JPH04212206A - Insulating paint, solderable insulated wire, manufacture of the insulated wire, and flyback transformer using the insulated wire - Google Patents

Insulating paint, solderable insulated wire, manufacture of the insulated wire, and flyback transformer using the insulated wire

Info

Publication number
JPH04212206A
JPH04212206A JP3062316A JP6231691A JPH04212206A JP H04212206 A JPH04212206 A JP H04212206A JP 3062316 A JP3062316 A JP 3062316A JP 6231691 A JP6231691 A JP 6231691A JP H04212206 A JPH04212206 A JP H04212206A
Authority
JP
Japan
Prior art keywords
chemical formula
formula
general formula
group
group selected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3062316A
Other languages
Japanese (ja)
Inventor
Tetsuo Tajima
田島 哲夫
Ryoichi Sudo
須藤 亮一
Makoto Obata
誠 小幡
Fusaji Shoji
房次 庄子
Kimikatsu Kitatani
北谷 公克
Hiroshige Oikawa
及川 宏滋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3062316A priority Critical patent/JPH04212206A/en
Publication of JPH04212206A publication Critical patent/JPH04212206A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an insulated wire having excellent heat resistivity and solderability by painting specific insulating paint including polyamic acid onto a conductor and baking it. CONSTITUTION:An insulating paint including a polyamic acid shown by formula I (where X stands for an alkylene group or an alkylenephenylene group, n is a positive integer, R<1> stands for a quadrivalent organic group shown by formula II, R<2> stands for a bivalent organic group shown by formula III. When R<1> is aquadrivalent organic group shown by formula IV, R<2> is selected to be a bivalent organic group shown by formula V, and k is selected to be an integer ranging from 1 to 10.) is applied onto a conductor 1, followed by baking. With this constitution, heat resistivity is compatible with solderability, so that a wire coated with a polyimide resin or with an imide-denaturated polyurethane resin available to electric machineries with high workability can be obtained.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、耐熱性に優れ、ハンダ
付け性の良い絶縁電線及び絶縁塗料に関し、さらに詳し
くは、ポリイミド樹脂又はイミド変性ポリウレタン樹脂
皮膜を導体上に形成させたハンダ付け可能な絶縁電線及
びその製造方法、並びに絶縁塗料更には前記絶縁電線を
用いたフライバックトランスに関する。
[Field of Industrial Application] The present invention relates to insulated wires and insulating paints that have excellent heat resistance and good solderability, and more specifically, the present invention relates to insulated wires and insulating paints that have excellent heat resistance and good solderability. The present invention relates to an insulated wire, a method for manufacturing the same, an insulating coating, and a flyback transformer using the insulated wire.

【0002】0002

【従来の技術】最近、テレビ等家電製品の小型・軽量化
が一層進み、これに対応して、モ−タ−やトランス等の
電気機器の小型・軽量化・高性能化は著しく、また、そ
の信頼性向上も強く望まれている。
[Prior Art] Recently, home appliances such as televisions have become more compact and lightweight, and in response to this, electrical equipment such as motors and transformers have become significantly smaller, lighter, and more efficient. There is also a strong desire to improve its reliability.

【0003】これらの観点から、上記電気機器等に用い
られている絶縁電線の被覆材料としては耐熱性の優れた
材料が望まれ、ポリエステル樹脂塗料を用いた電線がB
種(130℃)またはF種(155℃)の絶縁電線とし
て用いられている。他に、さらに耐熱性の優れた材料と
してポリイミド樹脂が知られている。
From these viewpoints, a material with excellent heat resistance is desired as a coating material for insulated wires used in the above-mentioned electrical equipment, etc., and wires using polyester resin paint are preferred.
It is used as a type (130°C) or F type (155°C) insulated wire. In addition, polyimide resin is known as a material with even better heat resistance.

【0004】一方、電気機器の小型・軽量化・高性能化
には電線の細線化を必要とし、細線化されたポリエステ
ル絶縁電線には、一層高性能なものが求められるように
なった。
On the other hand, the reduction in size, weight, and performance of electrical equipment requires thinner wires, and thinner polyester insulated wires are now required to have even higher performance.

【0005】さらに、これらのポリエステル絶縁電線は
過酷な環境下で使用される為、耐熱性、電気絶縁性の他
に耐化学薬品性、耐溶剤性、耐加水分解性および耐アル
カリ性が求められている。
Furthermore, since these polyester insulated wires are used in harsh environments, they are required to have chemical resistance, solvent resistance, hydrolysis resistance, and alkali resistance in addition to heat resistance and electrical insulation. There is.

【0006】また、原価低減を目的に工程の合理化が求
められている。
[0006] Furthermore, there is a demand for process rationalization for the purpose of cost reduction.

【0007】その一環として絶縁電線の端末はく離処理
の合理化およびライン化がある。
[0007] As part of this effort, there is the rationalization and production line of the terminal stripping process of insulated wires.

【0008】現在、この端末はく離の処理方法には、機
械はく離、熱分解はく離、薬品はく離およびハンダはく
離等の諸方法があるが、作業時間、細線の導体の無傷化
および連続処理化等を考えると、上記のハンダはく離処
理方法が最も好ましい。
At present, there are various methods for processing this terminal peeling, such as mechanical peeling, thermal decomposition peeling, chemical peeling, and solder peeling. The above solder stripping method is most preferable.

【0009】しかし、ポリエステル絶縁電線は、薬品は
く離によるライン化はすでに行なわれているものの、薬
品中への浸漬に一定時間を必要とし、また洗浄も必要に
なる。取扱う上でも薬品の危険があるため、ハンダはく
離のライン化が試みられたが、従来のポリエステル絶縁
電線ではいずれもハンダはく離性を有していなかった。
However, although polyester insulated wires have already been made into lines by chemical stripping, they require a certain amount of time to be immersed in chemicals and also require cleaning. Because of the danger of chemicals in handling, attempts were made to create a solder stripping line, but none of the conventional polyester insulated wires had solder stripping properties.

【0010】また、耐熱性が優れたものとしてポリイミ
ド絶縁電線があるが(特開平1−124905号)、ハ
ンダはく離性を有していない。
[0010]Although polyimide insulated wire has excellent heat resistance (Japanese Unexamined Patent Publication No. 1-124905), it does not have solder releasability.

【0011】ハンダはく離処理が可能な絶縁電線として
は、特開昭64−90268号に見られるようにポリウ
レタン樹脂を主成分とするポリウレタン絶縁電線がある
が、耐熱性がE種(120℃)と低いものである。
[0011] As insulated wires that can be treated with solder peeling, there are polyurethane insulated wires whose main component is polyurethane resin, as seen in JP-A No. 64-90268, but the heat resistance is class E (120°C). It is low.

【0012】このため、ハンダはく離処理ができる、耐
熱性がB種(130℃)以上の耐熱性樹脂被覆の絶縁電
線の出現が強く望まれている。
[0012] Therefore, there is a strong desire for an insulated wire coated with a heat-resistant resin having a heat resistance of class B (130°C) or higher, which can be subjected to solder peeling treatment.

【0013】また、最近、多数のより合わせ絶縁電線を
ハンダ付けする場合には、絶縁皮膜が被ったままの絶縁
電線を直接ハンダ浴に浸漬することによって絶縁皮膜の
はく離とハンダ付けを一挙に行なう端末処理が増えてき
た。
[0013] Recently, when soldering a large number of stranded insulated wires, it has become common practice to strip the insulation film and solder the wires at the same time by directly immersing the wires with the insulation film still covered in a solder bath. Terminal processing has increased.

【0014】このためには、ハンダ浴への浸漬に続いて
絶縁皮膜はできるだけ速やかに除去されねばならない。 ハンダ浴への浸漬が短時間であればある程に良いことは
当然である。
For this purpose, the insulating coating must be removed as quickly as possible following immersion into the solder bath. Naturally, the shorter the immersion time in the solder bath, the better.

【0015】ハンダはく離においては、溶融ハンダ浴の
温度が450℃を超えるとハンダ浴の酸化劣化が著しく
進み、導体である銅がハンダに溶解する速度が速くなる
ために絶縁電線の線細りの問題が生じて来る。
[0015] In solder stripping, if the temperature of the molten solder bath exceeds 450°C, the oxidation deterioration of the solder bath progresses significantly, and the rate at which copper, which is a conductor, dissolves in the solder increases, resulting in the problem of wire thinning of insulated wires. will arise.

【0016】上記のようなハンダはく離性を考慮して、
ポリエステルイミド樹脂系の絶縁皮膜を有する絶縁電線
(特開昭63−289711号)や、ポリエステルイミ
ドとイソシアネ−トから形成されるポリウレタン系の組
成物(特開昭63−69819号)等が提案されている
が、これらは皮膜の化学構造が異なり、また、原料が特
殊なものであったり、反応が複雑であるので、製品が高
価格となる上、極性基濃度が高いため電気絶縁性に劣る
欠点がある。更に、エステル型の架橋構造が多いためハ
ンダ付け性に劣る可能性がある。
Considering the solder releasability as described above,
Insulated wires having an insulating film made of polyesterimide resin (Japanese Unexamined Patent Publication No. 63-289711) and polyurethane compositions formed from polyesterimide and isocyanate (Japanese Unexamined Patent Application No. 63-69819) have been proposed. However, these films have different chemical structures, the raw materials are special, and the reactions are complicated, making the products expensive, and they have poor electrical insulation properties due to the high concentration of polar groups. There are drawbacks. Furthermore, since there are many ester-type crosslinked structures, solderability may be poor.

【0017】[0017]

【発明が解決しようとする課題】上記の問題点に鑑み、
本発明は絶縁電線被覆材料の耐熱性がB種(130℃)
以上で、被覆材料のはく離とハンダ付けを450℃以下
の温度で一挙にできる、優れた熱的、機械的、電気的、
化学的特性をもつハンダ付け可能な絶縁電線及び絶縁塗
料を、比較的容易にかつ低価格にて提供すべくなされた
ものであり、さらには、上記絶縁電線を用いたフライバ
ックトランスを提供することを目的とする。
[Problem to be solved by the invention] In view of the above problems,
The heat resistance of the insulated wire coating material of the present invention is Class B (130°C).
The above describes the excellent thermal, mechanical, electrical, and
The present invention has been made to provide solderable insulated wires and insulating paints having chemical properties relatively easily and at low cost, and furthermore, to provide a flyback transformer using the above-mentioned insulated wires. With the goal.

【0018】[0018]

【課題を解決するための手段】上記目的を達成するため
に、本発明者らが鋭意検討を重ねた結果、特定の化学構
造のポリアミド酸又はポリイミドを含む絶縁塗料、ある
いは特定の化学構造のポリアミド酸とイソシアネ−ト又
はブロック化イソシアネ−トとを含む絶縁塗料を用いて
、これを導体上に塗布し焼き付けることによって、上記
の要望に応える絶縁電線が得られることを見出し、本発
明に到達した。
[Means for Solving the Problems] In order to achieve the above object, the present inventors have made extensive studies and have developed an insulating paint containing polyamic acid or polyimide with a specific chemical structure, or a polyamide coating with a specific chemical structure. The present inventors have discovered that an insulated wire that meets the above requirements can be obtained by applying an insulating paint containing acid and isocyanate or blocked isocyanate onto a conductor and baking it, and have arrived at the present invention. .

【0019】すなわち、本発明は、一般式(化1)That is, the present invention provides general formula (Formula 1)

【0
020】
0
020]

【化1】[Chemical formula 1]

【0021】で示されるポリアミド酸を含む絶縁塗料を
導体上に塗布し、焼き付けてなる、ポリイミド樹脂皮膜
を有するハンダ付け可能な絶縁電線に関する。
The present invention relates to a solderable insulated wire having a polyimide resin film, which is obtained by coating a conductor with an insulating paint containing a polyamic acid represented by the formula and baking it.

【0022】但し、上記一般式(化1)中、Xは、ポリ
アミド酸のエンドキャップ剤であるヒドロキシルアミン
中の主鎖となるアルキレン基又はアルキレンフェニレン
基であり、特に望ましくは、Xは一般式(化12)
However, in the above general formula (Chemical formula 1), X is an alkylene group or an alkylenephenylene group that becomes the main chain in hydroxylamine, which is an end capping agent for polyamic acid, and particularly preferably, X is a group of the general formula (Chem.12)

【0
023】
0
023]

【化12】[Chemical formula 12]

【0024】からなる群より選ばれるアルキレン基又は
一般式(化13)
An alkylene group selected from the group consisting of: or general formula (Formula 13)

【0025】[0025]

【化13】[Chemical formula 13]

【0026】からなる群より選ばれるアルキレンフエニ
レン基である。
An alkylenephenylene group selected from the group consisting of:

【0027】すなわち、上記式中、HO−X−は、一般
式(化14)
That is, in the above formula, HO-X- is represented by the general formula (Chemical formula 14)

【0028】[0028]

【化14】[Chemical formula 14]

【0029】からなる群より選ばれる1価の有機基であ
り、これらの基を含むモノアミンはエンドキャップ剤と
して同等に用いられるものである。
It is a monovalent organic group selected from the group consisting of the following, and monoamines containing these groups are equally used as end-capping agents.

【0030】以下、本願明細書全体を通じて他の一般式
においてもXについては同様である。
The same applies to X in other general formulas throughout this specification.

【0031】また、nは正の整数であり、皮膜の機械的
強度の点からnは5以上であることが望ましい。以下、
本願明細書全体を通じて他の一般式においてもnについ
ては同様である。
Further, n is a positive integer, and from the viewpoint of the mechanical strength of the film, n is desirably 5 or more. below,
The same applies to n in other general formulas throughout this specification.

【0032】またR1及びR2については、R1が一般
式(化2)
Regarding R1 and R2, R1 has the general formula (Formula 2)

【0033】[0033]

【化2】[Case 2]

【0034】からなる群より選ばれる4価の有機基であ
るとき、R2は一般式(化3)
When R2 is a tetravalent organic group selected from the group consisting of:

【0035】[0035]

【化3】[Chemical 3]

【0036】からなる群より選ばれる2価の有機基(h
は2〜16の整数、i及びjは2〜10の整数)であり
、R1が一般式(化4)
A divalent organic group (h
is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is the general formula (Chemical formula 4)

【0037】[0037]

【化4】[C4]

【0038】からなる群より選ばれる4価の有機基であ
るとき、R2は一般式(化5)
When R2 is a tetravalent organic group selected from the group consisting of:

【0039】[0039]

【化5】[C5]

【0040】からなる群より選ばれる2価の有機基(k
は1〜10の整数、l及びmは2〜10の整数)である
A divalent organic group (k
is an integer of 1 to 10, l and m are integers of 2 to 10).

【0041】以下、本願明細書全体を通じて他の一般式
においてもR1及びR2については同様である。
The same applies to R1 and R2 in other general formulas throughout this specification.

【0042】上記の絶縁電線は次のようにして製造する
ことができる。
The above insulated wire can be manufactured as follows.

【0043】すなわち、本願発明は、一般式(化6)That is, the present invention is based on the general formula (chemical formula 6)


0044】
[
0044

【化6】[C6]

【0045】で示されるヒドロキシルアミンと、一般式
(化7)
Hydroxylamine represented by the formula (Chemical formula 7)

【0046】[0046]

【化7】[C7]

【0047】で示されるテトラカルボン酸二無水物と、
一般式(化8)
A tetracarboxylic dianhydride represented by:
General formula (Chemical formula 8)

【0048】[0048]

【化8】[Chemical formula 8]

【0049】で示されるジアミンとを、有機溶媒の存在
下に反応させ、一般式(化1)
A diamine represented by the formula (Chemical formula 1) is reacted with the diamine represented by the formula (Chemical formula 1) in the presence of an organic solvent.

【0050】[0050]

【化1】[Chemical formula 1]

【0051】で示されるポリアミド酸を生成させた後、
これを含む絶縁塗料を導体上に塗布し、焼き付けて、上
記一般式(化1)中のアミド基とカルボキシル基とを分
子内反応させてイミド化してポリイミド樹脂とすること
を特徴とするハンダ付け可能な絶縁電線の製造方法に関
する。
After producing the polyamic acid shown below,
Soldering characterized by applying an insulating paint containing this on a conductor, baking it, and causing an intramolecular reaction between the amide group and the carboxyl group in the above general formula (Chemical formula 1) to imidize it into a polyimide resin. The present invention relates to a possible manufacturing method of an insulated wire.

【0052】上記製造方法において用いられる有機溶媒
は、反応促進の為に必要であり、例えば、ジメチルアセ
トアミド、N−メチルピロリドン、N−メチルカプロラ
クタム、ジメチルスルホン、ジメチルホルムアミド、ジ
メチルスルホキシド等である。
The organic solvent used in the above production method is necessary for promoting the reaction, and includes, for example, dimethylacetamide, N-methylpyrrolidone, N-methylcaprolactam, dimethylsulfone, dimethylformamide, dimethylsulfoxide, and the like.

【0053】また、上記製造方法において、絶縁塗料中
に触媒量の第三級アミンを加えてもよい。これらは、例
えば、トリエチルアミン、トリ−n−ブチルアミン、ジ
メチルドデシルアミン、ピリジン、4−イソプロピルピ
リジン、N−ジメチルベンジルアミン、イソキノリン、
N−メチルモルホリン等である。これらの第三級アミン
は、イミド化ばかりでなく、ウレタン化の触媒としても
作用する。
Further, in the above manufacturing method, a catalytic amount of tertiary amine may be added to the insulating coating. These include, for example, triethylamine, tri-n-butylamine, dimethyldodecylamine, pyridine, 4-isopropylpyridine, N-dimethylbenzylamine, isoquinoline,
N-methylmorpholine and the like. These tertiary amines act not only as catalysts for imidization but also for urethanization.

