JPH04166948A - Method and device for processing photosensitive plate for lithography - Google Patents

Abstract

PURPOSE:To stably develop a negative and positive type photosensitive plates for lithography in common through a process of using one automatic developing machine by identifying information on plates according to identification signals provided in advance on the reverse face or photosensitive layer surface of each photosensitive plate for lithography, and automatically changing developing conditions. CONSTITUTION:When a photosensitive plate for lithography is inserted from the left end of a passage PS the area of the plate is calculated by a plate width detecting circuit 31 and a plate area integrating circuit 32 according to a signal detected by an area measurement reflection sensor 30 and a negative/positive plate discriminating circuit 34 discriminates between positive and negative type according to a signal detected by an optical read sensor 33 and the signals are input to a flow control circuit 37. In the circuit 37, a feeder 21 is so controlled that the amount of a developing liquid supplied corresponds to a predetermined functional relation wherein the area of the plate, the kind of the plate(negative or positive) and a signal from an operation/stoppage integrating circuit 35 are variables; then a developing liquid for supply in a supply liquid tank 20 is supplied to a developing tank 14. The photosensitive plate for lithography is developed at a developing portion A and then conveyed to a water-washing portion B and finally to a rinse/gum portion C whereby the process is completed.

Description

Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a processing method and a processing apparatus for photosensitive lithographic printing plates, and more particularly, the present invention relates to a processing method and a processing apparatus for photosensitive lithographic printing plates, and more specifically, for processing photosensitive lithographic printing plates under different development conditions using one automatic developing machine. The present invention relates to a processing method and processing apparatus for commonly processing lithographic printing plates.

[Conventional technology]

BACKGROUND ART Conventionally, the following technology is known as a technology for commonly processing photosensitive lithographic printing plates having different development conditions using one automatic developing machine.

(b) Supply and dispose of new special developer solution according to the type of photosensitive lithographic printing plate. (JP-A-61-248051, JP-A-62-21152, etc.) (b) A positive photosensitive planographic printing plate and a negative photosensitive planographic printing plate are developed using a new developer solution that can commonly develop both. Develop and throw away. (Unexamined Japanese Patent Publication No. 63-103256) (c) A positive-type photosensitive lithographic printing plate and a dead-type photosensitive lithographic printing plate,
A replenisher is added to a developer that can commonly develop both types, and the developer is used repeatedly.

[Problem to be solved by the invention]

However, techniques such as (a) and (b) above have the disadvantage of high processing costs because they consume a relatively large amount of developer, and techniques such as (c) above have the disadvantage of high processing costs.
Since the degree of fatigue of the developer differs between the positive type photosensitive lithographic printing plate and the negative type photosensitive lithographic printing plate, there is a problem that it is difficult to manage replenishment and it is difficult to perform stable processing in practice.

An object of the present invention is to provide a processing method and a processing apparatus that can stably and commonly process photosensitive planographic printing plates having different development conditions using one automatic processor.

Another object of the present invention is to provide a processing method and a processing apparatus that can perform common processing at the processing cost of one automatic processor.

[Means to solve the problem]

The purpose of the present invention is to provide the following treatment method (1) and the following (
2) is achieved by the processing device.

(1) In a method of developing an exposed photosensitive planographic printing plate using an automatic developing machine, plate information is determined by an identification symbol provided in advance on the back surface or photosensitive layer surface of the photosensitive planographic printing plate. , a method for processing a photosensitive lithographic printing plate, characterized in that development conditions are automatically changed according to the information.

(2) Photosensitive lithographic printing characterized by having a means for reading an identification symbol provided on the back surface or the surface of the photosensitive layer of a photosensitive lithographic printing plate, and a means for automatically changing development conditions based on the information read by the means. Plate processing equipment.

Hereinafter, the present invention will be explained with reference to the drawings.

FIG. 1 is a configuration diagram showing an embodiment of a processing device according to the present invention. In the figure, A is a development process in which a developing solution (hereinafter referred to as "negative/positive developer") that can commonly develop positive-working photosensitive lithographic printing plates and negative-working photosensitive lithographic printing plates that are used in circulation is used. B is a water washing section for washing with water, C is a rinse/gum section for processing with a rinsing liquid or a desensitizing liquid, and PS is a conveyance path for the photosensitive planographic printing plate.

In each of these processing sections, ■ is a pair of conveying rollers that convey the photosensitive planographic printing plate, 5, 6, 7 is a pair of squeezing rollers, 8 is a pair of skewer rollers, 9 is a guide roller, and 10 is a pair of rollers that rub the plate surface for development. Brush roller for promotion, IL 12.1
3 is a shower vibe, 14 is a developer tank for containing a developer, 15 is a washing water tank for containing washing water, 16 is a rinse/gum solution tank for containing a rinse solution or a desensitizing solution (gum solution), 17.18, 19 is a pump that sends the processing liquid from the developer tank 14, the washing water tank 15, and the rinse/gum liquid tank to the shower vibes 11, 12, and 13, respectively; 20 is a replenisher tank for storing developer replenisher; 21 is a replenisher;
2.23.24 is developer tank 14, washing water tank 15
, are pipes that lead the respective overflows from the rinse/gum liquid tank 16 to an overflow tank (not shown).

