JPH04221878A - Thick film circuit board and its manufacturing method - Google Patents

Thick film circuit board and its manufacturing method

Info

Publication number
JPH04221878A
JPH04221878A JP41322690A JP41322690A JPH04221878A JP H04221878 A JPH04221878 A JP H04221878A JP 41322690 A JP41322690 A JP 41322690A JP 41322690 A JP41322690 A JP 41322690A JP H04221878 A JPH04221878 A JP H04221878A
Authority
JP
Japan
Prior art keywords
film
conductive film
wiring
thick film
lower conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP41322690A
Other languages
Japanese (ja)
Inventor
Noboru Oki
大木 昇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Yuden Co Ltd
Original Assignee
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Yuden Co Ltd filed Critical Taiyo Yuden Co Ltd
Priority to JP41322690A priority Critical patent/JPH04221878A/en
Publication of JPH04221878A publication Critical patent/JPH04221878A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4685Manufacturing of cross-over conductors

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

PURPOSE:To provide a circuit board manufacturing method by which a lower conductor film formed on a thick film circuit board having a structure of two wiring lines crossing through an insulating film thereon is effectively isolated from an external field, and migration does not occur and which is simpler than prior art inexpensively. CONSTITUTION:A lower conductor film 2 of Ag paste is formed at an intersection of two wiring lines on an alumina board 1, a glass insulating film 3 is formed on the upper surface of the lower conductor film except at least two edge regions, the lower film exposed from the insulating film is covered, for example, with a vitreous conductive film 7 for a thick film resistor of RuO2 paste, a first wiring line 4 of Cu paste is so formed as to be superposed on the conductive film, and a second wiring line 5 of Cu paste is so formed as to pass over the upper surface of the insulating film.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、その表面上において、
2本の厚膜導体による配線ラインが絶縁膜を隔てて交差
するような構造を有する厚膜配線基板およびその形成方
法に関する。
[Industrial Application Field] On the surface, the present invention comprises:
The present invention relates to a thick film wiring board having a structure in which wiring lines made of two thick film conductors intersect with an insulating film in between, and a method for forming the same.

【0002】0002

【従来の技術】上記のような厚膜配線基板として、例え
ば、以下のようにして得られるものが知られている。ま
ず、例えばアルミナ基板等のセラミック基板1を用意し
、その表面上にAg・Pdペースト等のAg系ペースト
を矩形状にスクリーン印刷し、その後、空気中で約 8
50℃で焼成して、矩形状の下部導体膜2を形成する(
図4)。次にこの下部導体膜2の上面にガラスペースト
をスクリーン印刷し、空気中で焼成してガラス絶縁膜3
を形成する。この時、前記ガラス絶縁膜3は下部導体膜
2の対向する2つの末端縁部が帯状に露出するように形
成される(図5)。
2. Description of the Related Art A thick film wiring board as described above is known, for example, one obtained as follows. First, a ceramic substrate 1 such as an alumina substrate is prepared, and an Ag-based paste such as Ag/Pd paste is screen printed on the surface of the ceramic substrate 1 in a rectangular shape.
A rectangular lower conductor film 2 is formed by baking at 50°C (
Figure 4). Next, a glass paste is screen printed on the upper surface of this lower conductor film 2 and baked in air to form a glass insulating film 3.
form. At this time, the glass insulating film 3 is formed so that two opposing end edges of the lower conductive film 2 are exposed in a band shape (FIG. 5).

