JPH0310245A - Method for processing silver halide photographic sensitive material - Google Patents

Abstract

PURPOSE:To obviate the decrease in contrast, the increase in sensitivity and the increase in fogging during the preservation at and under a high temp. and high humid ity by incorporating at least one kind of specific compds. into at least one layer of hydrophilic colloidal layers adjacent to emulsion layers and processing the photosensi tive material by using an automatic developing machine. CONSTITUTION:At least one kind of the compds. expressed by formula I are incorpo rated into at least one layer of the hydrophilic colloidal layers adjacent to the emulsion layers and the photosensitive material is proccessed by using the automatic developing machine. The processing time to the developing, fixing and rinsing and/or stabilizing thereof is within 45 seconds. In the formula, R1 denotes hydrogen or an acetyl group; R2 to R4 denote hydrogen or substd. or unsubstd. alkyl group. The amt. of the compds. to be added varies with the kind of the photosensitive material, the compsn. of silver halide, the compds., etc., and is preferably in a 0.1 to 1000mg, more preferably 1 to 500mg range per 1mol silver halide in the adjacent silver halide emulsion layers. The generation of the fogging is suppressed and the soft contrast is not obtd. even if the photosensitive material is preserved at and under the high temp. and high humidity.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a silver halide photographic light-sensitive material, and more particularly to a method for processing a light-sensitive material having a high contrast printing layer.

[Background of the invention]

In recent years, the consumption of silver halide photographic materials has continued to increase. For this reason, the number of silver halide photographic materials to be processed is increasing, and there is a demand for speeding up the development process, that is, increasing the amount of processing within the same amount of time.

The above trend can also be seen in the field of printing plate making.

Due to the rapid increase in the immediacy of information and the rapid increase in the number of times, the turnaround time for printing and prepress work has become shorter, and it has become necessary to handle larger quantities.

In order to meet the demands of the printing plate making industry, there is a need to simplify the printing process and process printing plate films more quickly.

The photoengraving process using silver halide photographic light-sensitive materials involves the process of converting a continuous tone original into a halftone image, that is, a collection of halftone dots having an area proportional to the continuous tone density change. and a step of converting the halftone dot image obtained in this step into a halftone dot image with better sharpness, that is, a turning step.

It is essential that the photosensitive materials used in these processes have high contrast in order to obtain good halftone dot quality.

Conventionally, a method to obtain such characteristics is to process a photosensitive material made of a silver chlorobromide emulsion with relatively fine grains, a narrow particle size distribution, and a high silver chloride content using an alkaline hydroquinone developer with a very low sulfite ion concentration. A so-called lithographic development method is known.

However, when this method is used, the storage stability is extremely poor due to the low concentration of sulfite ions in the developer, and the development speed is slow due to the use of hydroquinone as a single principal agent, making rapid processing impossible.

Therefore, so-called P contains a super-additive developing agent that has good storage stability and can be processed quickly, and contains a relatively high concentration of sulfite.
It is desired to develop a new photosensitive material that can obtain high contrast by processing with a Q-type or MQ-type developer.

Regarding this new light-sensitive material,
．． No. 7825, No. 59-17818, No. 59-178
], No. 9, No. 59-17820, No. 59-17821
No. 59-17826, No. 5917822,
Silver halide photographic light-sensitive materials containing tetrazolium compounds are also disclosed in JP-A-53-1-6623 and JP-A-53-2.
No. 0927, No. 53-84714, No. 57-5813
No. 7 and the like disclose silver halide photographic materials containing a hydrazine compound.

The method of processing a photosensitive material containing these compounds with a super-additive developer to obtain a silver image with high contrast can be said to be an extremely revolutionary technology compared to conventional technology.
In recent years, it has become the mainstream of photoengraving processes.

However, if the gradations of silver halide photographic materials are kept at very high contrast and high sensitivity, their storage stability under high temperature and high humidity conditions deteriorates significantly, especially the occurrence of fogging and drag (softening of contrast). This has the serious drawback of causing

[Purpose of the invention]

An object of the present invention is to provide a silver halide photographic light-sensitive material that suppresses the occurrence of fog and does not soften in contrast even when stored under high temperature and high humidity conditions.

[Structure of the invention]

The above object of the present invention is to provide a silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support, in which at least one hydrophilic colloid layer adjacent to the emulsion layer has the following properties: - Contains at least one compound represented by Noshiro % formula % [VI],
Furthermore, in the present invention, a silver halogen copy is processed using an automatic developing machine, and the processing time for developing, fixing, washing with water and/or stabilizing solution is within 45 seconds. It is effective to process using an automatic processor with a speed of 1000 mm/sec or more.

General formula [I] p+ R4 represents hydrogen or a substituted or unsubstituted alkyl group. ] Noshiro (I+) represents an atom, a 21-mouth group, an amino group, a cyano group, a hydroxycarbonyl group, an alkoxycarbonyl group, an alkylcarbonyl group, a hydroxy group, a mercapto group, or a sulfo group.

Also, A represents a nitrogen atom, a carbon atom, or an oxygen atom, and B
represents a nitrogen atom or a carbon atom. When A represents a carbon atom, n2 is 2, when A represents a nitrogen atom, n2 is l, and when A represents an oxygen atom, n2 is 0.

Further, when B represents a carbon atom, nl is l, and when B represents a nitrogen atom, nl is O. ] General Noshiro III)
- Noshiro [IV] [In the formula, Y and Y2 represent a hydrogen atom or a mercapto group, and R4 is a substituted or unsubstituted alkyl group, alkenyl group, alkynyl group, aryl group or alkoxy group, or a hydrogen atom.] Roge-Noshiro [■] -Noshiro [■] [In the formula, R1, R3 and R3 may be the same or different, and each is a hydrogen atom, a halogen atom, an amino group, a substituted amino group, an alkyl group, a substituted alkyl group , aryl group,
Substituted aryl group, cycloalkyl group, substituted cycloalkyl group, mercapto group, substituted mercapto group or -〇〇NH
R, group (R, hydrogen atom, halogen atom, alkyl group,
Represents a substituted alkyl group, amino group, substituted amine group, cycloalkyl group, substituted cycloalkyl group, aryl group, or substituted allyl group. ), and R1 and R2 may be combined to form a ring. ] The present invention will be explained in more detail below.

