JPH0421855B2 - - Google Patents

Info

Publication number
JPH0421855B2
JPH0421855B2 JP57153283A JP15328382A JPH0421855B2 JP H0421855 B2 JPH0421855 B2 JP H0421855B2 JP 57153283 A JP57153283 A JP 57153283A JP 15328382 A JP15328382 A JP 15328382A JP H0421855 B2 JPH0421855 B2 JP H0421855B2
Authority
JP
Japan
Prior art keywords
acid
weight
plate
photosensitive
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57153283A
Other languages
Japanese (ja)
Other versions
JPS5942539A (en
Inventor
Masao Nakatsuka
Takatoshi Oota
Teruo Ezaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okamoto Chemical Industry Co Ltd
Original Assignee
Okamoto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okamoto Chemical Industry Co Ltd filed Critical Okamoto Chemical Industry Co Ltd
Priority to JP15328382A priority Critical patent/JPS5942539A/en
Publication of JPS5942539A publication Critical patent/JPS5942539A/en
Publication of JPH0421855B2 publication Critical patent/JPH0421855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/0166Diazonium salts or compounds characterised by the non-macromolecular additives

Description

【発明の詳现な説明】[Detailed description of the invention]

本発明は、感光性平版印刷版に関する。 埓来、ゞアゟ感光局を有する感光性平版印刷版
以䞋、PS版ず呌ぶの倚くは、ゞアゟ暹脂の有
機塩およびたたは無機塩ず、これに混合が可胜
の高分子重合䜓および、必芁に応じお、染料、顔
料等を配合した感光液を、アルミニりム薄板䞊に
塗垃しお圢成したものである。 これらPS版の印刷適性の良吊は、䞊蚘高分子
重合䜓の特性によるこずが倚い。䟋えば、アルカ
リ珟像を行なうPS版の堎合、該高分子重合䜓の
構造内の芪氎性官胜基量䟋えば、ヒドロキシ
−OH、カルボキシル−COOH基などの構
造内における数量が、珟像特性、たたは画線郚
のむンキ着肉性に圱響を䞎える。該高分子重合䜓
の芪氎性官胜基量が少い堎合、画線郚のむンキ着
肉性は向䞊するが、非画線郚のぬけ速床以䞋、
珟像速床ず呌ぶは遅くなる傟向がある。逆に、
芪氎性官胜基量が倚い堎合、珟像速床は早くなる
が、画線郚のむンキ着肉性は悪くなる。さらに、
画線郚が膚最しやすくなるので、珟像時に物理的
衝撃が加わ぀た堎合、画線郚に傷が぀きやすくな
る。 このようなPS版の珟像性を改善するためには、
以䞋の諞特性珟像促進性ずいうをPS版が持
぀ようにしなければならない。 â—‹ã‚€ 短時間に珟像でき、さらに非画線郚が印刷䞭
に地汚れを起さない。 ○ロ 長時間の珟像においおも、画線郚の膚最が比
范的少く、画線郚に圱響をあたえない。 ○ハ 珟像時間の長短にかかわらず、同䞀な画線郚
を提䟛する。 ○ニ 珟像液濃床が倉化しおも、同䞀な画線郚を提
䟛する。 しかし、前蚘のように、該感光局に混合する高
分子合䜓の特性に倉化を䞎えるだけでは、問題の
解決に限界がある。 本発明は、䞊蚘問題を解決し、PS版および高
分子重合䜓の諞特性を倉えるこずなく、前述のご
ずき珟像促進性をも぀PS版を提䟛するものでそ
の芁旚は、ゞアゟ暹脂の有機塩およびたたは無
機塩ず有機溶剀可溶性の高分子化合物を䞻成分ず
する感光局に、䞀般匏 〔は、氎玠たたは炭玠数〜のアルキル基、
たたはアリヌル基、X+ 1X+ 2は、氎玠、アルカリ
金属、アルカリ土類金属䟋えばナトリりム、カ
リりム、カルシりム、たたはアミン類を瀺す。〕 で瀺される化合物を、該感光局の総重量の0.1〜
20重量の範囲で添加するこずを特城ずする感光
性平版印刷版にある。 䞀般匏(1)で瀺される化合物ずしお、−ヒドロ
キシ−−スルホベンゟむツクアシド、−ヒド
ロキシ−−スルホベンゟむツクアシド、−ヒ
ドロキシ−−スルホベンゟむツクアシド、−
ヒドロキシ−−スルホベンゟむツクアシド、
−ヒドロキシ−−スルホベンゟむツクアシド、
−ヒドロキシ−−スルホベンゟむツクアシ
ド、−スルホ−−クロ゜チツクアシド、−
スルホ−−クレ゜チツクアシド、−スルホ−
−クロ゜チツクアシド、−ヒドロキシ−−
スルホナフトむツクアシド、およびたたはその
アルカリ金属塩䟋えばナトリりム、カリりム
塩、アルカリ土類金属塩䟋えばカルシりム
塩、アンモニりム塩などを挙げるこずができる。
特に、−ヒドロキシ−−スルホベンゟむツク
アシドず−スルホクレ゜チツクアシドの−、
−、−異性䜓が奜たしい。 これら化合物の少くずも䞀皮を、感光局の総重
量に察しお、0.1〜20重量、奜たしくは〜10
重量䜿甚する。0.1重量以䞋では珟像促進性
の効果がなく、20重量以䞊になるず、感光局が
倉色しやすくなり、補版埌の画線郚が、膚最し、
キズが぀きやすく、むンキの着肉性もわるくな
る。 本発明に䜿甚されるゞアゟ暹脂の有機塩およ
びたたは無機塩は、氎に察しお䞍溶性もしくは
難溶性で、有機溶媒に可溶性であるこずが奜たし
い。このような性質を有するゞアゟ暹脂ずしお、
特公昭40−8611、米囜特蚱2922715、米囜特蚱
2946683等に蚘茉された、ゞアゟゞアリヌルアミ
ンずホルムアルデヒド、アセトアルデヒド等の掻
性カルボニル化合物ずの瞮合物がある。䞊蚘ゞア
ゟアリヌルアミンずしお、䟋えば、−ゞアゟゞ
プニルアミン、−ゞアゟ−−メチルゞプ
ニルアミン、−ゞアゟ−3′−メチルゞプニル
アミン、−ゞアゟ−4′−メトキシゞプニルア
ミン、−ゞアゟ−−メトキシゞプニルアミ
ン等を挙げるこずができる。 䞊蚘ゞアゟ暹脂ず化合しお有機塩を圢成する化
合物ずしお、特公昭40−2203、特公昭41−6813、
特公昭47−1167等に蚘茉の化合物がある。䟋え
ば、ベンれンスルホン酞、−トル゚ンスルホン
酞、−キシレンスルホン酞、盎鎖型、偎鎖
型ドデシルベンれンスルホン酞通称ドデシルベ
ンれンスルホン酞、−ヒドロキシ−−メト
キシ−ベンゟプノン−−スルホン酞、メタニ
ル゚ロヌ、−クロルトル゚ン−−スルホン
酞、およびたたはそのアルカリ金属塩䟋え
ば、ナトリりム、カリりム、アルカリ土類金属
塩カルシりム、アンモニりム塩等を挙げるこ
ずができる。 䞊蚘ゞアゟ暹脂ず化合しお無機塩を圢成する化
合物ずしお、特公昭40−2203、特開昭54−98613、
米囜特蚱4093465等に蚘茉の化合物がある。䟋え
ば、ホりフツ化氎玠酞、ヘキサフルオルリン酞、
リンタングステン酞、チオシアン酞、およびた
たはそのアルカリ金属塩䟋えば、ナトリりム、
カリりム、アルカリ土類金属塩䟋えば、カル
シりム、アンモニりム塩等を挙げるこずができ
る。 䞊蚘ゞアゟ化合物は、それぞれ単独で、あるい
は混合しお甚いるこずができ、その含有量は、感
光局総重量に察しお玄〜30重量の範囲が奜た
しい。 本発明に䜿甚される有機溶剀可溶性高分子化合
物ずしお、特公昭35−16157、特公昭47−1167、
特公昭49−36961、特公昭50−34967、特公昭51−
6566、特開昭50−30604、特開昭50−36207、特開
昭50−118802、特開昭57−2035、米囜特蚱
3652272号、米囜特蚱3660097号特に蚘茉の高分子
重合䜓がある。䟋えば、゚ポキシ暹脂、ノボラツ
ク暹脂、りレタン暹脂、ポリアミド暹脂、スチレ
ン−無氎マレむン酞共重合䜓暹脂、スチレンおよ
びビニルトル゚ンず䞍飜和二塩基酞ずの共重合䜓
暹脂、アクリル暹脂等を挙げるこずができる。特
に、米囜特蚱4282301に蚘茉の共重合䜓が奜たし
い。 䞊蚘の有機溶剀可溶性高分子化合物の含有量
は、本発明の感光局総重量に察しお、玄70〜95重
量の範囲が奜たしい。 本発明においお、必芁に応じお、感光局に染料
あるいは顔料を配合するこずができる。 染料ずしおは、クリスタルバむオレツト、マラ
カむトグリヌン、ビクトリアブルヌ、メチレンブ
ルヌ、゚チルバむオレツト、ロヌダミン等、お
よびその誘導䜓である塩基性油性染料をあげるこ
ずができ、垂販品ずしお、ビクトリアブルヌ
BOH保土谷化孊工業(æ ª)補、オむルブルヌ603
オリ゚ント化孊工業(æ ª)補、パヌマネントブルヌ
47倧同化孊工業(æ ª)補等を挙げるこずができ
る。 顔料ずしおは、フタロシアニンブルヌ、フタロ
シアニングリヌン、ゞオキサゞンバむオレツト、
キナクリドンレツド、むンダンスレンブルヌ等が
あり、その垂販品ずしお、ネオザボンブルヌ
FLEバヌデむツシナ・アニリン・りント・リヌ
ダ・フアブリカチペヌン補、オむルブルヌBOS
オリ゚ント化孊工業(æ ª)補、スピロンブルヌ
GNH保土谷化孊工業(æ ª)補等を挙げるこずが
できる。 䞊蚘染料の含有量は、本発明の感光性組成物の
総重量に察しお、玄0.5〜20重量であり、玄10
〜15重量の範囲が奜たしい。 たた、䞊蚘顔料の含有量は、本発明の感光性組
成物の総重量に察しお、玄10〜40重量の範囲で
あり、玄20〜30重量の範囲が奜たしい。 本発明の感光性平版印刷版に䜿甚する珟像液
は、匱アルカリ性氎溶液である。匱アルカリ性氎
溶液ずしおは、匱酞の金属塩䟋えばケむ酞、メ
タケむ酞、オルトケむ酞、リン酞、ピロリン酞、
メタリン酞、ヘキサメタリン酞、炭酞、酒石酞、
ホり酞等のナトリりム塩、リチりム塩、カリりム
塩等の金属塩、あるいはアンモニアおよびその誘
導䜓、䟋えば、アルキルアミン類䟋えばモノメ
