JPH04198211A - Resin composition - Google Patents
Resin compositionInfo
- Publication number
- JPH04198211A JPH04198211A JP32124990A JP32124990A JPH04198211A JP H04198211 A JPH04198211 A JP H04198211A JP 32124990 A JP32124990 A JP 32124990A JP 32124990 A JP32124990 A JP 32124990A JP H04198211 A JPH04198211 A JP H04198211A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- epoxy
- molecule
- resin composition
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 27
- 239000004593 Epoxy Substances 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 238000002156 mixing Methods 0.000 claims abstract description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 8
- 239000003822 epoxy resin Substances 0.000 claims abstract description 7
- 239000011256 inorganic filler Substances 0.000 claims abstract description 7
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 7
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 7
- 239000004065 semiconductor Substances 0.000 claims abstract description 7
- 230000001588 bifunctional effect Effects 0.000 claims description 12
- 150000002989 phenols Chemical class 0.000 claims description 11
- 238000005538 encapsulation Methods 0.000 claims description 6
- 230000035939 shock Effects 0.000 abstract description 12
- -1 diphenol compound Chemical class 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 238000007789 sealing Methods 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 229910002026 crystalline silica Inorganic materials 0.000 abstract description 3
- 239000005350 fused silica glass Substances 0.000 abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 3
- 239000003566 sealing material Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- 238000004132 cross linking Methods 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- 238000005476 soldering Methods 0.000 description 8
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 235000010893 Bischofia javanica Nutrition 0.000 description 2
- 240000005220 Bischofia javanica Species 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- WHHGLZMJPXIBIX-UHFFFAOYSA-N decabromodiphenyl ether Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br WHHGLZMJPXIBIX-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高集積度IC封圧用樹脂組成物に適する耐熱衝
撃性と半田耐熱性および低粘度性に優れたエポキシ樹脂
組成物に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to an epoxy resin composition with excellent thermal shock resistance, soldering heat resistance, and low viscosity, which is suitable for a resin composition for sealing high-density ICs. .
従来、ダイオード、トランノスタ、集積回路等の電子部
品を熱硬化性樹脂で封止しているか、特に集積回路では
耐熱性、耐湿性に優れた0−クレゾールノボラックエポ
キン樹脂をノボラック型フェノール樹脂で硬化させたエ
ボキン樹脂か用いられている。Traditionally, electronic components such as diodes, transnostars, and integrated circuits have been sealed with thermosetting resins, or, especially for integrated circuits, 0-cresol novolac-epochene resin, which has excellent heat resistance and moisture resistance, has been cured with novolac-type phenolic resin. Evokin resin is used.
ところか近年、集積回路の高集積化に伴いチップかたん
たん大型化し、かつパッケージは従来のDIPタイプか
ら表面実装化された小型、薄型のフラットパッケージ、
5OPSSOJ、PLCCに変わってきている。However, in recent years, as integrated circuits have become more highly integrated, chips have become larger and larger, and packages have changed from the conventional DIP type to surface-mounted smaller, thinner flat packages.
5OPSSOJ is changing to PLCC.
即ち大型チップを小型て薄いパッケージに封入すること
により、応力によりクラック発生、これらのクラックに
よる耐湿性の低下等の問題か大きくクローズアップされ
てきている。That is, when a large chip is enclosed in a small and thin package, problems such as the occurrence of cracks due to stress and a decrease in moisture resistance due to these cracks are attracting attention.
特に耐熱衝撃性と半田耐熱性の2点をクリアーてきる封
止樹脂か必要とされている。In particular, there is a need for a sealing resin that meets two requirements: thermal shock resistance and soldering heat resistance.
