JPH04205806A - Thin-film magnetic head - Google Patents

Thin-film magnetic head

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Publication number
JPH04205806A
JPH04205806A JP32940890A JP32940890A JPH04205806A JP H04205806 A JPH04205806 A JP H04205806A JP 32940890 A JP32940890 A JP 32940890A JP 32940890 A JP32940890 A JP 32940890A JP H04205806 A JPH04205806 A JP H04205806A
Authority
JP
Japan
Prior art keywords
layer
magnetic
lower magnetic
magnetic layer
gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32940890A
Other languages
Japanese (ja)
Inventor
Masakatsu Saito
正勝 斎藤
Hiroyuki Nagatomo
浩之 長友
Yuko Shibayama
優子 柴山
Yoshitsugu Miura
義從 三浦
Shigeo Aoki
青木 茂夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP32940890A priority Critical patent/JPH04205806A/en
Publication of JPH04205806A publication Critical patent/JPH04205806A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enable increase in magnetic reluctance at a connection part of a gap formation part and upper/lower magnetic layers to be restricted by bending an interlayer insulation layer at the gap formation part and the upper/lower magnetic layer connection part in a direction which is vertical to a plane of the gap formation part and the upper/lower magnetic layer connection part and by terminating one edge of the interlayer insulation layer at the plane. CONSTITUTION:An interlayer insulation layer 21 has one edge on a gap surface at a front core part, is extended in vertical direction to the gap surface from here, and is formed so that the interlayer insulation layer formation surface is twisted near a rear edge of the front core part and is nearly in parallel direction to the gap surface at the rear core part. Further, the interlayer insulation layer 21 is bent in vertical direction again toward a connection surface at an upper/lower magnetic layer connection part and is formed to be terminated at the connection part. On the other hand, an upper magnetic layer 6 is in double structure similarly and a width in track width direction is regulated by a width of a through-hole which is provided at a coil insulation layer 5 at the front core part, thus obtaining a multilayer structure of the upper/lower magnetic layers 6 and 2 without increasing magnetic reluctance.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はVTRなどの磁気記録再生装置に使用する薄膜
磁気ヘッドに係り、特に上、下部磁性層の多層化に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head used in a magnetic recording/reproducing device such as a VTR, and particularly to multilayering of upper and lower magnetic layers.

〔従来の技術〕[Conventional technology]

強磁性金属粉を用いた高抗磁力媒体等とFe−AQ−3
i系やCo−Nb−Zr系等薄膜コアを有する薄膜磁気
ヘッドとの組み合わせにより、磁気記録の高密度化が進
められている。しかし、このような金属コアをもつ薄膜
磁気ヘッドは高周波領域においては、渦電流損により実
効透磁率が低下し、ヘッド効率が低下するという問題が
ある。
High coercive force media using ferromagnetic metal powder and Fe-AQ-3
High-density magnetic recording is progressing through combination with thin film magnetic heads having thin film cores such as i-based and Co--Nb--Zr based. However, such a thin film magnetic head having a metal core has a problem in that the effective magnetic permeability decreases due to eddy current loss in a high frequency region, resulting in a decrease in head efficiency.

これを解決する手法として、軟磁性薄膜と5i−02膜
等の層間絶縁膜とを交互に積層した多層磁気コア構造が
提案されている。
As a method to solve this problem, a multilayer magnetic core structure in which soft magnetic thin films and interlayer insulating films such as 5i-02 films are alternately laminated has been proposed.

その従来の薄膜磁気ヘッドの例としで、第5図(8)、
 (b)に示すように特開昭62’−103814号公
報に記載のものがある。
As an example of the conventional thin film magnetic head, Fig. 5 (8),
As shown in (b), there is a method described in JP-A-62'-103814.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術はギャップ形成部および上下磁性層の接続
部において、上記層間絶縁膜か磁束の流れに対して交差
して形成されており、この領域の磁気抵抗が大きくなる
ため再生効率を低下させるという問題があった。
In the above conventional technology, the interlayer insulating film is formed to cross the flow of magnetic flux at the gap forming part and the connection part between the upper and lower magnetic layers, and the magnetic resistance in this area increases, which reduces the reproduction efficiency. There was a problem.