【0003】続いて、Cuペーストを用いて、各末端部
が、露出している前記下部導体膜2の末端縁部の上に重
なるように、一対の厚膜導体ライン(焼成後、第1の配
線ライン4となる)を互いに逆方向に延びるようにスク
リーン印刷で形成し(図6)、これと同時に、前記ガラ
ス絶縁膜上を通過する別の厚膜導体ライン(焼成後、第
2の配線ライン5となる)を前記と同様にCuペースト
のスクリーン印刷で形成して(図7)、N2 雰囲気中
、約 600℃で焼成する。このとき、前記の一対の厚
膜導体ラインは、前記下部導体膜を仲立ちに互いに短絡
されて、1つの配線ラインを構成することとなる。
Next, using Cu paste, a pair of thick film conductor lines (after firing, the first Wiring lines 4) are formed by screen printing so as to extend in opposite directions (FIG. 6), and at the same time, another thick film conductor line (after baking, a second wiring line is formed) passing over the glass insulating film. Line 5) is formed by screen printing Cu paste in the same manner as described above (FIG. 7), and is fired at about 600° C. in an N2 atmosphere. At this time, the pair of thick film conductor lines are short-circuited to each other using the lower conductor film as an intermediary, thereby forming one wiring line.

【0004】さらに、N2 雰囲気において 500℃
で焼成可能なガラスペーストを用意し、このガラスペー
ストを、前記ガラス絶縁膜3と第1の配線ラインとの間
隙に露出している前記下部導体膜2を覆うようにスクリ
ーン印刷する。ここで、前述のようなN2 雰囲気で焼
成可能なガラスペーストを用いる理由は、空気中で焼成
可能なガラスペーストを用いて、実際に空気中で焼成す
ると、Cuペーストから形成された配線ラインが酸化さ
れるためである。この後、前記の条件の通りN2 雰囲
気中で焼成してオーバーコート膜6を形成し(図8)、
厚膜配線基板が完成される。なお、図9は図8における
A−A′断面を示す図である。
[0004]Furthermore, at 500°C in an N2 atmosphere,
A glass paste that can be fired is prepared, and this glass paste is screen printed so as to cover the lower conductor film 2 exposed in the gap between the glass insulating film 3 and the first wiring line. Here, the reason for using a glass paste that can be fired in an N2 atmosphere as mentioned above is that if a glass paste that can be fired in air is actually fired in air, the wiring line formed from Cu paste will be oxidized. This is to be done. Thereafter, the overcoat film 6 is formed by firing in an N2 atmosphere under the conditions described above (FIG. 8).
A thick film wiring board is completed. Note that FIG. 9 is a diagram showing a cross section taken along line A-A' in FIG.

【0005】ここで、前記オーバーコート膜6を形成し
て露出した下部導体膜2を封止する理由は、下部導体膜
を構成するAg系材料が耐湿性が低いためであり、オー
バーコート膜が形成されない場合、下部導体膜からイオ
ン化した金属が、この下部導体膜より高い電位にある電
極、あるいは配線の方向に向かって溶出する現象(マイ
グレーション)が発生するからである。図10における
矢印はこのようなAgイオンの溶出によるマイグレーシ
ョンにおけるAgイオンの進行方向を示す。
The reason why the exposed lower conductor film 2 is sealed by forming the overcoat film 6 is that the Ag-based material constituting the lower conductor film has low moisture resistance. This is because if it is not formed, a phenomenon (migration) occurs in which ionized metal from the lower conductor film is eluted toward the electrode or wiring at a higher potential than the lower conductor film. The arrows in FIG. 10 indicate the traveling direction of Ag ions during migration due to such elution of Ag ions.

【0006】また、上記の形成過程において、前記ガラ
スペーストの代りに、Cuペーストを用い、下部導体膜
をすべて覆うようにスクリーン印刷、焼成し、配線ライ
ンを形成して下部導体膜を封止しようとしても(図11
)、Cuペーストの焼成によって得られる厚膜導体は緻
密さに欠け、海綿状になっているため、水分が下部導体
膜まで達し、下部導体膜から金属イオンが溶出してしま
い、さらにそのイオンがCuの配線ラインを透過して外
に出て、マイグレーションが防止できないということが
あった。
[0006] Also, in the above formation process, Cu paste is used instead of the glass paste, screen printed and fired to cover the entire lower conductor film, wiring lines are formed, and the lower conductor film is sealed. Even if (Fig. 11
), the thick film conductor obtained by firing the Cu paste lacks density and is spongy, so moisture reaches the lower conductor film, metal ions are eluted from the lower conductor film, and the ions are further removed. There have been cases where it has penetrated the Cu wiring line and gone out, making it impossible to prevent migration.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、上記先
行技術において、前記のN2 雰囲気において 500
℃で焼成可能なガラスペーストは高価であり、厚膜配線
基板の製造コストの増大の原因となっていた。また、オ
ーバーコート膜の形成によって、工数が増えるという課
題もあった。
[Problems to be Solved by the Invention] However, in the above-mentioned prior art, in the above-mentioned N2 atmosphere, 500
Glass pastes that can be fired at °C are expensive and have been a cause of increased manufacturing costs for thick film wiring boards. There was also the problem that the number of man-hours increased due to the formation of the overcoat film.