耐熱衝撃性の向上に対しては、シリコーンオイル、シリ
コーンゴム等のシリコーン化合物や合成ゴム等の添加か
行われてきた。しかしこれらの添加は、成形時の型汚れ
、樹脂パリの発生等不都合な現象か生しるため、シリコ
ーンとエポキシ樹脂又は硬化剤とを反応させたシリコー
ン変性レジンが開発されてきた。(例えば特開昭58−
21417号公報)。現在の封止樹脂は、この活用によ
りかなり耐熱衝撃性か向上している。しかし、これらは
マトリック樹脂中に低弾性率ドメインを導入して全体を
低弾性率化しようとする手法であるかドメンとマトリッ
クスとの接着性に問題かあり、弾性率と同時に強度も低
下してしまう等、いまだ十分てはないし、しかも半田耐
熱性か低下する傾向があり問題となっている。そこで、
上記のような低応力賦与剤を添加せずにマトリックス樹
脂そのものの耐熱衝撃性を向上する必要かでてくる。In order to improve thermal shock resistance, silicone compounds such as silicone oil and silicone rubber, and synthetic rubbers have been added. However, since these additions cause inconvenient phenomena such as mold staining during molding and generation of resin flakes, silicone-modified resins have been developed in which silicone is reacted with epoxy resins or curing agents. (For example, JP-A-58-
21417). Current sealing resins have considerably improved thermal shock resistance through the use of this technology. However, these methods either introduce a low elastic modulus domain into the matrix resin to lower the overall elastic modulus, or there is a problem with the adhesion between the domain and the matrix, resulting in a decrease in elastic modulus and strength. It is still insufficient, and the soldering heat resistance tends to decrease, which is a problem. Therefore,
It becomes necessary to improve the thermal shock resistance of the matrix resin itself without adding the above-mentioned low stress imparting agent.
半田耐熱性の向上に対しては、ポリイミド樹脂やフィラ
ーの検討および3官能樹脂の活用(例えば特開昭6l−
16862Cj号公報)か有望とされているか、いずれ
も耐熱衝撃性に劣り、しかも樹脂組成物粘度か増加する
ことによるダイパッドシフト等の不良かおきやすく、こ
れらの手法の単独使用ではバランスのとれた樹脂組成物
系を得ることは難しい。To improve soldering heat resistance, we investigated polyimide resins and fillers, and utilized trifunctional resins (e.g.,
16862Cj Publication) is considered promising, but both have poor thermal shock resistance and are prone to defects such as die pad shift due to increased resin composition viscosity. Composition systems are difficult to obtain.
そこで樹脂の架橋点間距離、主鎖構造等の組成構造を自
在に変化させ諸物性のバランスをとりつつ半田耐熱性を
向上する方法か有効であると考えられる。Therefore, it is thought that an effective method is to freely change the compositional structure such as the distance between crosslinking points and the main chain structure of the resin to balance various physical properties while improving the soldering heat resistance.
耐熱衝撃性、半田耐熱性、低粘度性および成形性のいず
れも優れた半導体封止用エポキシ樹脂組成物を提供する
ことにある。The object of the present invention is to provide an epoxy resin composition for semiconductor encapsulation that has excellent thermal shock resistance, soldering heat resistance, low viscosity, and moldability.
本発明者らはこれらの問題を解決するために鋭意研究を
進め、つきの組成を持つ樹脂組成物を見い出した。The present inventors conducted extensive research to solve these problems and discovered a resin composition having the following composition.
(A)エポキシ基を分子内に2ケ含有する2官能工ポキ
シ化合物
(B)フェノール性水酸基を分子内に2ケ含有する2官
能フェノール系化合物
(C)エポキシ基を分子内に3ケ以上 含有する多官能
エボキン化合物
(D)硬化促進剤および
(E)無機充填材
を必須成分とし、(B)と(C)の配合割合か(C)/
(B)+ (C)= 25〜75重量%とした組成物を
用いることにより耐熱衝撃性、半田耐熱性、低粘度性、
さらに成形性にも優れた半導体封止用樹脂組成物か得ら
れることを見い出して本願発明を完成するに至ったもの
である。(A) Bifunctional phenolic compound containing two epoxy groups in the molecule (B) Bifunctional phenol compound containing two phenolic hydroxyl groups in the molecule (C) Containing three or more epoxy groups in the molecule A polyfunctional Evoquin compound containing (D) a curing accelerator and (E) an inorganic filler as essential components, and a blending ratio of (B) and (C) or (C)/
By using a composition in which (B) + (C) = 25 to 75% by weight, thermal shock resistance, soldering heat resistance, low viscosity,
Furthermore, the present invention was completed by discovering that a resin composition for semiconductor encapsulation having excellent moldability can be obtained.