本発明の目的は、ギャップ形成部および上下磁性層の接
続部での磁気抵抗を増加させない上下磁性層の多層構造
およびその製法を提供することにある。
An object of the present invention is to provide a multilayer structure of upper and lower magnetic layers that does not increase magnetic resistance at a gap forming portion and a connecting portion between upper and lower magnetic layers, and a method for manufacturing the same.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するために、ギャップ形成部および上下
磁性層接続部における層間絶縁層をギャップ形成部およ
び上下磁性層接続部の平面と垂直方向に曲げ、かつ、層
間絶縁層の一端が該平面で終端するようにしたものであ
る。
In order to achieve the above object, the interlayer insulating layer in the gap forming part and the upper and lower magnetic layer connecting parts is bent in a direction perpendicular to the plane of the gap forming part and the upper and lower magnetic layer connecting parts, and one end of the interlayer insulating layer is bent in the plane of the gap forming part and the upper and lower magnetic layer connecting parts. It is designed to terminate.

〔作用〕[Effect]

このような層間絶縁膜の構造により、磁束が層間絶縁膜
とはとんと交差する二とがなくなるため、磁気抵抗の増
加、すなわち効率低下を防ぐことができる。
Such a structure of the interlayer insulating film eliminates the possibility that the magnetic flux crosses the interlayer insulating film, thereby preventing an increase in magnetic resistance, that is, a decrease in efficiency.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1図〜第4図により説明す
る。第1図(a)は摺動面の正面図、(b)は(d)図
のB−B’線断面図て、第2図は第1図の下部磁性層の
作製方法、また第3図第4図は第1図の上部磁性層の作
成方法を示す工程図である。
An embodiment of the present invention will be described below with reference to FIGS. 1 to 4. FIG. 1(a) is a front view of the sliding surface, FIG. 2(b) is a sectional view taken along the line B-B' in FIG. FIG. 4 is a process diagram showing a method for producing the upper magnetic layer of FIG. 1.

1は非磁性基板、2は下部磁性層、21は下部磁性層の
層間絶縁層、3は非磁性層絶縁材からなる下部磁性層2
の埋込み材、4はギャップ材、5はコイル導体9の絶縁
層、7は保護膜、8は保護板である。下部磁性層2は2
層膜からなる多層構造で非磁性基板1に形成した溝内に
おいて、所望の形状にパターニング後非磁性絶縁材の埋
込み材3て平坦化されている。
1 is a nonmagnetic substrate, 2 is a lower magnetic layer, 21 is an interlayer insulating layer of the lower magnetic layer, and 3 is a lower magnetic layer 2 made of a nonmagnetic layer insulating material.
4 is a gap material, 5 is an insulating layer of the coil conductor 9, 7 is a protective film, and 8 is a protective plate. The lower magnetic layer 2 is 2
A groove formed in a nonmagnetic substrate 1 with a multilayer structure made of layers is patterned into a desired shape and then flattened with a filling material 3 made of a nonmagnetic insulating material.

層間絶縁層21は第1図(a)、 (b)よりフロント
コア部では、ギャップ面に一端を有し、ここからギャッ
プ面と垂直方向に伸び、フロントコア部後端近傍で、層
間絶縁層形成面がねしれてリアコア部でギャップ面と略
平行方向になるように形成されている。
As shown in FIGS. 1(a) and 1(b), the interlayer insulating layer 21 has one end on the gap surface in the front core section, extends from there in a direction perpendicular to the gap surface, and near the rear end of the front core section, the interlayer insulating layer 21 has one end on the gap surface. The forming surface is twisted so as to be substantially parallel to the gap surface at the rear core portion.

