即ち、ベースコート層として、鉛筆硬度
H以上の層を形成することによつて、プラスチツ
ク成型品の素材の表面に起因する金属薄膜のクラ
ツク発生が減少し、又、特定の条件下でのスパツ
タリングにより、クラツク発生性の低い光輝性層
が形成され、更に、特定のトツプコート剤によ
り、金属層と密着性の良いトツプコート層が形成
されるので前述の如き従来技術の欠点が解決さ
れ、優れた光輝性と長期表面耐久性のプラスチツ
ク成型品が提供される。(Function/Effect) In the method of the present invention, by adopting the above configuration, that is, by forming a layer having a pencil hardness of H or higher as a base coat layer, it is possible to In addition, by sputtering under specific conditions, a glittering layer with low crack occurrence is formed, and a top coat layer with good adhesion to the metal layer is formed using a specific top coat agent. is formed, the above-mentioned drawbacks of the prior art are overcome, and a plastic molded product with excellent brightness and long-term surface durability is provided.
(実施例)
次に実施例及び参考例を挙げて本発明を更に具
体的に説明する。尚、文中部又は%とあるのは重
量基準である。(Example) Next, the present invention will be explained in more detail by giving examples and reference examples. Note that "%" or "%" in the text is based on weight.
実施例 1
コロナ放電処理したポリエステルフイルム(厚
さ50μm)に、以下のベースコート塗料を塗布
し、ベースコート層を作成した。Example 1 The following base coat paint was applied to a corona discharge treated polyester film (thickness: 50 μm) to create a base coat layer.
2官能ウレタンアクリレート(分子量1000〜
1500) 50部
平均3官能ポリエステルアクリレート(分子量
500−1600) 40部
ジペンタエリスリトールヘキサアクリレート10部
酢酸イソブチル 50部
ベンジフエノン 3部
ベンジルジメチルケタノール 2部
この塗料をグラビアケタロールコーターで、約
3μmに塗布し、溶剤を乾燥後、160W/cm高圧水
銀灯15cmで、コンベア速度20m/minで硬化して
得た被膜の硬度は、鉛筆硬度は3Hであつた。Bifunctional urethane acrylate (molecular weight 1000~
1500) 50 parts average trifunctional polyester acrylate (molecular weight
500-1600) 40 parts Dipentaerythritol hexaacrylate 10 parts Isobutyl acetate 50 parts Bendiphenone 3 parts Benzyl dimethyl ketanol 2 parts Apply this paint with a gravure ketal roll coater to approx.
After coating to a thickness of 3 μm and drying the solvent, the film was cured using a 160 W/cm high pressure mercury lamp 15 cm at a conveyor speed of 20 m/min, and the pencil hardness of the film obtained was 3H.
次に上記のベースコート上に、徳田真空(株)製の
スパツタリング装置で、真空度1×10-4Torr、
アルゴン圧8×10-4Torr、電圧500V、電流密度
200A/m2の条件でクロムのスパツタ膜(厚さ
1000Å)を形成した。 Next, the above base coat was coated with a vacuum degree of 1×10 -4 Torr using a sputtering device manufactured by Tokuda Vacuum Co., Ltd.
Argon pressure 8×10 -4 Torr, voltage 500V, current density
Chromium spatter film ( thickness
1000 Å) was formed.
次いで、上記のスパツタ薄膜上に以下のトツプ
コート塗料を塗布し、トツプコートを作成した。 Next, the following top coat paint was applied onto the above sputtered thin film to prepare a top coat.