First, examples of compounds represented by the general formulas CI) and [■] will be given. However, it goes without saying that the compounds used in the present invention are not limited to the exemplified compounds below.

I-11-phenyl-3-pyrazolidone r-21-phenyl-4-methyl-3-pyrazolidone 1-3 1-phenyl-4,4-dimethyl-3-pyrazolidone I-41-phenyl-5-methyl-3- Pyrazolidone I
-51-phenyl-4-methyl-4'-hydroxymethyl-3-pyrazolidone 1-6 1-phenyl-44-dihydroxymethyl-3
Virasoliton -71-phenyl-4,4-di-n-propyl-3-
Pyrazolidone ■-81-phenyl-2-acetyl-4,4-dimethyl-3-pyrazolidone (exemplary compound) 11-1 Benzotriazole l1-2 5-methylbenzotriazole ■-35-Chlorpenztriazole ■-45-2l. Lobenzotriazole 11-5 5-
Ethylbenzotriazole 1-6 II-7 1-8 I[-9 ■ -10 1-11 -12 1-13 II-14 -15 -16 l-17 l-18 ■ -19 ■ -20 ■ -21 ■ -22 ■ -23 1 Hydroxylbenzotriazole 5-Hydroxybenzotriazole 5-Aminobenzotriazole 5-Sulfonebenzo 1 Heliazole 5-Cyanobenzotriazole 5-Methoxybenzotriazole 5-ethoxybenzo)・Xybenzo)・Riazole 5 -mercaptobenzotriazolebenzimidazole 5-sulfobenzimidazole 5-methoxybenzimidazole 5-chloropenzimita/-mercaptobenzotriazole 6-nitroindazole 5-sulfoindazolebenzoxazole 2-olcapto-5-sulfobenzimidacyl 2-Mercaptobenzoxazole 2 The amount of the compound represented by the general formulas (I) and (II) of the present invention varies depending on the type of photosensitive material, silver halide composition, compound, etc., but in general, 0.1-1000 m per mole of silver halide in adjacent silver halide emulsion layers
g is preferred, and a range of l -500 mg is particularly preferred.

Next, the hydroxytetrazaindene compounds represented by -Noshiro CIII) to [■] will be explained.

In general formulas [III] to [■], examples of the alkyl group represented by R1-R4 include methyl, ethyl, propyl, l-propyl, S-butyl, t-butyl, pentyl, hexyl, octyl, 2- Various groups such as norbornyl are mentioned, and substituted alkyl groups include aralkyl groups (e.g., benzyl, phenethyl, benzhydryl, l-naphthylmethyl, 3-phenylbutyl, etc.), alkoxyalkyl groups (e.g., methoxymethyl, 2-methoxyethyl, 3
-ethoxypropyl, 4-methquine butyl, etc.), talolomethyl, hydroxymethyl, 3-hydroquinebutyl, carboxymethyl, 2-carboxyethyl, 2-(methquinecarbonyl)ethyl, aminomethyl, diethylaminemethyl, benzoylaminoethyl, etc. , the above general formula [
Examples include alkyl groups substituted with monovalent groups obtained by removing one hydrogen atom from the compounds represented by [III] to [VI].

Examples of the aryl group represented by R1-R1 include phenyl group, ■-naphdyl group, etc., and examples of substituted aryl groups include p-tolyl, nl-ethylphenyl,
rll-cumenyl, mesidel, 2,3-ginolyl, p-
Chlorophenyl, o-bromophenyl, p-hydroxyphenyl, 1-hydroxy-2-su7tyl, 1j1-methoxyphenyl, p-ethoxyphenyl, p-carboquinphenyl, 0-(methoxycarbonyl)phenyl, m
-(ethoxycarbonyl)phenyl, 4-carboquine
Examples include various groups such as -naphthyl.

Examples of the cycloalkyl group represented by R3-R3 include cyclopentyl, nclohexyl, and /cloheptyl, and examples of the substituted cycloalkyl group include methylcyclohexyl.

Examples of the halokene atoms represented by R1 to R include atoms such as fluorine, chlorine, bromine, and iodine; examples of substituted amino groups represented by R1 to R4 include groups such as butylamino, diethylamino, anilino, etc. can be mentioned.

Examples of the substituted mercapto group represented by R2 to R include groups such as methylthio, ethylthio, and phenylthio.

Next, typical specific examples of the compound represented by the general formula (III), [:IV:], [:V) or [■] (hereinafter referred to as the tetrazaindene compound of the present invention) are shown. It is not limited.

(1) (2) (3) (4) 5 (5) (6) (■2) (I3) (7) (14) (15) (8) (9) (16) (17) (10) (11) (18) (19) (20) (21) (28) (29) (22) (23) (30) (31) (24) (25) (32) (33) (26) (27 ) The amount of the tetrazaindene compound added in the present invention varies depending on the type of light-sensitive material, silver halide composition, compound, etc., but generally it is 10% per mole of silver halide in the adjacent silver halide emulsion layer. ~5000mg is preferred, 300mg
A range of ˜2000 mg is particularly preferred.

The silver halide photographic material of the present invention comprises a support 9 coated with a hydrophilic colloid layer including at least one silver halide emulsion layer. Coated directly or via a hydrophilic colloid layer containing no silver halide emulsion,
A hydrophilic colloid layer as a protective layer may be further coated on the silver halide emulsion layer. The silver halide emulsion layer may also be divided into silver halide emulsion layers of different sensitivities, eg high and low sensitivity. An intermediate layer of a hydrophilic colloid layer may be provided between the silver halide emulsion layers, or an intermediate layer may be provided between the silver halide emulsion layer and the protective layer.

Specifically, one silver halide emulsion layer, which is a photosensitive layer, is provided on one side of the support, and one silver halide emulsion layer is provided on each side of the support.
One layer is provided on one side of the support, and two or more layers are provided on the other side with an intermediate layer belonging to a non-photosensitive layer interposed therebetween, and those with a non-photosensitive layer provided on both sides of the support. Examples include those provided with two or more layers. Incidentally, the surface of the support may be provided with a subbing layer belonging to a non-photosensitive layer or a protective layer 0 on the outermost surface, and various other materials may be provided as long as the performance is not degraded.

The hydrophilic colloid layer can be roughly divided into a photosensitive layer and a non-photosensitive layer. The photosensitive layer is typically a silver halide emulsion layer, and the non-photosensitive layers include a subbing layer, an intermediate layer, a protective layer and the like.