さらに、同図(b)に示したように、層間絶縁層21は
上下磁性層接続部では、接続面に向って再び垂直方向に
曲がり、該接続部で終端するように形成されている。
Furthermore, as shown in FIG. 2B, the interlayer insulating layer 21 is formed so as to bend again perpendicularly toward the connecting surface at the upper and lower magnetic layer connecting portion, and to terminate at the connecting portion.

一方、上部磁性層6は同じく2層構造で、フロントコア
部ではトラック幅方向の幅ををコイル絶縁層5に設けた
スルーホールの幅で規制されている。上部磁性層6の層
間絶縁層61は下部磁性層2の場合と全く同様に形成さ
れている。すなわち、フロントコア部ではギャップ面に
端を発しギャップ面と垂直方向に伸びて形成され、リニ
ア部ではギャップ面と略平行方向になり、さらに上下磁
性層接続部では再び接続面に対して垂直方向に曲がり、
該接続面で終端する。
On the other hand, the upper magnetic layer 6 similarly has a two-layer structure, and the width in the track width direction of the front core portion is regulated by the width of a through hole provided in the coil insulating layer 5. The interlayer insulating layer 61 of the upper magnetic layer 6 is formed in exactly the same way as the lower magnetic layer 2. In other words, in the front core part, it starts from the gap plane and extends in a direction perpendicular to the gap plane, in the linear part, it extends in a direction almost parallel to the gap plane, and furthermore, in the upper and lower magnetic layer connection parts, it starts in a direction perpendicular to the connection plane. turn to,
It terminates at the connection surface.

このように上下磁性層6.2は、層間絶縁層ム1.21
によって、フロ、ントコア部てはギャップ面に対して、
垂直方向に磁気コアを分断され、また、リアコア部では
磁性層の積層方向に磁気コアを分断され、上下磁性層接
続部ではフロントコア部同様に接続面に対して垂直方向
に磁気コアを分断される構造となっており、流れる磁束
はフロントコア部および上下磁性層接続部においてもほ
とんど層間絶縁層21.61と交差することがないため
、この部分の磁気抵抗を増加させることがない。すなわ
ち、磁気コアの多層化の効果を最大限活かしきれる。
In this way, the upper and lower magnetic layers 6.2 have an interlayer insulating layer 1.21.
Accordingly, the front core part is relative to the gap surface.
The magnetic core is divided in the vertical direction, and in the rear core part, the magnetic core is divided in the stacking direction of the magnetic layers, and in the upper and lower magnetic layer connection part, the magnetic core is divided in the direction perpendicular to the connecting surface, as in the front core part. Since the flowing magnetic flux hardly crosses the interlayer insulating layer 21.61 even in the front core portion and the upper and lower magnetic layer connection portions, the magnetic resistance in these portions does not increase. In other words, the effect of multilayering the magnetic core can be fully utilized.

さらに、第1図(a)から明らかなように、上下磁性層
の端部がギャップ面と非平行になっていることからコン
タ−効果も低減できている。
Furthermore, as is clear from FIG. 1(a), since the ends of the upper and lower magnetic layers are non-parallel to the gap plane, the contour effect can also be reduced.

次に第2図〜第4図により、本実施例の作製方法につい
て説明する。
Next, the manufacturing method of this example will be explained with reference to FIGS. 2 to 4.

第2図は下部磁性層2の作製方法を工程順に示したもの
である。図にしたがって説明する。
FIG. 2 shows the method for manufacturing the lower magnetic layer 2 in the order of steps. This will be explained according to the diagram.

(a)非磁性基板1にイオンエツチング法により下部磁
性層を埋め込むための溝10を形成する。この時、ヒー
ム入射角を適正に選ぶことによってフロントコア相当部
10′の溝底面は基板面と非平行にする。
(a) A groove 10 for burying a lower magnetic layer is formed in the nonmagnetic substrate 1 by ion etching. At this time, by appropriately selecting the beam incidence angle, the groove bottom surface of the front core equivalent portion 10' is made non-parallel to the substrate surface.

