JPH04216555A - Photosensitive planographic printing plate without requiring damping water - Google Patents
Photosensitive planographic printing plate without requiring damping waterInfo
- Publication number
- JPH04216555A JPH04216555A JP41129290A JP41129290A JPH04216555A JP H04216555 A JPH04216555 A JP H04216555A JP 41129290 A JP41129290 A JP 41129290A JP 41129290 A JP41129290 A JP 41129290A JP H04216555 A JPH04216555 A JP H04216555A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- weight
- resin
- printing plate
- shielding layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 31
- 238000013016 damping Methods 0.000 title 1
- 239000003086 colorant Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 6
- 230000002940 repellent Effects 0.000 claims description 4
- 239000005871 repellent Substances 0.000 claims description 4
- 239000002245 particle Substances 0.000 abstract description 9
- 239000000049 pigment Substances 0.000 abstract description 9
- 239000011230 binding agent Substances 0.000 abstract description 6
- 239000000843 powder Substances 0.000 abstract description 5
- 238000004040 coloring Methods 0.000 abstract description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 abstract description 3
- 239000004952 Polyamide Substances 0.000 abstract description 2
- 239000004721 Polyphenylene oxide Substances 0.000 abstract description 2
- 229920002647 polyamide Polymers 0.000 abstract description 2
- 229920000570 polyether Polymers 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 102
- 229920005989 resin Polymers 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- ALVGSDOIXRPZFH-UHFFFAOYSA-N [(1-diazonioimino-3,4-dioxonaphthalen-2-ylidene)hydrazinylidene]azanide Chemical compound C1=CC=C2C(=N[N+]#N)C(=NN=[N-])C(=O)C(=O)C2=C1 ALVGSDOIXRPZFH-UHFFFAOYSA-N 0.000 description 28
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 27
- 239000000203 mixture Substances 0.000 description 24
- -1 Brilliant Green Chemical compound 0.000 description 23
- 229920002379 silicone rubber Polymers 0.000 description 21
- 239000004945 silicone rubber Substances 0.000 description 19
- 239000000178 monomer Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- 238000004043 dyeing Methods 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 239000000975 dye Substances 0.000 description 10
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 239000003431 cross linking reagent Substances 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000009833 condensation Methods 0.000 description 7
- 230000005494 condensation Effects 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 6
- 229920000178 Acrylic resin Polymers 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical group CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 4
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 4
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- MPGOFFXRGUQRMW-UHFFFAOYSA-N [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O MPGOFFXRGUQRMW-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 4
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 4
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 4
- JTHNLKXLWOXOQK-UHFFFAOYSA-N hex-1-en-3-one Chemical compound CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000004014 plasticizer Substances 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229920006026 co-polymeric resin Polymers 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 3
- 229940100630 metacresol Drugs 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 2
- YEVQZPWSVWZAOB-UHFFFAOYSA-N 2-(bromomethyl)-1-iodo-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(I)C(CBr)=C1 YEVQZPWSVWZAOB-UHFFFAOYSA-N 0.000 description 2
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- DKHZGIKPBFMBBY-UHFFFAOYSA-N 2-cyano-n-[4-(diethylamino)phenyl]-2-phenylacetamide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)C1=CC=CC=C1 DKHZGIKPBFMBBY-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- CWBAMDVCIHSKNW-UHFFFAOYSA-N 2-iminonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(=N)CC(=O)C2=C1 CWBAMDVCIHSKNW-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 2
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- MGUKYHHAGPFJMC-UHFFFAOYSA-N 4-[3-(4-hydroxy-2,5-dimethylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C)C=2)C)=C1C MGUKYHHAGPFJMC-UHFFFAOYSA-N 0.000 description 2
- OLQIKGSZDTXODA-UHFFFAOYSA-N 4-[3-(4-hydroxy-2-methylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C1(C=2C(=CC(O)=CC=2)C)C2=CC=CC=C2S(=O)(=O)O1 OLQIKGSZDTXODA-UHFFFAOYSA-N 0.000 description 2
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- JUQPZRLQQYSMEQ-UHFFFAOYSA-N CI Basic red 9 Chemical compound [Cl-].C1=CC(N)=CC=C1C(C=1C=CC(N)=CC=1)=C1C=CC(=[NH2+])C=C1 JUQPZRLQQYSMEQ-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 2
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 2
- WZKXBGJNNCGHIC-UHFFFAOYSA-N Leucomalachite green Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=CC=C1 WZKXBGJNNCGHIC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- JKRZOJADNVOXPM-UHFFFAOYSA-N Oxalic acid dibutyl ester Chemical compound CCCCOC(=O)C(=O)OCCCC JKRZOJADNVOXPM-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 2
- 229940052223 basic fuchsin Drugs 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- SESFRYSPDFLNCH-UHFFFAOYSA-N benzyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1=CC=CC=C1 SESFRYSPDFLNCH-UHFFFAOYSA-N 0.000 description 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- IRPXADUBAQAOKL-UHFFFAOYSA-N chembl1408927 Chemical compound C1=CC=C2C(N=NC3=C4C=CC(=CC4=CC(=C3O)S(O)(=O)=O)S(O)(=O)=O)=CC=C(S(O)(=O)=O)C2=C1 IRPXADUBAQAOKL-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- OBRMNDMBJQTZHV-UHFFFAOYSA-N cresol red Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C=C(C)C(O)=CC=2)=C1 OBRMNDMBJQTZHV-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- RAGZEDHHTPQLAI-UHFFFAOYSA-L disodium;2',4',5',7'-tetraiodo-3-oxospiro[2-benzofuran-1,9'-xanthene]-3',6'-diolate Chemical compound [Na+].[Na+].O1C(=O)C2=CC=CC=C2C21C1=CC(I)=C([O-])C(I)=C1OC1=C(I)C([O-])=C(I)C=C21 RAGZEDHHTPQLAI-UHFFFAOYSA-L 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 2
- VYXSBFYARXAAKO-UHFFFAOYSA-N ethyl 2-[3-(ethylamino)-6-ethylimino-2,7-dimethylxanthen-9-yl]benzoate;hydron;chloride Chemical compound [Cl-].C1=2C=C(C)C(NCC)=CC=2OC2=CC(=[NH+]CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-UHFFFAOYSA-N 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 229920000609 methyl cellulose Polymers 0.000 description 2
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 2
- 239000001923 methylcellulose Substances 0.000 description 2
- 235000010981 methylcellulose Nutrition 0.000 description 2
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-M oleate Chemical compound CCCCCCCC\C=C/CCCCCCCC([O-])=O ZQPPMHVWECSIRJ-KTKRTIGZSA-M 0.000 description 2
- 229940049964 oleate Drugs 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N ortho-butylphenol Natural products CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- LYKRPDCJKSXAHS-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrahydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC(C(=O)C=2C=CC=CC=2)=C1O LYKRPDCJKSXAHS-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229910052913 potassium silicate Inorganic materials 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229940090181 propyl acetate Drugs 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 2
- 229940043267 rhodamine b Drugs 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000010186 staining Methods 0.000 description 2
- 239000012192 staining solution Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003459 sulfonic acid esters Chemical class 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- UYBDKTYLTZZVEB-UHFFFAOYSA-N (2,3,4,5,6-pentahydroxyphenyl)-phenylmethanone Chemical compound OC1=C(O)C(O)=C(O)C(O)=C1C(=O)C1=CC=CC=C1 UYBDKTYLTZZVEB-UHFFFAOYSA-N 0.000 description 1
- DEQUKPCANKRTPZ-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1O DEQUKPCANKRTPZ-UHFFFAOYSA-N 0.000 description 1
- FYELGSIOXSRGGW-UHFFFAOYSA-N (2-aminoacetyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(=O)CN FYELGSIOXSRGGW-UHFFFAOYSA-N 0.000 description 1
- SEGCOINEUCJSAP-UHFFFAOYSA-N (2-aminoacetyl) prop-2-enoate Chemical compound NCC(=O)OC(=O)C=C SEGCOINEUCJSAP-UHFFFAOYSA-N 0.000 description 1
- NIUHGYUFFPSEOW-UHFFFAOYSA-N (4-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=C(OC(=O)C=C)C=C1 NIUHGYUFFPSEOW-UHFFFAOYSA-N 0.000 description 1
- ZRDYULMDEGRWRC-UHFFFAOYSA-N (4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O ZRDYULMDEGRWRC-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- WXWYJCSIHQKADM-ZNAKCYKMSA-N (e)-n-[bis[[(e)-butan-2-ylideneamino]oxy]-ethenylsilyl]oxybutan-2-imine Chemical compound CC\C(C)=N\O[Si](O\N=C(/C)CC)(O\N=C(/C)CC)C=C WXWYJCSIHQKADM-ZNAKCYKMSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 1
