JPH04218039A - Silver halide photosensitive material - Google Patents
Silver halide photosensitive materialInfo
- Publication number
- JPH04218039A JPH04218039A JP9217491A JP9217491A JPH04218039A JP H04218039 A JPH04218039 A JP H04218039A JP 9217491 A JP9217491 A JP 9217491A JP 9217491 A JP9217491 A JP 9217491A JP H04218039 A JPH04218039 A JP H04218039A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- groups
- water
- photosensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 98
- 239000000463 material Substances 0.000 title claims abstract description 44
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 40
- 239000004332 silver Substances 0.000 title claims abstract description 40
- 150000001875 compounds Chemical class 0.000 claims abstract description 40
- 239000000839 emulsion Substances 0.000 claims abstract description 20
- 238000010521 absorption reaction Methods 0.000 claims abstract description 4
- 125000001424 substituent group Chemical group 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- 230000035945 sensitivity Effects 0.000 claims description 5
- 125000004434 sulfur atom Chemical group 0.000 claims description 5
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 3
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 3
- 239000010410 layer Substances 0.000 abstract description 26
- 230000002542 deteriorative effect Effects 0.000 abstract description 3
- 239000011247 coating layer Substances 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 52
- 239000000243 solution Substances 0.000 description 36
- 238000000034 method Methods 0.000 description 32
- 238000012545 processing Methods 0.000 description 29
- 238000005406 washing Methods 0.000 description 27
- 239000003795 chemical substances by application Substances 0.000 description 22
- 239000000203 mixture Substances 0.000 description 22
- 239000000126 substance Substances 0.000 description 19
- 238000011161 development Methods 0.000 description 18
- 108010010803 Gelatin Proteins 0.000 description 17
- 229920000159 gelatin Polymers 0.000 description 17
- 239000008273 gelatin Substances 0.000 description 17
- 235000019322 gelatine Nutrition 0.000 description 17
- 235000011852 gelatine desserts Nutrition 0.000 description 17
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 125000004432 carbon atom Chemical group C* 0.000 description 15
- 239000000975 dye Substances 0.000 description 15
- 125000000217 alkyl group Chemical group 0.000 description 14
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 13
- 239000004094 surface-active agent Substances 0.000 description 13
- 125000003118 aryl group Chemical group 0.000 description 12
- 239000007788 liquid Substances 0.000 description 12
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 12
- 125000003545 alkoxy group Chemical group 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- 230000000087 stabilizing effect Effects 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 125000000623 heterocyclic group Chemical group 0.000 description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 8
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 230000006641 stabilisation Effects 0.000 description 7
- 238000011105 stabilization Methods 0.000 description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 5
- 239000003242 anti bacterial agent Substances 0.000 description 5
- 239000012141 concentrate Substances 0.000 description 5
- 125000004093 cyano group Chemical group *C#N 0.000 description 5
- 238000009472 formulation Methods 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 125000002950 monocyclic group Chemical group 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 239000003381 stabilizer Substances 0.000 description 5
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 4
- 229910021607 Silver chloride Inorganic materials 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 4
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 238000010790 dilution Methods 0.000 description 4
- 239000012895 dilution Substances 0.000 description 4
- 229940015043 glyoxal Drugs 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical class N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 230000001235 sensitizing effect Effects 0.000 description 4
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- 235000010265 sodium sulphite Nutrition 0.000 description 4
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 3
- 125000004442 acylamino group Chemical group 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000002619 bicyclic group Chemical group 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000003755 preservative agent Substances 0.000 description 3
- 229930182490 saponin Natural products 0.000 description 3
- 235000017709 saponins Nutrition 0.000 description 3
- 150000007949 saponins Chemical class 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 3
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- GUUULVAMQJLDSY-UHFFFAOYSA-N 4,5-dihydro-1,2-thiazole Chemical class C1CC=NS1 GUUULVAMQJLDSY-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 2
- 235000011130 ammonium sulphate Nutrition 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- 150000001642 boronic acid derivatives Chemical class 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- DNSISZSEWVHGLH-UHFFFAOYSA-N butanamide Chemical compound CCCC(N)=O DNSISZSEWVHGLH-UHFFFAOYSA-N 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- HBNYJWAFDZLWRS-UHFFFAOYSA-N ethyl isothiocyanate Chemical compound CCN=C=S HBNYJWAFDZLWRS-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachlorophenol Chemical compound OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 125000004076 pyridyl group Chemical group 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 239000001509 sodium citrate Substances 0.000 description 2
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 2
- 235000011083 sodium citrates Nutrition 0.000 description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 125000005415 substituted alkoxy group Chemical group 0.000 description 2
- 125000000565 sulfonamide group Chemical group 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 239000012224 working solution Substances 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- OXZRQDIWHYFSGL-UHFFFAOYSA-N 1,2-dimethylpyrazolidin-3-one Chemical compound CN1CCC(=O)N1C OXZRQDIWHYFSGL-UHFFFAOYSA-N 0.000 description 1
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical group C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical group C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical compound SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- XIWRQEFBSZWJTH-UHFFFAOYSA-N 2,3-dibromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1Br XIWRQEFBSZWJTH-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NCDBYAPSWOPDRN-UHFFFAOYSA-N 2-[dichloro(fluoro)methyl]sulfanylisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(SC(Cl)(Cl)F)C(=O)C2=C1 NCDBYAPSWOPDRN-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- NCKMMSIFQUPKCK-UHFFFAOYSA-N 2-benzyl-4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1CC1=CC=CC=C1 NCKMMSIFQUPKCK-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- AJKLCDRWGVLVSH-UHFFFAOYSA-N 4,4-bis(hydroxymethyl)-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(CO)(CO)CN1C1=CC=CC=C1 AJKLCDRWGVLVSH-UHFFFAOYSA-N 0.000 description 1
- SOVXTYUYJRFSOG-UHFFFAOYSA-N 4-(2-hydroxyethylamino)phenol Chemical compound OCCNC1=CC=C(O)C=C1 SOVXTYUYJRFSOG-UHFFFAOYSA-N 0.000 description 1
- SRYYOKKLTBRLHT-UHFFFAOYSA-N 4-(benzylamino)phenol Chemical compound C1=CC(O)=CC=C1NCC1=CC=CC=C1 SRYYOKKLTBRLHT-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- HDGMAACKJSBLMW-UHFFFAOYSA-N 4-amino-2-methylphenol Chemical compound CC1=CC(N)=CC=C1O HDGMAACKJSBLMW-UHFFFAOYSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- PCNFLKVWBDNNOW-UHFFFAOYSA-N 4-hydrazinylbenzoic acid Chemical compound NNC1=CC=C(C(O)=O)C=C1 PCNFLKVWBDNNOW-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- JXRGUPLJCCDGKG-UHFFFAOYSA-N 4-nitrobenzenesulfonyl chloride Chemical compound [O-][N+](=O)C1=CC=C(S(Cl)(=O)=O)C=C1 JXRGUPLJCCDGKG-UHFFFAOYSA-N 0.000 description 1
- KMVPXBDOWDXXEN-UHFFFAOYSA-N 4-nitrophenylhydrazine Chemical compound NNC1=CC=C([N+]([O-])=O)C=C1 KMVPXBDOWDXXEN-UHFFFAOYSA-N 0.000 description 1
- LQGKDMHENBFVRC-UHFFFAOYSA-N 5-aminopentan-1-ol Chemical compound NCCCCCO LQGKDMHENBFVRC-UHFFFAOYSA-N 0.000 description 1
- BOPVGQUDDIEQAO-UHFFFAOYSA-N 7-methyl-1h-[1,2,4]triazolo[1,5-a]pyrimidin-5-one Chemical compound CC1=CC(=O)N=C2N=CNN12 BOPVGQUDDIEQAO-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- MDNWOSOZYLHTCG-UHFFFAOYSA-N Dichlorophen Chemical compound OC1=CC=C(Cl)C=C1CC1=CC(Cl)=CC=C1O MDNWOSOZYLHTCG-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- GDESWVWAZUMGLN-UHFFFAOYSA-N N(CCO)CCO.C(CCC)N Chemical compound N(CCO)CCO.C(CCC)N GDESWVWAZUMGLN-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- 238000001016 Ostwald ripening Methods 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 102100040160 Rabankyrin-5 Human genes 0.000 description 1
- 101710086049 Rabankyrin-5 Proteins 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- XEFQLINVKFYRCS-UHFFFAOYSA-N Triclosan Chemical compound OC1=CC(Cl)=CC=C1OC1=CC=C(Cl)C=C1Cl XEFQLINVKFYRCS-UHFFFAOYSA-N 0.000 description 1
- MVLAOHLVHJYFIF-UHFFFAOYSA-N [4-[formamido-(4-methylphenyl)sulfonylamino]phenyl] acetate Chemical compound C1=CC(OC(=O)C)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 MVLAOHLVHJYFIF-UHFFFAOYSA-N 0.000 description 1
- XEIPQVVAVOUIOP-UHFFFAOYSA-N [Au]=S Chemical compound [Au]=S XEIPQVVAVOUIOP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000005035 acylthio group Chemical group 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- DMSMPAJRVJJAGA-UHFFFAOYSA-N benzo[d]isothiazol-3-one Chemical compound C1=CC=C2C(=O)NSC2=C1 DMSMPAJRVJJAGA-UHFFFAOYSA-N 0.000 description 1
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical group C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 1
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical group C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 1
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical group C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 1
- JBIROUFYLSSYDX-UHFFFAOYSA-M benzododecinium chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 JBIROUFYLSSYDX-UHFFFAOYSA-M 0.000 description 1
- 239000003139 biocide Substances 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- IYCOKCJDXXJIIM-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1.CCCCOC(=O)C=C IYCOKCJDXXJIIM-UHFFFAOYSA-N 0.000 description 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- VXIVSQZSERGHQP-UHFFFAOYSA-N chloroacetamide Chemical compound NC(=O)CCl VXIVSQZSERGHQP-UHFFFAOYSA-N 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 229960003887 dichlorophen Drugs 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- YVRWSHBSELXXRQ-UHFFFAOYSA-N ethyl n-anilino-n-(4-methylphenyl)sulfonylcarbamate Chemical compound C=1C=C(C)C=CC=1S(=O)(=O)N(C(=O)OCC)NC1=CC=CC=C1 YVRWSHBSELXXRQ-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000012010 growth Effects 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 229940071264 lithium citrate Drugs 0.000 description 1
- WJSIUCDMWSDDCE-UHFFFAOYSA-K lithium citrate (anhydrous) Chemical compound [Li+].[Li+].[Li+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WJSIUCDMWSDDCE-UHFFFAOYSA-K 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 230000002906 microbiologic effect Effects 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- QICZWSAAJCZAJA-UHFFFAOYSA-N n-(4-dodecylanilino)formamide Chemical compound CCCCCCCCCCCCC1=CC=C(NNC=O)C=C1 QICZWSAAJCZAJA-UHFFFAOYSA-N 0.000 description 1
- LLGRMPUCXVCEMW-UHFFFAOYSA-N n-(4-ethylanilino)formamide Chemical compound CCC1=CC=C(NNC=O)C=C1 LLGRMPUCXVCEMW-UHFFFAOYSA-N 0.000 description 1
- SKKBQXQQMZZDBZ-UHFFFAOYSA-N n-(4-hexoxy-n-(4-methylphenyl)sulfonylanilino)formamide Chemical compound C1=CC(OCCCCCC)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 SKKBQXQQMZZDBZ-UHFFFAOYSA-N 0.000 description 1
- UBAAGBJKCKRZFY-UHFFFAOYSA-N n-(4-hydroxy-n-(4-methylphenyl)sulfonylanilino)formamide Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N(NC=O)C1=CC=C(O)C=C1 UBAAGBJKCKRZFY-UHFFFAOYSA-N 0.000 description 1
- DDPJROKUKMXGPW-UHFFFAOYSA-N n-(4-methylanilino)formamide Chemical compound CC1=CC=C(NNC=O)C=C1 DDPJROKUKMXGPW-UHFFFAOYSA-N 0.000 description 1
- RIMXIAKFSZVMOD-UHFFFAOYSA-N n-(4-methylphenyl)sulfonyl-n'-phenylacetohydrazide Chemical compound C=1C=C(C)C=CC=1S(=O)(=O)N(C(=O)C)NC1=CC=CC=C1 RIMXIAKFSZVMOD-UHFFFAOYSA-N 0.000 description 1
- YALFWDFYLAHMCK-UHFFFAOYSA-N n-[4-(2-formylhydrazinyl)-3-methylphenyl]acetamide Chemical compound CC(=O)NC1=CC=C(NNC=O)C(C)=C1 YALFWDFYLAHMCK-UHFFFAOYSA-N 0.000 description 1
- ILFKOROXPGVKCP-UHFFFAOYSA-N n-[4-(diethylamino)anilino]formamide Chemical compound CCN(CC)C1=CC=C(NNC=O)C=C1 ILFKOROXPGVKCP-UHFFFAOYSA-N 0.000 description 1
- JIDHTEGXKCPFRM-UHFFFAOYSA-N n-[4-(octylamino)anilino]formamide Chemical compound CCCCCCCCNC1=CC=C(NNC=O)C=C1 JIDHTEGXKCPFRM-UHFFFAOYSA-N 0.000 description 1
- ZKMXAPDXIAMBNJ-UHFFFAOYSA-N n-[4-[[methyl(phenyl)carbamothioyl]amino]-n-(4-methylphenyl)sulfonylanilino]formamide Chemical compound C=1C=CC=CC=1N(C)C(=S)NC(C=C1)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 ZKMXAPDXIAMBNJ-UHFFFAOYSA-N 0.000 description 1
- ALDLYNPBJNWNPX-UHFFFAOYSA-N n-[n-(4-methylphenyl)sulfonyl-4-(oxan-2-yloxy)anilino]formamide Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N(NC=O)C(C=C1)=CC=C1OC1OCCCC1 ALDLYNPBJNWNPX-UHFFFAOYSA-N 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- KSMRQHOUTCWXMT-UHFFFAOYSA-N o-ethyl n-[4-[formamido-(4-methylphenyl)sulfonylamino]phenyl]carbamothioate Chemical compound C1=CC(NC(=S)OCC)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 KSMRQHOUTCWXMT-UHFFFAOYSA-N 0.000 description 1
- MEWFMWDYZGDIPI-UHFFFAOYSA-N o-phenyl n-[4-[formamido-(4-methylphenyl)sulfonylamino]phenyl]carbamothioate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N(NC=O)C(C=C1)=CC=C1NC(=S)OC1=CC=CC=C1 MEWFMWDYZGDIPI-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 239000006179 pH buffering agent Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- KYKNRZGSIGMXFH-ZVGUSBNCSA-M potassium bitartrate Chemical compound [K+].OC(=O)[C@H](O)[C@@H](O)C([O-])=O KYKNRZGSIGMXFH-ZVGUSBNCSA-M 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
- 235000011082 potassium citrates Nutrition 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- 239000001472 potassium tartrate Substances 0.000 description 1
- 229940111695 potassium tartrate Drugs 0.000 description 1
- 235000011005 potassium tartrates Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000001422 pyrrolinyl group Chemical group 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229960001790 sodium citrate Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- UOULCEYHQNCFFH-UHFFFAOYSA-M sodium;hydroxymethanesulfonate Chemical compound [Na+].OCS([O-])(=O)=O UOULCEYHQNCFFH-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229960001367 tartaric acid Drugs 0.000 description 1
- XGMYMWYPSYIPQB-UHFFFAOYSA-J tetrasodium;2-(1,2-dicarboxylatoethoxy)butanedioate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CC(C([O-])=O)OC(C([O-])=O)CC([O-])=O XGMYMWYPSYIPQB-UHFFFAOYSA-J 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 125000002769 thiazolinyl group Chemical group 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 125000001391 thioamide group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- TYLYVJBCMQFRCB-UHFFFAOYSA-K trichlororhodium;trihydrate Chemical compound O.O.O.[Cl-].[Cl-].[Cl-].[Rh+3] TYLYVJBCMQFRCB-UHFFFAOYSA-K 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は印刷製版用感光材料に関
し、明朝ゴシック再現性に優れ、目伸ばし性の良好な感
光材料に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material for printing plate making, and more particularly to a photosensitive material having excellent Mincho Gothic reproducibility and good eye-stretching properties.