The layer containing the compounds CI) to [■] of the present invention is a hydrophilic colloid layer adjacent to the silver halide emulsion layer.

In order to incorporate the compounds represented by the general formulas [I] to (Vl) used in the present invention into the hydrophilic colloid layer, a method is employed in which both are dissolved in appropriate water and/or an organic solvent and then added, or an organic solvent Examples include a method of dispersing a solution in a hydrophilic colloid matrix such as gelatin or a gelatin derivative, and then adding the solution, or a method of adding the solution after dispersing it in a latin lath. The present invention may use any of these methods.

The compounds CI) to [■] of the present invention may be used alone,
Further, two or more types may be used in combination in an appropriate ratio.

Furthermore, the compound of the present invention and an inhibitor other than the present invention may be used in combination in an appropriate ratio.

The silver halide photosensitive material of the present invention is suitable for printing photosensitive materials, especially photosensitive materials for printing that can obtain high contrast [.] without using lithographic development, and is preferably expressed by the following general formula [■]. or a hydrazine compound represented by the general formula [■].

[In the formula, R, , R2 and R3 each represent a hydrogen atom or a substituent, and XO represents an anion. [General formula ■] A-N-N-B 1 R, R2 [In the formula, A represents an aliphatic group or an aromatic group, and B represents a polmyl group, an acyl group, an alkyl group, an arylsulfonyl group, an alkyl or represents an allylsulfinyl group, a carbamoyl group, an alkoxy or aryloquine carbonyl group, a sulfinamoyl group, an alkoxysulfonyl group, a thioacyl group, a thiocarbamoyl group, or a heterocyclic group, and R, R2 are both hydrogen atoms or one is hydrogen The other atom is a substituted or unsubstituted alkylsulfonyl group, or a substituted or unsubstituted arylsulfonyl group,
Or represents a substituted or unsubstituted acyl group. However, B
, R2 and the nitrogen atoms to which they are condensed may form a hydrazone partial structure -N=C\. ] Next, the compound of the above general formula [■] will be explained.

In the general formula [■], preferred examples of the substituent represented by R1 to R3 include an alkyl group (for example, methyl, ethyl, ncropropyl, propyl, isopropyl, cyclobutyl, butyl, isobutyl, pentyl, /chlorohexyl, etc.), and an amino group. , acylamide 7 group (e.g. acetylamino), hydroxyl group, alkoxy group (e.g. methoxy, ethoxy, 2:3 propoquine, butoxy, pentoxy, etc.), acyloxy group (e.g. acedeloxy), halokene atom (e.g. fluorine, chlorine, bromine) etc.), carbamoyl group, acylthio group (
(e.g. acetylthio), alkoxycarbonyl groups (e.g. aethquine carbonyl), carboxyl groups, acyl groups (e.g.
For example, groups such as acetyl), an ano group, a mercapto group, a sulfoxy group, and an aminosulfoxy group can be mentioned.

Examples of the anion represented by XO include halogen ions such as chloride ion, bromide ion, and iodide ion, acid groups of inorganic acids such as nitric acid, sulfuric acid, and perchloric acid, and acid groups of organic acids such as sulfonic acid and carboxylic acid. , anionic activator,
Specifically, lower alkylbenzene sulfonate anions such as p-toluenesulfonate anions, higher alkylbenzene sulfonate anions such as p-dodecylbenzenesulfonate anions, higher alkyl sulfate ester anions such as lauryl sulfate anions, tetraphenylboron, etc. boric acid anions such as di-2-ethylhexyl sulfosuccinate anions, polyether alcohol sulfate anions such as cetyl polyethenoxysulfate anions, higher fatty acid anions such as stearate anions, polyacrylic Examples include polymers such as acid anions with acid groups attached.

Specific examples of compounds represented by the general formula [■] used in the present invention are listed below, but the compounds of the present invention are not limited to these.

(Exemplary Compounds) 28 The tetrazolium compounds used in the present invention may be described, for example, in Chemical Review (Chemical Review).
s) It can be easily synthesized according to the method described in Vol. 55, pp. 335-483.

The tetrathulium compound represented by the general formula [■] of the present invention is contained in an amount of about 1 mg or more to 10 g, preferably about 10 mg or more per mol of silver halide contained in the silver halide photographic material of the present invention. It is preferable to use up to about 2 g.

The tetrathulium compounds represented by the general formula [■] used in the present invention may be used alone or in combination of two or more in an appropriate ratio. Furthermore, the tetrathulium compound of the present invention and the tetrathulium compound other than the present invention may be used in combination in an appropriate ratio.

In the present invention, particularly favorable results can be obtained when an anion that binds to the tetrazolium compound of the present invention and lowers the hydrophilicity of the tetrazolium compound of the present invention is used in combination. Examples of such anions include acid groups of inorganic acids such as perchloric acid, acid groups of organic acids such as sulfonic acids and carboxylic acids, anionic activators, and specifically lower alkylbenzenes such as p-toluenesulfonic acid anions. sulfonic acid anion,
p-dotecylbenzenesulfonate anions, alkylnaphthalenesulfonate anions, lauryl sulfate anions, tetraphenylporones, dialgyl sulfosuccinate anions such as cy-2-ethylhexylsulfosuccinate anions, cetyl polyetheno Examples include polyether alcohol sulfate anions such as quinsal 7ate anions, stearate anions, and polyacrylate anions.

Such anions may be mixed in advance with the tetrazolium compound of the present invention and then added to the hydrophilic colloid layer, or may be added alone to the silver halide emulsion layer containing or not containing the tetrazolium of the present invention or to the hydrophilic colloid layer. It can be added to the sexual colloid layer.

Next, the compound represented by the general formula [■] will be explained.

In Noshiro [■], the aliphatic group represented by A preferably has 1 to 3 carbon atoms, particularly 1 to 20 carbon atoms.
is a straight chain, branched or cyclic alkyl group. Here, the branched alkyl group may be cyclized to form a saturated heterocycle containing one or more heteroatoms therein. Also, this alkyl group is
It may have a substituent such as an aryl group, an alkokene group, a sulfoxy group, a sulponamide group, or a carbonamide group.

For example, L-butyl group, n-octyl group, t-octyl group, ncrohequinyl group, pyrrolidyl group, imidanolyl group,
Examples include a tetrahydrofuryl group and a morpholino group.