【0008】したがって、本発明の目的は、上記先行技
術の課題を解決して、下部導体膜を外界から確実に隔絶
させる構造を有し、マイグレーションを発生させない厚
膜配線基板を提供するとともに、さらに該厚膜配線基板
を簡易に製造できる形成方法を提供することにある。
Therefore, an object of the present invention is to solve the above-mentioned problems of the prior art and provide a thick film wiring board having a structure that reliably isolates the lower conductor film from the outside world and which does not cause migration. It is an object of the present invention to provide a method for easily manufacturing the thick film wiring board.

【0009】[0009]

【課題を解決するための手段】本発明者は上記目的を達
成すべく研究の結果、基板上に下部導体膜を形成し、そ
の上にガラス絶縁膜を形成した後、該絶縁膜から露出し
ている下部導体膜の縁部領域を厚膜抵抗用ガラス質導電
性膜で被覆し、該導電性膜を介して一つの配線ラインが
形成されるようにすれば、前記マイグレーションを防止
でき、しかも下部導体膜と配線ラインとの導通に関して
は両者の間に挟まる導電性膜の厚みに対して、配線ライ
ンと下部導体膜との対向する面積を充分大きく設計すれ
ば、導電性膜の抵抗成分は無視できることを見出し本発
明に到達した。
[Means for Solving the Problems] As a result of research to achieve the above object, the present inventor formed a lower conductive film on a substrate, formed a glass insulating film thereon, and then formed a glass insulating film exposed from the insulating film. By covering the edge region of the lower conductor film with a glassy conductive film for thick film resistors and forming one wiring line through the conductive film, the migration can be prevented. Regarding the conduction between the lower conductive film and the wiring line, if the area where the wiring line and the lower conductive film face each other is designed to be sufficiently large compared to the thickness of the conductive film sandwiched between them, the resistance component of the conductive film can be reduced. The present invention was achieved by discovering that this can be ignored.