【0002】0002
【発明の背景】ハロゲン化銀写真感光材料を用いる写真
用製版過程には連続階調の原稿を網点画像に変換する工
程、即ち連続階調の濃度変化を該濃度に比例する面積を
有する網点の集合体に変換する工程及び該工程で得られ
た網点画像をより鮮鋭度の良好な網点画像に変換する工
程すなわち返し工程などが含まれている。BACKGROUND OF THE INVENTION The photoengraving process using silver halide photographic light-sensitive materials involves the process of converting a continuous tone original into a halftone image. The method includes a step of converting into a set of dots and a step of converting the halftone dot image obtained in this step into a halftone image with better sharpness, that is, a turning step.
【0003】これらの工程に使用される感光材料は良好
な網点品質を得る必要から高コントラストを有すること
が不可欠とされている。It is essential that the photosensitive materials used in these processes have high contrast in order to obtain good halftone dot quality.
【0004】このような特性を得る方法として従来から
比較的微粒子で粒子径分布が狭く、かつ塩化銀含有率の
高い塩臭化銀乳剤よりなる感光材料を亜硫酸イオン濃度
が非常に小さいアルカリハイドロキノン現像液で処理す
る方法、いわゆるリス現像法が知られている。Conventionally, as a method for obtaining such characteristics, a light-sensitive material made of a silver chlorobromide emulsion with relatively fine grains, a narrow particle size distribution, and a high silver chloride content is subjected to alkaline hydroquinone development with a very low sulfite ion concentration. A method of processing with a liquid, the so-called lith development method, is known.
【0005】しかし、この方法を用いると現像液中の亜
硫酸イオン濃度が小さいため保恒性が極めて悪く、かつ
ハイドロキノン単体主薬を用いるために現像速度が遅く
迅速処理ができないという欠点を有していた。[0005] However, when this method is used, the storage stability is extremely poor due to the low concentration of sulfite ions in the developer, and the development speed is slow due to the use of hydroquinone as a single active ingredient, making rapid processing impossible. .
【0006】従って、保恒性が良好で迅速処理可能な超
加成性現像主薬を含有し、比較的高濃度の亜硫酸塩を含
有するいわゆるPQ型或いはMQ型の現像液による処理
によって高いコントラストが得られる新規な感光材料の
開発が望まれ、この新規な感光材料に関するものとして
特公昭59−17825号、同59−17818号、同
59−17819号、同59−17820号、同59−
17821号、同59−17826号、同59−178
22号の各広報にはテトラゾリウム化合物を含有するハ
ロゲン化銀写真感光材料が開示されている。Therefore, high contrast can be achieved by processing with a so-called PQ type or MQ type developer containing a relatively high concentration of sulfite, which contains a super-additive developing agent that has good storage stability and can be processed rapidly. The development of new photosensitive materials is desired, and Japanese Patent Publications No. 59-17825, No. 59-17818, No. 59-17819, No. 59-17820, No. 59-
No. 17821, No. 59-17826, No. 59-178
Each publication of No. 22 discloses a silver halide photographic material containing a tetrazolium compound.
【0007】これらのテトラゾリウム化合物を含有する
感光材料を超加成性現像液で処理し、高いコントラスト
を有する銀画像を得る方法は、従来のリス現像の技術に
対し極めて画期的技術ということができる。一方、別の
原理に基ずく、迅速に、かつ高コントラストの画像を得
る方法として、例えば米国特許2419975号、同4
224401号、特開昭51−16623号、同51−
20921号等にみられるように、ヒドラジン化合物を
含有するハロゲン化銀写真感光材料が開示されている。[0007] The method of processing photosensitive materials containing these tetrazolium compounds with a superadditive developer to obtain a silver image with high contrast is an extremely revolutionary technology compared to the conventional lithographic development technology. can. On the other hand, as a method for quickly obtaining high contrast images based on another principle, for example, US Pat.
No. 224401, JP-A-51-16623, JP-A No. 51-
As seen in No. 20921 and the like, silver halide photographic materials containing a hydrazine compound are disclosed.
【0008】しかし、このような硬調な感光材料は、反
面線画撮影を行った際、文字の再現性が劣るという欠点
を有している。即ち、例えば7級の明朝体とゴシック体
が混在する原稿を写真製版用カメラで露光する際に明朝
体の細線が潰れないように露光をひかえると、黒く潰れ
るはずの地の濃度が低下してピンホールが増加したり、
ゴシック体の線幅が所望の太さまで太らずに細く仕上が
る。反対にゴシック体の線幅に合わせるべく露光量を調
節すると、明朝体の細線は潰れてしまう。このため印刷
製版業界では明朝体とゴシック体をわけて撮影し、後工
程で合成するという方法が用いられているが、この方法
は作業量や材料が2倍必要となる。However, such high-contrast photosensitive materials have the disadvantage that the reproducibility of characters is poor when line drawings are photographed. In other words, for example, when exposing a manuscript containing a mix of Grade 7 Mincho and Gothic fonts with a photoengraving camera, if the exposure is held back so that the fine lines of the Mincho fonts are not crushed, the density of the ground that should be blackened will decrease. and pinholes increase,
The line width of Gothic fonts can be made thin without increasing to the desired thickness. On the other hand, if you adjust the exposure to match the line width of a Gothic font, the fine lines of a Mincho font will be crushed. For this reason, in the printing and plate making industry, a method is used in which the Mincho and Gothic fonts are photographed separately and then combined in a later process, but this method requires twice the amount of work and materials.
【0009】また目伸ばしと呼ばれている網点に変換さ
れている原稿の拡大、縮小の作業においても、硬調な感
光材料を用いると網点のレンジが詰まるという問題があ
る。そのため目伸ばし作業を行う際には、通常リーフイ
ルターとよばれているフイルターを用いて露光作業を行
っている。しかし、露光の度に毎回フイルターを着脱す
ることや、フイルターの劣化度により、仕上がり品質が
変動し、問題になっている。[0009] Also, in the process of enlarging or reducing a document that has been converted into halftone dots, which is called stretching, there is a problem in that the range of halftone dots is clogged when a high-contrast photosensitive material is used. Therefore, when performing eye stretching work, a filter called a leaf filter is usually used to perform the exposure work. However, the quality of the finish fluctuates due to the need to attach and detach the filter each time the exposure is performed and the degree of deterioration of the filter, which has become a problem.
【0010】0010
【発明の目的】上記のような問題に対し、本発明の目的
は、線画のキレを劣化させずに、明朝体及びゴシック体
の再現性を改良するとともに、フイルターを用いずに同
等の目伸ばしを得ることができる印刷製版用ハロゲン化
銀写真感光材料を提供することである。OBJECTS OF THE INVENTION In order to solve the above-mentioned problems, an object of the present invention is to improve the reproducibility of Mincho typefaces and Gothic typefaces without deteriorating the sharpness of line drawings, and to improve the reproducibility of Mincho typefaces and Gothic typefaces without using a filter. An object of the present invention is to provide a silver halide photographic light-sensitive material for printing plate making which can be stretched.
【0011】[0011]
【発明の構成】本発明の上記目的は、支持体の同じ側に
、少なくとも2層以上の塗設層を有するハロゲン化銀写
真感光材料において、該乳剤層が400〜500nmの
領域に分光増感されており、かつ350〜500nmに
吸収ピークを有する染料を感光層と同じ側で支持体から
遠い非感光層に添加し、かつ下記一般式〔I〕または〔
II〕または〔III〕の化合物を感光性層に含有する
ことを特徴とするハロゲン化銀写真感光材料により達成
される。[Structure of the Invention] The above object of the present invention is to provide a silver halide photographic material having at least two coating layers on the same side of a support, in which the emulsion layer is spectral sensitized in the 400 to 500 nm region. and a dye having an absorption peak in the range of 350 to 500 nm is added to the non-photosensitive layer on the same side as the photosensitive layer and far from the support, and the dye has the following general formula [I] or [
This is achieved by a silver halide photographic material characterized by containing the compound of [II] or [III] in the photosensitive layer.
【0012】0012
【化2】[Case 2]
【0013】〔式中、R31は1価の有機残基を表し、
R32は水素原子または1価の有機残基を表し、Q1及
びQ2は水素原子、アルキルスルホニル基(置換基を有
するものも含む)、アリールスルホニル基(置換基を有
するものも含む)を表し、X1は酸素原子またはイオウ
原子を表す。X1が酸素原子であり、かつR32が水素
原子である化合物が更に好ましい。〕尚、本発明におい
ては染料を、感度がLogEで−0.05〜−0.3低
下する量を含有させることが望ましい。[In the formula, R31 represents a monovalent organic residue,
R32 represents a hydrogen atom or a monovalent organic residue, Q1 and Q2 represent a hydrogen atom, an alkylsulfonyl group (including those having a substituent), an arylsulfonyl group (including those having a substituent), and X1 represents an oxygen atom or a sulfur atom. More preferred are compounds in which X1 is an oxygen atom and R32 is a hydrogen atom. In the present invention, it is desirable to contain the dye in an amount that reduces the sensitivity by -0.05 to -0.3 in LogE.
【0014】以下、本発明の詳細について具体的に説明
する。 前記一般式〔I〕において、R1、R2ない
しR3が表す置換基の好ましい例としてアルキル基(例
えばメチル、エチル、シクロプロピル、プロピル、イソ
プロピル、シクロブチル、ブチル、イソブチル、ペンチ
ル、シクロヘキシル等)、アミノ基、アシルアミノ基(
例えばアセチルアミノ)、ヒドロキシル基、アルコキシ
基(例えぱメトキシ、エトキシ、プロポキシ、プトキシ
、ペントキシ等)、アシルオキシ基(例えばアセチルオ
キシ)、ハロゲン原子(例えばフッ素、塩素、臭素等)
、カルバモイル基、アシルチオ基(例えばアセチルチオ
)、アルコキシカルボニル基(例えばエトキシカルボニ
ル)、カルボキシル基、アシル基(例えばアセチル)、
シアノ基、ニトロ基、メルカプト基、スルホオキシ基、
アミノスルホキシ基のような基が挙げられる。The details of the present invention will be specifically explained below. In the general formula [I], preferred examples of the substituents represented by R1, R2 to R3 include alkyl groups (e.g. methyl, ethyl, cyclopropyl, propyl, isopropyl, cyclobutyl, butyl, isobutyl, pentyl, cyclohexyl, etc.), amino groups , acylamino group (
(e.g. acetylamino), hydroxyl group, alkoxy group (e.g. methoxy, ethoxy, propoxy, putoxy, pentoxy, etc.), acyloxy group (e.g. acetyloxy), halogen atom (e.g. fluorine, chlorine, bromine, etc.)
, carbamoyl group, acylthio group (e.g. acetylthio), alkoxycarbonyl group (e.g. ethoxycarbonyl), carboxyl group, acyl group (e.g. acetyl),
Cyano group, nitro group, mercapto group, sulfooxy group,
Examples include groups such as aminosulfoxy groups.
【0015】前記X−で示されるアニオンとしては、例
えば塩化物イオン、臭化物イオン、ヨウ化物イオン等の
ハロゲンイオン、硝酸、硫酸、過塩素酸等の無機酸の酸
根、スルホン酸、カルボン酸等の有機酸の酸根、アニオ
ン系の活性剤、具体的にはp−トルエンスルホン酸アニ
オン等の低級アルキルベンゼンスルホン酸アニオン、p
−ドデシルベンゼンスルホン酸アニオン等の高級アルキ
ルベンゼンスルホン酸アニオン、ラウリルスルフェート
アニオン等の高級アルキル硫酸エステルアニオン、テト
ラフェニルボロン等の硼酸系アニオン、ジ−2−エチル
ヘキシルスルホサクシネートアニオン等のジアルキルス
ルホサクシネートアニオン、セチルポリエテノキシサル
フェートアニオン等のポリエーテルアルコール硫酸エス
テルアニオン、ステアリン酸アニオン等の高級脂肪族ア
ニオン、ポリアクリル酸アニオン等のポリマーに酸根の
ついたもの等を挙げることができる。[0015] Examples of the anion represented by Acid radicals of organic acids, anionic activators, specifically lower alkylbenzenesulfonate anions such as p-toluenesulfonate anions, p
-Higher alkylbenzenesulfonate anions such as dodecylbenzenesulfonate anions, higher alkylsulfate ester anions such as lauryl sulfate anions, borate anions such as tetraphenylboron, dialkyl sulfosuccinates such as di-2-ethylhexylsulfosuccinate anions Anions, polyether alcohol sulfate ester anions such as cetyl polyethenoxysulfate anions, higher aliphatic anions such as stearate anions, and polymers with acid groups such as polyacrylate anions can be mentioned.
【0016】以下、本発明に用いられる一般式〔I〕で
表される化合物の具体例を挙げるが、本発明の化合物は
これに限定されるものではない。Specific examples of the compounds represented by the general formula [I] used in the present invention are listed below, but the compounds of the present invention are not limited thereto.
【0017】[0017]
【化3】[Chemical formula 3]
【0018】[0018]
【化4】[C4]
【0019】[0019]
【化5】[C5]
【0020】[0020]
【化6】[C6]
【0021】[0021]
【化7】[C7]
【0022】本発明に用いられるテトラゾリウム化合物
は、例えばケミカル・レビュー(Chemical R
eviews)第55巻、第335頁〜483頁に記載
の方法に従って容易に合成することができる。[0022] The tetrazolium compound used in the present invention is described in, for example, Chemical Review (Chemical R
It can be easily synthesized according to the method described in Vol. 55, pp. 335-483.
【0023】本発明の一般式〔I〕で表されるテトラゾ
リウム化合物は、本発明のハロゲン化銀写真感光材料中
に含有されるハロゲン化銀1モル当り約1mg以上10
gまで、好ましくは約10mg以上約2gまでの範囲で
用いられるのが好ましい。The tetrazolium compound represented by the general formula [I] of the present invention is contained in an amount of about 1 mg or more per mole of silver halide contained in the silver halide photographic light-sensitive material of the present invention.
It is preferred to use up to about 2 g, preferably from about 10 mg to about 2 g.
【0024】次に一般式〔II〕について説明するNext, general formula [II] will be explained.
【0
025】0
025]
【化8】[Chemical formula 8]
【0026】R21で表わされる脂肪族基は、好ましく
は、炭素数6以上のものであって、特に炭素数8〜50
の直鎖、分岐または環状のアルキル基である。ここで分
岐アルキル基はその中に1つまたはそれ以上のヘラロ原
子を含んだ飽和のヘテロ環を形成するように環化されて
もよい。またこのアルキル基はアリール基、アルコキシ
基、スルホキシ基、等の置換基を有してもよい。The aliphatic group represented by R21 preferably has 6 or more carbon atoms, particularly 8 to 50 carbon atoms.
is a straight chain, branched or cyclic alkyl group. The branched alkyl group herein may be cyclized to form a saturated heterocycle containing one or more helaro atoms therein. Further, this alkyl group may have a substituent such as an aryl group, an alkoxy group, or a sulfoxy group.
【0027】R21で表される芳香族基は単環または2
環アリール基または不飽和ヘテロ環基である。ここで不
飽和ヘテロ環基は単環または2環のアリール基と縮合し
てヘテロアリール基を形成してもよい。The aromatic group represented by R21 is monocyclic or bicyclic.
It is a ring aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with a monocyclic or bicyclic aryl group to form a heteroaryl group.