Reference numeral 30 designates an area measurement reflection sensor, which has a plurality of optical sensors arranged at equal intervals in the horizontal direction perpendicular to the conveyance path, irradiates light from a light emitting element onto the surface of the photosensitive planographic printing plate being conveyed, and measures the reflected light. The presence of a photosensitive lithographic printing plate is detected by receiving the light with a light-receiving element. Reference numeral 31 denotes a plate width detection circuit, which detects the plate width based on a plate detection signal from the area measuring reflection sensor 30, and enables a plate area integration circuit 32 to detect the plate area.

Reference numeral 33 denotes an optical reading sensor that reads an identification mark provided in advance on the back surface of the photosensitive lithographic printing plate or the surface of the photosensitive layer and distinguishes between a positive-working photosensitive lithographic printing plate and a negative-working photosensitive lithographic printing plate, and 34 an optical reading sensor. This is a negative/positive plate discriminating circuit that discriminates between a negative type and a positive type based on the signal detected by 30.

35 is an operation/rest time integration circuit for replenishing in response to developer fatigue (processing fatigue) due to processing of photosensitive planographic printing plates and decrease in activity due to absorption of carbon dioxide gas in the air (aging fatigue). This is the power switch 3 of the processing device.
The operation and rest of the processing device are detected by opening and closing of the processing device 6, the operating time and the rest time are respectively integrated, and the amount of replenishment corresponding to fatigue over time in each of these states is replenished.

The above-mentioned plate area, positive type/negative type discrimination signal, and signal corresponding to the amount of fatigue over time are input to the flow rate control circuit 37, and the pump is driven so that the replenishment amount is refilled based on a predetermined functional relationship. It is arranged to control the replenishment device 21 via the circuit 38 .

Known techniques can be applied to adjust the plate area, the type of plate (positive type and negative type), and development conditions corresponding to fatigue over time during operation and rest.

Next, the operation will be explained using FIG.

First, when a photosensitive lithographic printing plate is inserted from the top left end of the transport path ps in the diagram, the plate area is calculated by the plate width detection circuit 32 and plate area integration circuit 33 based on the signal detected by the area measurement reflection sensor 33. and a negative/positive plate discrimination circuit 34 based on the signal detected by the optical reading sensor 33.
A positive type or a negative type is determined by this, and these signals are input to the flow rate control circuit 37. In parallel with these, a signal from the operation/pause integration circuit 35 is transmitted to the flow rate control circuit 3.
7 is input. The flow rate control circuit 37 controls the plate area, i.
The replenishing device 21 is controlled so that the developer replenishment amount is based on a predetermined functional relationship based on variables such as G type/positive type and signals from the operation/pause integration circuit 35, and the developer replenishment amount in the replenisher tank 20 is controlled. The developer tank 14 is replenished with the replenisher. The timing of this replenishment may be selected as appropriate. For example, when a photosensitive lithographic printing plate is carried in, replenishment is carried out by changing the amount of replenishment depending on the plate area and whether it is a negative or positive type, and replenishment is carried out in response to fatigue over time before the photosensitive lithographic printing plate is carried in.

In the developing section A, the developer tank 4 in which the above-mentioned replenishment is performed is fed with a developer for both negative and positive use by a pump 17 and supplied to the printing plate from a shower pipe 11, and the printing plate is rubbed by a brush roller 10. The developing solution and the eluate of the photosensitive layer of the photosensitive lithographic printing plate adhering to the front and back surfaces of the plate are removed by a squeeze roller pair 5, and the development is completed.

Next, the photosensitive lithographic printing plate is transported to washing section B. In the washing section B, the washing water put in the washing water tank 15 is supplied from the shower pipe 12 to the plate surface of the photosensitive planographic printing plate by the pump I8, and is washed with water. The water-washed photosensitive planographic printing plate is subjected to a squeezing roller 7 to remove deposits from the front and back surfaces thereof.

Next, the photosensitive planographic printing plate is conveyed to the rinse gum section c. Here, the rinsing liquid or desensitizing liquid contained in the rinsing gum tank 16 is supplied from the shower pipe 13 to the plate surface by the pump 24, and is removed by the squeezing roller 7 except for the necessary amount, thereby completing the process.

FIG. 2 is a block diagram of a processing device showing another embodiment according to the present invention. In the figure, A is a developing section that performs development with a circulating negative/positive developing solution, B is a water washing section, C is a rinse/gum section that is processed with a rinsing solution or a desensitizing solution, and Ps
is the conveyance path of the photosensitive planographic printing plate.