チル、ゞメチル、トリメチル、モノ゚チル、ゞ゚
チル、トリ゚チル等のアミン化合物。、たたはア
ルカノヌルアミン類䟋えばモノ゚タノヌルアミ
ン、ゞ゚タノヌルアミン、ゞむ゜プロパノヌルア
ミン等アルカリ性化合物の氎溶液を挙げるこず
ができる。 これらの珟像液の、感光局における未露光郚の
溶解速床を向䞊させるためには、掻性剀および
たたは溶剀を添加するこずができる。掻性剀ずし
おは、隠むオン界面掻性剀、䟋えば炭玠数が〜
22のアルコヌルの硫酞゚ステル塩類䟋えば゜ゞ
りムラりリルサルプヌト、アンモニりムラりリ
ルサルプヌト、゜ゞりムオクチルサルプヌ
ト、アンモニりムオクチルサルプヌト、ポタシ
りムオクチルサルプヌト、倚䟡アルコヌルの
硫酞゚ステル塩類䟋えばポリオキシ゚チレンア
ルキルサルプヌト゜ヌダ塩花王アトラス(æ ª)性
゚マヌル20C、アルキルアリヌルスルホン酞塩
類䟋えばドデシルベンれンスルホン酞゜ヌダ、
ポリオキシ゚チレンドデシルプニルサルプヌ
ト゜ヌダ塩、アルキルナフタレンスルホン酞゜ヌ
ダ、ナフタレンスルホン酞゜ヌダのホルマリン瞮
合物、゜ゞりムゞアルキルスルホサクシネヌト、
脂肪酞アミドスルホネヌト、アルキルリン酞゚ス
テル、アルキル゚ヌテルリン酞゚ステル等を挙げ
るこずができる。 溶剀ずしおは、アルコヌル酞、゚ヌテル類が奜
たしいが、氎䞭20℃に10以䞊溶解しない溶
剀が最も奜たしく、この皮の溶剀ずしおは、䟋え
ば、アルコヌル類ずしお、ベンゞルアルコヌル、
DL−α−プニル゚チルアルコヌル、−プ
ニル゚チルアルコヌル、プニルセロ゜ルブ、プ
ロピレングリコヌルモノブチル゚ヌテル等を挙げ
るこずができる。 珟像液の組成は、前蚘アルカリ性化合物0.1〜
重量、界面掻性剀0.5〜重量、溶剀〜
重量、奜たしくは0.1〜重量である。 本発明の印刷版甚感光局を支持䜓䞊に圢成させ
る堎合、有機溶剀可溶性の高分子化合物、ゞアゟ
化合物および油性染料等を有機溶剀、䟋えば、メ
タノヌルずメチレンクロラむドず酢酞゚チルの混
合溶剀、−ゞメチルホルムアミド、゚チレ
ングリコヌルモノメチル゚ヌテル、゚チレングリ
コヌルモノ゚チル゚ヌテル等に溶解させ、塗垃機
䟋えばホワむラヌを甚いお支持䜓䞊に塗垃埌、
也燥するこずにより、感光局が支持䜓䞊に圢成さ
れる。 支持䜓ずしおは、ブラシたたはボヌル研磚した
アルミニりム板、化孊研磚したアルミニりム板、
ブラシ研磚したのち陜極酞化凊理を斜したアルミ
ニりム板、電解研磚したのち陜極酞化凊理を斜し
たアルミニりム板、たたは䞀般的な支持䜓を甚い
るこずができる。 この様な支持䜓に、ケむ酞アルカリ、フツ化ゞ
ルコニりム、アルキルチタネヌト、トリヒドロキ
シ安息銙酞等による化成凊理、ベヌマむト凊理、
あるいは酢酞ストロンチりム、酢酞亜鉛、酢酞マ
グネシりム、安息銙酞カルシりム等の氎溶液によ
る被芆凊理、ポリビニルピロリドン、ポリアミン
スルホン酞、ポリ−−゚チルヒドロキシアクリ
レヌト等による被芆凊理を、前蚘凊理の埌凊理ず
しお行うこずができる。 本発明を、以䞋の実斜䟋により説明する。 実斜䟋  窒玠気流䞋で、ゞオキサン150にアゟビスむ
゜ブチロニトリル0.3を加え、80〜85℃に加熱
しお撹拌しながら、その䞭ぞ、䞋蚘組成の混合物
を滎䞋した。 −ヒドロキシ−−プノキシプロピルアクリ
レヌト 50 メチルメタクリレヌト 25 アクリロニトリル 10 メタクリル酞  滎䞋終了埌、時間撹拌を続け、ゞオキサン
150を加えたのち、氎䞭に投入しお共重合䜓を
沈柱させた。その沈柱を−メトキシ゚タノヌル
に最溶解したのち、氎䞭に滎䞋しお粟補し、真空
也燥70℃しお共重合䜓(1)を埗た。この共重合
䜓の20重量−メトキシ゚タノヌル溶液を調補
し、粘床を枬定したずころ、350cps25℃であ
぀た。 䞀方、アルミニりム板を、苛性゜ヌダ、ケ
む酞゜ヌダを溶解した80℃の氎溶液で掗浄
し、ブラシ研磚したのち、硫酞電解液を甚いお、
分間陜極酞化した電流密床2Am2、電圧
10V。次いで氎掗したのち、メタケむ酞ナトリ
りム氎溶液で10秒間皮膜凊理し、陜極酞化ア
ルミニりム板を䜜補した。 䞊蚘アルミニりム板に、次の感光液を回転塗
垃機ホワむラヌを甚いお塗垃したのち、80℃
で分間也燥しお、PS版を埗た。 ゞアゟ化合物−−ゞアゟプニルアミンずホル
ムアルデヒドの瞮合物のドデシルベンれンスルホ
ン酞塩 0.3 共重合䜓(1) 3.0 オむルブルヌ603オリ゚ント化孊工業(æ ª)補
0.1 −スルホ−−クレ゜チツクアシド 0.08 ゚チレングリコヌルモノメチル゚ヌテル 90 −ゞメチルホルムアミド 10 塗垃、也燥埌の塗垃量は1.7m2であ぀た。 このPS版の感光局䞊に、ネガフむルム
を真空密着し、30Aの単盞カヌボンアヌク燈を甚
いお、距離60cmで、30秒間玫倖線照射したのち、
次に瀺す組成の珟像液を甚いお、宀枩で秒間浞
挬しお珟像した。 ケむ酞カリりム20氎溶液 50 プニルグリコヌル(H)日本乳化剀(æ ª) 40 む゜プロピルナフタレンゞスルホン酞カリりム
 亜硫酞カリりム  æ°Ž 903 次いで、氎掗し、未露光郚が陀去されるかを調
べたずころ、未露光郚はよく陀去されおいた。さ
らに、この印刷版を甚いお、校正刷りしたずこ
ろ、非画線郚にむンキによる地汚れはなか぀た。
埓぀お、短い珟像時間でも珟像できるこずがわか
぀た。 䞀方、−スル−−クレ゜チツクアシドを含
たない点を埐いお、その他は䞊蚘組成ず党く同じ
方法で䜜぀たPS板は、䞊蚘珟像条件で珟
像埌も非画線郚に残膜が残り、珟像が䞍可胜であ
぀た。 たた、PS版からなる䞊蚘印刷版の耐刷
性を調べたずころ、通垞の印刷版䟋えばPS版
を通垞の長い珟状時間で珟像しお埗られた
印刷版ず比べお、同数の印刷版を埗るこずがで
き、同時に、画線郚のむンキ着肉性に぀いおも、
良奜であ぀た。 次に、PS版を、䞊蚘ず同じ方法
によ぀おネガフむルムを密着、露光しお、その珟
像性を比范した結果を衚−に瀺す。 比范䟋  実斜䟋で甚いた「ゞアゟ化合物−−ゞアゟ
シプニルアミンずホルムアルデヒドの瞮合物の
ドデシルベンれンスルホン酞塩」の代わりに「ゞ
アゟ化合物−−ゞアゟプニルアミンずホルム
アルデヒドの瞮合物のスルホサリチル酞塩」を甚
い、「−スルホ−−クレ゜チツクアシド」の
代わりに−トル゚ンスルホン酞を甚いる以倖は
実斜䟋のPS版ず同様のPS版を䜜補し、
実斜䟋ず同様に衚−の詊隓方法で珟像性を比
范した。 詊隓方法では、画線郚が膚最しやすく、傷぀
きやすい。 詊隓方法では、長時間の堎合、画線の䞀郚が
溶出した。 詊隓方法では、芋た目には珟像できたが、む
ンキングにより地汚れが発生した。 詊隓方法では、汚れた。 詊隓方法では、汚れた。 実斜䟋  厚さ0.25mm、幅1000mmのアルミニりム板材質
1100をアルカリ脱脂し、氎掗したのち、カヌボ
ランダム20氎溶液の研磚剀を䜿甚しおブラシ研
磚した。次に、10の苛性゜ヌダ济で研磚残枣を
よく陀去し、氎掗したのち、塩酞2.5、塩化ナ
トリりム0.1を含む電解液20䞭で、電流
密床10Am2で10秒間、亀流電解研磚した。次
いで、氎掗し、10硫酞济30℃䞭、電流密床
2Am2で60秒間陜極酞化し、氎掗したのち、
ケむ酞カリりム济40℃䞭で、電流密床2A
m2ずしお、15秒間、亀流陜極酞化凊理を斜こ
し、氎掗、也燥しお陜極酞化アルミニりム板を
埗た。 このアルミニりム板に、次の組成の感光液を
回転塗垃機を甚いお塗垃し、也燥しおPS板
を埗た。 実斜䟋で䜿甚したものず同じゞアゟ化合物
0.3 スチレン−無氎マレむン酞共重合䜓暹脂  オむルブルヌ603オリ゚ント化孊工業(æ ª)補
0.1 −スルホ−−クレ゜チツクアシド 0.08 ゚チレングリコヌルモノメチル゚ヌテル 90 −ゞメチルホルムアミド 10 也燥埌の塗垃量は、2.0m2であ぀た。 䞊蚘PS版に぀いお、実斜䟋ず同様な
比范詊隓を行぀たずころ、珟像促進性のあるPS
版であるこずが確認された。 実斜䟋  実斜䟋で䜿甚した陜極酞化アルミニりム板
に、䞋蚘した瀺した感光性組成物−および
を、回転塗垃機を甚いお、塗垃量1.7m2で該
板䞊に塗垃し、也燥しおPS版および
を埗た。 感光性組成物−実斜䟋で䜿甚したゞアゟ化
合物 0.3 実斜䟋の共重合䜓(1)  オむルブルヌ603オリ゚ント化孊工業(æ ª)補
0.1 −ヒドロキシ−−スルホベンゟむツクアシド
0.08 ゚チレングリコヌルモノメチル゚ヌテル 90 −ゞメチルホルムアミド 10 感光性組成物−実斜䟋で䜿甚したゞアゟ化
合物 0.3 実斜䟋の共重合䜓(1)  オむルブルヌ603オリ゚ント化孊工業(æ ª)補
0.1 −スルホ−−クレ゜チツクアシドのカリりム
å¡© 0.08 ゚チレングリコヌルモノメチル゚ヌテル 90 −ゞメチルホルムアミド 10 このPS板およびそれぞれに぀い
お、実斜䟋ず同様な比范詊隓を行぀た結果、
−ヒドロキシ−−スルホゟンゟむツクアシドを
添加した感光性組成物−を塗垃したPS板
は、−スルホ−−クレ゜チツクアシドのカリ
りム塩を添加した感光性組成物−を塗垃した
PS板ずほが同等の印刷適正を瀺した。 以䞊の実斜䟋、、により、本発明の感光
性平版印刷版は、埓来のものより優れた印刷適正
を瀺すこずが明らかである。 さらに、本発明の感光性平版印刷版は、経時安
定性の面からも優れおいる。
The present invention relates to photosensitive lithographic printing plates. Conventionally, most photosensitive lithographic printing plates (hereinafter referred to as PS plates) having a diazo photosensitive layer are made of organic salts and/or inorganic salts of diazo resin, high molecular weight polymers that can be mixed with this, and, if necessary, It is formed by coating a photosensitive liquid containing dyes, pigments, etc. on a thin aluminum plate. The printability of these PS plates often depends on the characteristics of the high molecular weight polymer. For example, in the case of a PS plate that undergoes alkaline development, the amount of hydrophilic functional groups in the structure of the polymer (for example, the number of hydroxy (-OH), carboxyl (-COOH) groups, etc. in the structure) It affects the characteristics or the ink receptivity of the printed area. When the amount of hydrophilic functional groups in the high molecular weight polymer is small, the ink receptivity in the printed areas improves, but the penetration rate (hereinafter referred to as