【0028】例えばベンゼン環、ナフタレン環、ピリジ
ン環、ピリミジン環、イミダゾール環、ピラゾール環、
キノリン環、イソキノリン環、ベンズイミダゾール環、
チアゾール環、ベンゾチアゾール環等があるがなかでも
ベンゼン環を含むものが好ましい。For example, benzene ring, naphthalene ring, pyridine ring, pyrimidine ring, imidazole ring, pyrazole ring,
Quinoline ring, isoquinoline ring, benzimidazole ring,
Among them, there are thiazole rings, benzothiazole rings, etc., and among them, those containing a benzene ring are preferred.
【0029】R21として特に好ましいものはアリール
基である。Particularly preferred as R21 is an aryl group.
【0030】R21のアリール基または不飽和ヘテロ環
基は置換されていてもよく、代表的な置換基としては直
鎖、分岐または環状のアルキル基(好ましくはアルキル
部分の炭素数が1〜20の単環または2環のもの)、ア
ルコキシ基(好ましくは炭素数1〜20のもの)、置換
アミノ基(好ましくは炭素数1〜20のアルキル基で置
換されたアミノ基)、アシルアミノ基(好ましくは炭素
数2〜30を持つもの)、スルホンアミド基(好ましく
は炭素数1〜30を持つもの)、ウレイド基(好ましく
は炭素数1〜30を持つもの)などがある。The aryl group or unsaturated heterocyclic group of R21 may be substituted, and typical substituents include a linear, branched or cyclic alkyl group (preferably an alkyl group having 1 to 20 carbon atoms). monocyclic or bicyclic), alkoxy groups (preferably those having 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon atoms), acylamino groups (preferably (having 2 to 30 carbon atoms), a sulfonamide group (preferably having 1 to 30 carbon atoms), and a ureido group (preferably having 1 to 30 carbon atoms).
【0031】一般式〔II〕のR22で表される基のう
ち置換されてもよいアルコキシ基としては炭素数1〜2
0のものであって、ハロゲン原子、アリール基などで置
換されていてもよい。Among the groups represented by R22 in general formula [II], the optionally substituted alkoxy group has 1 to 2 carbon atoms.
0, and may be substituted with a halogen atom, an aryl group, etc.
【0032】一般式〔II〕においてR22で表される
基のうち置換されてもよいアリールオキシ基またはヘテ
ロ環オキシ基としては単環のものが好ましく、また置換
基としてはハロゲン原子アルキル基、アルコキシ基、シ
アノ基などがある。Among the groups represented by R22 in the general formula [II], the optionally substituted aryloxy group or heterocyclic oxy group is preferably a monocyclic group, and the substituent is a halogen atom alkyl group, an alkoxy group, cyano group, etc.
【0033】R22で表される基のうちで好ましいもの
は、置換されてもよいアルコキシ基またはアミノ基であ
る。Among the groups represented by R22, preferred are an optionally substituted alkoxy group or an amino group.
【0034】アミノ基の場合には−N(A1)(A2)
基でA1およびA2は置換されてもよいアルキル基、ア
ルコシ基または−O−、−S−、−N−基結合を含む環
状構造であってもよい。但しR22がヒドラジノ基であ
ることはない。In the case of an amino group, -N(A1)(A2)
In the group, A1 and A2 may be an optionally substituted alkyl group, an alkoxy group, or a cyclic structure containing -O-, -S-, -N- group bonds. However, R22 is never a hydrazino group.
【0035】一般式〔II〕のR21またはR22はそ
の中にカプラー等の不動性写真用添加剤において常用さ
れているバラスト基が組み込まれているものでもよい。
バラスト基は8以上の炭素数を有する写真性に対して比
較的不活性な基であり、例えばアルキル基、アルコキシ
基、フェニル基、アルキルフェニル基、フニノキシ基、
アルキルフェノキシ基などの中から選ぶことができる。R21 or R22 in the general formula [II] may have a ballast group commonly used in immobile photographic additives such as couplers incorporated therein. The ballast group is a group having a carbon number of 8 or more and is relatively inert to photography, such as an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a fninoxy group,
It can be selected from alkylphenoxy groups, etc.
【0036】一般式〔II〕のR21またはR22はそ
の中にハロゲン化銀粒子表面に対する吸着を強める基が
組み込まれているものでもよい。かかる吸着基としては
、チオ尿素基、複素環チオアミド基、メルカプト複素環
基、トリアゾール基などの米国特許第4,355,10
5号に記載された基があげられる。一般式〔II〕で表
される化合物のうち下記一般式〔II−a〕で表される
化合物は特に好ましい。R21 or R22 in the general formula [II] may have a group incorporated therein to enhance adsorption to the silver halide grain surface. Such adsorption groups include thiourea groups, heterocyclic thioamide groups, mercapto heterocyclic groups, triazole groups, etc.
Examples include the groups described in No. 5. Among the compounds represented by the general formula [II], the compounds represented by the following general formula [II-a] are particularly preferred.
【0037】[0037]
【化9】[Chemical formula 9]
【0038】上記一般式〔II−a〕中、R23および
R24は水素原子、置換されてもよいアルキル基(例え
ばメチル基、エチル基、ブチル基、ドデシル基、2−ヒ
ドロキシプロピル基、2−シアノエチル基、2−クロロ
エチル基)、置換されてもよいフェニル基、ナフチル基
、シクロヘキシル基、ピリジル基、ピロリジル基(例え
ばフェニル基、p−メチルフェニル基、ナフチル基、α
−ヒドロキシナフチル基、シクロヘキシル基、p−メチ
ルシクロヘキシル基、ピリジル基、4−プロピル−2−
ピリジル基、ピロリジル基、4−メチル−2−ピロリジ
ル基)を表し、R25は水素原子または置換されてもよ
いベンジル基、アルコキシ基及びアルキル基(例えばベ
ンジル基、p−メチルベンジル基、メトキシ基、エトキ
シ基、エチル基、ブチル基)を表し、R26及びR27
は2価の芳香族基(例えばフェニレン基またはナフチレ
ン基) を表し、Yはイオウ原子または酸素原子を表し
、Lは2価の結合基(例えば−SO2CH2CH2NH
−SO2NH、−OCH2SO2NH、−O−、−CH
=N−)を表し、R28は−NR′R″または−OR2
9を表し、R′,R″及びR29は水素原子、置換され
てもよいアルキル基(例えばメチル基、エチル基、ドデ
シル基)、フェニル基(例えばフェニル基、p−メチル
フェニル基、p−メトキシフェニル基)、ナフチル基(
例えばα−ナフチル基、β−ナフチル基)又は、複素環
基(例えば、ピリジン、チオフエン、フランの様な不飽
和複素環基、または、テトラヒドロフラン、スルホラン
の様な飽和複素環基)を表し、R′とR″は窒素原子と
共に環(例えば、ピペリジン、ピペラジン、モルホリン
等)を形成しても良い。In the above general formula [II-a], R23 and R24 are hydrogen atoms, optionally substituted alkyl groups (for example, methyl group, ethyl group, butyl group, dodecyl group, 2-hydroxypropyl group, 2-cyanoethyl group). group, 2-chloroethyl group), optionally substituted phenyl group, naphthyl group, cyclohexyl group, pyridyl group, pyrrolidyl group (e.g. phenyl group, p-methylphenyl group, naphthyl group, α
-Hydroxynaphthyl group, cyclohexyl group, p-methylcyclohexyl group, pyridyl group, 4-propyl-2-
pyridyl group, pyrrolidyl group, 4-methyl-2-pyrrolidyl group), and R25 represents a hydrogen atom or an optionally substituted benzyl group, alkoxy group, and alkyl group (e.g. benzyl group, p-methylbenzyl group, methoxy group, ethoxy group, ethyl group, butyl group), R26 and R27
represents a divalent aromatic group (e.g. phenylene group or naphthylene group), Y represents a sulfur atom or oxygen atom, L represents a divalent bonding group (e.g. -SO2CH2CH2NH
-SO2NH, -OCH2SO2NH, -O-, -CH
=N-), and R28 is -NR'R'' or -OR2
9, and R', R'' and R29 are hydrogen atoms, optionally substituted alkyl groups (e.g. methyl group, ethyl group, dodecyl group), phenyl groups (e.g. phenyl group, p-methylphenyl group, p-methoxy phenyl group), naphthyl group (
R ' and R'' may form a ring (eg, piperidine, piperazine, morpholine, etc.) together with the nitrogen atom.
【0039】m,nは0または1を表す。R28がOR
29を表すときYはイオウ原子を表すのが好ましい。[0039] m and n represent 0 or 1. R28 is OR
When representing 29, Y preferably represents a sulfur atom.
【0040】上記一般式〔II〕及び〔II−a〕で表
される代表的な化合物を以下に示す。Representative compounds represented by the above general formulas [II] and [II-a] are shown below.
【0041】[0041]
【化10】[Chemical formula 10]
【0042】[0042]
【化11】[Chemical formula 11]
【0043】[0043]
【化12】[Chemical formula 12]
【0044】[0044]
【化13】[Chemical formula 13]
【0045】[0045]
【化14】[Chemical formula 14]
【0046】[0046]
【化15】[Chemical formula 15]
【0047】[0047]
【化16】[Chemical formula 16]
【0048】[0048]
【化17】[Chemical formula 17]
【0049】[0049]
【化18】[Chemical formula 18]
【0050】[0050]
【化19】[Chemical formula 19]
【0051】[0051]
【化20】[C20]
【0052】[0052]
【化21】[C21]
【0053】[0053]
【化22】[C22]
【0054】[0054]
【化23】[C23]
【0055】[0055]
【化24】[C24]
【0056】[0056]
【化25】[C25]
【0057】化合物4‐ニトロフェニルヒドラジン15
3gと500mlのジエチルオキザレートを混合し、1
時間還流する。反応を進めながらエタノールを除去して
いき、最後に冷却し結晶を析出させる。濾過し石油エー
テルで数回洗浄し、再結晶する。次に得られた結晶(A
)のうち50gを1000mlのメタノールで加温溶解
し、pd/C(パラジウム・炭素)触媒下に50Psi
のか加圧したH2雰囲気で還元し、化合物(B)を得る
。Compound 4-nitrophenylhydrazine 15
Mix 3g and 500ml of diethyl oxalate,
Reflux for an hour. Ethanol is removed as the reaction progresses, and finally it is cooled to precipitate crystals. Filter, wash several times with petroleum ether and recrystallize. Next, the obtained crystal (A
) was heated and dissolved in 1,000 ml of methanol, and heated at 50 Psi under a PD/C (palladium/carbon) catalyst.
Compound (B) is obtained by reduction in a pressurized H2 atmosphere.
【0058】この化合物(B)22gをアセトニトリル
200mlとピリジン16gの溶液に溶かし室温で化合
物(C)24gのアセトニトリル溶液を滴下した。不溶
物を濾別後、濾液を濃縮し再結晶精製して化合物(D)
31gを得た。22 g of this compound (B) was dissolved in a solution of 200 ml of acetonitrile and 16 g of pyridine, and a solution of 24 g of compound (C) in acetonitrile was added dropwise at room temperature. After filtering off insoluble materials, the filtrate is concentrated and recrystallized to obtain compound (D).
31 g was obtained.
【0059】化合物(D)30gを上記と同様に水添を
して化合物(E)20gを得た。30 g of compound (D) was hydrogenated in the same manner as above to obtain 20 g of compound (E).
【0060】化合物(E)10gをアセトニトリル10
0mlに溶解しエチルイソチオシアネート3.0gを加
え、1時間還流した。溶媒を留去後再結晶精製して化合
物(F)7.0gを得た。化合物(F)5.0gをメタ
ノール50mlに溶解してメチルアミン(40%水溶液
8ml)を加え攪拌した。メタノールを若干濃縮後、析
出した固体をとり出し再結晶精製して化合物II−45
を得た。10 g of compound (E) was mixed with 10 g of acetonitrile.
3.0 g of ethyl isothiocyanate was added to the solution and refluxed for 1 hour. After distilling off the solvent, the residue was purified by recrystallization to obtain 7.0 g of compound (F). 5.0 g of compound (F) was dissolved in 50 ml of methanol, and methylamine (8 ml of 40% aqueous solution) was added and stirred. After slightly concentrating methanol, the precipitated solid was taken out and purified by recrystallization to obtain compound II-45.
I got it.
【0061】[0061]
【化26】[C26]
【0062】[0062]
【化27】[C27]
【0063】化合物(B)22gをピリジン200ml
に溶解し攪拌する中へ、p‐ニトロベンゼンスルホニル
クロライド22gを加えた。反応混合物を水あけ、後析
出する固体をとり出し化合物(C)を得た。この化合物
(C)を合成スキームに従って化合物II−45と同様
の反応により化合物II−47を得た。[0063] 22 g of compound (B) was added to 200 ml of pyridine.
22 g of p-nitrobenzenesulfonyl chloride was added to the solution and stirred. The reaction mixture was poured with water, and the precipitated solid was taken out to obtain compound (C). This compound (C) was subjected to the same reaction as compound II-45 according to the synthesis scheme to obtain compound II-47.
【0064】次に一般式〔III〕について説明する。Next, general formula [III] will be explained.
【0065】[0065]
【化28】[C28]
【0066】式中、R31は1価の有機残基を表し、R
32は水素原子または1価の有機残基を表し、Q1及び
Q2は水素原子、アルキルスルホニル基 (置換基を有
するものも含む)、アリールスルホニル基 (置換基を
有するものも含む) を表し、X1は酸素原子またはイ
オウ原子を表す。一般式〔I〕で表される化合物のうち
、X1が酸素原子であり、かつR32が水素原子である
化合物が更に好ましい。In the formula, R31 represents a monovalent organic residue;
32 represents a hydrogen atom or a monovalent organic residue, Q1 and Q2 represent a hydrogen atom, an alkylsulfonyl group (including those having a substituent), an arylsulfonyl group (including those having a substituent), and X1 represents an oxygen atom or a sulfur atom. Among the compounds represented by the general formula [I], compounds in which X1 is an oxygen atom and R32 is a hydrogen atom are more preferred.
【0067】上記R31及びR32の1価の有機残基と
しては、芳香族残基、複素環残基及び脂肪族残基が包含
される。[0067] The monovalent organic residues for R31 and R32 include aromatic residues, heterocyclic residues and aliphatic residues.
【0068】芳香族残基としては、フェニル基、ナフチ
ル基及びこれらに置換基 (例えばアルキル基、アルコ
キシ基、アシルヒドラジノ基、ジアルキルアミノ基、ア
ルコキシカルボニル基、シアノ基、カルボキシ基、ニト
ロ基、アルキルチオ基、ヒドロキシ基、スルホニル基、
カルバモイル基、ハロゲン原子、アシルアミノ基、スル
ホンアミド基、チオウレア基など) のついたものを含
む。
置換基のついたものの具体例として、例えば、4−メチ
ルフェニル基、4−エチルフェニル基、4−オキシエチ
ルフェニル基、4−ドデシルフェニル基、4−カルボキ
シフェニル基、4−ジエチルアミノフェニル基、4−オ
クチルアミノフェニル基、4−ベンジルアミノフェニル
基、4−アセトアミド−2−メチルフェニル基、4−(
3−エチルチオウレイド)フェニル基、4−[2−(2
,4−ジ−tert−ブチルフェノキシ)ブチルアミド
]フェニル基、4−[2−(2,4−ジ−tert−ブ
チルフェノキシ)ブチルアミド]フェニル基などを挙げ
ることができる。Examples of aromatic residues include phenyl groups, naphthyl groups, and substituents thereof (for example, alkyl groups, alkoxy groups, acylhydrazino groups, dialkylamino groups, alkoxycarbonyl groups, cyano groups, carboxy groups, nitro groups, and alkylthio groups). , hydroxy group, sulfonyl group,
(carbamoyl group, halogen atom, acylamino group, sulfonamide group, thiourea group, etc.). Specific examples of those with substituents include 4-methylphenyl group, 4-ethylphenyl group, 4-oxyethylphenyl group, 4-dodecylphenyl group, 4-carboxyphenyl group, 4-diethylaminophenyl group, -octylaminophenyl group, 4-benzylaminophenyl group, 4-acetamido-2-methylphenyl group, 4-(
3-ethylthioureido) phenyl group, 4-[2-(2
, 4-di-tert-butylphenoxy)butyramide] phenyl group, 4-[2-(2,4-di-tert-butylphenoxy)butyramide] phenyl group, and the like.