The aromatic group represented by A in Noshiro [■] is monocyclic or dicyclic.
It is a ring aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with a monocyclic or bicyclic aryl group to form a heteroaryl group.

For example, benzene ring, naphthalene ring, pyridine ring, pyrimidine ring, imidazole ring, pyrazole ring, quinoline ring,
inquinoline ring, pensimidasol ring, thiazole ring,
There are benzothiazole rings, etc. Among these, those containing a benzene ring are preferred.

Particularly preferred as A is an aryl group.

2 The aryl group or unsaturated heterocyclic group of A may have a substituent. Typical substituents include linear, branched or cyclic alkyl groups (preferably those with 1 to 20 carbon atoms)
, an aralkyl group (preferably an alkyl moiety with 1 carbon number)
-3 monocyclic or bicyclic), alkoxy groups (preferably those having 1 to 20 carbon atoms), substituted amine groups (preferably amine groups substituted with alkyl groups having 1 to 20 carbon atoms),
Examples thereof include an acylamino group (preferably having 2 to 30 carbon atoms), a sulfonamide group (preferably having 1 to 30 carbon atoms), and a ureido group (preferably having 1 to 30 carbon atoms).

A in Noshiro [■] may have a ballast group commonly used in immobile photographic additives such as couplers incorporated therein. The ballast group is a group having 8 or more carbon atoms and is relatively inert to photography, and examples include an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group, and an alkylphenoxy group. You can choose.

- A in Noshiro [■] may have a group incorporated therein to enhance adsorption to the silver halide grain surface.

Examples of such adsorption groups include thiourea groups, heterocyclic thioamide groups, mercapto heterocyclic groups, and triazole groups, for example, in U.S. Pat.
No., JP-A-59-195233, JP-A No. 59-20023
No. 1, No. 59-201045, No. 59-201046
Examples include the groups described in Japanese Patent Application Nos. 1982-1983, Nos. 59-201047, 59-201048, and 59-201049, and Japanese Patent Application Nos. 59-36788, 1982-11459, and 1982-19739.

B specifically represents a formyl group, an acyl group (acetyl group,
pucopionyl group, trifluoroacetyl group, chloroacetyl group, benzoyl M, 410robenzoyl group, bilboyl group, methoxalyl group, methyloxamoyl group, etc.)
, alkylsulfonyl groups (methanesulfonyl group, 2-chloroethanesulfonyl group, etc.), arylsulfonyl groups (
benzenesulfonyl group, etc.), alkylsulfinyl group (
methanesulfinyl group, etc.), arylsulfinyl group (
benzenesulfinyl group, etc.), carbamoyl group (methylcarbamoyl group, phenylcarbamoyl group, etc.), sulfamoyl group (dimethylsulfamoyl group, etc.), alkoxycarbonyl group (methoxycarbonyl group, methoxyethoxycarbonylaryloxycarbonyl group (phenoxycarbonyl group, etc.) ), sulfamoyl group (methylsulfamoyl group, etc.), alkoxysulfonyl group (methoxysulfonyl group, etkynesulfonyl group, etc.), thioacyl group (
methylthiocarbonyl group, etc.), thiocarbamoyl group (methylthiocarbamoyl group, etc.), or heterocyclic group (pyridine group, etc.).

Particularly preferred as B is a formyl group or an acyl group.

B in Noshiro [■] represents a partial structure of a hydrazone together with R2 and the nitrogen atom to which these are fused. In the above, R3 represents an alkyl group, an aryl group, or a heterocyclic group. R4 represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group.

5 R. R2 is a hydrogen atom, an alkylsulfonyl group having 20 or less carbon atoms, and an arylsulfonyl group (preferably a phenylsulfonyl group or a Hammett substituent constant of -0.5)
phenylsulfonyl group substituted as above),
Acyl group having 20 or less carbon atoms (preferably benzoyl group,
or a benzoyl group substituted so that the sum of Hammett's substituent constants is -0.5 or more, or a linear, branched, or cyclic unsubstituted and substituted aliphatic acyl group (for example, a halogen atom as a substituent) , ether group, sulfonamide group, carbonamide group, hydroxyl group, carboxyl group, and sulfonic acid group).

As R,, R2, a hydrogen atom is most preferable.

Specific examples of hydrazine derivatives are shown below.

However, the present invention is not limited to the following compounds.

■-2 ■-3 ■-4 ■-5 ■-6 6 ■-1 ■-7 ■-12 ■-8 ■-13 ■-9 ■-14 ■-10 ■-15 ■-11 ■-16 9 ■-17 ■-18 ■-20 When a hydrazine derivative is contained in a photographic light-sensitive material, it is preferably contained in a silver halide emulsion layer.
It may be contained in other non-photosensitive hydrophilic colloid layers (eg, protective layer, intermediate layer, filter layer, antihalation layer, etc.).

Specifically, when the compound to be used is water-soluble, it is prepared as an aqueous solution, and when it is poorly water-soluble, it is prepared as a solution of water-miscible organic solvents such as alcohols, esters, and ketones. Just add it to the solution. When added to the silver halide emulsion layer, it may be added at any time from the start of chemical ripening to before coating, but it is preferably added between after the end of chemical ripening and before coating. In particular, it is preferable to add it to a coating solution prepared for coating.

The content of the hydrazine derivative depends on the grain size of the silver halide emulsion, the halogen composition, the method and degree of chemical sensitization, the relationship between the layer containing the compound and the silver halide emulsion layer, the type of antifogging compound, etc. It is desirable to select the optimum amount, and testing methods for this selection are well known to those skilled in the art.

Usually preferably from lo-6 to l per mole of silver halide
Xl0-' moles are used, especially in the range from 10-5 to 4X10-' moles.

Further, the hydrazine derivative can be used by being mixed into the developer. In that case, the amount of developer to be added is 10. Hit 5
mg-5g, especially lQmg-1g is preferred.

The silver halide used in the silver halide photographic material of the present invention is not particularly limited, but silver chloride or silver chlorobromide is preferred. The composition of silver chlorobromide is AgCn/AgBr
= 10010-2/98, but preferably AgCI2/AgBr = 90/10-40
The molar ratio is /60. The average grain size of the silver halide grains is preferably 0°IL1m to 0.50μm, and the coefficient of variation expressed by (standard deviation of grain size)/(average grain size) x 100 is 1
It is more preferable to have a narrow particle size distribution of 5% or less.

