JPH04177356A - Processing method and device of photosensitive planographic printing plate - Google Patents
Processing method and device of photosensitive planographic printing plateInfo
- Publication number
- JPH04177356A JPH04177356A JP30641690A JP30641690A JPH04177356A JP H04177356 A JPH04177356 A JP H04177356A JP 30641690 A JP30641690 A JP 30641690A JP 30641690 A JP30641690 A JP 30641690A JP H04177356 A JPH04177356 A JP H04177356A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- photosensitive
- plate
- developing
- planographic printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 83
- 238000003672 processing method Methods 0.000 title description 6
- 238000012545 processing Methods 0.000 claims abstract description 48
- 238000011161 development Methods 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 24
- 230000003287 optical effect Effects 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 2
- 239000000725 suspension Substances 0.000 abstract 1
- -1 aromatic diazonium salt Chemical class 0.000 description 59
- 230000018109 developmental process Effects 0.000 description 25
- 239000007788 liquid Substances 0.000 description 20
- 150000003839 salts Chemical class 0.000 description 20
- 239000000243 solution Substances 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 15
- 229920005989 resin Polymers 0.000 description 15
- 239000011347 resin Substances 0.000 description 15
- 238000005406 washing Methods 0.000 description 15
- 230000010354 integration Effects 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- 239000002736 nonionic surfactant Substances 0.000 description 11
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 238000001514 detection method Methods 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- 239000004698 Polyethylene Substances 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 235000014113 dietary fatty acids Nutrition 0.000 description 7
- 239000000194 fatty acid Substances 0.000 description 7
- 229930195729 fatty acid Natural products 0.000 description 7
- 229920000573 polyethylene Polymers 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 159000000000 sodium salts Chemical class 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 5
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000003093 cationic surfactant Substances 0.000 description 5
- 150000004665 fatty acids Chemical class 0.000 description 5
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 4
- 229910052913 potassium silicate Inorganic materials 0.000 description 4
- 235000019353 potassium silicate Nutrition 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ALKYHXVLJMQRLQ-UHFFFAOYSA-N 3-Hydroxy-2-naphthoate Chemical compound C1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 ALKYHXVLJMQRLQ-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 239000004111 Potassium silicate Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 3
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 3
- 235000019252 potassium sulphite Nutrition 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 235000019795 sodium metasilicate Nutrition 0.000 description 3
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- GLDQAMYCGOIJDV-UHFFFAOYSA-N 2,3-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1O GLDQAMYCGOIJDV-UHFFFAOYSA-N 0.000 description 2
- UIAFKZKHHVMJGS-UHFFFAOYSA-N 2,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1O UIAFKZKHHVMJGS-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- KDVYCTOWXSLNNI-UHFFFAOYSA-N 4-t-Butylbenzoic acid Chemical compound CC(C)(C)C1=CC=C(C(O)=O)C=C1 KDVYCTOWXSLNNI-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 2
- 229960004050 aminobenzoic acid Drugs 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 229940118056 cresol / formaldehyde Drugs 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- QNVRIHYSUZMSGM-UHFFFAOYSA-N hexan-2-ol Chemical compound CCCCC(C)O QNVRIHYSUZMSGM-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- DJEHXEMURTVAOE-UHFFFAOYSA-M potassium bisulfite Chemical compound [K+].OS([O-])=O DJEHXEMURTVAOE-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 235000010259 potassium hydrogen sulphite Nutrition 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 150000008054 sulfonate salts Chemical class 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- VKFFEYLSKIYTSJ-UHFFFAOYSA-N tetraazanium;phosphonato phosphate Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[O-]P([O-])(=O)OP([O-])([O-])=O VKFFEYLSKIYTSJ-UHFFFAOYSA-N 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 2
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- YUCTUWYCFFUCOR-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC YUCTUWYCFFUCOR-UHFFFAOYSA-N 0.000 description 1
- CUOSYYRDANYHTL-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC CUOSYYRDANYHTL-UHFFFAOYSA-N 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- BFXKJHOJSIMHSJ-UHFFFAOYSA-N 1-(hexadecoxymethyl)pyridin-1-ium Chemical class CCCCCCCCCCCCCCCCOC[N+]1=CC=CC=C1 BFXKJHOJSIMHSJ-UHFFFAOYSA-N 0.000 description 1
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- FDCJDKXCCYFOCV-UHFFFAOYSA-N 1-hexadecoxyhexadecane Chemical compound CCCCCCCCCCCCCCCCOCCCCCCCCCCCCCCCC FDCJDKXCCYFOCV-UHFFFAOYSA-N 0.000 description 1
- HBXWUCXDUUJDRB-UHFFFAOYSA-N 1-octadecoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOCCCCCCCCCCCCCCCCCC HBXWUCXDUUJDRB-UHFFFAOYSA-N 0.000 description 1
- WAPNOHKVXSQRPX-UHFFFAOYSA-N 1-phenylethanol Chemical compound CC(O)C1=CC=CC=C1 WAPNOHKVXSQRPX-UHFFFAOYSA-N 0.000 description 1
- XDESGXRLUIHEJT-UHFFFAOYSA-N 2,3,4-tribenzylphenol Chemical compound C=1C=CC=CC=1CC1=C(CC=2C=CC=CC=2)C(O)=CC=C1CC1=CC=CC=C1 XDESGXRLUIHEJT-UHFFFAOYSA-N 0.000 description 1
- 229940082044 2,3-dihydroxybenzoic acid Drugs 0.000 description 1
- IWSZDQRGNFLMJS-UHFFFAOYSA-N 2-(dibutylamino)ethanol Chemical compound CCCCN(CCO)CCCC IWSZDQRGNFLMJS-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- CUZKCNWZBXLAJX-UHFFFAOYSA-N 2-phenylmethoxyethanol Chemical compound OCCOCC1=CC=CC=C1 CUZKCNWZBXLAJX-UHFFFAOYSA-N 0.000 description 1
- ZTFYJIXFKGPCHV-UHFFFAOYSA-N 2-propan-2-ylnaphthalene-1-sulfonic acid Chemical class C1=CC=CC2=C(S(O)(=O)=O)C(C(C)C)=CC=C21 ZTFYJIXFKGPCHV-UHFFFAOYSA-N 0.000 description 1
- ZDFKSZDMHJHQHS-UHFFFAOYSA-N 2-tert-butylbenzoic acid Chemical compound CC(C)(C)C1=CC=CC=C1C(O)=O ZDFKSZDMHJHQHS-UHFFFAOYSA-N 0.000 description 1
- XRHGYUZYPHTUJZ-UHFFFAOYSA-N 4-chlorobenzoic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1 XRHGYUZYPHTUJZ-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
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- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、感光性平版印刷版の処理方法及び処理装置に
関し、更に詳しくは、1台の自動現像機で現像条件を異
にする感光性平版印刷版を共通に処理する処理方法及び
処理装置に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a processing method and a processing apparatus for photosensitive lithographic printing plates, and more particularly, the present invention relates to a processing method and a processing apparatus for photosensitive lithographic printing plates, and more specifically, for processing photosensitive lithographic printing plates under different development conditions using one automatic developing machine. The present invention relates to a processing method and processing apparatus for commonly processing lithographic printing plates.
従来、1台の自動現像機で、現像条件を異にする感光性
平版印刷版を共通に処理する技術として下記のような技
術が知られている。BACKGROUND ART Conventionally, the following technology is known as a technology for commonly processing photosensitive lithographic printing plates having different development conditions using one automatic developing machine.
(イ)感光性平版印刷版の種類に応じた専用現像液の新
液を供給し使い捨てる。(特開昭61−248051号
、同62−21152号等)
(ロ)ポジ型感光性平版印刷版とネガ型感光性平版印刷
版とを、両者を共通に現像し得る現像液の新液で現像し
使い捨てる。(特開昭63−103256号)(ハ)ポ
ジ型感光性平版印刷版とネガ型感光性平版印刷版とを、
両者を共通に現像し得る現像液に補充液を補充して現像
液を繰り返し使用する。(b) Supply and dispose of new special developer solution according to the type of photosensitive lithographic printing plate. (JP-A-61-248051, JP-A No. 62-21152, etc.) (b) A positive-working photosensitive lithographic printing plate and a negative-working photosensitive lithographic printing plate are developed using a new developer that can commonly develop both. Develop and throw away. (Unexamined Japanese Patent Publication No. 63-103256) (c) A positive-working photosensitive lithographic printing plate and a negative-working photosensitive lithographic printing plate,
A replenisher is added to a developer that can commonly develop both types, and the developer is used repeatedly.
しかしながら、上記(イ)及び(ロ)のような技術には
、現像液を比較的多量に消費するため、処理コストが高
いという欠点があり、上記(ハ)のような技術には、ポ
ジを感光性平版印刷版とネガ型感光性平版印刷版とで現
像液を疲労させる度合が異なるため、補充の管理が困難
で、実用上安定な処理が障しいという問題がある。However, techniques such as (a) and (b) above have the disadvantage of high processing costs because they consume a relatively large amount of developer, and techniques such as (c) above have the disadvantage of high processing costs. Since the degree of fatigue of the developer differs between the photosensitive lithographic printing plate and the negative photosensitive lithographic printing plate, there is a problem in that it is difficult to manage replenishment and it is difficult to achieve a practically stable process.
本発明の目的は、1台の自動現像機で、現像条件を異に
する感光性平版印刷版を安定に共通に処理できる処理方
法及び処理装置を提供することである。An object of the present invention is to provide a processing method and a processing apparatus that can stably and commonly process photosensitive planographic printing plates having different development conditions using one automatic processor.
本発明のもう一つの目的は、1台の自動現像機で、現像
条件を異にする感光性平版印刷版を低減された処理コス
トで共通に処理できる処理方法及び処理装置を提供する
ことである。Another object of the present invention is to provide a processing method and processing apparatus that can commonly process photosensitive planographic printing plates with different development conditions at reduced processing costs using one automatic processing machine. .
上記本発明の目的は、下記(1)の処理方法及び下記(
2)の処理装置によって達成される。The purpose of the present invention is to provide the following treatment method (1) and the following (
2) is achieved by the processing device.
(1)自動現像機を用いて、露光済みの感光性平版印刷
版を現像処理する方法において、該感光性平版印刷版の
感光層面に露光により焼き付けられた識別記号によって
版の情報を判別し、その情報に応じて現像条件を自動的
に変えることを特徴とする感光性平版印刷版の処理方法
。(1) In a method of developing an exposed photosensitive lithographic printing plate using an automatic developing machine, information on the plate is determined by an identification symbol printed on the photosensitive layer surface of the photosensitive lithographic printing plate by exposure, A method for processing a photosensitive lithographic printing plate, characterized in that development conditions are automatically changed according to the information.