【0069】複素環残基としては、酸素、窒素、硫黄、
またはセレン原子のうち少なくとも一つを有する五員も
しくは六員の単環または縮合環で、これらに置換基がつ
いてもよい。具体的には例えば、ピロリン環、ピリジン
環、キノリン環、インドール環、オキサゾール環、ベン
ゾオキサゾール環、ナフトオキサゾール環、イミダゾー
ル環、ベンゾイミダゾール環、チアゾリン環、チアゾー
ル環、ベンゾチアゾール環、ナフトチアゾール環、セレ
ナゾール環、ベンゾセレナゾール環、ナフトセレナゾー
ル環などの残基を挙げることが出来る。Heterocyclic residues include oxygen, nitrogen, sulfur,
Alternatively, it is a five- or six-membered monocyclic or condensed ring having at least one selenium atom, which may have a substituent. Specifically, for example, pyrroline ring, pyridine ring, quinoline ring, indole ring, oxazole ring, benzoxazole ring, naphthoxazole ring, imidazole ring, benzimidazole ring, thiazoline ring, thiazole ring, benzothiazole ring, naphthothiazole ring, Examples include residues such as a selenazole ring, a benzoselenazole ring, and a naphthoselenazole ring.
【0070】これらの複素環は、メチル基、エチル基等
炭素数1〜4のアルキル基、メトキシ基、エトキシ基等
炭素数1〜4のアルコキシ基、フェニル基等の炭素数6
〜18のアリール基や、クロル、ブロム等のハロゲン原
子、アルコキシカルボニル基、シアノ基、アミノ基等で
置換されていてもよい。These heterocycles include alkyl groups having 1 to 4 carbon atoms such as methyl group and ethyl group, alkoxy groups having 1 to 4 carbon atoms such as methoxy group and ethoxy group, and 6 carbon atoms such as phenyl group.
-18 aryl groups, halogen atoms such as chloro and bromine, alkoxycarbonyl groups, cyano groups, amino groups, etc. may be substituted.
【0071】脂肪族残基としては、直鎖及び分岐のアル
キル基、シクロアルキル基及びこれらに置換基のついた
もの、並びにアルケニル基及びアルキニル基を含む。[0071] Aliphatic residues include linear and branched alkyl groups, cycloalkyl groups, and those with substituents, as well as alkenyl groups and alkynyl groups.
【0072】直鎖及び分岐のアルキル基としては、例え
ば炭素数1〜18、好ましくは1〜8のアルキル基であ
って、具体的には例えばメチル基、エチル基、イソブチ
ル基、1−オクチル基等である。Examples of straight chain and branched alkyl groups include alkyl groups having 1 to 18 carbon atoms, preferably 1 to 8 carbon atoms, and specific examples include methyl group, ethyl group, isobutyl group, and 1-octyl group. etc.
【0073】シクロアルキル基としては、例えば炭素数
3〜10のもので、具体的には例えばシクロプロピル基
、シクロヘキシル基、アダマンチル基等である。アルキ
ル基やシクロアルキル基に対する置換基としてはアルコ
キシ基 (例えばメトキシ基、エトキシ基、プロポキシ
基、ブトキシ基等)、アルコキシカルボニル基、カルバ
モイル基、ヒドロキシ基、アルキルチオ基、アミド基、
アシロキシ基、シアノ基、スルホニル基、ハロゲン原子
(例えば塩素、臭素、弗素、沃素など)、アリール基
(例えばフェニル基、ハロゲン置換フェニル基、アル
キル置換フェニル基) 等であり、置換されたものの具
体例としては例えば3−メトキシプロピル基、エトキシ
カルボニルメチル基、4−クロロシクロヘキシル基、ベ
ンジル基、p−メチルベンジル基、p−クロロベンジル
基などを挙げることができる。また、アルケニル基とし
ては例えばアリル (allyl) 基、アルキニル基
としては例えばプロパルギル基を挙げることができる。Examples of the cycloalkyl group include those having 3 to 10 carbon atoms, such as cyclopropyl, cyclohexyl, adamantyl, and the like. Substituents for alkyl groups and cycloalkyl groups include alkoxy groups (e.g. methoxy, ethoxy, propoxy, butoxy, etc.), alkoxycarbonyl groups, carbamoyl groups, hydroxy groups, alkylthio groups, amide groups,
Examples of substituted groups include acyloxy groups, cyano groups, sulfonyl groups, halogen atoms (e.g., chlorine, bromine, fluorine, iodine, etc.), aryl groups (e.g., phenyl groups, halogen-substituted phenyl groups, alkyl-substituted phenyl groups), etc. Examples of the group include 3-methoxypropyl group, ethoxycarbonylmethyl group, 4-chlorocyclohexyl group, benzyl group, p-methylbenzyl group, and p-chlorobenzyl group. Examples of alkenyl groups include allyl groups, and examples of alkynyl groups include propargyl groups.
【0074】本発明のヒドラジン化合物の好ましい具体
例を以下に示すが、本発明は何等これによって限定され
るものではない。Preferred specific examples of the hydrazine compound of the present invention are shown below, but the present invention is not limited thereto in any way.
【0075】III−1 1−ホルミル−2−{4−
[2−(2,4−ジ−tert−ブチルフェノキシ)ブ
チルアミド]フェニル}ヒドラジンIII−2 1−
ホルミル−2−(4−ジエチルアミノフェニル)ヒドラ
ジンIII−3 1−ホルミル−2−(p−トリル)
ヒドラジンIII−4 1−ホルミル−2−(4−エ
チルフェニル)ヒドラジンIII−5 1−ホルミル
−2−(4−アセトアミド−2−メチルフェニル)ヒド
ラジンIII−6 1−ホルミル−2−(4−オキシ
エチルフェニル)ヒドラジンIII−7 1−ホルミ
ル−2−(4−N,N−ジヒドロキシエチルアミノフェ
ニル)ヒドラジンIII−8 1−ホルミル−2−[
4−(3−エチルチオウレイド)フェニル)ヒドラジン
III−9 1−チオホルミル−2−{4−[2−(
2,4−ジ−tert−ブチルフェノキシ)ブチルアミ
ド]フェニル}ヒドラジンIII−10 II−ホル
ミル−2−(4−ベンジルアミノフェニル)ヒドラジン
III−11 1−ホルミル−2−(4−オクチルア
ミノフェニル)ヒドラジンIII−12 1−ホルミ
ル−2−(4−ドデシルフェニル)ヒドラジンIII−
13 1−アセチル−2−{4−2−2,4−ジ−t
ert−ブチルフェノキシ)ブチルアミド]フェニル}
ヒドラジンIII−14 4−カルボキシフェニルヒ
ドラジンIII−15 1−アセチル−1−(4−メ
チルフェニルスルホニル)−2−フェニルヒドラジンI
II−16 1−エトキシカルボニル−1−(4−メ
チルフェニルスルホニル)−2−フェニルヒドラジンI
II−17 1−ホルミル−2−(4−ヒドロキシフ
ェニル)−2−(4−メチルフェニルスルホニル)−ヒ
ドラジンIII−18 1−(4−アセトキシフェニ
ル)−2−ホルミル−1−(4−メチルフェニルスルホ
ニル)−ヒドラジンIII−19 1−ホルミル−2
−(4−ヘキサノキシフェニル)−2−(4−メチルフ
ェニルスルホニル)−ヒドラジンIII−20 1−
ホルミル−2−〔4−(テトラヒドロ−2H−ピラン−
2−イルオキシ)−フェニル〕−2−(4−メチルフェ
ニルスルホニル)−ヒドラジンIII−21 1−ホ
ルミル−2−〔4−(3−ヘキシルウレイドフェニル)
〕−2−(4−メチルフェニルスルホニル)−ヒドラジ
ンIII−22 1−ホルミル−2−(4−メチルフ
ェニルスルホ ニル)−2−〔4−(フェノキシチオカ
ルボニ ルアミノ)−フェニル〕−ヒドラジンIII−
23 1−(4−エトキシチオカルボニルアミノフェ
ニル)−2−ホルミル−1−(4−メチルフェニルスル
ホニル)−ヒドラジンIII−24 1−ホルミル−
2−(4−メチルフェニルスルホニル)−2−〔4−(
3−メチル−3−フェニル−2−チオウレイド)−フェ
ニル〕−ヒドラジンIII−25 1−{{4−{3
−〔4−(2,4−ビス−t−アミルフェノキシ)−ブ
チル〕−ウレイド}−フェニル}}−2−ホルミル−1
−(4−メチルフェニルスルホニル)−ヒドラジンIII-1 1-formyl-2-{4-
[2-(2,4-di-tert-butylphenoxy)butyramido]phenyl}hydrazine III-2 1-
Formyl-2-(4-diethylaminophenyl)hydrazine III-3 1-formyl-2-(p-tolyl)
hydrazine III-4 1-formyl-2-(4-ethylphenyl)hydrazine III-5 1-formyl-2-(4-acetamido-2-methylphenyl)hydrazine III-6 1-formyl-2-(4-oxy ethylphenyl)hydrazine III-7 1-formyl-2-(4-N,N-dihydroxyethylaminophenyl)hydrazine III-8 1-formyl-2-[
4-(3-ethylthioureido)phenyl)hydrazine III-9 1-thioformyl-2-{4-[2-(
2,4-di-tert-butylphenoxy)butylamido]phenyl}hydrazine III-10 II-formyl-2-(4-benzylaminophenyl)hydrazine III-11 1-formyl-2-(4-octylaminophenyl)hydrazine III-12 1-formyl-2-(4-dodecylphenyl)hydrazine III-
13 1-acetyl-2-{4-2-2,4-di-t
ert-butylphenoxy)butyramido]phenyl}
Hydrazine III-14 4-Carboxyphenylhydrazine III-15 1-acetyl-1-(4-methylphenylsulfonyl)-2-phenylhydrazine I
II-16 1-ethoxycarbonyl-1-(4-methylphenylsulfonyl)-2-phenylhydrazine I
II-17 1-formyl-2-(4-hydroxyphenyl)-2-(4-methylphenylsulfonyl)-hydrazine III-18 1-(4-acetoxyphenyl)-2-formyl-1-(4-methylphenyl sulfonyl)-hydrazine III-19 1-formyl-2
-(4-hexanoxyphenyl)-2-(4-methylphenylsulfonyl)-hydrazine III-20 1-
Formyl-2-[4-(tetrahydro-2H-pyran-
2-yloxy)-phenyl]-2-(4-methylphenylsulfonyl)-hydrazine III-21 1-formyl-2-[4-(3-hexylureidophenyl)
]-2-(4-methylphenylsulfonyl)-hydrazine III-22 1-formyl-2-(4-methylphenylsulfonyl)-2-[4-(phenoxythiocarbonylamino)-phenyl]-hydrazine III-
23 1-(4-ethoxythiocarbonylaminophenyl)-2-formyl-1-(4-methylphenylsulfonyl)-hydrazine III-24 1-formyl-
2-(4-methylphenylsulfonyl)-2-[4-(
3-Methyl-3-phenyl-2-thioureido)-phenyl]-hydrazine III-25 1-{{4-{3
-[4-(2,4-bis-t-amylphenoxy)-butyl]-ureido}-phenyl}-2-formyl-1
-(4-methylphenylsulfonyl)-hydrazine
【0076】[0076]
【化29】[C29]
【0077】[0077]
【化30】[C30]
【0078】[0078]
【化31】[Chemical formula 31]
【0079】[0079]
【化32】[C32]
【0080】[0080]
【化33】[Chemical formula 33]
【0081】[0081]
【化34】[C34]
【0082】[0082]
【化35】[C35]
【0083】[0083]
【化36】[C36]
【0084】一般式〔III〕で表わされるヒドラジン
化合物の添加位置はハロゲン化銀乳剤層及び/または支
持体上のハロゲン化銀乳剤層側にある非感光層であるが
、好ましくは、ハロゲン化銀乳剤層及び/またはその下
層である。添加量は、10−5〜10−1モル/銀1モ
ルが好ましく、更に好ましくは10−4〜10−2モル
/銀1モルである。The hydrazine compound represented by the general formula [III] is added to the silver halide emulsion layer and/or the non-photosensitive layer on the side of the silver halide emulsion layer on the support, but preferably the silver halide emulsion layer is The emulsion layer and/or its underlying layer. The amount added is preferably 10-5 to 10-1 mol/silver 1 mol, more preferably 10-4 to 10-2 mol/silver 1 mol.
【0085】本発明において、350〜500nmに吸
収ピークを有する染料としては特に限定しないが、例え
ば次の如き染料が挙げられる。[0085] In the present invention, the dye having an absorption peak in the range of 350 to 500 nm is not particularly limited, but examples include the following dyes.
【0086】[0086]
【化37】[C37]
【0087】[0087]
【化38】[C38]
【0088】[0088]
【化39】[C39]
【0089】また、400〜500nmの領域に分光増
感させる増感色素としては、公知の青感光増感色素を用
いることが出来る。例えば西独特許929,080号、
米国特許2,231,658号、同2,493,748
号、同2,530,776号、同2,519,001号
、同2,912,329号、同3,656,956号、
同3,672,897号、同3,6494,217号、
同4,025,349号、同4,046,572号、米
国特許1,242,588号、特公昭44−14030
号、同52−24844号、特開昭48−73137号
、同61−172140号等に記載されたものを挙げる
ことができる。Further, as the sensitizing dye for spectral sensitization in the region of 400 to 500 nm, a known blue sensitizing dye can be used. For example, West German Patent No. 929,080,
U.S. Patent Nos. 2,231,658 and 2,493,748
No. 2,530,776, No. 2,519,001, No. 2,912,329, No. 3,656,956,
No. 3,672,897, No. 3,6494,217,
No. 4,025,349, No. 4,046,572, U.S. Patent No. 1,242,588, Japanese Patent Publication No. 14030/1973
No. 52-24844, JP-A-48-73137, JP-A-61-172140, and the like.
【0090】本発明のハロゲン化銀写真感光材料に用い
るハロゲン化銀については、特に限定はないが、塩化銀
もしくは塩臭化銀が好ましい。塩臭化銀の組成はAgC
l/AgBr=100/0〜2/98のいずれでもよい
が、好ましくはAgCl/AgBr=90/10〜40
/60のモル比である。ハロゲン化銀粒子の平均粒径は
0.10μm〜0.50μmが好ましく、(粒径の標準
偏差)/(平均粒径)×100で表される変動係数が1
5%以下の粒径分布の狭いものがより好ましい。The silver halide used in the silver halide photographic material of the present invention is not particularly limited, but silver chloride or silver chlorobromide is preferred. The composition of silver chlorobromide is AgC
l/AgBr=100/0 to 2/98, preferably AgCl/AgBr=90/10 to 40
The molar ratio is /60. The average grain size of the silver halide grains is preferably 0.10 μm to 0.50 μm, and the coefficient of variation expressed by (standard deviation of grain size)/(average grain size) x 100 is 1.
It is more preferable to have a narrow particle size distribution of 5% or less.
