JPH04196521A - Fixing method for semiconductor substrate - Google Patents
Fixing method for semiconductor substrateInfo
- Publication number
- JPH04196521A JPH04196521A JP2332406A JP33240690A JPH04196521A JP H04196521 A JPH04196521 A JP H04196521A JP 2332406 A JP2332406 A JP 2332406A JP 33240690 A JP33240690 A JP 33240690A JP H04196521 A JPH04196521 A JP H04196521A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor substrate
- fixing
- metal
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 160
- 239000004065 semiconductor Substances 0.000 title claims abstract description 69
- 238000000034 method Methods 0.000 title claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 51
- 239000002184 metal Substances 0.000 claims abstract description 51
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 238000001816 cooling Methods 0.000 claims abstract description 8
- 238000007664 blowing Methods 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 30
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 239000013078 crystal Substances 0.000 description 5
- 230000005611 electricity Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は基板ホルダーへの半導体基板固定法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for fixing a semiconductor substrate to a substrate holder.
従来の技術
従来結晶成長法、とりわけ分子線エピタキシー法におい
て、半導体基板を基板ホルダーに固定するには基板ホル
ダー上にインジウムのような低融点で柔らかな基板固定
用金属を用いる方法が多く行われている。この方法は基
板固定用金属を加熱・融解し、半導体基板をその上で動
かして基板ホルダー及び半導体基板裏面と充分になじま
せた後冷却して半導体基板を固定するものである。その
際半導体基板の下部にある基板固定用金属以外は、それ
が成長した結晶へ影響を及ぼすことを防ぐために除去し
ておく。Conventional technology In conventional crystal growth methods, especially molecular beam epitaxy, in order to fix a semiconductor substrate to a substrate holder, a method of using a soft substrate fixing metal such as indium with a low melting point on the substrate holder is often used. There is. In this method, a metal for fixing a substrate is heated and melted, a semiconductor substrate is moved on top of the metal, and the semiconductor substrate is sufficiently blended with the substrate holder and the back surface of the semiconductor substrate, and then the metal is cooled to fix the semiconductor substrate. At this time, all metal parts other than the metal for fixing the substrate at the bottom of the semiconductor substrate are removed to prevent them from affecting the grown crystal.
また最近では半導体基板をモリブデン製などの止め金を
用いて半導体基板表面の側から固定する方法も広く行わ
れている。Recently, a method of fixing a semiconductor substrate from the surface side of the semiconductor substrate using a stopper made of molybdenum or the like has also been widely used.
発明が解決しようとする課題
しかしながら基板同定用金属を用いて半導体基板を固定
する場合、半導体基板裏面や基板ホルダーと基板固定用
金属とを充分になじませておく必要がある。この作業が
不完全であると基板固定用金属の付着状態がムラになり
結晶成長中の基板温度に面内分布を生じ成長した結晶の
面内均一性が低下する。また半導体基板裏面と基板固定
用金属とをなじませる作業を行う際に半導体基板を溶融
した基板固定用金属の上で動かすため、作業を充分慎重
に行わないと単導体基板表面を基板固定用金属で汚染し
てしまうことになる。Problems to be Solved by the Invention However, when a semiconductor substrate is fixed using a substrate identification metal, it is necessary to sufficiently blend the back surface of the semiconductor substrate or the substrate holder with the substrate fixing metal. If this operation is incomplete, the state of adhesion of the metal for fixing the substrate will be uneven, resulting in in-plane distribution of the substrate temperature during crystal growth, which will reduce the in-plane uniformity of the grown crystal. In addition, when performing the work of blending the back side of the semiconductor substrate with the board fixing metal, the semiconductor substrate is moved over the molten board fixing metal, so if the work is not done carefully, the surface of the single conductor board will be rubbed with the board fixing metal. It will become contaminated.
この様に従来の基板固定用金属を用いて半導体基板を固
定する方法では、均一な結晶成長を行うために作業者の
熟練を必要とするうえ基板固定用金属による半導体基板
を汚染する可能性があるという問題があった。As described above, the conventional method of fixing a semiconductor substrate using a substrate fixing metal requires the skill of the operator to achieve uniform crystal growth, and there is a possibility that the semiconductor substrate may be contaminated by the substrate fixing metal. There was a problem.