2官能ウレタンアクリレート(分子量1000〜
1500) 50部
トリメチロールプロパントリアクリレート 20部
1,6−ヘキサンジオールジアクリレート 10部
ビス(メタアクリロキシエチル)フオスフエート
4部
メチルイソブチルケトン 20部
酢酸エチル 20部
2−ヒドロキシ−2−メチル−トリフエニルプロ
パン−1−オン 4部
3−メルカプトピルピロトリメトキシシラン2部
シリコン系レベリング剤 Byk−300 0.3部
(酸価=30)
この塗料をグラビアロールコーターで約4μm
の厚さを塗布し、溶剤を乾燥後、80W/cm高圧水
銀灯下15cmでコンベア速度10m/minで硬化さ
せ、鉛筆硬度3Hで密着性1mm巾クロスカツトセ
ロテープ剥離100/100の耐久性良好な美麗なクロ
ムスパツタリングのフイルムを作成することが出
来た。Bifunctional urethane acrylate (molecular weight 1000~
1500) 50 parts trimethylolpropane triacrylate 20 parts 1,6-hexanediol diacrylate 10 parts bis(methacryloxyethyl) phosphate
4 parts methyl isobutyl ketone 20 parts ethyl acetate 20 parts 2-hydroxy-2-methyl-triphenylpropan-1-one 4 parts 3-mercaptopylpyrotrimethoxysilane 2 parts Silicone leveling agent Byk-300 0.3 parts (acid value =30) Apply this paint to approximately 4μm using a gravure roll coater.
After drying the solvent, cure it under a 80W/cm high-pressure mercury lamp for 15cm at a conveyor speed of 10m/min.It has a pencil hardness of 3H, has an adhesion of 1mm, cross-cut cellophane tape, and has good durability and peelability of 100/100. I was able to create a film with beautiful chrome sputtering.
参考例 2
実施例1におけるベースコートの鉛筆硬度を
HBとした場合は、トツプコート硬化後、スパツ
タリング膜に細かいクラツクを多数生じた。Reference example 2 The pencil hardness of the base coat in Example 1
In the case of HB, many fine cracks were generated in the sputtered film after the top coat was cured.
実施例1のトツプコートの形状において、3−
メルカプトプロピルトリメトキシシランを除いた
塗料を用いた場合は、トツプコートは、密着テス
トで20/100であり、密着不良であつた。 In the top coat shape of Example 1, 3-
When a paint excluding mercaptopropyltrimethoxysilane was used, the top coat had a 20/100 adhesion test, indicating poor adhesion.
参考例 3
実施例1においてトツプコートの形成において
ビス(メタクリロキシグリシジル)フオスフエー
トを除き、酸価を5以下とした時は、密着テスト
でトツプコートは0/100で密着不良であつた。Reference Example 3 In Example 1, when bis(methacryloxyglycidyl) phosphate was removed and the acid value was set to 5 or less in the formation of the top coat, the adhesion test showed that the top coat was 0/100 and had poor adhesion.
実施例 2
ABS成型物に、以下のベースコート塗料を塗
布し、トツプコート層を作成した。Example 2 The following base coat paint was applied to an ABS molded article to create a top coat layer.
2官能エポキシアクリレート(分子量600〜1000)
50部
ペンタエリスリトールトリアクリレート 40部
ベンゾフエノン 2部
1−ハイドロキシシクロヘキシルケトン 3部
n−ヘキサン 30部
イソプロピルアルコール 20部
酢酸エチル 20部
キシレン 30部
メチルセロソルプ 30部
ブチルセロソルプ 30部
この塗料をエアースプレーで約10μmに塗布
し、溶剤乾燥後、80W/cm高圧水銀灯下、15cmで
回転しながら、5秒間硬化させ、鉛筆硬度Hのベ
ースコート層を得た。Bifunctional epoxy acrylate (molecular weight 600-1000)
50 parts pentaerythritol triacrylate 40 parts benzophenone 2 parts 1-hydroxycyclohexyl ketone 3 parts n-hexane 30 parts isopropyl alcohol 20 parts ethyl acetate 20 parts xylene 30 parts methyl cellosolp 30 parts butyl cellosolp 30 parts Apply this paint to approximately 10 μm using air spray. After drying the solvent, it was cured for 5 seconds under a high-pressure mercury lamp of 80 W/cm while rotating at 15 cm to obtain a base coat layer with a pencil hardness of H.