(2)感光性平版印刷版の感光層面に焼き付けられた識
別記号を読み取る手段、及び該手段で読み取った情報に
よって現像条件を自動外に変える手段を有することを特
徴とする感光性平版印刷版の処理装置。(2) A photosensitive lithographic printing plate characterized by having a means for reading an identification symbol printed on the surface of the photosensitive layer of the photosensitive lithographic printing plate, and a means for automatically changing development conditions based on the information read by the means. Processing equipment.
以下、本発明を図面を参照して説明する。Hereinafter, the present invention will be explained with reference to the drawings.
第1図は本発明に係る処理装置の実施例を示す構成図で
ある。同図において、Aは循環使用するポジ型感光性平
版印刷版とネガ型感光性平版印刷版とを共通に現像し得
る現像液(以下「ネガ・ポジ両用現像液」という)で現
像処理する現像部、Bは水洗を行う水洗部、Cはリン゛
ス液又は不感脂化液で処理するリンス・ガム部、PSは
感光性平版印刷版の搬送路である。FIG. 1 is a configuration diagram showing an embodiment of a processing device according to the present invention. In the figure, A is a development process in which a developing solution (hereinafter referred to as "negative/positive developer") that can commonly develop positive-working photosensitive lithographic printing plates and negative-working photosensitive lithographic printing plates that are used in circulation is used. B is a water washing section for washing with water, C is a rinse/gum section for processing with a rinsing liquid or a desensitizing liquid, and PS is a conveyance path for the photosensitive planographic printing plate.
これらの各処理部において、lは感光性平版印刷版を搬
送する搬送ローラ対、5は絞りローラ対、8は串ローラ
対、9はガイドローラ、lOは版面をこすって現像を促
進させるためのブラシローラ、11はシャワーパイプ、
14は現像液を入れる現像液タンク、15は水洗水を入
れる水洗水タンク、16はリンス液又は不感脂化液(ガ
ム液)を入れるリンス・ガム液タンク、17.18.1
9は現像液タンク14、水洗水タンク15、リンス・ガ
ム液タンクからそれぞれ処理液をシャワーパイプ11へ
送るポンプ、20は現像補充液を入れる補充液タンク、
21は補充装置で、送液用定量ポンプ、及び補充液タン
ク20内の現像補充液のエンプティを検出するセンサの
検知結果によってブザーを作動する機構を有し、該送液
用定量ポンプは、後記の流量制御回路37による制御系
による他にマニュアルでも作動し得るようになっている
。22は現像液タンク14、水洗水タンク15、リンス
・ガム液タンク16からのそれぞれのオーバーフローを
図示しないオーバーフロータンクへ導く配管である。3
0は面積測定反射センサで、複数の光センサを搬送路P
Sと直交する水平方向に等間隔に配設したものである。In each of these processing sections, 1 is a pair of transport rollers that transport the photosensitive planographic printing plate, 5 is a squeeze roller pair, 8 is a skewer roller pair, 9 is a guide roller, and 1O is a pair of rollers for rubbing the plate surface to accelerate development. Brush roller, 11 is a shower pipe,
14 is a developer tank containing a developer, 15 is a washing water tank containing washing water, 16 is a rinse/gum liquid tank containing a rinsing liquid or desensitizing liquid (gum liquid), 17.18.1
Reference numeral 9 denotes a pump that sends the processing liquid from the developer tank 14, the washing water tank 15, and the rinse/gum liquid tank to the shower pipe 11, and 20 denotes a replenisher tank for storing the developer replenisher.
Reference numeral 21 denotes a replenishment device, which has a metering pump for feeding liquid and a mechanism that operates a buzzer based on the detection result of a sensor that detects empty developer replenisher in the replenisher tank 20. The metering pump for liquid feeding is described later. In addition to the control system using the flow rate control circuit 37, it can also be operated manually. Reference numeral 22 denotes piping that leads the overflows from the developer tank 14, the washing water tank 15, and the rinse/gum liquid tank 16 to an overflow tank (not shown). 3
0 is an area measurement reflection sensor, and multiple optical sensors are connected to the conveyance path P.
They are arranged at equal intervals in the horizontal direction perpendicular to S.
該センサは発光素子と受光素子を有し、挿入された感光
性平版印刷版の表面に発光素子から照射された光の反射
光を受光素子で受けて感光性平版印刷版の存在を検知す
る。31は版幅検出回路で、面積測定反射センサ30か
らの板検出信号により版幅を検出し、版面積積算回路3
2で感光性平版印刷版の面積を検出し得るようになって
いる。The sensor has a light emitting element and a light receiving element, and detects the presence of the photosensitive lithographic printing plate by receiving reflected light from the light emitting element onto the surface of the inserted photosensitive lithographic printing plate. 31 is a plate width detection circuit, which detects the plate width based on the plate detection signal from the area measurement reflection sensor 30, and detects the plate width by the plate area integration circuit 3.
2, the area of the photosensitive planographic printing plate can be detected.
33は感光性平版印刷版の感光層面に露光により焼き付
けられた識別記号を読み取る光読み取りセンサである。Reference numeral 33 denotes an optical reading sensor that reads an identification symbol printed on the photosensitive layer surface of the photosensitive lithographic printing plate by exposure.
34はネガ/ポジ版判別回路で、光読み取りセンサ30
により検出された信号によりネガ型とポジ型との判別を
行うものである。35は稼働。34 is a negative/positive plate discrimination circuit, and an optical reading sensor 30
A negative type and a positive type are discriminated based on the signal detected by the . 35 is in operation.
休止時間積算回路で、感光性平版印刷版の処理による現
像液の疲労(処理疲労)及び空気中の炭酸ガスの吸収に
よる活性度の低下(経時疲労)に対応する補充を行うた
めのものであり、処理装置の電源スィッチ(図示せず)
の開閉により処理装置の稼働及び休止を検知し、稼働時
間及び休止時間をそれぞれ積算し、これらの各状態にお
ける経時疲労に対応する補充量を求める。上記版面積信
号及び経時疲労量に対応する信号は流量制御回路37に
入力され、予め定めた関数関係に基づく補充量の補充が
なされるよう、ポンプ駆動回路38を介して補充装置2
1を制御するように構成されている。This is a rest time integration circuit that performs replenishment in response to fatigue of the developer due to processing of photosensitive planographic printing plates (processing fatigue) and decrease in activity due to absorption of carbon dioxide gas in the air (aging fatigue). , processing equipment power switch (not shown)
The operation and rest of the processing equipment are detected by the opening and closing of the processing equipment, the operating time and the rest time are respectively integrated, and the replenishment amount corresponding to fatigue over time in each of these states is determined. The plate area signal and the signal corresponding to the amount of fatigue over time are input to the flow rate control circuit 37, and are sent to the replenishing device 2 via the pump drive circuit 38 so that the replenishment amount is refilled based on a predetermined functional relationship.
1.
上記関数関係については公知の技術を適用することがで
きる。Known techniques can be applied to the above functional relationship.
次に、第1図に基づいてその動作を説明する。Next, the operation will be explained based on FIG.
感光性平版印刷版が図上左端から処理装置に挿入される
と、面積測定反射センサ30で感光性平版印刷版を検出
し、この検出された信号に基づき版幅検出回路31及び
版面積積算回路32により版面積が計算され、この信号
が流量制御回路37に入力され、また、稼働・休止積算
回路35からの信号が流量制御回路37に入力される。When a photosensitive planographic printing plate is inserted into the processing device from the left end in the figure, the photosensitive planographic printing plate is detected by the area measurement reflection sensor 30, and based on the detected signal, the plate width detection circuit 31 and the plate area integration circuit are activated. 32 calculates the plate area, and this signal is input to the flow rate control circuit 37, and a signal from the operation/pause integration circuit 35 is input to the flow rate control circuit 37.
上記感光性平版印刷版は、現像部Aにおいて、現像液タ
ンク14内のネガ・ポジ両用現像液がポンプ17で送ら
れてシャワーパイプ11からその版面に供給され、ブラ
シローラlOで版面がこすられ、絞りローラ対5でその
表裏面に付着している現像液及び感光性平版印刷版の感
光層の溶出物が除去されて現像を終了する。次いで、該
感光性平版印刷版は水洗部Bへ搬送され、水洗水タンク
15に入れられた水洗水がポンプ18によってシャワー
パイプ11から感光性平版印刷版の版面に供給され水洗
され、絞りローラ7でその表裏面の付着物が除去され、
次いで、該感光性平版印刷版はリンス・ガム部cA搬送
され、リンス・ガムタンク16に入れられたリンス液又
は不感脂化液がポンプ24によってシャワーパイプ11
からその版面に供給され、絞りローラ7により必要量を
残して除去され、処理を終わる。In the photosensitive planographic printing plate, in the developing section A, the negative/positive developer in the developer tank 14 is sent by the pump 17 and supplied to the plate surface from the shower pipe 11, and the plate surface is rubbed by the brush roller IO. The developing solution and the eluate of the photosensitive layer of the photosensitive lithographic printing plate adhering to the front and back surfaces of the plate are removed by a squeeze roller pair 5, and the development is completed. Next, the photosensitive planographic printing plate is transported to the washing section B, and the washing water put in the washing water tank 15 is supplied from the shower pipe 11 to the plate surface of the photosensitive planographic printing plate by the pump 18, and the plate surface is washed with water. The deposits on the front and back surfaces are removed,
Next, the photosensitive planographic printing plate is transported to the rinse gum section cA, and the rinse liquid or desensitizing liquid put in the rinse gum tank 16 is pumped into the shower pipe 11 by the pump 24.
The paper is supplied to the plate surface from the paper, and is removed by the squeezing roller 7, leaving only the necessary amount, and the processing is completed.
上記処理が施された後、光読み取りセンサ33で上記感
光性平版印刷版の版面の識別記号が読み取られ、ネガ/
ポジ版判別回路でポジ型とネガ型の判別がされ、この判
別信号が流量制御回路37に入力される。流量制御回路
37によりこの判別信号は前記面積積算回路25からの
版面積の信号及び稼働・休止積算回路35からの処理疲
労の信号と共に処理されて、予め定めた関数関係に基づ
いた現像補充量になるよう補充装置21が制御され補充
液タンク20中の現像補充液が現像タンク14へ補充さ
れる。After the above processing is performed, the optical reading sensor 33 reads the identification symbol on the plate surface of the photosensitive planographic printing plate, and the negative/
A positive plate discrimination circuit discriminates between a positive type and a negative type, and this discrimination signal is input to the flow rate control circuit 37. This discrimination signal is processed by the flow rate control circuit 37 together with the plate area signal from the area integration circuit 25 and the processing fatigue signal from the operation/pause integration circuit 35, and the development replenishment amount is determined based on a predetermined functional relationship. The replenishing device 21 is controlled so that the developer replenisher in the replenisher tank 20 is replenished into the developer tank 14.