(b)スパッタリング法により磁性層、層間絶層および
磁性層の多層膜を成膜、基板表面まで研磨することによ
って、非磁性基板1に埋込まれた下部磁性層2を作る。
(b) The lower magnetic layer 2 embedded in the non-magnetic substrate 1 is created by forming a multilayer film of a magnetic layer, an interlayer dielectric layer, and a magnetic layer by sputtering and polishing it to the substrate surface.

(C)埋め込まれた下部磁性層2のフロントコア相当部
2′をイオンエツチングでトランク幅Twとなるように
加工する。この時、非磁性基板の溝に埋込まれた下部磁
性層のフロントコア相当部2′の中心からトランク幅方
向のいずれか一方に片寄った位置に最終フロントコア部
がくるようにする(この片寄った分だけ、あらかじめフ
ロントコア相当部2′用の溝部10′をずらしておく)
(C) The part 2' of the buried lower magnetic layer 2 corresponding to the front core is processed by ion etching so that it has the trunk width Tw. At this time, make sure that the final front core section is located at a position offset to either side in the trunk width direction from the center of the front core equivalent section 2' of the lower magnetic layer embedded in the groove of the non-magnetic substrate. Shift the groove 10' for the front core equivalent part 2' in advance by that amount.)
.

(d)スパッタリングにより非磁性絶縁材3を形成後、
再度研摩により基板表面まで削り、平坦化する。
(d) After forming the nonmagnetic insulating material 3 by sputtering,
The substrate surface is polished again to make it flat.

このようにして作った下部磁性層2の上にコイル導体9
を絶縁層5て絶縁して形成し、ギャップ形成部と上下磁
性層接続部のコイル絶縁層にスルーホールを形成する。
A coil conductor 9 is placed on the lower magnetic layer 2 made in this way.
are insulated by an insulating layer 5, and through holes are formed in the coil insulating layer at the gap forming part and the upper and lower magnetic layer connecting parts.

以下ギャップ材4を成膜した後、第3図、第4図の方法
により上部磁性層6を作製する。
After forming the gap material 4, the upper magnetic layer 6 is manufactured by the method shown in FIGS. 3 and 4.

第3図は第2図(b)のc−c’線断面に相当する上部
磁性層のフロントコア部の断面図で示した工程図である
FIG. 3 is a process diagram showing a cross-sectional view of the front core portion of the upper magnetic layer corresponding to the cross section taken along the line c-c' in FIG. 2(b).

(a)高耐熱性高分子材料であるポリイシド系樹脂から
なるリフトオフ用のパターン11をスルーホールのほぼ
中央に一端がくるように形成する。2の時、選択化が充
分とれる金属をマスク材として02ガスによる反応性イ
オンエツチングをもちいてパターニングすることによっ
て、略垂直なパターン端にした方が後でリフトオフしや
すい。
(a) A lift-off pattern 11 made of polyide resin, which is a highly heat-resistant polymeric material, is formed so that one end is located approximately at the center of the through hole. In case 2, it is easier to lift off later if patterning is performed using reactive ion etching using 02 gas using a metal with sufficient selectivity as a mask material to form substantially vertical pattern edges.

(b)第1の上部磁性層6′をスパッタリングにより形
成する。
(b) Forming the first upper magnetic layer 6' by sputtering.

(c)磁性膜の湿式エツチング液によりライトエツチン
グを行い、第1上磁性層6′の密層の低い部分を除去後
、層間絶縁層61をスパッタリングで形成する。
(c) Light etching is performed using a magnetic film wet etching solution to remove the low dense layer portion of the first upper magnetic layer 6', and then the interlayer insulating layer 61 is formed by sputtering.

(d)ポリイシド系を湿式エッチャントで除去し、不要
な第1上部磁性層も同様に除去する。
(d) The polyamide system is removed using a wet etchant, and the unnecessary first upper magnetic layer is also removed in the same manner.

(e)第2上部磁性層6“を成膜する。(e) A second upper magnetic layer 6'' is formed.

