JPH0421914Y2 - - Google Patents

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Publication number
JPH0421914Y2
JPH0421914Y2 JP1987010656U JP1065687U JPH0421914Y2 JP H0421914 Y2 JPH0421914 Y2 JP H0421914Y2 JP 1987010656 U JP1987010656 U JP 1987010656U JP 1065687 U JP1065687 U JP 1065687U JP H0421914 Y2 JPH0421914 Y2 JP H0421914Y2
Authority
JP
Japan
Prior art keywords
water
water supply
diffusion
rim
toilet bowl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1987010656U
Other languages
Japanese (ja)
Other versions
JPS63121682U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987010656U priority Critical patent/JPH0421914Y2/ja
Publication of JPS63121682U publication Critical patent/JPS63121682U/ja
Application granted granted Critical
Publication of JPH0421914Y2 publication Critical patent/JPH0421914Y2/ja
Expired legal-status Critical Current

Links

Description

【考案の詳細な説明】 〔産業上の利用分野〕 本考案は、小便器に供給される洗浄水を各射水
孔へ分配する構造の改良に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an improvement in a structure for distributing flush water supplied to a urinal to each water injection hole.

〔従来の技術〕[Conventional technology]

従来、小便器における洗浄水分配構造として
は、本出願人による先の出願(実願昭60−167356
号実開昭62−77284号に係る未公知のものがある。
即ち、この構造は、第3図乃至第5図に示す如
く、小便器本体1の上面に、便鉢2上部の給水室
3への通ずる給水口4が穿設され、該給水室3の
底壁3aに、その周辺部に便鉢洗浄用の射水孔
5,5……が複数穿設されていると共に、射水孔
5,5……の開口部を相互に連絡する分配溝6を
周囲に設けた拡散隆起部7が形成されたものであ
る。拡散隆起部7は、給水口4の直下部分に形成
され、その平面視形状を給水室3の底壁3aより
も一回り小さい長円状としてある。給水室3の底
壁3aの手前両側には、リム通水路用流入孔2
a,2aが穿設されている。リム通水路(図示は
省略)は、便鉢2の正面開口周部に沿つて形成さ
れ、便鉢洗浄用の射水孔が複数穿設されている。
Conventionally, a washing water distribution structure in a urinal has been proposed in an earlier application by the present applicant (Utility Application No. 167356/1986).
There is an unknown item related to No. 62-77284.
That is, in this structure, as shown in FIGS. 3 to 5, a water supply port 4 that communicates with the water supply chamber 3 above the toilet bowl 2 is bored in the upper surface of the urinal body 1, and the bottom of the water supply chamber 3 is opened. In the wall 3a, a plurality of water injection holes 5, 5... for flushing the toilet bowl are bored in the surrounding area, and a distribution groove 6 is provided around the wall 3a to connect the openings of the water injection holes 5, 5... with each other. A diffusion ridge 7 is formed therein. The diffusion protrusion 7 is formed directly below the water supply port 4, and has an oval shape that is slightly smaller than the bottom wall 3a of the water supply chamber 3 in plan view. On both sides of the bottom wall 3a of the water supply chamber 3, there are inflow holes 2 for the rim water passage.
a, 2a are drilled. The rim water passage (not shown) is formed along the periphery of the front opening of the toilet bowl 2, and has a plurality of water injection holes for cleaning the toilet bowl.

給水口4に接続された給水管(図示は省略)か
ら給水室3に所定水圧の洗浄水が供給されると、
洗浄水が拡散隆起部7に衝突してその全周へ拡散
し、この拡散水が給水室3の周壁(例えば、内奥
壁3b)に反射して分配溝6内へ集められる。分
配溝6内に集められた洗浄水は、射水孔5,5…
…から流出して便鉢2の立壁部を洗浄すると共
に、リム通水路用流入孔2a,2aからリム通水
路内へ導かれ射水孔から流出して便鉢2の垂れ受
け部等を洗浄する。
When cleaning water at a predetermined water pressure is supplied to the water supply chamber 3 from a water supply pipe (not shown) connected to the water supply port 4,
The cleaning water collides with the diffusion ridge 7 and diffuses around its entire circumference, and this diffused water is reflected on the peripheral wall (for example, the inner inner wall 3b) of the water supply chamber 3 and collected into the distribution groove 6. The cleaning water collected in the distribution groove 6 flows through the water injection holes 5, 5...
It flows out from ... and cleans the standing wall part of the toilet bowl 2, and is guided into the rim passageway through the rim passageway inflow holes 2a, 2a and flows out from the water injection hole to wash the drip receiving part of the toilet bowl 2, etc. .