第2図は本発明に係る別の実施例を示す処理装置の構成
図である。同図において、Aは循環使用されるネガ・ポ
ジ両用現像液で現像を行う現像部、Bは水洗部、Cはリ
ンス液又は不感脂化液で処理するリンス・ガム部、PS
は感光性平版印刷版の搬送路である。FIG. 2 is a block diagram of a processing device showing another embodiment according to the present invention. In the figure, A is a developing section that performs development with a negative/positive developing solution that is used in circulation, B is a water washing section, C is a rinse/gum section that is processed with a rinsing solution or a desensitizing solution, and PS
is the conveyance path of the photosensitive planographic printing plate.
これらの各処理部において、■は感光性平版印刷版を搬
送する搬送ローラ対、5は絞りローラ対、8aは串ロー
ラ、8bは串ローラ対、9はガイドローラ、lOaはブ
ラシローラ、12はシャワーパイプ、14aは現像タン
ク、15は水洗水タンク、16はリンス液又は不感脂化
液(ガム液)を入れるリンス・ガムタンク、17aは現
像タンク14a内の現像液を流動させるためのポンプ、
18.19はシャワーパイプ12へそれぞれの処理液を
圧送するポンプ、20は現像補充液を入れる補充液タン
ク、21は補充装置、25はオーバーフロー液をオーバ
ーフロータンク(図示せず)へ導く配管、27は現像タ
ンク14a内の現像液を加熱し所定の温肩に保つための
サーモスタット付きヒータである。In each of these processing sections, ■ is a pair of transport rollers that transport the photosensitive planographic printing plate, 5 is a squeeze roller pair, 8a is a skewer roller, 8b is a skewer roller pair, 9 is a guide roller, lOa is a brush roller, and 12 is a pair of skewer rollers. Shower pipe, 14a is a developing tank, 15 is a washing water tank, 16 is a rinse/gum tank containing a rinsing liquid or desensitizing liquid (gum liquid), 17a is a pump for flowing the developer in the developing tank 14a,
18. 19 is a pump that pumps each processing solution to the shower pipe 12; 20 is a replenisher tank for storing a developer replenisher; 21 is a replenisher; 25 is a pipe that leads the overflow solution to an overflow tank (not shown); 27 is a heater with a thermostat that heats the developer in the developer tank 14a and maintains it at a predetermined temperature level.
40は光センサで、搬送されている感光性平版印刷版の
表面に発光素子から光を照射し、その反射光を受光素子
で受けて感光性平版印刷版の存在を検知する。41は駆
動制御回路で、光センサ40からの検知信号が入力され
るとローラ駆動回路42に信号が出され、ローラ駆動モ
ータ43が駆動されて搬送路PSに沿って設けられた各
ローラが駆動されるようになっている。また、光センサ
40の検知信号の入力により駆動制御回路41から信号
が出され、ポンプ駆動回路44によりポンプ17a、1
8.19が作動するようになっている。Reference numeral 40 denotes an optical sensor that irradiates light from a light emitting element onto the surface of the photosensitive planographic printing plate being conveyed, and receives the reflected light with a light receiving element to detect the presence of the photosensitive planographic printing plate. 41 is a drive control circuit, and when a detection signal from the optical sensor 40 is input, a signal is output to the roller drive circuit 42, and the roller drive motor 43 is driven to drive each roller provided along the conveyance path PS. It is now possible to do so. In addition, a signal is output from the drive control circuit 41 in response to the input of the detection signal of the optical sensor 40, and the pump drive circuit 44 causes the pumps 17a, 1
8.19 is now working.
33は光読み取りセンサ、45は識別記号判別回路、4
6は版面積積算回路、47はネガ/ポジ版判別回路、3
5は稼働・休止時間積算回路、37は流量制御回路、3
8はポンプ駆動回路である。光読み取りセンサ33で読
み取られた信号は識別記号判別回路45で判断され、版
面積積算回路46及びネガ/ポジ版判別回路47に入力
されて、それぞれ感光性平版印刷版の面積及びネガ型と
ポジ型別の各信号が流量制御回路37に入力され、第1
図の場合と同様にして制御された補充量の補充液が補充
される。光読み取りセンサ33、稼働・休止時間積算回
路35、流量制御回路37、ポンプ駆動回路38の構造
及び機能は第1図におけると同じである。33 is an optical reading sensor, 45 is an identification symbol discrimination circuit, 4
6 is a plate area integration circuit, 47 is a negative/positive plate discrimination circuit, 3
5 is an operation/stop time integration circuit, 37 is a flow rate control circuit, 3
8 is a pump drive circuit. The signal read by the optical reading sensor 33 is judged by an identification symbol discrimination circuit 45, and inputted to a plate area integration circuit 46 and a negative/positive plate discrimination circuit 47, which determine the area of the photosensitive planographic printing plate and whether it is a negative type or a positive type, respectively. Each type-specific signal is input to the flow rate control circuit 37, and the first
A controlled amount of replenishment fluid is replenished in the same manner as in the case shown in the figure. The structures and functions of the optical reading sensor 33, the operating/inactive time integration circuit 35, the flow rate control circuit 37, and the pump drive circuit 38 are the same as in FIG.
次に、第2図を用いてその動作を説明する。Next, the operation will be explained using FIG. 2.
まず、感光性平版印刷版が図上左端がら処理装置に挿入
されると、光センサ40により検知され、その検知信号
が駆動制御回路41に入力される。ローラ駆動回路制御
回路41はローラ駆動回路42に出力し、ローラ駆動モ
ータが駆動され、同時にポンプ駆動回路44に出力され
ポンプ17a、18.19が作動する。First, when a photosensitive lithographic printing plate is inserted into the processing device from the left end in the figure, it is detected by the optical sensor 40, and the detection signal is input to the drive control circuit 41. The roller drive circuit control circuit 41 outputs an output to the roller drive circuit 42 to drive the roller drive motor, and at the same time outputs to the pump drive circuit 44 to operate the pumps 17a and 18.19.
感光性平版印刷版は、現像部Aにおいて、上記の補充が
行われる現像液タンク14a内のネガ・ポジ両用現像液
に浸漬され、ブラシローラ10aで版面がこすられ、絞
りローラ対5でその表裏面に付着している現像液及び感
光性平版印刷版の感光層の溶出物が除去されて現像を終
了する。次いで、感光性平版印刷版は水洗部B、次いで
リンス・ガム部Cへ搬送され、第1図におけると同様に
して水洗及び後処理がなされる。In the developing section A, the photosensitive planographic printing plate is immersed in the negative/positive developer in the developer tank 14a, which is replenished as described above. The developer adhering to the back surface and the eluate of the photosensitive layer of the photosensitive lithographic printing plate are removed, and development is completed. Next, the photosensitive planographic printing plate is conveyed to washing section B and then to rinse/gum section C, where it is washed with water and subjected to post-processing in the same manner as in FIG.
リンス・ガム部Cでの処理が終わった感光性平版印刷版
はその版面に形成された識別記号画像が光読み取りセン
サ33で読み取られ、その信号が識別記号判別回路45
で判断され、版面積積算回路46で版面積を求める処理
、及びネガ/ポジ版判別回路47でポジ型とネガ型の判
別がされ、この面積信号、ネガ型とポジ型との判別信号
及び稼働、休止積算回路35からの処理疲労信号が流量
制御回路37に入力される。流量制御回路37によりこ
れらの信号が処理されて、予め定めた関数関係に基づい
た現像補充量になるよう補充装置21が制御され補充液
タンク20中の現像補充液が現像タンク14へ補充され
る。The identification symbol image formed on the photosensitive planographic printing plate that has been processed in the rinse gum section C is read by the optical reading sensor 33, and the signal is sent to the identification symbol discrimination circuit 45.
The plate area is determined by the plate area integration circuit 46, and the negative/positive plate discrimination circuit 47 discriminates between positive type and negative type, and this area signal, negative type and positive type discrimination signal, and operation , the processing fatigue signal from the pause integration circuit 35 is input to the flow rate control circuit 37. These signals are processed by the flow rate control circuit 37, and the replenishing device 21 is controlled so that the developer replenishment amount is based on a predetermined functional relationship, and the developer replenisher in the replenisher tank 20 is replenished into the developer tank 14. .
本発明において識別記号を検出するセンサの位置は、処
理装置への挿入前、現像の途中、処理装置から排出後の
いずれでもよいが、挿入前か現像後が好ましく、特にレ
ジスト状の識別記号画像が形成される現像後が好ましい
。In the present invention, the position of the sensor for detecting the identification symbol may be before insertion into the processing device, during development, or after ejection from the processing device, but it is preferably before insertion or after development, especially when the identification symbol image in resist form is detected. is preferably formed after development.
識別記号とその読み取り装置には、例えば、公知の複写
機に給送される原稿の識別記号とその読取装置、バーコ
ードとバーコード・スキャナ等のようなものを使用する
ことができる。As the identification symbol and its reading device, for example, a known identification symbol and its reading device for a document fed to a copying machine, a bar code and a bar code scanner, etc. can be used.
識別記号にのせる情報としては、版の種類(板積、品種
、サイズ、補充量等)の他に、現像条件(時間、ブラシ
条件、温度等)や露光条件、デリバリ−条件(フィルム
、ps版、印刷物等)等がある。The information to be placed on the identification symbol includes the type of plate (plate volume, type, size, replenishment amount, etc.), development conditions (time, brush conditions, temperature, etc.), exposure conditions, and delivery conditions (film, PS, etc.). editions, printed matter, etc.).
識別記号を焼き付ける手段は、原稿フィルム上に識別記
号画像を設ける方法、あるいは別に識別記号画像を有す
るフィルムを用意しておき、該フィルムを焼き付ける方
法のいずれも可能である。識別記号の位置は、版の端部
(印刷のくわえにあたる)から5c■以内の端部とする
ことが好ましい。The means for printing the identification symbol can be either a method of providing an identification symbol image on an original film, or a method of separately preparing a film having an identification symbol image and printing the film. The position of the identification symbol is preferably within 5 cm from the edge of the plate (corresponding to the printing grip).
また、本発明方法において、現像後に識別記号を読み取
り後、消去することが好ましい。Furthermore, in the method of the present invention, it is preferable that the identification symbol be read and then erased after development.
本発明が適用される感光性平版印刷版には下記のような
感光性組成物の層を親水性面を有する支持体の該面に設
けたものが含まれる。Photosensitive lithographic printing plates to which the present invention is applied include those in which a layer of a photosensitive composition as described below is provided on the surface of a support having a hydrophilic surface.