(referred to as development speed) tends to be slow. vice versa,
When the amount of hydrophilic functional groups is large, the development speed becomes faster, but the ink receptivity in the image area becomes worse. moreover,
Since the image area tends to swell, the image area is more likely to be damaged if a physical impact is applied during development. In order to improve the developability of such PS plates,
The PS plate must have the following properties (referred to as development acceleration). ○B It can be developed in a short time, and non-image areas do not become smudged during printing. ○B Even during long-term development, the image area swells relatively little and does not affect the image area. ○C Provide the same image area regardless of the length of development time. ○D Even if the developer concentration changes, the same image area is provided. However, as mentioned above, there is a limit to how the problem can be solved simply by changing the properties of the polymer compound mixed into the photosensitive layer. The present invention solves the above problems and provides a PS plate having the above-mentioned development accelerating properties without changing the properties of the PS plate and the polymer. / Or in a photosensitive layer mainly composed of an inorganic salt and an organic solvent-soluble polymer compound, the general formula [R is hydrogen or an alkyl group having 1 to 2 carbon atoms,
Alternatively, the aryl group, X + 1 , X + 2 represents hydrogen, an alkali metal, an alkaline earth metal (eg, sodium, potassium, calcium), or amines. ] The compound represented by is added in an amount of 0.1 to 0.1 to
The photosensitive lithographic printing plate is characterized in that it is added in an amount of 20% by weight. Examples of the compound represented by the general formula (1) include 4-hydroxy-2-sulfobenzoitschacide, 4-hydroxy-3-sulfobenzoitschacide, 5-hydroxy-3-sulfobenzoitschacide, 6-hydroxy-3-sulfobenzoitschacide,
Hydroxy-3-sulfobenzoitukaside, 2
-Hydroxy-4-sulfobenzoitsuquaside,
3-Hydroxy-4-sulfobenzoic acid, 5-sulfo-o-crosotic acid, 5-
Sulfo-p-cresotic acid, 5-sulfo-
m-Closotic acid, 1-hydroxy-5-
Examples include sulfonaphtoic acid and/or its alkali metal salts (eg, sodium, potassium salts), alkaline earth metal salts (eg, calcium salts), ammonium salts, and the like.
In particular, the o-,
The m-, p-isomers are preferred. At least one of these compounds is contained in an amount of 0.1 to 20% by weight, preferably 1 to 10% by weight, based on the total weight of the photosensitive layer.
Use % by weight. If it is less than 0.1% by weight, there is no development accelerating effect, and if it is more than 20% by weight, the photosensitive layer tends to discolor, and the image area after plate making swells.
It is easily scratched and the ink receptivity is also poor. The organic salt and/or inorganic salt of the diazo resin used in the present invention is preferably insoluble or sparingly soluble in water and soluble in an organic solvent. As a diazo resin with such properties,
Special Publication No. 40-8611, U.S. Patent No. 2922715, U.S. Patent
There are condensates of diazodiarylamines and active carbonyl compounds such as formaldehyde and acetaldehyde, which are described in 2946683 and the like. Examples of the diazoarylamine include 4-diazodiphenylamine, 4-diazo-3-methyldiphenylamine, 4-diazo-3'-methyldiphenylamine, 4-diazo-4'-methoxydiphenylamine, Examples include 4-diazo-3-methoxydiphenylamine. As a compound that forms an organic salt by combining with the above diazo resin, Japanese Patent Publication No. 40-2203, Japanese Patent Publication No. 41-6813,
There are compounds described in Japanese Patent Publication No. 47-1167, etc. For example, benzenesulfonic acid, p-toluenesulfonic acid, 2,5-xylenesulfonic acid, linear type, side chain type dodecylbenzenesulfonic acid (commonly known as dodecylbenzenesulfonic acid), 2-hydroxy-4-methoxy-benzophenone-5 -sulfonic acid, methanyl yellow, 2-chlorotoluene-4-sulfonic acid, and/or its alkali metal salts (eg, sodium, potassium), alkaline earth metal salts (calcium), ammonium salts, and the like. As a compound that forms an inorganic salt by combining with the above diazo resin, Japanese Patent Publication No. 40-2203, Japanese Patent Application Publication No. 54-98613,