【0091】本発明において用いられるハロゲン化銀は
、種々な増感剤、安定剤等を用いることができる。また
、本発明に特に有利に用いられる親水性コロイドはゼラ
チンである。[0091] Various sensitizers, stabilizers, etc. can be used for the silver halide used in the present invention. Furthermore, a hydrophilic colloid particularly advantageously used in the present invention is gelatin.
【0092】これらの親水性コロイドはハロゲン化銀を
含有しない層、例えばハレーション防止層、保護層、中
間層等にも適用できる。These hydrophilic colloids can also be applied to layers that do not contain silver halide, such as antihalation layers, protective layers, intermediate layers, etc.
【0093】本発明に用いる支持体としては、例えばポ
リエステルフィルム等感光材料業界で用いている各種支
持体を用いることができる。As the support used in the present invention, various supports used in the photosensitive material industry, such as polyester films, can be used.
【0094】本発明の感光材料は適度の膜厚を有する保
護層、即ち好ましくは0.1〜10μm、特に好ましく
は0.8〜2μmのゼラチン保護層が塗設されているの
が望ましい。The photosensitive material of the present invention is preferably coated with a gelatin protective layer having an appropriate thickness, preferably 0.1 to 10 μm, particularly preferably 0.8 to 2 μm.
【0095】本発明に用いられる前記親水性コロイド層
には必要に応じて各種写真用添加剤、例えばゼラチン可
塑剤、硬膜剤、界面活性剤、画像安定剤、紫外線吸収剤
、アンチステイン剤、pH調整剤、酸化防止剤、帯電防
止剤、増粘剤、粒状性向上剤、染料、モルダント、増白
剤、現像速度調整剤、マット剤等を本発明の効果が損な
われない範囲内で使用することができる。The hydrophilic colloid layer used in the present invention may optionally contain various photographic additives such as gelatin plasticizers, hardeners, surfactants, image stabilizers, ultraviolet absorbers, antistain agents, pH adjusters, antioxidants, antistatic agents, thickeners, graininess improvers, dyes, mordants, brighteners, development speed adjusters, matting agents, etc. are used within the range that does not impair the effects of the present invention. can do.
【0096】本発明のハロゲン化銀写真感光材料の現像
に用いられる現像主薬としては 、T.H.ジェームス
著ザ・セオリィ・オブ・ザ・フォトグラフィック・プロ
セス第4版(The Theory of the P
hotographic Process,Fourt
h Edition)291〜334頁及びジャーナル
・オブ・ザ・アメリカン・ケミカル・ソサイティ(Jo
urnal of THeAmerican Chem
ical Society)73巻、3,100頁(1
951)に記載されている如き現像剤が本発明に有効に
使用し得るものである。これらの現像剤は単独で使用し
ても2種以上を組み合わせてもよいが、2種以上組み合
わせて用いる方が好ましい。又、本発明の感光材料の現
像に使用する現像液には保恒剤として、例えば亜硫酸ナ
トリウム、ヒドロキシルアミン、ヒドラジド化合物を用
いてもよい。
その他一般白黒現像液で用いられるような苛性アルカリ
、炭酸アルカリ又はアミン等によるpHの調整とバッフ
ァー機能を持たせること、及び臭化カリウムなど無機現
像抑制剤及びベンゾトリアゾール等の有機現像抑制剤、
エチレンジアミン四酢酸等の金属イオン捕捉剤、メタノ
ール、エタノール、ベンジルアルコール、ポリアルキレ
ンオキシド等の現像促進剤、アルキルアリールスルホン
酸ナトリウム、天然のサポニン、糖類又は前記化合物の
アルキルエステル物等の界面活性剤、グルタルアルデヒ
ド、ホルマリン、グリオキザール等の硬膜剤、硫酸ナト
リウム等のイオン強度調整剤等の添加を行うことは任意
である。As the developing agent used for developing the silver halide photographic light-sensitive material of the present invention, T. H. The Theory of the Photographic Process, 4th Edition by James
photographic Process, Fourt
h Edition) pages 291-334 and Journal of the American Chemical Society (Jo
urnal of THe American Chem
ical Society) Volume 73, Page 3,100 (1
951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more types, but it is preferable to use two or more types in combination. Further, the developer used for developing the light-sensitive material of the present invention may contain, for example, sodium sulfite, hydroxylamine, or a hydrazide compound as a preservative. In addition, adjusting the pH with caustic alkali, alkali carbonate, or amine, etc. used in general black and white developers, and providing a buffer function, and inorganic development inhibitors such as potassium bromide and organic development inhibitors such as benzotriazole,
Metal ion scavengers such as ethylenediaminetetraacetic acid, development accelerators such as methanol, ethanol, benzyl alcohol, polyalkylene oxide, surfactants such as sodium alkylarylsulfonate, natural saponins, sugars or alkyl esters of the above compounds, It is optional to add hardening agents such as glutaraldehyde, formalin, and glyoxal, and ionic strength adjusting agents such as sodium sulfate.
【0097】本発明の現像液には、特開昭56−106
244号に記載のアルカノールアミンなどのアミノ化合
物を用いることができる。The developing solution of the present invention is disclosed in Japanese Patent Application Laid-Open No. 56-106
Amino compounds such as the alkanolamines described in No. 244 can be used.
【0098】この他L.F.A.メソン著「フォトグラ
フィック・プロセシン・ケミストリー」、フォーカル・
プレス刊(L.F.A. Mason Photogr
aphic Process−ing Chemist
ry、Focal Press, London )1
966年の226〜229頁、米国特許第2,193,
015号、同2,592,364号、特開昭48−64
933号などに記載のものを用いてもよい。[0098] In addition, L. F. A. Meson, “Photographic Processing Chemistry”, Focal
Published by Press (L.F.A. Mason Photogr.
aphic Processing Chemist
ry, Focal Press, London) 1
966, pp. 226-229, U.S. Patent No. 2,193,
No. 015, No. 2,592,364, Japanese Unexamined Patent Publication No. 48-64
Those described in No. 933 may also be used.
【0099】本発明においては感光材料は現像、定着し
た後、水洗又は安定化処理に施される。In the present invention, the photosensitive material is subjected to water washing or stabilization treatment after being developed and fixed.
【0100】水洗又は安定化処理は本分野で公知のあら
ゆる方法を適用することができる。本発明において感光
材料は、露光後、ラインスピードが1000mm/mi
n以上の自動現像機を用いて、現像、定着、水洗及び/
又は安定化までの全処理が50秒以内となるように超迅
速処理を行ったところ、目伸し特性がさらに良化し、好
ましい。以下超迅速処理について主に説明する。[0100] For the water washing or stabilization treatment, any method known in the art can be applied. In the present invention, the photosensitive material has a line speed of 1000 mm/mi after exposure.
Development, fixing, washing and/or
Alternatively, when ultra-quick processing is performed so that the entire processing up to stabilization takes less than 50 seconds, the eye stretching properties are further improved, which is preferable. The ultra-quick processing will be mainly explained below.
【0101】本発明の感光材料は従来のスピードで処理
しても本発明の目的を達成できるが、更に以下のような
超迅速処理にも好ましく適用できる。Although the photographic material of the present invention can be processed at conventional speeds to achieve the objects of the present invention, it can also be preferably applied to ultra-rapid processing as described below.
【0102】即ちラインスピードが1000mm/mi
n以上の自動現像機を用い、現像・定着・水洗及び/又
は安定化処理時間が50秒以内という超迅速処理を行う
場合に、色素残色を更に改良できるという効果がある。
以下、超迅速処理について主に説明する。現像液、特に
黒白現像液に用いる現像主薬には良好な性能を得やすい
点で、ジヒドロキシベンゼン類と1−フェニル−3−ピ
ラゾリドン類の組合わせが好ましい。勿論この他にp−
アミノフェノール系現像主薬を含んでもよい。[0102] That is, the line speed is 1000 mm/mi.
When ultra-quick processing is performed using an automatic processor of n or more and the processing time for development, fixing, washing and/or stabilization processing is within 50 seconds, there is an effect that residual color of the dye can be further improved. The ultra-quick processing will be mainly explained below. A combination of dihydroxybenzenes and 1-phenyl-3-pyrazolidones is preferred as a developing agent used in a developer, especially a black and white developer, since good performance can be easily obtained. Of course, in addition to this, p-
It may also contain an aminophenol developing agent.
【0103】上記ジヒドロキシベンゼン現像主薬として
はハイドロキノン、クロロハイドロキノン、ブロモハイ
ドロキノン、イソプロピルハイドロキノン、メチルハイ
ドロキノン、2,3−ジクロロハイドロキノン、2,5
−ジクロロハイドロキノン、2,3−ジブロモハイドロ
キノン、2,5−ジメチルハイドロキノンなどがあるが
、特にハイドロキノンが好ましい。Examples of the dihydroxybenzene developing agent include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3-dichlorohydroquinone, 2,5
Examples include -dichlorohydroquinone, 2,3-dibromohydroquinone, and 2,5-dimethylhydroquinone, with hydroquinone being particularly preferred.
【0104】上記1−フェニル−3−ピラゾリドン又は
その誘導体の現像主薬としては1−フェニル−4,4−
ジメチル−3−ピラゾリドン、1−フェニル−4−メチ
ル−4−ヒドロキシメチル−3−ピラゾリドン、1−フ
ェニル−4,4−ジヒドロキシメチル−3−ピラゾリド
ンなどがある。The developing agent for the above 1-phenyl-3-pyrazolidone or its derivative is 1-phenyl-4,4-
Examples include dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, and 1-phenyl-4,4-dihydroxymethyl-3-pyrazolidone.
【0105】上記p−アミノフェノール系現像主薬とし
てはN−メチル−p−アミノフェノール、p−アミノフ
ェノール、N−(β−ヒドロキシエチル)−p−アミノ
フェノール、N−(4−ヒドロキシフェニル)グリシン
、2−メチル−p−アミノフェノール、p−ベンジルア
ミノフェノール等があるが、なかでもN−メチル−p−
アミノフェノールが好ましい。[0105] The p-aminophenol type developing agents include N-methyl-p-aminophenol, p-aminophenol, N-(β-hydroxyethyl)-p-aminophenol, and N-(4-hydroxyphenyl)glycine. , 2-methyl-p-aminophenol, p-benzylaminophenol, etc. Among them, N-methyl-p-
Aminophenols are preferred.
【0106】現像主薬は通常0.01モル/l〜1.2
モル/lの量で用いられるのが好ましい。[0106] The developing agent is usually 0.01 mol/l to 1.2 mol/l.
Preferably it is used in amounts of mol/l.
【0107】現像液に保恒剤として亜硫酸塩が用いられ
るが、このような亜硫酸塩としては亜硫酸ナトリウム、
亜硫酸カリウム、亜硫酸リチウム、亜硫酸アンモニウム
、重亜硫酸ナトリウム、メタ重亜硫酸カリウム、ホルム
アルデヒド重亜硫酸ナトリウムなどがある。亜硫酸塩は
0.2モル/l以上、特に0.4モル/l以上が好まし
い。
また、上限は2.5モル/lまでとするのが好ましい。[0107] Sulfites are used as preservatives in developing solutions, and examples of such sulfites include sodium sulfite,
These include potassium sulfite, lithium sulfite, ammonium sulfite, sodium bisulfite, potassium metabisulfite, and sodium formaldehyde bisulfite. The amount of sulfite is preferably 0.2 mol/l or more, particularly 0.4 mol/l or more. Further, the upper limit is preferably 2.5 mol/l.
【0108】現像液のpHは9〜13までの範囲が好ま
しく、更に好ましくはpH10〜12までの範囲である
。pH調整のために用いるアルカリ剤には水酸化ナトリ
ウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム
、第三リン酸ナトリウム、第三リン酸カリウムの如きp
H調整剤を含む。特開昭61−28708号(ホウ酸塩
)、特開昭60−93439号(例えば、サッカロース
、アセトオキシム、5−スルホサルチル酸)、リン酸塩
、炭酸塩などの緩衝剤を用いてもよい。The pH of the developer is preferably in the range of 9 to 13, more preferably in the range of 10 to 12. Alkaline agents used for pH adjustment include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, trisodium phosphate, and potassium triphosphate.
Contains H regulator. Buffers such as JP-A-61-28708 (borates), JP-A-60-93439 (eg, sucrose, acetoxime, 5-sulfosalcylic acid), phosphates, carbonates, etc. may be used.
【0109】上記成分以外に用いられる添加剤としては
、臭化ナトリウム、臭化カリウム、沃化カリウムの如き
現像抑制剤:エチレングリコール、ジエチレングリコー
ル、トリエチレングリコール、ジメチルホルムアルデヒ
ド、メチルセロソルブ、ヘキシレングリコール、エタノ
ール、メタノールの如き有機溶剤:1−フェニル−5−
メルカプトテトラゾール、2−メルカプトベンツイミダ
ゾール−5−スルホン酸ナトリウム塩等のメルカプト系
化合物、5−ニトロインダゾール等のインダゾール系化
合物、5−メチルベンツトリアゾール等のベンツトリア
ゾール系化合物などのカブリ防止剤を含んでもよく、更
に必要に応じ色調剤、界面活性剤、消泡剤、硬水軟化剤
、特開昭56−106244号記載のアミノ化合物など
を含んでもよい。Additives used in addition to the above components include development inhibitors such as sodium bromide, potassium bromide, and potassium iodide; ethylene glycol, diethylene glycol, triethylene glycol, dimethyl formaldehyde, methyl cellosolve, hexylene glycol; Organic solvents such as ethanol and methanol: 1-phenyl-5-
Even if it contains an antifoggant such as a mercapto compound such as mercaptotetrazole or 2-mercaptobenzimidazole-5-sulfonic acid sodium salt, an indazole compound such as 5-nitroindazole, or a benztriazole compound such as 5-methylbenztriazole. It may also contain, if necessary, a color toning agent, a surfactant, an antifoaming agent, a water softener, an amino compound described in JP-A-56-106244, and the like.
【0110】本発明においては現像液に、銀汚れ防止剤
、例えば特開昭56−24347号に記載の化合物、特
開昭56−106244号に記載のアルカノールアミン
などのアミノ化合物を用いることができる。In the present invention, silver stain preventive agents such as compounds described in JP-A-56-24347 and amino compounds such as alkanolamines described in JP-A-56-106244 can be used in the developer. .
【0111】この他L.F.A.メソン著「フォトグラ
フィック・プロセシン・ケミストリー」、フォーカル・
プレス刊(L.F.A. Mason Photogr
aphic Processing Chemistr
y、Focal Press, London )19
66年 の226〜229頁、米国特許第2,193,
015号、同2,592,364号、特開昭48−64
933号などに記載のものを用いてもよい。[0111] In addition, L. F. A. Meson, “Photographic Processing Chemistry”, Focal
Published by Press (L.F.A. Mason Photogr.
aphic Processing Chemistry
y, Focal Press, London) 19
1966, pages 226-229, U.S. Patent No. 2,193,
No. 015, No. 2,592,364, Japanese Unexamined Patent Publication No. 48-64
Those described in No. 933 may also be used.
【0112】本発明において「現像時間」、「定着時間
」とは各々、処理する感光材料が自現機の現像タンク液
に浸漬してから次の定着液に浸漬するまでの時間、定着
タンク液に浸漬してから次の水洗タンク液(安定液)に
浸漬するまでの時間を言う。また「水洗時間」とは、水
洗タンク液に浸漬している時間をいう。[0112] In the present invention, "developing time" and "fixing time" respectively refer to the time from when the photosensitive material to be processed is immersed in the developing tank liquid of an automatic processing machine until it is immersed in the next fixing liquid; This refers to the time from immersion in water to the time it is immersed in the next washing tank liquid (stabilizing liquid). Further, "washing time" refers to the time during which the product is immersed in the washing tank liquid.
【0113】また「乾燥時間」とは通常35℃〜100
℃で好ましくは40℃〜80℃の熱風が吹きつけられる
乾燥ゾーンが、自現機には設置されているが、その乾燥
ゾーンに入っている時間をいう。[0113] Also, "drying time" is usually 35°C to 100°C.
