JPH04186797A - Manufacture of multi-layer circuit board - Google Patents
Manufacture of multi-layer circuit boardInfo
- Publication number
- JPH04186797A JPH04186797A JP31657990A JP31657990A JPH04186797A JP H04186797 A JPH04186797 A JP H04186797A JP 31657990 A JP31657990 A JP 31657990A JP 31657990 A JP31657990 A JP 31657990A JP H04186797 A JPH04186797 A JP H04186797A
- Authority
- JP
- Japan
- Prior art keywords
- thermoplastic resin
- circuit board
- melting point
- temperature
- crystalline thermoplastic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 25
- 238000010438 heat treatment Methods 0.000 claims abstract description 18
- 238000002844 melting Methods 0.000 claims abstract description 16
- 230000008018 melting Effects 0.000 claims abstract description 16
- 230000009477 glass transition Effects 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- 239000013078 crystal Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 5
- 238000002425 crystallisation Methods 0.000 abstract description 5
- 230000008025 crystallization Effects 0.000 abstract description 5
- 229920002959 polymer blend Polymers 0.000 abstract description 2
- 238000005452 bending Methods 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 230000000116 mitigating effect Effects 0.000 abstract 1
- 238000012805 post-processing Methods 0.000 abstract 1
- 238000003475 lamination Methods 0.000 description 8
- 238000001125 extrusion Methods 0.000 description 5
- 238000005476 soldering Methods 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920000412 polyarylene Polymers 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 230000002040 relaxant effect Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- -1 sulfide ketone Chemical class 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は熱可塑性樹脂を絶縁層とする多層回路基板の製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing a multilayer circuit board using a thermoplastic resin as an insulating layer.
[従来の技術〕
熱可塑性樹脂を絶縁層とし、その一方の面に回路を設け
た回路基板を複数枚積層して多層回路基板とし、高温雰
囲気に曝して部品をハンダ付けした後常温に戻すと多層
回路基板は樹脂の種類、温度によるが湾曲を呈すること
がある。[Conventional technology] A multilayer circuit board is created by laminating multiple circuit boards with thermoplastic resin as an insulating layer and a circuit on one side, and after exposing the board to a high temperature atmosphere and soldering the components, the circuit board is heated to room temperature. Multilayer circuit boards may exhibit curvature depending on the type of resin and temperature.
[発明が解決しようとする課題]
本発明の目的は多層回路基板が成形後、高温雰囲気で半
田付けして常温に戻したときに生じる湾曲をできるだけ
抑える方法にある。[Problems to be Solved by the Invention] An object of the present invention is to provide a method for suppressing as much as possible the curvature that occurs when a multilayer circuit board is soldered in a high temperature atmosphere and returned to room temperature after being molded.
[課題を解決するための手段]
(要旨)
本発明の要旨とするところは結晶性熱可塑性樹脂からな
る絶縁層と導体層よりなる回路基板複数枚を加圧接着後
、その結晶性熱可塑性樹脂の結晶融点未満、ガラス転移
温度以上で緩和熱処理することを特徴とする多層回路基
板の製造方法にある以下、本発明の詳細な説明する。[Means for Solving the Problem] (Summary) The gist of the present invention is that after bonding a plurality of circuit boards made of an insulating layer and a conductor layer made of a crystalline thermoplastic resin under pressure, Hereinafter, the present invention will be described in detail, which is a method of manufacturing a multilayer circuit board characterized by performing relaxation heat treatment at a temperature below the crystal melting point and above the glass transition temperature.
(多層回路基板積層工程)
多層回路基板を構成する絶縁層は結晶性熱可塑性樹脂か
らなる。絶縁層は結晶性熱可塑性樹脂以外の物を含有し
ても良く、また結晶性熱可塑性樹脂は単独で或いは二種
以上の組成物であっても良い。また組成物の場合、一方
が繊維状或いは分散相を形成するものであってもよい。(Multilayer circuit board lamination step) The insulating layer constituting the multilayer circuit board is made of crystalline thermoplastic resin. The insulating layer may contain substances other than the crystalline thermoplastic resin, and the crystalline thermoplastic resin may be used alone or in a composition of two or more types. In the case of a composition, one of the two may form a fibrous or dispersed phase.