〔考案が解決しようとする問題点〕[Problem that the invention attempts to solve]

従来の洗浄水分配構造にあつては、所定水圧の
洗浄水が供給されているときには、総ての射水孔
5,5……及びリム通水路用流入孔2a,2aへ
洗浄水を一定割合で分配して便鉢2を均一に洗浄
するものではあるが、洗浄水の給水圧力が低下し
ているときには、分配割合が一定とならず便鉢2
の立壁左右両側寄り及び垂れ受け部が充分に洗浄
されないという問題点が生じていた。その理由
は、拡散隆起部7に衝突した低水圧の洗浄水が、
低い動圧のために全周へ勢いよく拡散するには至
らず、拡散隆起部7の表面に案内されて流れ下る
だけとなるからである。そのため、給水室3内に
おける分配状況をみると、給水直下位置から案内
距離の遠い給水室3内の左右両側寄りは、洗浄水
が充分に供給されないことになり、左右両側寄り
の射水孔5,5……及びリム通水路の射水孔から
射水する洗浄水量が少なくなるのである。
In the conventional cleaning water distribution structure, when cleaning water at a predetermined water pressure is supplied, cleaning water is distributed at a constant rate to all the water injection holes 5, 5... and the rim water passage inlet holes 2a, 2a. Although it distributes the water and cleans the toilet bowl 2 uniformly, when the water supply pressure of cleaning water is low, the distribution ratio is not constant and the toilet bowl 2
A problem has arisen in that the left and right sides of the standing wall and the hanging portions are not sufficiently cleaned. The reason is that the low-pressure cleaning water that collided with the diffusion ridge 7
This is because, due to the low dynamic pressure, it is not possible to diffuse vigorously all around the circumference, but only flows down guided by the surface of the diffusion ridge 7. Therefore, looking at the distribution situation in the water supply chamber 3, cleaning water is not sufficiently supplied to the left and right sides of the water supply chamber 3, which are far from the position directly below the water supply, and the water injection holes 5, 5...and the amount of washing water injected from the water injection holes in the rim passageway is reduced.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点を解決するために本考案か採用した
手段は、小便器本体の上面に便鉢上部の給水室へ
通ずる給水口が穿設され、該給水口に給水管が接
合され、上記給水室の底壁には、その周辺に便鉢
洗浄用の射水孔が複数穿設され、その底壁手前側
の両側にリム通水路用流入孔が穿設れ、射水孔及
びリム通水路用流入孔に連絡する分配溝を周囲に
設けた拡散隆起部が形成され、該拡散隆起部及び
分配溝と前記給水管の吐水口との間に水拡散用空
間が形成された小便器において、前記給水室の底
壁における給水口の直下部分には、前記拡散隆起
部で囲まれた溜水部が形成され、前記拡散隆起部
は、前記リム通水路用流入孔に接近した部分が他
の部分より低く形成されていることを特徴とする
小便器における洗浄水分配構造である。
The means adopted by the present invention to solve the above problems is that a water supply port leading to the water supply chamber above the toilet bowl is bored on the top surface of the urinal body, a water supply pipe is connected to the water supply port, and the water supply chamber is connected to the water supply port. A plurality of water injection holes for flushing the toilet bowl are drilled around the bottom wall, and inlet holes for the rim water passage are bored on both sides of the front side of the bottom wall. A urinal in which a diffusion ridge is formed around which a distribution groove is connected to the water supply chamber, and a space for water diffusion is formed between the diffusion ridge and the distribution groove and the water outlet of the water supply pipe. A water reservoir surrounded by the diffusion ridge is formed in the bottom wall of the bottom wall directly below the water supply port, and the diffusion ridge has a portion closer to the rim waterway inflow hole that is lower than other portions. This is a flush water distribution structure in a urinal, characterized in that:

〔作用〕[Effect]

給水圧力の低い洗浄水が給水管から給水室に供
給されると、洗浄水は溜水部に貯えられた後、拡
散隆起部の全域から溢流して分配溝に分散供給さ
れ、総ての射水孔及びリム通水路用流入孔を介し
て洗浄水が便鉢内に流出する。殊にリム通水路用
流入孔は、拡散隆起部の低い部分に接近している
ため、洗浄水が確実に導かれることになる。
When cleaning water with low water supply pressure is supplied from the water supply pipe to the water supply chamber, the cleaning water is stored in the water reservoir, then overflows from the entire area of the diffusion ridge and is distributed to the distribution groove, distributing all the water. Wash water flows into the toilet bowl through the hole and the inlet hole for the rim waterway. In particular, since the inflow hole for the rim water passage is close to the lower part of the diffusion ridge, the cleaning water is reliably introduced.