The automatic processing machine is equipped with a drying zone in which hot air, preferably 40 to 80 degrees Celsius, is blown, and the term refers to the time the product is in the drying zone.
【0114】現像温度及び時間は約25℃〜50℃で2
0秒以下であるが好ましくは30℃〜40℃で6秒〜2
0秒である。
定着液はチオ硫酸塩を含む水溶液であり、pH3.8以
上、好ましくは4.2〜5.5を有する。[0114] The development temperature and time are approximately 25°C to 50°C.
0 seconds or less, but preferably 6 seconds to 2 seconds at 30°C to 40°C
It is 0 seconds. The fixer is an aqueous solution containing thiosulfate and has a pH of 3.8 or higher, preferably 4.2 to 5.5.
【0115】定着剤としてはチオ硫酸ナトリウム、チオ
硫酸アンモニウムがあるが、チオ硫酸イオンとアンモニ
ウムイオンとを必須成分とするものであり、定着速度の
点からチオ硫酸アンモニウムが特に好ましい。定着剤の
使用量は適宜変えることができ、一般には約0.1〜約
6モル/lである。Examples of the fixing agent include sodium thiosulfate and ammonium thiosulfate, which contain thiosulfate ions and ammonium ions as essential components, and ammonium thiosulfate is particularly preferred from the viewpoint of fixing speed. The amount of fixing agent used can be varied as appropriate, and is generally about 0.1 to about 6 mol/l.
【0116】定着液には硬膜剤として作用する水溶性ア
ルミニウム塩を含んでも良く、それらには、例えば塩化
アルミニウム、硫酸アンモニウム、カリ明ばんなどがあ
る。定着液には、酒石酸、クエン酸あるいはそれらの導
体を単独で、あるいは2種以上、併用することてができ
る。これらの化合物に定着液1lにつき0.005モル
以上含むものが有効で、特に0.01モル/l〜0.0
3モル/lが特に有効である。The fixer may also contain water-soluble aluminum salts that act as hardeners, such as aluminum chloride, ammonium sulfate, potassium alum, and the like. In the fixing solution, tartaric acid, citric acid, or conductors thereof can be used alone or in combination of two or more kinds. Those containing 0.005 mol or more of these compounds per liter of fixer are effective, especially 0.01 mol/l to 0.0 mol/l.
3 mol/l is particularly effective.
【0117】具体的には、酒石酸、酒石酸カリウム、酒
石酸ナトリウム、酒石酸カリウムナトリウム、クエン酸
、クエン酸ナトリウム、クエン酸カリウム、クエン酸リ
チウム、クエン酸アンモニウムなどがある。Specific examples include tartaric acid, potassium tartrate, sodium tartrate, potassium sodium tartrate, citric acid, sodium citrate, potassium citrate, lithium citrate, and ammonium citrate.
【0118】定着液には所望により保恒剤(例えば、亜
硫酸塩、重亜硫酸塩)、pH緩衡剤(例えば、酢酸、硝
酸)、pH調整剤(例えば硫酸)、硬水軟化能のあるキ
レート剤や特願昭60−213562号記載の化合物を
含むことができる。The fixing solution may optionally contain a preservative (for example, sulfite, bisulfite), a pH buffering agent (for example, acetic acid, nitric acid), a pH adjuster (for example, sulfuric acid), and a chelating agent with water softening ability. and the compounds described in Japanese Patent Application No. 60-213562.
【0119】定着温度及び時間は約20℃〜約50℃で
6秒〜1分が好ましいが30℃〜40℃で6秒〜30秒
がより好ましく、更に好ましくは30℃〜40℃で6秒
〜20秒である。The fixing temperature and time are preferably 6 seconds to 1 minute at about 20°C to about 50°C, more preferably 6 seconds to 30 seconds at 30°C to 40°C, even more preferably 6 seconds at 30°C to 40°C. ~20 seconds.
【0120】定着液濃縮液が本発明の方法で自動現像機
に、感光材料が処理されるに従って、それを希釈する水
と共に補充される場合、定着液濃縮液はI剤で構成され
ることが最も好ましいことは現像液の場合と同じである
。When the fixer concentrate is replenished into the automatic processor in the method of the invention with water to dilute it as the light-sensitive material is processed, the fixer concentrate may be comprised of an I agent. The most preferable conditions are the same as those for the developer.
【0121】I剤として定着液現液が安定に存在しうる
のはpH4.5以上であり、より好ましくはpH4.6
5以上である。pH4.5未満では、特に定着液が実際
に使われるまでの期間長年放置された場合にチオ硫酸塩
が分解して最終的には硫化してしまうためである。従っ
てpH4.5以上の範囲では亜硫酸ガスの発生も少なく
、作業環境上も良くなる。pHの上限はそれ程厳しくな
いが余り高pHで定着されると、以後水洗されても膜p
Hが高くなって膜膨潤が大きくなり従って乾燥負荷が大
きくなるのでpH7まで位が限度である。アルミニウム
塩を使って硬膜する定着液ではアルミニウム塩の折出沈
澱防止pH5.5までが限界である。[0121] The fixer solution as the I agent can stably exist at a pH of 4.5 or higher, more preferably at a pH of 4.6.
It is 5 or more. This is because if the pH is less than 4.5, the thiosulfate will decompose and eventually become sulfided, especially if the fixer is left for a long period of time before it is actually used. Therefore, in a pH range of 4.5 or higher, less sulfur dioxide gas is generated, which improves the working environment. The upper limit of pH is not so strict, but if it is fixed at too high a pH, the pH of the membrane will deteriorate even after washing with water.
The pH is limited to about 7 because the H content increases, membrane swelling increases, and therefore the drying load increases. A fixing solution that hardens a film using an aluminum salt has a pH limit of 5.5 to prevent precipitation of the aluminum salt.
【0122】本発明は現像液または定着液のいずれかが
上記のような希釈水を必要としない(すなわち原液のま
まで補充する)いわゆる使用液であっても構わない。In the present invention, either the developing solution or the fixing solution may be a so-called working solution that does not require dilution water as described above (that is, it is replenished as an undiluted solution).
【0123】各濃縮液の処理タンク液への供給量及び希
釈水との混合割合はそれぞれ濃縮液の組成に依存して種
々変化させることができるが、一般に濃縮液対希釈水は
1対0〜8の割合で、これらの現像液、定着液各々の全
量は感光材料1m2に対して50mlから1500ml
であることが好ましい。[0123] The amount of each concentrate supplied to the processing tank liquid and the mixing ratio with dilution water can be varied depending on the composition of the concentrate, but generally the ratio of concentrate to dilution water is 1:0 to 0. The total amount of each of these developing solutions and fixing solutions is 50 ml to 1500 ml per 1 m2 of photosensitive material.
It is preferable that
【0124】本発明においては感光材料は現液、定着し
た後、水洗又は安定化処理に施される。In the present invention, the photosensitive material is developed, fixed, and then subjected to water washing or stabilization treatment.
【0125】水洗又は安定化処理は本分野で公知のあら
ゆる方法を適用することができ、本分野で公知の種々の
添加剤を含有する水を水洗水又は安定化液として用いる
こともできる。防黴手段を施した水を水洗水又は安定化
液に使用することにより、感光材料1m2当たり3l以
下の補充量という節水処理も可能となるのみならず、自
現機設置の配管が不要となり更にストック槽の削減が可
能となる。即ち現像液及び定着液用の調液希釈水及び水
洗水又は安定化液を共通の一槽のストック槽から供給で
き、自動現像機の一層のコンバクト化が可能となる。[0125] For the washing or stabilization treatment, any method known in the art can be applied, and water containing various additives known in the art can also be used as the washing water or stabilizing liquid. By using anti-mold water for washing water or stabilizing liquid, not only is it possible to save water by replenishing less than 3 liters per 1 m2 of photosensitive material, but it also eliminates the need for piping for installing an automatic processing machine. It is possible to reduce the number of stock tanks. That is, the solution dilution water and washing water or stabilizing solution for the developing solution and the fixing solution can be supplied from a common stock tank, making it possible to make the automatic developing machine even more compact.
【0126】防黴手段を施した水を水洗水又は安定化液
に併用すると、水垢の発生等が有効に防止し得るため、
感光材料1m2当たり0〜3l、好ましくは0〜1l、
の節水処理を行うことができる。[0126] When water treated with anti-mildew means is used in combination with washing water or stabilizing liquid, the formation of limescale etc. can be effectively prevented.
0 to 3 liters per m2 of photosensitive material, preferably 0 to 1 liter,
Water-saving treatment can be carried out.
【0127】ここで、補充量が0の場合とは、水洗槽中
の水洗水が自然蒸発等により減少した分だけ適宜補充す
る以外は全く補充を行なわない、即ち実質的に無補充の
いわゆる「ため水」処理方法を行なう場合をいう。[0127] Here, when the replenishment amount is 0, no replenishment is performed at all except for appropriately replenishing the amount of washing water in the washing tank that has decreased due to natural evaporation, etc., that is, there is virtually no replenishment. This refers to cases where the "reserved water" treatment method is used.
【0128】補充量を少なくする方法として、古くより
多段向流方式(例えば2段、3段など)が知られている
。この多段向流方式を本発明に適用すれば定着液の感光
材料はだんだんと清浄な方向、つまり定着液で汚れてい
ない処理液の方に順次接触して処理されて行くので、更
に効率の良い水洗がなされる。これによれば、不安定な
チオ硫酸塩等が適度に除去され、変退色の可能性が一層
小さくなって、更に著しい安定化効果が得られる。水洗
水も従来に比べ津、非常に少ない量ですむ。As a method for reducing the amount of replenishment, a multistage countercurrent system (for example, two stages, three stages, etc.) has been known for a long time. If this multi-stage countercurrent method is applied to the present invention, the photosensitive material in the fixer will be processed in a progressively cleaner direction, that is, in sequential contact with the processing solution that is not contaminated with the fixer, resulting in even more efficient processing. Washing is done. According to this, unstable thiosulfates and the like are appropriately removed, the possibility of discoloration and fading is further reduced, and an even more significant stabilizing effect can be obtained. The amount of water used for washing is also much smaller compared to conventional methods.
【0129】少量の水洗水で水洗するときには特願昭6
0−172968号に記載のスクイズローラー洗浄槽を
設けることがより好ましい。[0129] When washing with a small amount of washing water,
It is more preferable to provide a squeeze roller cleaning tank as described in No. 0-172968.
【0130】更に水洗又は安定化浴に防黴手段を施した
水を処理に応じて補充することによって生ずる水洗又は
安定化浴からのオーバーフロー液の一部又は全部は特開
昭60−235133号に記載されているようにその前
の処理工程である定着能を有する処理液に利用すること
もできる。こうすることによって上記ストック水の節水
ができ、しかも廃液がより少なくなるためより好ましい
。[0130] Furthermore, part or all of the overflow liquid from the washing or stabilizing bath, which is generated by replenishing the washing or stabilizing bath with anti-mold water depending on the treatment, is disclosed in Japanese Patent Application Laid-Open No. 60-235133. As described, it can also be used in a processing solution having fixing ability, which is a processing step before that. This is more preferable because the stock water can be saved and the amount of waste liquid can be reduced.
【0131】防黴手段としては、特開昭60−2639
39号に記された紫外線照射法、同60−263940
号に記された磁場を用いる方法、同61−131632
号に記されたイオン交換樹脂を用いて純水にする方法、
特願昭60−253807号、同60−295894号
、同61−63030号、同61−51396号に記載
の防菌剤を用いる方法を用いることができる。[0131] As an anti-mildew means, Japanese Patent Application Laid-Open No. 60-2639
Ultraviolet irradiation method described in No. 39, No. 60-263940
Method using a magnetic field described in No. 61-131632
A method of purifying water using an ion exchange resin as described in the issue,
Methods using antibacterial agents described in Japanese Patent Application No. 60-253807, No. 60-295894, No. 61-63030, and No. 61-51396 can be used.
【0132】更には、L.E.West “Wate
r Quality Criteria”Photo
Sci & Eng. Vol.9No.6(1965
)、M.W.Be−ach “Microbiolog
ical Growths in Motion−Pi
c−ture Processing” SMPTE
Journal Vol.85,(1976).R.O
.Deegan, “Photo Processi
ng WashWater Biocides” J.
Imaging Tech.Vol 10,No.6(
1984)及び特開昭57−8542号、同57−58
143号、同58−105145号、同57−1321
46号、同58−18631号、同57−97530号
、同57−157244号などに記載されている防菌剤
、防バイ剤、界面活性剤などを併用することもできる。Furthermore, L. E. West “Wate”
r Quality Criteria"Photo
Sci & Eng. Vol. 9No. 6 (1965
), M. W. Be-ach “Microbiolog
ical Growths in Motion-Pi
c-ture Processing” SMPTE
Journal Vol. 85, (1976). R. O
.. Deegan, “Photo Processi
ng WashWater Biocides” J.
Imaging Tech. Vol 10, No. 6(
1984) and JP-A-57-8542, JP-A No. 57-58.
No. 143, No. 58-105145, No. 57-1321
46, No. 58-18631, No. 57-97530, No. 57-157244, and the like can also be used in combination with antibacterial agents, anti-bacterial agents, surfactants, and the like.
【0133】更に水洗浴には、R.T.Kreiman
著J.Image,Tech 10,(6) 242
(1984)に記載されたイソチアゾリン系化合物、
RESEARCH DISCLOSURE 第205巻
、Item 20526 (1981年、5月号)に記
載されたイソチアゾリン系化合物、同第228巻、It
em 22845 (1983年、4月号)に記載され
たイソチアゾリン系化合物特願昭61−51396号に
記載された化合物、などを防菌剤(Microbioc
ide)として併用することもできる。Furthermore, in the water washing bath, R. T. Kreiman
Written by J. Image, Tech 10, (6) 242
(1984), isothiazoline compounds described in
Isothiazoline compounds described in RESEARCH DISCLOSURE Vol. 205, Item 20526 (May 1981 issue), Vol. 228, It
em 22845 (April issue, 1983), the compound described in Japanese Patent Application No. 61-51396, etc. are used as antibacterial agents (Microbioc).
It can also be used in combination as ide).
【0134】更に防バイ剤の具体例としては、フェノー
ル、4−クロロフェノール、ペンタクロロフェノール、
クレゾール、O−フェニルフェノール、クロロフェン、
ジクロロフェン、ホルムアルデヒド、グルタールアルデ
ヒド、クロルアセトアミド、p−ヒドロキシ安息香酸エ
ステル、2−(4−チアゾリン)−ベンゾイミダゾール
、ベンゾイソチアゾリン−3−オン、ドデシル−ベンジ
ル−ジメチルアンモニウム−クロライド、N−(フルオ
ロジクロロメチルチオ)−フタルイミド、2,4,4′
−トリクロロ−2′−ハイドロオキシジフェニルエーテ
ルなどである。[0134] Further, specific examples of anti-bacterial agents include phenol, 4-chlorophenol, pentachlorophenol,
Cresol, O-phenylphenol, chlorophene,
Dichlorophene, formaldehyde, glutaraldehyde, chloracetamide, p-hydroxybenzoic acid ester, 2-(4-thiazoline)-benzimidazole, benzisothiazolin-3-one, dodecyl-benzyl-dimethylammonium-chloride, N-(fluoro Dichloromethylthio)-phthalimide, 2,4,4'
-trichloro-2'-hydroxydiphenyl ether and the like.
【0135】防黴手段を施して水ストック槽に保存され
た水は前記現像液定着液などの処理液原液の希釈水とそ
の添加量は好ましくは0.01〜10g/l、より好ま
しくは0.1〜5g/lである。[0135] The water treated with anti-mildew means and stored in the water stock tank is diluted with water for diluting the stock solution of the processing solution such as the developer/fixer, and the amount thereof added is preferably 0.01 to 10 g/l, more preferably 0. .1 to 5 g/l.