【0054】図1は、本発明に係る絶縁電線の断面図で
ある。図1において1は銅線などの導体であり、導体1
には、絶縁塗料を塗布し焼き付けることにより、絶縁皮
膜2が形成されている。
FIG. 1 is a sectional view of an insulated wire according to the present invention. In FIG. 1, 1 is a conductor such as a copper wire, and the conductor 1
An insulating film 2 is formed by applying an insulating paint and baking it.

【0055】上記一般式(化1)で示されるポリアミド
酸を含む絶縁塗料を導体上に塗布し、焼き付けることに
より、一般式(化1)中のアミド基とカルボキシル基と
が分子内反応によりイミド化してポリイミド樹脂が生成
するとともに、溶媒が揮発して強固なポリイミド樹脂皮
膜が導体上に形成される。
By applying an insulating paint containing a polyamic acid represented by the above general formula (Chemical formula 1) onto a conductor and baking it, the amide group and carboxyl group in the general formula (Chemical formula 1) are converted into imide by an intramolecular reaction. At the same time, the solvent evaporates and a strong polyimide resin film is formed on the conductor.

【0056】また、上記一般式(化1)で示されるポリ
アミド酸を含む絶縁塗料は、ポリアミド酸の合成の過程
で、反応温度が高いなどの条件によっては分子内イミド
化が起こり、一般式(化9)
In addition, insulating paints containing polyamic acid represented by the general formula (Chemical formula 1) undergo intramolecular imidization depending on conditions such as high reaction temperature during the synthesis process of the polyamic acid, resulting in the formation of the general formula (Chemical formula 1). 9)

【0057】[0057]

【化9】[Chemical formula 9]

【0058】で示されるポリイミドをも含んでいる場合
もあり得る。
It may also contain the polyimide shown below.

【0059】また更に、絶縁塗料が上記一般式(化9)
で示されるポリイミドを含むように、導体上への塗布前
にイミド化を予め進めておいてもよい。この場合ポリア
ミド酸の合成反応時に有機溶媒の中にイミド化触媒を添
加しておくことが望ましい。
Furthermore, the insulating paint has the above general formula (Chemical formula 9)
Imidation may be performed in advance before coating on the conductor so that the polyimide shown in is included. In this case, it is desirable to add an imidization catalyst to the organic solvent during the polyamic acid synthesis reaction.

【0060】イミド化触媒は上記した第三級アミンなど
である。
The imidization catalyst is the above-mentioned tertiary amine.

【0061】すなわち、本発明は、一般式(化9)That is, the present invention provides general formula (Formula 9)

【0
062】
0
062]

【化9】[Chemical formula 9]

【0063】で示されるポリイミドを含む絶縁塗料を導
体上に塗布し、焼き付けてなる、ポリイミド樹脂皮膜を
有するハンダ付け可能な絶縁電線に関する。
The present invention relates to a solderable insulated wire having a polyimide resin film, which is obtained by coating a conductor with an insulating paint containing polyimide represented by the formula and baking it.

【0064】さらに、本発明は、上記絶縁電線の製造方
法として、一般式(化6)
Furthermore, the present invention provides a method for manufacturing the above-mentioned insulated wire using the general formula (Chemical formula 6).

【0065】[0065]

【化6】[C6]

【0066】で示されるヒドロキシルアミンと、一般式
(化7)
Hydroxylamine represented by the formula (Chemical formula 7)

【0067】[0067]

【化7】[C7]

【0068】で示されるテトラカルボン酸二無水物と、
一般式(化8)
A tetracarboxylic dianhydride represented by:
General formula (Chemical formula 8)

【0069】[0069]

【化8】[Chemical formula 8]

【0070】で示されるジアミンとを、有機溶媒の存在
下に反応させ、一般式(化9)
A diamine represented by the formula (Chemical formula 9) is reacted with the diamine represented by the formula (Chemical formula 9) in the presence of an organic solvent.

【0071】[0071]

【化9】[Chemical formula 9]

【0072】で示されるポリイミドを生成させた後、こ
れを含む絶縁塗料を導体上に塗布し、焼き付けることを
特徴とするハンダ付け可能な絶縁電線の製造方法に関す
る。
The present invention relates to a method for producing a solderable insulated wire, which comprises producing a polyimide represented by the following formula, and then applying an insulating paint containing the polyimide onto a conductor and baking it.

【0073】ここにおいて、ポリイミドの生成は、イミ
ド化触媒の添加あるいは、反応温度を高くする等によっ
てなされる。
[0073] Here, polyimide is produced by adding an imidization catalyst or increasing the reaction temperature.

【0074】さらにまた、本発明は、一般式(化1)Furthermore, the present invention provides general formula (Formula 1)


0075】
[
0075

【化1】[Chemical formula 1]

【0076】で示されるポリアミド酸と、イソシアネ−
ト又はブロック化イソシアネ−トを含む絶縁塗料を導体
上に塗布し、焼き付けてなる、イミド化ポリウレタン樹
脂皮膜を有するハンダ付け可能な絶縁電線に関する。
The polyamic acid shown below and the isocyanate
The present invention relates to a solderable insulated wire having an imidized polyurethane resin film, which is obtained by coating a conductor with an insulating paint containing isocyanate or blocked isocyanate and baking it.

【0077】ここにおいて、一般式(化1)で示される
ポリアミド酸をポリオ−ルとして、末端の2つの水酸基
とイソシアネ−トを反応させることにより、イミド化ポ
リウレタンが生成することを利用するものであり、上記
イミド化ポリウレタン樹脂皮膜を有する絶縁電線は次の
ようにして製造することができる。
[0077] Here, the method takes advantage of the fact that imidized polyurethane is produced by reacting the two terminal hydroxyl groups with isocyanate using polyamic acid represented by the general formula (Chemical formula 1) as a polyol. The insulated wire having the above-mentioned imidized polyurethane resin film can be manufactured as follows.

【0078】すなわち、本発明は、一般式(化1)That is, the present invention provides general formula (Formula 1)

【0
079】
0
079]

【化1】[Chemical formula 1]

【0080】で示されるポリアミド酸と、イソシアネ−
ト又はブロック化イソシアネ−トとを上記ポリアミド酸
の末端水酸基1当量につきイソシアネ−ト基0.4〜2
.0当量の割合で配合してなる絶縁塗料を導体上に塗布
し、焼き付けることにより、上記ポリアミド酸のアミド
基とカルボキシル基とが分子内反応してイミド化すると
ともに、末端水酸基がイソシアネ−ト又はブロック化イ
ソシアネ−ト基と反応してイミド化ポリウレタン樹脂が
生成することを特徴とするハンダ付け可能な絶縁電線の
製造方法に関する。
The polyamic acid represented by
or blocked isocyanate in an amount of 0.4 to 2 isocyanate groups per equivalent of terminal hydroxyl group of the above polyamic acid.
.. By applying an insulating paint containing a 0 equivalent ratio onto a conductor and baking it, the amide group and carboxyl group of the polyamic acid react intramolecularly to imidize it, and the terminal hydroxyl group is converted into isocyanate or carboxyl group. The present invention relates to a method for manufacturing a solderable insulated wire, characterized in that an imidized polyurethane resin is produced by reacting with a blocked isocyanate group.

【0081】なお、末端水酸基とイソシアネ−ト基の当
量比が上記範囲の時に、ウレタン化反応が完結し、被覆
層の諸特性が良好であり、特に、イソシアネ−ト基とし
て0.9〜1.1当量が著しく良い。
Note that when the equivalent ratio of the terminal hydroxyl group to the isocyanate group is within the above range, the urethanization reaction is completed and the various properties of the coating layer are good. .1 equivalent is significantly better.

【0082】また、イソシアネ−トとしては、ジイソシ
アネ−トあるいはトリイソシアネ−トの例として、フェ
ニレンジイソシアネ−ト、トルイレンジイソシアネ−ト
、1−エチルベンゼン−2,4−ジイソシアネ−ト、ジ
フェニルメタンジイソシアネ−ト、1−イソプロピルベ
ンゼン−2,4−ジイソシアネ−ト、1−クロルベンゼ
ン−2,4−ジイソシアネ−ト、キシリレンジイソシア
ネ−ト、1−ニトロベンゼン−2,4−ジイソシアネ−
ト、イソホロンジイソシアネ−ト、1−メトキシベンゼ
ン−2,4−ジイソシアネ−ト、ナフタレンジイソシア
ネ−ト、ジメチルビフェニレンジイソシアネ−ト、1−
メチルベンゼン−2,4,6−トリイソシアネ−ト、ト
リフェニルメタントリイソシアネ−ト、1,3,5−ト
リメチルベンゼン−2,4,6−トリイソシアネ−ト、
ナフタレン−1,3,7−トリイソシアネ−ト、ビフェ
ニル−2,4,4´−トリイソシアネ−ト、ヘキサメチ
レンジイソシアネ−ト等を挙げることができる。
Examples of the isocyanate include diisocyanate or triisocyanate such as phenylene diisocyanate, tolylene diisocyanate, 1-ethylbenzene-2,4-diisocyanate, and diphenylmethane diisocyanate. Isocyanate, 1-isopropylbenzene-2,4-diisocyanate, 1-chlorobenzene-2,4-diisocyanate, xylylene diisocyanate, 1-nitrobenzene-2,4-diisocyanate
Isophorone diisocyanate, 1-methoxybenzene-2,4-diisocyanate, naphthalene diisocyanate, dimethylbiphenylene diisocyanate, 1-
Methylbenzene-2,4,6-triisocyanate, triphenylmethane triisocyanate, 1,3,5-trimethylbenzene-2,4,6-triisocyanate,
Examples include naphthalene-1,3,7-triisocyanate, biphenyl-2,4,4'-triisocyanate, and hexamethylene diisocyanate.

【0083】また、ポリイソシアネ−ト化合物の例とし
ては、分子量100〜400程度の低分子イソシアネ−
ト、特にジイソシアネ−トと、トリメチロ−ルプロパン
、ヘキサントリオ−ル、ブタンジオ−ル等の分子量60
〜200程度の低分子量ポリオ−ルの単独もしくは混合
物を反応させて得られるウレタン結合含有ポリイソシア
ネ−トを挙げることができる。
Examples of polyisocyanate compounds include low molecular weight isocyanates with a molecular weight of about 100 to 400.
In particular, diisocyanates, trimethylolpropane, hexanetriol, butanediol, etc. with a molecular weight of 60
Examples include urethane bond-containing polyisocyanates obtained by reacting low molecular weight polyols having a molecular weight of about 200 to 200, singly or as a mixture.

【0084】また、ブロック化イソシアネ−トとしては
上記のすべてのイソシアネ−トをブロック化した化合物
であり、分子量300〜10,000程度のジイソシア
ネ−ト化合物やトリイソシアネ−ト化合物、更に、ポリ
イソシアネ−ト化合物のような一分子中に2個以上のイ
ソシアネ−ト基を持つ多価イソシアネ−ト化合物におい
て、その各々のイソシアネ−ト基を活性水素を有する化
合物、例えばフェノ−ル、クレゾ−ル、キシレノ−ル、
クロルフェノ−ル等のフェノ−ル類、メチルエチルケト
ンオキシム等のオキシム類、第一級、第二級、第三の水
酸基を有するモノアルコ−ル類、カプロラクタム類のブ
ロック化剤を用いて常法でブロック化されたものを用い
ることができる。また、上記多価イソシアネ−ト化合物
をトリメチロ−ルプロパン、ヘキサントリオ−ル、グリ
セリン等の多価アルコ−ルと反応させてブロック化して
なるものでも良い。本発明で用いることができるブロッ
ク化イソシアネ−トの市販品の例としては、日本ポリウ
レタン社製のコロネ−トAPステ−ブル、コロネ−ト2
503、コロネ−ト2515、ミリオネ−トMS−50
、住友バイエルウレタン社製のデスモジュ−ルAP−1
2ステ−ブル、デスモジュ−ルCTステ−ブル等を挙げ
ることができる。
Blocked isocyanates include compounds obtained by blocking all of the above-mentioned isocyanates, including diisocyanate compounds and triisocyanate compounds having a molecular weight of about 300 to 10,000, and polyisocyanate compounds. In polyvalent isocyanate compounds having two or more isocyanate groups in one molecule, each isocyanate group is replaced by a compound having active hydrogen, such as phenol, cresol, xylene, etc. - Le,
Blocking is performed using a conventional method using a blocking agent such as phenols such as chlorphenol, oximes such as methyl ethyl ketone oxime, monoalcohols having primary, secondary, or tertiary hydroxyl groups, or caprolactam. You can use the one given. Alternatively, the polyhydric isocyanate compound may be blocked by reacting with a polyhydric alcohol such as trimethylolpropane, hexanetriol, or glycerin. Examples of commercially available blocked isocyanates that can be used in the present invention include Coronate AP Stable and Coronate 2 manufactured by Nippon Polyurethane Co., Ltd.
503, Coronate 2515, Millionate MS-50
, Desmodule AP-1 manufactured by Sumitomo Bayer Urethane Co., Ltd.
2 stable, desmodule CT stable, etc.

【0085】上記イミド化ポリウレタン樹脂皮膜を形成
するに際して、前記と同様に、絶縁塗料中に、イミド化
触媒としての第三級アミンを含めることができる。第三
級アミンはウレタン化反応の触媒としても作用する。
[0085] When forming the imidized polyurethane resin film, a tertiary amine as an imidization catalyst can be included in the insulating coating material as described above. Tertiary amines also act as catalysts for urethanization reactions.

【0086】また、本発明は、一般式(化10)The present invention also provides general formula (Formula 10)

【00
87】
00
87]

【化10】[Chemical formula 10]

【0088】で示されるポリイミド樹脂皮膜を有するハ
ンダ付け可能な絶縁電線に関する。
The present invention relates to a solderable insulated wire having a polyimide resin film shown in the following.

【0089】この絶縁皮膜の形成方法として、本発明は
、一般式(化7)
As a method for forming this insulating film, the present invention uses the general formula (Chemical formula 7)

【0090】[0090]

【化7】[C7]

【0091】で示されるテトラカルボン酸二無水物と、
一般式(化8)
A tetracarboxylic dianhydride represented by:
General formula (Chemical formula 8)

【0092】[0092]

【化8】[Chemical formula 8]

【0093】で示されるジアミンとを、有機溶媒の存在
下に反応させ、一般式(化11)
[0093] A diamine represented by the formula (Chemical formula 11) is reacted with the diamine in the presence of an organic solvent.

【0094】[0094]

【化11】[Chemical formula 11]

【0095】で示されるポリアミド酸を生成させた後、
これを含む絶縁塗料を導体上に塗布し、焼き付けること
により、(化11)式中のアミド基とカルボキシル基と
の分子内反応によりイミド化してポリイミド樹脂とする
ことを特徴とするハンダ付け可能な絶縁電線の製造方法
に関する。
After producing the polyamic acid represented by
By applying an insulating paint containing this on a conductor and baking it, it is imidized by an intramolecular reaction between an amide group and a carboxyl group in the formula (11), resulting in a solderable polyimide resin. This invention relates to a method of manufacturing an insulated wire.

【0096】ここにおいて、有機溶媒は前述と同様であ
り、また、絶縁塗料は触媒量の第三級アミンをイミド化
触媒とし含むことができる。
[0096] Here, the organic solvent is the same as described above, and the insulating paint can contain a catalytic amount of tertiary amine as an imidization catalyst.

【0097】上記(化10)式及び(化11)式中、n
は正の整数であり、5以上であることが望ましい。
In the above formulas (10) and (11), n
is a positive integer, preferably 5 or more.

【0098】また、(化10)式で示されるポリイミド
樹脂皮膜を有する絶縁電線は、(化10)式で示される
ポリイミドを含む絶縁塗料を導体上に塗布し、焼き付け
ることによっても製造することもできる。
An insulated wire having a polyimide resin film represented by formula (10) can also be produced by applying an insulating paint containing polyimide represented by formula (10) onto a conductor and baking it. can.

【0099】すなわち、例えば、一般式(化7)That is, for example, general formula (Chemical formula 7)

【01
00】
01
00]

【化7】[C7]

【0101】で示されるテトラカルボン酸二無水物と、
一般式(化8)
A tetracarboxylic dianhydride represented by:
General formula (Chemical formula 8)

【0102】[0102]

【化8】[Chemical formula 8]

【0103】で示されるジアミンとを、有機溶媒の存在
下に反応させ、一般式(化11)
[0103] A diamine represented by the formula (Chemical formula 11) is reacted with the diamine in the presence of an organic solvent.

【0104】[0104]

【化11】[Chemical formula 11]

【0105】で示されるポリアミド酸を生成させ、該ポ
リアミド酸をイミド化して、一般式(化10)
A polyamic acid represented by the following formula is produced, and the polyamic acid is imidized to form the general formula (Formula 10)

【010
6】
010
6]

【化10】[Chemical formula 10]

【0107】で示されるポリイミドを生成させた後、こ
れを含む絶縁塗料を導体上に塗布し、焼き付けることに
よって絶縁電線を製造する。ここにおいてイミド化は、
イミド化触媒の添加あるいは加熱などによってなされる
。イミド化触媒は前述の第三級アミンなどである。
After producing the polyimide represented by the formula, an insulating paint containing the polyimide is applied onto a conductor and baked to produce an insulated wire. Here, imidization is
This is done by adding an imidization catalyst or by heating. The imidization catalyst is the above-mentioned tertiary amine.

【0108】このように、絶縁塗料がポリイミドを含ん
でいる場合には、導体上への塗布、焼き付けによって溶
媒が揮発して、強固な絶縁皮膜が形成される。
[0108] In this way, when the insulating paint contains polyimide, the solvent evaporates when it is applied onto a conductor and baked, forming a strong insulating film.