結晶性熱可塑性樹脂以外に含まれるものとしては特に制
限されるものではないが、ガラス繊維、チタン酸カリウ
ム繊維のような無機繊維、マイカ、カオリン、ステアリ
ン酸カルシウムのような無機或いは有機の添加物等が例
示される。In addition to the crystalline thermoplastic resin, there are no particular restrictions on what may be included, but inorganic fibers such as glass fibers and potassium titanate fibers, inorganic or organic additives such as mica, kaolin, and calcium stearate, etc. is exemplified.
結晶性熱可塑性樹脂としては特に制限されるものではな
く、耐熱性のある公知の結晶性熱可塑性樹脂が用いられ
る。ここで耐熱性とは耐半田性を有するものであること
を意味し、結晶性熱可塑性樹脂の融点が半田の融点より
高いものであることを意味する。また結晶性熱可塑性樹
脂とは十分な熱処理により結晶化度を20%以上とじう
る熱可塑性樹脂を意味し、例えば、ポリアリーレンスル
フィド、ポリアリーレンスルフィドケトン、ポリエーテ
ルエーテルケトン、ポリエーテルケトン又はこれらの樹
脂の二種以上よりなるポリマーブレンド等が挙げられる
。ここで結晶化度(Xc)とは、密度勾配管により求め
た密度値(ρ)より結晶密度ρい非晶密度ρ、を別に求
めた上で次式から求める。The crystalline thermoplastic resin is not particularly limited, and known heat-resistant crystalline thermoplastic resins may be used. Here, heat resistance means having solder resistance, and means that the melting point of the crystalline thermoplastic resin is higher than the melting point of solder. Furthermore, the term "crystalline thermoplastic resin" means a thermoplastic resin whose crystallinity can be reduced to 20% or more by sufficient heat treatment, such as polyarylene sulfide, polyarylene sulfide ketone, polyether ether ketone, polyether ketone, or any of these. Examples include polymer blends consisting of two or more types of resins. Here, the degree of crystallinity (Xc) is determined from the following equation after separately determining the amorphous density ρ, which is lower than the density value (ρ) determined by the density gradient tube.
xc−(ρ。/ρ)((ρ−ρ、)/(ρ。−ρ、))
別に求める結晶密度ρ。とじてはX線回折で格子定数を
定め計算で求めた値が採用され、非晶密度ρ、とじては
実測による値が採用される。例えばポリフェニレンスル
フィドの結晶密度としては1.430g/cm3が、非
晶密度としては1.313g/cm3が採用される。xc-(ρ./ρ) ((ρ-ρ,)/(ρ.-ρ,))
The crystal density ρ is determined separately. For the closure, a value determined by calculation after determining the lattice constant by X-ray diffraction is used, and for the amorphous density ρ, an actually measured value is used. For example, the crystal density of polyphenylene sulfide is 1.430 g/cm3, and the amorphous density is 1.313 g/cm3.
かかる絶縁層を得る製造方法としては公知の成形方法が
採用されるが、いずれの成形方法を用いるにせよ、積層
前に緊張熱処理をした上で緩和熱処理をすることが望ま
しい。A known molding method is employed as a manufacturing method for obtaining such an insulating layer, but whichever molding method is used, it is desirable to perform a tension heat treatment and then a relaxation heat treatment before lamination.
他方、多層基板の導体層を構成する導体としては絶縁層
を構成する熱可塑性樹脂と同−又は類似の熱可塑性樹脂
をバインダーとした導電性樹脂組成物、金属等が例示さ
れ、導体層も公知の方法で。On the other hand, examples of the conductor constituting the conductor layer of the multilayer board include a conductive resin composition using the same or similar thermoplastic resin as the binder to the thermoplastic resin constituting the insulating layer, metal, etc., and the conductor layer is also known. in a way.
得ることができる。Obtainable.
また多層回路基板は加圧下で加熱により接着剤を介し、
又は介することなく積層される。接着剤を用いないとき
は熱可塑性樹脂の融点近傍、通常結晶融点の±10℃以
内の温度で加圧して、流動しない程度の時間保持するこ
とにより積層接着させることができる。In addition, multilayer circuit boards are bonded with adhesive by heating under pressure.