1)ジアゾ化合物を含む感光性組成物
この感光性組成物中のジアゾ化合物は、例えば芳香族ジ
アゾニウム塩とホルムアルデヒド又はアセトアルデヒド
との縮合物で代表されるジアゾ樹脂である。例えば、p
−ジアゾジフェニルアミンとホルムアルデヒド又はアセ
トアルデヒドとの縮合物の塩、例えばヘキサフルオロホ
ウ燐酸塩、テトラフルオロホウ酸塩、過塩素酸塩又は過
ヨウ素酸塩と前記縮合物との反応生成物であるジアゾ樹
脂無機塩や、米国特許3,300,309号明細書中に
記載されているような、前記縮合物とスルホン酸類との
反応生成物であるジアゾ樹脂有機塩等が挙げられる。更
にジアゾ樹脂が結合剤と共に使用された組成物が挙げら
れる。かかる結合剤としては種々の高分子化合物を使用
することができるが、例えば特開昭54−98613号
公報に記載されているような芳香族性水酸基を有する単
量体、例えば、N−(4−ヒドロキシフェニル)アクリ
ルアミド、N−(4−ヒドロキシフェニル)メタクリル
アミド、0−111−、まt;はp−ヒドロキシスチレ
ン、’−1”−1またはp−ヒドロキシフェニルメタク
リレート等と他の単量体との共重合体、米国特許4,1
23,276号明細書中に記載されているようなヒドロ
キシエチルアクリレート単位又はヒドロキシエチルメタ
クリレート単位を主な繰り返し単位として含むポリマー
、シェラツク、ロジン等の天然樹脂、ポリビニルアルコ
ール、米国特許3,751,257号明細書中に記載さ
れているようなポリアミド樹脂、米国特許3,660,
097号明細書中に記載されているような線状ポリウレ
タン樹脂、ポリビニルアルコールの7タレート化樹脂、
ビスフェノールAとエピクロルヒドリンから縮合された
エポキシ樹脂、酢酸セルロース、セルロースアセテート
フタレート等のセルロース誘導体が包含される。1) Photosensitive composition containing a diazo compound The diazo compound in this photosensitive composition is, for example, a diazo resin represented by a condensate of an aromatic diazonium salt and formaldehyde or acetaldehyde. For example, p
- diazo resin inorganic salts of condensates of diazodiphenylamine and formaldehyde or acetaldehyde, such as reaction products of said condensates with hexafluoroborophosphates, tetrafluoroborates, perchlorates or periodates; Salts and diazo resin organic salts which are reaction products of the above condensates and sulfonic acids as described in US Pat. No. 3,300,309 can be mentioned. Also included are compositions in which a diazo resin is used together with a binder. Various polymer compounds can be used as such a binder, but monomers having an aromatic hydroxyl group such as those described in JP-A No. 54-98613, such as N-(4 -hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, 0-111-, p-hydroxystyrene, '-1''-1 or p-hydroxyphenyl methacrylate, etc. and other monomers copolymer with US Pat. No. 4,1
Polymers containing hydroxyethyl acrylate units or hydroxyethyl methacrylate units as the main repeating unit as described in No. 23,276, natural resins such as shellac, rosin, polyvinyl alcohol, U.S. Pat. Polyamide resins such as those described in U.S. Pat. No. 3,660,
Linear polyurethane resins as described in No. 097, polyvinyl alcohol 7-talate resins,
Epoxy resins condensed from bisphenol A and epichlorohydrin, cellulose derivatives such as cellulose acetate and cellulose acetate phthalate are included.
2)O−キノンジアジド化合物を含む感光性組成物0−
キノンジアジド化合物を含む感光性組成物においては、
0−キノンジアジド化合物とアルカリ可溶性樹脂を併用
した組成物が挙げられる。2) Photosensitive composition 0- containing an O-quinonediazide compound
In a photosensitive composition containing a quinonediazide compound,
Examples include compositions in which an 0-quinonediazide compound and an alkali-soluble resin are used in combination.
0−キノンジアジド化合物としては、例えば0−ナフト
キノンジアジドスルホン酸と、フェノール類及びアルデ
ヒド又はケトンの重縮合樹脂とのエステル化合物が挙げ
られる。Examples of the 0-quinonediazide compound include ester compounds of 0-naphthoquinonediazide sulfonic acid and polycondensation resins of phenols and aldehydes or ketones.
前記フェノール類としては、例えば、フェノール、0−
クレゾール、m−クレゾール、p−クレゾール、3.5
−キシレ/−ル、カルバクロール、チモール等のm個フ
エノール、カテコール、レゾルシン、ヒドロキノン等の
二価フェノール、ピロガロール、フロログルシン等の三
価フェノール等が挙げられる。前記アルデヒドとしては
ホルムアルデヒド、ベンズアルデヒド、アセトアルデヒ
ド、クロトンアルデヒド、フルフラール等が挙げられる
。又、前記ケトンとしてはアセトン、メチルエチルケト
ン等が挙げられる。Examples of the phenols include phenol, 0-
Cresol, m-cresol, p-cresol, 3.5
Examples include m-phenols such as -xyl/-, carvacrol, and thymol, dihydric phenols such as catechol, resorcinol, and hydroquinone, and trihydric phenols such as pyrogallol and phloroglucin. Examples of the aldehyde include formaldehyde, benzaldehyde, acetaldehyde, crotonaldehyde, and furfural. Further, examples of the ketone include acetone and methyl ethyl ketone.
前記重縮合樹脂の具体的な例としては、フェノール・ホ
ルムアルデヒド樹脂、m−クレゾール・ホルムアルデヒ
ド樹脂、”−1p−混合クレゾール・ホルムアルデヒド
樹脂、レゾルシン・ベンズアルデヒド樹脂、ピロガロー
ル・アセトン樹脂等が挙げられる。Specific examples of the polycondensation resin include phenol/formaldehyde resin, m-cresol/formaldehyde resin, "-1p-mixed cresol/formaldehyde resin, resorcinol/benzaldehyde resin, pyrogallol/acetone resin, and the like.
前記。−ナフトキノンジアジド化合物のフェノール類の
OH基に対する0−ナフトキノンジアジドスルホン酸の
縮合率(OH基1個に対する反応率)は15〜80%の
ものが包含される。Said. The condensation rate of 0-naphthoquinonediazide sulfonic acid with respect to the OH group of the phenol of the -naphthoquinonediazide compound (reaction rate with respect to one OH group) ranges from 15 to 80%.
0−キノンジアジド化合物としては特開昭58−434
51号公報に記載のある以下の化合物も使用できる。As a 0-quinonediazide compound, JP-A-58-434
The following compounds described in Publication No. 51 can also be used.
又、特公昭37−1953号、同37−3627号、同
37−13109号、同40〜26126号、同40−
3801号、同45−5604号、同45−27345
号、同51−13013号、特開昭48−96575号
、同48−63802号、同48−63802号各公報
に記載された1、2−キノンジアジド化合物をも挙げる
ことができる。Also, Special Publications No. 37-1953, No. 37-3627, No. 37-13109, No. 40-26126, No. 40-
No. 3801, No. 45-5604, No. 45-27345
1,2-quinonediazide compounds described in JP-A No. 51-13013, JP-A No. 48-96575, JP-A No. 48-63802, and JP-A No. 48-63802 can also be mentioned.
前記支持体としては、紙、プラスチック (例えばポリ
エチレン、ポリプロピレン、ポリスチレンなと)ラミネ
ート紙、アルミニウム (アルミニウム合金も含む)、
亜鉛、銅などのような金属の板、二酢酸セルロース、三
酢酸セルロース、プロピオン酸セルロース、ポリエチレ
ンテレフタレート、ポリエチレン、ポリプロピレン、ポ
リカーポ4−ト、ポリビニルアセタールなどのようなプ
ラスチックのフィルム、上記の如き金属がラミネートも
しくは蒸着された紙もしくはクロームメツキが施された
鋼板などが挙げられ、これらのうち特にアルミニウム及
びアルミニウム被覆された複合支持体が好ましい。Examples of the support include paper, plastic (for example, polyethylene, polypropylene, polystyrene), laminated paper, aluminum (including aluminum alloy),
Plates of metals such as zinc, copper, etc.; films of plastics such as cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate, polyethylene, polypropylene, polycarbonate, polyvinyl acetal, etc.; Examples include laminated or vapor-deposited paper or chrome-plated steel sheets, among which aluminum and aluminum-coated composite supports are particularly preferred.
又、アルミニウム材の表面は、保水性を高め感光層と密
着性を向上させる目的で粗面化処理されているものが包
含される。粗面化方法としては、一般に公知のブラシ研
磨法、ポール研磨法、電解エツチング、化学的エツチン
グ、液体ホーニング、サンドブラスト等の方法及びこれ
らの組合せが挙げられる。Further, the surface of the aluminum material may be roughened for the purpose of increasing water retention and adhesion to the photosensitive layer. Examples of the surface roughening method include generally known methods such as brush polishing, pole polishing, electrolytic etching, chemical etching, liquid honing, and sandblasting, and combinations thereof.
本発明方法に使用される少なくとも1つの循環使用する
現像液は、水を主たる溶媒とする(具体的には50重量
%以上が水からなる)アルカリ性現像液であり、ネガ・
ポジ両用現像液であることが好ましい。該現像液は及び
その補充液はいずれもケイ酸アルカリを含有し、かつ有
機溶媒及び界面活性剤の少なくとも1つを含有するpH
10以上、より好ましくは12以上のアルカリ水系現像
液であることが好ましい。At least one circulating developing solution used in the method of the present invention is an alkaline developing solution containing water as a main solvent (specifically, 50% by weight or more consists of water), and is an alkaline developing solution for negative and
It is preferable to use a developer for both positive and negative uses. The developer and its replenisher both contain an alkali silicate and have a pH of at least one of an organic solvent and a surfactant.
It is preferable to use an alkaline aqueous developer having a concentration of 10 or more, more preferably 12 or more.
ケイ酸アルカリとしては、例えばケイ酸カリウム、ケイ
酸ナトリウム、メタケイ酸ナトリウム、メタケイ酸カリ
ウム、ケイ酸アンモニウム等が挙げられる。ケイ酸アル
カリの現像液中の含有量は0.3〜10重量%の範囲が
好ましい。また、ケイ酸アルカリはS10.濃度で0,
1〜7.0重量%の範囲が好ましい。Examples of the alkali silicate include potassium silicate, sodium silicate, sodium metasilicate, potassium metasilicate, and ammonium silicate. The content of alkali silicate in the developer is preferably in the range of 0.3 to 10% by weight. In addition, alkali silicate is S10. 0 in concentration,
A range of 1 to 7.0% by weight is preferred.
