JPH0417552Y2 - - Google Patents

Info

Publication number
JPH0417552Y2
JPH0417552Y2 JP8953185U JP8953185U JPH0417552Y2 JP H0417552 Y2 JPH0417552 Y2 JP H0417552Y2 JP 8953185 U JP8953185 U JP 8953185U JP 8953185 U JP8953185 U JP 8953185U JP H0417552 Y2 JPH0417552 Y2 JP H0417552Y2
Authority
JP
Japan
Prior art keywords
plasma processing
processing chamber
plasma
chamber
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8953185U
Other languages
English (en)
Japanese (ja)
Other versions
JPS61206650U (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8953185U priority Critical patent/JPH0417552Y2/ja
Publication of JPS61206650U publication Critical patent/JPS61206650U/ja
Application granted granted Critical
Publication of JPH0417552Y2 publication Critical patent/JPH0417552Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP8953185U 1985-06-13 1985-06-13 Expired JPH0417552Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8953185U JPH0417552Y2 (enExample) 1985-06-13 1985-06-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8953185U JPH0417552Y2 (enExample) 1985-06-13 1985-06-13

Publications (2)

Publication Number Publication Date
JPS61206650U JPS61206650U (enExample) 1986-12-27
JPH0417552Y2 true JPH0417552Y2 (enExample) 1992-04-20

Family

ID=30643696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8953185U Expired JPH0417552Y2 (enExample) 1985-06-13 1985-06-13

Country Status (1)

Country Link
JP (1) JPH0417552Y2 (enExample)

Also Published As

Publication number Publication date
JPS61206650U (enExample) 1986-12-27

Similar Documents

Publication Publication Date Title
KR20210035769A (ko) 성막 방법 및 성막 장치
JPH04352426A (ja) 熱処理装置
TW201546934A (zh) 電漿處理裝置及成膜方法
US20120103989A1 (en) Method and apparatus for sealing an opening of a processing chamber
CN109868458A (zh) 一种半导体设备的清洗系统及清洗方法
TWI796030B (zh) 具有串接處理區域的電漿腔室
JP7166759B2 (ja) Hdp-cvdチャンバのアーク発生を防止するための高度なコーティング方法および材料
KR101655900B1 (ko) 진공펌프와 배기부 세정 및 pfc 제거를 위한 융합형 플라즈마 정화장치
KR101696252B1 (ko) 기판처리장치의 샤워헤드 어셈블리
JPH04214873A (ja) Ecrプラズマcvd装置ドライクリーニングの方法
JP4640891B2 (ja) 熱処理装置
JP2000169950A (ja) ベ―スの表面をプラズマ処理するための装置および方法
JP3891802B2 (ja) 半導体製造装置
WO2000003566A1 (en) Microwave discharge apparatus
JP3047750B2 (ja) プラズマ装置
JPH01286424A (ja) 半導体製造装置の洗浄方法
CN222923231U (zh) 化学气相沉积设备
JPH0348194Y2 (enExample)
KR20160061204A (ko) 와류 방지 게이트가 구비된 기판처리장치 및 그 제조방법
TWI854519B (zh) 電漿處理裝置
CN214914742U (zh) 一种生产二氯硝基苯的废气处理装置
CN211112211U (zh) 真空反应腔室和真空镀膜设备
KR20180093685A (ko) 플라즈마 화학 기상 증착 장치
JPH0514507Y2 (enExample)
JPH0323303Y2 (enExample)