- HMLSBRLVTDLLOI-UHFFFAOYSA-N 1-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)C(C)OC(=O)C(C)=C HMLSBRLVTDLLOI-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- GYSCBCSGKXNZRH-UHFFFAOYSA-N 1-benzothiophene-2-carboxamide Chemical compound C1=CC=C2SC(C(=O)N)=CC2=C1 GYSCBCSGKXNZRH-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- AEPWOCLBLLCOGZ-UHFFFAOYSA-N 2-cyanoethyl prop-2-enoate Chemical compound C=CC(=O)OCCC#N AEPWOCLBLLCOGZ-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- WBAXCOMEMKANRN-UHFFFAOYSA-N 2-methylbut-3-enenitrile Chemical compound C=CC(C)C#N WBAXCOMEMKANRN-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- VVXLFFIFNVKFBD-UHFFFAOYSA-N 4,4,4-trifluoro-1-phenylbutane-1,3-dione Chemical compound FC(F)(F)C(=O)CC(=O)C1=CC=CC=C1 VVXLFFIFNVKFBD-UHFFFAOYSA-N 0.000 description 1
- SNTUCKQYWGHZPK-UHFFFAOYSA-N 4-ethenylbenzonitrile Chemical compound C=CC1=CC=C(C#N)C=C1 SNTUCKQYWGHZPK-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- YQUQWHNMBPIWGK-UHFFFAOYSA-N 4-isopropylphenol Chemical compound CC(C)C1=CC=C(O)C=C1 YQUQWHNMBPIWGK-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- NTDQQZYCCIDJRK-UHFFFAOYSA-N 4-octylphenol Chemical compound CCCCCCCCC1=CC=C(O)C=C1 NTDQQZYCCIDJRK-UHFFFAOYSA-N 0.000 description 1
- KDVYCTOWXSLNNI-UHFFFAOYSA-N 4-t-Butylbenzoic acid Chemical compound CC(C)(C)C1=CC=C(C(O)=O)C=C1 KDVYCTOWXSLNNI-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- DKMROQRQHGEIOW-UHFFFAOYSA-N Diethyl succinate Chemical compound CCOC(=O)CCC(=O)OCC DKMROQRQHGEIOW-UHFFFAOYSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- YCUVUDODLRLVIC-UHFFFAOYSA-N Sudan black B Chemical compound C1=CC(=C23)NC(C)(C)NC2=CC=CC3=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC1=CC=CC=C1 YCUVUDODLRLVIC-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical class [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 229910001361 White metal Inorganic materials 0.000 description 1
- LEEBETSNAGEFCY-UHFFFAOYSA-N [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC(=O)C=C1 Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC(=O)C=C1 LEEBETSNAGEFCY-UHFFFAOYSA-N 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- KXJLGCBCRCSXQF-UHFFFAOYSA-N [diacetyloxy(ethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(OC(C)=O)OC(C)=O KXJLGCBCRCSXQF-UHFFFAOYSA-N 0.000 description 1
- VLFKGWCMFMCFRM-UHFFFAOYSA-N [diacetyloxy(phenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C1=CC=CC=C1 VLFKGWCMFMCFRM-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 229940022682 acetone Drugs 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- FJMNNXLGOUYVHO-UHFFFAOYSA-N aluminum zinc Chemical compound [Al].[Zn] FJMNNXLGOUYVHO-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 229960002903 benzyl benzoate Drugs 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- XJELOQYISYPGDX-UHFFFAOYSA-N ethenyl 2-chloroacetate Chemical compound ClCC(=O)OC=C XJELOQYISYPGDX-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000005816 fluoropropyl group Chemical group [H]C([H])(F)C([H])([H])C([H])([H])* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- DOUHZFSGSXMPIE-UHFFFAOYSA-N hydroxidooxidosulfur(.) Chemical compound [O]SO DOUHZFSGSXMPIE-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- HXTZZFBBMWUFFG-UHFFFAOYSA-N n-[bis[acetyl(methyl)amino]-methylsilyl]-n-methylacetamide Chemical compound CC(=O)N(C)[Si](C)(N(C)C(C)=O)N(C)C(C)=O HXTZZFBBMWUFFG-UHFFFAOYSA-N 0.000 description 1
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 1
- JBLADNFGVOKFSU-UHFFFAOYSA-N n-cyclohexyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1CCCCC1 JBLADNFGVOKFSU-UHFFFAOYSA-N 0.000 description 1
- BNTUIAFSOCHRHV-UHFFFAOYSA-N n-ethyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(CC)C1=CC=CC=C1 BNTUIAFSOCHRHV-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- FYCBGURDLIKBDA-UHFFFAOYSA-N n-hexyl-2-methylprop-2-enamide Chemical compound CCCCCCNC(=O)C(C)=C FYCBGURDLIKBDA-UHFFFAOYSA-N 0.000 description 1
- NXURUGRQBBVNNM-UHFFFAOYSA-N n-nitro-2-phenylprop-2-enamide Chemical compound [O-][N+](=O)NC(=O)C(=C)C1=CC=CC=C1 NXURUGRQBBVNNM-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 239000005014 poly(hydroxyalkanoate) Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000903 polyhydroxyalkanoate Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- ZCERHNFXRWHACE-UHFFFAOYSA-N silyl 2-ethylbutanoate Chemical compound C(C)C(C(=O)O[SiH3])CC ZCERHNFXRWHACE-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- FTUYQIPAPWPHNC-UHFFFAOYSA-M sodium;4-[[4-[benzyl(ethyl)amino]phenyl]-[4-[benzyl(ethyl)azaniumylidene]cyclohexa-2,5-dien-1-ylidene]methyl]benzene-1,3-disulfonate Chemical compound [Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=CC=CC=2)C=2C(=CC(=CC=2)S([O-])(=O)=O)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC=C1 FTUYQIPAPWPHNC-UHFFFAOYSA-M 0.000 description 1
- 125000000626 sulfinic acid group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- YZVRVDPMGYFCGL-UHFFFAOYSA-N triacetyloxysilyl acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O YZVRVDPMGYFCGL-UHFFFAOYSA-N 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000010969 white metal Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
【0001】
【産業上の利用分野】本発明は、湿し水不要感光性平版
印刷版に関するものであり、更に詳しくは画像が鮮明で
あり、その上現像後等における染色工程に時間を要した
り、また染色に際し、染色液で手や衣服を汚したり、自
動現像機が汚れたりすることがない湿し水不要感光性平
版印刷版に関する。
【0002】
【発明の背景】従来、湿し水不要感光性平版印刷版(以
下、必要に応じ「版材料」という。)としては、支持体
上に順に感光層及びインキ反撥層を塗設したものが知ら
れている。この版材料を露光・現像することにより印刷
版を得ることができる。このような版材料は、現像時又
は現像後の版の状態(現像性、キズ、版の汚れ等)を調
べる必要があり、そのため検版性に優れていなければな
らない。
【0003】この検版性を良好にするために、従来、特
開昭63−280251号公報等には、基板上にプライ
マー層、感光層及びインキ反撥層を順次積層してなる湿
し水不要感光性平版印刷版を画像露光した後、現像液を
用いて未露光部の感光層を溶出又は膨潤させ、ついで未
露光部の感光層と該感光層に接する部分のシリコーンゴ
ム層を除去してプライマー層を現出させ、このプライマ
ー層のみを染色液で染色することが示されているが、【
0004】このような方法では染色工程に時間を要し、
また一連の製版工程における染色液の補充、保存、また
は管理の仕方等が繁雑なうえ、染色時に染色液で手や衣
服が汚れたり、染色液により自動現像機が汚れたりする
等の問題がある。更に使用後の染色液の処理において公
害上の問題を有する。
【0005】そこで、本発明者等は、前記の検版性を考
慮するとともに染色液を使用しない方法について種々研
究した結果、着色層と着色層上に隠蔽層を設けておき、
現像に際し未露光部の隠蔽層を除去することにより画像
部にのみ着色層が現れ、可視画像が得られることを見出
し、ここに本発明を成すに至った。
【0006】
【発明の目的】したがって、本発明の目的は、鮮明な画
像が得られ、しかも染色液を不要とするので、染色工程
に時間を取られず、また染色液で手や衣服が汚れたり自
動現像機が汚れたりすることがなく、従って作業環境の
良好な湿し水不要感光性平版印刷版を提供することにあ
る。
【0007】
【発明の構成】本発明の前記目的は、基板上にプライマ
ー層、感光層及びインキ反撥層を順次積層してなる湿し
水不要感光性平版印刷版において、前記プライマー層が
着色剤を含有し、かつ感光層とプライマー層との間に隠
蔽層を設けた湿し水不要感光性平版印刷版によって達成
される。以下に本発明の構成について、更に具体的に説
明する。本発明は、プライマー層に着色剤を添加すると
共に該プライマー層上に隠蔽層を設け、現像によりこの
隠蔽層を除去することにより可視画像を得ることを特徴
とするものである。
【0008】本発明に用いられるプライマー層には、例
えばポリエステル樹脂、塩化ビニル−酢酸ビニル共重合
体、アクリル樹脂、塩化ビニル樹脂、ポリアミド樹脂、
ポリビニルブチラール樹脂、エポキシ樹脂、アクリレー
ト系共重合体、酢酸ビニル系共重合体、フェノキシ樹脂
、ポリウレタン樹脂、ポリカーボネート樹脂、ポリアク
リロニトリルブタジエン、ポリ酢酸ビニル等が挙げられ
る。
【0009】好ましくはアクリル樹脂、ポリエステル樹
脂、ウレタン樹脂等を挙げることができる。これらの樹
脂は、熱又は光で硬化させた形で用いることが好ましい
。また上記プライマー層を構成するアンカー剤としては
、例えば前記シランカップリング剤、シリコーンプライ
マー等を用いることができ、また有機チタネート等も有
効である。
【0010】本発明においては、プライマー層に着色剤
を添加するものであるが、この着色剤として好ましいも
のは、以下の挙げる染料又は顔料である。ビクトリアピ
ュアブルーBOH、オイルブルー♯603、オイルピン
ク♯312、パテントピュアブルー、クリスタルバイオ
レット、ロイコクリスタルバイオレット、ブリリアント
グリーン、エチルバイオレト、メチルグリーン、エリス
ロシンB、ベイシックフクシン、マラカイトグリーン、
【0011】ロイコマラカイトグリーン、m−クレゾー
ルパープル、クレゾールレッド、キシレノールブルー、
ローダミンB、オーラミン、4−p−ジエチルアミノフ
ェニルイミノナフトキノン、シアノ−p−ジエチルアミ
ノフェニルアセトアニリド、等に代表されるトリフェニ
ルメタン系、ジフェニルメタン系、オキサジン系、キサ
ンテン系、イミノナフトキノン系、アゾメチン系または
アントラキノン系の色素、ビクトリアピュアブルー(C
.I 42595)、
【0012】カチロンブリリアントフラビン(C.I
ベーシック13)、ローダミン6GCP(C.I
45160)、エリオグラウシンX(C.I 420
80)、ファーストブラックHB(C.I 2615
0)、シムラーファーストレッド4015(C.I
12355)、リオノールレッド7B4401(C.I
15830)、ファーストゲンブルーTGR−L(
C.I 74160)、リオノールブルーSM(C.
I 26150)、三菱カーボンブラックMA−10
0、【0013】三菱カーボンブラック#30、#40
、#50、MA−100、シアニンブルー4920(大
日精化製)、セイカファーストカーミン1483(大日
精化製)等が挙げられる。
【0014】本発明に用いられるプライマー層中におけ
る着色剤の含有量は染料の場合、重量で5%〜75%、
顔料の場合、重量で5%〜90%が適当である。本発明
に用いられる隠蔽層とは、プライマー層の上に設置され
、かつプライマー層の着色を遮断するものであり、この
隠蔽物質としては白色粒子が用いられる。
【0015】本発明にかかる隠蔽層に用いられるバイン
ダー樹脂は水系現像液に可溶であり、以下に示すものが
挙げられる。バインダー樹脂としては、ポリアミド、ポ
リエーテル、ポリエステル、ポリカーボネート、ポリス
チレン、ポリウレタン、ポリビニルクロライド及びその
コポリマー、ポリビニルブチラール樹脂、ポリビニルホ
ルマール樹脂、シェラック、エポキシ樹脂、フェノール
樹脂、アクリル樹脂等が挙げられる。
【0016】好ましくは、下記(1)〜(12)に示し
たモノマーの通常1000〜20万の重量平均分子量を
もつ共重合体が挙げられる。
(1)芳香族水酸基を有するモノマー、例えばN−(4
−ヒドロキシフェニル)アクリルアミド、N−(4−ヒ
ドロキシフェニル)メタクリルアミド、o−、m−、p
−ヒドロキシスチレン、o−、m−、p−ヒドロキシフ
ェニルアクリレート又はメタクリレート、【0017】
(2)脂肪族水酸基を有するモノマー、例えば2−ヒド
ロキシエチルアクリレート又は2−ヒドロキシエチルメ
タクリレート、
(3)アクリル酸、メタクリル酸、無水マレイン酸等の
α、β−不飽和カルボン酸、
【0018】(4)アクリル酸メチル、アクリル酸エチ
ル、アクリル酸プロピル、アクリル酸ブチル、アクリル
酸アミル、アクリル酸ヘキシル、アクリル酸オクチル、
アクリル酸−2−クロロエチル、2−ヒドロキシエチル
アクリレート、グリシジルアクリレート、N−ジメチル
エチルアクリレート等の(置換)アルキルアクリレート
、
【0019】(5)メチルメタクリレート、エチルメタ
クリレート、プロピルメタクリレート、ブチルメタクリ
レート、アミルメタクリレート、シクロヘキシルメタク
リレート、2−ヒドロキシエチルメタクリレート、4−
ヒドロキシブチルメタクリレート、グリシジルメタクリ
レート、N−ジメチルアミノエチルメタクリレート等の
(置換)アルキルメタクリレート、
【0020】(6)アクリルアミド、メタクリルアミド
、N−メチロールメタクリルアミド、N−エチルアクリ
ルアミド、N−ヘキシルメタクリルアミド、N−シクロ
ヘキシルメタクリルアミド、N−ヒドロキシエチルアク
リルアミド、N−フェニルアクリルアミド、N−ニトロ
フェニルアクリルアミド、N−エチル−N−フェニルア
クリルアミド等のアクリルアミド若しくはメタクリルア
ミド類、
【0021】(7)エチルビニルエーテル、2−クロロ
エチルビニルエーテル、ヒドロキシエチルビニルエーテ
ル、プロビニルエーテル、ブチルビニルエーテル、オク
チルビニルエーテル、フェニルビニルエーテル等のビニ
ルエーテル類、
(8)ビニルアセテート、ビニルクロロアセテート、ビ
ニルブチレート、安息香酸ビニル等のビニルエステル類
、
【0022】(9)スチレン、α−メチルスチレン、メ
チルスチレン、クロロメチルスチレン等のスチレン類、
(10)メチルビニルケトン、エチルビニルケトン、プ
ロピルビニルケトン、フェニルビニルケトン等のビニル
ケトン類、
【0023】(11)エチレン、プロピレン、イソブチ
レン、ブタジエン、イソブレン等のオレフィン類、(1
2)N−ビニルピロリドン、N−ビニルカルバゾール、
4−ビニルピリジン、アクリロニトリル、メタクリロニ
トリル等、
【0024】更に、上記モノマーと共重合し得るモノマ
ーを共重合させてもよい。また上記ノマーの共重合によ
って得られる共重合体を、例えばグリジルメタクリレー
ト、グリジルアクリレート等によって修飾したものも含
まれるが、これらに限定されるものではない。
【0025】更に具体的には、上記(1)、(2)に掲
げたモノマー等を含有する水酸基を有する共重合体が好
ましく、芳香族水酸基を有する共重合体が更に好ましい
。本発明に用いられる隠蔽層に含有される白色粒子とし
ては、アルミナホワイト、鉛白、二酸化チタン、モリブ
デンホワイト、酸化亜鉛等の白色顔料や、アルミニウム
亜鉛、アンチモン、ビスマス、カルシウム、インジウム
、マグネシウム、ニッケル、スズ等の白色金属粉を挙げ
ることができる。
【0026】白色粒子サイズとしては、平均粒径が0.