【0010】すなわち、本発明は、基板表面上に絶縁膜
を隔てて交差する2本の配線ラインが存在する構造を有
する厚膜配線基板であって、上記2本の配線ラインの交
差部分が、基板上に形成された下部導体膜と、該下部導
体膜の上面を覆い、下部導体膜の対向する2つの縁部の
みが露出するように形成された絶縁膜と、前記下部導体
膜露出縁部上に形成されたガラス質導電性膜と、各末端
部が該導電性膜に被覆された下部導電膜の2つの縁部に
それぞれ重なるようにして下部導体膜によって導通され
るように形成された一対の第1の配線ラインと、上記絶
縁膜上面を通過するように形成された第2の配線ライン
とからなる構造を有することを特徴とする厚膜配線基板
;および前記ガラス質導電性膜はペースト状抵抗性物質
を厚膜工程によって形成されたものである上記の厚膜配
線基板;並びに基板表面上に絶縁膜を隔てて交差する2
本の配線ラインが存在する構造を有する厚膜配線基板の
形成方法において、上記2本の配線ラインの交差部分を
、基板上に下部導体膜を形成し、その2つの縁部領域を
除く下部導体膜の全面を被覆するガラス絶縁膜を形成し
た後、ガラス絶縁膜から露出している下部導体膜の縁部
領域を厚膜抵抗用ガラス質導電性膜で完全に被覆し、各
末端部が下部導体膜の露出縁部上に形成された前記ガラ
ス質導電性膜の上に重なるようにして下部導体膜によっ
て導通される一対の第1の配線ラインを形成し、同時に
上記絶縁膜の上面を通過するように第2の配線ラインを
形成することを特徴とする厚膜配線基板の形成方法;お
よび前記ガラス質導電性膜はペースト状抵抗物質の厚膜
工程によって形成される上記の方法を提供するものであ
る。
That is, the present invention provides a thick film wiring board having a structure in which two wiring lines intersect with each other with an insulating film on the surface of the substrate, and where the intersection of the two wiring lines is a lower conductor film formed on a substrate; an insulating film formed to cover the upper surface of the lower conductor film so that only two opposing edges of the lower conductor film are exposed; and exposed edges of the lower conductor film. The conductive layer was formed so as to be electrically connected to the vitreous conductive film formed on the upper conductive film and the lower conductive film so that each end portion overlapped with the two edges of the lower conductive film covered with the conductive film. A thick film wiring board characterized by having a structure consisting of a pair of first wiring lines and a second wiring line formed to pass through the upper surface of the insulating film; and the glassy conductive film The above-mentioned thick film wiring board, which is formed using a paste-like resistive material by a thick film process;
In a method for forming a thick film wiring board having a structure in which two wiring lines are present, a lower conductor film is formed on the substrate at the intersection of the two wiring lines, and a lower conductor film is formed on the substrate except for the two edge regions. After forming a glass insulating film that covers the entire surface of the film, the edge area of the lower conductive film exposed from the glass insulating film is completely covered with a glassy conductive film for thick film resistors, so that each end forming a pair of first wiring lines electrically connected by the lower conductive film so as to overlap the glassy conductive film formed on the exposed edge of the conductive film, and simultaneously passing through the upper surface of the insulating film; A method for forming a thick film wiring board, characterized in that a second wiring line is formed so as to form a second wiring line; It is something.

【0011】[0011]

【作用】本発明の一実施例の厚膜配線基板の断面を示し
た図1に見られるように、前記下部導体膜2を覆うよう
に形成されたガラス質導電性膜7の緻密性のため、外気
の湿気等の水分を確実に隔絶でき、マイグレーションの
発生を防止することができる。また、ガラス質導電性膜
として、厚膜抵抗に用いられるRuO2 等の既存のペ
ースト状抵抗物質を用いることで、製造工程における工
数を増加させず、安価に製造することができる。
[Operation] As seen in FIG. 1 showing a cross section of a thick film wiring board according to an embodiment of the present invention, due to the denseness of the vitreous conductive film 7 formed to cover the lower conductive film 2, , it is possible to reliably isolate moisture such as moisture from the outside air, and prevent migration from occurring. In addition, by using an existing paste-like resistive material such as RuO2 used in thick film resistors as the glassy conductive film, it is possible to manufacture the film at low cost without increasing the number of steps in the manufacturing process.

【0012】また、図1からも明らかな通り、配線ライ
ン4と下部導体膜2との間を分かつように導電性膜7が
挟まることになる。そこで、この導電性膜がRuO2 
を主成分とするもののような厚膜抵抗であるとき、本来
短絡すべき両者の間に抵抗成分が介されることになるが
、配線ラインと下部導体膜との対向する部分の面積を、
導電性膜の厚みに対して充分大きく設計することで、前
記の抵抗成分は無視できるほど小さくできる。
Furthermore, as is clear from FIG. 1, the conductive film 7 is sandwiched between the wiring line 4 and the lower conductive film 2 so as to separate them from each other. Therefore, this conductive film is RuO2
When the main component is a thick film resistor, a resistance component is interposed between the two that should be short-circuited, but the area of the opposing portion of the wiring line and the lower conductor film is
By designing the conductive film to have a sufficiently large thickness, the resistance component can be made negligibly small.