本発明において用いられるエポキシ基を分子内に2ケ含
有する2官能工ポキシ化合物としては2官能フェノール
系化合物である4、4′−ジヒドロキンジフェニルメタ
ン、4.4′−ジヒドロキシジフェニルプロパン、4,
4′−ジビフェノール、3.3’、5.5’−テトラメ
チル−4,4′−ジビフェノール、1,6−シヒドロキ
ンナフタレン、ンクロヘキシリデンヒスフェノールA、
3.3′−ジアリル−4,4′〜ノヒトロキンメタン、
カテコール、レゾルノン、ハイドロキノン等をジグリン
ジルエーテル化したものの他にブロム化ヒスフェノール
A型エポキン樹脂、脂環式エポキノ化合物か挙げられる
。The bifunctional poxy compounds containing two epoxy groups in the molecule used in the present invention include bifunctional phenolic compounds such as 4,4'-dihydroquine diphenylmethane, 4,4'-dihydroxydiphenylpropane, 4,4'-dihydroxydiphenylpropane, and
4'-dibiphenol, 3.3', 5.5'-tetramethyl-4,4'-dibiphenol, 1,6-cyhydroquinaphthalene, cyclohexylidenehisphenol A,
3.3'-diallyl-4,4'-nohytroquinemethane,
In addition to diglyndyl ethers of catechol, resolnones, hydroquinone, etc., brominated hisphenol A type epochine resins and alicyclic epochino compounds may be mentioned.
これらのものは単独又は2種以上を併用してもよい。These materials may be used alone or in combination of two or more.
フェノール性水酸基を分子内に2ケ含有する2官能フェ
ノール系化合物は上述のフェノール系化合物の他に、フ
ェノール性水酸基を1ケ有するモノマー、又はオリゴマ
ーとホルムアルデヒド、又はサリチルアルデヒド等のア
ルデヒド類と、又は必要により各種芳香環、脂肪環を有
する化合物を加えて、仕込比や反応条件を調節してフェ
ノール性水酸基か分子内に2ケのみ含有されるように調
整された共縮合物等が挙げられる。これらのものは単独
又は2種以上を併用してもよい。Bifunctional phenolic compounds containing two phenolic hydroxyl groups in the molecule include, in addition to the above-mentioned phenolic compounds, monomers or oligomers containing one phenolic hydroxyl group and aldehydes such as formaldehyde or salicylaldehyde, or Examples include cocondensates prepared by adding compounds having various aromatic rings or alicyclic rings as necessary and adjusting the charging ratio and reaction conditions so that only two phenolic hydroxyl groups are contained in the molecule. These materials may be used alone or in combination of two or more.
これらの2官能エポキシ化合物及び2官能フェノール化
合物は成形温度(165〜185°C)に於いて、数セ
ンチボイズという低粘度を示すものか多く、樹脂組成物
の粘度を著しく低下させることか可能であり、成形時に
は高流動性を賦与し、更にICパノケーノではリードフ
レーム、チップ、アイランド界面で高濡れ性、高密着性
を与え耐半田クラック性か向上する。又、無機充填剤の
含有量を大幅に増加することか可能なため、熱時強度、
耐熱衝撃性、耐半田クラック性か更に向上する。These difunctional epoxy compounds and difunctional phenol compounds often exhibit a low viscosity of several centimeters at the molding temperature (165 to 185°C), and are capable of significantly lowering the viscosity of the resin composition. It provides high fluidity during molding, and also provides high wettability and high adhesion at the interface between the lead frame, chip, and island in IC panocheno, improving solder crack resistance. In addition, since it is possible to significantly increase the content of inorganic fillers, the heat strength and
Thermal shock resistance and solder crack resistance are further improved.
本発明に用いられるエポキン基を分子内に3ヶ以上含有
する多官能エポキシ化合物としては例えば多官能フェノ
ール系化合物であるフェノールノボラック、オルソクレ
ゾールノホラック、トリス(ビトロキンアルキルフェニ
ル)メタン等の他にフェノール性水酸基を有するモノマ
ー、又はオリゴマー、前記した2官能性フェノール化合
物とホルムアルデヒド、又はサリチルアルデヒド等のア
ルデヒド類と、又は必要により各種芳香環、脂脂環を有
する化合物を加え反応させた共縮合物等をグリシジルエ
ーテル化したもの、多官能脂環式エポキシ化合物か挙げ
られる。Examples of the polyfunctional epoxy compound containing three or more epoxy groups in the molecule used in the present invention include polyfunctional phenolic compounds such as phenol novolac, orthocresol novolac, and tris(vitroquine alkylphenyl)methane. Monomers or oligomers having a phenolic hydroxyl group, cocondensates made by reacting the bifunctional phenol compound described above with aldehydes such as formaldehyde or salicylaldehyde, or, if necessary, with compounds having various aromatic rings or alialicyclic rings. and polyfunctional alicyclic epoxy compounds.