In each of these processing sections, 1 is a pair of conveying rollers for conveying the photosensitive planographic printing plate, 5.6.7 is a pair of squeezing rollers, and 8a is a pair of squeezing rollers.
is a skewer roller, 8b is a pair of skewer rollers, 9 is a guide roller, I
Oa is the brush roller, 12.13 is the shower pipe, 1
4a is a developing tank, 15 is a washing water tank, 16 is a rinsing/gum tank containing a rinsing liquid or a desensitizing liquid (gum liquid), 7a is a pump for flowing the developing liquid in the developing tank 14a, 18.19 Shower pipe 12.13
20 is a replenisher tank for storing developing replenisher, 21 is a replenisher, 22.23
．． Numerals 24 and 25 are pipes that lead the overflow liquid to an overflow tank (not shown), and 27 is a heater with a thermostat for heating the developer in the developing tank 14a and maintaining it at a predetermined temperature. 30 is an area measurement reflection sensor, 3
1 is a plate width detection circuit, 32 is a plate area integration circuit, 33 is an optical reading sensor, 34 is a negative/positive plate discrimination circuit, 35 is an operation/rest time integration circuit, 36 is a power switch, 37 is a flow rate control circuit, 38 is a pump drive circuit whose structure and function are the same as in FIG.

40 is a conveyance speed control circuit, and a negative/positive plate discrimination circuit 34
The conveyance speed of the photosensitive planographic printing plate is changed according to the input from the printer. 41 is a drive circuit that rotationally drives each roller along the conveyance path Ps, 42 is a motor that rotationally drives each roller, and each roller facing the conveyance path PS is driven by the motor.

Next, the operation will be explained using FIG. 2.

First, when a photosensitive lithographic printing plate is inserted from the top left end of the conveyance path PS in the figure, the plate width detection circuit 31 based on the signal detected by the area measurement reflection sensor 3o, as in the apparatus shown in FIG. Then, the plate area is calculated by the plate area integration circuit 32, and a negative type or positive type is determined by the ineffective/positive plate discrimination circuit 34 based on the signal detected by the optical reading sensor 33. These signals are sent to the flow rate control circuit. 37. In parallel with these, a signal from the operation/pause integration circuit 35 is input to the flow rate control circuit 374. In the flow rate control circuit 37, the replenishing device 21 controls the developer replenishment amount based on a predetermined functional relationship using variables such as plate area, negative type/positive type, and signals from the operation/pause integration circuit 35. Then, the developer replenisher in the replenisher tank 20 is replenished into the developer tank 14a. Further, the signal from the negative/positive plate discrimination circuit 34 is processed by a conveyance speed control circuit 40 to generate a signal representing the respective conveyance speeds of the positive photosensitive planographic printing plate and the negative photosensitive planographic printing plate,
This signal controls the roller drive circuit so that the conveying speed can be switched between negative and positive plate types.

In the developing section A, the photosensitive planographic printing plate is immersed in the negative/positive developer in the developer tank 14a, which is replenished as described above. The developer adhering to the back surface and the eluate of the photosensitive layer of the photosensitive lithographic printing plate are removed, and development is completed.

Next, the photosensitive lithographic printing plate is conveyed to the washing section 8 and then to the rinse/gum section C, where it is washed with water and subjected to post-processing in the same manner as in FIG.

In the present invention, the identification symbol is provided on the back surface and/or the photosensitive layer surface of the photosensitive lithographic printing plate. Examples of this method include screen printing, printing using a rubber stamp or the like, recording using an inkjet method, and attaching a sticker with an identification symbol printed thereon. The type of ink used for these can be either water-based or oil-soluble.
You can choose any color you want, and infrared absorbing ink can also be used. It is preferable to provide the identification symbol on the back side.

The identification symbol may be placed at any position when provided on the back surface, and preferably within 5 cm from the edge of the plate (corresponding to the printing grip) when provided on the photosensitive layer surface.

As the identification symbol and its reading device, for example, a known identification symbol and its reading device for a document fed to a copying machine, a bar code and a bar code scanner, etc. can be used.

The development conditions that are automatically changed according to the results of automatically determining the information of the photosensitive planographic printing plate according to the present invention include development time, development temperature, amount of developer, brush conditions (number, type, rotation speed), developer The type, composition, replenishment conditions (amount, type, composition), etc. are listed, and preferred ones include the development time, brush conditions, and the photosensitive lithographic printing plate to which the present invention is applied. A support having a hydrophilic surface is provided with a layer on the surface of the support.

