JPH04206238A - Hot-cathode hollow cathode ion source - Google Patents
Hot-cathode hollow cathode ion sourceInfo
- Publication number
- JPH04206238A JPH04206238A JP2329065A JP32906590A JPH04206238A JP H04206238 A JPH04206238 A JP H04206238A JP 2329065 A JP2329065 A JP 2329065A JP 32906590 A JP32906590 A JP 32906590A JP H04206238 A JPH04206238 A JP H04206238A
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- filament
- cathode
- heater
- hot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000013022 venting Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000007872 degassing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、静電型加速器用熱陰極ホロ−カソードイオン
源の構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the structure of a hot cathode holo-cathode ion source for an electrostatic accelerator.
従来の熱陰極ホロ−カソードイオン源は、フィラメント
とアノード、フィラメント−アノードに電圧を掛けるた
めの電源とハウジングから構成されている（Ｓｏ−５５
形イオン源取扱説明書１９８１年５月（株）日新ハイボ
ルテージ）。A conventional hot cathode holo-cathode ion source consists of a filament, an anode, a power supply for applying a voltage to the filament-anode, and a housing (So-55
Type ion source instruction manual (May 1981, Nissin High Voltage Co., Ltd.).
従来のイオン源では、まず、イオン源室内を高真空（６
Ｘ １０ ”−’ｔｏｒｒ以下）状態にする。それから
。In a conventional ion source, first, the ion source chamber is placed in a high vacuum (6
X 10 ''-'torr or less). Then.
フィラメントに約２０アンペア通電することによりフィ
ラメントを１５００℃以上に加熱する。フィラメントの
加熱で、フィラメント以外のイオン源部とイオン源室壁
を約２ｏｏ℃まで加熱する。The filament is heated to over 1500° C. by passing a current of about 20 amperes through the filament. By heating the filament, the ion source part other than the filament and the wall of the ion source chamber are heated to about 20°C.
それにより、イオン源（フィラメントを含む）とイオン
源室壁のガス出しを行う、ガス出しを行う場合、急激な
ガス放出を防ぐために、フィラメント電流を１０分に２
アンペアずつ段階的に２０アンペアまで増加させる方法
を採るが、これでも真空度は６ Ｘ １０−”ｔｏｒｒ
以上に息下する。真空が悪い状態でのフィラメントの高
温化は、フィラメント寿命を短かくする。ガス出し終了
後には真空度は４×１０″″’ ｔｏｒｒ以下に回復す
る。As a result, the ion source (including the filament) and the ion source chamber wall are degassed. When degassing, the filament current is reduced every 10 minutes to prevent sudden gas release.
The method is to increase the ampere step by step up to 20 amperes, but even with this the vacuum level is 6 x 10-”torr.
Take a deep breath. High temperature of the filament under poor vacuum conditions will shorten the filament life. After the gas release is completed, the degree of vacuum is restored to 4×10''' torr or less.
上記従来技術は、真空度の悪い状態でフィラメントを高
温にする点についての考慮がされていないため、フィラ
メント寿命短縮の問題があった。The above-mentioned prior art does not take into consideration the fact that the filament is heated to a high temperature in a poor vacuum state, and therefore has the problem of shortening the life of the filament.
本発明の目的は、フィラメント寿命を延ばすことにある
。The purpose of the invention is to extend filament life.
上記目的を達成するために、本発明は、熱陰極ホロ−カ
ソードイオン源に、イオン源及びイオン源室内を十分ガ
ス出しするための加熱ヒータを取り付けたものである。In order to achieve the above object, the present invention is a hot-cathode holo-cathode ion source equipped with a heater for sufficiently venting gas from inside the ion source and the ion source chamber.
熱陰極ホロ−カソードイオン源に取り付けたヒータは、
イオン源及びイオン源室を加熱し、ガス出しできるよう
に動作する。The heater attached to the hot cathode holo-cathode ion source is
It operates to heat the ion source and ion source chamber and vent gas.