現像液及び現像補充液にはケイ酸アルカリ以外のアルカ
リ剤を併用することができ、例えば、水酸化カリウム、
水酸化ナトリウム、水酸化リチウム、第三リン酸ナトリ
ウム、第ニリン酸ナトリウム、第三リン酸カリウム、第
ニリン酸カリウム、第三リン酸アンモニウム、第ニリン
酸アンモニウム、メタケイ酸ナトリウム、重炭酸ナトリ
ウム、炭酸ナトリウム、炭酸カリウム、炭酸アンモニウ
ムなどのような無機アルカリ剤、モノ、ジ又はトリエタ
ノールアミン及び水酸化テトラアルキルのような有機ア
ルカリ剤を併用することができる。Alkali agents other than alkali silicates can be used in combination with the developer and developer replenisher, such as potassium hydroxide,
Sodium hydroxide, lithium hydroxide, sodium triphosphate, sodium diphosphate, potassium triphosphate, potassium diphosphate, ammonium diphosphate, ammonium diphosphate, sodium metasilicate, sodium bicarbonate, carbonic acid Inorganic alkaline agents such as sodium, potassium carbonate, ammonium carbonate, etc., organic alkaline agents such as mono-, di- or triethanolamine and tetraalkyl hydroxide can be used in combination.
有機溶媒としては20’(:!おける水に対する溶解度
が10重量%以下のものが好ましく、例えば酢酸エチル
、酢酸プロピル、酢酸ブチル、酢酸ベンジル、エチレン
グリコールモノブチルエ−テル乳酸ブチル、レブリン酸
ブチルのようなカルボン酸エステル;エチルブチルケト
ン、メチルイソブチルケトン、シクロヘキサノンのよう
なケトン類;エチレングリコールモノブチルエーテル、
エチレングリコールベンジルエーテル、エチレングリコ
ールモノフェニルエーテル、ベンジルアサコール、メチ
ルフェニルカルビノール、n−アミルアルコール、メチ
ルアミルアルコールのようなアルコール類;キシレンの
ようなアルキル置換芳香族炭化水素;メチレンジクロラ
イド、エチレンジクロライド、モノクロルベンゼンのよ
うなハロゲン化炭化水素などがある。これらの有機溶媒
はそれぞれ単独又は2種以上を組合わせて使用すること
ができる。The organic solvent preferably has a solubility in water of 10% by weight or less in 20' (:! carboxylic acid esters such as; ketones such as ethyl butyl ketone, methyl isobutyl ketone, and cyclohexanone; ethylene glycol monobutyl ether,
Alcohols such as ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl asacol, methylphenyl carbinol, n-amyl alcohol, methyl amyl alcohol; alkyl-substituted aromatic hydrocarbons such as xylene; methylene dichloride, ethylene dichloride, These include halogenated hydrocarbons such as monochlorobenzene. These organic solvents can be used alone or in combination of two or more.
界面活性剤としてはノニオン、アニオン、カチオン及び
両性の各界面活性剤の少なくとも1種を用いることがで
きる。好ましくはノニオン界面活性剤である。As the surfactant, at least one of nonionic, anionic, cationic and amphoteric surfactants can be used. Preferably it is a nonionic surfactant.
ノニオン界面活性剤は大別するとポリエチレングリコー
ル型と多価アルコール型に分類することができ、どちら
も使用できるが、現像性能の点からポリエチレングリコ
ール型のノニオン界面活性剤が好ましく、その中でもエ
チレンオキシ基を3以上有し、かつI(LB値(HLB
はt(ydrophi 1e−Lipophile B
a1anceの略)が5以上(より好ましくは8〜20
)のノニオン界面活性剤がより好ましい。Nonionic surfactants can be broadly classified into polyethylene glycol type and polyhydric alcohol type, both of which can be used, but polyethylene glycol type nonionic surfactants are preferred from the viewpoint of developing performance, and among them, ethylene glycol type nonionic surfactants are preferred. 3 or more, and I (LB value (HLB
is t(hydrophi 1e-Lipophile B
a1ance) is 5 or more (more preferably 8 to 20)
) nonionic surfactants are more preferred.
ノニオン界面活性剤のうち、エチレンオキシ基とプロピ
レンオキシ基の両者を有するものが特に好ましく、その
なかでHLB値が8以上のものがより好ましい。Among nonionic surfactants, those having both an ethyleneoxy group and a propyleneoxy group are particularly preferred, and among these, those having an HLB value of 8 or more are more preferred.
ノニオン界面活性剤の好ましい例として下記−般式〔1
〕〜〔8〕で表される化合物が挙げられる。Preferred examples of nonionic surfactants include the following general formula [1
] to [8] are mentioned.
C1:] R−0−(CH2CH20)nHCH。C1:] R-0-(CH2CH20)nHCH.
(3) RO(CHzCHO)m (CH2CH2
O)nH(6) HO(Cx)l*o)a (Cs
HeO)b (CzH,0)cH(8) 8O−(
CH2CH20)nH〔1〕〜〔8〕式において、Rは
水素原子又は1価の有機基を表す。該有機基としては、
例えば直鎖もしくは分岐の炭素数1〜30の、置換基(
例えばアリール基(フェニル等))ををしていてもよい
アルキル基、アルキル部分が上記アルキル基であるアル
キルカルボニル基、置換基(例えばヒドロキシル基、上
記のようなアルキル基等)を有していてもよいフェニル
基等が挙げられる。alblclmlnlx及びyは各
々1−40の整数を表す。(3) RO(CHzCHO)m (CH2CH2
O)nH(6) HO(Cx)l*o)a (Cs
HeO)b (CzH,0)cH(8) 8O-(
CH2CH20)nH In formulas [1] to [8], R represents a hydrogen atom or a monovalent organic group. As the organic group,
For example, a linear or branched substituent having 1 to 30 carbon atoms (
For example, an alkyl group which may have an aryl group (such as phenyl), an alkyl carbonyl group whose alkyl moiety is the above-mentioned alkyl group, or an alkyl group having a substituent (such as a hydroxyl group or an alkyl group as described above). Examples include a phenyl group and the like. alblclmlnlx and y each represent an integer of 1-40.
ノニオン界面活性剤の具体例を示す。Specific examples of nonionic surfactants are shown below.
ポリエチレングリコール、ポリオキシエチレンラウリル
エーテル、ポリオキシエチレンノニルエーテル、ポリオ
キシエチレンセチルエーテル、ボリオキンエチレンステ
アリルエーテル、ポリオキシエチレンオレイルエーテル
、ポリオキシエチレンベヘニルエーテル、ポリオキシエ
チレンホリオキシプロピレンセチルエーテル、ポリオキ
シエチレンポリオキンプロピレンベヘニルエーテル、ポ
リオキシエチレンノニルフェニルエーテル、ポリオキン
エチレンオクチルフェニルエーテル、ポリオキシエチレ
ンステアリルアミン、ポリオキシエチレンオレイルアミ
ン、ポリオキシエチレンステアリン酸アミド、ポリオキ
シエチレンオレイン酸アミド、ポリオキシエチレンヒマ
シ油、ポリオキシエチレンアビエチルエーテル、ポリオ
キシエチレンラノリンエーテル、ポリオキシエチレンモ
ノラウレート、ポリオキシエチレンモノステアレート、
ポリオキシエチレングリセリルモノオレート、ポリオキ
ンエチレングリセルモノステアレート、ポリオキシエチ
レンプロピレングリコールモノステアレート、オキシエ
チレンオキシプロピレンブロックポリマー、ジスチレン
化フェノールポリエチレンオキンド付加物、トリベンジ
ルフェノールポリエチレンオキンド付加物、オクチルフ
ェノールポリオキシエチレンポリオキンプロピレン付加
物、グリセロールモノステアレート、ソルビタンモノラ
ウレート、ポリオキシエチレンソルビタンモノラウレー
ト等。Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, voriquin ethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether, polyoxyethylene holoxypropylene cetyl ether, poly Oxyethylene polyoxylene propylene behenyl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene ethylene octylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene stearamide, polyoxyethylene oleic acid amide, polyoxyethylene Castor oil, polyoxyethylene abiethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxyethylene monostearate,
Polyoxyethylene glyceryl monooleate, polyoxyethylene glycerol monostearate, polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene Oquindo adduct, tribenzylphenol polyethylene Oquindo adduct, octylphenol Polyoxyethylene polyoxine propylene adduct, glycerol monostearate, sorbitan monolaurate, polyoxyethylene sorbitan monolaurate, etc.
ノニオン界面活性剤の重量平均分子量は300〜100
00の範囲が好ましく、500〜5000の範囲が特に
好ましい。The weight average molecular weight of the nonionic surfactant is 300 to 100
A range of 00 is preferred, and a range of 500 to 5000 is particularly preferred.
アニオン型界面活性剤としては、高級アルコール(CS
−C2,)硫酸エステル塩類〔例えは、ラウリルアルコ
ールサルフェートのナトリウム塩、オクチルアルコール
サルフェートのナトリウム塩、ラウリルアルコールサル
フェートのアンモニウム塩、rTeepol−81J
(商品名・シェル化学製)、第二ナトリウムアルキル
サルフェートなと]、脂肪族アルコールリン際エステル
塩類(例えば、セチルアルコールリン酸エステルのナト
リウム塩など)、アルキルアリールスルホン酸塩類(例
えば、ドデシルベンゼンスルホン酸のナトリウム塩、イ
ソプロピルナフタレンスルホン酸のナトリウム塩、シナ
フタリンジスルホン酸のナトリム塩、メタニトロベンゼ
ンスルホン酸のナトリウム塩など)、アルキルアミドの
スルホン酸塩類(例えば、C1tHx 3CON(CH
X)CH2SO3N&など)、二塩基性脂肪酸エステル
のスルホン酸塩類(例えば、ナトリウムスルホコハク酸
ジオクチルエステル、ナトリウムスルホコハク酸ジヘキ
シルエステルなど)がある。As anionic surfactants, higher alcohols (CS
-C2,) Sulfuric ester salts [for example, sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, rTeepol-81J
(trade name, manufactured by Shell Chemical), dibasic sodium alkyl sulfate], aliphatic alcohol phosphorus ester salts (e.g., sodium salt of cetyl alcohol phosphate, etc.), alkylaryl sulfonates (e.g., dodecylbenzene sulfone), sodium salts of acids, sodium salts of isopropylnaphthalenesulfonic acid, sodium salts of sinaphthalene disulfonic acid, sodium salts of metanitrobenzenesulfonic acid, etc.), sulfonate salts of alkylamides (e.g., C1tHx 3CON(CH
X) CH2SO3N & etc.), sulfonic acid salts of dibasic fatty acid esters (for example, sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.).
これらの中で特にスルホン酸塩類が好適に用いられる。Among these, sulfonate salts are particularly preferably used.
カチオン界面活性剤はアミン型と第四アンモニウム塩型
に大別されるが、これらの何れをも用いることができる
。Cationic surfactants are broadly classified into amine type and quaternary ammonium salt type, and any of these can be used.