(2) Photosensitive composition containing a diazo compound The diazo compound in the photosensitive composition of the liquid is a diazo resin typified by, for example, a condensate of an aromatic diazonium salt and formaldehyde or acetaldehyde. For example, p
- diazo resin inorganic salts of condensates of diazodiphenylamine and formaldehyde or acetaldehyde, such as reaction products of said condensates with hexafluoroborophosphates, tetrafluoroborates, perchlorates or periodates; Salts and diazo resin organic salts which are reaction products of the above condensates and sulfonic acids as described in US Pat. No. 3,300,309 can be mentioned. Also included are compositions in which a diazo resin is used together with a binder. Various polymer compounds can be used as such a binder, but monomers having an aromatic hydroxyl group such as those described in JP-A No. 54-98613, such as N-(4 - hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, o-, m-, or p-hydroxystyrene,
Copolymers of o-, m-, or p-hydroxyphenyl methacrylate, etc. and other monomers, U.S. Pat. No. 4,1.2
Polymers containing hydroxyethyl acrylate units or hydroxyethyl methacrylate-1 units as the main repeating unit as described in No. 3,276, natural resins such as shellac and rosin, polyvinyl alcohol, U.S. Pat. , 751,257, U.S. Pat. No. 3,660,
Linear polyurethane resins as described in No. 097, polyvinyl alcohol 7-thale 1 resins, epoxy resins condensed from bisphenol A and epichlorohydrin, cellulose derivatives such as cellulose acetate and cellulose acetate phthalate are included. be done.

2) Photosensitive composition 0- containing 0-quinonediazide compound
In a photosensitive composition containing a quinonediazide compound,
Examples include compositions in which an 0-quinonediazide compound and an alkali-soluble resin are used in combination.

Examples of the 0-quinonediazide compound include ester compounds such as polycondensation resins of 0-naphthoquinonediazide sulfonic acid, phenols, and aldehydes or ketones.

Examples of the phenols include phenol, 0-
Cresol, m-cresol, p-cresol, 3.5
Examples include m-phenols such as quinlenol, carvacrol, and thymol, dihydric phenols such as catechol, resorcinol, and hydroquinone, and trihydric phenols such as pyrogallol and 70-glucine. Examples of the aldehyde include pormaldehyde, benzaldehyde, acetaldehyde, crotonaldehyde, and furfural. Further, examples of the ketone include acetone and methyl ethyl ketone.

Specific examples of the polycondensation resin include phenol/formaldehyde resin, m-cresol/formaldehyde resin, m-1p-mixed cresol/formaldehyde resin, resorcinol/penzalde b-human resin, pyrogallol/acetone resin, etc. .

The condensation rate of 0-naphthoquinonediazide sulfonic acid with respect to the OH group of the phenol in the 0-su7toquinonediazide compound (reaction rate with respect to one OH group) ranges from 15 to 80%.

As a 0-quinonediazide compound, JP-A-58-434
The following compounds described in Publication No. 51 can also be used.

Also, Special Publication No. 37-1953, No. 37-3627, No. 37-13109, No. 40-26126, No. 40-
No. 3801, No. 45-5604, No. 45-27345
1,2-quinonediazide compounds described in JP-A No. 51-13013, JP-A No. 48-96575, JP-A No. 48-63802, and JP-A No. 48-63802 can also be mentioned.

Examples of the support include paper, plastic (for example, polyethylene, polypropylene, polystyrene), laminated paper, aluminum (including aluminum alloy),
Metal plates such as zinc, copper, etc., cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate, polyethylene, polypropylene,
Examples include plus deck films such as polycarbonate, polyvinyl acetal, paper laminated or vapor-deposited with metals such as those mentioned above, or chrome-plated steel sheets, especially aluminum and aluminum-coated composite supports. Body is preferred.

Further, the surface of the aluminum material may be roughened for the purpose of increasing water retention and adhesion to the photosensitive layer. As the surface roughening method, generally known brush polishing method, ball polishing method, electrolytic etching, chemical etching,
Examples include methods such as liquid honing, sandblasting, and combinations thereof.

At least one circulating developer used in the method of the present invention is an alkaline developer containing water as a main solvent (specifically, 50% by weight or more consists of water), and is an alkaline developer containing water as a main solvent.
It is preferable to use a developer for both positive and negative uses. The developer and its replenisher both contain an alkali silicate and have a pH of at least one of a primary solvent and a surfactant.
It is preferable to use an alkaline aqueous developer having a molecular weight of 10 or more, more preferably 12 or more.

Examples of the alkali silicate include potassium silicate, sodium silicate, sodium metasilicate, potassium metasilicate, and ammonium silicate. The content of alkali silicate in the developer is preferably in the range of 0.3 to 10% by weight. In addition, alkali silicate has a concentration of 0.5 in2.
A range of 1 to 7.0% by weight is preferred.

Alkali agents other than alkali silicates can be used in combination with the developer and developer replenisher, such as potassium hydroxide,
Sodium hydroxide, lithium hydroxide, sodium triphosphate, sodium diphosphate, potassium triphosphate, potassium diphosphate, ammonium diphosphate, ammonium diphosphate, sodium metasilicate, sodium bicarbonate, carbonic acid Inorganic alkaline agents such as sodium, potassium carbonate, ammonium carbonate, etc., organic alkaline agents such as mono-, di- or triethanolamine and tetraalkyl hydroxide can be used in combination.