There are compounds described in US Pat. No. 4,093,465 and the like. For example, hydroborofluoric acid, hexafluorophosphoric acid,
Phosphotungstic acid, thiocyanic acid, and/or its alkali metal salts (e.g., sodium,
(potassium), alkaline earth metal salts (eg, calcium), ammonium salts, and the like. The above-mentioned diazo compounds can be used alone or in combination, and the content thereof is preferably in the range of about 5 to 30% by weight based on the total weight of the photosensitive layer. As the organic solvent-soluble polymer compound used in the present invention, Japanese Patent Publication No. 35-16157, Japanese Patent Publication No. 47-1167,
Tokuko Sho 49-36961, Tokuko Sho 50-34967, Tokko Shou 51-
6566, JP 50-30604, JP 50-36207, JP 50-118802, JP 57-2035, US Patent
No. 3,652,272 and US Pat. No. 3,660,097. Examples include epoxy resins, novolak resins, urethane resins, polyamide resins, styrene-maleic anhydride copolymer resins, copolymer resins of styrene and vinyltoluene with unsaturated dibasic acids, and acrylic resins. Particularly preferred are the copolymers described in US Pat. No. 4,282,301. The content of the above-mentioned organic solvent-soluble polymer compound is preferably in the range of about 70 to 95% by weight based on the total weight of the photosensitive layer of the present invention. In the present invention, dyes or pigments may be added to the photosensitive layer, if necessary. Examples of dyes include crystal violet, malachite green, Victoria blue, methylene blue, ethyl violet, rhodamine B, and basic oil dyes that are derivatives thereof.
BOH (manufactured by Hodogaya Chemical Industry Co., Ltd.), oil blue #603
(manufactured by Orient Chemical Industry Co., Ltd.), Permanent Blue #47 (manufactured by Daido Chemical Industry Co., Ltd.), and the like. Pigments include phthalocyanine blue, phthalocyanine green, dioxazine violet,
There are quinacridone red, indanthrene blue, etc., and neopomelo blue is a commercially available product.
FLE (manufactured by Bardate Aniline und Rieda Fabrication), oil blue BOS
(manufactured by Orient Chemical Industry Co., Ltd.), Spiron Blue
Examples include GNH (manufactured by Hodogaya Chemical Industry Co., Ltd.). The content of the above dye is about 0.5 to 20% by weight, and about 10% by weight based on the total weight of the photosensitive composition of the present invention.
A range of 15% by weight is preferred. Further, the content of the pigment is in the range of about 10 to 40% by weight, preferably in the range of about 20 to 30% by weight, based on the total weight of the photosensitive composition of the present invention. The developer used in the photosensitive lithographic printing plate of the present invention is a weakly alkaline aqueous solution. Examples of weakly alkaline aqueous solutions include metal salts of weak acids; for example, silicic acid, metasilicic acid, orthosilicic acid, phosphoric acid, pyrophosphoric acid,
Metaphosphoric acid, hexametaphosphoric acid, carbonic acid, tartaric acid,
Metal salts such as sodium salts, lithium salts, and potassium salts such as boric acid, or ammonia and its derivatives, such as alkylamines (e.g., amine compounds such as monomethyl, dimethyl, trimethyl, monoethyl, diethyl, and triethyl), or alkanols. Examples include aqueous solutions of alkaline compounds such as amines (eg, monoethanolamine, diethanolamine, diisopropanolamine). In order to improve the dissolution rate of unexposed areas in the photosensitive layer of these developers, activators and/or
Or a solvent can be added. As the activator, a hidden ionic surfactant, for example, a carbon number of 8 to
22 sulfate ester salts of alcohols (e.g. sodium lauryl sulfate, ammonium lauryl sulfate, sodium octyl sulfate, ammonium octyl sulfate, potassium octyl sulfate), sulfate ester salts of polyhydric alcohols (e.g. polyoxyethylene alkyl Sulfate soda salt: Kao Atlas Co., Ltd. Emar 20C), alkylaryl sulfonates (e.g. sodium dodecylbenzenesulfonate,
polyoxyethylene dodecyl phenyl sulfate soda salt, sodium alkylnaphthalene sulfonate, formalin condensate of sodium naphthalene sulfonate), sodium dialkyl sulfosuccinate,