Various sensitizers, sensitizing dyes, stabilizers, etc. can be used for the silver halide used in the present invention.

The silver halide and tetrazaindene compounds according to the invention are incorporated into a hydrophilic colloid layer, and the hydrophilic colloid used particularly advantageously in the invention is gelatin. Hydrophilic colloids other than gelatin can also be used.

These hydrophilic colloids can also be applied to layers that do not contain silver halide, such as anti-slip/anti-scratch layers, protective layers, interlayers, etc.

As the support used in the present invention, various supports used in the photosensitive material industry, such as polyester films, can be used.

The photosensitive material of the present invention has a protective layer having an appropriate thickness, preferably 0.1-10 μm, particularly preferably 0-8-2 μm.
Preferably, a gelatin protective layer of .mu.m is coated.

The hydrophilic colloid layer used in the present invention may contain various photographic additives, such as gelatin plasticizers, hardeners, surfactants, image stabilizers, ultraviolet absorbers, antistain agents, pH Additives, antioxidants, antistatic agents, thickeners, graininess improvers, dyes, mordan), brighteners, development speed regulators, matting agents, etc. within the range that does not impair the effects of the present invention. Can you use it?

The developing agent used in developing the silver halide photographic light-sensitive material of the present invention includes T,
Photographic Peocess, Fou
rth Edition) pp. 291-334 and Journal of the American Chemical Society.
Cbemical 5ociety) Volume 73, 3, 1
Developers such as those described on page 00 (1951) can be effectively used in the present invention.

These developers may be used alone or in combination of two or more types, but it is preferable to use two or more types in combination. Further, even if a sulfite salt such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the photosensitive material of the present invention, the effects of the present invention will not be impaired and This can be mentioned as one of the characteristics. Furthermore, hydroquineluamine and hydrazide compounds may be used as preservatives. In addition, adjusting the pH with caustic alkali, alkali carbonate, or amines used in general black and white developers and providing a buffer function, inorganic development inhibitors such as potassium bromide, organic development inhibitors such as benzotriazole, and ethylenediamine. Metal ion scavengers such as tetraacetic acid, development accelerators such as methanol, ethanol, benzyl alcohol, and polyalkylene oxide, surfactants such as sodium alkylarylsulfonate, natural zabonin, sugars, or alkyl esters of the above compounds. It is optional to add hardening agents such as glutaraldehyde, formalin and glyoxal, and ionic strength adjusting agents such as sodium sulfate.

In the developer of the present invention, amino compounds such as alkanolamines described in JP-A-56-106244 can be used.

In addition, "Photographic Processing Chemistry" by F. A. Messon, published by Focal Press (
1966), pp. 226-229, U.S. Patent No. 2193
．． No. 015, No. 2,592,364, Japanese Unexamined Patent Publication No. 1973-6
Those described in No. 4933 may also be used.

In the present invention, "development time" and "fixing time" respectively mean
The time from when the photosensitive material to be processed is immersed in the developing tank solution of the automatic processing machine until it is immersed in the next fixing solution, and the time from when it is immersed in the fixing tank solution until it is immersed in the next washing tank solution (stabilizing solution). say the time

Further, "washing time" refers to the time during which the product is immersed in the washing tank liquid.

In addition, "drying time" refers to the drying time when a drying son, which blows hot air at a temperature of 35°0-100'c, preferably 40°C to 80°C, is installed in the processor or installed in the drying son. This refers to the time spent.

The development temperature and time are about 25 DEG C. to 50 DEG C. for less than 20 seconds, preferably 30 DEG C. to 40 DEG C. for 6 seconds to 20 seconds.

The fixing solution is an aqueous solution containing thiosulfate, and has a pH of 3.8.
Above, preferably 4.2 to 5.5.

The fixing agent may be thorium thiosulfate or ammonium thiosulfate, or it may contain thiosulfate ions and ammonium ions as essential components, and ammonium thiosulfate is particularly preferred from the viewpoint of fixing speed. The amount of fixing agent used can be varied as appropriate, and is generally about 0.1 to about 6 moles. It is.

The fixer may also contain water-soluble aluminum salts that act as hardeners, such as aluminum chloride, ammonium sulfate, and potassium brightener.

In the fixing solution, tartaric acid, citric acid, or conductors thereof can be used alone or in combination of two or more kinds.

These compounds containing 0.005 mol or more per fixer IQ are effective, especially 0.01 mol 10. ~0.03
Mol/Q is particularly effective.

Specifically, there are tartaric acid, potassium tartrate, storium tartrate, potassium sodium tartrate, citric acid, sodium citrate, potassium citrate, lithium citrate, ammonium citrate, and the like.

The fixing solution may optionally contain preservatives (e.g. sulfites, bisulfites), pH buffering agents (e.g. acetic acid, nitric acid), pH
It may contain a conditioning agent (for example, sulfuric acid), a chelating agent having water softening ability, and a compound described in Japanese Patent Application No. 60-213562.

Fixing temperature and time are approximately 20°C to approximately 50°C for 6 seconds to 1
The heating time is preferably 6 seconds to 30 seconds at 30°C to 40°C, and even more preferably 6 seconds to 20 seconds at 30°C to 40°C.

When the fixer concentrate is refilled to the automatic processor in the method of the present invention with water to dilute it as the light-sensitive material is processed, it is most preferred that the fixer concentrate is composed of one part. The same is true for developer.

The lyophilic fixer can exist stably as a single agent at pH 4,
5 or more, more preferably pH 4.65 or more. This is because if the pH is less than 4.5, the thiosulfate will decompose and eventually become sulfided, especially if the fixer is left for a long period of time before it is actually used. Therefore pH 4,5
Within the above range, sulfur dioxide gas is generated less and the working environment is also improved. The upper limit of pH is not so strict, but if it is too high
If the film is fixed with H, the pH of the film becomes high even after subsequent washing with water, and the swelling of the film increases, which increases the drying load, so the pH is limited to about 7. Fixer that uses aluminum salt to harden the film has a pH of 5 to prevent precipitation of aluminum salt.
, up to 5 is the limit.

In the present invention, either the developing solution or the fixing solution may be a so-called working solution that does not require dilution water as described above (that is, the undiluted solution is replenished).

The amount of each concentrate supplied to the processing tank liquid and the mixing ratio with dilution water can be varied depending on the composition of the concentrate, but generally the ratio of concentrate to dilution water is 1:0 to 8. The total amount of each of the developer and fixer is preferably from 50 m12 to 1500 mffi per m2 of the light-sensitive material.