01〜10μmのものが好ましく、またその添加量は隠
蔽層の膜厚、隠蔽層に用いられる白色粒子の種類(顔料
、金属粉、高分子化合物)により定めることができるが
、重量で5%〜75%が好ましく、特に好ましくは30
〜50重量%である。また、本発明に用いられる隠蔽層
の膜厚は0.01〜10μmであることが好ましく特に
好ましくは0.1から5μmである。
【0027】なお、上記隠蔽層には、必要に応じて塗布
性向上剤、可塑剤、感脂化剤、安定化剤等を添加するこ
とができる。塗布性向上剤としては、アルキルエーテル
類(例えばエチルセルロース、メチルセルロース)、フ
ッ素系界面活性剤類や、ノニオン系界面活性剤(例えば
、ブルロニックL64(旭電化社製))等が挙げられる
。
【0028】塗膜の柔軟性、耐摩擦性を賦与するための
可塑剤としては、例えばブチルフタリル、ポリエチレン
グリコール、クエン酸トリブチル、フタル酸ジエチル、
フタル酸ジブチル、フタル酸ジヘキシル、フタル酸ジオ
クチル、リン酸トリクレジル、リン酸トリブチル、リン
酸トリオクチル、オレイン酸テトラヒドラフルフリル、
アクリル酸またはメタクリル酸のオリゴマー等が挙げら
れる。これらの添加剤の添加量はその使用対象目的によ
って異なるが、一般に全固形分に対して0.01重量%
〜30重量%が好ましい。
【0029】本発明に用いられる隠蔽層は、現像により
除去されるものであり、現像液としては湿し水不要の版
材の現像液として、公知のものが利用できるが、好まし
くは水系現像液が用いられる。水系現像液とは、水を3
0重量%以上、好ましくは50重量%〜98重量%と、
有機溶剤、界面活性剤を含む現像液を挙げることができ
、更に好ましくはアルカリ剤を含有する。
【0030】水を主成分とする現像液に含有する有機溶
剤としては、例えば脂肪族炭化水素類(ヘキサン、ヘプ
タン、”アイソパーE、H、G(エッソ化学社製、脂肪
族炭化水素類の商品名あるいはガソリン、灯油等)、芳
香族炭化水素類(トルエン、キシレン等)、或いはハロ
ゲン化炭化水素類(トリクレン等)、アルコール類(メ
タノール、エタノール、1−ブトキシ−2−プロパノー
ル、3−メチル−3−メトキシブタノール、β−アニリ
ノエタノール、ベンジルアルコール等)、【0031】
エーテル類(メチルセロソルブ、エチルセロソルブ、ブ
チルセロソルブ、フェニルセロソルブ、メチルカルビト
ール、エチルカルビトール、ブチルカルビトール、ジオ
キサン、ジエチレングリコールジメチルエーテル、ジエ
チレングリコールジエチルエーテル、ジエチレングリコ
ールジブチルエーテル、エチレングリコールジブチルエ
ーテル、プロピレングリコール、ジプロピレングリコー
ルブチルエーテル、トリプロピレングリコールメチルエ
ーテル、ポリプロピレングリコールメチルエーテル等)
、
【0032】ケトン類(アセトン、メチルエチルケトン
、メチルイソブチルケトン、ジイソブチルケトン、4−
メチル−1,3−ジオキソラン−2−オン等)、エステ
ル類(酢酸エチル、酢酸プロピル、酢酸ヘキシル、酢酸
メチル、酢酸プロピル、こはく酸ジエチル、蓚酸ジブチ
ル、マレイン酸ジエチル、安息香酸ベンジル、メチルセ
ロソルブアセテート、セロソルブアセテート、カルビト
ールアセテート等)等が挙げられる。
【0033】本発明に用いられる現像液に添加される界
面活性剤としては、アニオン界面活性剤、ノニオン界面
活性剤、カチオン界面活性剤および両性イオン界面活性
剤が用いられ、例えば特願平2−206041号の明細
書に記載された界面活性剤が使用される。これらの界面
活性剤は、単独でもまたは2種以上を組み合わせて使用
することができる。
【0034】本発明に用いられる界面活性剤の使用量は
、0.01重量%〜60重量%、好ましくは0.1重量
%〜10重量%が適当である。更に本発明に用いられる
アルカリ剤としては、
(1)ケイ酸ナトリウム、ケイ酸カリウム、水酸化カリ
ウム、水酸化ナトリウム、水酸化リチウム、第二または
第三リン酸ナトリウムまたはアンモニウム塩、メタケイ
酸ナトリウム、炭酸ナトリウム、アンモニア等の無機ア
ルカリ剤、
【0035】(2)モノ、ジまたはトリメチルアミン、
モノまたはジイソプロピルアミン、n−ブチルアミン、
モノ、ジまたはトリエタノールアミン、モノ、ジまたは
トリイソプロパノールアミン、エチレンイミン、エチレ
ンジイミン等の有機アミン化合物が挙げられる。
アルカリ剤の使用量は、0.05重量%〜20重量%、
好ましくは0.2重量%〜10重量%が適当である。
【0036】現像は、例えば上記のような現像液を含む
現像用バッドでこすったり現像液を版面に注いだ後に現
像ブラシでこする等の方法で行うことができる。上記現
像により、未露光部の感光層の一部及びシリコーンゴム
が除去された印刷版、あるいはシリコーンゴム層のみが
除去され、発色した感光層が露出し、露光部はシリコー
ンゴム層と実質的に発色しない感光層が残っている印刷
版が得られる。
【0037】本発明に用いうる感光層としては、ポジ型
の場合、光重合性接着層または光架橋型感光層及び、ジ
アゾ樹脂とバインダー樹脂等からなる感光層等が挙げら
れる。ネガ型の場合はキノンジアジド化合物とバインダ
ー樹脂からなる感光層等を用いることができる。
【0038】上記ジアゾ樹脂としては、従来公知のもの
が種々使用できるが、芳香族ジアゾニウム塩と例えば活
性カルボニル含有化合物、特にホルムアルデヒドとの縮
合物で代表されるジアゾ樹脂が含まれ、その中で有機溶
媒可溶性のジアゾ樹脂が好ましい。ジアゾ樹脂として好
ましい具体例としては、下記式1で表される樹脂が挙げ
られる。
【0039】
【式1】
【0040】〔式中、R12、R13、R14は、それ
ぞれ、水素原子、アルキル基またはアルコキシ基を表し
、好ましくは水素原子である。R15は、水素原子、ア
ルキル基またはフェニル基を表し、好ましくは水素原子
である。
Xは、ジアゾ樹脂の対アニオンを表し、具体的には、P
F6 、BF4 、デカン酸、安息香酸等の有機カルボ
ン酸類、フェニルリン酸等の有機リン酸類及びメタンス
ルホン酸等のスルホン酸類等を表す。
【0041】Yは、NH、S、Oを表す。更にZは、ス
ルホン酸基、スルホン酸塩(Na塩、K塩等)基、スル
フィン酸基、スルフィン酸塩(Na塩、K塩等)基、O
H基およびCOOH基から選ばれる少なくとも1つ以上
の置換基で置換されたフェニル基またはナフチル基を表
す。m及びnの割合は、モル比でm/n=1/0〜10
、好ましくは1/0〜2の範囲を示す。〕【0042】
上記式1で表されるジアゾ樹脂としては、好ましくは分
子量が約500〜10,000のものが挙げられる。感
光層中のジアゾ樹脂の含有量は、好ましくは1〜70重
量%、更に好ましくは3〜60重量%の範囲から選ばれ
る。
【0043】ネガ型湿し水不要感光性平版印刷版におい
ては、オルトキノンジアジド化合物が用いられるが、該
化合物としては、例えばフェノール類およびアルデヒド
類またはケトン類の重縮合樹脂と下記式2または式3で
表されるオルトキノンジアジドスルホン酸またはカルボ
ン酸誘導体とを化学的に縮合させることにより得られる
オルトキノンジアジドスルホン酸エステルまたはカルボ
ン酸エステルが挙げられる。
【0044】
【式2】
【0045】
【式3】
【0046】〔式中、Xは−SO2 Yまたは−COY
で示される基で、Yはハロゲン原子、アルカリ金属等の
縮合の際除去し得る基を表す。〕上記式2で表される化
合物の具体例としては、1,2−ベンゾキノンジアジド
(2)−4−スルホニルクロリド、1,2−ベンゾキノ
ンジアジド(2)−4−カルボニルクロリド、1,2−
ベンゾキノンジアジド(2)−、5−スルホニルクロリ
ド、1,2−ベンゾキノンジアジド(2)−5−カルボ
ニルクロリド等が挙げられる。
【0047】上記式3で表される化合物の具体例として
は、1,2−ナフトキノンジアジド(2)−4−スルホ
ニルクロリド、、1,2−ナフトキノンジアジド(2)
−4−カルボニルクロリド、1,2−ナフトキノンジア
ジド(2)−5−スルホニルクロリド、1,2−ナフト
キノンジアジド(2)−5−カルボニルクロリド等が挙
げられる。
【0048】フェノール類およびアルデヒド類またはケ
トン類の重縮合樹脂としては、例えば特公昭43−28
403号公報に記載されている如く、ピロガロールとア
セトンの重縮合物、特開昭55−76346号公報に記
載されている如く、ピロガロールとレゾルシンの混合物
とアセトンの重縮合物、特公昭45−9610号公報に
記載されている如く、フェノール・ホルムアルデヒド・
ノボラック樹脂あるいは、メタクレゾール・ホルムアル
デヒド・ノボラック樹脂、
【0049】特公昭50−5083号に記載されている
如く、パラ置換フェノール・ホルマリン樹脂(例えばパ
ラクレゾール・ホルマリン樹脂、パラーt−ブチルフェ
ノール・ホルマリン樹脂、パラエチルフェノール・ホル
マリン樹脂、パラプロピルフェノール・ホルマリン樹脂
、パライソプロピルフェノール・ホルマリン樹脂、パラ
ーn−ブチルフェノール・ホルマリン樹脂、パラオクチ
ルフェノール・ホルマリン樹脂等)、【0050】特公
昭62−60407号公報に記載されている如く、炭素
原子数3〜12のアルキル基またはフェニル基置換フェ
ノールとフェノールまたはそのメチル置換体あるいはこ
れらの混合物とをモル比1:9〜9:1で含むフェノー
ル類混合物とホルムアルデヒドの重縮合物(例えば前記
パラ置換フェノールとフェノール、パラクレゾール、メ
タクレゾールの重縮合物など)等が挙げられる。フェノ
ール類及びアルデヒド類またはケトン類の重縮合樹脂の
水酸基に対するオルトキノンジアジド基のエステル化率
は、15〜100モル%が好ましく20〜80モル%が
より好ましい。
【0051】更にオルトキノンジアジド化合物として、
ポリヒドロキシベンゾフェノンのオルトナフトキノンジ
アジドスルホン酸エステル(例えば1,2−ナフトキノ
ンジアジド(2)−5−スルホン酸エステル、1、2−
ナフトキノンジアジド(2)−4−スルホン酸エステル
など)が挙げられる。
【0052】このポリオキシベンゾフェノンは、ベンゾ
フェノンの水素原子2個以上を水酸基に置換してなる化
合物、例えば、ジヒドロキシベンゾフェノン、トリヒド
ロキシベンゾフェノン、テトラヒドロキシベンゾフェノ
ン、ペンタヒドロキシベンゾフェノン、オクタヒドキシ
ベンゾフェノン、またはその誘導体、(例えば、ハロゲ
ン原子、アルキル基、アリール基、アラルキル基、カル
ボン酸基の置換基)等が挙げられる。
【0053】好ましくは、トリヒドロキシベンゾフェノ
ンまたはテトラヒドロキシベンゾフェノンであり、より
好ましくは、2,3,4−トリヒドロキシベンゾフェノ
ン、2,3,4、4´−テトラヒドロキシベンゾフェノ
ンが挙げられる。また、水酸基に対するエステル化率は
、30〜100%が好ましい。本発明においてはオルト
キノンジアジド化合物として上記の化合物を各々単独で
用いてもよいし、2種以上組み合わせて用いてもよい。
【0054】上記に挙げたこれらのオルトキノンジアジ
ド化合物の中で、2,3,4−トリヒドロキシベンゾフ
ェノンの1,2−ナフトキノンジアジド(2)−5−ス
ルホン酸エステルまたは1,2−ナフトキノンジアジド
(2)−4−スルホン酸エステル、メタクレゾール・ホ
ルムアルデヒド・ノボラック樹脂の1、2−ナフトキノ
ンジアジド(2)−5−スルホン酸エステルまたは1、
2−ナフトキノンジアジド(2)−4−スルホン酸エス
テルあるいは、これらの混合物がより好ましく用いられ
る。
【0055】上記オルトキノンジアジド化合物の感光層
中に占める割合は、好ましくは50〜60重量%、更に
好ましくは20〜50重量%である。また前記感光層に
