JPH0421840B2 - - Google Patents
Info
- Publication number
- JPH0421840B2 JPH0421840B2 JP57065246A JP6524682A JPH0421840B2 JP H0421840 B2 JPH0421840 B2 JP H0421840B2 JP 57065246 A JP57065246 A JP 57065246A JP 6524682 A JP6524682 A JP 6524682A JP H0421840 B2 JPH0421840 B2 JP H0421840B2
- Authority
- JP
- Japan
- Prior art keywords
- diffraction
- crystal
- receiving surface
- spacing
- interplanar spacing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 claims description 159
- 230000008859 change Effects 0.000 claims description 24
- 230000005540 biological transmission Effects 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 15
- 230000000750 progressive effect Effects 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 230000008569 process Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 239000011135 tin Substances 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 229910052718 tin Inorganic materials 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052732 germanium Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 229910021532 Calcite Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US25597481A | 1981-04-20 | 1981-04-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57182152A JPS57182152A (en) | 1982-11-09 |
| JPH0421840B2 true JPH0421840B2 (it) | 1992-04-14 |
Family
ID=22970630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57065246A Granted JPS57182152A (en) | 1981-04-20 | 1982-04-19 | Diffraction device |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS57182152A (it) |
| CA (1) | CA1183285A (it) |
| DE (1) | DE3214611A1 (it) |
| FR (1) | FR2504308B1 (it) |
| IT (1) | IT1150848B (it) |
| NL (1) | NL8201621A (it) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4525853A (en) * | 1983-10-17 | 1985-06-25 | Energy Conversion Devices, Inc. | Point source X-ray focusing device |
| JPS60111125A (ja) * | 1983-11-21 | 1985-06-17 | Hitachi Ltd | モノクロメ−タ |
| US4699509A (en) * | 1984-04-21 | 1987-10-13 | Nippon Soken, Inc. | Device for measuring contamination of lubricant |
| JPH0515120Y2 (it) * | 1985-05-29 | 1993-04-21 | ||
| DE3820549A1 (de) * | 1988-06-16 | 1989-12-21 | Fraunhofer Ges Forschung | Verfahren und vorrichtung zur untersuchung von membranoberflaechen |
| JPH02179500A (ja) * | 1988-12-29 | 1990-07-12 | Shimadzu Corp | 軟ｘ線用フレネルゾーンプレート |
| JPH0782117B2 (ja) * | 1989-02-23 | 1995-09-06 | オリンパス光学工業株式会社 | 反射型結像光学系 |
| US5802137A (en) * | 1993-08-16 | 1998-09-01 | Commonwealth Scientific And Industrial Research | X-ray optics, especially for phase contrast imaging |
| JP4521573B2 (ja) * | 2007-01-10 | 2010-08-11 | 大学共同利用機関法人 高エネルギー加速器研究機構 | 中性子線の反射率曲線測定方法及び測定装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3777156A (en) * | 1972-02-14 | 1973-12-04 | Hewlett Packard Co | Bent diffraction crystal with geometrical aberration compensation |
| US4012843A (en) * | 1973-04-25 | 1977-03-22 | Hitachi, Ltd. | Concave diffraction grating and a manufacturing method thereof |
| US3980883A (en) * | 1973-05-15 | 1976-09-14 | National Research Development Corporation | X-ray diffraction gratings |
| JPS5256856Y2 (it) * | 1974-05-15 | 1977-12-22 | ||
| US3991309A (en) * | 1975-07-09 | 1976-11-09 | University Of Rochester | Methods and apparatus for the control and analysis of X-rays |
| US4132654A (en) * | 1976-07-02 | 1979-01-02 | The Machlett Laboratories, Inc. | X-ray focal spot test system |
| US4192994A (en) * | 1978-09-18 | 1980-03-11 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Diffractoid grating configuration for X-ray and ultraviolet focusing |
-
1982
- 1982-04-15 CA CA000401037A patent/CA1183285A/en not_active Expired
- 1982-04-19 IT IT20815/82A patent/IT1150848B/it active
- 1982-04-19 JP JP57065246A patent/JPS57182152A/ja active Granted
- 1982-04-19 FR FR8206676A patent/FR2504308B1/fr not_active Expired
- 1982-04-19 NL NL8201621A patent/NL8201621A/nl unknown
- 1982-04-20 DE DE19823214611 patent/DE3214611A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| NL8201621A (nl) | 1982-11-16 |
| DE3214611A1 (de) | 1982-11-04 |
| FR2504308B1 (fr) | 1988-09-02 |
| FR2504308A1 (fr) | 1982-10-22 |
| CA1183285A (en) | 1985-02-26 |
| JPS57182152A (en) | 1982-11-09 |
| IT8220815A0 (it) | 1982-04-19 |
| IT1150848B (it) | 1986-12-17 |
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