In the present invention, the photosensitive material is made lyophilic and, after being fixed, is subjected to water washing or stabilization treatment.

Any method known in the art can be applied to the washing or stabilization treatment, and water containing various additives known in the art can also be used as the washing water or stabilizing liquid. By using anti-mold water for washing water or stabilizing liquid, not only is it possible to save water by reducing the amount of replenishment to less than 3Q per m2 of photosensitive material, but it also eliminates the need for piping for installing an automatic processing machine. Furthermore, the number of stock tanks can be reduced.

That is, the solution dilution water and washing water or stabilizing solution for the developer and fixer can be supplied from a common single layer stock tank, making it possible to further downsize the automatic developing machine.

When water treated with anti-mildew measures is used in combination with washing water or stabilizing liquid, it is possible to effectively prevent the formation of limescale, etc.
Water saving treatment of 0 to 3a1, preferably 0 to 1a1, can be performed per 2.

Here, when the replenishment amount is O, there is no replenishment at all except for appropriately replenishing the amount of washing water in the washing tank that has decreased due to natural evaporation, etc. In other words, the so-called "reservoir water" is essentially not refilled. Refers to cases in which a processing method is used.

As a method of reducing the amount of replenishment, a multistage countercurrent system (for example, two stages, three stages, etc.) has been known for a long time. If this multistage countercurrent method is applied to the present invention, the photosensitive material in the fixer will be processed in a clean direction, that is, in sequential contact with the processing solution that is not contaminated with the fixer, resulting in even more efficient water washing. will be done. In this way, unstable thiosulfates and the like are appropriately removed, the possibility of discoloration and fading is further reduced, and a more significant stabilizing effect can be obtained. The amount of water used for washing is also much smaller compared to conventional methods.

When washing with a small amount of water, patent application 1729/1986
It is more preferable to provide the space roller cleaning tank described in No. 68.

Further, part or all of the overflow liquid from the washing or stabilizing bath, which is generated by replenishing the washing or stabilizing bath with anti-mold water depending on the treatment, is disclosed in Japanese Patent Application Laid-Open No. 60-23
As described in Japanese Patent Application No. 5133, it can also be used in a processing liquid having a fixing ability, which is a processing step before that. This is more preferable because the stock water can be saved and the amount of waste liquid can be reduced.

Anti-mildew methods include the ultraviolet irradiation method described in JP-A No. 60-263939, the method using a magnetic field described in JP-A No. 60-263940, and the use of ion exchange resin described in JP-A No. 61-131632. How to make pure water, patent application 1986-
No. 253807, No. 60-295894, No. 61-6
The method using the antibacterial agent described in No. 3030 and No. 61-51396 can be used.

Furthermore, L, E, West “Water Qual
ity Cr1teria Pboto Sci &
Eng., Vol. 9 No. 6 (1965)
, M.W., Beach llMicrobiology
cal Growths in Motion-Pie
I ture Processing” SMPTE
Journal Vol, 85. (1976).

R. O. Deegan, “Pboto Pro
cessing Wash Water Bioci
des” J, Imaging Tech, Vol 1
0. No. 6 (1984) and Japanese Patent Application Publication Nos. 57-8542, 57-58143, 58-105145, 57-132146, 58-18631, 57
Antibacterial agents, anti-inflammatory agents, surfactants, etc. described in Japanese Patent Nos. 97530 and 57-157244 can also be used in combination.

Furthermore, for the washing bath, R, T, Kreiman, J, 1 ma.
RESEARCH, an inthiazoline compound described in GE, Techlo, (6) 242 (1984)
DISCLO5URE Volume 205, l tem2052
6 (May 1981), isothiazoline compounds described in Volume 228, Item 22845 (
Indiazoline compounds described in Japanese Patent Application No. 1983-51.396 (April issue, 1983);
etc. can also be used together as a microbiocide.

Furthermore, specific examples of the anti-spill agent include phenol, 4-chlorophenol, pentachlorophenol, Fresol,
0-phenylphenol, talolofen, dichlorophene, formaldehyde, glutaraldehyde, talolacetamide, p-hydroxybenzoic acid ester, 2-(4-thiazoline)-benzimidazole, benzisothiazolin-3-one, dotesyl- Benzyl-dimethylammonium-chloride, N-
(-y fluorodichloromethylthio)-7talimide, 2
, 4.4'-1-lichloro2'-/\hydrooxydiphenyl ether, and the like.

The water stored in the water stock tank after being treated with antifungal means is diluted with water for diluting the stock solution of the processing solution such as the developer/fixer, and the amount thereof added is preferably 0.01 to 10 g10. , more preferably 0.
1-5g10. It is.

Furthermore, in addition to the silver image stabilizer, various surfactants can be added to the washing water for the purpose of preventing water droplet unevenness. As the surfactant, any of cationic, anionic, nonionic, and amphoteric types may be used. Specific examples of surfactants include compounds described in "Surfactant Handbook" published by Kogaku Tosho Co., Ltd.

Various compounds are added to the stabilizing bath for the purpose of stabilizing the image. For example, adjusting the membrane pH (e.g. pH 3
~8) various buffering agents (e.g. borates, metaborates, borax, phosphates, carbonates, potassium hydroxide, sodium hydroxide, aqueous ammonia, monocarboxylic acids, dicarboxylic acids, polycarboxylic acids) Typical examples include aldehydes such as (used in combination) and formalin. In addition, Kill-1 agent, fungicide (thiazole type,
Various additives such as inthazole, halogenated phenol, sulfanilamide, penztriazole, etc.), surfactants, optical brighteners, and hardening agents may be used. Two or more kinds of compounds may be used in combination.

In addition, ammonium chloride,
It is preferable to add various ammonium salts such as ammonium nitrate, ammonium sulfate, ammonium phosphate, ammonium sulfite, and ammonium thiosulfate in order to improve image storage stability.

Water washing or stabilization bath temperature and time by the above method is 0°
Preferably 6 seconds to 1 minute at 15°C to 40°C
6 to 30 seconds at °C, more preferably 15 °C
6 to 15 seconds at ~40°C is preferred.