【0109】上記絶縁塗料による本発明のハンダ付け可
能な絶縁電線は、上記絶縁塗料を導体上に塗布後、汎用
の焼き付け塗装装置で焼き付けて所定の皮膜厚さとする
ことにより提供される。
The solderable insulated wire of the present invention using the above-mentioned insulating paint is provided by applying the above-mentioned insulating paint onto a conductor and then baking it in a general-purpose baking coating device to obtain a predetermined film thickness.

【0110】この時に使用する導体とは、例えば、銅、
銀又はステンレス鋼線であり、適用される導体径は極細
線から太線までいずれの径のものでも良く、特定の導体
径のものに限定されるものではない。一般的には径が約
0.030乃至2.0mm程度の銅線に主として適用さ
れている。
[0110] The conductor used at this time is, for example, copper,
The wire may be a silver or stainless steel wire, and the applicable conductor diameter may be any diameter from a very thin wire to a thick wire, and is not limited to a specific conductor diameter. Generally, it is mainly applied to copper wires having a diameter of about 0.030 to 2.0 mm.

【0111】上記導体上に絶縁皮膜を形成する方法は従
来公知の方法に準拠すれば良く、例えば、フェルト絞り
方式やダイス絞り方式等の方法により絶縁塗料を塗布し
、連続的に300〜500℃の温度の焼付炉中に3〜1
00秒程度ずつ、数回〜数十回通すことによって所望の
絶縁皮膜が形成される。要するに、塗料の硬化反応をほ
ぼ完了し得るに充分な温度と時間焼き付けて得られる。 また、絶縁皮膜の厚さは、JIS、NEMAあるいはI
EC等の規格に規定された皮膜厚さである。
[0111] The method for forming an insulating film on the above-mentioned conductor may be based on a conventionally known method. For example, an insulating paint is applied by a method such as a felt drawing method or a die drawing method, and then continuously heated at 300 to 500°C. 3 to 1 in a baking oven at a temperature of
A desired insulating film is formed by passing it several times to several tens of times for about 00 seconds each. In short, it is obtained by baking at a temperature and time sufficient to almost complete the curing reaction of the paint. In addition, the thickness of the insulation film is determined according to JIS, NEMA or I
This is the film thickness specified in standards such as EC.

【0112】なお、上記本発明に係る絶縁電線の皮膜を
形成するために使用される絶縁塗料はすべて、電線に限
らず各種導体の絶縁被覆を形成するために用いることも
できる。
[0112] All of the insulating paints used to form the coating of the insulated wire according to the present invention can also be used not only for forming the insulating coating for electric wires but also for various conductors.

【0113】また、本発明は上記絶縁電線を用いてなる
フライバックトランスを提供するにある。
The present invention also provides a flyback transformer using the above insulated wire.

【0114】[0114]

【作用】本発明に係る絶縁塗料は、特定の化学構造のポ
リアミド酸又はポリイミドあるいは特定の化学構造のポ
リアミド酸とイソシアネ−ト又はブロック化イソシアネ
−トとを含むものであり、この絶縁塗料を導体上に塗布
、焼き付けて形成されるポリイミド樹脂又はイミド化ポ
リウレタン樹脂は、優れた熱的、機械的、電気的、化学
的特性を有し、これを皮膜とする絶縁電線は、130℃
以上の耐熱性と良好なハンダ付け性を有する。
[Function] The insulating paint according to the present invention contains polyamic acid or polyimide with a specific chemical structure, or polyamic acid with a specific chemical structure and isocyanate or blocked isocyanate, and this insulating paint is used as a conductor. The polyimide resin or imidized polyurethane resin formed by coating and baking has excellent thermal, mechanical, electrical, and chemical properties, and insulated wires coated with this resin can be heated to 130°C.
It has higher heat resistance and good solderability.

【0115】[0115]

【実施例】以下、本発明を実施例に基づき詳細に説明す
るが、本発明はこれに限定されるものではない。
EXAMPLES The present invention will be explained in detail below based on Examples, but the present invention is not limited thereto.

【0116】実施例及び比較例においては、絶縁皮膜を
形成する塗料の原料をそれぞれ略称で示した。略称の意
味は次のとおりである。
[0116] In the Examples and Comparative Examples, the raw materials for the paint forming the insulating film are indicated by abbreviations. The meanings of the abbreviations are as follows.

【0117】イ.一般式(化6)B. General formula (Chemical formula 6)

【0118】[0118]

【化6】[C6]

【0119】で示されるヒドロキシルアミンとしては、
略称S…p−アミノベンジルアルコ−ル(化15)
The hydroxylamine represented by:
Abbreviation S...p-aminobenzyl alcohol (Chemical formula 15)

【0
120】
0
120]

【化15】[Chemical formula 15]

【0121】ロ.一般式(化7)B. General formula (Chemical formula 7)

【0122】[0122]

【化7】[C7]

【0123】で示されるテトラカルボン酸二無水物と、
一般式(化8)
A tetracarboxylic dianhydride represented by:
General formula (Chemical formula 8)

【0124】[0124]

【化8】[Chemical formula 8]

【0125】で示されるジアミンとの組合せは、以下の
2通りがある。すなわち、1.上記テトラカルボン酸二
無水物が、以下の略称(A1〜A8)の化合物である時
に、上記ジアミンは、以下の略称(B1〜B5)の化合
物が良く、2.上記テトラカルボン酸二無水物が、以下
の略称(A9〜A17)の化合物である時に、上記ジア
ミンは、以下の略称(B6〜B13)の化合物が良い。
There are two types of combinations with the diamine shown below. That is, 1. When the tetracarboxylic dianhydride is a compound with the following abbreviations (A1 to A8), the diamine is preferably a compound with the following abbreviations (B1 to B5); 2. When the tetracarboxylic dianhydride is a compound with the following abbreviations (A9 to A17), the diamine is preferably a compound with the following abbreviations (B6 to B13).

【0126】テトラカルボン酸二無水物としては、以下
の17種である。
[0126] The following 17 types of tetracarboxylic dianhydrides are used.

【0127】略称A1…1,3,3a,4,5,9b−
ヘキサヒドロ−5−(テトラヒドロ−2,5−ジオキソ
−3−フラニル)−ナフト[1,2−C]フラン−1,
3−ジオン(化16)
[0127] Abbreviation A1...1, 3, 3a, 4, 5, 9b-
hexahydro-5-(tetrahydro-2,5-dioxo-3-furanyl)-naphtho[1,2-C]furan-1,
3-dione (chemical formula 16)

【0128】[0128]

【化16】[Chemical formula 16]

【0129】略称A2…エチレングリコ−ルビス(アン
ヒドロトリメリテ−ト)(化17)
Abbreviation A2...Ethylene glycol bis(anhydrotrimellitate) (Chemical formula 17)

【0130】[0130]

【化17】[Chemical formula 17]

【0131】略称A3…テトラメチレングリコ−ルビス
(アンヒドロトリメリテ−ト)(化18)
Abbreviation A3... Tetramethylene glycol bis(anhydrotrimellitate) (Chemical formula 18)

【0132】[0132]

【化18】[Chemical formula 18]

【0133】略称A4…ジエチレングリコ−ルビス(ア
ンヒドロトリメリテ−ト)(化19)
Abbreviation A4...Diethylene glycol bis(anhydrotrimellitate) (Chemical formula 19)

【0134】[0134]

【化19】[Chemical formula 19]

【0135】略称A5…ネオペンチルグリコ−ルビス(
アンヒドロトリメリテ−ト)(化20)
Abbreviation A5...Neopentyl glycol bis(
anhydrotrimellitate) (Chemical formula 20)

【0136】[0136]

【化20】[C20]

【0137】略称A6…1,4−シクロヘキサンジオ−
ルビス(アンヒドロトリメリテ−ト)(化21)
Abbreviation A6...1,4-cyclohexanedio-
Rubis (anhydrotrimellitate) (Chemical formula 21)

【01
38】
01
38]

【化21】[C21]

【0139】略称A7…p−キシリレングリコ−ルビス
(アンヒドロトリメリテ−ト)(化22)
Abbreviation A7...p-xylylene glycol bis(anhydrotrimellitate) (Chemical formula 22)

【0140】[0140]

【化22】[C22]

【0141】略称A8…ハイドロキノン−ジ−(β−ヒ
ドロキシエチル)エ−テルビス(アンヒドロトリメリテ
−ト)(化23)
Abbreviation A8...Hydroquinone di-(β-hydroxyethyl)ether bis(anhydrotrimellitate) (Chemical formula 23)

【0142】[0142]

【化23】[C23]

【0143】略称A9…ピロメリット酸二無水物(化2
4)
Abbreviation A9...Pyromellitic dianhydride (chemical formula 2
4)

【0144】[0144]

【化24】[C24]

【0145】略称A10…3,3´,4,4´−ジフェ
ニルテトラカルボン酸二無水物(化25)
Abbreviation A10...3,3',4,4'-diphenyltetracarboxylic dianhydride (Chemical formula 25)

【0146】[0146]

【化25】[C25]

【0147】略称A11…3,3´,4,4´−ベンゾ
フェノンテトラカルボン酸二無水物(化26)
Abbreviation A11...3,3',4,4'-benzophenonetetracarboxylic dianhydride (Chemical formula 26)

【0148】[0148]

【化26】[C26]

【0149】略称A12…2,3,6,7−ナフタレン
テトラカルボン酸二無水物(化27)
Abbreviation A12...2,3,6,7-naphthalenetetracarboxylic dianhydride (Chemical formula 27)

【0150】[0150]

【化27】[C27]

【0151】略称A13…1,4,5,8−ナフタレン
テトラカルボン酸二無水物(化28)
Abbreviation A13...1,4,5,8-naphthalenetetracarboxylic dianhydride (Chemical formula 28)

【0152】[0152]

【化28】[C28]

【0153】略称A14…1,2,5,6−ナフタレン
テトラカルボン酸二無水物(化29)
Abbreviation A14...1,2,5,6-naphthalenetetracarboxylic dianhydride (Chemical formula 29)

【0154】[0154]

【化29】[C29]

【0155】略称A15…3,3´,4,4´−ジフェ
ニルエ−テルテトラカルボン酸二無水物(化30)
Abbreviation A15...3,3',4,4'-diphenyl ether tetracarboxylic dianhydride (Chemical formula 30)

【0
156】
0
156]

【化30】[C30]

【0157】略称A16…3,3´,4,4´−ジフェ
ニルメタンテトラカルボン酸二無水物(化31)
Abbreviation A16...3,3',4,4'-diphenylmethanetetracarboxylic dianhydride (Chemical formula 31)

【0158】[0158]

【化31】[Chemical formula 31]

【0159】略称A17…3,3´,4,4´−ジフェ
ニルプロパンテトラカルボン酸二無水物(化32)
Abbreviation A17...3,3',4,4'-diphenylpropane tetracarboxylic dianhydride (Chemical formula 32)

【0
160】
0
160]

【化32】[C32]

【0161】一方、ジアミンとしては、以下の13種で
ある。
On the other hand, the following 13 types of diamines are used.

【0162】略称B1…2,2−ビス[4−(4´−ア
ミノフェノキシ)フェニル]プロパン(化33)
Abbreviation B1...2,2-bis[4-(4'-aminophenoxy)phenyl]propane (Chemical formula 33)

【0163】[0163]

【化33】[Chemical formula 33]

【0164】略称B2…1,3−ビス[2−(4´−ア
ミノフェニル)プロピル]ベンゼン(化34)
Abbreviation B2...1,3-bis[2-(4'-aminophenyl)propyl]benzene (Chemical formula 34)

【0165】[0165]

【化34】[C34]

【0166】略称B3…4,4´−ジアミノジフェニル
メタン(化35)
Abbreviation B3...4,4'-diaminodiphenylmethane (Chemical formula 35)

【0167】[0167]

【化35】[C35]

【0168】略称B4…1,3−ビス(4−アミノフェ
ノキシ)ベンゼン(化36)
Abbreviation B4...1,3-bis(4-aminophenoxy)benzene (Chemical formula 36)

【0169】[0169]

【化36】[C36]

【0170】略称B5…4,4´−ジアミノジフェニル
エ−テル(化37)
Abbreviation B5...4,4'-diaminodiphenyl ether (Chemical formula 37)

【0171】[0171]

【化37】[C37]

【0172】略称B6…4,4´−ジアミノジシクロヘ
キシルメタン(化38)
Abbreviation B6...4,4'-diaminodicyclohexylmethane (Chemical formula 38)

【0173】[0173]

【化38】[C38]

【0174】略称B7…1,4−ジ(アミノメチル)ベ
ンゼン(化39)
Abbreviation B7...1,4-di(aminomethyl)benzene (Chemical formula 39)

【0175】[0175]

【化39】[C39]

【0176】略称B8…4,4´−ジアミノジフェニル
プロパン(化40)
Abbreviation B8...4,4'-diaminodiphenylpropane (Chemical formula 40)

【0177】[0177]

【化40】[C40]

【0178】略称B9…1,4−ジ(アミノメチル)シ
クロヘキサン(化41)
Abbreviation B9...1,4-di(aminomethyl)cyclohexane (Chemical formula 41)

【0179】[0179]

【化41】[C41]

【0180】略称B10…1,4−ジアミノシクロヘキ
サン(化42)
Abbreviation B10...1,4-diaminocyclohexane (Chemical formula 42)

【0181】[0181]

【化42】[C42]

【0182】略称B11…4,4´−ジアミノジシクロ
ヘキシルプロパン(化43)
Abbreviation B11...4,4'-diaminodicyclohexylpropane (Chemical formula 43)

【0183】[0183]

【化43】[C43]

【0184】略称B12…ヘキサメチレンジアミン(化
44)
Abbreviation B12...Hexamethylenediamine (Chemical formula 44)

【0185】[0185]

【化44】[C44]

【0186】略称B13…2,2−ジメチルプロピレン
ジアミン(化45)
Abbreviation B13...2,2-dimethylpropylenediamine (Chemical formula 45)

【0187】[0187]

【化45】[C45]

【0188】ハ.イミド化触媒の第三級アミンとしては
、以下の2種類を用いた。
C. The following two types of tertiary amines were used as imidization catalysts.

【0189】略称C1…ジメチルドデシルアミン略称C
2…N−ジメチルベンジルアミン尚、ウレタン化反応用
のブロック化イソシアネ−トとしては、デスモジュ−ル
CTステ−ブル(住友バイエルウレタン社製)、又イソ
シアネ−トとしては、ジフェニルメタンジイソシアネ−
ト、さらにポリアミド酸生成用の有機溶媒としては、ジ
メチルアセトアミド(DMAc)とN−メチルピロリド
ン(NMP)の混合溶媒(重量比で1:1)を用いた。
Abbreviation C1...Dimethyldodecylamine Abbreviation C
2...N-Dimethylbenzylamine The blocked isocyanate for the urethanization reaction is Desmodur CT Stable (manufactured by Sumitomo Bayer Urethane), and the isocyanate is diphenylmethane diisocyanate.
Furthermore, as an organic solvent for producing polyamic acid, a mixed solvent of dimethylacetamide (DMAc) and N-methylpyrrolidone (NMP) (1:1 by weight) was used.

【0190】[0190]

【実施例】【Example】

(実施例1) 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB1を6.15g(0.015モル)、溶
媒DMAcを40g及びNMPを40g仕込み、窒素気
流下で25℃を保ちつつ、充分に撹拌した。この溶液に
、酸二無水物A1を4.95g(0.0165モル)及
びヒドロキシルアミンSを0.369g(0.003モ
ル)徐々に加えた。全部を加えた後、窒素気流下25℃
で12時間撹拌を続け、ポリアミド酸を合成した。
(Example 1) 6.15 g (0.015 mol) of diamine B1, 40 g of solvent DMAc, and 40 g of NMP were placed in a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, and the mixture was heated at 25° C. under a nitrogen stream. While maintaining the temperature, stir thoroughly. To this solution, 4.95 g (0.0165 mol) of acid dianhydride A1 and 0.369 g (0.003 mol) of hydroxylamine S were gradually added. After adding everything, heat at 25℃ under nitrogen stream.
Stirring was continued for 12 hours to synthesize polyamic acid.

【0191】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温37
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い、皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜
の赤外線吸収スペクトルには1780cm ̄1と138
0cm ̄1にイミド基の吸収が認められた。
[0191] The obtained paint (polyamic acid solution) was heated to 0.
Coating on a 4mmφ copper wire at a wire speed of 10m/min at a furnace temperature of 37.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1780cm ̄1 and 138cm ̄1.
Imide group absorption was observed at 0 cm ̄1.

【0192】得られた電線をJIS C3003−19
84のエナメル銅線及びエナメルアルミニウム線試験方
法に準じて評価した。その評価結果を表1に示す。
[0192] The obtained electric wire was rated according to JIS C3003-19.
Evaluation was made according to the test method for enameled copper wire and enameled aluminum wire of No. 84. The evaluation results are shown in Table 1.

【0193】 (実施例2) ジアミンB2を6.192g(0.018モル)、溶媒
DMAcを40g及びNMPを40g、酸二無水物A1
を5.85g(0.0195モル)及びヒドロキシルア
ミンSを0.369g(0.003モル)用いた以外は
実施例1と同様にしてポリアミド酸を合成した。
(Example 2) 6.192 g (0.018 mol) of diamine B2, 40 g of solvent DMAc and 40 g of NMP, acid dianhydride A1
Polyamic acid was synthesized in the same manner as in Example 1, except that 5.85 g (0.0195 mol) of hydroxylamine S and 0.369 g (0.003 mol) of hydroxylamine S were used.

【0194】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and evaluated in the same manner as in Example 1.

【0195】その評価結果を表1に示す。Table 1 shows the evaluation results.