【0136】更に水洗水中には銀画像安定化剤の他に水
滴むらを防止する目的で、各種の界面活性剤を添加する
ことができる。界面活性剤としては、陽イオン型、陰イ
オン型、非イオン型および両イオン型のいずれを用いて
もよい。界面活性剤の具体例としてはたとえば工学図書
(株)発行の「界面活性剤ハンドブック」に記載されて
いる化合物などがある。Furthermore, in addition to the silver image stabilizer, various surfactants can be added to the washing water for the purpose of preventing uneven water droplets. As the surfactant, any of cationic, anionic, nonionic, and amphoteric types may be used. Specific examples of surfactants include compounds described in "Surfactant Handbook" published by Kogaku Tosho Co., Ltd.
【0137】上記安定化浴中には画像を安定化する目的
で各種化合物が添加される。例えば膜pHを調整する(
例えばpH3〜8)ための各種の緩衝剤(例えばホウ酸
塩、メタホウ酸塩、ホウ砂、リン酸塩、炭酸塩、水酸化
カリ、水酸化ナトリウム、アンモニア水、モノカルボン
酸、ジカルボン酸、ポリカルボン酸などを組み合わせて
使用)やホルマリンなどのアルデヒドを代表例として挙
げることができる。その他、キレート剤、殺菌剤(チア
ゾール系、イソチアゾール系、ハロゲン化フェノール、
スルファニルアミド、ベンゾトリアゾールなど)、界面
活性剤、蛍光増白剤、硬膜剤などの各種添加剤を使用し
てもよく、同一もしくは異種の目的の化合物を2種以上
併用しても良い。Various compounds are added to the stabilizing bath for the purpose of stabilizing the image. For example, adjusting membrane pH (
various buffering agents (e.g. borates, metaborates, borax, phosphates, carbonates, potassium hydroxide, sodium hydroxide, aqueous ammonia, monocarboxylic acids, dicarboxylic acids, Typical examples include aldehydes such as formalin (used in combination with carboxylic acids, etc.) and formalin. In addition, chelating agents, fungicides (thiazole type, isothiazole type, halogenated phenol,
Various additives such as sulfanilamide, benzotriazole, etc.), surfactants, optical brighteners, and hardening agents may be used, and two or more compounds for the same or different purposes may be used in combination.
【0138】また、処理液の膜pH調整剤として塩化ア
ンモニウム、硝酸アンモニウム、硫酸アンモニウム、リ
ン酸アンモニウム、亜硫酸アンモニウム、チオ硫酸アン
モニウム等の各種アンモニウム塩を添加するのが画像保
存性を良化するために好ましい。[0138] Furthermore, it is preferable to add various ammonium salts such as ammonium chloride, ammonium nitrate, ammonium sulfate, ammonium phosphate, ammonium sulfite, and ammonium thiosulfate as a membrane pH adjusting agent for the processing solution in order to improve image storage stability.
【0139】上記の方法による水洗または安定浴温度及
び時間は0℃〜50℃で6秒〜1分が好ましいが15℃
〜40℃で6秒から30秒がより好ましく、更には15
℃〜40℃で6秒から15秒が好ましい。[0139] The water washing or stabilization bath temperature and time in the above method are preferably 0°C to 50°C and 6 seconds to 1 minute, but 15°C.
6 to 30 seconds at ~40°C, more preferably 15
C. to 40.degree. C. for 6 seconds to 15 seconds is preferred.
【0140】本発明の方法によれば、現像、定着及び水
洗された写真材料は水洗水をしぼり切る、すなわちスク
イズローラ法を経て乾燥される。乾燥は約40℃〜約1
00℃で行なわれ、乾燥時間は周囲の状態によって適宜
変えられるが、通常は約5秒〜1分でよいが、より好ま
しくは40℃〜80℃で約5秒〜30秒である。According to the method of the present invention, the developed, fixed and washed photographic material is dried by squeezing out the washing water, that is, by using a squeeze roller method. Drying is about 40℃~about 1
The drying time is suitably changed depending on the surrounding conditions, but is usually about 5 seconds to 1 minute, more preferably about 5 seconds to 30 seconds at 40 to 80 degrees Celsius.
【0141】本発明においては、感光材料における膨潤
百分率を低減する程その乾燥時間を短縮できるという更
に優れた効果を発揮する。In the present invention, an even more excellent effect is exhibited in that the lower the swelling percentage of the photosensitive material, the shorter the drying time thereof.
【0142】本発明の方法によれば、現像、定着、水洗
及び乾燥されるまでのいわゆる Dryto Dryの
処理時間は100秒以内、好ましくは60秒以内で処理
されることである。ここで“dry to dry”と
は処理される感材の先端が自現機のフィルム挿入部分に
入った瞬間から、処理されて、同先端が自現機から出て
くる瞬間までの時間を言う。According to the method of the present invention, the so-called Dry to Dry processing time from development, fixing, washing with water, and drying is within 100 seconds, preferably within 60 seconds. Here, "dry to dry" refers to the time from the moment the leading edge of the photosensitive material to be processed enters the film insertion area of the processor to the moment the leading edge emerges from the processor after being processed. .
【0143】[0143]
【実施例】以下に具体的実施例を示して、本発明を更に
詳しく説明する。EXAMPLES The present invention will be explained in more detail with reference to specific examples below.
【0144】実施例1
〔乳剤(A)の調製方法〕
次に示すA液、B液、C液の溶液を用いて塩臭化銀乳剤
を調製した。
<溶液A>
オセインゼラチン
17g ポリイソプロピレン−ポリエチレンオキシジ
コハク酸 エステルナトリウム塩10%エタノール水
溶液 5ml 蒸留
水
1280ml<溶液B>
硝酸銀
170g 蒸留水
410ml<溶液C>
塩化ナトリウム
45.0g 臭化カリウム
27.4g 三塩化ロジウム3水塩
28μg ポリイソプロピレ
ンオキシジコハク酸エステルナトリウム塩 10%エ
タノール溶液
3ml オ
セインゼラチン
11g
蒸留水
407ml
溶液Aを40℃に保温した後EAg値が160mVにな
る様に塩化ナトリウムを添加した。Example 1 [Preparation method of emulsion (A)] A silver chlorobromide emulsion was prepared using the following solutions A, B and C. <Solution A> Ossein gelatin
17g Polyisopropylene-polyethyleneoxydisuccinic acid ester sodium salt 10% ethanol aqueous solution 5ml Distilled water
1280ml <Solution B> Silver nitrate
170g distilled water
410ml <Solution C> Sodium chloride
45.0g potassium bromide
27.4g Rhodium trichloride trihydrate
28 μg Polyisopropylene oxydisuccinate sodium salt 10% ethanol solution
3ml ossein gelatin
11g
Distilled water
After keeping 407 ml of solution A at 40° C., sodium chloride was added so that the EAg value was 160 mV.
【0145】次に特開昭57−92523号と同57−
92524号記載の混合撹拌機を用いて、ダブルジェッ
ト法にて溶液B及び溶液Cを添加した。[0145] Next, JP-A-57-92523 and JP-A-57-92523
Solution B and solution C were added by a double jet method using the mixer described in No. 92524.
【0146】添加流量は表−1に示した様に、全添加時
間80分の間に亘って、徐々に添加流量を増加させEA
g値を一定に保ちながら添加を行った。[0146] As shown in Table 1, the addition flow rate was gradually increased over the total addition time of 80 minutes.
The addition was carried out while keeping the g value constant.
【0147】EAg値は160mVより添加開始5分後
に3ml/lの塩化ナトリウム水溶液を用いてEAg値
120mVに変化させ、以後混合の完了迄この値を維持
した。The EAg value was changed from 160 mV to 120 mV using a 3 ml/l aqueous sodium chloride solution 5 minutes after the start of addition, and this value was maintained thereafter until the completion of mixing.
【0148】EAg値を一定に保つため、3モル/lの
塩化ナトリウム水溶液を用いてEAg値を制御した。[0148] In order to keep the EAg value constant, the EAg value was controlled using a 3 mol/l aqueous sodium chloride solution.
【0149】[0149]
【表1】[Table 1]
【0150】EAg値の測定には、金属銀電極と、ダブ
ルジャンクション型飽和 Ag/AgCl比較電極を用
いた(電極の構成は、特開昭57−197534号に開
示されるダブルジャンクションを使用した。)。For the measurement of the EAg value, a metal silver electrode and a double junction type saturated Ag/AgCl reference electrode were used (the electrode configuration was a double junction disclosed in JP-A-57-197534). ).
【0151】又、溶液B液、C液の添加には、流量可変
型のローラーチューブ定量ポンプを用いた。
又、添加中、乳剤のサンプリングにより、系内に新たな
粒子の発生が認められないことを電子顕微鏡により観察
し、確認している。A variable flow rate roller tube metering pump was used to add solutions B and C. Furthermore, during the addition, the emulsion was sampled and observed using an electron microscope to confirm that no new particles were generated within the system.
【0152】又、添加中、系のpH値を3.0に一定に
保つように3%硝酸水溶液で制御した。B液、C液を添
加終了後、乳剤は10分間オストワルド熟成した後、常
法により脱塩、水洗を行い、その後オセインゼラチンの
水溶液600ml(オセインゼラチン30g含有)を加
えて、55℃、30分間撹拌により分散した後、750
mlに調整した。乳剤(A)に対して金硫黄増感を施し
た後、臭化カリウムをハロゲン化銀1モル当たり500
mg添加し、次に増感色素Aを乳剤中に含まれるハロゲ
ン化銀1モルあたり300mg、10分間停滞した後、
安定剤として4‐ヒドロキシ‐6−メチル−1,3,3
a,7−テトラザインデンを加え、増感色素Bを乳剤中
に含まれるハロゲン銀1モルあたり100mg添加した
。During the addition, the pH value of the system was controlled to be kept constant at 3.0 using a 3% aqueous nitric acid solution. After adding Solutions B and C, the emulsion was subjected to Ostwald ripening for 10 minutes, and then desalted and washed with water using a conventional method. Then, 600 ml of an aqueous solution of ossein gelatin (containing 30 g of ossein gelatin) was added, and the emulsion was heated at 55°C. After dispersion by stirring for 30 minutes, 750
Adjusted to ml. After gold-sulfur sensitization was applied to emulsion (A), 500% potassium bromide was added per mole of silver halide.
Then, 300 mg of sensitizing dye A was added per mole of silver halide contained in the emulsion, and after stagnation for 10 minutes,
4-hydroxy-6-methyl-1,3,3 as a stabilizer
a,7-tetrazaindene was added, and 100 mg of sensitizing dye B was added per mole of silver halide contained in the emulsion.
【0153】[0153]
【化40】[C40]
【0154】次いでハロゲン化銀1モル当り一般式〔I
〕のテトラゾリウム化合物を表1に示す量加え、更にp
−ドデシルベンゼンスルホン酸ソーダ300mg、スチ
レン−マレイン酸共重合体がポリマー2g、スチレン−
ブチルアクリレート−アクリル酸共重合体ラテックス(
平均粒径約0.25μm)1.25g/m2を加えて、
Ag量4.0g/m2、ゼラチン量2.00/m2にな
るように特開昭59−19941号実施例(1)に記載
の下引を施したポリエチレンテレフタレートフィルムベ
ース上に塗布した。その際ゼラチン量0.75g/m2
になるように延展剤として、ビス−(2ーエチルヘキシ
ル)スルホコハク酸エステルを10mg/m2、更に表
−1に示すごとく染料を加え、硬膜剤としてホルマリン
15g/m2、グリオキザール8mg/m2を含む保護
層を同時重層塗布した。表−2にその試料の構成を示す
。Next, per mole of silver halide, general formula [I
] was added in the amount shown in Table 1, and further p
- 300 mg of sodium dodecylbenzenesulfonate, 2 g of styrene-maleic acid copolymer, styrene-
Butyl acrylate-acrylic acid copolymer latex (
Add 1.25 g/m2 (average particle size approximately 0.25 μm),
It was coated onto a polyethylene terephthalate film base which had been subbed as described in Example (1) of JP-A-59-19941 so that the amount of Ag was 4.0 g/m2 and the amount of gelatin was 2.00/m2. At that time, the amount of gelatin is 0.75g/m2
As a spreading agent, 10 mg/m2 of bis-(2-ethylhexyl)sulfosuccinate was added, and dyes as shown in Table 1 were added, and as a hardening agent, formalin 15 g/m2 and glyoxal 8 mg/m2 were added. The layers were coated simultaneously. Table 2 shows the composition of the sample.
【0155】[0155]
【表2】[Table 2]
【0156】得られた試料の一部に明朝体−ゴシック体
が混在した線画原稿を撮影し、感度及び明朝−ゴシック
再現性を評価した。また別の一部を用いて目伸ばし撮影
(100%→200%の拡大)を行った。ただし試料1
については目伸ばしの後、さらにリーフィルターNo.
101を用いて露光した。A line drawing manuscript in which Mincho and Gothic fonts were mixed in a part of the obtained sample was photographed, and the sensitivity and Mincho-Gothic reproducibility were evaluated. In addition, another part of the image was used for eye-extension photography (enlargement from 100% to 200%). However, sample 1
After stretching the eyes, apply Lee filter No.
101 was used for exposure.
【0157】露光を与えた試料は、下記の処方による現
像液及び定着液を用いて自動現像機にて処理した。[0157] The exposed sample was processed in an automatic processor using a developer and a fixer having the following formulation.
【0158】<現像処理条件>
(工程) (温度) (時
間)現像 28℃
30秒定着 28
℃ 約20秒水洗
常温 約20秒乾燥
50℃ 1
5秒<現像液処方>
(組成A)
純水(イオン交換水)
150ml エチレンジアミン四酢酸2ナトリウム塩
2g ジ
エチレングリコール
50g
亜硫酸カリウム(55%w/v水溶液)
100ml
炭酸カリウム
50g ハイドロキノン
15g 5−メチルベンゾトリアゾール
200mg 1−フェニル−5−メルカプ
トテトラゾール
30mg 水酸化カリウム 使用液のpHを
10.4にする量 臭化カリウム
4.5g(組成B)
純水(イオン交換水)
3ml ジエチレングリコール
50g エチレンジアミン四酢酸2ナトリウム塩
25mg
酢酸(90%水溶液)
0.3ml 5−ニトロインダゾール
110mg 1−フェニル−3−ピラゾリド
ン
700mg ブチルアミンジエタノー
ルアミン
15g
現像液の使用時に水500ml中に上記組成A、組
成Bの順に溶かし、1lに仕上げて用いた。
<定着液処方>
(組成A)
チオ硫酸アンモニウム(72.5%w/v水溶液)
240ml
亜硫酸ナトリウム
1
7g 酢酸ナトリウム・3水塩
6.5g 硼酸
6g クエン酸ナトリウム・2
水塩
2g 酢酸(90%w/w水溶液)
13.6ml(組成B)
純水(イオン交換水)
17ml 硫酸(50%w/w水溶液)
4.7g 硫酸アルミニウム(Al2O
3換算含量が8.1%w/wの水溶液)
26.5g
定着液の使用時に水500ml中に上記組成A、組成B
の順に溶かし、1lに仕上げて用いた。この定着液のp
Hは約4.3であった。<Development processing conditions> (Step) (Temperature) (Time) Development 28°C
Fix for 30 seconds 28
℃ Rinse with water for about 20 seconds
Dry at room temperature for about 20 seconds
50℃ 1
5 seconds <Developer prescription> (Composition A) Pure water (ion exchange water)
150ml ethylenediaminetetraacetic acid disodium salt 2g diethylene glycol
50g
Potassium sulfite (55% w/v aqueous solution)
100ml
potassium carbonate
50g hydroquinone
15g 5-methylbenzotriazole
200mg 1-phenyl-5-mercaptotetrazole
30mg Potassium hydroxide Amount to adjust the pH of the working solution to 10.4 Potassium bromide
4.5g (composition B) Pure water (ion exchange water)
3ml diethylene glycol
50g Ethylenediaminetetraacetic acid disodium salt
25mg
Acetic acid (90% aqueous solution)
0.3ml 5-nitroindazole
110mg 1-phenyl-3-pyrazolidone
700mg Butylamine diethanolamine
15 g When using a developer, the above composition A and composition B were dissolved in 500 ml of water in that order to make up to 1 liter. <Fixer formulation> (Composition A) Ammonium thiosulfate (72.5% w/v aqueous solution)
240ml
sodium sulfite
1
7g Sodium acetate trihydrate
6.5g boric acid
6g Sodium citrate 2
water salt
2g acetic acid (90% w/w aqueous solution)
13.6ml (composition B) Pure water (ion exchange water)
17ml sulfuric acid (50% w/w aqueous solution)
4.7g aluminum sulfate (Al2O
Aqueous solution with 3 equivalent content of 8.1% w/w)
26.5g When using the fixer, add the above composition A and composition B in 500ml of water.