アミン型の例としては、ポリオキシエチレンアルキルア
ミン、N−アルキルプロピレンアミン、N−アルキルポ
リエチレンポリアミン、N−アルキルポリエチレンポリ
アミンジメチル硫酸塩、アルキルビグアニド、長鎖アミ
ンオキシド、アルキルイミダシリン、■−ヒドロキシエ
チルー2−アルキルイミダシリン、l−アセチルアミノ
エチル−2−アルキルイミダシリン、2−アルキル−4
−メチル−4−ヒドロキシメチルオキサゾリン等がある
。Examples of amine types include polyoxyethylene alkyl amine, N-alkyl propylene amine, N-alkyl polyethylene polyamine, N-alkyl polyethylene polyamine dimethyl sulfate, alkyl biguanide, long chain amine oxide, alkylimidacilline, ■-hydroxy Ethyl-2-alkylimidacyline, l-acetylaminoethyl-2-alkylimidacyline, 2-alkyl-4
-Methyl-4-hydroxymethyloxazoline and the like.
また、第四アンモニウム塩型の例としては、長鎖第1ア
ミン塩、アルキルトリメチルアンモニウム塩、ジアルキ
ルジメチルエチルアンモニウム塩、アルキルジメチルア
ンモニウム塩、アルキルジメチルベンジルアンモニウム
塩、アルキルピリジニウム塩、アルキルキノリニウム塩
、アルキルイソキノリニウム塩、アルキルピリジニウム
硫酸塩、ステアラミドメチルピリジニウム塩、アシルア
ミノエチルジエチルアミン塩、アシルアミノエチルメチ
ルジエチルアンモニウム塩、アルキルアミドプロピルジ
メチルベンジルアンモニウム塩、脂肪酸ポリエチレンポ
リアミド、アシルアミノエチルピリジニウム塩、アンル
コラミノホルミルメチルピリジニウム塩、ステアロオキ
シメチルピリジニウム塩、脂肪酸トリエタノールアミン
、脂肪酸トリエタノールアミンギ酸塩、トリオキシエチ
レン脂肪酸トリエタノールアミン、脂肪酸ジブチルアミ
ノエタノール、セチルオキシメチルピリジニウム塩、p
−インオクチルフエノキシエトキシエチルジメチルベン
ジルアンモニウム塩等がある。(上記化合物の例の中の
「アルキル」とは炭素数6〜20の、直鎖または一部置
換されたアルキルを示し、具体的には、ヘキシル、オク
チル、セチル、ステアリル等の直鎖アルキルが好ましく
用いられる。)これらの中では、特に水溶性の第四アン
モニウム塩型のカチオン界面活性剤が有効で、その中で
も、アルキルトリメチルアンモニウム塩、アルキルジメ
チルベンジルアンモニウム塩、エチレンオキシド付加ア
ンモニウム塩等が好適である。また、カチオン成分をく
り返し単位として有する重合体も広い意味ではカチオン
界面活性剤であり、本発明のカチオン界面活性剤に含泡
される。特に、親油性七ツマ−と共重合して得られた第
四アンモニウム塩を含む重合体は好適に用いることがで
きる。Examples of quaternary ammonium salts include long-chain primary amine salts, alkyltrimethylammonium salts, dialkyldimethylethylammonium salts, alkyldimethylammonium salts, alkyldimethylbenzylammonium salts, alkylpyridinium salts, and alkylquinolinium salts. , alkylisoquinolinium salt, alkylpyridinium sulfate, stearamidemethylpyridinium salt, acylaminoethyldiethylamine salt, acylaminoethylmethyldiethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide, acylaminoethylpyridinium salt , anrucolaminoformylmethylpyridinium salt, stearoxymethylpyridinium salt, fatty acid triethanolamine, fatty acid triethanolamine formate, trioxyethylene fatty acid triethanolamine, fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p
-Inoctylphenoxyethoxyethyldimethylbenzylammonium salt and the like. ("Alkyl" in the above compound examples refers to a straight chain or partially substituted alkyl having 6 to 20 carbon atoms, and specifically, straight chain alkyl such as hexyl, octyl, cetyl, stearyl, etc.) (Preferably used.) Among these, water-soluble quaternary ammonium salt type cationic surfactants are particularly effective, and among these, alkyltrimethylammonium salts, alkyldimethylbenzylammonium salts, ethylene oxide addition ammonium salts, etc. are preferable. be. Further, a polymer having a cationic component as a repeating unit is also a cationic surfactant in a broad sense, and is included in the cationic surfactant of the present invention. In particular, a polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic hexamer can be suitably used.
該重合体の重量平均分子量は300〜50000の範囲
であり、特に好ましくは500〜5000の範囲である
。The weight average molecular weight of the polymer is in the range of 300 to 50,000, particularly preferably in the range of 500 to 5,000.
両性界面活性剤としては、例えばN−メチル−N−ペン
タデシルアミノ酢酸ナトリウムのような化合物を用いる
ことができる。As the amphoteric surfactant, for example, a compound such as sodium N-methyl-N-pentadecylaminoacetate can be used.
これらの界面活性剤は0.5〜lO重量%の範囲で含有
させることができる。These surfactants can be contained in a range of 0.5 to 10% by weight.
本発明方法に用いるネガ・ポジ両用現像液及びソノ補充
液には上記のほかに無機及び有機の還元剤、有機カルボ
ン酸等を含有させることができる。In addition to the above, inorganic and organic reducing agents, organic carboxylic acids, etc. can be contained in the negative/positive developer and the replenisher used in the method of the present invention.
無機の還元剤としては、例えば亜硫酸ナトリウム、亜硫
酸カリウム、亜硫酸アンモニウム、亜硫酸水素ナトリウ
ム、亜硫酸水素カリウム等の亜硫酸塩、亜リン酸ナトリ
ウム、亜リン酸カリウム、亜リン酸水素ナトリウム、亜
リン酸水素カリウム、亜リン酸二水素ナトリウム、亜硫
酸水素カリウム等のリン酸塩、ヒドラジン、チオ硫酸ナ
トリウム、亜ジチオン酸ナトリウム等を挙げることがで
きるが、特に効果が優れている還元剤は亜硫酸塩である
。これらの還元剤は0.1〜IO重量%、より好ましく
は0.5〜5重量%の範囲で含有される。Examples of inorganic reducing agents include sulfites such as sodium sulfite, potassium sulfite, ammonium sulfite, sodium hydrogen sulfite, and potassium hydrogen sulfite, sodium phosphite, potassium phosphite, sodium hydrogen phosphite, and potassium hydrogen phosphite. , phosphates such as sodium dihydrogen phosphite and potassium hydrogen sulfite, hydrazine, sodium thiosulfate, sodium dithionite, etc. Among the reducing agents that are particularly effective are sulfites. These reducing agents are contained in an amount of 0.1 to IO weight %, more preferably 0.5 to 5 weight %.
該現像液及びその補充液には、その他公知の添加剤、例
えば、水溶性又はアルカリ可溶性の有機の還元剤、有機
カルボン酸及びその塩等を含有させることができる。The developer and its replenisher may contain other known additives, such as water-soluble or alkali-soluble organic reducing agents, organic carboxylic acids and salts thereof, and the like.
有機の還元剤としては、例えばハイドロキノン、メトー
ル、メトキシキノン等のフェノール化合物、フェニレン
ジアミン、フェニルヒドラジン等のアミン化合物がある
。Examples of organic reducing agents include phenolic compounds such as hydroquinone, metol, and methoxyquinone, and amine compounds such as phenylenediamine and phenylhydrazine.
有機カルボン酸には、炭素原子数6〜20の脂肪族カル
ボン酸、およびベンゼン環またはナフタレン環にカルボ
キシル基が置換した芳香族カルボン酸が包含される。The organic carboxylic acids include aliphatic carboxylic acids having 6 to 20 carbon atoms and aromatic carboxylic acids in which a benzene ring or a naphthalene ring is substituted with a carboxyl group.
脂肪族カルボン酸としては炭素数6〜20のアルカン酸
が好ましく、具体的な例としては、カプロン酸、エナメ
チル酸、カプリル酸、ペラルゴン酸、カプリン酸、ラウ
リン酸、ミスチリン酸、パルミチン酸、ステアリン酸等
があり、特に好ましいのは炭素数6〜12のアルカン酸
である。また炭素鎖中に二重結合を有する脂肪酸でも、
枝分れした炭素鎖のものでもよい。上記脂肪族カルボン
酸はナトリウムやカリウムの塩またはアンモニウム塩と
して用いてもよい。The aliphatic carboxylic acid is preferably an alkanoic acid having 6 to 20 carbon atoms, and specific examples include caproic acid, enamethyl acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mystyric acid, palmitic acid, and stearic acid. etc., and particularly preferred are alkanoic acids having 6 to 12 carbon atoms. Also, fatty acids with double bonds in their carbon chains,
It may also have a branched carbon chain. The above aliphatic carboxylic acids may be used as sodium or potassium salts or ammonium salts.
芳香族カルボン酸の具体的な化合物としては、安息香酸
、O−クロロ安息香酸、p−クロロ安息香酸、0−ヒド
ロキシ安息香酸、p−ヒドロキシ安息香酸、p−ter
t−ブチル安息香酸、0−アミノ安息香酸1.−アミノ
安息香酸、2,4−ジヒドロキシ安息香酸、2゜5−ジ
ヒドロキシ安息香酸、2.3−ジヒドロキシ安息香酸、
2.3−ジヒドロキシ安息香酸、3.5−ジヒドロキシ
安息香酸、没食子酸、l−ヒドロキシ−2−ナフトエ酸
、3−ヒドロキシ−2−ナフトエ酸、2−ヒドロキシ−
1−ナフトエ酸、l−ナフトエ酸、2−す7トエ酸等が
ある。Specific compounds of aromatic carboxylic acids include benzoic acid, O-chlorobenzoic acid, p-chlorobenzoic acid, 0-hydroxybenzoic acid, p-hydroxybenzoic acid, p-ter
t-Butylbenzoic acid, 0-aminobenzoic acid 1. -aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2゜5-dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid,
2.3-dihydroxybenzoic acid, 3.5-dihydroxybenzoic acid, gallic acid, l-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, 2-hydroxy-
Examples include 1-naphthoic acid, 1-naphthoic acid, 2-7-naphthoic acid, and the like.
上記芳香族カルボン酸はナトリウムやカリウムの塩また
はアンモニウム塩として用いてもよい。The above aromatic carboxylic acid may be used as a sodium or potassium salt or an ammonium salt.
脂肪族カルボン酸、芳香族カルボン酸の含有量は好まし
くは0.1−10重量%である。The content of aliphatic carboxylic acid and aromatic carboxylic acid is preferably 0.1-10% by weight.