【0013】[0013]

【実施例】本発明の一実施例である厚膜配線基板の形成
過程を以下に説明する。
EXAMPLE The process of forming a thick film wiring board which is an example of the present invention will be described below.

【0014】96%アルミナ基板を用意し、基板の表面
にAg・Pdペーストを矩形状にスクリーン印刷した。 次いでこの基板を空気中で約 850℃、約10分間焼
成し、下部導体膜を形成した。
A 96% alumina substrate was prepared, and a rectangular Ag/Pd paste was screen printed on the surface of the substrate. Next, this substrate was baked in air at about 850° C. for about 10 minutes to form a lower conductor film.

【0015】次に、両末端部における一定幅の縁辺部分
を除き下部導体膜の上面にガラスペーストをスクリーン
印刷し、空気中で焼成してガラス絶縁膜を形成した。続
いて、厚膜抵抗用RuO2 ペーストを基板上の所定の
位置にスクリーン印刷を行い、同時に前記下部導体膜上
面の内、ガラス絶縁膜から露出している領域にも同じR
uO2 ペーストによるスクリーン印刷を行い、空気中
で焼成した。
Next, a glass paste was screen printed on the upper surface of the lower conductor film except for edge portions of a certain width at both ends, and the glass paste was baked in air to form a glass insulating film. Next, a RuO2 paste for thick film resistors is screen printed on a predetermined position on the substrate, and at the same time, the same R is applied to the area exposed from the glass insulating film on the upper surface of the lower conductor film.
Screen printing with uO2 paste was performed and fired in air.

【0016】さらに、Cuペーストのスクリーン印刷に
よって、下部導体膜の両側に下部導体膜を挟んで対向し
互いに逆方向に延びるように配された一対の厚膜配線ラ
インを、各末端部が下部導体膜上に形成されたRuO2
 厚膜の上に直接に接して重なるように形成し、これと
同時に、前記ガラス絶縁膜上を通過する別の厚膜配線ラ
インを、前記と同様にCuペーストのスクリーン印刷で
形成して、N2 雰囲気中で約 600℃、約5分間焼
成し、厚膜配線基板の製造を完成させた。
Furthermore, by screen printing Cu paste, a pair of thick film wiring lines are formed on both sides of the lower conductor film, facing each other with the lower conductor film in between, and extending in opposite directions. RuO2 formed on the film
At the same time, another thick film wiring line passing over the glass insulating film was formed by screen printing with Cu paste in the same manner as above, and N2 The product was baked in an atmosphere at about 600°C for about 5 minutes to complete the production of a thick film wiring board.

【0017】[0017]

【発明の効果】実施例からも明らかな通り、本発明の厚
膜配線基板によれば、下部導体膜を外界から確実に隔絶
させることができ、したがってマイグレーションを発生
させない上、高価なガラスペーストを用いず、またオー
バーコート膜の形成工程も必要としないので、従来の方
法に比し簡便でコスト安である。
[Effects of the Invention] As is clear from the examples, the thick film wiring board of the present invention can reliably isolate the lower conductor film from the outside world, and therefore does not cause migration and does not require the use of expensive glass paste. This method is simpler and less costly than conventional methods, as it does not require any overcoat film formation process.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の一実施例における厚膜配線基板を説明
するための断面図である。
FIG. 1 is a cross-sectional view for explaining a thick film wiring board in one embodiment of the present invention.

【図2】本発明実施例における厚膜配線基板の、第2の
配線ラインに沿った断面を示す図である。
FIG. 2 is a diagram showing a cross section along a second wiring line of a thick film wiring board according to an embodiment of the present invention.

【図3】本発明実施例における厚膜配線基板の、第1の
配線ラインに沿った断面を示す図である。
FIG. 3 is a diagram showing a cross section along a first wiring line of a thick film wiring board according to an embodiment of the present invention.

【図4】基板上に形成された下部導体膜を示す平面図で
ある。
FIG. 4 is a plan view showing a lower conductor film formed on a substrate.