Or they can be laminated without intervening. When no adhesive is used, lamination can be achieved by applying pressure at a temperature close to the melting point of the thermoplastic resin, usually within ±10° C. of the crystal melting point, and holding it for a period of time long enough to prevent it from flowing.
(緩和熱処理工程)
本発明は二のような多層回路基板を構成する結晶性熱可
塑性樹脂の結晶融点未満、ガラス転移温度以上で緩和熱
処理する。(Relaxation heat treatment step) In the present invention, relaxation heat treatment is performed at a temperature below the crystal melting point and above the glass transition temperature of the crystalline thermoplastic resin constituting the multilayer circuit board as described in 2.
緩和熱処理は好ましくは結晶化温度以上、融点未満、よ
り好ましくは後工程の多層回路基板上に部品を半田付は
固定する工程の温度以上、融点未満の温度範囲でなされ
る。ここでガラス転移温度、結晶融点及び結晶化温度と
はそれぞれ示差走査熱量計を用い、ガラス状態から10
℃/分の速度で非晶ペレット状熱可塑性樹脂を昇温した
ときに現われるゴム状態に転移する際の吸熱ピーク1、
融解時の吸熱ピーク及びその間に現われる発熱ビーりを
指す。The relaxing heat treatment is preferably carried out at a temperature that is higher than the crystallization temperature and lower than the melting point, more preferably higher than the temperature of the subsequent step of soldering and fixing the component on the multilayer circuit board, but lower than the melting point. Here, the glass transition temperature, crystal melting point, and crystallization temperature are measured using a differential scanning calorimeter, and are
Endothermic peak 1 when transitioning to a rubber state that appears when an amorphous pellet thermoplastic resin is heated at a rate of °C/min;
Refers to the endothermic peak during melting and the exothermic beep that appears in between.
但し、樹脂組成物のように2以上のガラス転移温度、結
晶融点、結晶化温度を有するときはそれぞれその主たる
ピークをここでいうガラス転移温度、結晶融点、結晶化
温度とする。However, when a resin composition has two or more glass transition temperatures, crystal melting points, and crystallization temperatures, the main peaks thereof are defined as the glass transition temperature, crystal melting point, and crystallization temperature, respectively.
本発明で云う緩和熱処理とは積層過程に生じる歪が緩和
されるような処理条件下で熱処理されれば良く、ある程
度応力が加わっていても良い。例えば、複数の回路基板
を相互に接着させることなく重ねられているような応力
が加わっていても良い。しかし両端を固定するが如き緊
張状態の熱処理は不適当である。The relaxation heat treatment referred to in the present invention may be heat treatment under processing conditions such that strain generated during the lamination process is relaxed, and stress may be applied to some extent. For example, stress may be applied as if a plurality of circuit boards were stacked on top of each other without being bonded to each other. However, heat treatment under tension, such as fixing both ends, is inappropriate.
かかる緩和熱処理は積層接着し、冷却後に行なってもよ
いし、積層接着後、冷却過程で行なっても良い。緩和熱
処理に要する時間は緩和熱処理の温度がガラス転移温度
に近い程、長時間を要し、積層の際に加わった歪の程度
にも依存する。Such relaxing heat treatment may be performed after lamination and adhesion and cooling, or may be performed during the cooling process after lamination and adhesion. The time required for the relaxation heat treatment is longer as the temperature of the relaxation heat treatment is closer to the glass transition temperature, and it also depends on the degree of strain applied during lamination.
[実施例]
(測定法)
熱収縮率:
多層回路基板を縦横100mmに切り出し、押出方向に
平行及び垂直に長さが約LOOmmのクロスを刻印し、
平面上に静置し、透明アクリル板を載置し、その上から
その長さを顕微鏡で測定した。次いでアクリル板を除き
、多層回路基板をコピー用紙上に載せて、所定の温度の
熱風オーブン中に10分間装いた。ついで常温まで放置
した後における長さを測定前と同様に顕微鏡で測定した
。このような操作を3回繰り返してその平均値から熱収
縮率を求めた。[Example] (Measurement method) Heat shrinkage rate: A multilayer circuit board was cut into 100 mm in length and width, and a cross with a length of about LOO mm was stamped parallel and perpendicular to the extrusion direction.