一方止め金を用いて半導体基板を固定する方法では、半
導体基板の汚染はないものの止め金の近傍において止め
金からの熱伝導のため基板温度が設定値から変化してし
捷いその部分では良好な結晶成長が行えないという課題
があった。On the other hand, with the method of fixing the semiconductor substrate using a clasp, although there is no contamination of the semiconductor substrate, the temperature of the substrate changes from the set value near the clasp due to heat conduction from the clasp, and there is no problem in that area. The problem was that crystal growth could not be achieved.
本発明はこのような従来の課題を解決し、簡易に短時間
で作業することができ、しかも半導体基板を汚染する可
能性の少ない半導体基板固定方法を提供するものである
。The present invention solves these conventional problems and provides a method for fixing a semiconductor substrate, which can be easily carried out in a short time and is less likely to contaminate the semiconductor substrate.
課題を解決するだめの手段
この目的を達成するために本発明の半導体基板固定方法
では、半導体基板裏面に予め基板固定用金属を設けた半
導体基板を用い、この半導体基板を基板ホルダー上で加
熱して半導体基板裏面の基板固定用金属を溶融した後冷
却し、基板固定用金属を固化させて半導体基板を基板ホ
ルダー上に固定するものである。Means for Solving the Problem In order to achieve this object, the semiconductor substrate fixing method of the present invention uses a semiconductor substrate with a substrate fixing metal provided on the back side of the semiconductor substrate in advance, and heats this semiconductor substrate on a substrate holder. The substrate fixing metal on the back side of the semiconductor substrate is melted and then cooled to solidify the substrate fixing metal and fix the semiconductor substrate on the substrate holder.
作用
本発明の半導体基板固定方法は半導体基板裏面に予め基
板固定用金属を設けたものであり、基板および基板ホル
ダーと基板固定用金属とをなじませる必要がないため、
半導体基板と基板ホルダーとを容易にムラなく基板固定
用金属によって固定することができる。また半導体基板
固定方法が極めて単紳であるだめ作業の熟練を必要とせ
ず、作業中に半導体基板表面を汚染する可能性を低減で
きる。Function: In the method for fixing a semiconductor substrate of the present invention, a metal for fixing the substrate is provided on the back side of the semiconductor substrate in advance, and there is no need to blend the substrate and the substrate holder with the metal for fixing the substrate.
The semiconductor substrate and the substrate holder can be easily and evenly fixed with the substrate fixing metal. In addition, the semiconductor substrate fixing method is extremely simple and does not require any skill in manual labor, and the possibility of contaminating the semiconductor substrate surface during the operation can be reduced.
実施例
以下、本発明の一実施例について、図面を参照しながら
説明する。EXAMPLE Hereinafter, an example of the present invention will be described with reference to the drawings.
第1図は本発明の第1の実施例における基板ホルダーへ
の半導体基板の固定方法を示した側面である。第1図に
おいて、11は基板ホルダー、12は基板固定用金属、
13は半導体基板、14はヒーターである。ヒーター1
4上に基板ホルダー11を配置し、さらにその上には裏
面に基板固定用金属12を蒸着した半導体基板13がの
せられている。FIG. 1 is a side view showing a method of fixing a semiconductor substrate to a substrate holder in a first embodiment of the present invention. In FIG. 1, 11 is a substrate holder, 12 is a metal for fixing the substrate,
13 is a semiconductor substrate, and 14 is a heater. Heater 1
A substrate holder 11 is placed on top of the substrate holder 4, and a semiconductor substrate 13 having a substrate fixing metal 12 deposited on its back surface is further placed on top of the substrate holder 11.
以上のように構成された第1の実施例について以下にそ
の手順を説明する。The procedure of the first embodiment configured as described above will be explained below.