【図5】下部導体膜上に形成されたガラス絶縁膜を示す
平面図である。
FIG. 5 is a plan view showing a glass insulating film formed on a lower conductor film.

【図6】各末端部が下部導体膜の露出縁部と重なるよう
にして対向的に設けられた第1の配線ラインを示す平面
図である。
FIG. 6 is a plan view showing first wiring lines provided oppositely so that each end overlaps with an exposed edge of a lower conductor film.

【図7】ガラス絶縁膜上を通過する第2の配線ラインを
示す平面図である。
FIG. 7 is a plan view showing a second wiring line passing over a glass insulating film.

【図8】ガラス絶縁膜と第1の配線ラインとの間隙に露
出している下部導体膜を被覆するため、従来行われてい
るオーバーコート膜を示す平面図である。
FIG. 8 is a plan view showing a conventional overcoat film for covering the lower conductor film exposed in the gap between the glass insulating film and the first wiring line.

【図9】図8のA−A′線における断面図である。9 is a sectional view taken along line AA' in FIG. 8;

【図10】従来の方法において、オーバーコート膜が形
成されない場合の下部導体膜からのマイグレーションに
おけるAgイオンの進行方向を示す平面図である。
FIG. 10 is a plan view showing the traveling direction of Ag ions during migration from the lower conductor film when no overcoat film is formed in the conventional method.

【図11】従来の方法において、ガラスペーストによる
オーバーコート膜の代りにCuペーストで下部導体膜を
封止した場合の断面図である。
FIG. 11 is a cross-sectional view of a conventional method in which a lower conductor film is sealed with Cu paste instead of an overcoat film using glass paste.

【符号の説明】[Explanation of symbols]

1‥‥基板 2‥‥下部導体膜 3‥‥ガラス絶縁膜 4‥‥第1の配線ライン 5‥‥第2の配線ライン 6‥‥オーバーコート膜 7‥‥ガラス質導電性膜 1‥‥Substrate 2. Lower conductor film 3.Glass insulation film 4..First wiring line 5. Second wiring line 6.Overcoat film 7. Glassy conductive film

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】  基板表面上に絶縁膜を隔てて交差する
2本の配線ラインが存在する構造を有する厚膜配線基板
であって、上記2本の配線ラインの交差部分が、基板上
に形成された下部導体膜と、該下部導体膜の上面を覆い
、下部導体膜の対向する2つの縁部のみが露出するよう
に形成された絶縁膜と、前記下部導体膜露出縁部上に形
成されたガラス質導電性膜と、各末端部が該導電性膜に
被覆された下部導電膜の2つの縁部にそれぞれ重なるよ
うにして下部導体膜によって導通されるように形成され
た一対の第1の配線ラインと、上記絶縁膜上面を通過す
るように形成された第2の配線ラインとからなる構造を
有することを特徴とする厚膜配線基板。
1. A thick film wiring board having a structure in which two wiring lines intersect with each other with an insulating film on the surface of the substrate, wherein the crossing portion of the two wiring lines is formed on the substrate. an insulating film formed to cover the upper surface of the lower conductive film so that only two opposing edges of the lower conductive film are exposed; a vitreous conductive film, and a pair of first conductive films formed so as to be electrically connected by the lower conductive film so that each end overlaps two edges of the lower conductive film covered with the conductive film. A thick film wiring board having a structure comprising a wiring line and a second wiring line formed to pass through the upper surface of the insulating film.
【請求項2】前記ガラス質導電性膜はペースト状抵抗性
物質を厚膜工程によって形成されたものである請求項1
記載の厚膜配線基板。
2. The glassy conductive film is formed of a paste-like resistive material by a thick film process.
The thick film wiring board described above.
【請求項3】  基板表面上に絶縁膜を隔てて交差する
2本の配線ラインが存在する構造を有する厚膜配線基板
の形成方法において、上記2本の配線ラインの交差部分
を、基板上に下部導体膜を形成し、その2つの縁部領域
を除く下部導体膜の全面を被覆するガラス絶縁膜を形成
した後、ガラス絶縁膜から露出している下部導体膜の縁
部領域を厚膜抵抗用ガラス質導電性膜で完全に被覆し、
各末端部が下部導体膜の露出縁部上に形成された前記ガ
ラス質導電性膜の上に重なるようにして下部導体膜によ
って導通される一対の第1の配線ラインを形成し、同時
に上記絶縁膜の上面を通過するように第2の配線ライン
を形成することを特徴とする厚膜配線基板の形成方法。
3. In a method for forming a thick film wiring board having a structure in which two wiring lines intersect with each other with an insulating film on the surface of the substrate, the crossing portion of the two wiring lines is formed on the substrate. After forming a lower conductor film and forming a glass insulating film that covers the entire surface of the lower conductor film except for its two edge regions, the edge region of the lower conductor film exposed from the glass insulating film is covered with a thick film resistor. completely coated with a glassy conductive film for
forming a pair of first wiring lines electrically connected by the lower conductive film such that each end overlaps the glassy conductive film formed on the exposed edge of the lower conductive film; A method for forming a thick film wiring board, comprising forming a second wiring line so as to pass through the upper surface of the film.
【請求項4】前記ガラス質導電性膜はペースト状抵抗物
質の厚膜工程によって形成される請求項3記載の方法。
4. The method of claim 3, wherein the glassy conductive film is formed by a thick film process of a pasty resistive material.
JP41322690A 1990-12-21 1990-12-21 Thick film circuit board and its manufacturing method Withdrawn JPH04221878A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP41322690A JPH04221878A (en) 1990-12-21 1990-12-21 Thick film circuit board and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP41322690A JPH04221878A (en) 1990-12-21 1990-12-21 Thick film circuit board and its manufacturing method

