JPH0417561Y2 - - Google Patents
Info
- Publication number
- JPH0417561Y2 JPH0417561Y2 JP11092886U JP11092886U JPH0417561Y2 JP H0417561 Y2 JPH0417561 Y2 JP H0417561Y2 JP 11092886 U JP11092886 U JP 11092886U JP 11092886 U JP11092886 U JP 11092886U JP H0417561 Y2 JPH0417561 Y2 JP H0417561Y2
- Authority
- JP
- Japan
- Prior art keywords
- container
- raw material
- liquid supply
- gas
- carrier gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 43
- 239000007789 gas Substances 0.000 claims description 33
- 238000010438 heat treatment Methods 0.000 claims description 29
- 239000002994 raw material Substances 0.000 claims description 21
- 239000012159 carrier gas Substances 0.000 claims description 18
- 239000000945 filler Substances 0.000 claims description 12
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 5
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- 230000005587 bubbling Effects 0.000 description 3
- 208000037998 chronic venous disease Diseases 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- -1 SiCl 4 Chemical class 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11092886U JPH0417561Y2 (zh) | 1986-07-18 | 1986-07-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11092886U JPH0417561Y2 (zh) | 1986-07-18 | 1986-07-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6319569U JPS6319569U (zh) | 1988-02-09 |
| JPH0417561Y2 true JPH0417561Y2 (zh) | 1992-04-20 |
Family
ID=30990385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11092886U Expired JPH0417561Y2 (zh) | 1986-07-18 | 1986-07-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0417561Y2 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6181558A (ja) * | 1984-09-27 | 1986-04-25 | Honda Motor Co Ltd | 内燃機関用ピストン |
| JP4601535B2 (ja) * | 2005-09-09 | 2010-12-22 | 株式会社リンテック | 低温度で液体原料を気化させることのできる気化器 |
-
1986
- 1986-07-18 JP JP11092886U patent/JPH0417561Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6319569U (zh) | 1988-02-09 |
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