これらのものは単独又は2種以上併用してもよい。These compounds may be used alone or in combination of two or more.
この多官能エポキシ化合物は2官能工ポキン化合物、2
官能フェノール系化合物との3次元架橋をもたらすもの
である。This polyfunctional epoxy compound is a difunctional poquin compound, 2
It brings about three-dimensional crosslinking with a functional phenolic compound.
2官能間士のエポキシ化合物/フェノール化合物では通
常の反応では直線状高分子量体しか生成しないか、多官
能エポキシ化合物を添加することにより3次元的に架橋
点を生成し、熱硬化高分子量体を生成する。更に、この
多官能フェノール系化合物の配合量を調節することによ
り硬化特性、架橋密度、架橋点間距離の調節か自在であ
り流動性、硬化性等の作業性、強度、弾性率、靭性等の
硬化物特性を望み通りに調節可能である。With bifunctional epoxy compounds/phenol compounds, only linear polymers are produced in normal reactions, or by adding polyfunctional epoxy compounds, crosslinking points are generated three-dimensionally to form thermosetting polymers. generate. Furthermore, by adjusting the blending amount of this polyfunctional phenolic compound, it is possible to freely adjust the curing characteristics, crosslinking density, and distance between crosslinking points, and it is possible to freely adjust the curing characteristics, crosslinking density, and distance between crosslinking points. Cured product properties can be adjusted as desired.
これら多官能エポキシ化合物の配合割合は(多官能エポ
キシ化合物)/(2官能工ポンキ化合物÷多官能エボキ
ン化合物)で25〜75重量%か適切であり、25重量
%未満たと硬化性か大幅に劣り、又熱時諸物性も非常に
低下する。75重量%を超えると架橋点間距離の延長効
果か低下し低弾性効果と強靭性化か得られず好ましくな
い。The blending ratio of these polyfunctional epoxy compounds is (polyfunctional epoxy compound)/(bifunctional polyfunctional epoxy compound ÷ polyfunctional epoxy compound), which is 25 to 75% by weight, which is appropriate.If it is less than 25% by weight, the curability will be significantly inferior. Also, various physical properties when heated are greatly reduced. If it exceeds 75% by weight, the effect of extending the distance between crosslinking points will decrease, and the effect of lowering elasticity and increasing toughness will not be obtained, which is not preferable.
エポキシ化合物とフェノール系化合物の配合割合は当量
比で0.7〜1.3の範囲か好ましい。The mixing ratio of the epoxy compound and the phenol compound is preferably in the range of 0.7 to 1.3 in terms of equivalent ratio.
本発明で用いられる無機充填材としては結晶性シリカ、
溶融シリカ、アルミナ、炭酸カルシウム、タルク、マイ
カ、ガラス繊維等が挙げられ、これらは1種又は2種以
上混合して使用される。これらの中で特に結晶性ソリ力
または溶融シリカか好適に用いられる。Inorganic fillers used in the present invention include crystalline silica,
Examples include fused silica, alumina, calcium carbonate, talc, mica, glass fiber, etc., and these may be used alone or in combination of two or more. Among these, crystalline silica or fused silica is particularly preferably used.
また、本発明に使用される硬化促進剤はエポキン基とフ
ェノール性水酸基との反応を促進するもてあれば良く、
一般に封止用材料に使用されているものを広く使用する
ことかでき、例えばBDM八等の第3級アミン類、イミ
ダゾール類、1.8−ジアザビシクロ〔5,4,0〕ウ
ンデセン−7、トリフェニルホスフィン等の有機リン化
合物等か単独もしくは2種以上混合して用いられる。Further, the curing accelerator used in the present invention only needs to be one that promotes the reaction between the Epoquine group and the phenolic hydroxyl group.