According to the method of the present invention, the developed, fixed and washed photographic material is dried by squeezing out the washing water, that is, by using a swiss roller method. Drying is carried out at a temperature of about 40° C. to about 100° C., and the drying time can be varied appropriately depending on the surrounding conditions, and is usually about 5 seconds to 1 minute, more preferably 4 minutes.
It is about 5 seconds to 30 seconds at 0°C to 80°C.

In the present invention, an even more excellent effect is exhibited in that the lower the swelling percentage of the photosensitive material, the shorter the drying time thereof.

According to the method of the present invention, the so-called dry-to-dry processing time for development, fixing, washing, and drying is within 100 seconds, preferably within 60 seconds.

Here, "dry to dry" refers to the time from the moment the tip of the photosensitive material to be processed enters the film insertion section of the processor to the moment the tip comes out of the processor after being processed. .

5 [Example] The present invention will be explained in more detail with reference to specific examples below.

Example 1 [Method for Preparing Emulsion (A)] A silver chlorobromide emulsion was prepared using the following solutions A, B, and C.

<Solution A> Ossein gelatin 17g Polyisopropylene-polyethylene oxydisuccinic acid ester sodium salt 10% ethanol aqueous solution 5m12 Distilled water 1280m (2 solutions) Silver nitrate 170g Distilled water 410m0゜<Solution C> Sodium chloride 45゜0g Odor Potassium chloride 27.4g 6 Polyisopropylene oxydicono phosphate ester sodium salt 10% ethanol solution 3m (2 ossein gelatin 1g distilled water
After incubating 407 mg of solution A at solution °C, chloride it so that the EAg value becomes 160 mV.
Added lium.

Next, solutions B and C were added by the double-entrant method using the mixer described in JP-A-57-92523 and JP-A-57-92524.

As shown in Table 1, addition was carried out by gradually increasing the addition flow rate over a total addition time of 80 minutes while keeping the EAg value constant.

EAg value is 3mQ/Q 5 minutes after starting addition from 160mV
The EAg value was changed to 120 mV using an aqueous sodium chloride solution, and this value was maintained thereafter until the mixing was completed.

To keep the EAg value constant, 3 mol 10. Sodium chloride rhodium trichloride trihydrate 28 μg Table 1 A metal silver electrode and a tuple junction type saturated Ag/AgCI2 reference electrode were used to measure the EAg value (the configuration of the electrode is described in JP-A-57-197534). using the disclosed tuple junction).

Further, a variable flow rate roller tube metering pump was used to add solutions B and C.

Furthermore, during the addition, the emulsion was sampled and observed using an electron microscope to confirm that no new particles were generated within the system.

Also, during the addition, the pH value of the system was kept constant at 3.0.
% nitric acid aqueous solution.

After addition of solutions B and C, the emulsion was subjected to 1-Wald ripening for 10 minutes, and then desalted and washed with water in a conventional manner. Then, 600 m++ of an aqueous solution of ossein gelatin (containing 30 g of ossein gelatin) was added. After dispersion by stirring at 55°C for 30 minutes, the volume was adjusted to 750 m12.

Emulsion (A) was subjected to total sulfur sensitization, and 300 mg of 4-hydroxy-6-methyl-1,3,3a as a stabilizer was added to sensitizing dye A per mole of silver halide contained in the emulsion.
, 7-titrazaindene were added, and 100 mg of sensitizing dye B was added per mole of silver halide contained in the emulsion.

Sensitizing Dye A CH2C82CN 9 0 Sensitizing Dye B The samples obtained as described above were given in Tables 2 to 4, and 800 m of the compound shown in ■-11 was added per mole of silver halide.
g, and further p-F decylhenzenesulfonic acid sodium 3
00mg, styrene-maleic acid copolymer is polymer 2
g, 15 g of styrene-butyl acrylate acrylic acid copolymer latex (average particle size approximately 0.25 μm) was added, Ag amount 4.0 g/m2, gelatin amount 2.007 m2
It was coated onto a polyethylene terephthalate film base coated with the coating described in Example (1) of JP-A No. 59-19941. At that time, gelatin amount 1.0g/m
2, 10 mg/m2 of his-(2-ethylhexyl)sulfony/'L phosphate as a spreading agent;
Compounds of general formulas CI) and [■] and [■] to (, VI) as shown in Tables 2 to 4 were added per mole of silver halide, and 15 mg/m'' of formalin and 8 mg/m2 of glyoxal were added as a hardening agent. The amount of the protective layer added is mg/A.
Expressed in g moles.

Table 4 The obtained sample was divided into two parts, and the two halves were left as they were for 3 days at a high temperature and high humidity of 40° C. and 80% relative humidity, and then exposed to light using a tungsten light source using a wedge.

The exposed sample was processed in an automatic processor using a developing solution and a fixing solution according to the following formulation.

<Development processing conditions> (Process) (Temperature) (Time) Development
Fixed at 28°O for 15 seconds
Wash with water at 28°C for about 15 seconds, at room temperature, about 1
Dry for 2 seconds 50°0
10 seconds <Developer prescription> (Composition A) Pure water (ion-exchanged water) 150ml 12-functional ethylenediaminetetraacetic acid disodium salt g 0g 00ml12 0g 5g Diethylene glycol potassium sulfite (55% w/v aqueous solution) Potassium carbonate hydroquinone 5-methylbenzo Triazole 200mg1-
7enyl-5-mercaptotetrazole Potassium hydroxide Adjust the pH of the working solution to 10-4? amount of potassium bromide to rub
4.5g (composition) Pure water (ion-exchanged water) 3m12 Diethylene glycol 50g Ethylenediaminetetraacetic acid disthorium salt 5mg Acetic acid (90% aqueous solution) 0.3mα5
-Nitroindazole 110mgl-Phenyl-3-pyrazolidone 700mgButylamine diethanolamine 15gWhen using a developer, dissolve in 500mQ of water in the order of the above composition A1 composition, IQ
It was finished and used.

<Fixer formulation> (Composition A) Ammonium thiosulfate (72.5% Wha aqueous solution) 240
m(2 Sodium sulfite 17g Sodium acetate trihydrate 6.5g Boric acid
6g Sodium citrate dihydrate
2g acetic acid (90% w/w aqueous solution)
13.5m12 (composition) Pure water (ion exchange water) 17m (1 sulfuric acid (50% v/w aqueous solution) 4.7g aluminum sulfate (Ag2O, converted content or L1% w/w aqueous solution) 26,
When using 5 g of fixer, the above compositions were dissolved in 500 mff of water in the order of composition A1 and finished to 112 for use. The pH of this fixer was about 43.