以下、本発明の一実施例を第１図により説明する。この
実施例はフィラメント１．ヒータ２．アノード３．イオ
ン源ハウジング４により構成された熱陰極ホロ−カソー
ドイオン源である。An embodiment of the present invention will be described below with reference to FIG. This example uses filament 1. Heater 2. Anode 3. It is a hot cathode holo-cathode ion source constituted by an ion source housing 4.
イオン源室５内をＩ Ｘ １０”−’ｔｏｒｒまで真空
ポンプ６を用いて真空引きする。以後、真空ポンプ６は
稼動し続ける。真空度がＩ Ｘ １０−’ｔｏｒｒにな
ればヒータ２を加熱させる。なお、本ヒータ２はイオン
源及びイオン源室Ｓ壁の十分なガス出しする能力を持つ
、ヒータ２の加熱により、イオン源及びイオン源室５壁
をガス出しできる最低温度まで上昇させる。ガス出し終
了後フィラメント１に通電する。The inside of the ion source chamber 5 is evacuated to I x 10"-'torr using the vacuum pump 6. From then on, the vacuum pump 6 continues to operate. When the degree of vacuum reaches I x 10"-'torr, the heater 2 is heated. Note that this heater 2 has the ability to sufficiently vent gas from the ion source and the wall of the ion source chamber S. By heating the heater 2, the temperature of the ion source and the wall of the ion source chamber 5 is raised to the lowest temperature at which gas can be vented. After the gas is released, the filament 1 is energized.
本実施例によれば、真空度の悪い状態、すなわち、ガス
出し中のフィラメント１の温度を、従来のイオン源と比
較して数百度低下させることができ、フィラメント１の
寿命を延ばす効果がある。According to this embodiment, the temperature of the filament 1 in a poor vacuum state, that is, during gas release, can be lowered by several hundred degrees compared to a conventional ion source, which has the effect of extending the life of the filament 1. .
本発明によれば、イオン源及びイオン源室壁加熱用ヒー
タの設置により、ガス出し中のフィラメント温度は上昇
しないのでフィラメントを延命させることができる６According to the present invention, by installing the ion source and the heater for heating the wall of the ion source chamber, the filament temperature does not rise during degassing, so the life of the filament can be extended6.
第１図は本発明の一実施例の熱陰極ホロ−カソードイオ
ン源とイオン源室の縦断面図（ａ）とイオン源の正面図
（ｂ）である。FIG. 1 is a longitudinal sectional view (a) of a hot cathode holo-cathode ion source and an ion source chamber and a front view (b) of the ion source according to an embodiment of the present invention.
Claims (1)
電圧を掛けるための電源とハウジングから構成されてい
る熱陰極ホロ−カソードイオン源において、 イオン源とイオン源室壁を十分加熱できるヒータを設け
たことを特徴とする熱陰極ホロ−カソードイオン源。[Claims] 1. In a hot cathode holo-cathode ion source consisting of a filament, a cathode, a power source for applying voltage between the cathode and the anode, and a housing, the ion source and the ion source chamber wall can be sufficiently heated. A hot cathode holo-cathode ion source characterized by being equipped with a heater.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2329065A JPH04206238A (en) | 1990-11-30 | 1990-11-30 | Hot-cathode hollow cathode ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2329065A JPH04206238A (en) | 1990-11-30 | 1990-11-30 | Hot-cathode hollow cathode ion source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04206238A true JPH04206238A (en) | 1992-07-28 |
Family
ID=18217222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2329065A Pending JPH04206238A (en) | 1990-11-30 | 1990-11-30 | Hot-cathode hollow cathode ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04206238A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007242521A (en) * | 2006-03-10 | 2007-09-20 | Mitsui Eng & Shipbuild Co Ltd | Exchanging method of ion source |
-
1990
- 1990-11-30 JP JP2329065A patent/JPH04206238A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007242521A (en) * | 2006-03-10 | 2007-09-20 | Mitsui Eng & Shipbuild Co Ltd | Exchanging method of ion source |
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