用いられるバインダー樹脂としてはアクリル樹脂、ノボ
ラック樹脂等が挙げられる。アクリル樹脂の共重合構成
成分としては、共重合可能なモノマーのすべてを用いる
ことができ、特にラジカル重合用モノマーとしては、下
記の不飽和結合を有する化合物が用いられる。
【0056】(1)水酸基を有するモノマー類:(2)
−ヒドキシエチル(メタ)アクリレート、2−ヒドロキ
シプロピル(メタ)アクリレート、2−ヒドロキシペン
チル(メタ)アクリレート、4−ヒドロキシフェニル(
メタ)アクリレート、2−ヒドロキシフェニル(メタ)
アクリレート等の(メタ)アクリレートモノマー類;N
−メチロール(メタ)アクリルアミド、N−ヒドロキシ
エチル(メタ)アクリルアミド、N−(ヒドロキシフェ
ニル)−(メタ)アクリルアミド、N−(ヒドロキシナ
フチル)−(メタ)アクリルアミド等の(メタ)アクリ
ルアミドモノマー類;o−、m−、p−ヒドロキシスチ
レンモノマ−類等、
【0057】(2)、(1)以外の(メタ)アクリル酸
エステルまたはアミドモノマー類;メチル(メタ)アク
リレート、エチル(メタ)アクリレート、プロピル(メ
タ)アクリレート、ブチル(メタ)アクリレート等のア
ルキル(メタ)アクリレー類;N−フェニル(メタ)ア
クリルアミド、o−、m−、p−メトキシフェニル(メ
タ)アクリルアミド、o−、m−、p−エトキシフェニ
ル(メタ)アクリルアミド等、
【0058】(3)側鎖にシアノ基を有するモノマー類
;(メタ)アクリロニトリル、2−ペンテニトリル、2
−メチル−3−ブテンニトリル、2−シアノエチルアク
リレート、o−、m−、p−シアノスチレン等;(4)
側鎖にカルボン酸を有するモノマー類;(メタ)アクリ
ル酸、イタコン酸およびその無水物、マレイン酸および
その無水物、クロトン酸等、
【0059】(5)ビニールエーテル類;プロピルビニ
ルエーテル、ブチルビニルエーテル、オクチルビニルエ
ーテル、フェニルビニルエーテル等、(6)スチレン類
;α−メチルスチレン、メチルスチレン、クロロメチル
スチレン、スチレン等、
【0060】(7)ビニルケトン類;メチルビニルケト
ン、エチルビニルケトン、プロピルビニルケトン等、(
8)(1)〜(7)以外のモノマー類;エチレン、プロ
ピレン、イソブチレン、ブタジエン、塩化ビニル等のオ
レフィン類、N−ビニルピロリドン、N−ビニルカルバ
ゾール、4−ビニルピリジン等が挙げられるが、その他
これらモノマー類とラジカル共重合を起こしうるモノマ
ーであればよい。
【0061】本発明においては、感光層には、以上に説
明した各素材のほかに、ポジ型ネガ型いずれにおいても
必要に応じて更に染料、顔料、塗布性向上剤、可塑剤、
感脂化剤、安定化剤等を添加することができる。ポジ型
の湿し水不要感光性平版印刷版の感光層には更に公知の
露光可視画付与剤を含有させることが有利である。
【0062】上記の染料としては、例えばビクトリアピ
ュアブルーBOH、オイルブルー♯603、オイルピン
ク♯312、パテントピュアブルー、クリスタルバイオ
レット、ロイコクリスタルバイオレット、ブリリアント
グリーン、エチルバイオレット、メチルグリーン、エリ
スロシンB、ベイシックフクシン、マラカイグリーン、
ロイコマラカイトグリーン、m−クレゾールパープル、
クレゾールレッド、キシレノールブルー、ローダミンB
、オーラミン、4−p−ジエチルアミノフェニルイミノ
ナフトキノン、シアノ−p−ジエチルアミノフェニルア
セトアニリド等に代表されるトリフェニルメタン系、ジ
フェニルタン系、オキサジン系、キサンテン系、イミノ
ナフトキノン系、アゾメチン系またはアントラキノン系
の色素が挙げられる。
【0063】染料は、感光層中に通常約0.01〜約1
0重量%、好ましくは約0.05〜8重量%含有させる
。塗布性向上剤としては、アルキルエーテル類(例えば
エチルセルロース、メチルセルロース)、フッ素系界面
活性剤類や、ノニオン系界面活性剤(例えば、ブルロニ
ックL64(旭電化社製))等が挙げられる。
【0064】塗膜の柔軟性、耐摩耗性を賦与するための
可塑剤としては、例えばブチルフタリル、ポリエチレン
グリコール、クエン酸トリブチル、フタル酸ジエチル、
フタル酸ジブチル、フタル酸ジヘキシル、フタル酸ジオ
クチル、リン酸トリクレジル、リン酸トリブチル、リン
酸トリオクチル、オレイン酸テトラヒドラフルフリル、
アクリル酸またはメタクリル酸のオリゴマー等が挙げら
れる。
【0065】これらの添加剤の添加量はその使用対象目
的によって異なるが、一般に全固形分に対して0.01
重量%〜30重量%が好ましい。本発明に用いられる感
光層の膜厚は通常0.05〜100μm、好ましくは、
0.1〜20μmである。
【0066】本発明においては感光層上にシリコーンゴ
ム層が塗設される。本発明に用いられるシリコーンゴム
としては、綿状、あるいはある程度架橋したポリオルガ
ノシロキサンが好ましい。該ポリオルガノシロキサンは
、分子量が通常千ないし数十万のものであり、常温では
液体ないしはワックスなたは餅状に適度に架橋されたも
のである。該ポリオルガノシロキサンは、架橋の方法に
より縮合型と付加型とに分けられる。
【0067】縮合型は縮合反応によって架橋が行われる
ので、反応によって水、アルコール、有機酸などが放出
される。特に有用な縮合型のシリコーンゴムとしては、
両末端あるいは主鎖の1部に水酸基、アセトキシ基等を
有する線状ポリオルガノシロキサンとシリコーン架橋剤
の混合物か、水酸基にシリコーン架橋剤を反応させたも
のが挙げられ、いづれも縮合触媒を加えた方が架橋速度
の点で有利である。
【0068】特に両末端水酸基線状ジメチルオルガノポ
リシロキサンを縮合架橋させて得られるものが好ましい
。前記ポリオルガノシロキサンの主鎖は、下記の繰り返
し単位を有する。
【0069】
【式4】
【0070】式中、R1 およびR2 は各々置換基を
有してもよいアルキル基、アリール基、アルケニル基ま
たはその組み合わせであり、メチル基、フェニル基、ビ
ニル基、トリフルオロプロピル基が好ましく、特にメチ
ル基が好ましい。
【0071】上記シリコーン架橋剤としては、−OCO
CH3 、−ONR(R´)、−ON=CR(R´)、
−OR、−NR(R´)または−OH(式中、RとR´
はアルキル基である。)で表される官能基を持つ、いわ
ゆる脱酢酸型、脱オキシム型、脱アルコール型、脱アミ
ノ型、脱水型等の縮合型シリコーン架橋剤が挙げられる
。
【0072】このような架橋剤の例としては、テトラア
セトキシシラン、メチルトリアセトキシシラン、エチル
トリアセトキシシラン、フェニルトリアセトキシシラン
、ジメチルジアセトキシシラン、ジエチルアセトキシシ
ラン、ビニルトリアセトキシシラン、メチルトリメトキ
シシラン、ジメチルジメトキシシラン、ビニルトリメト
キシシラン、メチルトリス(アセトンオキシム)シラン
、メチルトリ(N−メチル−N−アセチルアミノ)シラ
ン、ビニルトリ(メチルエチルケトオキシム)シラン、
メチルトリ(メチルエチルケトオキシム)シラン、また
はそのオリゴマーなどを挙げることができる。
【0073】これらの架橋剤は、いづれもポリオルガノ
シロキサン100重量部に対して0.5 〜30重量部
の範囲とするのがよい。前記縮合触媒としては、有機の
カルボン酸、チタン酸エステル、アセチルアセトン金属
錯体、塩化白金酸、ナフテン酸等が挙げられる。
【0074】付加型とは、本体中の不飽和基、例えばビ
ニル基(−CH=CH2 )に架橋剤中の水系基が付加
して架橋するようなものを言う。具体的にはビニル基含
有オルガノポリシロキサン、水素化オルガノポリシロキ
サン等に白金系触媒(例えば塩化白金酸)等を混合させ
たものが挙げられる。
【0075】該ポリオルガノシロキサンは主鎖に前記縮
合型と同様の繰り返し単位を有する。本発明に用いられ
るシリコーンゴム層には、縮合型および付加型シリコー
ンゴムのいづれかあるいは両方を用いることが可能であ
る。また1つのポリオルガノシロキサンの中に水酸基と
不飽和基等を有する縮合かつ付加型のものを使用するこ
とも可能である。
【0076】本発明に用いられるシリコーンゴム層の膜
厚は、通常0.5μm〜10μmであり、好ましくは1
μm〜5μmである。尚、本発明においては感光層とシ
リコーンゴム層との間にアクリル酸系樹脂等から成る接
着層を設けてもよく、接着層には種々の反応性架橋剤、
シランカップリング剤等を含むことができ、また接着層
の膜厚として0.01μm〜0.5μmが好ましい。
【0077】本発明に用いられる基板としては、通常の
平版印刷機にセットできるたわみ性を有し、印刷時にか
かる荷重に耐えうるものであればいかなるものも用いる
ことができ、層構成も含めて特に制限されない。例えば
、コート紙などの紙類、アルミニウム板(JIS規格H
−16、H−18等)などの金属板、あるいはポリエチ
レンテレフタレートなどのプラスチックフィルムを例と
して挙げることができる。
【0078】特に、アルミニウム板、又はアルミニウム
箔と他の複合材が好ましく、耐刷性の点からアルミニウ
ム板が特に好ましい。また保存性の点から、基板、特に
アルミニウム板、またはアルミニウム箔と他の複合材は
公知の方法で表面処理して使用することができる。
【0079】このような表面処理としては、例えばアル
ミニウム板の表面を珪酸塩で処理する方法(米国特許第
2,714,066号)、有機酸塩で処理する方法(米
国特許第2,714,066号)、ホスホン酸およびそ
れらの誘導体で処理する方法(米国特許第3,220,
832号)、ヘキサフルオロジルコン酸カリウムで処理
する方法(米国特許第2,946,683号)、陽極酸
化する方法および陽極酸化後、アルカリ金属珪酸塩の水
溶液で処理する方法(米国特許第3,181,461号
)等がある。
【0080】このような支持体の厚さは、50μm〜4
00μmが好ましく、更に好ましくは100μm〜30
0μmである。本発明において、シリコーンゴム層の上
面には必要に応じて保護層を有していてもよい。この保
護層の材質としては、ポリビニルアルコール等の水溶性
フィルム、ポリヒドロキシアルカノエート、ポリエステ
ルアミド等の生分解性フィルムを用いることが好ましい
。
【0081】本発明の湿し水不要の版材は、例えば、次
のようにして製造される。支持体上に、リバースロール
コータ、エアーナイフコータ、メーヤバーコータ等の通
常のコータあるいはホエラーのような回転塗布装置を用
い、プライマー層を構成すべき組成物溶液を塗布乾燥し
架橋硬化させる。次いで感光層を構成すべき組成物溶液
を塗布乾燥する。
【0082】上記感光層上にシリコーンゴム溶液を同様
な方法で塗布し、通常100〜120℃の温度で数分間
熱処理して、充分に硬化せしめてシリコーンゴム層を形
成する。必要に応じて該シリコーンゴム層上にラミネー
ターを用いて保護フィルムを設けることができる。
【0083】次に本発明の湿し水不要の版材料を用いて
湿し水不要の印刷版を製造する方法を説明する。原稿で
あるポジフィルムをポジ型版材表面に真空密着させ、露
光する。この露光用の光源は、紫外線を豊富に発生する
水銀灯、カーボンアーク灯、キセノンランプ、メタルハ
ライドランプ、蛍光灯等が用いられる。次いでポジフィ
ルムを剥がし、現像液を用いて現像する。
【0084】
【実施例】実施例1
アルミニウム板aの製造
厚さ0.24mmのアルミニウム版を3%水酸化ナトリ
ウム水溶液に浸漬し水洗した後、32%硫酸水溶液にお
いて温度30℃で5A/dm2 の条件で10秒間、陽
極酸化を行い、水洗し、2%メタケイ酸ナトリウム水溶
液に温度85℃で37秒間浸漬し、更に温度90℃の水
(pH8.5)に25秒間浸漬し水洗、乾燥して、アル
ミニウム板aを得た。
【0085】アルミニウム板aに下記の組成のプライマ