As an organic solvent, the solubility in water at 20°C is 10.
% by weight or less, preferably carboxylic acid esters such as ethyl acetate, propyl acetate, butyl acetate, benzyl acetate, ethylene glycol monobutyl ether butyl lactate, butyl levulinate; ethyl butyl ketone, methyl isobutyl ketone, cyclohexanone Ketones such as: ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl asacol, methylphenylcarbinol alcohols such as methyl amyl alcohol; alkyl-substituted aromatic hydrogen ash such as xylene; These include halogenated hydrocarbons such as methylene dichloride, ethylene dichloride, and monochlorobenzene. These organic solvents can be used alone or in combination of two or more.

As the surfactant, at least one of nonionic, anionic, cationic and amphoteric surfactants can be used. Preferably it is a nonionic surfactant.

Nonionic surfactants can be broadly classified into polyethylene glycol type and polyhydric alcohol type, both of which can be used, but polyethylene glycol type nonionic surfactants are preferred from the viewpoint of developing performance, and among them, ethylene glycol type nonionic surfactants are preferred. 3 or more, and l (LB value ( HL
Bl. f Hydrophile-Lipophile
Balance) is 5 or more (more preferably 8 to 8)
The nonionic surfactant 20) is more preferred.

Among nonionic surfactants, those having both an ethyleneoxy group and a propyleneoxy group are particularly preferred, and among these, those having an HLB value of 8 or more are more preferred.

Preferred examples of nonionic surfactants include the following - Noshiro [1
] to [8] are mentioned.

C I ) R- 0- (CH2CH20)nH(3)
R-0-(CI(2CHO)m-=(CH2CH2
0)nH(6) HO(C2H40)a (C3
H60)b (C2H40)cHCB'J HO-
CCH2CH20)nH [1] to [8] In formulas, R
represents a hydrogen atom or a monovalent organic group. Examples of the organic group include a straight-chain or branched alkyl group having 1 to 3 carbon atoms that may have a substituent (for example, an aryl group (phenyl, etc.)), and an alkylcarbonyl group in which the alkyl moiety is the above-mentioned alkyl group. groups, substituents (e.g. hydroxyl groups,
Examples include a phenyl group which may have an alkyl group as described above). albXC, m% 1% 'X and y each represent an integer from 1 to 40.

Specific examples of nonionic surfactants are shown below.

Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether, polyoxyethylene polyoxypropylene cetyl ether, polyoxy Ethylene polyoquine propylene behenyl ether, holoxyethylene nonylphenyl ether, polyoxyethylene ocdylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene stearamide, polyoxyethylene oleate amide, polyoxy Ethylene himan oil, polyoxyethylene ahyethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, holoxyethylene monosteare = 1-
, polyoxyethylene glyceryl monooleate, polyoxyethylene glycer monostearate, polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene blank polymer, distyrenated phenol polyethylene oxide adduct, tribendicyphenol polyethylene oxydoi, octylphenol polyoxyethylene polyoxypropylene adduct, glycerol monostearate, sorbitan monolaurate, polyoxyethylene sorbitan monolaurate, etc.

The weight average molecular weight of the nonionic surfactant is 300 to 100
A range of 00 is preferred, and a range of 500 to 5000 is particularly preferred.

As anionic surfactants, higher alcohols (Ca
- C2
1J (trade name, manufactured by Shell Chemical Co., Ltd.), disodium alkyl sulfate, etc.], aliphatic alcohol phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate, etc.), alkylaryl sulfonates (e.g., dodecylbenzene sulfone) sodium salts of acids, sodium salts of isopropylnaphthalene sulfonic acid, sodium salts of cina7talin disulfonic acid, sodium salts of metanitrobenzenesulfonic acid, etc.), sulfonate salts of alkylamides (for example, C+yHx3CON
(Cth)CHzSOLNa, etc.), sulfonic acid salts of dibasic fatty acid esters (eg, Na)lium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.).

Among these, sulfonic acid salts are particularly preferably used.

Cationic surfactants are broadly classified into amine type and quaternary ammonium salt type, and any of these can be used.

Examples of amine types include polyoxyethylene alkyl amines, N-alkyl propylene amines, N-alkyl polyethylene polyamines, N-alkyl polyethylene nonpolyamine dimethyl sulfates, alkyl beargeanides, long chain amine oxides, and alkylimidases. Phosphorus, ■-hydroxyedy-2-alkylimitasoline, ■-acetylaminoethyl-2-argylimidacilline, 2-alkyl-
Examples include 4-methyl-4-hydroxymethyloxazoline.