Examples include fatty acid amide sulfonates, alkyl phosphates, and alkyl ether phosphates. As the solvent, alcoholic acids and ethers are preferred, but solvents that do not dissolve at least 10% in water (20°C) are most preferred. Examples of this type of solvent include alcohols such as benzyl alcohol,
Examples include DL-α-phenylethyl alcohol, 2-phenylethyl alcohol, phenyl cellosolve, propylene glycol monobutyl ether, and the like. The composition of the developer is 0.1 to 0.1% of the above alkaline compound.
3% by weight, surfactant 0.5~2% by weight, solvent 0~
2% by weight, preferably 0.1-1% by weight. When the photosensitive layer for a printing plate of the present invention is formed on a support, organic solvent-soluble polymer compounds, diazo compounds, oil dyes, etc. are mixed with an organic solvent such as a mixed solvent of methanol, methylene chloride, and ethyl acetate, N, After dissolving it in N-dimethylformamide, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, etc. and coating it on a support using a coating machine (e.g., Whiler),
By drying, a photosensitive layer is formed on the support. Supports include brushed or ball polished aluminum plates, chemically polished aluminum plates,
An aluminum plate that has been brush polished and then anodized, an aluminum plate that has been electrolytically polished and then anodized, or a general support can be used. Such a support is subjected to chemical conversion treatment with alkali silicate, zirconium fluoride, alkyl titanate, trihydroxybenzoic acid, etc., boehmite treatment,
Alternatively, coating treatment with an aqueous solution of strontium acetate, zinc acetate, magnesium acetate, calcium benzoate, etc., coating treatment with polyvinylpyrrolidone, polyaminesulfonic acid, poly-2-ethylhydroxyacrylate, etc. can be performed as a post-treatment of the above treatment. . The invention is illustrated by the following examples. Example 1 Under a nitrogen stream, 0.3 g of azobisisobutyronitrile was added to 150 g of dioxane, and a mixture having the following composition was added dropwise thereinto while heating and stirring at 80 to 85°C. 2-Hydroxy-3-phenoxypropyl acrylate 50g Methyl methacrylate 25g Acrylonitrile 10g Methacrylic acid 2g After the dropwise addition, stirring was continued for 3 hours, and dioxane
After adding 150 g, the copolymer was poured into water to precipitate the copolymer. The precipitate was redissolved in 2-methoxyethanol, purified by dropping it into water, and dried under vacuum (70°C) to obtain copolymer (1). A 20% by weight 2-methoxyethanol solution of this copolymer was prepared, and the viscosity was measured to be 350 cps (25°C). On the other hand, the aluminum plate was cleaned with an aqueous solution of 3% caustic soda and 5% sodium silicate at 80°C, polished with a brush, and then polished with a sulfuric acid electrolyte.
Anodized for 1 minute (current density 2 A /dm 2 , voltage
10V). After washing with water, the plate was coated with a 5% sodium metasilicate aqueous solution for 10 seconds to produce an anodized aluminum plate 1. After applying the following photosensitive liquid to the above aluminum plate 1 using a rotary coating machine (whiler), 80°C
was dried for 3 minutes to obtain a PS plate (). Diazo compound - dodecylbenzenesulfonate of condensate of 4-diazophenylamine and formaldehyde 0.3g Copolymer (1) 3.0g Oil Blue #603 (manufactured by Orient Chemical Industry Co., Ltd.)
0.1 g 5-sulfo-o-cresotic acid 0.08 g Ethylene glycol monomethyl ether 90 g N,N-dimethylformamide 10 g The coating amount after coating and drying was 1.7 g/m 2 . A negative film was vacuum-adhered onto the photosensitive layer of this PS plate (), and after irradiating it with ultraviolet light for 30 seconds using a 30A single-phase carbon arc lamp at a distance of 60cm,
Using a developer having the composition shown below, the film was developed by immersion at room temperature for 5 seconds. Potassium silicate 20% aqueous solution 50g Phenyl glycol (H) (Nippon Nyukazai Co., Ltd.) 40g Potassium isopropylnaphthalenedisulfonate
5g Potassium sulfite 2g Water 903g Next, it was washed with water and examined to see if the unexposed areas were removed, and it was found that the unexposed areas were well removed. Furthermore, when proof printing was carried out using this printing plate, there was no scumming caused by ink in the non-image areas.