(f)第1、第2上部磁性層6′、6“をイオンエツチ
ング法により所望の形状にパターニングする。
(f) The first and second upper magnetic layers 6', 6'' are patterned into a desired shape by ion etching.

このようにしてフロントコア部はできる。次に上下磁性
層接続部での上部磁性層の製法について第4図により説
明する。上記説明より、ポリイシド系樹脂からなるリフ
トオフ用パターン11′をスルーホールの中央に配置し
、以下第3図の工程にしたがえば、第1図に示した上下
磁性層の接続部における上部磁性層の形状を作ることが
できる。
In this way, the front core part is created. Next, a method for manufacturing the upper magnetic layer at the upper and lower magnetic layer connecting portion will be explained with reference to FIG. According to the above explanation, if the lift-off pattern 11' made of polyide resin is placed in the center of the through hole and the steps shown in FIG. 3 are followed, the upper magnetic layer at the connection part of the upper and lower magnetic layers shown in FIG. You can create the shape of

次に本発明になる多層磁性層の他の実施例を第5図に示
す。この例では上部磁性層はリフトオフ用パターン11
をスルーホール中央に配置することで作ることができる
。流れる磁束をギャップ部に効率より集中させることが
できる。
Next, another embodiment of the multilayer magnetic layer according to the present invention is shown in FIG. In this example, the upper magnetic layer has a lift-off pattern 11.
It can be made by placing the through hole in the center. The flowing magnetic flux can be more efficiently concentrated in the gap portion.

以上の実施例ではコイル絶縁層5が摺動面に露出する(
コイル絶縁膜5に形成したスルーホールによって上部磁
性層6の幅(形)を制限している)。構造で示したが、
コイル絶縁層5が露出しない例も当然考えられる。また
、上下磁性層は2層の例を示したが、3層以上も可能な
ことはいうまでもない。また、下部磁性層2の代りにフ
ェライトなどの絶縁性磁性基板を用い、上部磁性層6だ
けを本発明の構造とした場合でも同様な効果は得られる
In the above embodiments, the coil insulating layer 5 is exposed on the sliding surface (
The width (shape) of the upper magnetic layer 6 is limited by the through hole formed in the coil insulating film 5). As shown in the structure,
Naturally, an example in which the coil insulating layer 5 is not exposed is also conceivable. Further, although an example has been shown in which the upper and lower magnetic layers are two layers, it goes without saying that three or more layers are also possible. Further, the same effect can be obtained even when an insulating magnetic substrate such as ferrite is used instead of the lower magnetic layer 2 and only the upper magnetic layer 6 has the structure of the present invention.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、ギャップ形成部および上下磁性層の接
続部の磁気抵抗を増加させることなく、上下磁性層の多
層構造を実現できる。
According to the present invention, a multilayer structure of upper and lower magnetic layers can be realized without increasing the magnetic resistance of the gap forming part and the connection part of the upper and lower magnetic layers.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)は本発明の第1実施例の摺動面の正面図、
第1図(b)は第1図(a)のB−B’線断面図、第2
図は本発明の下部磁性層の製法を示す工程図、第3図お
よび第4図は本発明の上部磁性層の製法を示す工程図、
第5図は本発明の繭2の実施例の第1図(a)相当図、
第6図(a)(b)は従来の薄膜磁気ヘッドでそれぞれ
第1図(a)、 (b)に相当する図でおる。 符号の説明 1・・非磁性基板、2 下部磁性層、21.61層間絶
縁層、3 非磁性絶縁層、4・・ギャップ材、5・コイ
ル導体の絶縁層、9・コイル導体、6上部磁性層、7・
保護膜、8・・保護板、10 ・下部磁性層用埋込み溝
、11.11′ ・・リフトオフ用パターン $  f  []  ((1) B   − ■ 1−、s″ 隼 2 目 $3  図 第 4 団 隼 5 ロ 第 乙 1 LA・ t59
FIG. 1(a) is a front view of the sliding surface of the first embodiment of the present invention;
Figure 1(b) is a sectional view taken along line B-B' of Figure 1(a),
The figure is a process diagram showing the manufacturing method of the lower magnetic layer of the present invention, FIGS. 3 and 4 are process diagrams showing the manufacturing method of the upper magnetic layer of the invention,
FIG. 5 is a diagram corresponding to FIG. 1(a) of an embodiment of the cocoon 2 of the present invention,
FIGS. 6(a) and 6(b) show a conventional thin film magnetic head corresponding to FIGS. 1(a) and 1(b), respectively. Explanation of symbols 1: Nonmagnetic substrate, 2: Lower magnetic layer, 21.61 Interlayer insulating layer, 3: Nonmagnetic insulating layer, 4: Gap material, 5: Insulating layer of coil conductor, 9: Coil conductor, 6: Upper magnetic layer layer, 7.
Protective film, 8... Protective plate, 10 - Buried groove for lower magnetic layer, 11.11'... Lift-off pattern $ f [] ((1) B - ■ 1-, s'' Hayabusa 2 eyes $ 3 Figure 4 Dan Hayabusa 5 Lo No. Otsu 1 LA・t59