Publications (1)

Publication Number Publication Date
JPH04221878A true JPH04221878A (en) 1992-08-12

Family

ID=18521907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP41322690A Withdrawn JPH04221878A (en) 1990-12-21 1990-12-21 Thick film circuit board and its manufacturing method

Country Status (1)

Country Link
JP (1) JPH04221878A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103763854A (en) * 2014-01-18 2014-04-30 上海美维电子有限公司 Printed circuit board and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103763854A (en) * 2014-01-18 2014-04-30 上海美维电子有限公司 Printed circuit board and manufacturing method thereof

Similar Documents

Publication Publication Date Title
US4300115A (en) Multilayer via resistors
JP3852649B2 (en) Manufacturing method of chip resistor
JPH035676B2 (en)
KR920005985B1 (en) Post-termination process for thick-film resistors of printed circuit boards
JPH04221878A (en) Thick film circuit board and its manufacturing method
JP3370685B2 (en) Manufacturing method of square chip resistor
JP2839262B2 (en) Chip resistor and manufacturing method thereof
JPH05135902A (en) Rectangular type chip resistor and manufacture thereof
JP3036214B2 (en) Manufacturing method of square chip resistor
JP3159440B2 (en) Square chip resistors
JPH1097954A (en) Laminated chip type cr filter and cr filter array
JP3223917B2 (en) Square chip resistors
JPH1097953A (en) Laminated chip type cr filter and array thereof
JP3649668B2 (en) Trimming method for chip network resistor
JPH0287588A (en) Formation of resistor on thick-film wiring board
JPH09120933A (en) Thick-film capacitor
JPH0653004A (en) Rectangular chip resistor and its manufacture
JPS63244900A (en) Method of forming thick film printed circuit
JPS6045095A (en) Method of producing thick film multilayer board
JPH0513903A (en) Metal core substrate and manufacture there0f
JP2000195701A (en) Rectangular chip resistor and manufacturing method
JP2004128218A (en) Method of manufacturing small electronic component and chip resistor
JPS6345729Y2 (en)
JPH0134340Y2 (en)
JPH10303001A (en) Method for manufacturing square chip resistor

Legal Events

Date Code Title Description
A300 Application deemed to be withdrawn because no request for examination was validly filed

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19980312