These were dissolved in the following order and used in a final volume of 1 liter. This fixer p
H was approximately 4.3.
【0159】処理し得られた試料を次ぎのごとく評価し
た。感度は各々の試料1のリーフィルターなしを100
とし、相対感度で示した。The treated samples were evaluated as follows. Sensitivity is 100 without Lee filter for each sample 1
and expressed as relative sensitivity.
【0160】キレは明朝体の細線を100倍のルーペで
観察し、フリンジの有無から評価した。ランク5が最良
で、ランク3は市場に受け入れられる下限であり、それ
以下は特殊な用途にのみ使用することができる。Sharpness was evaluated by observing the fine lines of the Mincho font with a 100x magnifying glass and checking the presence or absence of fringes. Rank 5 is the best, rank 3 is the lower limit of market acceptance, and anything below can only be used for special applications.
【0161】明朝−ゴシック再現性は、明朝体の50μ
mの細線原稿(ポジ)を50μmのネガに返した時、ゴ
シック体文字中の巾50μmの白ヌケの部分が何μmの
黒化部になるかを示したものであり、50μmに近い程
、優れる。[0161] Mincho-Gothic reproducibility is 50μ of Mincho typeface.
This shows how many micrometers of blackened part the 50-μm-width blank part of Gothic letters becomes when a 50-μm-wide negative is turned into a 50-μm negative.The closer it is to 50 μm, the Excellent.
【0162】目伸ばしについては、網%が95%の原稿
が5%になる露光条件で撮影した時、49%の原稿が何
%になるかで評価を行った。51%に近い程優れている
。[0162] Regarding eye stretching, evaluation was made based on what percentage the original with a dot percentage of 49% would be when photographed under exposure conditions where the original with a halftone percentage of 95% would be 5%. The closer it is to 51%, the better.
【0163】以上の評価結果を表−3に示した。[0163] The above evaluation results are shown in Table 3.
【0164】[0164]
【表3】[Table 3]
【0165】以上の結果より、感光性層より非感光性層
に染料を添加することにより、線画のキレを損なうこと
なく明朝体−ゴシック体再現性、目伸ばし性を良好に改
善することができた。特に染料の添加量はlogEで−
0.1〜−0.2減感させる量添加することが効果が大
きい。[0165] From the above results, by adding dye to the non-photosensitive layer rather than the photosensitive layer, it is possible to improve Mincho-Gothic type reproducibility and eye-stretching properties without impairing the sharpness of line drawings. did it. In particular, the amount of dye added is logE -
Adding an amount that desensitizes by 0.1 to -0.2 is most effective.
【0166】実施例2
(ハロゲン化銀写真感光材料の調製)
両面に厚さ0.1μmの下塗層(特開昭59−1994
1号の実施例1参照)を施した厚さ100μmのポリエ
チレンテレフタートフィルムの一方の下塗層上に、下記
処方(1)のハロゲン化銀乳剤層をゼラチン量が2.0
g/m2になる様に塗設し、さらにその上に下記処方(
2)の保護層をゼラチン量が1.5g/m2になる様に
塗設し、また反対側のもう一方の下塗層上には下記処方
(3)に従ってバッキング層をゼラチン量が2.7g/
m2になる様に塗設し、さらにその上に下記処方(4)
の保護層をゼラチン量が1g/m2になる様に塗設して
各試料No.1〜15を得た。Example 2 (Preparation of silver halide photographic light-sensitive material) Undercoat layer with a thickness of 0.1 μm on both sides (Japanese Patent Laid-Open No. 59-1994
A silver halide emulsion layer having the following formulation (1) with a gelatin amount of 2.0 was applied on one undercoat layer of a 100 μm thick polyethylene tereftate film coated with a polyethylene tereftate film (see Example 1 of No. 1).
g/m2, and then apply the following formulation (
The protective layer of 2) was coated with a gelatin amount of 1.5 g/m2, and on the other undercoat layer on the opposite side, a backing layer was coated with a gelatin amount of 2.7 g according to the following recipe (3). /
Coat it so that it is m2, and then apply the following prescription (4) on top of it.
A protective layer with a gelatin amount of 1 g/m2 was applied to each sample No. 1 to 15 were obtained.
【0167】
処方(1)(ハロゲン化銀乳剤層組成) ゼラチ
ン
2
.0g/m2ハロゲン化銀乳剤A
平均粒径0.2μmの沃臭化銀(沃化銀2モル%)
銀量 3.5g/m2 カブリ防
止剤:ハイドロキノン
25mg/m2 安定剤
:4−メチル−6−ヒドロキシ−1,3,3a,7−テ
トラザインデン 30mg/m2 界面活性剤:サポ
ニン
0.1g/m2本発明に係
るヒドラゾン化合物
表−3に示す量Prescription (1) (Silver halide emulsion layer composition) Gelatin
2
.. 0g/m2 Silver halide emulsion A Silver iodobromide (silver iodide 2 mol%) with an average grain size of 0.2 μm
Silver amount 3.5g/m2 Antifoggant: Hydroquinone
25mg/m2 Stabilizer: 4-methyl-6-hydroxy-1,3,3a,7-tetrazaindene 30mg/m2 Surfactant: Saponin
0.1g/m2 Hydrazone compound according to the present invention
Quantities shown in Table-3
【0168】[0168]
【化41】[C41]
【0169】
処方(2)〔乳剤保護層組成〕
ゼラチン
1.5g/m2 染料
表−4に記載 マット剤:平
均粒径3.0〜5.0μmのポリチメルメタクリレート
0.05g/m2 コロイダルシリカ
0.02g/m2 界面活性剤S
:Prescription (2) [Emulsion protective layer composition] Gelatin
1.5g/m2 dye
Listed in Table 4 Matting agent: Polythimel methacrylate with an average particle size of 3.0 to 5.0 μm 0.05 g/m2 Colloidal silica
0.02g/m2 Surfactant S
:
【0170】[0170]
【化42】[C42]
【0171】
ゼラチン
2.7g/m2 界面活性剤:サポニン
0.1g/m2 硬膜剤:グリオ
キザール
0.01g/m2 ドデ
シルベンゼンスルホン酸ナトリウム
0.01g/m2 処方(4
)〔バッキング保護層組成〕 ゼラチン
1g/m2 マ
ット剤:平均粒径3.0〜5.0μmのポリメチルメタ
キリート 0.05g/m2 界面活性剤S:
0.01g/m2硬
膜剤:グリオキザール
0.01
g/m2
試料の構成を表−4に示す。この試料を下記の現像
処理を行った。Gelatin
2.7g/m2 Surfactant: Saponin
0.1g/m2 Hardening agent: Glyoxal
0.01g/m2 Sodium dodecylbenzenesulfonate
0.01g/m2 prescription (4
) [Backing protective layer composition] Gelatin
1 g/m2 Matting agent: Polymethyl methacrylate with an average particle size of 3.0 to 5.0 μm 0.05 g/m2 Surfactant S:
0.01g/m2 Hardener: Glyoxal
0.01
g/m2 The composition of the sample is shown in Table 4. This sample was subjected to the following development treatment.
【0172】[0172]
【表4】[Table 4]
【0173】
現像液処方
エチレンジアミン四酢酸二ナトリウム塩
1g 亜硫酸ナトリ
ウム
表−1に示す量 ハイド
ロキノン
35g
5−アミノ−1−ペンタノール
50
g 臭化カリウム
2.5g 5−メチルペンゾトリアゾール
0.3g 1−フェニル−3−ピラゾリドン
表−1に示す量 水を加えて1lとし、水酸化ナト
リウムにてpHを11.5に調整する。Developer formulation Ethylenediaminetetraacetic acid disodium salt
1g sodium sulfite
Amount shown in Table-1 Hydroquinone
35g
5-amino-1-pentanol
50
g potassium bromide
2.5g 5-methylpenzotriazole
0.3g 1-phenyl-3-pyrazolidone
Add the amount of water shown in Table 1 to make 1 liter, and adjust the pH to 11.5 with sodium hydroxide.
【0174】定着液は実施例1のものと同じである。The fixer was the same as in Example 1.
【0175】
得られた試料について実施例と同様な評価を行い、結果
を表−5に示した。[0175] The obtained samples were evaluated in the same manner as in the examples, and the results are shown in Table 5.
【0176】[0176]
【表5】[Table 5]
【0177】表−5から実施例1と同様な効果を得るこ
とが出来た。[0177] From Table 5, it was possible to obtain the same effects as in Example 1.
【0178】実施例3
実施例2における一般式〔II〕の化合物II−20の
代わりに一般式〔III〕の化合物III−39を使用
して実施例2と全く同様の方法で試料を作成し現像処理
を行い、評価した結果同様な効果を得ることができた。Example 3 A sample was prepared in exactly the same manner as in Example 2, using Compound III-39 of general formula [III] in place of Compound II-20 of general formula [II] in Example 2. As a result of development and evaluation, similar effects could be obtained.
【0179】実施例4
下記に示す現像処理条件を変更する以外は、実施例1と
全く同様な方法で試料を作成し、現像処理を行い評価を
した。Example 4 A sample was prepared in exactly the same manner as in Example 1, except that the developing conditions shown below were changed, and the sample was developed and evaluated.
【0180】結果を表−6に示す。[0180] The results are shown in Table 6.
【0181】[0181]
【0182】[0182]
【表6】[Table 6]
【0183】表−6から超迅速処理をするとさらに明ゴ
再現性、目伸し性が良化することが確認された。[0183] From Table 6, it was confirmed that the ultra-rapid treatment further improved the color reproducibility and the eye-stretchability.
【0184】[0184]
【発明の効果】本発明により、線画のズレを劣化させず
に、明朝体及びゴシック体の再現性を改良するとともに
、フィルターを用いずに同等の目伸ばしを得ることので
きる印刷製版用感光材料を提供することができた。Effects of the Invention: The present invention provides a photosensitive material for printing plate making that improves the reproducibility of Mincho typefaces and Gothic typefaces without deteriorating the deviation of line drawings, and can obtain equivalent eye extension without using a filter. were able to provide the materials.
Claims (2)
塗設層を有するハロゲン化銀写真感光材料において、該
乳剤層が400〜500nmの領域に分光増感されてお
り、かつ350〜500nmに吸収ピークを有する染料
を感光層と同じ側で支持体から遠い非感光層に添加し、
かつ下記一般式〔I〕または〔II〕または〔III〕
の化合物を感光性層に含有することを特徴とするハロゲ
ン化銀写真感光材料。Claims: 1. A silver halide photographic material having at least two coated layers on the same side of a support, wherein the emulsion layer is spectrally sensitized in the 400-500 nm region, and A dye having an absorption peak at 500 nm is added to the non-photosensitive layer on the same side as the photosensitive layer and far from the support,
and the following general formula [I] or [II] or [III]
1. A silver halide photographic material, characterized in that the photosensitive layer contains a compound of the following.
−0.05〜−0.3低下する量を含有させることを特
徴とする請求項1記載のハロゲン化銀写真感光材料。 【化1】 〔式中、R31は1価の有機残基を表し、R32は水素
原子または1価の有機残基を表し、Q1及びQ2は水素
原子、アルキルスルホニル基(置換基を有するものも含
む)、アリールスルホニル基(置換基を有するものも含
む)を表し、X1は酸素原子またはイオウ原子を表す。 一般式〔I〕で表される化合物のうち、X1が酸素原子
であり、かつR32が水素原子である化合物が更に好ま
しい。〕2. The silver halide photographic material according to claim 1, wherein the dye according to claim 1 is contained in an amount that lowers the sensitivity by -0.05 to -0.3 in LogE. [Formula, R31 represents a monovalent organic residue, R32 represents a hydrogen atom or a monovalent organic residue, Q1 and Q2 represent a hydrogen atom, an alkylsulfonyl group (some with substituents) ), represents an arylsulfonyl group (including those having a substituent), and X1 represents an oxygen atom or a sulfur atom. Among the compounds represented by the general formula [I], compounds in which X1 is an oxygen atom and R32 is a hydrogen atom are more preferred. ]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9217491A JPH04218039A (en) | 1990-05-07 | 1991-04-23 | Silver halide photosensitive material |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2-117054 | 1990-05-07 | ||
JP11705490 | 1990-05-07 | ||
JP2-133113 | 1990-05-23 | ||
JP9217491A JPH04218039A (en) | 1990-05-07 | 1991-04-23 | Silver halide photosensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04218039A true JPH04218039A (en) | 1992-08-07 |
Family
ID=26433642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9217491A Pending JPH04218039A (en) | 1990-05-07 | 1991-04-23 | Silver halide photosensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04218039A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06130554A (en) * | 1992-10-22 | 1994-05-13 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material and processing method therefor |
-
1991
- 1991-04-23 JP JP9217491A patent/JPH04218039A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06130554A (en) * | 1992-10-22 | 1994-05-13 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material and processing method therefor |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3078431B2 (en) | Method for developing black-and-white silver halide photographic materials | |
JP3781200B2 (en) | Processing method of silver halide photographic light-sensitive material | |
JPH0627599A (en) | Processing method for silver halide photographic sensitive material | |
JP2686983B2 (en) | Processing method of silver halide photographic material | |
JPH06123943A (en) | Development processing method for black-and-white silver halide photosensitive material | |
JPH04218039A (en) | Silver halide photosensitive material | |
JPH0310245A (en) | Method for processing silver halide photographic sensitive material | |
JPH02230137A (en) | Method for processing silver halide photographic sensitive material | |
USH1508H (en) | Image-forming process | |
JPS63284546A (en) | Liquid fixer for silver halide photographic sensitive material which forbids generation of precipitate and gaseous acetic acid | |
JP2694381B2 (en) | Processing method of black and white silver halide photographic material | |
JP3248004B2 (en) | Processing method and processing agent for black-and-white silver halide photographic material | |
JP2844018B2 (en) | Silver halide photographic material and processing method | |
JP2684257B2 (en) | Developing method of silver halide photographic material | |
JPH0193737A (en) | Developing method | |
JP3430021B2 (en) | Developing method of silver halide photographic material | |
JP3141216B2 (en) | Processing method of silver halide photographic material | |
JP3476561B2 (en) | Processing method of silver halide photographic material | |
JPH07104442A (en) | Processing method for silver halide photographic material | |
JPH07295128A (en) | Black-and-white silver halide photographic sensitive material and image forming method | |
JPH04284444A (en) | Silver halide photosensitive material | |
JPH10246935A (en) | Method for processing silver halide photographic sensitive material | |
JPH023031A (en) | Silver halide photographic sensitive material | |
JPS6334543A (en) | Method for forming negative image having high contrast | |
JPH10246937A (en) | Developing composition for black-and-white silver halide photographic sensitive material |