Therefore, it was found that development can be performed even in a short development time. On the other hand, the PS plate (), which was made in exactly the same manner as the above composition except that it did not contain 5-through-o-cresotic acid, had a film remaining in the non-image area even after development under the above development conditions. remained, making it impossible to develop. In addition, when we investigated the printing durability of the above-mentioned printing plate made of PS plate (), we found that compared to a normal printing plate (for example, a printing plate obtained by developing the PS plate () in the usual long time), The same number of printing plates can be obtained, and at the same time, the ink receptivity of the printed area is also improved.
It was good and warm. Next, the PS plates () and () were exposed to negative film in close contact with each other in the same manner as described above, and the developability was compared. Table 1 shows the results. Comparative Example 1 In place of "diazo compound - dodecylbenzenesulfonate of a condensate of 4-diazocyphenylamine and formaldehyde" used in Example 1, "diazo compound - a condensate of 4-diazocyphenylamine and formaldehyde" was used. A PS plate similar to the PS plate of Example 1 () was prepared, except that P-toluenesulfonic acid was used instead of “5-sulfosalicylate” and “5-sulfo-o-cresotic acid”.
Similar to Example 1, the developability was compared using the test method shown in Table 1. In the test method, the printed area easily swells and is easily damaged. In the test method, some of the streaks eluted over a long period of time. In the test method, it appeared that development was possible, but background smearing occurred due to inking. The test method is dirty. The test method is dirty. Example 2 Aluminum plate with a thickness of 0.25 mm and a width of 1000 mm (material
1100) was degreased with alkaline, washed with water, and then polished with a brush using a polishing agent containing a 20% aqueous solution of carborundum. Next, the polishing residue was thoroughly removed in a 10% caustic soda bath, washed with water, and then washed in an electrolytic solution (20%) containing 2.5% hydrochloric acid and 0.1% sodium chloride at a current density of 10 A /dm 2 for 10 seconds. AC electrolytic polishing was performed. Then washed with water and placed in a 10% sulfuric acid bath (30°C) at current density.
After anodizing for 60 seconds at 2 A / dm2 and washing with water,
% potassium silicate bath (40°C) at a current density of 2 A /
AC anodic oxidation treatment was performed for 15 seconds at dm 2 , washed with water, and dried to obtain an anodized aluminum plate 2. A photosensitive liquid with the following composition is applied to this aluminum plate 2 using a spin coater, dried, and then the PS plate ()
I got it. The same diazo compound used in Example 1
0.3g Styrene-maleic anhydride copolymer resin 3g Oil Blue #603 (manufactured by Orient Chemical Industry Co., Ltd.)
0.1 g 5-sulfo-m-cresotic acid 0.08 g Ethylene glycol monomethyl ether 90 g N,N-dimethylformamide 10 g The coating amount after drying was 2.0 g/m 2 . When the above PS plate () was subjected to a comparative test similar to that in Example 1, it was found that PS, which has the ability to accelerate development,
It has been confirmed that this is the version. Example 3 Anodized aluminum plate 2 used in Example 2
The following photosensitive compositions-1 and 2 were used.
was applied onto the plate 2 in a coating amount of 1.7 g/m 2 using a rotary coater, and dried to obtain PS plates () and (). Photosensitive composition-1: Diazo compound used in Example 1 0.3g Copolymer (1) of Example 1 3g Oil Blue #603 (manufactured by Orient Chemical Industry Co., Ltd.)
0.1g 6-hydroxy-3-sulfobenzoitukaside
0.08g Ethylene glycol monomethyl ether 90g N,N-dimethylformamide 10g Photosensitive composition-2; Diazo compound used in Example 1 0.3g Copolymer (1) of Example 1 3g Oil Blue #603 (Orient Chemical Industry Co., Ltd.) (manufactured by Co., Ltd.)
0.1g Potassium salt of 5-sulfo-o-cresotic acid 0.08g Ethylene glycol monomethyl ether 90g N,N-dimethylformamide 10g Comparative tests similar to those in Example 1 were conducted on each of the PS plates () and (). Result, 6
-PS board coated with photosensitive composition-1 added with hydroxy-3-sulfozone zoitschacide ()
applied photosensitive composition-2 to which potassium salt of 5-sulfo-o-cresotic acid was added.
It showed almost the same printing suitability as PS board (). From the above Examples 1, 2, and 3, it is clear that the photosensitive lithographic printing plate of the present invention exhibits better printing suitability than the conventional one. Furthermore, the photosensitive lithographic printing plate of the present invention is also excellent in terms of stability over time.