Examples of quaternary ammonium salts include long-chain primary amine salts, alkyltrimethylammonium salts, dialkyldimethylethylammonium salts, alkyldimethylammonium salts, alkyldimethylbenzylammonium salts, alkylpyridinium salts, and alkylquinolinium salts. , alkylisoquinolinium salt, argylpyridinium sulfate, stearamidemethylpyridinium salt, acylaminoethyldiethylamine salt, acylaminoethylmethyljethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide, acylaminoethyl Pyridinium salt, acylcolaminoformylmethylpyridinium salt, stearoxymethylpyridinium salt, fatty acid triethanolamine, fatty acid triethanolamine formate, trioxyethylene fatty acid triethanolamine, fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p
-inoctylphenoxyethoxyethyldimethylbenzylammonium salt and the like. ("Alkyl" in the above compound examples refers to a straight chain or partially substituted alkyl having 6 to 20 carbon atoms, and specifically, straight chain alkyl such as hexyl, octyl, cetyl, stearyl, etc.) (Preferably used.) Among these, water-soluble quaternary ammonium salt type cationic surfactants are particularly effective, and among these, alkyltrimethylammonium salts, alkyldimethylbenzylammonium salts, ethylene oxide addition ammonium salts, etc. are preferable. be. Further, a polymer having a cationic component as a repeating unit is also a cationic surfactant in a broad sense, and the cationic surfactant of the present invention has a golden color. In particular, a polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic monomer can be suitably used.

The weight average molecular weight of the polymer is in the range of 300 to 50,000, particularly preferably in the range of 500 to 5,000.

As the amphoteric surfactant, for example, a compound such as sodium N-methyl-N-pentadecylaminoacetate can be used.

These surfactants can be contained in a range of 0.5 to IO weight %.

In addition to the above, inorganic and organic reducing agents, organic carboxylic acids, etc. can be contained in the negative/positive developing solution and its replenisher used in the method of the present invention.

Examples of inorganic reducing agents include sulfites such as sodium sulfite, potassium sulfite, ammonium sulfite, sodium hydrogen sulfite, and potassium hydrogen sulfite, sodium phosphite, potassium phosphite, sodium hydrogen phosphite, and potassium hydrogen phosphite. , phosphates such as sodium dihydrogen phosphite and potassium hydrogen sulfite, hydrazine, sodium thiosulfate, and sodium dithionite, among which sulfites are particularly effective reducing agents. These reducing agents are contained in an amount of 0.1-10% by weight, more preferably 0.5-5% by weight.

The developer and its replenisher may contain other known additives, such as water-soluble or alkali-soluble organic reducing agents, organic carboxylic acids and salts thereof, and the like.

Examples of organic reducing agents include phenolic compounds such as hydroquinone, metol, and methoxyquinone, and amine compounds such as phenylenediamine and phenylhydrazine.

The organic carboxylic acids include aliphatic carboxylic acids having 6 to 20 carbon atoms, and aromatic carboxylic acids in which a benzene ring or a naphcrene ring is substituted with a carboxyl group.

The aliphatic carboxylic acid is preferably an alkanoic acid having 6 to 20 carbon atoms, and specific examples include caproic acid, enantylic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mystylic acid, palmitic acid, and stearic acid. etc., and particularly preferred are alkanoic acids having 6 to 12 carbon atoms. Also, fatty acids with double bonds in their carbon chains,
It may also have a branched carbon chain. The above aliphatic carboxylic acids may be used as sodium or potassium salts or ammonium salts.

Specific compounds of aromatic carboxylic acids include benzoic acid, 0-chlorobenzoic acid, p-chlorobenzoic acid, 0-hydroxybenzoic acid, p-hydroxybenzoic acid, p-ter
t-butylbenzoic acid, 0-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2゜5-dihydroxybenzoic acid, 2.3-dihydroxybenzoic acid,
2.3-dihydroxybenzoic acid, 3.5-dihydroxybenzoic acid, gallic acid, ■-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, 2-hydroxy-
Examples include 1-naphthoic acid, 1-naphthoic acid, and 2-naphthoic acid.

The above aromatic carboxylic acid may be used as a sodium or potassium salt or an ammonium salt.

The content of aliphatic carboxylic acid and aromatic carboxylic acid is preferably 0.1-10% by weight.

Furthermore, the following additives can be added to the developer and replenisher in the present invention in order to improve development performance. For example, NaCl described in JP-A-58-75152
2. Neutral salts such as KCQ and KBr, JP-A-59-190
Chelating agents such as EDTA and NTA described in No. 952, CCoCNH described in JP-A-59-121336
3) Complexes such as &CQ3, JP-A-56-1.42528
Ampholytic polymer electrolytes such as the copolymer of vinylbenzyltrimethylammonium chloride and thorium acrylate described in JP-A-58-59444, inorganic lithium compounds such as lithium chloride described in JP-A-58-59444, JP-A-50-34.
Organic lithium compounds such as lithium benzoate described in No. 442, Si described in JP-A-59-75255,
Organometallic surfactant containing Ti, etc., JP-A-59-842
Examples include organic boron compounds described in Japanese Patent No. 41.

Further, the negative/positive developing solution used in the method of the present invention includes Japanese Patent Application Laid-open Nos. 62-24263, 62-24264, 62-25761, 62-35351, and 6
No. 2-75535, No. 62-89060, No. 62-1
No. 25357, No. 62-133460, No. 62-15
No. 9148, No. 62-168160, No. 62-175
No. 758, No. 63-200154, No. 63-2056
58 and the developer described in each publication.