【0196】 (実施例3) ジアミンB1を6.15g(0.015モル)、溶媒D
MAcを40g及びNMPを40g、酸二無水物A2を
6.765g(0.0165モル)及びヒドロキシルア
ミンSを0.369g(0.003モル)用いた以外は
実施例1と同様にしてポリアミド酸を合成した。
(Example 3) 6.15 g (0.015 mol) of diamine B1, solvent D
Polyamic acid was prepared in the same manner as in Example 1, except that 40 g of MAc, 40 g of NMP, 6.765 g (0.0165 mol) of acid dianhydride A2, and 0.369 g (0.003 mol) of hydroxylamine S were used. was synthesized.

【0197】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0198】その評価結果を表1に示す。Table 1 shows the evaluation results.

【0199】 (実施例4) ジアミンB2を7.224g(0.021モル)、溶媒
DMAcを60g及びNMPを60g、酸二無水物A2
を9.225g(0.0225モル)及びヒドロキシル
アミンSを0.369g(0.003モル)用いた以外
は実施例1と同様にしてポリアミド酸を合成した。
(Example 4) 7.224 g (0.021 mol) of diamine B2, 60 g of solvent DMAc and 60 g of NMP, acid dianhydride A2
A polyamic acid was synthesized in the same manner as in Example 1, except that 9.225 g (0.0225 mol) of hydroxylamine S and 0.369 g (0.003 mol) of hydroxylamine S were used.

【0200】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
[0200] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0201】その評価結果を表1に示す。[0201] The evaluation results are shown in Table 1.

【0202】 (実施例5) ジアミンB1を6.15g(0.015モル)、溶媒D
MAcを60g及びNMPを60g、酸二無水物A2を
6.765g(0.0165モル)及びヒドロキシルア
ミンSを0.369g(0.003モル)、さらに第三
級アミンC1を0.06g用いた以外は実施例1と同様
にしてポリアミド酸を合成した。
(Example 5) 6.15 g (0.015 mol) of diamine B1, solvent D
60 g of MAc, 60 g of NMP, 6.765 g (0.0165 mol) of acid dianhydride A2, 0.369 g (0.003 mol) of hydroxylamine S, and 0.06 g of tertiary amine C1 were used. Polyamic acid was synthesized in the same manner as in Example 1 except for this.

【0203】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0204】その評価結果を表1に示す。[0204] The evaluation results are shown in Table 1.

【0205】 (実施例6) ジアミンB1を3.69g(0.009モル)、溶媒D
MAcを30g及びNMPを30g、酸二無水物A2を
4.305g(0.0105モル)及びヒドロキシルア
ミンSを0.369g(0.003モル)用いた以外は
実施例1と同様にしてポリアミド酸を合成した。
(Example 6) 3.69 g (0.009 mol) of diamine B1, solvent D
Polyamic acid was prepared in the same manner as in Example 1, except that 30 g of MAc, 30 g of NMP, 4.305 g (0.0105 mol) of acid dianhydride A2, and 0.369 g (0.003 mol) of hydroxylamine S were used. was synthesized.

【0206】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
[0206] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0207】その評価結果を表1に示す。[0207] The evaluation results are shown in Table 1.

【0208】 (実施例7) 実施例6のポリアミド酸溶液中へ、その末端水酸基1当
量につきイソシアネ−ト基1当量の割合になるようにジ
フェニルメタンジイソシアネ−を配合して混合し塗料を
得た。
(Example 7) Diphenylmethane diisocyanate was blended into the polyamic acid solution of Example 6 at a ratio of 1 equivalent of isocyanate group per 1 equivalent of terminal hydroxyl group and mixed to obtain a paint. Ta.

【0209】得られた塗料を用い、実施例1と同様にし
て本発明のイミド化ポリウレタン樹脂絶縁電線を得、こ
れを実施例1と同様に評価した。
Using the obtained paint, an imidized polyurethane resin insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0210】その評価結果を表1に示す。[0210] The evaluation results are shown in Table 1.

【0211】 (実施例8) ジアミンB1を6.15g(0.015モル)、溶媒D
MAcを40g及びNMPを40g、酸二無水物A2を
6.15g(0.015モル)用いた以外は実施例1と
同様にしてポリアミド酸を合成した(但し、ヒドロキシ
ルアミンSは用いなかった)。
(Example 8) 6.15 g (0.015 mol) of diamine B1, solvent D
Polyamic acid was synthesized in the same manner as in Example 1, except that 40 g of MAc, 40 g of NMP, and 6.15 g (0.015 mol) of acid dianhydride A2 were used (however, hydroxylamine S was not used). .

【0212】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
[0212] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0213】その評価結果を表1に示す。[0213] The evaluation results are shown in Table 1.

【0214】 (実施例9) ジアミンB2を6.88g(0.02モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A1を6
.00g(0.02モル)用いた以外は実施例1と同様
にしてポリアミド酸を合成した(但し、ヒドロキシルア
ミンSは用いなかった)。
(Example 9) 6.88 g (0.02 mol) of diamine B2, solvent DM
40g of Ac, 40g of NMP, 6g of acid dianhydride A1
.. A polyamic acid was synthesized in the same manner as in Example 1 except that 00g (0.02 mol) was used (however, hydroxylamine S was not used).

【0215】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0216】その評価結果を表1に示す。[0216] The evaluation results are shown in Table 1.

【0217】 (実施例10) ジアミンB4を5.84g(0.02モル)、溶媒DM
Acを50g及びNMPを50g、酸二無水物A2を8
.2g(0.02モル)用いた以外は実施例1と同様に
してポリアミド酸を合成した(但し、ヒドロキシルアミ
ンSは用いなかった)。
(Example 10) 5.84 g (0.02 mol) of diamine B4, solvent DM
50g of Ac, 50g of NMP, 8g of acid dianhydride A2
.. Polyamic acid was synthesized in the same manner as in Example 1, except that 2 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0218】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and evaluated in the same manner as in Example 1.

【0219】その評価結果を表1に示す。Table 1 shows the evaluation results.

【0220】 (実施例11) ジアミンB5を4g(0.02モル)、溶媒DMAcを
40g及びNMPを40g、酸二無水物A2を8.2g
(0.02モル)用いた以外は実施例1と同様にしてポ
リアミド酸を合成した(但し、ヒドロキシルアミンSは
用いなかった)。
(Example 11) 4 g (0.02 mol) of diamine B5, 40 g of solvent DMAc and 40 g of NMP, 8.2 g of acid dianhydride A2
Polyamic acid was synthesized in the same manner as in Example 1 except that (0.02 mol) was used (however, hydroxylamine S was not used).

【0221】得られた塗料(ポリアミド酸溶液)を用い
、実施例1と同様にして本発明のイミド化絶縁電線を得
、これを実施例1と同様に評価した。
[0221] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 1, and this was evaluated in the same manner as in Example 1.

【0222】その評価結果を表1に示す。[0222] The evaluation results are shown in Table 1.

【0223】 (実施例12) 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB3を3.96g(0.02モル)、溶媒
DMAcを40g及びNMPを40g仕込み、窒素気流
下で25℃を保ちつつ、充分に撹拌した。この溶液に、
酸二無水物A2を9.225g(0.0225モル)及
びヒドロキシルアミンSを0.615g(0.005モ
ル)徐々に加えた。全部を加えた後、窒素気流下25℃
で14時間撹拌を続け、ポリアミド酸を合成した。
(Example 12) 3.96 g (0.02 mol) of diamine B3, 40 g of solvent DMAc, and 40 g of NMP were placed in a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, and the mixture was heated under a nitrogen stream. The mixture was stirred thoroughly while maintaining the temperature at 25°C. In this solution,
9.225 g (0.0225 mol) of acid dianhydride A2 and 0.615 g (0.005 mol) of hydroxylamine S were gradually added. After adding everything, heat at 25℃ under nitrogen stream.
Stirring was continued for 14 hours to synthesize polyamic acid.

【0224】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温38
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い、皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜
の赤外線吸収スペクトルには1780cm ̄1と138
0cm ̄1にイミド基の吸収が認められた。
[0224] The obtained paint (polyamic acid solution) was mixed with 0.
Coat it on a 4mmφ copper wire at a wire speed of 10m/min and at a furnace temperature of 38.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1780cm ̄1 and 138cm ̄1.
Imide group absorption was observed at 0 cm ̄1.

【0225】得られた電線をJIS C3003−19
84のエナメル銅線及びエナメルアルミニウム線試験方
法に準じて評価した。その評価結果を表2に示す。
[0225] The obtained electric wire was rated according to JIS C3003-19.
Evaluation was made according to the test method for enameled copper wire and enameled aluminum wire of No. 84. The evaluation results are shown in Table 2.

【0226】 (実施例13) ジアミンB3を3.168g(0.016モル)、溶媒
DMAcを40g及びNMPを40g、酸二無水物A2
を6.97g(0.017モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)用いた以外は実
施例12と同様にしてポリアミド酸を合成した。
(Example 13) 3.168 g (0.016 mol) of diamine B3, 40 g of solvent DMAc and 40 g of NMP, acid dianhydride A2
A polyamic acid was synthesized in the same manner as in Example 12, except that 6.97 g (0.017 mol) of hydroxylamine S and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0227】得られた塗料(ポリアミド酸溶液)を用い
、実施例12と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 12, and evaluated in the same manner as in Example 1.

【0228】その評価結果を表2に示す。[0228] The evaluation results are shown in Table 2.

【0229】 (実施例14) ジアミンB3を4.95g(0.025モル)、溶媒D
MAcを60g及びNMPを60g、酸二無水物A2を
10.66g(0.026モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)用いた以外は実
施例12と同様にしてポリアミド酸を合成した。
(Example 14) 4.95 g (0.025 mol) of diamine B3, solvent D
Polyamic acid was prepared in the same manner as in Example 12, except that 60 g of MAc, 60 g of NMP, 10.66 g (0.026 mol) of acid dianhydride A2, and 0.246 g (0.002 mol) of hydroxylamine S were used. was synthesized.

【0230】得られた塗料(ポリアミド酸溶液)を用い
、実施例12と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 12, and evaluated in the same manner as in Example 1.

【0231】その評価結果を表2に示す。[0231] The evaluation results are shown in Table 2.

【0232】 (実施例15) ジアミンB3を2.97g(0.015モル)、溶媒D
MAcを30g及びNMPを30g、酸二無水物A2を
6.56g(0.016モル)及びヒドロキシルアミン
Sを0.246g(0.002モル)、さらに第三級ア
ミンC2を0.045g用いた以外は実施例12と同様
にしてポリアミド酸を合成した。
(Example 15) 2.97 g (0.015 mol) of diamine B3, solvent D
30 g of MAc, 30 g of NMP, 6.56 g (0.016 mol) of acid dianhydride A2, 0.246 g (0.002 mol) of hydroxylamine S, and 0.045 g of tertiary amine C2 were used. Polyamic acid was synthesized in the same manner as in Example 12 except for this.

【0233】得られた塗料(ポリアミド酸溶液)を用い
、実施例12と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 12, and evaluated in the same manner as in Example 1.

【0234】その評価結果を表2に示す。[0234] The evaluation results are shown in Table 2.

【0235】 (実施例16) ジアミンB3を3.564g(0.018モル)、溶媒
DMAcを40g及びNMPを40g、酸二無水物A2
を8.61g(0.021モル)及びヒドロキシルアミ
ンSを0.738g(0.006モル)用いた以外は実
施例12と同様にしてポリアミド酸を合成した。
(Example 16) 3.564 g (0.018 mol) of diamine B3, 40 g of solvent DMAc and 40 g of NMP, acid dianhydride A2
A polyamic acid was synthesized in the same manner as in Example 12, except that 8.61 g (0.021 mol) of hydroxylamine S and 0.738 g (0.006 mol) of hydroxylamine S were used.

【0236】本発明の一般式(化1)におけるn=6の
ポリアミド酸であった。
[0236] It was a polyamic acid with n=6 in the general formula (Chemical formula 1) of the present invention.

【0237】得られた塗料(ポリアミド酸溶液)を用い
、実施例12と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 12, and evaluated in the same manner as in Example 1.

【0238】その評価結果を表2に示す。[0238] The evaluation results are shown in Table 2.

【0239】 (実施例17) ジアミンB3を4.158g(0.021モル)、溶媒
DMAcを50g及びNMPを50g、酸二無水物A2
を9.84g(0.024モル)及びヒドロキシルアミ
ンSを0.738g(0.006モル)用いた以外は実
施例12と同様にしてポリアミド酸を合成した。
(Example 17) 4.158 g (0.021 mol) of diamine B3, 50 g of solvent DMAc and 50 g of NMP, acid dianhydride A2
A polyamic acid was synthesized in the same manner as in Example 12, except that 9.84 g (0.024 mol) of hydroxylamine S and 0.738 g (0.006 mol) of hydroxylamine S were used.

【0240】これをさらに200℃、3時間反応させ、
イミド化を行ない、実施例12と同様に赤外線吸収スペ
クトルで確認した。
[0240] This was further reacted at 200°C for 3 hours,
It was imidized and confirmed by infrared absorption spectrum in the same manner as in Example 12.

【0241】得られた塗料(上記溶液)を用い、実施例
12と同様にして本発明のイミド化絶縁電線を得、これ
を実施例1と同様に評価した。
An imidized insulated wire of the present invention was obtained in the same manner as in Example 12 using the obtained coating material (above solution), and evaluated in the same manner as in Example 1.

【0242】その評価結果を表2に示す。[0242] The evaluation results are shown in Table 2.

【0243】 (実施例18) 実施例16のポリアミド酸溶液中へその末端水酸基1当
量につきイソシアネ−ト基1当量の割合になるように、
ジフェニルメタンジイソシアネ−トを配合して混合し塗
料を得た。
(Example 18) Into the polyamic acid solution of Example 16, 1 equivalent of isocyanate group was added per 1 equivalent of terminal hydroxyl group.
Diphenylmethane diisocyanate was blended and mixed to obtain a paint.

【0244】得られた塗料を用い、実施例12と同様に
して本発明のイミド化ポリウレタン樹脂絶縁電線を得、
これを実施例1と同様に評価した。
[0244] Using the obtained paint, an imidized polyurethane resin insulated wire of the present invention was obtained in the same manner as in Example 12.
This was evaluated in the same manner as in Example 1.

【0245】その評価結果を表2に示す。[0245] The evaluation results are shown in Table 2.

【0246】 (実施例19) ジアミンB3を3.96g(0.02モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A2を8
.2g(0.02モル)用いた以外は実施例12と同様
にしてポリアミド酸を合成した(但し、ヒドロキシルア
ミンSは用いなかった)。
(Example 19) 3.96 g (0.02 mol) of diamine B3, solvent DM
40g of Ac, 40g of NMP, 8g of acid dianhydride A2
.. Polyamic acid was synthesized in the same manner as in Example 12, except that 2 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0247】得られた塗料(ポリアミド酸溶液)を用い
、実施例12と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 12, and evaluated in the same manner as in Example 1.

【0248】その評価結果を表2に示す。[0248] The evaluation results are shown in Table 2.

【0249】 (実施例20) ジアミンB3を5.94g(0.03モル)、溶媒DM
Acを60g及びNMPを60g、酸二無水物A2を1
2.3g(0.03モル)用いた以外は実施例12と同
様にしてポリアミド酸を合成した。これをさらに210
℃、4時間反応させ、イミド化を行ない、実施例12と
同様に赤外線吸収スペクトルで確認した。
(Example 20) 5.94 g (0.03 mol) of diamine B3, solvent DM
60 g of Ac, 60 g of NMP, 1 acid dianhydride A2
Polyamic acid was synthesized in the same manner as in Example 12, except that 2.3 g (0.03 mol) was used. Add this to 210 more
℃ for 4 hours to perform imidization, which was confirmed by infrared absorption spectrum in the same manner as in Example 12.

【0250】得られた塗料(上記溶液)を用い、実施例
12と同様にして本発明のイミド化絶縁電線を得、これ
を実施例1と同様に評価した。
An imidized insulated wire of the present invention was obtained in the same manner as in Example 12 using the obtained paint (above solution), and evaluated in the same manner as in Example 1.

【0251】その評価結果を表2に示す。[0251] The evaluation results are shown in Table 2.

【0252】 (実施例21) 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB2を6.88g(0.02モル)、溶媒
DMAcを50g及びNMPを50g仕込み、窒素気流
下で25℃を保ちつつ充分に撹拌した。この溶液に、酸
二無水物A3を8.979g(0.0205モル)及び
ヒドロキシルアミンSを0.123g(0.001モル
)徐々に加えた。全部加えた後、窒素気流下25℃で1
5時間撹拌を続け、ポリアミド酸を合成した。
(Example 21) In a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, 6.88 g (0.02 mol) of diamine B2, 50 g of solvent DMAc, and 50 g of NMP were charged, and the mixture was heated under a nitrogen stream. The mixture was thoroughly stirred while maintaining the temperature at 25°C. To this solution, 8.979 g (0.0205 mol) of acid dianhydride A3 and 0.123 g (0.001 mol) of hydroxylamine S were gradually added. After adding everything, add 1 at 25℃ under nitrogen stream.
Stirring was continued for 5 hours to synthesize polyamic acid.

【0253】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温37
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜の
赤外線吸収スペクトルには1780cm ̄1と1380
cm ̄1にイミド基の吸収が認められた。
[0253] The obtained paint (polyamic acid solution) was heated to 0.
Coating on a 4mmφ copper wire at a wire speed of 10m/min at a furnace temperature of 37.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1780cm ̄1 and 1380cm ̄1.
Imide group absorption was observed at cm ̄1.

【0254】得られた電線をJIS  C3003−1
984のエナメル銅線及びエナメルアルミニウム線試験
方法に準じて評価した。
[0254] The obtained electric wire was rated according to JIS C3003-1.
Evaluation was made according to the test method for enameled copper wire and enameled aluminum wire of 984.