給水圧力の高い洗浄水が給水管から給水室に供
給されると、洗浄水の一部は溜水部に貯えられて
拡散隆起部の全域から溢流して分配溝に分散供給
され、洗浄水の残部は溜水部に貯えられた洗浄水
に衝突して水用拡散空間へ拡散した後に、給水室
の周壁に反射して分配溝へ分配供給される。その
結果、総ての射水孔及びリム通水路用流入孔を介
して洗浄水が便鉢内に流出する。
When cleaning water with high water supply pressure is supplied from the water supply pipe to the water supply chamber, a part of the cleaning water is stored in the water reservoir, overflows from the entire area of the diffusion ridge, and is distributed and supplied to the distribution groove, and the cleaning water is The remainder collides with the wash water stored in the water reservoir and diffuses into the water diffusion space, and then is reflected on the peripheral wall of the water supply chamber and distributed to the distribution groove. As a result, the flushing water flows into the toilet bowl through all the water injection holes and the rim water passage inflow holes.

〔実施例の説明〕[Explanation of Examples]

以下、本考案に係る小便器における洗浄水等配
構造(以下、「本案構造」という)を、第1図及
び第2図に示す実施例に基づいて説明する。
Hereinafter, the flush water equal distribution structure in a urinal according to the present invention (hereinafter referred to as the "proposed structure") will be explained based on the embodiment shown in FIGS. 1 and 2.

本案構造における主たる改良点は、給水室3の
底壁3aにおける給水口4の直下部分に、拡散隆
起部8で囲まれた溜水部9を形成し、拡散隆起部
8の左右の手前部8a′,8a′を低くしたことであ
る。
The main improvement in the proposed structure is that a water reservoir 9 surrounded by diffusion ridges 8 is formed in the bottom wall 3a of the water supply chamber 3 directly below the water supply port 4, and the right and left front portions 8a of the diffusion ridges 8 are formed. ', 8a' were lowered.

拡散隆起部8は、上面8aにおける左右の手前
部8a′,8a′を除く平坦部8a″を、便器所定取付
け姿勢の際に略々水平となるように形成すると共
に、上面8aから外方へ適宜傾斜角度θ(θ=30
〜45°)の傾斜面8bを延設してある。拡散隆起
部8は、その平面視形状を、上部内周縁8cの形
状と裾外周縁8dの形状とが略々相似関係になる
ようにし、平坦部8a″を溢流する洗浄水量が平坦
部8a″の全域に亘つて均等になるようにしてあ
る。更に、拡散隆起部8は、上記手前部8a′,8
a′を平坦部8a″より低くしてあり、手前部8a′,
8a′から溢流してリム通水路用流入孔2a,2a
へ所定水量の洗浄水が分配供給されるようにして
ある。溜水部9は、拡散隆起部8及び手前壁3c
で囲繞され、その深さ寸法H1を15〜25mm程度と
すると共に、底面9aから給水室内天井面3dま
での室内高さ寸法H2を40〜60mm程度とし、給水
配管工事をする際に、溜水部9内に給水管10の
スパツド10aを逃すことができるようにしてあ
る。拡散隆起部平坦部8a″及び分配溝6と給水管
10の吐水口10bとの間には、水拡散用空間S
が形成されている。
The diffusion raised portion 8 is formed such that a flat portion 8a'' excluding the left and right front portions 8a' and 8a' of the upper surface 8a is approximately horizontal when the toilet is in a predetermined mounting posture, and extends outward from the upper surface 8a. Adjust the inclination angle θ (θ=30
-45°) is extended. The shape of the diffusion protrusion 8 in plan view is such that the shape of the upper inner circumferential edge 8c and the shape of the bottom outer circumferential edge 8d have a substantially similar relationship, so that the amount of washing water overflowing the flat portion 8a'' is smaller than the flat portion 8a. It is made to be uniform over the whole area. Further, the diffusion protrusion 8 is located at the front portion 8a', 8.
a' is lower than the flat part 8a'', and the front part 8a',
The water overflows from 8a' and flows into the rim waterway inflow holes 2a, 2a.
A predetermined amount of washing water is distributed and supplied to the washing water. The water storage portion 9 includes the diffusion ridge portion 8 and the front wall 3c.
The depth dimension H 1 is set to be approximately 15 to 25 mm, and the indoor height dimension H 2 from the bottom surface 9a to the water supply indoor ceiling surface 3d is set to be approximately 40 to 60 mm. A spud 10a of a water supply pipe 10 is allowed to escape into the water reservoir 9. A water diffusion space S is provided between the flat portion 8a″ of the diffusion ridge, the distribution groove 6, and the water outlet 10b of the water supply pipe 10.
is formed.