It is preferable to replenish the developing solution that is used in circulation with a replenisher to prevent both processing fatigue and aging fatigue. For processing fatigue, detection of plate area, detection of non-image area,
It is preferable to detect the length of the photosensitive planographic printing plate in the transport direction, and it is preferable to change the coefficient of the replenishment amount calculated from the above information between the positive photosensitive planographic printing plate and the negative photosensitive planographic printing plate. . In addition, the coefficient of replenishment amount is determined based on the results of determining the plate electrodes of positive-working photosensitive planographic printing plates and negative-working photosensitive planographic printing plates, and the results of detecting both processing fatigue and aging fatigue. is preferred.

The reflection density on the surface of the photosensitive layer for determining the plate electrode may be measured anywhere on the photosensitive lithographic printing plate, but preferably at the edge within 5 cm from the edge of the photosensitive lithographic printing plate, and more preferably at the edge of the photosensitive lithographic printing plate. This is the end within 5 cm from the leading edge or trailing edge of the photosensitive planographic printing plate in the conveyance direction. This is the preferred method for determining the plate polarity because the above areas are normally exposed areas in positive photosensitive lithographic printing plates and unexposed areas in negative photosensitive lithographic printing plates. Is a negative photosensitive lithographic printing plate in the exposed area a preferable means for measuring the reflection density of the surface of the photosensitive layer in the unexposed area? [Example] The method of the present invention will be explained below with reference to Examples.

Example 1 The following developer solution 24M was put into the developer tank 14 of the automatic processor shown in FIG.
I set it to 0.

Developer β-anilinoethanol 0.3 parts by weight Propylene glycol 0.3 parts by weight 2-hydroxy-3-naphthoic acid 0.6 parts by weight p-tert-butylbenzoic acid 1.2 parts by weight Emulgen 147
0.05 parts by weight (manufactured by Kako Co., Ltd., nonionic surfactant) potassium silicate aqueous solution 2
．． 2 parts by weight (26% by weight containing SiO3, 13% by weight containing K20)
Weight%) Potassium hydroxide 1.5 parts by weight Potassium sulfite 0.9 parts by weight Water
90 parts by weight Developer replenisher β - Anilinoethanol 0.3 parts by weight Propylene geler 0.6 parts by weight 2-Hydroxy-3-naphthoic acid 0.6 parts by weight p-tert-butylbenzoic acid 1.5 parts by weight Emulgen 147
0.55 parts by weight potassium silicate
6.0 parts by weight potassium hydroxide
3.1 parts by weight Potassium sulfite 1.8 parts by weight Water 82 parts by weight Preparation of positive-working photosensitive lithographic printing plate A JIS-1050 aluminum plate with a thickness of 0.24 mm was immersed in a 2% aqueous sodium hydroxide solution and degreased. After treatment, the surface is electrochemically roughened in a dilute nitric acid solution.
After thorough washing, anodization treatment was performed in a dilute sulfuric acid solution to form an oxide film of 2-5 g/m'' on the surface of the aluminum plate.The aluminum plate thus treated was washed with water, dried, and then subjected to the following process. The dry weight of the photosensitive liquid with the composition is 2.5g/m
2 and dried to obtain a positive-working photosensitive lithographic printing plate.

Photosensitive coating liquid composition Ester compound of naphthoquinone-(1,2)-diazide-(2)-5-sulfonic acid chloride and pyrogallol acetone resin (compound described in Synthesis Example 2 of JP-A-60-143345) ) 2 parts by weight of phenol/-rut m-, p-copolycondensation resin of mixed cresol and formaldehyde (the molar ratio of each of phenol, m-cresol and p-cresol during synthesis was 2
0:48:32, weight average molecular weight Mw = 7400, number average molecular weight Mn = 1400) 6.5 parts by weight p-tert-octylphenol and a novolac resin synthesized from formaldehyde and 7 toquinone (1,
2) Ester compound with -diazide-(2)-5-sulfonic acid chloride (condensation rate: 50 mol%, M w-17
00) 0.1 parts by weight Victoria Pure Blue BOH (manufactured by Sakudogaya Chemical Co., Ltd.) 0.08 parts by weight Ethyl cellosolve 8034 Jl m Methyl cellosolve 20 parts by weight Many positive-working photosensitive lithographic printing plates thus obtained A 2kW metal halide lamp (Iwasaki Electric Co., Ltd. Idol fin 20 made by Co., Ltd.
00) as a light source and the condition of 8.0 mW/cm2, 70
Exposure was performed for 60 seconds from a distance of cm.