【衚】 実斜䟋  実斜䟋で䜜補した陜極酞化アルミニりム板
に、次の組成からなる感光液を也燥埌の塗垃量が
1.7m2になるように塗垃した。 感光液組成 実斜䟋における共重合䜓(1) 3.0 ゞアゟ化合物−−ゞアゟゞプニルアミンずホ
ルムアルデヒドの瞮合物の−ヒドロキシ−−
メトキシベンゟプノン−−スルホン酞塩
0.3 −ヒドロキシ−−スルホベンゟむツクアシド
0.08 ビクトリアブルヌBOX保土谷化孊工業(æ ª)補
0.1 ゚チレングリコヌルモノメチル゚ヌテル 90 N′−ゞメチルホルムアミド 10 このようにしお䜜補したPS版をずする。 たた、䞊蚘感光液組成䞭の−ヒドロキシ−
−スルホベンゟむツクアシドの代わりに、−ト
ル゚ンスルホン酞䞋蚘匏(2)およびオルトスル
ホベンゟむツクアシドモノアンモニり塩䞋蚘匏
(3)を同量甚いお、同じようにPS版、
を䜜補した。
[Table] Example 4 A photosensitive solution having the following composition was applied to the anodized aluminum plate prepared in Example 1, and the coating amount after drying was
It was applied at a weight of 1.7 g/m 2 . Copolymer (1) in photosensitive liquid composition Example 1 3.0 g Diazo compound - 2-hydroxy-4- condensate of 4-diazodiphenylamine and formaldehyde
Methoxybenzophenone-5-sulfonate
0.3g 6-hydroxy-3-sulfobenzoitukaside
0.08g Victoria Blue BOX (manufactured by Hodogaya Chemical Industry Co., Ltd.)
0.1g Ethylene glycol monomethyl ether 90g N,N'-dimethylformamide 10g The PS plate prepared in this manner is referred to as (). In addition, 6-hydroxy-3 in the above photosensitive liquid composition
-In place of sulfobenzoitschacide, P-toluenesulfonic acid (formula (2) below) and orthosulfobenzoitschacide monoammonium salt (formula below)
Using the same amount of (3)), do the PS version () and () in the same way.
was created.