ー層組成物を塗布し、85℃で3分間乾燥した後、3K
W超高圧水銀灯を用いて1000mJ/cm2 の全面
露光を行った。更に100℃で4分間乾燥して厚さ15
μmのプライマー層を形成した。
【0086】
〔プライマー層組成物〕
2−ヒドロキシエチルメタクリレート、メチルメタクリ
レート (50/50モル比)の共重合樹脂
100重量
部ペンタエリスリトールテトラアクリレート
100重量部DETX
(重合開始剤、日本化薬社製)
5重量部EPA(増感
剤、日本化薬社製)
5重量部ビクトリア
ピュアブルーBOH
200重量部乳酸メチル
1000
重量部【0087】次に上記プライマー層上に下記の組
成の隠蔽層組成物を塗布し、100℃で2分間乾燥して
厚さ1μmの隠蔽層を形成した。
〔隠蔽層組成物〕
2−ヒドロキシエチルメタクリレート、N−(4−ヒド
ロキシ フェニル)メタクリルアミド、メタクリル酸
のモル比 40/57/3の共重合樹脂
1
00重量部二酸化チタン
100重量部メチルセロソルブ
900重量部【0088】
次に上記隠蔽層上に下記の組成の感光性組成物を塗布し
、100℃で2分間乾燥して厚さ0.3μmの感光層を
形成した。
〔感光性組成物〕
(1)ジアゾ樹脂−1
50部(2)2−ヒドロキシエチルメタクリレート
、N−(4−ヒドロキシフェニル)メタクリアミド、メ
タクリル酸のモル比40/57/3の供重合樹脂−1
50重量部【0089】
(3)ビクトリアピュアブルーBOH
(保土ヶ谷化学(株)製、染料)
1重量
部(4)メチルセロソルブ
90
0重量部なお、ジアゾ樹脂−1は、以下のように合成し
た。p−ジアゾジフェニルアミン硫酸塩14.5g(5
0ミリモル)を氷冷下で40.9gの濃硫酸に溶解した
。この反応液に1.35g(45ミリモル)のパラホル
ムアルデヒドを反応温度が10℃を超えないようにゆっ
くり添加した。
【0090】この反応混合物を氷冷下、500ミリリッ
トルのエタノールに滴下し、生じた沈澱を濾過した。エ
タノールで洗浄後、この沈澱物を100ミリリットルの
純水に溶解し、この液に6.8gの塩化亜鉛を溶解した
冷濃厚水溶液を加えた。生じた沈澱を濾過した後、エタ
ノールで洗浄し、これを150ミリリットルの純水に溶
解した。この液に8gのヘキサフルオロリン酸アンモニ
ウムを溶解した冷濃厚水溶液を加えた。生じた沈澱を濾
取し水洗した後、乾燥してジアゾ樹脂−1を得た。
【0091】次いで上記感光層上に下記シリコーンゴム
組成物を乾燥膜厚1.8μmになるように塗布し、90
℃で10分乾燥した。
〔シリコーンゴム層組成物〕
(1)両末端に水酸基を有するジメチルポリシロキサン
(分子量82,000)
100
重量部(2)トリアセトキシメチルシラン
10重
量部(3)ジブチル錫ラウレート
0.8
重量部(4)アイソパーE(エッソ化学製)
900重量部
【0092】次に、上記シリコーンゴム層上に厚さ5μ
の片面マット化ポリプロピレンフィルムをラミネートし
、湿し水不要感光性平版印刷版を得た。上記の版材料の
上面にポジフィルムを真空密着させた後、光源としてメ
タルハライドランプを用いて露光した。
【0093】次に、下記の現像液に1分間浸漬した後、
版材料の表面を現像液を染め込ませたパッドで擦ること
により、未露光部分のシリコーンゴム層、感光層及び隠
蔽層が除去され、網点が良好に再現され、画線部である
未露光部に青色に着色したプライマー層が現れた印刷版
が得られた。
【0094】
〔現像液〕
β−アニリノエタノール
0.5部プロピレングリコール
1.0部p−tert−ブチル安息香酸
1.0部水酸化カリウム
1.0部
【0095】
ポリオキシエチレンラウリルエーテル
0.1部亜
硫酸カリウム
2.0部メタケイ酸カリウム
3.0部水
91部【0096】実施例2
実施例1のプライマー層組成物において、ビクトリアピ
ュアブル−BOHを三菱カーボンブラックMA−100
(三菱化成(株)製、顔料)に変更し、更に隠蔽層組成
物を次のように変更した以外は、実施例1と同様にして
湿し水不要感光性平版印刷版を得た。
【0097】
〔隠蔽層組成物〕
スチレン/メタクリル酸のモル比70/30の共重合樹
脂−2 100重量部カルシユム粉末
100重量部メチルセロソル
ブ
900重量部実
施例1と同様にして露光、現像を行ったところ、未露光
部分のシリコーンゴム層、感光層及び隠蔽層が除去され
て、網点が良好に再現され、画線部である未露光部に黒
色に着色したプライマー層が現れた印刷版が得られた。
【0098】実施例3
実施例1のプライマー層及び隠蔽層の組成物を次のよう
に変更した以外は、実施例1とどうようにして湿し水不
要感光性平版印刷版を得た。
〔プライマー層組成物〕
エピコート1007(エポキシ樹脂、シエル石油社
製) 50重量部ヒタノール4010(
フェノール樹脂、日立化成社製)
50重量部エチルセロソルブ
360重量部エチルセロソルブアセテート
360重量部シムラーファーストレッド4
015
100重量部ブチルセロソルブ
180重量部【0099】
〔隠蔽層組成物〕
p−ヒドロキシスチレン/2−ヒドロキシエチルメタク
リレート/メタクリル酸のモル比50/30/20の共
重合樹脂−3 1
00重量部酸化亜鉛
100重量部メチルセロソルブ
900重量部【010
0】実施例1と同様にして露光、現像を行ったところ、
未露光部分のシリコーンゴム層、感光層及び隠蔽層が除
去されて、網点が良好に再現され、画線部である未露光
部に鮮やかな赤色に着色したプライマー層が現れた印刷
版が得られた。
【0101】
【発明の効果】本発明は、プライマー層に着色剤を含有
させると共に該プライマー層上に隠蔽層を設けたので、
得られた画像が鮮明となり、また染色工程が不要となる
ため、染色工程にかかる時間を省くことができ、しかも
染色液による手や衣服の汚れがなく、更には自動現像機
が汚れないという優れた効果を奏する湿し水不要感光性
平版印刷版が得られる。出願人
コ ニ カ 株式会社代理人弁理士
中 島 幹 雄Detailed Description of the Invention [0001] [Industrial Application Field] The present invention relates to a photosensitive lithographic printing plate that does not require dampening water, and more specifically, provides a clear image and is easy to maintain after development. To provide a photosensitive lithographic printing plate that does not require dampening water and does not require time for a dyeing process, does not stain hands or clothes with a dyeing solution, and does not stain an automatic developing machine during dyeing. BACKGROUND OF THE INVENTION Conventionally, photosensitive lithographic printing plates that do not require dampening water (hereinafter referred to as "plate material" as necessary) have been prepared by coating a photosensitive layer and an ink repellent layer on a support in this order. something is known. A printing plate can be obtained by exposing and developing this plate material. For such plate materials, it is necessary to examine the condition of the plate (developability, scratches, stains on the plate, etc.) during or after development, and therefore it must have excellent plate inspection properties. [0003] In order to improve this plate inspection property, conventionally, in Japanese Patent Application Laid-Open No. 63-280251, etc., a primer layer, a photosensitive layer, and an ink repellent layer are sequentially laminated on a substrate, and no dampening water is required. After imagewise exposing the photosensitive lithographic printing plate, the unexposed areas of the photosensitive layer are eluted or swollen using a developer, and then the unexposed areas of the photosensitive layer and the silicone rubber layer in contact with the photosensitive layer are removed. It has been shown that the primer layer is exposed and only this primer layer is dyed with a dyeing solution, but [
[0004] In this method, the dyeing process takes time;
In addition, the replenishment, storage, and management of the dye solution during the series of plate-making processes is complicated, and there are problems such as staining hands and clothes with the dye solution during dyeing, and staining the automatic processor with the dye solution. . Furthermore, there is a problem of pollution in the treatment of the dye solution after use. [0005] Therefore, the inventors of the present invention took into account the above-mentioned plate inspection properties and conducted various studies on methods that do not use staining solutions.