【0255】その評価結果を表3に示す。Table 3 shows the evaluation results.

【0256】 (実施例22) ジアミンB5を3.2g(0.016モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A4を7
.491g(0.0165モル)及びヒドロキシルアミ
ンSを0.123g(0.001モル)用いた以外は実
施例21と同様にしてポリアミド酸を合成した。
(Example 22) 3.2 g (0.016 mol) of diamine B5, solvent DM
40g of Ac, 40g of NMP, 7g of acid dianhydride A4
.. Polyamic acid was synthesized in the same manner as in Example 21, except that 491 g (0.0165 mol) and 0.123 g (0.001 mol) of hydroxylamine S were used.

【0257】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0258】その評価結果を表3に示す。[0258] The evaluation results are shown in Table 3.

【0259】 (実施例23) ジアミンB4を5.84g(0.02モル)、溶媒DM
Acを50g及びNMPを50g、酸二無水物A5を9
.266g(0.0205モル)及びヒドロキシルアミ
ンSを0.123g(0.001モル)用いた以外は実
施例21と同様にしてポリアミド酸を合成した。
(Example 23) 5.84 g (0.02 mol) of diamine B4, solvent DM
50g of Ac, 50g of NMP, 9g of acid dianhydride A5
.. Polyamic acid was synthesized in the same manner as in Example 21, except that 266 g (0.0205 mol) and 0.123 g (0.001 mol) of hydroxylamine S were used.

【0260】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0261】その評価結果を表3に示す。[0261] The evaluation results are shown in Table 3.

【0262】 (実施例24) ジアミンB3を5.94g(0.03モル)、溶媒DM
Acを70g及びNMPを70g、酸二無水物A6を1
4.152g(0.0305モル)及びヒドロキシルア
ミンSを0.123g(0.001モル)用いた以外は
実施例21と同様にしてポリアミド酸を合成した。
(Example 24) 5.94 g (0.03 mol) of diamine B3, solvent DM
70 g of Ac, 70 g of NMP, 1 g of acid dianhydride A6
Polyamic acid was synthesized in the same manner as in Example 21, except that 4.152 g (0.0305 mol) and 0.123 g (0.001 mol) of hydroxylamine S were used.

【0263】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0264】その評価結果を表3に示す。[0264] The evaluation results are shown in Table 3.

【0265】 (実施例25) ジアミンB5を5.2g(0.026モル)、溶媒DM
Acを65g及びNMPを65g、酸二無水物A7を1
2.879g(0.0265モル)及びヒドロキシルア
ミンSを0.123g(0.001モル)用いた以外は
実施例21と同様にしてポリアミド酸を合成した。
(Example 25) 5.2 g (0.026 mol) of diamine B5, solvent DM
65 g of Ac, 65 g of NMP, 1 of acid dianhydride A7
A polyamic acid was synthesized in the same manner as in Example 21, except that 2.879 g (0.0265 mol) and 0.123 g (0.001 mol) of hydroxylamine S were used.

【0266】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0266] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0267】その評価結果を表3に示す。Table 3 shows the evaluation results.

【0268】 (実施例26) ジアミンB4を6.424g(0.022モル)、溶媒
DMAcを65g及びNMPを65g、酸二無水物A8
を12.285g(0.0225モル)及びヒドロキシ
ルアミンSを0.123g(0.001モル)用いた以
外は実施例21と同様にしてポリアミド酸を合成した。
(Example 26) 6.424 g (0.022 mol) of diamine B4, 65 g of solvent DMAc and 65 g of NMP, acid dianhydride A8
A polyamic acid was synthesized in the same manner as in Example 21, except that 12.285 g (0.0225 mol) of hydroxylamine S and 0.123 g (0.001 mol) of hydroxylamine S were used.

【0269】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0270】その評価結果を表3に示す。[0270] The evaluation results are shown in Table 3.

【0271】 (実施例27) ジアミンB5を4.0g(0.02モル)、溶媒DMA
cを45g及びNMPを45g、酸二無水物A3を8.
979g(0.0205モル)及びヒドロキシルアミン
Sを0.123g(0.001モル)用いた以外は実施
例21と同様にしてポリアミド酸を合成した。
(Example 27) 4.0 g (0.02 mol) of diamine B5, solvent DMA
45 g of c, 45 g of NMP, and 8.0 g of acid dianhydride A3.
A polyamic acid was synthesized in the same manner as in Example 21, except that 979 g (0.0205 mol) and 0.123 g (0.001 mol) of hydroxylamine S were used.

【0272】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0272] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and this was evaluated in the same manner as in Example 1.

【0273】その評価結果を表3に示す。Table 3 shows the evaluation results.

【0274】 (実施例28) ジアミンB4を5.84g(0.02モル)、溶媒DM
Acを50g及びNMPを50g、酸二無水物A3を8
.979g(0.0205モル)及びヒドロキシルアミ
ンSを0.123g(0.001モル)用いた以外は実
施例21と同様にしてポリアミド酸を合成した。
(Example 28) 5.84 g (0.02 mol) of diamine B4, solvent DM
50g of Ac, 50g of NMP, 8g of acid dianhydride A3
.. A polyamic acid was synthesized in the same manner as in Example 21, except that 979 g (0.0205 mol) and 0.123 g (0.001 mol) of hydroxylamine S were used.

【0275】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0276】その評価結果を表3に示す。Table 3 shows the evaluation results.

【0277】 (実施例29) ジアミンB4を5.84g(0.02モル)、溶媒DM
Acを50g及びNMPを50g、酸二無水物A3を8
.979g(0.0205モル)及びヒドロキシルアミ
ンSを0.123g(0.001モル)、さらに第三級
アミンC1を0.05g用いた以外は実施例21と同様
にしてポリアミド酸を合成した。
(Example 29) 5.84 g (0.02 mol) of diamine B4, solvent DM
50g of Ac, 50g of NMP, 8g of acid dianhydride A3
.. Polyamic acid was synthesized in the same manner as in Example 21, except that 979 g (0.0205 mol) of hydroxylamine S, 0.123 g (0.001 mol) of hydroxylamine S, and 0.05 g of tertiary amine C1 were used.

【0278】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0279】その評価結果を表4に示す。Table 4 shows the evaluation results.

【0280】 (実施例30) ジアミンB4を2.92g(0.01モル)、溶媒DM
Acを30g及びNMPを30g、酸二無水物A3を4
.818g(0.011モル)及びヒドロキシルアミン
Sを0.246g(0.002モル)用いた以外は実施
例21と同様にしてポリアミド酸を合成した。
(Example 30) 2.92 g (0.01 mol) of diamine B4, solvent DM
30g of Ac, 30g of NMP, 4g of acid dianhydride A3
.. A polyamic acid was synthesized in the same manner as in Example 21, except that 818 g (0.011 mol) and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0281】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0281] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0282】その評価結果を表4に示す。Table 4 shows the evaluation results.

【0283】 (実施例31) 実施例30のポリアミド酸溶液中へ、その末端水酸基1
当量につきイソシアネ−ト基1当量の割合になるように
、ジフェニルメタンジイソシアネ−トを配合して混合し
塗料を得た。
(Example 31) Into the polyamic acid solution of Example 30, the terminal hydroxyl group 1
Diphenylmethane diisocyanate was blended and mixed at a ratio of 1 equivalent of isocyanate group per equivalent to obtain a paint.

【0284】得られた塗料を用い、実施例21と同様に
して本発明のイミド化ポリウレタン樹脂絶縁電線を得、
これを実施例1と同様に評価した。
[0284] Using the obtained paint, an imidized polyurethane resin insulated wire of the present invention was obtained in the same manner as in Example 21,
This was evaluated in the same manner as in Example 1.

【0285】その評価結果を表4に示す。Table 4 shows the evaluation results.

【0286】 (実施例32) ジアミンB4を5.84g(0.02モル)、溶媒DM
Acを50g及びNMPを50g、酸二無水物A3を8
.76g(0.02モル)用いた以外は実施例21と同
様にしてポリアミド酸を合成した(但し、ヒドロキシル
アミンSは用いなかった)。
(Example 32) 5.84 g (0.02 mol) of diamine B4, solvent DM
50g of Ac, 50g of NMP, 8g of acid dianhydride A3
.. Polyamic acid was synthesized in the same manner as in Example 21 except that 76 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0287】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0287] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0288】その評価結果を表4に示す。Table 4 shows the evaluation results.

【0289】 (実施例33) ジアミンB5を4.0g(0.02モル)、溶媒DMA
cを45g及びNMPを45g、酸二無水物A3を8.
76g(0.02モル)用いた以外は実施例21と同様
にしてポリアミド酸を合成した(但し、ヒドロキシルア
ミンSは用いなかった)。
(Example 33) 4.0 g (0.02 mol) of diamine B5, solvent DMA
45 g of c, 45 g of NMP, and 8.0 g of acid dianhydride A3.
Polyamic acid was synthesized in the same manner as in Example 21 except that 76 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0290】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0291】その評価結果を表4に示す。Table 4 shows the evaluation results.

【0292】 (実施例34) ジアミンB2を6.88g(0.02モル)、溶媒DM
Acを55g及びNMPを55g、酸二無水物A3を8
.76g(0.02モル)用いた以外は実施例21と同
様にしてポリアミド酸を合成した(但し、ヒドロキシル
アミンSは用いなかった)。
(Example 34) 6.88 g (0.02 mol) of diamine B2, solvent DM
55g of Ac, 55g of NMP, 8g of acid dianhydride A3
.. Polyamic acid was synthesized in the same manner as in Example 21 except that 76 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0293】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0294】その評価結果を表4に示す。Table 4 shows the evaluation results.

【0295】 (実施例35) ジアミンB4を5.84g(0.02モル)、溶媒DM
Acを55g及びNMPを55g、酸二無水物A4を9
.08g(0.02モル)用いた以外は実施例21と同
様にしてポリアミド酸を合成した(但し、ヒドロキシル
アミンSは用いなかった)。
(Example 35) 5.84 g (0.02 mol) of diamine B4, solvent DM
55g of Ac, 55g of NMP, 9g of acid dianhydride A4
.. A polyamic acid was synthesized in the same manner as in Example 21 except that 08 g (0.02 mol) of hydroxylamine S was used (however, hydroxylamine S was not used).

【0296】得られた塗料(ポリアミド酸溶液)を用い
、実施例21と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 21, and evaluated in the same manner as in Example 1.

【0297】その評価結果を表4に示す。Table 4 shows the evaluation results.

【0298】 (実施例36) 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB7を2.72g(0.02モル)、溶媒
DMAcを25g及びNMPを25g仕込み、窒素気流
下で25℃を保ちつつ充分に撹拌した。この溶液に、酸
二無水物A9を4.578g(0.021モル)及びヒ
ドロキシルアミンSを0.246g(0.002モル)
徐々に加えた。全部加えた後、窒素気流下25℃で15
時間撹拌を続け、ポリアミド酸を合成した。
(Example 36) In a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, 2.72 g (0.02 mol) of diamine B7, 25 g of solvent DMAc, and 25 g of NMP were charged, and the mixture was heated under a nitrogen stream. The mixture was thoroughly stirred while maintaining the temperature at 25°C. To this solution, 4.578 g (0.021 mol) of acid dianhydride A9 and 0.246 g (0.002 mol) of hydroxylamine S were added.
Added gradually. After adding everything, heat at 25℃ under nitrogen stream for 15 minutes.
Stirring was continued for hours to synthesize polyamic acid.

【0299】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温37
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜の
赤外線吸収スペクトルには1780cm ̄1と1380
cm ̄1にイミド基の吸収が認められた。
[0299] The obtained paint (polyamic acid solution) was mixed with 0.
Coating on a 4mmφ copper wire at a wire speed of 10m/min at a furnace temperature of 37.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1780cm ̄1 and 1380cm ̄1.
Imide group absorption was observed at cm ̄1.

【0300】得られた電線をJIS  C3003−1
984のエナメル銅線及びエナメルアルミニウム線試験
方法に準じて評価した。
[0300] The obtained electric wire was rated according to JIS C3003-1.
Evaluation was made according to the test method for enameled copper wire and enameled aluminum wire of 984.

【0301】その評価結果を表5に示す。[0301] Table 5 shows the evaluation results.

【0302】 (実施例37) ジアミンB8を6.78g(0.03モル)、溶媒DM
Acを55g及びNMPを55g、酸二無水物A10を
9.114g(0.031モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)用いた以外は実
施例36と同様にしてポリアミド酸を合成した。
(Example 37) 6.78 g (0.03 mol) of diamine B8, solvent DM
Polyamic acid was prepared in the same manner as in Example 36, except that 55 g of Ac, 55 g of NMP, 9.114 g (0.031 mol) of acid dianhydride A10, and 0.246 g (0.002 mol) of hydroxylamine S were used. was synthesized.

【0303】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0303] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and this was evaluated in the same manner as in Example 1.

【0304】その評価結果を表5に示す。[0304] The evaluation results are shown in Table 5.

【0305】 (実施例38) ジアミンB6を3.36g(0.016モル)、溶媒D
MAcを30g及びNMPを30g、酸二無水物A11
を5.474g(0.017モル)及びヒドロキシルア
ミンSを0.246g(0.002モル)用いた以外は
実施例36と同様にしてポリアミド酸を合成した。
(Example 38) 3.36 g (0.016 mol) of diamine B6, solvent D
30 g of MAc and 30 g of NMP, acid dianhydride A11
A polyamic acid was synthesized in the same manner as in Example 36, except that 5.474 g (0.017 mol) of hydroxylamine S and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0306】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0307】その評価結果を表5に示す。Table 5 shows the evaluation results.

【0308】 (実施例39) ジアミンB9を2.84g(0.02モル)、溶媒DM
Acを30g及びNMPを30g、酸二無水物A12を
5.628g(0.021モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)用いた以外は実
施例36と同様にしてポリアミド酸を合成した。
(Example 39) 2.84 g (0.02 mol) of diamine B9, solvent DM
Polyamic acid was prepared in the same manner as in Example 36, except that 30 g of Ac, 30 g of NMP, 5.628 g (0.021 mol) of acid dianhydride A12, and 0.246 g (0.002 mol) of hydroxylamine S were used. was synthesized.

【0309】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0310】その評価結果を表5に示す。[0310] The evaluation results are shown in Table 5.

【0311】 (実施例40) ジアミンB10を2.964g(0.026モル)、溶
媒DMAcを35g及びNMPを35g、酸二無水物A
13を7.236g(0.027モル)及びヒドロキシ
ルアミンSを0.246g(0.002モル)用いた以
外は実施例36と同様にしてポリアミド酸を合成した。
(Example 40) 2.964 g (0.026 mol) of diamine B10, 35 g of solvent DMAc and 35 g of NMP, acid dianhydride A
Polyamic acid was synthesized in the same manner as in Example 36, except that 7.236 g (0.027 mol) of No. 13 and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0312】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0312] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0313】その評価結果を表5に示す。[0313] The evaluation results are shown in Table 5.

【0314】 (実施例41) ジアミンB11を5.712g(0.024モル)、溶
媒DMAcを45g及びNMPを45g、酸二無水物A
14を6.7g(0.025モル)及びヒドロキシルア
ミンSを0.246g(0.002モル)用いた以外は
実施例36と同様にしてポリアミド酸を合成した。
(Example 41) 5.712 g (0.024 mol) of diamine B11, 45 g of solvent DMAc and 45 g of NMP, acid dianhydride A
Polyamic acid was synthesized in the same manner as in Example 36, except that 6.7 g (0.025 mol) of No. 14 and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0315】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0316】その評価結果を表5に示す。Table 5 shows the evaluation results.

【0317】 (実施例42) ジアミンB12を3.48g(0.03モル)、溶媒D
MAcを50g及びNMPを50g、酸二無水物A15
を9.61g(0.031モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)用いた以外は実
施例36と同様にしてポリアミド酸を合成した。
(Example 42) 3.48 g (0.03 mol) of diamine B12, solvent D
50 g of MAc and 50 g of NMP, acid dianhydride A15
A polyamic acid was synthesized in the same manner as in Example 36, except that 9.61 g (0.031 mol) of hydroxylamine S and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0318】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0319】その評価結果を表5に示す。[0319] Table 5 shows the evaluation results.

【0320】 (実施例43) ジアミンB13を2.04g(0.02モル)、溶媒D
MAcを30g及びNMPを30g、酸二無水物A16
を6.468g(0.021モル)及びヒドロキシルア
ミンSを0.246g(0.002モル)用いた以外は
実施例36と同様にしてポリアミド酸を合成した。
(Example 43) 2.04 g (0.02 mol) of diamine B13, solvent D
30 g of MAc and 30 g of NMP, acid dianhydride A16
Polyamic acid was synthesized in the same manner as in Example 36, except that 6.468 g (0.021 mol) of hydroxylamine S and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0321】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0321] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0322】その評価結果を表5に示す。[0322] The evaluation results are shown in Table 5.

【0323】 (実施例44) ジアミンB8を4.52g(0.02モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A17を
7.056g(0.021モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)用いた以外は実
施例36と同様にしてポリアミド酸を合成した。
(Example 44) 4.52 g (0.02 mol) of diamine B8, solvent DM
Polyamic acid was prepared in the same manner as in Example 36, except that 40 g of Ac, 40 g of NMP, 7.056 g (0.021 mol) of acid dianhydride A17, and 0.246 g (0.002 mol) of hydroxylamine S were used. was synthesized.

【0324】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0324] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0325】その評価結果を表5に示す。Table 5 shows the evaluation results.