It was placed on a flat surface, a transparent acrylic plate was placed on it, and its length was measured from above using a microscope. Next, the acrylic board was removed, the multilayer circuit board was placed on copy paper, and placed in a hot air oven at a predetermined temperature for 10 minutes. Then, after being left to stand at room temperature, the length was measured using a microscope in the same manner as before measurement. This operation was repeated three times and the heat shrinkage rate was determined from the average value.
(比較例)
市販ポリフェニレンスルフィドフィルム三枚それぞれの
一方の面に銀ペーストを塗り、150℃で乾燥後、28
3℃で5分子熱し、その温度で初圧を10kg/cm2
とし4分間プレス積層した。次いで3時間かけてガラス
転移温度以下にまで徐冷した。この多層回路基板にIC
等を230℃でハンダ付けし、冷却した。その熱収縮率
は熱可塑性樹脂の押出方向に0−6%、押出方向に垂直
方向に0.8%であり、湾曲が相当程度認められた。(Comparative example) Silver paste was applied to one side of each of three commercially available polyphenylene sulfide films, and after drying at 150°C,
Heat 5 molecules at 3℃ and increase the initial pressure to 10kg/cm2 at that temperature.
Then, press lamination was performed for 4 minutes. Then, it was slowly cooled down to below the glass transition temperature over 3 hours. IC on this multilayer circuit board
etc. were soldered at 230°C and cooled. The heat shrinkage rate was 0-6% in the extrusion direction of the thermoplastic resin and 0.8% in the direction perpendicular to the extrusion direction, and a considerable degree of curvature was observed.
(実施例)
比較例のハンダ付けする前の多層回路基板を230℃で
10分間緩和熱処理した後に230℃でIC等をハンダ
付けし、冷却した。その熱収縮率は熱可塑性樹脂の押出
方向に0.1%以下、押出方向に垂直方向に0.1%以
下であり、それに伴い湾曲もほぼ認められ難い程度にま
で抑えられた。(Example) The multilayer circuit board of Comparative Example before soldering was subjected to relaxation heat treatment at 230° C. for 10 minutes, and then IC etc. were soldered at 230° C. and cooled. The heat shrinkage rate was 0.1% or less in the extrusion direction of the thermoplastic resin and 0.1% or less in the direction perpendicular to the extrusion direction, and the curvature was also suppressed to an almost unnoticeable level.
[本発明の効果]
本発明により多層回路基板は従来に比し熱収縮 ′
率がほぼ無視できる程度となり、湾曲を抑えることがで
きた。[Effects of the present invention] According to the present invention, the multilayer circuit board can be heat-shrinked compared to the conventional one.
The ratio became almost negligible, making it possible to suppress the curvature.
Claims (1)
なる回路基板複数枚を加圧接着後、その結晶性熱可塑性
樹脂の結晶融点未満、ガラス転移温度以上で緩和熱処理
することを特徴とする多層回路基板の製造方法(1) After bonding a plurality of circuit boards made of an insulating layer and a conductor layer made of a crystalline thermoplastic resin under pressure, a relaxation heat treatment is performed at a temperature below the crystal melting point and above the glass transition temperature of the crystalline thermoplastic resin. A method for manufacturing a multilayer circuit board
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31657990A JPH04186797A (en) | 1990-11-20 | 1990-11-20 | Manufacture of multi-layer circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31657990A JPH04186797A (en) | 1990-11-20 | 1990-11-20 | Manufacture of multi-layer circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04186797A true JPH04186797A (en) | 1992-07-03 |
Family
ID=18078664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31657990A Pending JPH04186797A (en) | 1990-11-20 | 1990-11-20 | Manufacture of multi-layer circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04186797A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5942779A (en) * | 1995-02-14 | 1999-08-24 | Canon Kabushiki Kaisha | Reduced-cost, flash memory element and memory apparatus |
-
1990
- 1990-11-20 JP JP31657990A patent/JPH04186797A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5942779A (en) * | 1995-02-14 | 1999-08-24 | Canon Kabushiki Kaisha | Reduced-cost, flash memory element and memory apparatus |
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