上記ベースコート層上に、徳田真空(株)製のスパ
ツタリング装置で、真空度8×10-5Torr、アル
ゴン圧8×10-4Torr、電圧400V、電流密度
300A/m2の条件でニツケルのスパツタ膜(1500
Å)を形成した。 The above base coat layer was coated with a sputtering device manufactured by Tokuda Vacuum Co., Ltd. at a vacuum level of 8 x 10 -5 Torr, an argon pressure of 8 x 10 -4 Torr, a voltage of 400 V, and a current density.
Nickel sputtered film ( 1500
Å) was formed.
上記ニツケルスパツタ薄膜上に、以下のトツプ
コート塗料を、塗布してトツプコート層を作成し
た。 The following top coat paint was applied onto the nickel spatter thin film to form a top coat layer.
2官能エポキシアクリレート(分子量600〜1000)
30部
2官能ポリエーテルアクリレート(分子量1000〜
1400) 30部
ヒドロキシバリン酸ネオペンチルグリコールジア
クリレート 15部
ジエトキシアセトフエノン 3部
ベンゾインイソブチルエーテル 1部
アクリルジアクリレート(分子量500、酸価150)
5部
3−アミノプロピルトリブトキシシラン 2部
酢酸エチル 20部
イソプロピルアルコール 20部
エチルセロソルブ 30部
メトルイソブチルケトン 30部
トルエン 30部
信越シリコンKF−69 0.2部
(酸価12)
上記塗料を、エアスプレーで約8μmに塗布し、
溶剤を乾燥後、80W/cmの高圧下水銀灯下15cmで
回転させながら6秒間照射して硬化させ、鉛筆硬
度3Hで、密着性1mm巾クロスカツトセロテープ
剥離テストは100/100であり、耐久性良好で美麗
なニツケルスパツタ膜を有するABS成型物が得
られた。Bifunctional epoxy acrylate (molecular weight 600-1000)
30 parts bifunctional polyether acrylate (molecular weight 1000~
1400) 30 parts hydroxyvalic acid neopentyl glycol diacrylate 15 parts diethoxyacetophenone 3 parts benzoin isobutyl ether 1 part acrylic diacrylate (molecular weight 500, acid value 150)
5 parts 3-aminopropyltributoxysilane 2 parts ethyl acetate 20 parts isopropyl alcohol 20 parts ethyl cellosolve 30 parts metolysobutyl ketone 30 parts toluene 30 parts Shin-Etsu Silicone KF-69 0.2 parts (acid value 12) The above paint was air sprayed. Apply to approximately 8μm,
After drying the solvent, it was cured by irradiating it for 6 seconds while rotating under a mercury lamp under a high pressure of 80W/cm for 6 seconds.The pencil hardness was 3H, and the adhesion was 100/100 in a 1mm width cross-cut Sellotape peel test, indicating good durability. An ABS molded product with a beautiful nickel spatter film was obtained.
参考例 4
実施例2のベースコートの硬度をFとした場合
は、トツプコート形成後に、数本のクラツクが発
生した。Reference Example 4 When the hardness of the base coat of Example 2 was F, several cracks occurred after the top coat was formed.
参考例 5
実施例2のトツプコートの形成に際し、シラン
化合物を使用しない場合は、トツプコート層の密
着性は、剥離テストで40/100であり、耐湿テスト
(60℃、95%RH、12時間)では0/100であつた。Reference Example 5 When forming the top coat of Example 2 without using a silane compound, the adhesion of the top coat layer was 40/100 in a peel test and 40/100 in a moisture resistance test (60°C, 95% RH, 12 hours). It was 0/100.
参考例 6
実施例2のトツプコートの形成に際し、アクリ
ルジアクリレートを使用しなかつた場合は、密着
性が不十分であつた。Reference Example 6 When the top coat of Example 2 was formed without using acrylic diacrylate, the adhesion was insufficient.
