JPH0421525U - - Google Patents
Info
- Publication number
- JPH0421525U JPH0421525U JP6255290U JP6255290U JPH0421525U JP H0421525 U JPH0421525 U JP H0421525U JP 6255290 U JP6255290 U JP 6255290U JP 6255290 U JP6255290 U JP 6255290U JP H0421525 U JPH0421525 U JP H0421525U
- Authority
- JP
- Japan
- Prior art keywords
- wall
- ion
- electrodes
- cylindrical
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
Landscapes
- Oxygen, Ozone, And Oxides In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6255290U JPH0421525U (zh) | 1990-06-13 | 1990-06-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6255290U JPH0421525U (zh) | 1990-06-13 | 1990-06-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0421525U true JPH0421525U (zh) | 1992-02-24 |
Family
ID=31591808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6255290U Pending JPH0421525U (zh) | 1990-06-13 | 1990-06-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0421525U (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008108331A1 (ja) * | 2007-03-05 | 2008-09-12 | Ohnit Co., Ltd. | 低温プラズマ発生体 |
-
1990
- 1990-06-13 JP JP6255290U patent/JPH0421525U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008108331A1 (ja) * | 2007-03-05 | 2008-09-12 | Ohnit Co., Ltd. | 低温プラズマ発生体 |
| JP5405296B2 (ja) * | 2007-03-05 | 2014-02-05 | オーニット株式会社 | 低温プラズマ発生体 |