基板ホルダー11はヒーター14によって裏面から加熱
され、基板ホルダー11からの熱により基板固定用金属
12は間接的に加熱され基板ホルダー上で融解する。こ
の状態を数分間保つことで融解した基板固定用金属を基
板および基板ホルダーとなじませることができる。その
後基板ホルダー11をヒーター14からはずして基板ボ
ルダ−11、基板固定用金属12および半導体基板13
を冷却し、基板固定用金属12を固化して半導体基板1
3を基板ホルダー11に固定する。The substrate holder 11 is heated from the back side by the heater 14, and the substrate fixing metal 12 is indirectly heated by the heat from the substrate holder 11 and melted on the substrate holder. By maintaining this state for several minutes, the molten substrate fixing metal can be blended with the substrate and substrate holder. After that, the substrate holder 11 is removed from the heater 14, and the substrate boulder 11, the substrate fixing metal 12, and the semiconductor substrate 13 are removed.
The semiconductor substrate 1 is cooled and the substrate fixing metal 12 is solidified.
3 is fixed to the substrate holder 11.
このように本実施例によれば、半導体基板13の裏面に
基板固定用金属12を設けることにより、半導体基板1
3を容易に表面を汚染することなく基板ホルダー11に
固定することができる。As described above, according to this embodiment, by providing the substrate fixing metal 12 on the back surface of the semiconductor substrate 13, the semiconductor substrate
3 can be easily fixed to the substrate holder 11 without contaminating the surface.
以下本発明の第2の実施例について図面を参照しながら
説明する。第2図は第2の実施例を示す基板ホルダーへ
の半導体基板固定方法を示したものである。同図におい
て、21は基板ホルダー、22は半導体基板、23は基
板固定用金属で、以上は第1図の構成と同じであり、裏
面に基板固定用金属23を蒸着した半導体基板22は基
板ホルダー21上に乗せられている。第1図の構成と異
なるのは窒素ガン24、窒素25と窒素加熱用ヒーター
26を設けた点である。この構成とすることで窒素ガン
24から発射された窒素25は通電加熱されている窒素
加熱用ヒーター26によって200℃以上の温度まで加
熱が行われている。A second embodiment of the present invention will be described below with reference to the drawings. FIG. 2 shows a method of fixing a semiconductor substrate to a substrate holder according to a second embodiment. In the same figure, 21 is a substrate holder, 22 is a semiconductor substrate, and 23 is a substrate fixing metal, which is the same as the structure shown in FIG. It is placed on 21. The difference from the configuration shown in FIG. 1 is that a nitrogen gun 24, nitrogen 25, and nitrogen heating heater 26 are provided. With this configuration, the nitrogen 25 emitted from the nitrogen gun 24 is heated to a temperature of 200° C. or more by the nitrogen heating heater 26 which is heated with electricity.
以上のように構成された第2の実施例について、以下そ
の基板固定方法について説明する。Regarding the second embodiment configured as above, a method for fixing the substrate will be described below.
2 窒素ガン24から発射される窒素25を窒素加熱
用ヒーター35によって加熱し温度が200℃以上とな
るようにしておく。この加熱した窒素25を半導体基板
22に吹き付けることによって基板ホルダー21、半導
体基板22および基板固定用金属23の加熱を行う。基
板固定用金属23が融解しそれが基板ホルダー21と充
分なじむまで加熱を続けた後自然冷却して基板固定用金
属23を固化させて半導体基板22を固定することがで
きる。2. The nitrogen 25 emitted from the nitrogen gun 24 is heated by the nitrogen heating heater 35 so that the temperature becomes 200° C. or higher. By blowing this heated nitrogen 25 onto the semiconductor substrate 22, the substrate holder 21, the semiconductor substrate 22, and the substrate fixing metal 23 are heated. The semiconductor substrate 22 can be fixed by continuing heating until the substrate fixing metal 23 melts and is sufficiently compatible with the substrate holder 21, and then cooling naturally to solidify the substrate fixing metal 23.