【匏】【formula】

【匏】 次に、これら、、の各々のPS
版を実斜䟋ず同様に露光し、同じ珟像液で秒
間珟像した。その結果、PS版は玠早く珟
像できたが、ずは残膜が残り、汚れ
の原因にな぀た。 たた、この珟像液を倍垌釈したもので30秒間
珟像し、非画線郚のぬけを芳察した。PS版
はきれいにぬけお、校正刷りでも汚れは生じなか
぀た。が、ははぬけきらず、汚れが
生じた。このこずから、本発明のPS版は、
珟像性に぀いお優れおいるこずが刀る。 さらに、これらのPS版を45℃、枩床75の恒
枩恒湿槜に二週間保存したのち、実斜䟋ず同様
に露光し、30秒間珟像を行ない校正刷りをしたず
ころ、、の非画線郚には汚れが生じ、
印刷できなか぀た。 䞊蚘実斜䟋の結果から明らなように、本発明の
䞀般匏(1)で瀺される化合物、すなわち氎酞噚、カ
ルボン酞基およびスルホン酞基を同䞀ベンれン栞
䞭に所有しおいる化合物は、ゞアゟ暹脂の勇気塩
およびたたは無機塩ず有機溶剀可溶性高分子化
合物よりも効果がある。
[Formula] Next, PS of each of these (), (), ()
The plate was exposed as in Example 1 and developed for 5 seconds with the same developer. As a result, PS plate () could be developed quickly, but () and () remained with residual film, which caused stains. Further, this developing solution was diluted 3 times and developed for 30 seconds, and the non-image areas were observed for removal. PS version ()
It came off cleanly and no stains appeared on the proof. However, () could not be removed completely and stains appeared. From this, the PS version () of the present invention is
It can be seen that the developability is excellent. Furthermore, after storing these PS plates for two weeks in a constant temperature and humidity chamber at 45°C and 75% temperature, they were exposed in the same manner as in Example 1, developed for 30 seconds, and made proofs. (), () Dirt occurs in the non-printed areas,
I couldn't print. As is clear from the results of the above examples, the compound represented by the general formula (1) of the present invention, that is, the compound having a hydroxyl group, a carboxylic acid group, and a sulfonic acid group in the same benzene nucleus, It is more effective than a diazo resin salt and/or inorganic salt and an organic solvent-soluble polymer compound.

Claims (1)

【特蚱請求の範囲】  ゞアゟ暹脂の有機塩およびたたは無機塩ず
有機溶剀可溶性の高分子化合物を䞻成分ずする感
光局に、 䞀般匏 〔は、氎玠たたは炭玠数〜のアルキル基、
たたはアリヌル基、X+ 1X+ 2は氎玠、アルカリ金
属、アルカリ土類金属䟋えばナトリりム、カリ
りム、カルシりム、たたはアミン類を瀺す。〕 で瀺される化合物を、該感光局の総重量に察し
0.1〜20重量の範囲で添加するこずを特城ずす
る感光性平版印刷版。
[Scope of Claims] 1. A photosensitive layer containing an organic salt and/or inorganic salt of a diazo resin and an organic solvent-soluble polymer compound as a main component has the general formula [R is hydrogen or an alkyl group having 1 to 2 carbon atoms,
Alternatively, the aryl group, X + 1 , X + 2 represents hydrogen, an alkali metal, an alkaline earth metal (eg, sodium, potassium, calcium), or amines. ] The compound represented by is added to the total weight of the photosensitive layer.
A photosensitive lithographic printing plate characterized in that it is added in an amount of 0.1 to 20% by weight.
JP15328382A 1982-09-02 1982-09-02 Photosensitive lithographic plate Granted JPS5942539A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15328382A JPS5942539A (en) 1982-09-02 1982-09-02 Photosensitive lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15328382A JPS5942539A (en) 1982-09-02 1982-09-02 Photosensitive lithographic plate

Publications (2)

Publication Number Publication Date
JPS5942539A JPS5942539A (en) 1984-03-09
JPH0421855B2 true JPH0421855B2 (en) 1992-04-14

Family

ID=15559081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15328382A Granted JPS5942539A (en) 1982-09-02 1982-09-02 Photosensitive lithographic plate

Country Status (1)

Country Link
JP (1) JPS5942539A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0812420B2 (en) * 1988-09-27 1996-02-07 富士写真フむルム株匏䌚瀟 Photosensitive lithographic printing plate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945322A (en) * 1972-09-08 1974-04-30

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945322A (en) * 1972-09-08 1974-04-30

Also Published As

Publication number Publication date
JPS5942539A (en) 1984-03-09

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