次に、給水室3内における洗浄水の挙動を説明
する。給水管10の吐出口10bから給水室3に
低水圧(例えば、流動時静圧が0.5〜0.7Kg/cm2
の洗浄水が供給されると、洗浄水は、溜水部9に
一旦貯えられ、拡散隆起部8の手前部8a′,8
a′から溢流してリム通水路用流入孔2a,2aへ
分配されると共に、拡散隆起部8の平坦部8a″の
全域から溢流することにより分配溝6の全域に亘
つて分配され、全部の射水孔5,5……及びリム
通水路(図示は省略)の射水孔から便鉢2内へ射
出され、便鉢2の洗浄面全域を満遍なく洗浄す
る。また、給水管10の吐出口10bから給水室
3に高水圧(例えば、流動時静圧が1.0Kg/cm2
上)の洗浄水が供給されると、洗浄水の一部は溜
水部9に貯えられて、拡散隆起部8の手前部8
a′,8a′から溢流すると共に拡散隆起部8の平坦
部8a″の全域から分配溝6内に溢流し、洗浄水の
残部は上記溜水部9に貯えられた洗浄水に衝突し
て水用拡散空間Sへ拡散した後に、給水室3の周
壁に反射して分配溝6内へ分配される。上記溢流
及び反射分配によりリム通水路用流入孔2a,2
a及び分配溝6の全域に亘つて分散された洗浄水
は、総ての射水孔5,5……及びリム通水路の射
水孔から便鉢2内へ射出され、便鉢2の洗浄面全
域を満遍なく洗浄する。
Next, the behavior of the cleaning water in the water supply chamber 3 will be explained. Low water pressure (for example, static pressure during flow is 0.5 to 0.7 Kg/cm 2 ) from the discharge port 10b of the water supply pipe 10 to the water supply chamber 3
When the cleaning water is supplied, the cleaning water is temporarily stored in the water storage section 9 and is distributed to the front portions 8a', 8 of the diffusion ridge 8.
a' and distributed to the rim flow channel inflow holes 2a, 2a, and also overflows from the entire area of the flat part 8a'' of the diffusion ridge 8, thereby being distributed over the entire area of the distribution groove 6, and all The water is injected into the toilet bowl 2 from the water injection holes 5, 5, . When cleaning water with high water pressure (for example, static pressure during flow is 1.0 Kg/cm 2 or more) is supplied to the water supply chamber 3 from front part 8
a', 8a' and also overflows into the distribution groove 6 from the entire area of the flat part 8a'' of the diffusion ridge 8, and the remainder of the cleaning water collides with the cleaning water stored in the water reservoir 9. After being diffused into the water diffusion space S, it is reflected on the peripheral wall of the water supply chamber 3 and distributed into the distribution groove 6. Due to the above-mentioned overflow and reflection distribution, the inflow holes 2a, 2 for the rim water passageway
The cleaning water dispersed over the entire area of the toilet bowl 2 and the distribution groove 6 is injected into the toilet bowl 2 from all the water injection holes 5, 5... and the water injection holes of the rim passageway, and is sprayed over the entire cleaning surface of the toilet bowl 2. Wash thoroughly.