また、本発明における現像液及び補充液には現像性能を
高めるために以下のような添加剤を加えることができる
。例えば特開昭58−75152号公報記載のNaCQ
、 KCQ、 KBr等の中性塩、特開昭59−190
952号公報記載のEDTA、 NTA等のキレート剤
、特開昭59−121336号公報記載の〔Co(NH
a))scL等の錯体、特開昭56−142528号公
報記載のビニルペンジルトリメチルアンモニウムクロラ
イドとアクリル酸ナトリウムの共重合体等の両性高分子
電解質、特開昭58−59444号公報記載の塩化リチ
ウム等の無機リチウム化合物、特公昭50−34442
号公報記載の安息香酸リチウム等の有機リチウム化合物
、特開昭59−75255号公報記載のSi、 Ti等
を含む有機金属界面活性剤、特開昭59−84241号
公報記載の有機硼素化合物が挙げられる。Furthermore, the following additives can be added to the developer and replenisher in the present invention in order to improve development performance. For example, NaCQ described in JP-A-58-75152
, KCQ, KBr and other neutral salts, JP-A-59-190
Chelating agents such as EDTA and NTA described in No. 952, [Co(NH
a)) Complexes such as scL, amphoteric polymer electrolytes such as copolymers of vinylpenzyltrimethylammonium chloride and sodium acrylate described in JP-A No. 56-142528, chlorides described in JP-A-58-59444 Inorganic lithium compounds such as lithium, Special Publication No. 50-34442
Examples include organolithium compounds such as lithium benzoate described in JP-A-59-75255, organometallic surfactants containing Si, Ti, etc. described in JP-A-59-75255, and organoboron compounds described in JP-A-59-84241. It will be done.
更に、本発明方法に用いられるネガ・ポジ両用現像液に
は、特開昭62−24263号、同62−24264号
、同62−25761号、同62−35351号、同6
2−75535号、同62−89060号、同62−1
25357号、同62−133460号、同62−15
9148号、同62−168160号、同62−175
7513号、同63−200154号、同63−205
658号、各公報に記載されているような現像液が含ま
れる。Further, the negative/positive developing solution used in the method of the present invention includes Japanese Patent Application Laid-open Nos. 62-24263, 62-24264, 62-25761, 62-35351, and 6
No. 2-75535, No. 62-89060, No. 62-1
No. 25357, No. 62-133460, No. 62-15
No. 9148, No. 62-168160, No. 62-175
No. 7513, No. 63-200154, No. 63-205
No. 658 and developers described in each publication are included.
本発明方法において、循環使用する現像液に対する補充
液の補充は、処理疲労と経時疲労の両方に対して行うこ
とが好ましい。処理疲労に対しては、識別記号に入れら
れた版の種類(板積、品種)の情報とサイズ情報との掛
は合わせで補充条件を制御することが好ましい。更に、
処理液に対しては、識別記号に入れられる情報の外に非
画像部の面積の検出を行い、版面積、非画像部面積、板
積等の処理疲労と経時疲労の両方について検知した結果
を組み合わせて補充条件(補充量の係数等)を決めるこ
とが好ましい。In the method of the present invention, it is preferable to replenish the replenisher to the developing solution used in circulation to prevent both processing fatigue and aging fatigue. To prevent processing fatigue, it is preferable to control the replenishment conditions by multiplying the plate type information (board volume, product type) included in the identification symbol by the size information. Furthermore,
For processing liquids, in addition to the information contained in the identification symbol, the area of the non-image area is detected, and the results of detection of both processing fatigue and aging fatigue such as plate area, non-image area, and board volume are calculated. It is preferable to determine replenishment conditions (coefficient of replenishment amount, etc.) in combination.
本発明によりポジ型感光性平版印刷版とネガ型感光性平
版印刷版とを自動的に判別した結果によって自動的に変
える現像条件としては、現像時間、現像温度、現像液量
、ブラシ条件(数、種類、回転数)、現像液の種類、組
成、補充条件(量、種類、組成)等が挙げられ、好まし
いものとして、現像時間、ブラシ条件及び補充条件が挙
げられる。Development conditions that are automatically changed according to the results of automatically distinguishing between positive-working photosensitive planographic printing plates and negative-working photosensitive planographic printing plates according to the present invention include development time, development temperature, amount of developer, and brush conditions (number of , type, rotational speed), developer type, composition, replenishment conditions (amount, type, composition), etc., and preferable examples include development time, brush conditions, and replenishment conditions.
以下、実施例により本発明方法を説明する。 The method of the present invention will be explained below with reference to Examples.
実施例1
下記現像液24Qを第1図に示す自動現像機の現像液タ
ンクI4に入れ、下記現像補充液を現像補充液タンク2
0に入れた。Example 1 The following developer solution 24Q was put into developer tank I4 of the automatic processor shown in FIG. 1, and the following developer replenisher was put into developer replenisher tank 2.
I set it to 0.
現像液
β−アニリノエタノール 0.3重量部プロピ
レングリコール 0.3重量部2−ヒドロキシ
−3−ナフトエ酸 0.6重量部p−tert−ブ
チル安息香酸 1.2重量部エマルゲン147
0.05重量部(花王(株)製、非イ
オン界面活性剤)ケイ酸カリウム水溶液 2.
2重量部(SiOz含有26重量%、K20含有13重
量%)水酸化カリウム 1.5重量部亜
硫酸カリウム 0.9重量部水
90重量部現像補充液
β−アニリノエタノール 0.31 量!プロ
ピレングリフレール 0.6重量W。Developer β-anilinoethanol 0.3 parts by weight Propylene glycol 0.3 parts by weight 2-hydroxy-3-naphthoic acid 0.6 parts by weight p-tert-butylbenzoic acid 1.2 parts by weight Emulgen 147
0.05 parts by weight (manufactured by Kao Corporation, nonionic surfactant) potassium silicate aqueous solution 2.
2 parts by weight (26% by weight containing SiOz, 13% by weight containing K20) Potassium hydroxide 1.5 parts by weight Potassium sulfite 0.9 parts by weight Water
90 parts by weight Developer replenisher β-anilinoethanol 0.31 amount! Propylene grille flail 0.6 weight W.
2−ヒドロキシ−3−ナフトエ酸 0.6重量部p
−tert−ブチル安息香酸 1.5重量部エ
マルゲン147 0.55重量部ケイ酸
カリウム 6.0重量部水酸化カリウム
3.1重量部亜硫酸カリウム
1.8重量部水
82重量部ポジ型感光性平版印刷版の作成
厚さ0.24mmのJIS−1050アルミニウム板を
2%の水酸化ナトリウム水溶液中に浸漬し、脱脂処理を
行った後に、希硝酸溶液中にて電気化学的に粗面化し、
よく洗浄した後に希硫酸溶液中で陽極酸化地理を行って
2.−5g/■2の酸化皮膜を上記アルミニウム板表面
上に形成させた。このように処理されたアルミニラ板を
水洗、乾燥後、下記組成の感光液を乾燥重量2.5g/
■1となるように塗布し、乾燥してポジ型感光性平版印
刷版を得た。2-hydroxy-3-naphthoic acid 0.6 parts by weight p
-tert-butylbenzoic acid 1.5 parts by weight Emulgen 147 0.55 parts by weight Potassium silicate 6.0 parts by weight Potassium hydroxide 3.1 parts by weight Potassium sulfite
1.8 parts by weight water
82 parts by weight Preparation of positive-working photosensitive lithographic printing plate A JIS-1050 aluminum plate with a thickness of 0.24 mm was immersed in a 2% aqueous sodium hydroxide solution, degreased, and then electrolyzed in a dilute nitric acid solution. chemically roughened,
After thorough washing, perform anodization in a dilute sulfuric acid solution.2. An oxide film of -5 g/2 was formed on the surface of the aluminum plate. After washing and drying the aluminum plate treated in this way, a photosensitive solution having the following composition was added to the dry weight of 2.5 g/
(1) and dried to obtain a positive-working photosensitive lithographic printing plate.
感光性塗布液組成
ナフトキノン−(1,2)−ジアジド−(2)−5−ス
ルホン酸クロライドとピロガロール・アセトン樹脂との
エステル化合物(特開昭60〜143345号公報合成
例2に記載された化合物)
2重量部
フェノールとm−、p−混合クレゾールとホルムアルデ
ヒドとの共重縮合樹脂(合成時のフェノール、■−クレ
ゾール及びp−クレゾールの各々の仕込みモル比が20
:48:32、重量平均分子量Mv−7400、数平均
分子量Mn1400)6.5重量部
p−tert−オクチルフェノールとホルムアルデヒド
より合成されたノボラック樹脂とナフトキノン−(1,
2)−ジアジド−(2)−5−スルホン酸クロライドと
のエステル化合物(縮合率:50モル%、M w= 1
700) 0.1重量部ビクトリ
ア・ピュア・ブルーBOH
(採土ケ谷化学(株)製、染料)O,Oa重量ニルチル
七ロソルブ 80重量部メチルセロソルブ
20重量部ネガ塁感光性平版印刷の作成
厚さ0.24■IのJIS−1050アルミニウム板を
20%リン酸ナトリウム水溶液に浸漬して脱脂し、希塩
酸溶液中で電気化学的に粗面化し、よく洗浄した後に希
硫酸溶液中で陽極酸化処理を行って1.5g/+”の酸
化皮膜を上記アルミニウム板表面上に形成させた。この
ように処理されたアルミニウム板をざらにメタ珪酸ナト
リウム水溶液中に浸漬して封孔九理を行い、水洗、乾燥
した後に、下記組成の感光液を乾燥重量2.0g/m”
となるように塗布し、乾燥してネガ型感光性平版印刷版
を得た。Photosensitive coating liquid composition Ester compound of naphthoquinone-(1,2)-diazide-(2)-5-sulfonic acid chloride and pyrogallol acetone resin (compound described in Synthesis Example 2 of JP-A-60-143345) ) Copolycondensation resin of 2 parts by weight of phenol, m- and p-mixed cresol, and formaldehyde (the molar ratio of each of phenol, ■-cresol and p-cresol during synthesis was 20
:48:32, weight average molecular weight Mv-7400, number average molecular weight Mn 1400) 6.5 parts by weight Novolac resin synthesized from p-tert-octylphenol and formaldehyde and naphthoquinone-(1,
2) Ester compound with -diazide-(2)-5-sulfonic acid chloride (condensation rate: 50 mol%, M w = 1
700) 0.1 part by weight Victoria Pure Blue BOH (manufactured by Odougaya Kagaku Co., Ltd., dye) O, Oa weight Nylthyl heptarosolve 80 parts by weight Methyl cellosolve 20 parts by weight Creation of negative base photosensitive lithographic printing Thickness 0 .24 I JIS-1050 aluminum plate was immersed in a 20% sodium phosphate aqueous solution to degrease it, electrochemically roughened in a dilute hydrochloric acid solution, thoroughly washed, and then anodized in a dilute sulfuric acid solution. An oxide film of 1.5 g/+" was formed on the surface of the aluminum plate. The aluminum plate treated in this way was roughly immersed in an aqueous solution of sodium metasilicate for hole sealing, washed with water, and dried. Afterwards, a photosensitive solution with the following composition was applied to a dry weight of 2.0 g/m''
A negative photosensitive planographic printing plate was obtained by coating and drying.