Preparation of negative photosensitive lithographic printing A JIS-1050 aluminum plate with a thickness of 0.2411III was immersed in a 20% sodium phosphate aqueous solution to degrease it, electrochemically roughened in a dilute hydrochloric acid solution, and washed thoroughly. Anodized in dilute sulfuric acid solution to produce L5g/
An oxide film with a thickness of 1.5 mm was formed on the surface of the aluminum plate.The aluminum plate treated in this way was further immersed in an aqueous solution of sodium metasilicate for pore sealing, washed with water, and dried. The dry weight of the photosensitive solution is 2-(
It was coated at a concentration of Ig/m2 and dried to obtain a negative photosensitive lithographic printing plate.

Photosensitive liquid composition 1 part by weight of hexafluorophosphate of a condensate of p-diazizodiphenylamine and paraformaldehyde ) 10 parts by weight Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd., dye) 0.2 parts by weight ethylene glycol monomethyl ether 100 parts by weight The thus obtained negative was printed on a number of photosensitive planographic sheets. Prepare a transparent negative film and a step tablet for sensitivity measurement (No. 2 manufactured by Eastman Kodak Company, 21 gray scale levels with a density difference of 0.15) in close contact.
8.0mW/cm" using a 2kW metal halide lamp (Idolfin 2000 manufactured by Iwasaki Electric Co., Ltd.) as a light source.
Exposure was performed for 30 seconds from a distance of 70 cm under these conditions.

The replenishment conditions for the treated plate area for each plate electrode were as follows.

Replenishment against processing fatigue: Positive type photosensitive lithographic printing plate...60+t+12/m" Preload type photosensitive lithographic printing plate...42m (1/m2 (replenishment amount coefficient: positive type -1, 0, A, G Mold-0, 7) Replenishment against aging fatigue: Operating time of automatic processor...200 mff/hour Automatic processor down time...50 mQ/hour Under the above conditions, the above positive photosensitive lithographic printing plate and negative type As a result of randomly processing 150 of each of the photosensitive planographic printing plates, good printed matter was obtained even on the 300th plate.

Example 2 The following experiment was conducted using the same developer, developer replenisher, and photosensitive lithographic printing plate as in Example 1, and using the processing apparatus shown in FIG.

Developing tank], put 24Q of developer into 4a, set the temperature of the developer to 30°C, 1 development time, positive photosensitive planographic printing plate 1.
2 seconds and a negative photosensitive planographic printing plate for 20 seconds.

The sizes of the positive and negative plate electrodes and the photosensitive planographic printing plate were detected based on the information read by the optical reading sensor 33, and the amount of replenishment was integrated.

The replenishment conditions for the treated plate area for each plate electrode were as follows.

Replenishment against processing fatigue Positive photosensitive lithographic printing plate...60 m0/m2 Negative photosensitive lithographic printing plate...42 m (17 m2 (replenishment coefficient:
Positive type = 1.0, negative type - 〇, 7) One refill amount is 30
It was set to 0mQ.

Replenishment against fatigue over time: Operating time of automatic processor...120mQ/hour Automatic processor down time...35m0.7hours Under the above conditions, positive-working photosensitive lithographic printing plates and negative-working photosensitive lithographic printing plates, respectively. 15
As a result of randomly processing 0 sheets, good prints were obtained even on the 300th plate.

Comparative Example The same experiment as in Example 1 was conducted, except that the optical reading sensor 33 was removed and the replenishment for processing fatigue was set at 60 mff/m2 for both the negative photosensitive planographic printing plate and the positive photosensitive planographic printing plate. As a result, poor development was observed on the 300=40th positive photosensitive lithographic printing plate, which caused stains during printing.

[Effects of the Invention] According to the present invention, a positive-working photosensitive lithographic printing plate and a positive-working photosensitive lithographic printing plate can be stably developed in common using a circulating developer in one automatic developing machine. You can also
Since a recirculating developer is used, the amount of developer consumed can be reduced compared to the new solution disposable method, thereby reducing processing costs.

[Brief explanation of the drawing]

FIGS. 1 and 2 are configuration diagrams showing an embodiment of a processing apparatus of the present invention. A...Developing section B...Washing section C...
Rinse gum section 14...Developer tank 14a.
・Developer tank 20 ・Replenisher tank 21 ・
...Replenishing device 30...Surface 8Il' measurement reflection sensor 31...Plate width detection circuit 32...Plate area integration circuit 33...Light reading sensor 34...Negative/positive plate discrimination circuit 35...・Operation/stop time integration circuit 36...Power switch 37...Flow rate control circuit 38...Pump drive circuit 40...Transportation speed control circuit 41...Roller drive circuit 42...Roller drive motor

Claims (2)

[Claims] (1) In a method of developing an exposed photosensitive planographic printing plate using an automatic developing machine, plate information is determined by an identification symbol provided in advance on the back surface or photosensitive layer surface of the photosensitive planographic printing plate. , a method for processing a photosensitive lithographic printing plate, characterized in that development conditions are automatically changed according to the information. (2) Photosensitive lithographic printing characterized by having a means for reading an identification symbol provided on the back surface or the surface of the photosensitive layer of a photosensitive lithographic printing plate, and a means for automatically changing development conditions based on the information read by the means. Plate processing equipment.