【0326】 (実施例45) ジアミンB8を4.52g(0.02モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A11を
6.762g(0.021モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)用いた以外は実
施例36と同様にしてポリアミド酸を合成した。
(Example 45) 4.52 g (0.02 mol) of diamine B8, solvent DM
Polyamic acid was prepared in the same manner as in Example 36, except that 40 g of Ac, 40 g of NMP, 6.762 g (0.021 mol) of acid dianhydride A11, and 0.246 g (0.002 mol) of hydroxylamine S were used. was synthesized.

【0327】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0327] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0328】その評価結果を表6に示す。[0328] Table 6 shows the evaluation results.

【0329】 (実施例46) ジアミンB11を4.76g(0.02モル)、溶媒D
MAcを40g及びNMPを40g、酸二無水物A16
を6.468g(0.021モル)及びヒドロキシルア
ミンSを0.246g(0.002モル)用いた以外は
実施例36と同様にしてポリアミド酸を合成した。
(Example 46) 4.76 g (0.02 mol) of diamine B11, solvent D
40 g of MAc and 40 g of NMP, acid dianhydride A16
Polyamic acid was synthesized in the same manner as in Example 36, except that 6.468 g (0.021 mol) of hydroxylamine S and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0330】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0331】その評価結果を表6に示す。[0331] The evaluation results are shown in Table 6.

【0332】 (実施例47) ジアミンB8を4.52g(0.02モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A11を
6.762g(0.021モル)及びヒドロキシルアミ
ンSを0.246g(0.002モル)、さらに第三級
アミンC1を0.06g用いた以外は実施例36と同様
にしてポリアミド酸を合成した。
(Example 47) 4.52 g (0.02 mol) of diamine B8, solvent DM
40 g of Ac, 40 g of NMP, 6.762 g (0.021 mol) of acid dianhydride A11, 0.246 g (0.002 mol) of hydroxylamine S, and 0.06 g of tertiary amine C1 were used. Polyamic acid was synthesized in the same manner as in Example 36 except for this.

【0333】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0334】その評価結果を表6に示す。Table 6 shows the evaluation results.

【0335】 (実施例48) ジアミンB8を2.26g(0.01モル)、溶媒DM
Acを25g及びNMPを25g、酸二無水物A11を
3.703g(0.0115モル)及びヒドロキシルア
ミンSを0.369g(0.003モル)用いた以外は
実施例36と同様にしてポリアミド酸を合成した。
(Example 48) 2.26 g (0.01 mol) of diamine B8, solvent DM
Polyamic acid was prepared in the same manner as in Example 36, except that 25 g of Ac, 25 g of NMP, 3.703 g (0.0115 mol) of acid dianhydride A11, and 0.369 g (0.003 mol) of hydroxylamine S were used. was synthesized.

【0336】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0337】その評価結果を表6に示す。[0337] Table 6 shows the evaluation results.

【0338】 (実施例49) 実施例48のポリアミド酸溶液中へ、その末端水酸基1
当量につきイソシアネ−ト基1当量の割合になるように
、ジフェニルメタンジイソシアネ−トを配合して混合し
塗料を得た。
(Example 49) Into the polyamic acid solution of Example 48, the terminal hydroxyl group 1
Diphenylmethane diisocyanate was blended and mixed at a ratio of 1 equivalent of isocyanate group per equivalent to obtain a paint.

【0339】得られた塗料を用い、実施例36と同様に
して本発明のイミド化ポリウレタン樹脂絶縁電線を得、
これを実施例1と同様に評価した。
[0339] Using the obtained paint, an imidized polyurethane resin insulated wire of the present invention was obtained in the same manner as in Example 36.
This was evaluated in the same manner as in Example 1.

【0340】その評価結果を表6に示す。[0340] The evaluation results are shown in Table 6.

【0341】 (実施例50) ジアミンB8を4.52g(0.02モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A11を
6.44g(0.02モル)用いた以外は実施例36と
同様にしてポリアミド酸を合成した(但し、ヒドロキシ
ルアミンSは用いなかった)。
(Example 50) 4.52 g (0.02 mol) of diamine B8, solvent DM
Polyamic acid was synthesized in the same manner as in Example 36, except that 40 g of Ac, 40 g of NMP, and 6.44 g (0.02 mol) of acid dianhydride A11 were used (however, hydroxylamine S was not used). .

【0342】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0342] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0343】その評価結果を表6に示す。[0343] The evaluation results are shown in Table 6.

【0344】 (実施例51) ジアミンB6を4.2g(0.02モル)、溶媒DMA
cを35g及びNMPを35g、酸二無水物A12を5
.36g(0.02モル)用いた以外は実施例36と同
様にしてポリアミド酸を合成した(但し、ヒドロキシル
アミンSは用いなかった)。
(Example 51) 4.2 g (0.02 mol) of diamine B6, solvent DMA
35g of c, 35g of NMP, 5g of acid dianhydride A12
.. Polyamic acid was synthesized in the same manner as in Example 36, except that 36 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0345】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0346】その評価結果を表6に示す。Table 6 shows the evaluation results.

【0347】 (実施例52) ジアミンB10を2.28g(0.02モル)、溶媒D
MAcを35g及びNMPを35g、酸二無水物A17
を6.72g(0.02モル)用いた以外は実施例36
と同様にしてポリアミド酸を合成した(但し、ヒドロキ
シルアミンSは用いなかった)。
(Example 52) 2.28 g (0.02 mol) of diamine B10, solvent D
35 g of MAc and 35 g of NMP, acid dianhydride A17
Example 36 except that 6.72 g (0.02 mol) of
Polyamic acid was synthesized in the same manner as (however, hydroxylamine S was not used).

【0348】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0348] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0349】その評価結果を表6に示す。Table 6 shows the evaluation results.

【0350】 (実施例53) ジアミンB13を2.04g(0.02モル)、溶媒D
MAcを25g及びNMPを25g、酸二無水物A9を
4.36g(0.02モル)用いた以外は実施例36と
同様にしてポリアミド酸を合成した(但し、ヒドロキシ
ルアミンSは用いなかった)。
(Example 53) 2.04 g (0.02 mol) of diamine B13, solvent D
Polyamic acid was synthesized in the same manner as in Example 36, except that 25 g of MAc, 25 g of NMP, and 4.36 g (0.02 mol) of acid dianhydride A9 were used (however, hydroxylamine S was not used). .

【0351】得られた塗料(ポリアミド酸溶液)を用い
、実施例36と同様にして本発明のイミド化絶縁電線を
得、これを実施例1と同様に評価した。
[0351] Using the obtained paint (polyamic acid solution), an imidized insulated wire of the present invention was obtained in the same manner as in Example 36, and evaluated in the same manner as in Example 1.

【0352】その評価結果を表6に示す。[0352] The evaluation results are shown in Table 6.

【0353】次に比較例について示す。[0353] Next, a comparative example will be shown.

【0354】 比較例1 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB5を3.00g(0.015モル)、溶
媒DMAcを20g及びNMPを20g仕込み、窒素気
流下で25℃を保ちつつ充分に撹拌した。この溶液に、
酸二無水物A9を3.597g(0.0165モル)及
びヒドロキシルアミンSを0.369g(0.003モ
ル)徐々に加えた。全部加えた後、窒素気流下25℃で
12時間撹拌を続け、ポリアミド酸を合成した。
Comparative Example 1 3.00 g (0.015 mol) of diamine B5, 20 g of solvent DMAc, and 20 g of NMP were placed in a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, and the mixture was heated for 25 hours under a nitrogen stream. The mixture was thoroughly stirred while maintaining the temperature at °C. In this solution,
3.597 g (0.0165 mol) of acid dianhydride A9 and 0.369 g (0.003 mol) of hydroxylamine S were gradually added. After all the mixture was added, stirring was continued for 12 hours at 25° C. under a nitrogen stream to synthesize polyamic acid.

【0355】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温37
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜の
赤外線吸収スペクトルには1380cm ̄1と730c
m ̄1にイミド基の吸収が認められた。
[0355] The obtained paint (polyamic acid solution) was mixed with 0.
Coating on a 4mmφ copper wire at a wire speed of 10m/min at a furnace temperature of 37.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1380 cm ̄1 and 730 cm
Imide group absorption was observed at m ̄1.

【0356】得られた電線を上記実施例1と同様に、J
IS  C3003−1984のエナメル銅線及びエナ
メルアルミニウム線試験方法に準じて評価し、その評価
結果を表1に示す。
[0356] The obtained electric wire was treated with J in the same manner as in Example 1 above.
It was evaluated according to the test method for enamelled copper wire and enameled aluminum wire of IS C3003-1984, and the evaluation results are shown in Table 1.

【0357】 比較例2 ジアミンB3を2.97g(0.015モル)、溶媒D
MAcを20g及びNMPを20g、酸二無水物A9を
3.597g(0.0165モル)及びヒドロキシルア
ミンSを0.369g(0.003モル)用いた以外は
比較例1と同様にしてポリアミド酸を合成した。
Comparative Example 2 2.97 g (0.015 mol) of diamine B3, solvent D
Polyamic acid was prepared in the same manner as in Comparative Example 1, except that 20 g of MAc, 20 g of NMP, 3.597 g (0.0165 mol) of acid dianhydride A9, and 0.369 g (0.003 mol) of hydroxylamine S were used. was synthesized.

【0358】得られた塗料(ポリアミド酸溶液)を用い
、比較例1と同様にイミド化絶縁電線を得、これを実施
例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 1, and this was evaluated in the same manner as in Example 1.

【0359】その評価結果を表1に示す。[0359] The evaluation results are shown in Table 1.

【0360】 比較例3 ジアミンB5を3.00g(0.015モル)、溶媒D
MAcを20g及びNMPを20g、酸二無水物A9を
3.27g(0.015モル)用いた以外は比較例1と
同様にしてポリアミド酸を合成した(但し、ヒドロキシ
ルアミンSは用いなかった)。
Comparative Example 3 3.00 g (0.015 mol) of diamine B5, solvent D
Polyamic acid was synthesized in the same manner as in Comparative Example 1, except that 20 g of MAc, 20 g of NMP, and 3.27 g (0.015 mol) of acid dianhydride A9 were used (however, hydroxylamine S was not used). .

【0361】得られた塗料(ポリアミド酸溶液)を用い
、比較例1と同様にイミド化絶縁電線を得、これを実施
例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 1, and this was evaluated in the same manner as in Example 1.

【0362】その評価結果を表1に示す。[0362] The evaluation results are shown in Table 1.

【0363】 比較例4 ジアミンB3を3.96g(0.02モル)、溶媒DM
Acを25g及びNMPを25g、酸二無水物A9を4
.36g(0.02モル)用いた以外は比較例1と同様
にしてポリアミド酸を合成した(但し、ヒドロキシルア
ミンSは用いなかった)。
Comparative Example 4 3.96 g (0.02 mol) of diamine B3, solvent DM
25g of Ac, 25g of NMP, 4g of acid dianhydride A9
.. A polyamic acid was synthesized in the same manner as in Comparative Example 1 except that 36 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0364】得られた塗料(ポリアミド酸溶液)を用い
、比較例1と同様にイミド化絶縁電線を得、これを実施
例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 1, and this was evaluated in the same manner as in Example 1.

【0365】その評価結果を表1に示す。[0365] The evaluation results are shown in Table 1.

【0366】 比較例5 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB3を3.96g(0.02モル)、溶媒
DMAcを40g及びNMPを40g仕込み、窒素気流
下で25℃を保ちつつ充分に撹拌した。この溶液に、酸
二無水物A9を4.578g(0.021モル)及びヒ
ドロキシルアミンSを0.246g(0.002モル)
徐々に加えた。全部加えた後、窒素気流下25℃で14
時間撹拌を続け、ポリアミド酸を合成した。
Comparative Example 5 3.96 g (0.02 mol) of diamine B3, 40 g of solvent DMAc, and 40 g of NMP were placed in a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, and the mixture was heated for 25 hours under a nitrogen stream. The mixture was thoroughly stirred while maintaining the temperature at °C. To this solution, 4.578 g (0.021 mol) of acid dianhydride A9 and 0.246 g (0.002 mol) of hydroxylamine S were added.
Added gradually. After adding everything, heat at 25°C under a nitrogen stream for 14 hours.
Stirring was continued for hours to synthesize polyamic acid.

【0367】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温38
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜の
赤外線吸収スペクトルには1780cm ̄1と1380
cm ̄1にイミド基の吸収が認められた。
[0367] The obtained paint (polyamic acid solution) was heated to 0.
Coat it on a 4mmφ copper wire at a wire speed of 10m/min and at a furnace temperature of 38.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1780cm ̄1 and 1380cm ̄1.
Imide group absorption was observed at cm ̄1.

【0368】得られた電線を上記実施例1と同様に、J
IS  C3003−1984のエナメル銅線及びエナ
メルアルミニウム線試験方法に準じて評価し、その評価
結果を表2に示す。
[0368] The obtained electric wire was treated with J in the same manner as in Example 1 above.
It was evaluated according to the enamelled copper wire and enameled aluminum wire test method of IS C3003-1984, and the evaluation results are shown in Table 2.

【0369】 比較例6 ジアミンB3を3.96g(0.02モル)、溶媒DM
Acを40g及びNMPを40g、酸二無水物A9を4
.36g(0.02モル)用いた以外は比較例5と同様
にしてポリアミド酸を合成した(但し、ヒドロキシルア
ミンSは用いなかった)。
Comparative Example 6 3.96 g (0.02 mol) of diamine B3, solvent DM
40g of Ac, 40g of NMP, 4g of acid dianhydride A9
.. Polyamic acid was synthesized in the same manner as in Comparative Example 5 except that 36 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0370】得られた塗料(ポリアミド酸溶液)を用い
、比較例5と同様にイミド化絶縁電線を得、これを実施
例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 5, and evaluated in the same manner as in Example 1.

【0371】その評価結果を表2に示す。[0371] The evaluation results are shown in Table 2.

【0372】 比較例7 多価アルコ−ルと多価カルボン酸より合成されたポリエ
ステルポリオ−ル(住友バイエルウレタン社製デスモフ
ェン600)10g、ブロック化イソシアネ−トとして
(住友バイエルウレタン社製デスモジュ−ルCTステ−
ブル)21.2g、さらに、オクチル酸鉛0.2gをク
レゾ−ル40gに溶解し、塗料組成物を得た。
Comparative Example 7 10 g of a polyester polyol synthesized from a polyhydric alcohol and a polycarboxylic acid (Desmophene 600 manufactured by Sumitomo Bayer Urethane Co., Ltd.) was used as a blocked isocyanate (Desmodur manufactured by Sumitomo Bayer Urethane Co., Ltd.) CT stay
A coating composition was obtained by dissolving 21.2 g of lead octylate and 0.2 g of lead octylate in 40 g of cresol.

【0373】得られた塗料組成物を用い、比較例5と同
様にして絶縁電線を得、これを実施例1と同様に評価し
た。
Using the obtained coating composition, an insulated wire was obtained in the same manner as in Comparative Example 5, and evaluated in the same manner as in Example 1.

【0374】その評価結果を表2に示す。[0374] The evaluation results are shown in Table 2.

【0375】 比較例8 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB3を3.96g(0.02モル)、溶媒
DMAcを30g及びNMPを30g仕込み、窒素気流
下で25℃を保ちつつ充分に撹拌した。この溶液に、酸
二無水物A9を4.469g(0.0205モル)及び
ヒドロキシルアミンSを0.123g(0.001モル
)徐々に加えた。全部加えた後、窒素気流下25℃で1
5時間撹拌を続け、ポリアミド酸を合成した。
Comparative Example 8 In a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, 3.96 g (0.02 mol) of diamine B3, 30 g of solvent DMAc, and 30 g of NMP were charged, and the mixture was heated for 25 hours under a nitrogen stream. The mixture was thoroughly stirred while maintaining the temperature at °C. To this solution, 4.469 g (0.0205 mol) of acid dianhydride A9 and 0.123 g (0.001 mol) of hydroxylamine S were gradually added. After adding everything, add 1 at 25℃ under nitrogen stream.
Stirring was continued for 5 hours to synthesize polyamic acid.

【0376】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温37
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜の
赤外線吸収スペクトルには1380cm ̄1と730c
m ̄1にイミド基の吸収が認められた。
[0376] The obtained paint (polyamic acid solution) was heated to 0.
Coating on a 4mmφ copper wire at a wire speed of 10m/min at a furnace temperature of 37.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1380 cm ̄1 and 730 cm
Imide group absorption was observed at m ̄1.

【0377】得られた電線を上記実施例1と同様に、J
IS  C3003−1984のエナメル銅線及びエナ
メルアルミニウム線試験方法に準じて評価し、その評価
結果を表3及び表4に示す。
[0377] The obtained electric wire was treated with J in the same manner as in Example 1 above.
It was evaluated according to the enamelled copper wire and enameled aluminum wire test method of IS C3003-1984, and the evaluation results are shown in Tables 3 and 4.

【0378】 比較例9 ジアミンB3を3.96g(0.02モル)、溶媒DM
Acを35g及びNMPを35g、酸二無水物A10を
6.027g(0.0205モル)及びヒドロキシルア
ミンSを0.123g(0.001モル)用いた以外は
比較例8と同様にしてポリアミド酸を合成した。
Comparative Example 9 3.96 g (0.02 mol) of diamine B3, solvent DM
Polyamic acid was prepared in the same manner as in Comparative Example 8, except that 35 g of Ac, 35 g of NMP, 6.027 g (0.0205 mol) of acid dianhydride A10, and 0.123 g (0.001 mol) of hydroxylamine S were used. was synthesized.

【0379】得られた塗料(ポリアミド酸溶液)を用い
、比較例8と同様にイミド化絶縁電線を得、これを実施
例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 8, and this was evaluated in the same manner as in Example 1.

【0380】その評価結果を表3及び表4に示す。[0380] The evaluation results are shown in Tables 3 and 4.