The photographic properties of the processed samples are shown in Tables 5 to 7.

Incidentally, gamma is indicated by tan θ of the linear portion from optical density 0.2 to 1.5, and relative sensitivity is indicated by the exposure amount ffogE value that gives a density of 2.0. It is a relative value with 100 being 3 days left for 3 days.

Fog is caused by the film i8 that was unexposed at that time. The concentration of lum was measured.

Table 6 (-Noshiro [H]) A method for processing silver photographic materials is obtained.

As is clear from Tables 5 to 7, the samples according to the present invention are
When processed at a line speed of 1000 mm/min or more, the contrast does not change even when stored under high temperature and high humidity, and the fog does not change -0. Example 2 of halogenation in which decrease in contrast and increase in fog were suppressed Emulsion (A) prepared in Example 1 was sulfur sensitized.

In addition, 55'-dichloro-3 was added to emulsion (A) as a sensitizing dye.
, 3'-di(3-sulfopropyl)-9-ethyloxalpocyanine sodium salt was added to emulsion (A) in an amount of 6.times.10@-' mol per mol of silver for spectrally sensitization.

Furthermore, 4-hydroxy-6-methyl-1,3 is used as a stabilizer.
3a,7-chitrazaindene was added.

Furthermore, the hydrazine derivative shown in [■-3] above was added to silver 1.
4 x 10-'' moles were added per mole.

Furthermore, alkylbenzene sulfonate as a surfactant,
After adding a vinyl sulfone hardener as a hardening agent and adjusting the pi of the emulsion to 5.8, the film thickness was 100 μm.
Coated silver amount 3 on polyethylene terephthalate support of m
．． The compounds of the present invention were added to the upper protective layer as shown in Tables 8 to IO, and the gelatin amount was 1 g/m21 2 Table 8 * mg/Ag moQ. Table 9 Table 10 5 The obtained sample was divided into two parts, the -half was kept as it was, and the -half was kept at a temperature of 4.
After being left in a high temperature and high humidity environment of 0℃ and 80% humidity for 3 days,
After each exposure with a tungsten light source using a wedge, the developer was heated at 40'C! , developed for 10 seconds, fixed for 9 seconds, washed with water for 10 seconds, and dried for 10 seconds.

Developer formulation> Hydroquinone 45', 0gN
-Methyl-p-aminophenol 1/2 sulfate 0.8g Sodium hydroxide 18.0g Potassium hydroxide 55.0g 5-sulfosalicylic acid 45.0g Boric acid
25.0g potassium sulfite
110.0g ethylenediaminetetraacetic acid 2s1~
Lium salt 1.0g Potassium bromide 6.0g 5-methylbenzotriazole 0.6gN-
Butyljetanolamine 15.0g6- Add water to 1ρ (pH = 12.0)
Tables 11 to 13 show the photographic properties of the samples obtained by processing. Gamma, relative sensitivity (Sample No. 16 left to stand for 3 days was set as 100) and fog in the table are the same as those in Example I.

8 Table 13 (Noshiro [■]) As can be seen from Tables 11 to 13, using a silver iodobromide emulsion,
Even when processed with a super-additive developer, the samples according to the present invention do not change in contrast or fog when stored under high temperature and high humidity, and increase in relative sensitivity is also suppressed.

〔Effect of the invention〕

79 As mentioned above, according to the present invention, the line speed is 10
Even when processed at a speed of 00 mm/min or more, a silver halide photographic light-sensitive material can be obtained that exhibits almost no decrease in contrast, increase in sensitivity, or increase in fog during storage at high temperatures.

Claims (4)

[Claims] (1) In a silver halide photographic material having at least one silver halide emulsion layer on a support, at least one of the hydrophilic colloid layers adjacent to the emulsion layer has the following general formula [I]. containing at least one of the compounds represented, and processed using an automatic processor, developing the
A method for processing a silver halide photographic material, characterized in that the processing time from fixing to washing and/or stabilizing solution is within 45 seconds. (2) General formula [I] in the treatment method according to claim 1
A treatment method characterized by containing at least one compound represented by the following general formula [II] instead of. (3) General formula [I] in the treatment method according to claim 1
The following general formula [III], [IV], [V] or [
A treatment method characterized by containing at least one compound represented by VI]. (4) The method for developing a silver halide photographic material according to claim 1, 2 or 3, wherein the processing is carried out using an automatic processor having a line speed of 1000 mm/sec or more. General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R_1 is hydrogen or an acetyl group, R_2, R_
3. R_4 represents hydrogen or a substituted or unsubstituted alkyl group. ] General formula [II] ▲ Numerical formulas, chemical formulas, tables, etc. are available▼ [In the formula, Y_1 and Y_2 represent a hydrogen atom or a mercapto group, and R_4 is a substituted or unsubstituted alkyl group, alkenyl group, alkynyl group, or aryl group. or represents an alkoxy group, a hydrogen atom, a halogen atom, a nitro group, an amino group, a cyano group, a hydroxycarbonyl group, an alkoxycarbonyl group, an alkylcarbonyl group, a hydroxy group, a mercapto group, or a sulfo group. Also, A represents a nitrogen atom, a carbon atom, or an oxygen atom, and B
represents a nitrogen atom or a carbon atom. When A represents a carbon atom, n_2 is 2, and when A represents a nitrogen atom, n_2 is 2.
2 is 1, and when A represents an oxygen atom, n_2 is 0. Further, when B represents a carbon atom, n_1 is 1, and when B represents a nitrogen atom, n_1 is 0. ] General formula [I
II〕General formula〔IV〕 ▲There are mathematical formulas, chemical formulas, tables, etc.▼ ▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼ Below are the margins: General formula [V] General formula [VI] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ ▲ Mathematical formulas, chemical formulas,
There are tables, etc. ▼ [In the formula, R_1, R_2 and R_3 may be the same or different, and each represents a hydrogen atom, a halogen atom, an amino group, a substituted amino group, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group. group, cycloalkyl group, substituted cycloalkyl group, mercapto group, substituted mercapto group or -C
ONHR_4 group (R_4 is a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an amino group, a substituted amino group,
Represents a cycloalkyl group, substituted cycloalkyl group, aryl group or substituted aryl group. ), R_1 and R_2
may be combined to form a ring. ]