〔考案の効果〕[Effect of idea]

以上詳述の如く、本案構造は、射水孔及びリム
通水路用流入孔の全体へ洗浄水を分散供給するの
で、洗浄水の供給圧力の影響を受けることなく全
部の射水孔及びリム通水路用流入孔へ洗浄水を供
給することが可能となり、便鉢の洗浄面全域を満
遍なく洗浄する実用的効果を有する。
As described in detail above, the proposed structure distributes and supplies cleaning water to the entire water injection hole and rim passageway inflow hole, so that all the water injection holes and rim passageway can be supplied without being affected by the supply pressure of cleaning water. It becomes possible to supply washing water to the inflow hole, which has the practical effect of evenly washing the entire cleaning surface of the toilet bowl.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本考案に係る小便器におけ
る洗浄水分配構造の実施例を示すものであつて、
第1図は平面断面図、第2図は上部を示す右側断
面図、第3図乃至第5図は従来の小便器における
洗浄水分配構造を示すものであつて、第3図は正
面図、第4図は第3図の−線における平面断
面図、第5図は上部を示す右側断面図である。 2……便鉢、2a……リム通水路用流入孔、3
……給水室、4……給水口、5……射水孔、6…
…分配溝、8……拡散隆起部、9……溜水部、1
0……給水管、10b……吐水口、S……水拡散
用空間。
1 and 2 show an embodiment of the flush water distribution structure in a urinal according to the present invention,
Fig. 1 is a plan sectional view, Fig. 2 is a right sectional view showing the upper part, Figs. 3 to 5 show the flush water distribution structure in a conventional urinal, and Fig. 3 is a front view; 4 is a plan sectional view taken along the - line in FIG. 3, and FIG. 5 is a right sectional view showing the upper part. 2...Toilet bowl, 2a...Inflow hole for rim waterway, 3
... Water supply room, 4 ... Water supply port, 5 ... Water injection hole, 6 ...
...Distribution groove, 8...Diffusion ridge, 9...Water storage part, 1
0... Water supply pipe, 10b... Water outlet, S... Space for water diffusion.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 小便器本体の上面に便鉢上部の給水室へ通ずる
給水口が穿設され、該給水口に給水管が接合さ
れ、上記給水室の底壁には、その周辺に便鉢洗浄
用の射水孔が複数穿設され、その底壁手前側の両
側にリム通水路用流入孔が穿設され、射水孔及び
リム通水路用流入孔に連絡する分配溝を周囲に設
けた拡散隆起部が形成され、該拡散隆起部及び分
配溝と前記給水管の吐水口との間に水拡散用空間
が形成された小便器において、前記給水室の底壁
における給水口の直下部分には、前記拡散隆起部
で囲まれた溜水部が形成され、前記拡散隆起部
は、前記リム通水路用流入孔へ接近した部分が他
の部分より低く形成されていることを特徴とする
小便器における洗浄水分配構造。
A water supply port leading to the water supply chamber above the toilet bowl is drilled on the top surface of the urinal body, a water supply pipe is connected to the water supply port, and a water injection hole for flushing the toilet bowl is provided around the bottom wall of the water supply chamber. A plurality of rim water passage inflow holes are bored on both sides of the front side of the bottom wall, and a diffusion ridge is formed around which a distribution groove communicating with the water injection hole and the rim water passage inflow hole is formed. , in a urinal in which a space for water diffusion is formed between the diffusion ridge and the distribution groove and the water outlet of the water supply pipe, the diffusion ridge is located directly below the water supply outlet on the bottom wall of the water supply chamber; A flushing water distribution structure in a urinal, characterized in that a water storage part surrounded by is formed, and a part of the diffusion protrusion part that approaches the inflow hole for the rim passageway is formed lower than the other part. .
JP1987010656U 1987-01-27 1987-01-27 Expired JPH0421914Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987010656U JPH0421914Y2 (en) 1987-01-27 1987-01-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987010656U JPH0421914Y2 (en) 1987-01-27 1987-01-27

Publications (2)

Publication Number Publication Date
JPS63121682U JPS63121682U (en) 1988-08-08
JPH0421914Y2 true JPH0421914Y2 (en) 1992-05-19

Family

ID=30797153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987010656U Expired JPH0421914Y2 (en) 1987-01-27 1987-01-27

Country Status (1)

Country Link
JP (1) JPH0421914Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6242650B2 (en) * 2013-10-03 2017-12-06 株式会社Lixil Urinal spreader

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH026724U (en) * 1988-06-22 1990-01-17

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH026724U (en) * 1988-06-22 1990-01-17

Also Published As

Publication number Publication date
JPS63121682U (en) 1988-08-08

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