It was discovered that by removing the hiding layer in the unexposed area during development, a colored layer appears only in the image area and a visible image can be obtained, and this has led to the present invention. OBJECTS OF THE INVENTION Therefore, the object of the present invention is to obtain clear images and eliminate the need for a dyeing solution, so that the dyeing process does not take much time and does not stain hands or clothes with the dyeing solution. To provide a photosensitive lithographic printing plate that does not require dampening water and does not stain an automatic developing machine and therefore has a good working environment. [Structure of the Invention] The object of the present invention is to provide a photosensitive lithographic printing plate that does not require dampening water and is formed by sequentially laminating a primer layer, a photosensitive layer, and an ink repellent layer on a substrate, wherein the primer layer contains a colorant. This is achieved by using a photosensitive lithographic printing plate which does not require dampening water and which contains a masking layer between the photosensitive layer and the primer layer. The configuration of the present invention will be explained in more detail below. The present invention is characterized in that a coloring agent is added to the primer layer, a hiding layer is provided on the primer layer, and a visible image is obtained by removing this hiding layer by development. The primer layer used in the present invention includes, for example, polyester resin, vinyl chloride-vinyl acetate copolymer, acrylic resin, vinyl chloride resin, polyamide resin,
Examples include polyvinyl butyral resin, epoxy resin, acrylate copolymer, vinyl acetate copolymer, phenoxy resin, polyurethane resin, polycarbonate resin, polyacrylonitrile butadiene, polyvinyl acetate, and the like. Preferred examples include acrylic resin, polyester resin, and urethane resin. These resins are preferably used in the form of being cured by heat or light. Further, as the anchor agent constituting the primer layer, for example, the silane coupling agent, silicone primer, etc. described above can be used, and organic titanates and the like are also effective. [0010] In the present invention, a coloring agent is added to the primer layer, and the preferred coloring agents are the following dyes or pigments. Victoria Pure Blue BOH, Oil Blue #603, Oil Pink #312, Patent Pure Blue, Crystal Violet, Leuco Crystal Violet, Brilliant Green, Ethyl Violet, Methyl Green, Erythrosin B, Basic Fuchsin, Malachite Green,
[0011] Leucomalachite green, m-cresol purple, cresol red, xylenol blue,
Triphenylmethane type, diphenylmethane type, oxazine type, xanthene type, iminonaphthoquinone type, azomethine type or anthraquinone type, represented by rhodamine B, auramine, 4-p-diethylaminophenyliminonaphthoquinone, cyano-p-diethylaminophenylacetanilide, etc. pigment, Victoria Pure Blue (C
.. C.I 42595), Catione brilliantoflavin (C.I.
Basic 13), Rhodamine 6GCP (C.I.
45160), Erioglaucine X (C.I 420)
80), Fast Black HB (C.I 2615
0), Shimla Fast Red 4015 (C.I.
12355), Lionor Red 7B4401 (C.I.
15830), First Gen Blue TGR-L (
C. I 74160), Lionor Blue SM (C.
I 26150), Mitsubishi Carbon Black MA-10
0, 0013] Mitsubishi Carbon Black #30, #40
, #50, MA-100, Cyanine Blue 4920 (manufactured by Dainichiseika), and Seika Fast Carmine 1483 (manufactured by Dainichiseika). [0014] The content of the colorant in the primer layer used in the present invention is 5% to 75% by weight in the case of dye;
In the case of pigments, 5% to 90% by weight is suitable. The hiding layer used in the present invention is placed on the primer layer and blocks coloring of the primer layer, and white particles are used as the hiding material. The binder resin used in the concealing layer according to the present invention is soluble in an aqueous developer, and examples include those shown below. Examples of the binder resin include polyamide, polyether, polyester, polycarbonate, polystyrene, polyurethane, polyvinyl chloride and its copolymers, polyvinyl butyral resin, polyvinyl formal resin, shellac, epoxy resin, phenol resin, acrylic resin, and the like. Preferably, copolymers of the monomers shown in (1) to (12) below, usually having a weight average molecular weight of 1,000 to 200,000, are used. (1) Monomers having aromatic hydroxyl groups, such as N-(4
-hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, o-, m-, p
-Hydroxystyrene, o-, m-, p-hydroxyphenylacrylate or methacrylate, 0017
(2) Monomers having aliphatic hydroxyl groups, such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate; (3) α,β-unsaturated carboxylic acids such as acrylic acid, methacrylic acid, and maleic anhydride; 4) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate,
(Substituted) alkyl acrylates such as 2-chloroethyl acrylate, 2-hydroxyethyl acrylate, glycidyl acrylate, and N-dimethylethyl acrylate; (5) methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate; Cyclohexyl methacrylate, 2-hydroxyethyl methacrylate, 4-
(Substituted) alkyl methacrylates such as hydroxybutyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl methacrylate, etc. (6) Acrylamide, methacrylamide, N-methylolmethacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N - Acrylamides or methacrylamides such as cyclohexyl methacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl-N-phenylacrylamide, etc. (7) Ethyl vinyl ether, 2-chloro Vinyl ethers such as ethyl vinyl ether, hydroxyethyl vinyl ether, provinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, (8) vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate, etc. 9) Styrenes such as styrene, α-methylstyrene, methylstyrene, chloromethylstyrene,
(10) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone; (11) olefins such as ethylene, propylene, isobutylene, butadiene, and isobrene; (1)
2) N-vinylpyrrolidone, N-vinylcarbazole,
4-vinylpyridine, acrylonitrile, methacrylonitrile, etc. Furthermore, monomers that can be copolymerized with the above monomers may be copolymerized. It also includes, but is not limited to, copolymers obtained by copolymerizing the above-mentioned nomers and modified with, for example, glycyl methacrylate, glycyl acrylate, and the like. More specifically, a copolymer having a hydroxyl group containing the monomers listed in (1) and (2) above is preferred, and a copolymer having an aromatic hydroxyl group is even more preferred. The white particles contained in the concealing layer used in the present invention include white pigments such as alumina white, lead white, titanium dioxide, molybdenum white, and zinc oxide, as well as aluminum zinc, antimony, bismuth, calcium, indium, magnesium, and nickel. , white metal powder such as tin. [0026] As for the white particle size, the average particle size is 0.
01 to 10 μm is preferable, and the amount added can be determined depending on the thickness of the hiding layer and the type of white particles used in the hiding layer (pigment, metal powder, polymer compound), but it is 5% to 10% by weight. 75% is preferred, particularly 30%
~50% by weight. Further, the thickness of the concealing layer used in the present invention is preferably 0.01 to 10 μm, particularly preferably 0.1 to 5 μm. [0027] Furthermore, a coating property improver, a plasticizer, a fat-sensitizing agent, a stabilizer, etc. can be added to the above-mentioned hiding layer, if necessary. Examples of the coating property improver include alkyl ethers (eg, ethyl cellulose, methyl cellulose), fluorine-based surfactants, nonionic surfactants (eg, Bluronic L64 (manufactured by Asahi Denka)), and the like. Examples of the plasticizer for imparting flexibility and abrasion resistance to the coating film include butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate,
Dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrafurfuryl oleate,
Examples include oligomers of acrylic acid or methacrylic acid. The amount of these additives added varies depending on the intended purpose, but is generally 0.01% by weight based on the total solid content.
~30% by weight is preferred. The hiding layer used in the present invention is removed by development, and any known developer can be used as a developer for plate materials that do not require dampening water, but preferably an aqueous developer. is used. Water-based developer is 3 parts of water.
0% by weight or more, preferably 50% to 98% by weight,
Examples include developing solutions containing organic solvents and surfactants, and more preferably containing an alkaline agent. Examples of organic solvents contained in the developer containing water as a main component include aliphatic hydrocarbons (hexane, heptane, Isopar E, H, G (manufactured by Esso Chemical Co., Ltd., aliphatic hydrocarbon products). alcohols (methanol, ethanol, 1-butoxy-2-propanol, 3-methyl- 3-methoxybutanol, β-anilinoethanol, benzyl alcohol, etc.), 0031
Ethers (methyl cellosolve, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, methyl carbitol, ethyl carbitol, butyl carbitol, dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether, ethylene glycol dibutyl ether, propylene glycol, dipropylene glycol) butyl ether, tripropylene glycol methyl ether, polypropylene glycol methyl ether, etc.)
, Ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, 4-
methyl-1,3-dioxolan-2-one, etc.), esters (ethyl acetate, propyl acetate, hexyl acetate, methyl acetate, propyl acetate, diethyl succinate, dibutyl oxalate, diethyl maleate, benzyl benzoate, methyl cellosolve acetate) , cellosolve acetate, carbitol acetate, etc.). [0033] As the surfactant added to the developer used in the present invention, anionic surfactants, nonionic surfactants, cationic surfactants and amphoteric ionic surfactants are used. The surfactants described in specification No. 206041 are used. These surfactants can be used alone or in combination of two or more. The appropriate amount of the surfactant used in the present invention is 0.01% to 60% by weight, preferably 0.1% to 10% by weight. Furthermore, the alkaline agents used in the present invention include (1) sodium silicate, potassium silicate, potassium hydroxide, sodium hydroxide, lithium hydroxide, dibasic or tribasic sodium or ammonium phosphate, sodium metasilicate, Inorganic alkaline agents such as sodium carbonate and ammonia; (2) mono-, di- or trimethylamine;
mono- or diisopropylamine, n-butylamine,
Examples include organic amine compounds such as mono-, di- or triethanolamine, mono-, di- or triisopropanolamine, ethyleneimine, ethylenediimine. The amount of alkaline agent used is 0.05% to 20% by weight,
Preferably, 0.2% to 10% by weight is appropriate. Development can be carried out, for example, by rubbing with a developing pad containing a developer as described above, or by pouring the developer onto the printing plate and then rubbing with a developing brush. By the above development, a part of the photosensitive layer in the unexposed area and the silicone rubber are removed from the printing plate, or only the silicone rubber layer is removed, and the colored photosensitive layer is exposed, and the exposed area is substantially separated from the silicone rubber layer. A printing plate is obtained in which a photosensitive layer that does not develop color remains. The photosensitive layer that can be used in the present invention includes, in the case of a positive type, a photopolymerizable adhesive layer, a photocrosslinkable photosensitive layer, a photosensitive layer made of a diazo resin, a binder resin, and the like. In the case of a negative type, a photosensitive layer made of a quinone diazide compound and a binder resin, etc. can be used. Various conventionally known diazo resins can be used as the above-mentioned diazo resin, but include diazo resins represented by condensates of aromatic diazonium salts and, for example, active carbonyl-containing compounds, especially formaldehyde; Solvent-soluble diazo resins are preferred. Preferred specific examples of the diazo resin include resins represented by the following formula 1. [Formula 1] [In the formula, R12, R13, and R14 each represent a hydrogen atom, an alkyl group, or an alkoxy group, and preferably a hydrogen atom. R15 represents a hydrogen atom, an alkyl group or a phenyl group, preferably a hydrogen atom. X represents the counter anion of the diazo resin, specifically, P
It represents F6, BF4, organic carboxylic acids such as decanoic acid and benzoic acid, organic phosphoric acids such as phenylphosphoric acid, and sulfonic acids such as methanesulfonic acid. [0041] Y represents NH, S, or O. Furthermore, Z is a sulfonic acid group, a sulfonate (Na salt, K salt, etc.) group, a sulfinic acid group, a sulfinate (Na salt, K salt, etc.) group, an O
Represents a phenyl group or naphthyl group substituted with at least one substituent selected from H group and COOH group. The ratio of m and n is m/n=1/0 to 10 in molar ratio.