Claims (1)
ク成型品の表面に、紫外線硬化型アクリル樹脂
系ベースコート塗料を塗布し、紫外線により硬
化させて、鉛筆硬度がH以上のベースコート層
を形成する工程、 (b) 真空度1×10-3〜6×10-5Torr、アルゴン
圧5×10-3〜1×10-4Torr、電圧200〜600V、
電流密度20〜500A/m2の条件下で、スパツタ
リングにより、クロム、ニツケル等の金属、黄
銅、ステンレススチール等の各種合金の300〜
2000Åの厚さの薄膜を上記のベースコート層上
に形成する工程、 (c) 反応性アルコキシシラン化合物を含有する酸
価が5〜50である紫外線硬化型アクリル樹脂系
トツプコート塗料を上記金属薄膜面に塗布し、
紫外線により硬化させる工程、 からなることを特徴とする金属薄膜被覆層を有す
るプラスチツク成型品の製造方法。 2 紫外線硬化型アクリル樹脂系ベースコート用
塗料及びトツプコート塗料が、3官能以上の成分
を5重量%以上含有する特許請求の範囲第1項に
記載の方法。[Claims] 1(a) A base coat having a pencil hardness of H or higher by applying an ultraviolet curable acrylic resin base coat paint to the surface of a plastic molded product on which a metal thin film coating layer is to be formed and curing it with ultraviolet light. Step of forming a layer, (b) degree of vacuum 1 × 10 -3 to 6 × 10 -5 Torr, argon pressure 5 × 10 -3 to 1 × 10 -4 Torr, voltage 200 to 600 V,
Various alloys such as metals such as chromium and nickel, brass, and stainless steel are heated by sputtering at a current density of 20 to 500 A/ m2 .
(c) forming a thin film with a thickness of 2000 Å on the above base coat layer; (c) applying an ultraviolet curable acrylic resin top coat paint containing a reactive alkoxysilane compound and having an acid value of 5 to 50 on the surface of the above metal thin film; Apply,
A method for producing a plastic molded product having a metal thin film coating layer, comprising the step of curing with ultraviolet rays. 2. The method according to claim 1, wherein the UV-curable acrylic resin base coat paint and top coat paint contain 5% by weight or more of a trifunctional or higher functional component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59182712A JPS6160878A (en) | 1984-09-03 | 1984-09-03 | Production of plastic molding having thin metallic film coating layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59182712A JPS6160878A (en) | 1984-09-03 | 1984-09-03 | Production of plastic molding having thin metallic film coating layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6160878A JPS6160878A (en) | 1986-03-28 |
JPH0422984B2 true JPH0422984B2 (en) | 1992-04-21 |
Family
ID=16123114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59182712A Granted JPS6160878A (en) | 1984-09-03 | 1984-09-03 | Production of plastic molding having thin metallic film coating layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6160878A (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01212753A (en) * | 1988-02-19 | 1989-08-25 | Ikuyo:Kk | Formation of metallic appearance for synthetic resin molding |
JP2003231207A (en) * | 2002-11-25 | 2003-08-19 | Matsushita Electric Ind Co Ltd | Composite thin film |
JP5217866B2 (en) * | 2008-10-03 | 2013-06-19 | 藤倉化成株式会社 | Base coat coating composition and glitter composite coating film |
JP5471395B2 (en) * | 2009-12-14 | 2014-04-16 | 藤倉化成株式会社 | Composite coating |
JP2012056252A (en) * | 2010-09-10 | 2012-03-22 | Kaneka Corp | Acrylic resin film |
BR112015016650A2 (en) * | 2013-01-17 | 2017-07-11 | Sun Chemical Corp | primer composition, printed article, and methods for printing an energy curable primer composition and for forming a coated shiny metallic paper material |
WO2019225465A1 (en) * | 2018-05-24 | 2019-11-28 | Dic株式会社 | Polymerizable composition, cured product of same, photospacer, overcoat for display elements, interlayer insulating material for display elements, and liquid crystal display element |
-
1984
- 1984-09-03 JP JP59182712A patent/JPS6160878A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6160878A (en) | 1986-03-28 |
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