【0381】 比較例10 ジアミンB3を3.96g(0.02モル)、溶媒DM
Acを35g及びNMPを35g、酸二無水物A11を
6.44g(0.02モル)用いた以外は比較例8と同
様にしてポリアミド酸を合成した(但し、ヒドロキシル
アミンSは用いなかった)。
Comparative Example 10 3.96 g (0.02 mol) of diamine B3, solvent DM
Polyamic acid was synthesized in the same manner as in Comparative Example 8, except that 35 g of Ac, 35 g of NMP, and 6.44 g (0.02 mol) of acid dianhydride A11 were used (however, hydroxylamine S was not used). .

【0382】得られた塗料(ポリアミド酸溶液)を用い
、比較例8と同様にイミド化絶縁電線を得、これを実施
例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 8, and evaluated in the same manner as in Example 1.

【0383】その評価結果を表3及び表4に示す。[0383] The evaluation results are shown in Tables 3 and 4.

【0384】 比較例11 ジアミンB3を3.96g(0.02モル)、溶媒DM
Acを30g及びNMPを30g、酸二無水物A9を4
.36g(0.02モル)用いた以外は比較例8と同様
にしてポリアミド酸を合成した(但し、ヒドロキシルア
ミンSは用いなかった)。
Comparative Example 11 3.96 g (0.02 mol) of diamine B3, solvent DM
30g of Ac, 30g of NMP, 4g of acid dianhydride A9
.. Polyamic acid was synthesized in the same manner as in Comparative Example 8 except that 36 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0385】得られた塗料(ポリアミド酸溶液)を用い
、比較例8と同様にイミド化絶縁電線を得、これを実施
例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 8, and this was evaluated in the same manner as in Example 1.

【0386】その評価結果を表3及び表4に示す。[0386] The evaluation results are shown in Tables 3 and 4.

【0387】 比較例12 撹拌機、温度計、窒素導入管を取り付けた反応フラスコ
内にジアミンB3を3.96g(0.02モル)、溶媒
DMAcを30g及びNMPを30g仕込み、窒素気流
下で25℃を保ちつつ充分に撹拌した。
Comparative Example 12 In a reaction flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube, 3.96 g (0.02 mol) of diamine B3, 30 g of solvent DMAc, and 30 g of NMP were charged, and the mixture was heated for 25 hours under a nitrogen stream. The mixture was thoroughly stirred while maintaining the temperature at °C.

【0388】この溶液に、酸二無水物A9を4.578
g(0.021モル)及びヒドロキシルアミンSを0.
246g(0.002モル)徐々に加えた。全部加えた
後、窒素気流下25℃で15時間撹拌を続け、ポリアミ
ド酸を合成した。
[0388] Add 4.578% of acid dianhydride A9 to this solution.
g (0.021 mol) and hydroxylamine S.
246 g (0.002 mol) was added gradually. After all the mixture was added, stirring was continued for 15 hours at 25° C. under a nitrogen stream to synthesize polyamic acid.

【0389】得られた塗料(ポリアミド酸溶液)を0.
4mmφの銅線に塗布し線速10m/minで炉温37
0℃、炉長3.0mの炉中を数回通して焼き付けを行な
い皮膜厚さ約20μmの絶縁電線を得た。なお、皮膜の
赤外線吸収スペクトルには1780cm ̄1と1380
cm ̄1にイミド基の吸収が認められた。
[0389] The obtained paint (polyamic acid solution) was heated to 0.
Coating on a 4mmφ copper wire at a wire speed of 10m/min at a furnace temperature of 37.
The wire was baked by passing it through a furnace with a furnace length of 3.0 m at 0° C. several times to obtain an insulated wire with a coating thickness of about 20 μm. In addition, the infrared absorption spectrum of the film has 1780cm ̄1 and 1380cm ̄1.
Imide group absorption was observed at cm ̄1.

【0390】得られた電線を上記実施例1と同様に、J
IS  C3003−1984のエナメル銅線及びエナ
メルアルミニウム線試験方法に準じて評価し、その評価
結果を表5及び表6に示す。
[0390] The obtained electric wire was treated with J in the same manner as in Example 1 above.
It was evaluated according to the enamelled copper wire and enameled aluminum wire test method of IS C3003-1984, and the evaluation results are shown in Tables 5 and 6.

【0391】 比較例13 ジアミンB5を4.0g(0.02モル)、溶媒DMA
cを35g及びNMPを35g、酸二無水物A12を5
.628g(0.021モル)及びヒドロキシルアミン
Sを0.246g(0.002モル)用いた以外は比較
例12と同様にしてポリアミド酸を合成した。
Comparative Example 13 4.0 g (0.02 mol) of diamine B5, solvent DMA
35g of c, 35g of NMP, 5g of acid dianhydride A12
.. A polyamic acid was synthesized in the same manner as in Comparative Example 12, except that 628 g (0.021 mol) and 0.246 g (0.002 mol) of hydroxylamine S were used.

【0392】得られた塗料(ポリアミド酸溶液)を用い
、比較例12と同様にイミド化絶縁電線を得、これを実
施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 12, and this was evaluated in the same manner as in Example 1.

【0393】その評価結果を表5及び表6に示す。[0393] The evaluation results are shown in Tables 5 and 6.

【0394】 比較例14 ジアミンB3を3.96g(0.02モル)、溶媒DM
Acを30g及びNMPを30g、酸二無水物A9を4
.36g(0.02モル)用いた以外は比較例12と同
様にしてポリアミド酸を合成した(但し、ヒドロキシル
アミンSは用いなかった)。
Comparative Example 14 3.96 g (0.02 mol) of diamine B3, solvent DM
30g of Ac, 30g of NMP, 4g of acid dianhydride A9
.. Polyamic acid was synthesized in the same manner as Comparative Example 12 except that 36 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0395】得られた塗料(ポリアミド酸溶液)を用い
、比較例12と同様にイミド化絶縁電線を得、これを実
施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 12, and this was evaluated in the same manner as in Example 1.

【0396】その評価結果を表5及び表6に示す。[0396] The evaluation results are shown in Tables 5 and 6.

【0397】 比較例15 ジアミンB5を4.0g(0.02モル)、溶媒DMA
cを35g及びNMPを35g、酸二無水物A12を5
.36g(0.02モル)用いた以外は比較例12と同
様にしてポリアミド酸を合成した(但し、ヒドロキシル
アミンSは用いなかった)。
Comparative Example 15 4.0 g (0.02 mol) of diamine B5, solvent DMA
35g of c, 35g of NMP, 5g of acid dianhydride A12
.. Polyamic acid was synthesized in the same manner as Comparative Example 12 except that 36 g (0.02 mol) was used (however, hydroxylamine S was not used).

【0398】得られた塗料(ポリアミド酸溶液)を用い
、比較例12と同様にイミド化絶縁電線を得、これを実
施例1と同様に評価した。
Using the obtained paint (polyamic acid solution), an imidized insulated wire was obtained in the same manner as in Comparative Example 12, and this was evaluated in the same manner as in Example 1.

【0399】その評価結果を表5及び表6に示す。[0399] The evaluation results are shown in Tables 5 and 6.

【0400】0400]

【表1】[Table 1]

【0401】0401]

【表2】[Table 2]

【0402】0402]

【表3】[Table 3]

【0403】0403]

【表4】[Table 4]

【0404】0404]

【表5】[Table 5]

【0405】0405]

【表6】[Table 6]

【0406】表1〜表6の結果から明らかな如く、本発
明の絶縁電線は、従来品(比較例)に比べ、一般特性に
おいて同等乃至それ以上の特性を有するとともに、優れ
たハンダ付け性を有していることが明らかである。
As is clear from the results in Tables 1 to 6, the insulated wire of the present invention has the same or better general characteristics than the conventional product (comparative example), and also has excellent solderability. It is clear that it has.

【0407】すなわち、本発明の電線は耐熱性に優れる
とともに、ハンダ付けも可能である優れた電線である。
[0407] That is, the electric wire of the present invention has excellent heat resistance and is also an excellent electric wire that can be soldered.

【0408】次に、カラ−TV用フライバックトランス
への応用例を示す。
Next, an example of application to a flyback transformer for color TV will be shown.

【0409】本発明の電線を用いたフライバックトラン
ス(FBT)の電圧印加時寿命試験を行なった。
A life test was conducted on a flyback transformer (FBT) using the electric wire of the present invention under voltage application.

【0410】図2にカラ−TV用FBTの概略断面図を
示す。また、図3には寿命に著しく関わる高圧コイル部
の拡大図を示す。
FIG. 2 shows a schematic cross-sectional view of an FBT for color TV. Furthermore, FIG. 3 shows an enlarged view of the high-voltage coil portion, which significantly affects the service life.

【0411】これらの図において、3は高圧巻線、4は
高圧ボビン、5は低圧巻線、6は低圧ボビンである。高
圧巻線3は、高圧ボビン4に形成された溝内に装巻され
ている。低圧巻線5は、低圧ボビン6に形成された溝内
に装巻されている。
In these figures, 3 is a high voltage winding, 4 is a high voltage bobbin, 5 is a low voltage winding, and 6 is a low voltage bobbin. The high voltage winding 3 is wound within a groove formed in the high voltage bobbin 4. The low voltage winding 5 is wound within a groove formed in the low voltage bobbin 6.

【0412】また、7は充填剤、8は収納ケ−ス、9は
コアである。
Further, 7 is a filler, 8 is a storage case, and 9 is a core.

【0413】通常、接触している巻線間の電圧は10〜
300Vと言われている。
[0413] Normally, the voltage between the windings in contact is 10~
It is said to be 300V.

【0414】そこで、電線2本を接触してプラスチック
円筒に巻いて、充填剤(エポキシレジン)中に埋め込ん
で、空気中に出ている両端間に3kVの電圧を印加しつ
つ110℃に放置して、FBTの加速寿命試験を行ない
、絶縁破壊するまでの時間を求めた。
[0414] Therefore, two electric wires were brought into contact and wound around a plastic cylinder, embedded in a filler (epoxy resin), and left at 110°C while applying a voltage of 3 kV between both ends exposed to the air. Then, an accelerated life test of the FBT was conducted to determine the time required for dielectric breakdown.

【0415】ワイブルプロットによると、本発明の実施
例1、2、3、22、28、32、35、37、49、
50、51の被覆材料を用いた電線(但し、銅線の径:
0.06mm、皮膜厚さ:0.01mm)による寿命試
験では、1%不良率が発生する時間は450hr、50
0hr、600hr、530hr、550hr、580
hr、560hr、540hr、550hr、570h
r、560hrであった。
According to Weibull plot, Examples 1, 2, 3, 22, 28, 32, 35, 37, 49,
Electric wires using coating materials of 50 and 51 (however, the diameter of copper wire:
0.06mm, film thickness: 0.01mm), the time for 1% defective rate to occur was 450hr, 50hr
0hr, 600hr, 530hr, 550hr, 580
hr, 560hr, 540hr, 550hr, 570hr
r, 560 hours.

【0416】一方、比較用被覆材料として、住友バイエ
ルウレタン社製デスモフェン800(ポリオ−ル)とデ
スモジュ−ルCTステ−ブル(ブロック型イソシアネ−
ト)からなる汎用ポリウレタン樹脂を選び、絶縁電線を
作り、上記と同じ加速寿命試験を行なった。その結果、
1%不良率が発生する時間は、わずか40hrにしか過
ぎず、実施例に比べ極めて劣っていることが明らかにな
った。
On the other hand, as coating materials for comparison, Desmophene 800 (polyol) manufactured by Sumitomo Bayer Urethane Co., Ltd. and Desmodur CT Stable (block type isocyanate) were used as coating materials for comparison.
A general-purpose polyurethane resin consisting of (g) was selected, an insulated wire was made, and the same accelerated life test as above was conducted. the result,
It was revealed that the time required for a 1% defective rate to occur was only 40 hours, which was extremely inferior to the example.

【0417】すなわち、本発明の電線を用いることによ
り、汎用のポリウレタン樹脂を用いた従来品(比較例)
に比べ、FBTの長寿命化や高出力化が可能となる。
[0417] That is, by using the electric wire of the present invention, a conventional product (comparative example) using a general-purpose polyurethane resin
Compared to this, it is possible to extend the life of the FBT and increase its output.

【0418】0418]

【発明の効果】本発明の絶縁電線は、電気特性、機械特
性及び化学特性を損なうことなく、耐熱性とハンダ付け
性の両立化を可能にしたものであり、トランス等の耐熱
性を要する電気機器に広く、作業性良く使用し得る効果
を有する。
[Effects of the Invention] The insulated wire of the present invention makes it possible to achieve both heat resistance and solderability without impairing electrical properties, mechanical properties, and chemical properties, and is suitable for electrical applications such as transformers that require heat resistance. It has an effect that can be used widely in equipment and has good workability.

【0419】また、本発明の絶縁塗料は、耐熱性と絶縁
性を必要とする皮膜として、各種の導体を被覆するのに
用いることができる。
Furthermore, the insulating paint of the present invention can be used to coat various conductors as a film that requires heat resistance and insulation.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明に係る絶縁電線の断面図である。FIG. 1 is a sectional view of an insulated wire according to the present invention.

【図2】カラ−TV用フライバックトランスの概略断面
図である。
FIG. 2 is a schematic cross-sectional view of a flyback transformer for color TV.

【図3】上記トランス断面図の高圧コイル部拡大図であ
る。
FIG. 3 is an enlarged view of a high-voltage coil portion in the sectional view of the transformer.

【符号の説明】[Explanation of symbols]

1…導体、2…絶縁皮膜、3…高圧巻線、4…高圧ボビ
ン、5…低圧巻線、6…低圧ボビン、7…充填剤、8…
収納ケ−ス、9…コア。
DESCRIPTION OF SYMBOLS 1... Conductor, 2... Insulating film, 3... High voltage winding, 4... High voltage bobbin, 5... Low voltage winding, 6... Low voltage bobbin, 7... Filler, 8...
Storage case, 9...core.

Claims (22)