なおこの場合基板固定用金属22の冷却は自然冷却で行
うとしたが、冷却時間を短縮するために窒素などの気体
を用いて強制的に冷却を行っても良いことは言うまでも
ない。このとき基板加熱用ヒーター26への通電を切っ
て窒素24の加熱を中止すれば、半導体基板22が窒素
24によって冷却されるので、半導体基板22の加熱・
冷却を連続的に行うことができ作業効率を高めることが
できる。In this case, the cooling of the metal 22 for fixing the substrate is performed by natural cooling, but it goes without saying that cooling may be performed forcibly using a gas such as nitrogen in order to shorten the cooling time. At this time, if the electricity is turned off to the substrate heating heater 26 and the heating of the nitrogen 24 is stopped, the semiconductor substrate 22 is cooled by the nitrogen 24, so that the semiconductor substrate 22 is heated and
Cooling can be performed continuously, increasing work efficiency.
発明の効果
以上のように本発明の半導体基板固定方法は、半導体基
板裏面に基板固定用金属を設けたものであり、ヒーター
を用いて加熱することにより半導体基板裏面に基板固定
用金属をムラなく付着することが可能で、半導体基板を
容易に表面の汚染なく短時間で基板ホルダー固定するこ
とができるため、実用上極めて有用なものである。Effects of the Invention As described above, the semiconductor substrate fixing method of the present invention provides the substrate fixing metal on the back side of the semiconductor substrate, and by heating with a heater, the substrate fixing metal is evenly applied to the semiconductor substrate back side. It is extremely useful in practice because it can be attached to a substrate holder and a semiconductor substrate can be easily fixed to a substrate holder in a short time without contaminating the surface.
第1図、第2図は本発明の第1、第2の実施例における
半導体基板固定方法を示す側面概念図である。
11・・基板ホルダー、12 半導体基板、13
基板固定用金属、14・・ヒーター、21・基板ホルダ
ー、22・・・半導体基板、23・基板固定用金属、2
4・窒素ガン、26・・・窒素加熱用ヒーター。1 and 2 are conceptual side views showing the semiconductor substrate fixing method in the first and second embodiments of the present invention. 11...Substrate holder, 12 Semiconductor substrate, 13
Metal for fixing the substrate, 14...Heater, 21.Substrate holder, 22...Semiconductor substrate, 23.Metal for fixing the substrate, 2
4. Nitrogen gun, 26... Nitrogen heating heater.
Claims (4)
半導体基板裏面に薄膜状の基板固定用金属を設けた半導
体基板用い、それを基板ホルダー上で加熱し基板固定用
金属を融解させた後冷却して、半導体基板を基板ホルダ
ー上に固定することを特徴とする半導体基板固定方法。(1) When fixing a semiconductor substrate to a substrate holder, use a semiconductor substrate with a thin film of substrate fixing metal provided on the back side of the semiconductor substrate in advance, and heat it on the substrate holder to melt the substrate fixing metal. A method for fixing a semiconductor substrate, comprising cooling the semiconductor substrate and fixing the semiconductor substrate on a substrate holder.
の膜厚が0.1〜2mmであることを特徴とする請求項
1記載の半導体基板固定方法。(2) The semiconductor substrate fixing method according to claim 1, wherein the thin film-like substrate fixing metal provided on the back surface of the semiconductor substrate has a thickness of 0.1 to 2 mm.
ムを用いることを特徴とする請求項1記載の半導体基板
固定方法。(3) The semiconductor substrate fixing method according to claim 1, characterized in that indium, which is a low melting point metal, is used as the substrate fixing metal.
用い、これを半導体基板表面から吹き付けることによっ
て基板固定用金属の融解を行うことを特徴とする請求項
1記載の半導体基板固定方法。(4) The method for fixing a semiconductor substrate according to claim 1, characterized in that the method for heating the metal for fixing the substrate includes using heated gas and blowing the gas from the surface of the semiconductor substrate to melt the metal for fixing the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2332406A JPH04196521A (en) | 1990-11-28 | 1990-11-28 | Fixing method for semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2332406A JPH04196521A (en) | 1990-11-28 | 1990-11-28 | Fixing method for semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04196521A true JPH04196521A (en) | 1992-07-16 |
Family
ID=18254615
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2332406A Pending JPH04196521A (en) | 1990-11-28 | 1990-11-28 | Fixing method for semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04196521A (en) |
-
1990
- 1990-11-28 JP JP2332406A patent/JPH04196521A/en active Pending
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