, preferably in the range of 1/0 to 2. ] [0042]
The diazo resin represented by the above formula 1 preferably has a molecular weight of about 500 to 10,000. The content of the diazo resin in the photosensitive layer is preferably selected from the range of 1 to 70% by weight, more preferably from 3 to 60% by weight. [0043] In the negative type photosensitive lithographic printing plate that does not require dampening water, an orthoquinone diazide compound is used, and as the compound, for example, a polycondensation resin of phenols and aldehydes or ketones and the following formula 2 or formula 3 are used. Orthoquinonediazide sulfonic acid ester or carboxylic acid ester obtained by chemically condensing orthoquinonediazide sulfonic acid or carboxylic acid derivative represented by: [Formula 2] [Formula 3] [In the formula, X is -SO2 Y or -COY
In the group represented by, Y represents a group that can be removed during condensation of a halogen atom, an alkali metal, etc. ] Specific examples of the compound represented by the above formula 2 include 1,2-benzoquinonediazide (2)-4-sulfonyl chloride, 1,2-benzoquinonediazide (2)-4-carbonyl chloride, and 1,2-benzoquinonediazide (2)-4-carbonyl chloride.
Examples include benzoquinone diazide (2)-, 5-sulfonyl chloride, 1,2-benzoquinone diazide (2)-5-carbonyl chloride, and the like. Specific examples of the compound represented by the above formula 3 include 1,2-naphthoquinonediazide (2)-4-sulfonyl chloride, 1,2-naphthoquinonediazide (2)
-4-carbonyl chloride, 1,2-naphthoquinonediazide (2)-5-sulfonyl chloride, 1,2-naphthoquinonediazide (2)-5-carbonyl chloride, and the like. Polycondensation resins of phenols and aldehydes or ketones include, for example, Japanese Patent Publication No. 43-28
403, a polycondensate of pyrogallol and acetone; as described in JP-A-55-76346, a polycondensate of a mixture of pyrogallol and resorcin and acetone; JP-A-45-9610; As stated in the publication, phenol, formaldehyde,
Novolac resin or meta-cresol formaldehyde novolac resin; As described in Japanese Patent Publication No. 50-5083, para-substituted phenol formalin resin (e.g. para-cresol formalin resin, para-t-butylphenol formalin resin, Paraethylphenol formalin resin, parapropylphenol formalin resin, paraisopropylphenol formalin resin, para n-butylphenol formalin resin, paraoctylphenol formalin resin, etc.), [0050] described in Japanese Patent Publication No. 62-60407 Polycondensation of formaldehyde with a phenol mixture containing a phenol substituted with an alkyl group or phenyl group having 3 to 12 carbon atoms and phenol or its methyl substituted product or a mixture thereof in a molar ratio of 1:9 to 9:1. (eg, polycondensates of the para-substituted phenol and phenol, para-cresol, metacresol, etc.). The esterification rate of the orthoquinone diazide group to the hydroxyl group of the polycondensation resin of phenols and aldehydes or ketones is preferably 15 to 100 mol%, more preferably 20 to 80 mol%. Furthermore, as an orthoquinone diazide compound,
Orthonaphthoquinonediazide sulfonic acid ester of polyhydroxybenzophenone (e.g. 1,2-naphthoquinonediazide(2)-5-sulfonic ester, 1,2-
naphthoquinone diazide (2)-4-sulfonic acid ester, etc.). This polyoxybenzophenone is a compound obtained by replacing two or more hydrogen atoms of benzophenone with hydroxyl groups, such as dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, pentahydroxybenzophenone, octahydroxybenzophenone, or derivatives thereof. , (for example, a substituent for a halogen atom, an alkyl group, an aryl group, an aralkyl group, a carboxylic acid group), and the like. Preferred are trihydroxybenzophenone and tetrahydroxybenzophenone, more preferred are 2,3,4-trihydroxybenzophenone and 2,3,4,4'-tetrahydroxybenzophenone. Moreover, the esterification rate with respect to hydroxyl groups is preferably 30 to 100%. In the present invention, each of the above compounds may be used alone as the orthoquinone diazide compound, or two or more thereof may be used in combination. Among these orthoquinonediazide compounds listed above, 1,2-naphthoquinonediazide (2)-5-sulfonic acid ester of 2,3,4-trihydroxybenzophenone or 1,2-naphthoquinonediazide (2) )-4-sulfonic acid ester, 1,2-naphthoquinone diazide (2)-5-sulfonic acid ester of metacresol formaldehyde novolak resin or 1,
2-naphthoquinonediazide (2)-4-sulfonic acid ester or a mixture thereof is more preferably used. The proportion of the orthoquinonediazide compound in the photosensitive layer is preferably 50 to 60% by weight, more preferably 20 to 50% by weight. Further, examples of binder resins used in the photosensitive layer include acrylic resins and novolak resins. All copolymerizable monomers can be used as the copolymerizable constituents of the acrylic resin, and in particular, the following compounds having unsaturated bonds are used as monomers for radical polymerization. (1) Monomers having a hydroxyl group: (2)
-Hydoxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxypentyl (meth)acrylate, 4-hydroxyphenyl (
meth)acrylate, 2-hydroxyphenyl(meth)
(Meth)acrylate monomers such as acrylate; N
-(meth)acrylamide monomers such as methylol(meth)acrylamide, N-hydroxyethyl(meth)acrylamide, N-(hydroxyphenyl)-(meth)acrylamide, N-(hydroxynaphthyl)-(meth)acrylamide; o- , m-, p-hydroxystyrene monomers, etc. (2), (meth)acrylic acid ester or amide monomers other than (1); methyl (meth)acrylate, ethyl (meth)acrylate, propyl ( Alkyl (meth)acrylates such as meth)acrylate and butyl (meth)acrylate; N-phenyl (meth)acrylamide, o-, m-, p-methoxyphenyl (meth)acrylamide, o-, m-, p-ethoxy Phenyl (meth)acrylamide etc. (3) Monomers having a cyano group in the side chain; (meth)acrylonitrile, 2-pentenitrile, 2
-Methyl-3-butenenitrile, 2-cyanoethyl acrylate, o-, m-, p-cyanostyrene, etc.; (4)
Monomers having carboxylic acid in the side chain; (meth)acrylic acid, itaconic acid and its anhydride, maleic acid and its anhydride, crotonic acid, etc.; (5) Vinyl ethers; propyl vinyl ether, butyl vinyl ether, Octyl vinyl ether, phenyl vinyl ether, etc., (6) Styrenes; α-methylstyrene, methylstyrene, chloromethylstyrene, styrene, etc.; (7) Vinyl ketones; Methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, etc. (
8) Monomers other than (1) to (7); Examples include olefins such as ethylene, propylene, isobutylene, butadiene, and vinyl chloride, N-vinylpyrrolidone, N-vinylcarbazole, and 4-vinylpyridine, but others Any monomer can be used as long as it can undergo radical copolymerization with these monomers. In the present invention, in addition to the above-mentioned materials, the photosensitive layer may further contain dyes, pigments, coatability improvers, plasticizers,
A fat sensitizer, a stabilizer, etc. can be added. It is advantageous that the photosensitive layer of the positive type photosensitive lithographic printing plate that does not require dampening water further contains a known exposure-visible image imparting agent. Examples of the above dyes include Victoria Pure Blue BOH, Oil Blue #603, Oil Pink #312, Patent Pure Blue, Crystal Violet, Leuco Crystal Violet, Brilliant Green, Ethyl Violet, Methyl Green, Erythrosine B, and Basic Fuchsin. , Malachi Green,
Leucomalachite green, m-cresol purple,
Cresol red, xylenol blue, rhodamine B
, auramine, 4-p-diethylaminophenylimino naphthoquinone, cyano-p-diethylaminophenyl acetanilide, etc.; triphenylmethane, diphenylthane, oxazine, xanthene, iminonaphthoquinone, azomethine, or anthraquinone pigments; can be mentioned. The dye is usually contained in the photosensitive layer in an amount of about 0.01 to about 1
0% by weight, preferably about 0.05-8% by weight. Examples of the coating property improver include alkyl ethers (eg, ethyl cellulose, methyl cellulose), fluorine-based surfactants, nonionic surfactants (eg, Bluronic L64 (manufactured by Asahi Denka)), and the like. Examples of plasticizers for imparting flexibility and abrasion resistance to the coating film include butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate,
Dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrafurfuryl oleate,
Examples include oligomers of acrylic acid or methacrylic acid. [0065] The amount of these additives added varies depending on the intended purpose, but is generally 0.01% of the total solid content.
% to 30% by weight is preferred. The thickness of the photosensitive layer used in the present invention is usually 0.05 to 100 μm, preferably,
It is 0.1 to 20 μm. In the present invention, a silicone rubber layer is coated on the photosensitive layer. The silicone rubber used in the present invention is preferably a cotton-like or somewhat crosslinked polyorganosiloxane. The polyorganosiloxane usually has a molecular weight of 1,000 to several hundred thousand, and is suitably crosslinked in the form of a liquid, wax, or cake at room temperature. The polyorganosiloxane is classified into condensed type and addition type depending on the method of crosslinking. [0067] In the condensed type, crosslinking is performed by a condensation reaction, and water, alcohol, organic acid, etc. are released by the reaction. Particularly useful condensation silicone rubbers include:
Examples include mixtures of linear polyorganosiloxanes having hydroxyl groups, acetoxy groups, etc. at both ends or part of the main chain, and silicone crosslinking agents, or those in which hydroxyl groups are reacted with silicone crosslinking agents, and in both cases, a condensation catalyst is added. This is more advantageous in terms of crosslinking speed. Particularly preferred are those obtained by condensation crosslinking of linear dimethylorganopolysiloxanes having hydroxyl groups at both ends. The main chain of the polyorganosiloxane has the following repeating units. [Formula 4] In the formula, R1 and R2 are each an alkyl group, an aryl group, an alkenyl group, which may have a substituent, or a combination thereof, and include a methyl group, a phenyl group, a vinyl group, and a tri-substituted group. A fluoropropyl group is preferred, and a methyl group is particularly preferred. As the silicone crosslinking agent, -OCO
CH3, -ONR(R'), -ON=CR(R'),
-OR, -NR(R') or -OH (where R and R'
is an alkyl group. ) Condensation type silicone crosslinking agents such as so-called deacetic acid type, deoxime type, dealcoholized type, deaminated type, dehydrated type, and the like, which have a functional group represented by the following formulas, can be mentioned. Examples of such crosslinking agents include tetraacetoxysilane, methyltriacetoxysilane, ethyltriacetoxysilane, phenyltriacetoxysilane, dimethyldiacetoxysilane, diethylacetoxysilane, vinyltriacetoxysilane, methyltrimethoxysilane. , dimethyldimethoxysilane, vinyltrimethoxysilane, methyltris(acetoneoxime)silane, methyltris(N-methyl-N-acetylamino)silane, vinyltris(methylethylketoxime)silane,
Examples include methyltri(methylethylketoxime)silane and oligomers thereof. The amount of each of these crosslinking agents is preferably in the range of 0.5 to 30 parts by weight per 100 parts by weight of the polyorganosiloxane. Examples of the condensation catalyst include organic carboxylic acids, titanate esters, acetylacetone metal complexes, chloroplatinic acid, naphthenic acid, and the like. The addition type refers to one in which a water-based group in a crosslinking agent is added to an unsaturated group in the main body, such as a vinyl group (-CH=CH2), resulting in crosslinking. Specifically, examples include vinyl group-containing organopolysiloxanes, hydrogenated organopolysiloxanes, and the like mixed with platinum-based catalysts (for example, chloroplatinic acid). The polyorganosiloxane has repeating units similar to those of the condensed type described above in the main chain. For the silicone rubber layer used in the present invention, either or both of condensation type and addition type silicone rubbers can be used. It is also possible to use condensed and addition type polyorganosiloxanes having hydroxyl groups, unsaturated groups, etc. in one polyorganosiloxane. The thickness of the silicone rubber layer used in the present invention is usually 0.5 μm to 10 μm, preferably 1 μm.