感光液組成
p−ジアジゾジフェニルアミンとバラホルムアルデヒド
との縮合物のへキサフルオロリン酸塩1重量部
N−(4−ヒドロキシフェニルメタクリルアミド共重合
体(特公昭57−43890号の実施例1に記載のもの
) 10重量部ビクトリア
・ピュア・ブルー・BOH
(保土谷化学工業(株)製、染料)
0.2重量部
エチレングリコールモノメチルエ−テル100重量部
J I S − B9550に準拠するバーコード画像
を有するフィルムをリスフィルムを用いて作成した。Photosensitive liquid composition: 1 part by weight of hexafluorophosphate, a condensate of p-diazizodiphenylamine and paraformaldehyde. Listed items) 10 parts by weight Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd., dye) 0.2 parts by weight Ethylene glycol monomethyl ether 100 parts by weight Bar code compliant with JIS-B9550 A film with an image was made using lith film.
バーコードに入れた情報は感光性平版印刷版のポジをと
ネガ型の判別情報とした。The information contained in the barcode was used to distinguish between positive and negative photosensitive planographic printing plates.
上記ポジ型感光性平版印刷版を多数枚用意し、上記バー
コード画像を有するフィルム透明ポジティブフィルム及
び感度測定用ステップタプレ・ント(イーストマン・コ
ダック社製NO.2、濃度差0.15ずつ21段階のグ
レースケール)を密層して、2kWメタルハライドラン
プ(岩崎電気(株)製アイドルフィン2000)を光源
として8.0mW/c■:の条件で、70cmの距離か
ら60秒間露光を行った。A large number of the above positive photosensitive lithographic printing plates were prepared, and a film transparent positive film having the above barcode image and a step tape for sensitivity measurement (manufactured by Eastman Kodak Company, No. 2, density difference 0.15 each) were prepared. (21 levels of gray scale) was densely layered and exposed for 60 seconds from a distance of 70 cm using a 2 kW metal halide lamp (Idol Fin 2000 manufactured by Iwasaki Electric Co., Ltd.) at 8.0 mW/c as a light source. .
上記ネガを感光性平版印刷を多数枚用意し、上記バーコ
ード画像を有するフィルム、透明ネガティブフィルム及
び感度測定用ステップタブレット(イーストマン・コダ
ック社製NO.2、濃度差0.15ずつ21段階のグレ
ースケール)を密着して、2kWメタルハライドランプ
(岩崎電気(株)製 アイドルフィン2000)を光源
として8.0諷W/am”の条件で、70c■の距離か
ら30秒間露光を行った。Prepare a large number of photosensitive lithography sheets of the above negative, and prepare a film with the above barcode image, a transparent negative film, and a step tablet for sensitivity measurement (manufactured by Eastman Kodak Co., Ltd. No. 2, 21 steps with a density difference of 0.15). Grayscale) was placed in close contact with the sample, and exposure was performed for 30 seconds from a distance of 70 cm using a 2 kW metal halide lamp (Idol Fin 2000, manufactured by Iwasaki Electric Co., Ltd.) at a light source of 8.0 W/am''.
板積別の処理版面積に対する補充条件は次のとおりとし
た。The replenishment conditions for the treated plate area for each plate volume were as follows.
気運疲労に対する補充:
ポジ型感光性平版印刷版・・・60mQ/m”ネガを感
光性平版印刷版・・・42mQ/B2(補充量係数:ポ
ジ型−1.0、ネガ型−0.7)経時疲労に対する補充
:
自動現像機の稼働時間・・・200+of27時自動現
像機の休止時間・・・50+aI2/時上記条件で前記
ポジ型感光性平版印刷版とネガ型感光性平版印刷版のそ
れぞれ150枚をランダムに処理した結果、300枚目
の版でも良好な印刷物を得た。Replenishment against energy fatigue: Positive type photosensitive planographic printing plate...60 mQ/m" Negative photosensitive planographic printing plate...42 mQ/B2 (Replenishment amount coefficient: positive type -1.0, negative type -0.7 ) Replenishment against fatigue over time: Automatic processor operating time...200+of27 hours Automatic processor down time...50+aI2/hour Under the above conditions, the positive-working photosensitive lithographic printing plate and the negative-working photosensitive lithographic printing plate, respectively. As a result of randomly processing 150 sheets, good printed matter was obtained even on the 300th sheet.
実施例2
実施例1と同じ現像液、現像補充液および感光性平版印
刷版を使用し、バーコードに入れる情報を板積(ネガ型
とポジ型の区別)及び感光性平版印刷版のサイズとし、
第2図に示す処理装置を使用して以下の実験を行った。Example 2 The same developer, developer replenisher, and photosensitive lithographic printing plate as in Example 1 were used, and the information to be included in the barcode was the plate volume (distinguishing between negative type and positive type) and the size of the photosensitive lithographic printing plate. ,
The following experiment was conducted using the processing apparatus shown in FIG.
現像タンク14aに現像液を24Q入れ、現像液の温度
を30℃、現像時間をポジ型感光性平版印刷版12秒、
ネガ型感光性平版印刷版20秒とした。Pour 24Q of developer into the developer tank 14a, set the temperature of the developer to 30°C, and set the development time to 12 seconds for the positive photosensitive lithographic printing plate.
The negative photosensitive planographic printing plate was used for 20 seconds.
光読み取りセンサ33の読み取り情報によりポジ型、ネ
ガ型の板積と感光性平版印刷版のサイズを検出し、補充
量を積算した。The plate area of positive type and negative type and the size of the photosensitive planographic printing plate were detected based on the information read by the optical reading sensor 33, and the amount of replenishment was integrated.
板積別の処理版面積に対する補充条件は次のとおりとし
た。The replenishment conditions for the treated plate area for each plate volume were as follows.
処理疲労に対する補充量
ポジ型感光性平版印刷版・・・60mQ/m”ネガ型感
光性平版印刷版・・・42m Q/ m ”(補充量係
数:ポジ型=1.0、ネガ型−0,7)1回の補充量を
300+o(lとした。Replenishment amount for processing fatigue Positive type photosensitive lithographic printing plate...60 mQ/m'' Negative type photosensitive lithographic printing plate...42 mQ/m'' (Replenishment amount coefficient: positive type = 1.0, negative type -0 , 7) The amount of replenishment per time was 300+o(l).
経時疲労に対する補充:
自動現像機の稼働時間・・・12(1mff/時自動現
像機の休止時間・・・35mQ/時上記条件でポジを感
光性平版印刷版とネガ型感光性平版印刷版のそれぞれ1
50枚をランダムに処理した結果、300枚目の版でも
良好な印刷物を得tこ。Replenishment for aging fatigue: Operating time of automatic processor...12 (1mff/hour) Resting time of automatic processor...35mQ/hour 1 each
As a result of randomly processing 50 sheets, good prints were obtained even on the 300th plate.
本発明によれば、1台の自動現像機で現像条件を異にす
る感光性平版印刷版を安定に共通に処理することができ
る。また、本発明によれば、1台の自動現像機で現像条
件を異にする感光性平版印刷版を低減された処理コスト
で共通に処理することができる。According to the present invention, photosensitive planographic printing plates having different development conditions can be stably and commonly processed with one automatic processor. Further, according to the present invention, photosensitive lithographic printing plates having different development conditions can be commonly processed at reduced processing cost using one automatic processor.
第1図、第2図は本発明の処理装置の実施例を示す構成
図である。
A・・・現像部 B・・・水洗部C・・・
リンス・ガム部 14・・・現像液タンク14a
・・・現像タンク 20・・・補充液タンク21
・・・補充装置
30・・・面積測定反射センサ
31・・・版幅検出回路
32.46・・・版面積積算回路
33・・・光読み取りセンサ
34.46・・・ネガ/ポジ版判別回路35・・・稼働
・休止時間積算回路
37・・・流量制御回路 38・・・ポンプ駆動
回路40・・・光センサ 41・・・駆動制
御回路42・・・ローラ駆動回路
43・・・ローラ駆動モータ
44・・・ポンプ駆動回路
45・・・識別記号判別回路FIGS. 1 and 2 are configuration diagrams showing an embodiment of a processing apparatus of the present invention. A...Developing section B...Washing section C...
Rinse/gum section 14...Developer tank 14a
...Developer tank 20...Replenisher tank 21
... Replenishment device 30 ... Area measurement reflection sensor 31 ... Plate width detection circuit 32.46 ... Plate area integration circuit 33 ... Optical reading sensor 34.46 ... Negative/positive plate discrimination circuit 35... Operating/stop time integration circuit 37... Flow rate control circuit 38... Pump drive circuit 40... Optical sensor 41... Drive control circuit 42... Roller drive circuit 43... Roller drive Motor 44...Pump drive circuit 45...Identification symbol discrimination circuit
Claims (2)
版を現像処理する方法において、該感光性平版印刷版の
感光層面に露光により焼き付けられた識別記号によって
感光性平版印刷版の情報を判別し、その情報に応じて現
像条件を自動的に変えることを特徴とする感光性平版印
刷版の処理方法。(1) In a method of developing an exposed photosensitive planographic printing plate using an automatic developing machine, information on the photosensitive planographic printing plate is provided by an identification symbol printed on the photosensitive layer surface of the photosensitive planographic printing plate by exposure. A method for processing a photosensitive lithographic printing plate, characterized by determining the information and automatically changing development conditions according to the information.
別記号を読み取る手段、及び該手段で読み取った情報に
よって現像条件を自動的に変える手段を有することを特
徴とする感光性平版印刷版の処理装置。(2) A photosensitive lithographic printing plate characterized by having a means for reading an identification symbol printed on the surface of the photosensitive layer of the photosensitive lithographic printing plate, and a means for automatically changing development conditions based on the information read by the means. Processing equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30641690A JPH04177356A (en) | 1990-11-13 | 1990-11-13 | Processing method and device of photosensitive planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30641690A JPH04177356A (en) | 1990-11-13 | 1990-11-13 | Processing method and device of photosensitive planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04177356A true JPH04177356A (en) | 1992-06-24 |
Family
ID=17956761
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30641690A Pending JPH04177356A (en) | 1990-11-13 | 1990-11-13 | Processing method and device of photosensitive planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04177356A (en) |
-
1990
- 1990-11-13 JP JP30641690A patent/JPH04177356A/en active Pending
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