Claims (1)

【特許請求の範囲】 1、非磁性基板上に下部磁性層、ギャップ材、コイル導
体層、上部磁性層等の薄膜を所定形状に積層してなる薄
膜磁気ヘッドにおいて、 上記上下磁性層が、層間絶縁層を介して2層以上の多層
膜で構成され、該多層膜は、すくなくともギャップ形成
部において、磁束の流れる方向と略同方向で、かつ、ギ
ャップ面と略垂直な方向に上記層間絶縁層によって多層
膜構造に分断されていることを特徴とする薄膜磁気ヘッ
ド。 2、請求項1項記載の薄膜磁気ヘッドにおいて、前記多
層膜は前記上部磁性層と下部磁性層の接続部において、
磁束の流れる方向と略同方向で、かつ上下磁性層接続面
に略垂直な方向に前記層間絶縁層によつて多層膜構造に
分断されていることを特徴とする薄膜磁気ヘッド。 3、請求項1または2項記載の薄膜磁気ヘッドにおいて
、前記下部磁性層をフェライトなどの絶縁性磁性基板と
したことを特徴とする薄膜磁気ヘッド。
[Claims] 1. A thin film magnetic head in which thin films such as a lower magnetic layer, a gap material, a coil conductor layer, and an upper magnetic layer are laminated in a predetermined shape on a non-magnetic substrate, wherein the upper and lower magnetic layers have an interlayer The multilayer film is composed of two or more layers with an insulating layer in between, and the multilayer film includes the interlayer insulating layer at least in the gap forming portion in substantially the same direction as the direction in which the magnetic flux flows and in a direction substantially perpendicular to the gap surface. A thin film magnetic head characterized by being divided into a multilayer film structure by. 2. The thin film magnetic head according to claim 1, wherein the multilayer film includes, at a connection portion between the upper magnetic layer and the lower magnetic layer,
A thin film magnetic head characterized in that the thin film magnetic head is divided into a multilayer film structure by the interlayer insulating layer in substantially the same direction as the direction in which magnetic flux flows and in a direction substantially perpendicular to the connection plane between the upper and lower magnetic layers. 3. A thin film magnetic head according to claim 1 or 2, wherein the lower magnetic layer is an insulating magnetic substrate such as ferrite.
JP32940890A 1990-11-30 1990-11-30 Thin-film magnetic head Pending JPH04205806A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32940890A JPH04205806A (en) 1990-11-30 1990-11-30 Thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32940890A JPH04205806A (en) 1990-11-30 1990-11-30 Thin-film magnetic head

Publications (1)

Publication Number Publication Date
JPH04205806A true JPH04205806A (en) 1992-07-28

Family

ID=18221086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32940890A Pending JPH04205806A (en) 1990-11-30 1990-11-30 Thin-film magnetic head

Country Status (1)

Country Link
JP (1) JPH04205806A (en)

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