It is μm to 5 μm. In the present invention, an adhesive layer made of acrylic resin or the like may be provided between the photosensitive layer and the silicone rubber layer, and the adhesive layer may contain various reactive crosslinking agents,
It can contain a silane coupling agent and the like, and the thickness of the adhesive layer is preferably 0.01 μm to 0.5 μm. [0077] As the substrate used in the present invention, any substrate can be used as long as it has the flexibility to be set in a normal lithographic printing machine and can withstand the load applied during printing, including the layer structure. There are no particular restrictions. For example, paper such as coated paper, aluminum plate (JIS standard H
Examples include metal plates such as (-16, H-18, etc.), and plastic films such as polyethylene terephthalate. [0078] In particular, an aluminum plate or a composite material of aluminum foil and other materials is preferable, and an aluminum plate is particularly preferable from the viewpoint of printing durability. In addition, from the viewpoint of storage stability, the substrate, particularly an aluminum plate, or a composite material of aluminum foil and other materials, can be surface-treated by a known method before use. Such surface treatments include, for example, a method of treating the surface of an aluminum plate with a silicate (US Pat. No. 2,714,066), a method of treating the surface of an aluminum plate with an organic acid salt (US Pat. No. 2,714, No. 066), a method of treatment with phosphonic acids and their derivatives (U.S. Pat. No. 3,220,
No. 832), treatment with potassium hexafluorozirconate (U.S. Pat. No. 2,946,683), anodic oxidation, and treatment with an aqueous solution of alkali metal silicate after anodization (U.S. Pat. No. 3, 181,461) etc. The thickness of such a support is 50 μm to 4 μm.
00 μm is preferable, more preferably 100 μm to 30 μm.
It is 0 μm. In the present invention, a protective layer may be provided on the upper surface of the silicone rubber layer, if necessary. As the material for this protective layer, it is preferable to use a water-soluble film such as polyvinyl alcohol, a biodegradable film such as polyhydroxyalkanoate, or polyesteramide. The plate material of the present invention that does not require dampening water can be produced, for example, as follows. A composition solution to form a primer layer is applied onto a support using a conventional coater such as a reverse roll coater, an air knife coater, a Meyer bar coater, or a rotary coating device such as a Whaler, and is dried and crosslinked to cure. Next, a composition solution to form a photosensitive layer is applied and dried. [0082] A silicone rubber solution is applied onto the above photosensitive layer in a similar manner and heat-treated at a temperature of usually 100 to 120°C for several minutes to sufficiently cure the solution to form a silicone rubber layer. If necessary, a protective film can be provided on the silicone rubber layer using a laminator. Next, a method for manufacturing a printing plate that does not require dampening water using the plate material that does not require dampening water of the present invention will be explained. A positive film, which is the manuscript, is vacuum-adhered to the surface of the positive plate material and exposed. As a light source for this exposure, a mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, etc., which generate abundant ultraviolet light, are used. Next, the positive film is peeled off and developed using a developer. [Example] Example 1 Production of aluminum plate a An aluminum plate with a thickness of 0.24 mm was immersed in a 3% aqueous sodium hydroxide solution, washed with water, and then immersed in a 32% aqueous sulfuric acid solution at a temperature of 5 A/dm2 at a temperature of 30°C. It was anodized for 10 seconds under the following conditions, washed with water, immersed in a 2% sodium metasilicate aqueous solution at a temperature of 85°C for 37 seconds, further immersed in water at a temperature of 90°C (pH 8.5) for 25 seconds, washed with water, and dried. , an aluminum plate a was obtained. [0085] A primer layer composition having the composition shown below was applied to an aluminum plate a, and after drying at 85°C for 3 minutes, 3K
The entire surface was exposed to light at 1000 mJ/cm2 using a W ultra-high pressure mercury lamp. Further dry at 100℃ for 4 minutes to a thickness of 15mm.
A primer layer of μm was formed. [Primer layer composition] Copolymer resin of 2-hydroxyethyl methacrylate and methyl methacrylate (50/50 molar ratio)
100 parts by weight pentaerythritol tetraacrylate
100 parts by weight DETX
(Polymerization initiator, manufactured by Nippon Kayaku Co., Ltd.)
5 parts by weight EPA (sensitizer, manufactured by Nippon Kayaku Co., Ltd.)
5 parts by weight Victoria Pure Blue BOH
200 parts by weight methyl lactate
1000
Parts by Weight Next, a concealing layer composition having the composition shown below was coated on the primer layer and dried at 100° C. for 2 minutes to form a concealing layer having a thickness of 1 μm. [Hiding layer composition] Copolymer resin of 2-hydroxyethyl methacrylate, N-(4-hydroxy phenyl) methacrylamide, and methacrylic acid in a molar ratio of 40/57/3.
1
00 parts by weight titanium dioxide
100 parts by weight methyl cellosolve
900 parts by weight 0088
Next, a photosensitive composition having the composition shown below was coated on the concealing layer and dried at 100° C. for 2 minutes to form a photosensitive layer having a thickness of 0.3 μm. [Photosensitive composition] (1) Diazo resin-1
50 parts (2) 2-hydroxyethyl methacrylate, N-(4-hydroxyphenyl) methacramide, methacrylic acid in a molar ratio of 40/57/3 copolymerized resin-1
50 parts by weight (3) Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd., dye)
1 part by weight (4) Methyl cellosolve
90
0 parts by weight Diazo resin-1 was synthesized as follows. p-diazodiphenylamine sulfate 14.5g (5
0 mmol) was dissolved in 40.9 g of concentrated sulfuric acid under ice cooling. 1.35 g (45 mmol) of paraformaldehyde was slowly added to this reaction solution so that the reaction temperature did not exceed 10°C. This reaction mixture was added dropwise to 500 ml of ethanol under ice cooling, and the resulting precipitate was filtered. After washing with ethanol, this precipitate was dissolved in 100 ml of pure water, and a cold concentrated aqueous solution containing 6.8 g of zinc chloride was added to this solution. The resulting precipitate was filtered, washed with ethanol, and dissolved in 150 ml of pure water. To this liquid was added a cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved. The resulting precipitate was collected by filtration, washed with water, and then dried to obtain diazo resin-1. Next, the following silicone rubber composition was coated on the photosensitive layer to a dry film thickness of 1.8 μm.
It was dried at ℃ for 10 minutes. [Silicone rubber layer composition] (1) Dimethylpolysiloxane having hydroxyl groups at both ends (molecular weight 82,000)
100
Part by weight (2) Triacetoxymethylsilane
10 parts by weight (3) dibutyltin laurate
0.8
Weight part (4) Isopar E (manufactured by Esso Chemical)
900 parts by weight [0092] Next, a layer with a thickness of 5 μm was applied on the silicone rubber layer.
A single-sided matte polypropylene film was laminated to obtain a photosensitive lithographic printing plate that did not require dampening water. After a positive film was vacuum-adhered to the upper surface of the above plate material, it was exposed to light using a metal halide lamp as a light source. Next, after immersing it in the following developer for 1 minute,
By rubbing the surface of the plate material with a pad impregnated with developer, the silicone rubber layer, photosensitive layer, and hiding layer in the unexposed areas are removed, the halftone dots are well reproduced, and the unexposed image areas are removed. A printing plate was obtained in which a blue colored primer layer appeared in some areas. [Developer] β-anilinoethanol
0.5 part propylene glycol
1.0 part p-tert-butylbenzoic acid
1.0 part potassium hydroxide
1.0 copy
Polyoxyethylene lauryl ether
0.1 part potassium sulfite
2.0 parts potassium metasilicate
3.0 parts water
91 parts Example 2 In the primer layer composition of Example 1, Victoria Pure Blue-BOH was mixed with Mitsubishi Carbon Black MA-100.
(manufactured by Mitsubishi Kasei Corporation, pigment) and the hiding layer composition was changed as follows, the same procedure as in Example 1 was carried out to obtain a photosensitive lithographic printing plate that did not require dampening water. [Hidden layer composition] Copolymer resin-2 with a styrene/methacrylic acid molar ratio of 70/30 100 parts by weight calcium powder
100 parts by weight methyl cellosolve
900 parts by weight When exposure and development were carried out in the same manner as in Example 1, the silicone rubber layer, photosensitive layer and hiding layer in the unexposed areas were removed, the halftone dots were well reproduced, and the unexposed area in the image area was removed. A printing plate was obtained in which a black colored primer layer appeared in the exposed areas. Example 3 A dampening water-free photosensitive lithographic printing plate was obtained in the same manner as in Example 1, except that the compositions of the primer layer and hiding layer of Example 1 were changed as follows. [Primer layer composition] Epikote 1007 (epoxy resin, manufactured by Shell Oil Co., Ltd.) 50 parts by weight Hytanol 4010 (
Phenol resin, manufactured by Hitachi Chemical)
50 parts by weight ethyl cellosolve
360 parts by weight ethyl cellosolve acetate
360 parts by weight Shimla Fast Red 4
015
100 parts by weight butyl cellosolve
180 parts by weight [Hidden layer composition] Copolymer resin of p-hydroxystyrene/2-hydroxyethyl methacrylate/methacrylic acid in a molar ratio of 50/30/20-3 1
00 parts by weight zinc oxide
100 parts by weight methyl cellosolve
900 parts by weight 010
0] Exposure and development were carried out in the same manner as in Example 1.
The silicone rubber layer, photosensitive layer and hiding layer in the unexposed areas are removed, resulting in a printing plate in which halftone dots are well reproduced and a primer layer colored bright red appears in the unexposed areas, which are image areas. It was done. Effects of the Invention In the present invention, since a coloring agent is contained in a primer layer and a concealing layer is provided on the primer layer,
The images obtained are clear, and since the dyeing process is not required, the time required for the dyeing process can be saved.In addition, the staining solution does not stain hands or clothes, and furthermore, the automatic processor does not get dirty. A photosensitive lithographic printing plate that does not require dampening water and exhibits the following effects can be obtained. applicant
Konica Co., Ltd. Agent Patent Attorney
Mikio Nakajima
Claims (1)
ンキ反撥層を順次積層してなる湿し水不要感光性平版印
刷版において、前記プライマー層が着色剤を含有し、か
つ感光層とプライマー層との間に隠蔽層を設けた湿し水
不要感光性平版印刷版。1. A dampening water-free photosensitive lithographic printing plate comprising a primer layer, a photosensitive layer, and an ink repellent layer sequentially laminated on a substrate, wherein the primer layer contains a colorant, and the photosensitive layer and the primer layer A photosensitive lithographic printing plate that does not require dampening water and has a concealing layer between it.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41129290A JPH04216555A (en) | 1990-12-18 | 1990-12-18 | Photosensitive planographic printing plate without requiring damping water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41129290A JPH04216555A (en) | 1990-12-18 | 1990-12-18 | Photosensitive planographic printing plate without requiring damping water |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04216555A true JPH04216555A (en) | 1992-08-06 |
Family
ID=18520310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP41129290A Pending JPH04216555A (en) | 1990-12-18 | 1990-12-18 | Photosensitive planographic printing plate without requiring damping water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04216555A (en) |
-
1990
- 1990-12-18 JP JP41129290A patent/JPH04216555A/en active Pending
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