【特許請求の範囲】[Claims] 【請求項1】一般式(化1) 【化1】 で示されるポリアミド酸を含む絶縁塗料を導体上に塗布
し、焼き付けてなる、ポリイミド樹脂皮膜を有するハン
ダ付け可能な絶縁電線。但し、上記一般式(化1)中、
Xはアルキレン基又はアルキレンフエニレン基、nは正
の整数であり、R1が一般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
1. A solderable insulated wire having a polyimide resin film, which is obtained by coating a conductor with an insulating paint containing a polyamic acid represented by the general formula (Chemical formula 1) and baking it. However, in the above general formula (Chemical formula 1),
X is an alkylene group or an alkylenephenylene group, n is a positive integer, and when R1 is a tetravalent organic group selected from the group consisting of general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項2】一般式(化6) 【化6】 で示されるヒドロキシルアミンと、一般式(化7)【化
7】 で示されるテトラカルボン酸二無水物と、一般式(化8
) 【化8】 で示されるジアミンとを、有機溶媒の存在下に反応させ
、一般式(化1) 【化1】 で示されるポリアミド酸を生成させた後、これを含む絶
縁塗料を導体上に塗布し、焼き付けて、上記一般式(化
1)中のアミド基とカルボキシル基とを分子内反応させ
てイミド化してポリイミド樹脂とすることを特徴とする
ハンダ付け可能な絶縁電線の製造方法。但し、上記一般
式(化6)、(化7)、(化8)及び(化1)中、Xは
アルキレン基又はアルキレンフエニレン基、nは正の整
数であり、R1が一般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)あり、R1が一般式
(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
[Claim 2] A hydroxylamine represented by the general formula (Chemical formula 6) [Chemical formula 6], a tetracarboxylic dianhydride represented by the general formula (Chemical formula 7) [Chemical formula 7], and a general formula (Chemical formula 8)
) A diamine represented by [Chemical formula 8] is reacted in the presence of an organic solvent to produce a polyamic acid represented by the general formula (Chemical formula 1) [Chemical formula 1], and then an insulating paint containing this is applied onto a conductor. A method for producing a solderable insulated wire, which comprises applying the polyimide resin to a polyimide resin, baking it, and causing an intramolecular reaction between the amide group and the carboxyl group in the general formula (Chemical formula 1) to imidize the polyimide resin. However, in the above general formulas (Chemical formula 6), (Chemical formula 7), (Chemical formula 8) and (Chemical formula 1), X is an alkylene group or an alkylenephenylene group, n is a positive integer, and R1 is 2) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 4) ) [Chemical 4] When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項3】絶縁塗料中に触媒量の第三級アミンを含む
ことを特徴とする請求項第2項記載のハンダ付け可能な
絶縁電線の製造方法。
3. The method for producing a solderable insulated wire according to claim 2, wherein the insulating paint contains a catalytic amount of tertiary amine.
【請求項4】一般式(化1) 【化1】 で示されるポリアミド酸を含む絶縁塗料。 但し、上記一般式(化1)中、Xはアルキレン基又はア
ルキレンフエニレン基、nは正の整数であり、R1は一
般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
4. An insulating paint containing a polyamic acid represented by the general formula (Chemical formula 1): [Chemical formula 1]. However, in the above general formula (Chemical formula 1), X is an alkylene group or an alkylenephenylene group, n is a positive integer, and R1 is a tetravalent group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2] When it is an organic group, R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項5】一般式(化1) 【化1】 で示されるポリアミド酸と、イソシアネ−ト又はブロッ
ク化イソシアネ−トを含む絶縁塗料を導体上に塗布し、
焼き付けてなる、イミド化ポリウレタン樹脂皮膜を有す
るハンダ付け可能な絶縁電線。 但し、上記一般式(化1)中、Xはアルキレン基又はア
ルキレンフエニレン基、nは正の整数であり、R1が一
般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
5. Applying an insulating paint containing a polyamic acid represented by the general formula (Chemical formula 1) [Chemical formula 1] and an isocyanate or a blocked isocyanate onto a conductor,
A solderable insulated wire with a baked imidized polyurethane resin film. However, in the above general formula (Chemical formula 1), X is an alkylene group or an alkylenephenylene group, n is a positive integer, and R1 is a tetravalent group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2] When it is an organic group, R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項6】一般式(化1) 【化1】 で示されるポリアミド酸と、イソシアネ−ト又はブロッ
ク化イソシアネ−トとを、上記ポリアミド酸の末端水酸
基1当量につきイソシアネ−ト基0.4〜2.0当量の
割合で配合してなる絶縁塗料を導体上に塗布し、焼き付
けることにより、上記ポリアミド酸のアミド基とカルボ
キシル基とが分子内反応してイミド化するとともに、末
端水酸基がイソシアネ−ト又はブロック化イソシアネ−
トと反応してイミド化ポリウレタン樹脂が生成すること
を特徴とするハンダ付け可能な絶縁電線の製造方法。 但し、上記一般式(化1)中、Xはアルキレン基又はア
ルキレンフエニレン基、nは正の整数であり、R1が一
般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
[Claim 6] A polyamic acid represented by the general formula (Chemical formula 1) [Chemical formula 1] and an isocyanate or a blocked isocyanate are used in an amount of 0.4 isocyanate groups per equivalent of the terminal hydroxyl group of the polyamic acid. By applying an insulating coating compounded at a ratio of ~2.0 equivalents onto a conductor and baking it, the amide group and carboxyl group of the polyamic acid react intramolecularly to imidize it, and the terminal hydroxyl group becomes an isocyanate. - or blocked isocyanate
A method for manufacturing a solderable insulated wire, characterized in that an imidized polyurethane resin is produced by reacting with a solderable insulated wire. However, in the above general formula (Chemical formula 1), X is an alkylene group or an alkylenephenylene group, n is a positive integer, and R1 is a tetravalent group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2] When it is an organic group, R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項7】絶縁塗料中に触媒量の第三級アミンを含む
ことを特徴とする請求項第6項記載のハンダ付け可能な
絶縁電線の製造方法。
7. The method for producing a solderable insulated wire according to claim 6, wherein the insulating paint contains a catalytic amount of tertiary amine.
【請求項8】一般式(化1) 【化1】 で示されるポリアミド酸と、イソシアネ−ト又はブロッ
ク化イソシアネ−トとを、上記ポリアミド酸の末端水酸
基1当量につきイソシアネ−ト基0.4〜2.0当量の
割合で配合してなる絶縁塗料。但し、上記一般式(化1
)中、Xはアルキレン基又はアルキレンフエニレン基、
nは正の整数であり、R1が一般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
[Claim 8] A polyamic acid represented by the general formula (Chemical formula 1) [Chemical formula 1] and an isocyanate or a blocked isocyanate are used in an amount of 0.4 isocyanate groups per equivalent of the terminal hydroxyl group of the polyamic acid. An insulating coating compounded at a ratio of ~2.0 equivalents. However, the above general formula (Chemical formula 1
), X is an alkylene group or an alkylenephenylene group,
n is a positive integer, and when R1 is a tetravalent organic group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項9】一般式(化9) 【化9】 で示されるポリイミドを含む絶縁塗料を導体上に塗布し
、焼き付けてなる、ポリイミド樹脂皮膜を有するハンダ
付け可能な絶縁電線。但し、上記一般式(化9)中、X
はアルキレン基又はアルキレンフエニレン基、nは正の
整数であり、R1が一般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
9. A solderable insulated wire having a polyimide resin film, which is obtained by coating a conductor with an insulating paint containing a polyimide represented by the general formula (Chemical Formula 9) and baking it. However, in the above general formula (Chemical formula 9), X
is an alkylene group or an alkylenephenylene group, n is a positive integer, and R1 is a tetravalent organic group selected from the group consisting of general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項10】一般式(化6) 【化6】 で示されるヒドロキシルアミンと、一般式(化7)【化
7】 で示されるテトラカルボン酸二無水物と、一般式(化8
) 【化8】 で示されるジアミンとを、有機溶媒の存在下に反応させ
、一般式(化9) 【化9】 で示されるポリイミドを生成させた後、これを含む絶縁
塗料を導体上に塗布し、焼き付けることを特徴とするハ
ンダ付け可能な絶縁電線の製造方法。但し、上記一般式
(化6)、(化7)、(化8)及び(化9)中、Xはア
ルキレン基又はアルキレンフエニレン基、nは正の整数
であり、R1が一般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
[Claim 10] A hydroxylamine represented by the general formula (Chemical formula 6) [Chemical formula 6], a tetracarboxylic dianhydride represented by the general formula (Chemical formula 7) [Chemical formula 7], and a general formula (Chemical formula 8)
) A diamine represented by [Chemical formula 8] is reacted in the presence of an organic solvent to produce a polyimide represented by the general formula (Chemical formula 9) [Chemical formula 9], and then an insulating paint containing this is applied onto a conductor. A method for manufacturing a solderable insulated wire, which comprises coating and baking. However, in the above general formulas (Chemical Formula 6), (Chemical Formula 7), (Chemical Formula 8) and (Chemical Formula 9), X is an alkylene group or an alkylenephenylene group, n is a positive integer, and R1 is 2) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項11】一般式(化9) 【化9】 で示されるポリイミドを含む絶縁塗料。但し、上記一般
式(化9)中、Xはアルキレン基又はアルキレンフエニ
レン基、nは正の整数であり、R1が一般式(化2)【
化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
[Claim 11] An insulating paint containing a polyimide represented by the general formula (Chemical formula 9) [Chemical formula 9]. However, in the above general formula (Chemical formula 9), X is an alkylene group or an alkylenephenylene group, n is a positive integer, and R1 is the general formula (Chemical formula 2) [
When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項12】一般式(化10) 【化10】 で示されるポリイミド樹脂皮膜を有するハンダ付け可能
な絶縁電線。但し、上記一般式(化10)中、nは正の
整数であり、R1が一般式(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
12. A solderable insulated wire having a polyimide resin film represented by the general formula (Chemical formula 10). However, in the above general formula (Chemical formula 10), n is a positive integer, and when R1 is a tetravalent organic group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項13】一般式(化7) 【化7】 で示されるテトラカルボン酸二無水物と、一般式(化8
) 【化8】 で示されるジアミンとを、有機溶媒の存在下に反応させ
、一般式(化11) 【化11】 で示されるポリアミド酸を生成させた後、これを含む絶
縁塗料を導体上に塗布し、焼き付けることにより、上記
一般式(化11)中のアミド基とカルボキシル基とを分
子内反応させてイミド化してポリイミド樹脂とすること
を特徴とするハンダ付け可能な絶縁電線の製造方法。但
し、上記一般式(化7)、(化8)及び(化11)中、
nは正の整数であり、R1が一般式(化2)【化2】 からなる群より選ばれる4価の有機基であるとき、R2
が一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
[Claim 13] A tetracarboxylic dianhydride represented by the general formula (Chemical formula 7) [Chemical formula 7] and a tetracarboxylic dianhydride represented by the general formula (Chemical formula 8)
) A diamine represented by [Chemical formula 8] is reacted in the presence of an organic solvent to produce a polyamic acid represented by the general formula (Chemical formula 11) [Chemical formula 11], and then an insulating paint containing this is applied onto a conductor. A method for manufacturing a solderable insulated wire, characterized in that the amide group and the carboxyl group in the general formula (Chemical formula 11) are intramolecularly reacted and imidized to form a polyimide resin by coating and baking the solderable insulated wire. . However, in the above general formulas (Chemical formula 7), (Chemical formula 8) and (Chemical formula 11),
n is a positive integer, and when R1 is a tetravalent organic group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項14】絶縁塗料が触媒量の第三級アミンを含む
ことを特徴とする請求項第13項記載のハンダ付け可能
な絶縁電線の製造方法。
14. The method of manufacturing a solderable insulated wire according to claim 13, wherein the insulating paint contains a catalytic amount of a tertiary amine.
【請求項15】一般式(化11) 【化11】 で示されるポリアミド酸を含む絶縁塗料。但し、上記一
般式(化11)中、nは正の整数であり、R1が一般式
(化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
15. An insulating paint containing a polyamic acid represented by the general formula (Chemical Formula 11): [Claim 15] However, in the above general formula (Chemical formula 11), n is a positive integer, and when R1 is a tetravalent organic group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項16】一般式(化10) 【化10】 で示されるポリイミドを含む絶縁塗料を導体上に塗布し
、焼き付けることを特徴とする上記一般式(化10)で
示されるポリイミド樹脂皮膜を有するハンダ付け可能な
絶縁電線の製造方法。但し、上記一般式(化10)中、
nは正の整数であり、R1が一般式(化2)【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
16. A polyimide resin film represented by the above general formula (Chemical formula 10), which is characterized in that an insulating paint containing a polyimide represented by the general formula (Chemical formula 10) [Chemical formula 10] is coated on a conductor and baked. A method of manufacturing a solderable insulated wire having the following methods. However, in the above general formula (Chemical formula 10),
n is a positive integer, and when R1 is a tetravalent organic group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項17】一般式(化7) 【化7】 で示されるテトラカルボン酸二無水物と、一般式(化8
) 【化8】 で示されるジアミンとを、有機溶媒の存在下に反応させ
、一般式(化11) 【化11】 で示されるポリアミド酸を生成させ、該ポリアミド酸を
イミド化して、一般式(化10) 【化10】 で示されるポリイミドを生成させた後、これを含む絶縁
塗料を導体上に塗布し、焼き付けることを特徴とするハ
ンダ付け可能な絶縁電線の製造方法。但し、上記一般式
(化7)、(化8)、(化11)及び(化11)中、n
は正の整数であり、R1が一般式(化2)【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
[Claim 17] A tetracarboxylic dianhydride represented by the general formula (Chemical formula 7) [Chemical formula 7] and a tetracarboxylic dianhydride represented by the general formula (Chemical formula 8)
) A diamine represented by [Chemical formula 8] is reacted in the presence of an organic solvent to produce a polyamic acid represented by the general formula (Chemical formula 11) [Chemical formula 11], and the polyamic acid is imidized to form the general formula (Chemical Formula 10) A method for producing a solderable insulated wire, which comprises producing a polyimide represented by the formula (Chemical Formula 10), and then applying an insulating paint containing the polyimide onto a conductor and baking it. However, in the above general formulas (Chemical Formula 7), (Chemical Formula 8), (Chemical Formula 11) and (Chemical Formula 11), n
is a positive integer, and when R1 is a tetravalent organic group selected from the group consisting of the general formula (Chemical formula 2) [Chemical formula 2], R2
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項18】一般式(化10) 【化10】 で示されるポリイミドを含む絶縁塗料。但し、上記一般
式(化10)中、nは正の整数であり、R1が一般式(
化2) 【化2】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化3) 【化3】 からなる群より選ばれる2価の有機基(hは2〜16の
整数、i及びjは2〜10の整数)であり、R1が一般
式(化4) 【化4】 からなる群より選ばれる4価の有機基であるとき、R2
は一般式(化5) 【化5】 からなる群より選ばれる2価の有機基(kは1〜10の
整数、l及びmは2〜10の整数)である。
18. An insulating paint containing a polyimide represented by the general formula (Chemical formula 10): [Claim 18] However, in the above general formula (Chemical formula 10), n is a positive integer, and R1 is the general formula (Chemical formula 10).
Chemical formula 2) [Chemical formula 2] When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of general formula (Chemical formula 3) [Chemical formula 3] (h is an integer of 2 to 16, i and j are integers of 2 to 10), and R1 is a general formula (Chemical formula 3) 4) When R2 is a tetravalent organic group selected from the group consisting of
is a divalent organic group selected from the group consisting of the general formula (Chemical formula 5) [Chemical formula 5] (k is an integer of 1 to 10, l and m are integers of 2 to 10).
【請求項19】Xが一般式(化12) 【化12】 からなる群より選ばれるアルキレン基又は一般式(化1
3) 【化13】 からなる群より選ばれるアルキレンフエニレン基である
請求項第1項、第5項又は第9項のいずれかに記載の絶
縁電線。
19. X is an alkylene group selected from the group consisting of general formula (Chemical formula 12) [Chemical formula 12] or general formula (Chemical formula 1)
3) The insulated wire according to claim 1, which is an alkylenephenylene group selected from the group consisting of:
【請求項20】Xが一般式(化12) 【化12】 からなる群より選ばれるアルキレン基又は一般式(化1
3) 【化13】 からなる群より選ばれるアルキレンフエニレン基である
請求項第2項、第3項、第6項、第7項又は第10項の
いずれかに記載の絶縁電線の製造方法。
20. X is an alkylene group selected from the group consisting of the general formula (Chemical formula 12) [Chemical formula 12] or the general formula (Chemical formula 1)
3) The method for producing an insulated wire according to any one of claims 2, 3, 6, 7, or 10, wherein the alkylenephenylene group is selected from the group consisting of: .
【請求項21】Xが一般式(化12) 【化12】 からなる群より選ばれるアルキレン基又は一般式(化1
3) 【化13】 からなる群より選ばれるアルキレンフエニレン基である
請求項第4項、第8項又は第11項のいずれかに記載の
絶縁塗料。
[Claim 21] X is an alkylene group selected from the group consisting of the general formula (Formula 12) [Chemical formula 12] or the general formula (Formula 1
3) The insulating paint according to claim 4, 8 or 11, which is an alkylenephenylene group selected from the group consisting of:
【請求項22】請求項第1項、第5項、第9項又は第1
2項に記載の絶縁電線を用いることを特徴とするフライ
バックトランス。
Claim 22: Claim 1, 5, 9 or 1
A flyback transformer characterized by using the insulated wire according to item 2.
JP3062316A 1990-03-27 1991-03-27 Insulating paint, solderable insulated wire, manufacture of the insulated wire, and flyback transformer using the insulated wire Pending JPH04212206A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3062316A JPH04212206A (en) 1990-03-27 1991-03-27 Insulating paint, solderable insulated wire, manufacture of the insulated wire, and flyback transformer using the insulated wire

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2-77309 1990-03-27
JP7730990 1990-03-27
JP2-96428 1990-04-13
JP2-233254 1990-09-05
JP23325490 1990-09-05
JP2-252547 1990-09-20
JP25254790 1990-09-20
JP3062316A JPH04212206A (en) 1990-03-27 1991-03-27 Insulating paint, solderable insulated wire, manufacture of the insulated wire, and flyback transformer using the insulated wire

Publications (1)

Publication Number Publication Date
JPH04212206A true JPH04212206A (en) 1992-08-03

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0532779A (en) * 1990-11-27 1993-02-09 Nkk Corp Polyimide resin having naphthalene skeleton
WO1995004100A1 (en) * 1993-08-03 1995-02-09 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide polymer, thermoplastic polyimide film, polyimide laminate, and process for producing the laminate
JP2006104462A (en) * 2004-09-10 2006-04-20 Ube Ind Ltd Modified polyimide resin including polybutadiene, its composition and cured insulating film
WO2006120954A1 (en) * 2005-05-09 2006-11-16 Tokyo Institute Of Technology Fluorescent material
JP2010534651A (en) * 2007-07-26 2010-11-11 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン Alcohols containing imide moieties and reactive oligomers produced therefrom
JP2011052220A (en) * 2004-09-10 2011-03-17 Ube Industries Ltd Modified polyimide resin containing polybutadiene,and composition and cured insulating film of the same
CN102276562A (en) * 2011-05-28 2011-12-14 南昌大学 1,2,2-trimethyl cyclopentyl alicyclic structure-containing dianhydride and preparation method thereof
JP2014177642A (en) * 2008-07-22 2014-09-25 Kaneka Corp Novel polyimide precursor composition and use of the same
JPWO2016129546A1 (en) * 2015-02-10 2017-12-14 日産化学工業株式会社 Release layer forming composition

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0532779A (en) * 1990-11-27 1993-02-09 Nkk Corp Polyimide resin having naphthalene skeleton
WO1995004100A1 (en) * 1993-08-03 1995-02-09 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide polymer, thermoplastic polyimide film, polyimide laminate, and process for producing the laminate
US5621068A (en) * 1993-08-03 1997-04-15 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide polymer; thermoplastic polyimide film; polyimide laminate; and method of manufacturing the laminate
KR100326655B1 (en) * 1993-08-03 2002-06-29 후루타 다케시 Polyimide laminate used for a carbay film or a base film for FPC production and a method for producing the laminate
CN1088074C (en) * 1993-08-03 2002-07-24 钟渊化学工业株式会社 Thermoplastic polyimide polymer, thermoplastic polyimide film, polyimide laminate, and process for producing the laminate
JP2011052220A (en) * 2004-09-10 2011-03-17 Ube Industries Ltd Modified polyimide resin containing polybutadiene,and composition and cured insulating film of the same
JP2006104462A (en) * 2004-09-10 2006-04-20 Ube Ind Ltd Modified polyimide resin including polybutadiene, its composition and cured insulating film
WO2006120954A1 (en) * 2005-05-09 2006-11-16 Tokyo Institute Of Technology Fluorescent material
JP2010534651A (en) * 2007-07-26 2010-11-11 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン Alcohols containing imide moieties and reactive oligomers produced therefrom
JP2014177642A (en) * 2008-07-22 2014-09-25 Kaneka Corp Novel polyimide precursor composition and use of the same
US9267004B2 (en) 2008-07-22 2016-02-23 Kaneka Corporation Polyimide precursor composition and use thereof
CN102276562A (en) * 2011-05-28 2011-12-14 南昌大学 1,2,2-trimethyl cyclopentyl alicyclic structure-containing dianhydride and preparation method thereof
JPWO2016129546A1 (en) * 2015-02-10 2017-12-14 日産化学工業株式会社 Release layer forming composition

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