A wide range of materials commonly used for sealing can be used, such as tertiary amines such as BDM 8, imidazoles, 1,8-diazabicyclo[5,4,0]undecene-7, Organic phosphorus compounds such as phenylphosphine can be used alone or in combination of two or more.
その他必要に応してワックス類等の離型剤、ヘキサブロ
ムペンセン、デカブロムビフェニルエーテル、三酸化ア
ンチモン等の!#燃剤、カーボンブラック、ベンガラ等
の着色剤、シランカップリング剤その地熱可塑性樹脂等
を適宜添加配合することかできる。If necessary, mold release agents such as waxes, hexabromo pentene, decabromo biphenyl ether, antimony trioxide, etc. #Fuel agent, coloring agent such as carbon black, red iron oxide, silane coupling agent, geothermal plastic resin, etc. may be added and blended as appropriate.
本発明の半導体封止用エポキシ樹脂組成物を製造するに
は一般的な方法としては、所定の配合比の原料をミキサ
ー等によって十分に混合した後、更にロールやニーダ−
等により溶融混線処理し、次いて冷却固化させて適当な
大きさに粉砕することにより容易に製造することか出来
る。The general method for producing the epoxy resin composition for semiconductor encapsulation of the present invention is to thoroughly mix raw materials in a predetermined blending ratio using a mixer, etc., and then further mix them using a roll or kneader.
It can be easily produced by carrying out a melt mixing treatment using a method such as the above, followed by cooling and solidifying the powder and pulverizing it to an appropriate size.
以下、本発明を実施例で示す。 The present invention will be illustrated below with examples.
実施例1〜6.比較例1.2
第1表に示したそれぞれの配合割合の組成物を常温にて
十分に混合し、更に95〜100℃で2軸ロールにより
混練し、冷却後粉砕して成形材料とし、これをタブレッ
ト化して半導体封止用エポキシ樹脂組成物を得た。Examples 1-6. Comparative Example 1.2 The compositions having the respective compounding ratios shown in Table 1 were thoroughly mixed at room temperature, further kneaded at 95 to 100°C with a twin-screw roll, cooled and crushed to obtain a molding material. was tableted to obtain an epoxy resin composition for semiconductor encapsulation.
この材料をトランスファー成形機(成形条件二金型温度
175°C1硬化時間2分)を用いて成形し、得られた
成形品を175℃、8時間て後硬化し評価した。結果を
第1表に示す。This material was molded using a transfer molding machine (molding conditions: 2 mold temperatures: 175° C., 1 curing time: 2 minutes), and the resulting molded products were post-cured at 175° C. for 8 hours and evaluated. The results are shown in Table 1.
評価方法
※1.スパイラルフロー
FMM4−1−66に準じたスパイラルフロー測定用金
型を用い、試料を20g、成形温度175℃、成形圧カ
フ、0MPa、成形時間2分て成形した時の成形品の長
さ。Evaluation method *1. Length of a molded product when 20 g of sample was molded using a spiral flow measurement mold according to Spiral Flow FMM4-1-66 at a molding temperature of 175°C, a molding pressure cuff of 0 MPa, and a molding time of 2 minutes.
※2.高化式フロー粘度
175℃時の高化式フロー粘度(ボイズ)※3.耐熱衝
撃性試験
成形品(チップサイズ36InIn2、パッケージ厚2
.05mm1後硬化175°Cl8Hrs)20個を温
度サイクルのテスト(+ 150°C〜−196℃)に
かけ、500サイクルのテストを行ないクラックの発生
した個数を示す。*2. Koka type flow viscosity Koka type flow viscosity at 175℃ (voids) *3. Thermal shock resistance test molded product (chip size 36InIn2, package thickness 2
.. A temperature cycle test (+150°C to -196°C) was performed on 20 pieces of 05 mm 1 post-cured 175°Cl8Hrs), and the number of cracks generated after 500 cycles was shown.
※4.半田耐熱性試験
成形品(チップサイズ36tun2、パッケージ厚2.
05叩)20個について85℃、85%RHの水蒸気下
で72時間処理後、240℃の半田槽に10秒間浸漬し
、クラックの発生した成形品の個数を示す。*4. Solder heat resistance test molded product (chip size 36tun2, package thickness 2.
After treating 20 molded products under steam at 85°C and 85% RH for 72 hours, they were immersed in a solder bath at 240°C for 10 seconds, and the number of molded products with cracks is shown.
※5.ンヨア尋硬度 175℃で成形し、離型後10秒後に測定。*5. hardness Molded at 175°C and measured 10 seconds after release from the mold.
本発明の2官能工ポキシ化合物、2官能フェノール系化
合物、多官能エボキン化合物、無機充填剤および硬化促
進剤を必須成分とする半導体封止用樹脂組成物は耐熱衝
撃性と半田耐熱性に極めて優れ、低粘度であり、このた
め金線変形性おび充填性に優れ、さらに成形加工性(樹
脂)くり)にも優れ、極めてバランスのとれた樹脂組成
物であるため高集積度IC封止用樹脂組成物として非常
に信頼性の高いものである。The semiconductor encapsulating resin composition of the present invention, which contains a bifunctional poxy compound, a bifunctional phenolic compound, a polyfunctional evoquin compound, an inorganic filler, and a curing accelerator as essential components, has extremely excellent thermal shock resistance and soldering heat resistance. , has low viscosity, has excellent gold wire deformability and filling properties, and is also excellent in molding processability (resin processing), and is an extremely well-balanced resin composition, making it an excellent resin for high-integration IC encapsulation. The composition is extremely reliable.
Claims (1)
エポキシ化合物 (B)フェノール性水酸基を分子内に2ヶ含有する2官
能フェノール系化合物 (C)エポキシ基を分子内に3ヶ以上含有する多官能エ
ポキシ化合物 (D)硬化促進剤および (E)無機充填材 を必須成分とし、(A)と(C)の配合割合か(C)/
(A)+(C)=25〜75重量%であることを特徴と
する半導体封止用エポキシ樹脂組成物。(1) (A) Bifunctional epoxy compound containing two epoxy groups in the molecule (B) Bifunctional phenolic compound containing two phenolic hydroxyl groups in the molecule (C) Three epoxy groups in the molecule The polyfunctional epoxy compound containing the above (D) curing accelerator and (E) inorganic filler are essential components, and the blending ratio of (A) and (C) is (C)/
An epoxy resin composition for semiconductor encapsulation, characterized in that (A)+(C)=25 to 75% by weight.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32124990A JPH04198211A (en) | 1990-11-27 | 1990-11-27 | Resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32124990A JPH04198211A (en) | 1990-11-27 | 1990-11-27 | Resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04198211A true JPH04198211A (en) | 1992-07-17 |
Family
ID=18130474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32124990A Pending JPH04198211A (en) | 1990-11-27 | 1990-11-27 | Resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04198211A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994029363A1 (en) * | 1993-06-08 | 1994-12-22 | Nippon Steel Chemical Co., Ltd. | Epoxy resin composition |
WO1996004329A1 (en) * | 1994-08-04 | 1996-02-15 | Hokuriku Toryo Kabushiki Kaisya | Flowable sealing resin composition |
US5834570A (en) * | 1993-06-08 | 1998-11-10 | Nippon Steel Chemical Co., Ltd. | Epoxy resin composition |
US6255409B1 (en) | 1998-03-13 | 2001-07-03 | Sumitomo Chemical Co., Ltd. | Epoxy resin composition and resin-encapsulated semiconductor device |
JP2009173728A (en) * | 2008-01-23 | 2009-08-06 | Nippon Steel Chem Co Ltd | Epoxy resin composition and cured product |
-
1990
- 1990-11-27 JP JP32124990A patent/JPH04198211A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994029363A1 (en) * | 1993-06-08 | 1994-12-22 | Nippon Steel Chemical Co., Ltd. | Epoxy resin composition |
US5834570A (en) * | 1993-06-08 | 1998-11-10 | Nippon Steel Chemical Co., Ltd. | Epoxy resin composition |
WO1996004329A1 (en) * | 1994-08-04 | 1996-02-15 | Hokuriku Toryo Kabushiki Kaisya | Flowable sealing resin composition |
US6255409B1 (en) | 1998-03-13 | 2001-07-03 | Sumitomo Chemical Co., Ltd. | Epoxy resin composition and resin-encapsulated semiconductor device |
JP2009173728A (en) * | 2008-01-23 | 2009-08-06 | Nippon Steel Chem Co Ltd | Epoxy resin composition and cured product |
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