JPH04162525A - Loading stand for wafer cassette - Google Patents

Abstract

PURPOSE:To obtain a newly structured loading stand which can clean and treat the whole face of a semiconductor wafer uniformly by a method wherein a frame body by means of which all semiconductor wafers held in a wafer cassette are faced directly with the bottom part of a cleaning tank and the frame body is provided with a coupling part which is coupled to the wafer cassette. CONSTITUTION:This is a stand 5 on which a wafer cassette 2 holding a plurality of semiconductor wafers 1 nearly vertically at equal intervals is loaded inside a cleaning tank 3; it is provided with a frame body 5a by means of which all the semiconductor wafers 1 held in the wafer cassette 2 are faced directly with the bottom part of the cleaning tank 3; the frame body 5a is provided with coupling parts 5b which are coupled to the wafer cassette 2. For example, said loading stand 5 is formed of a material such as quartz or the like. Said coupling parts 5b may be connected collectively to a frame body 5a or may be of a freely detachable structure. In addition, it is preferable that one pair of stoppers S are installed at the frame body 5a so as to position a wafer cassette 2 simply and quickly and to prevent the cassette from being dropped from a loading stand 5.

Description

Detailed Description of the Invention (Industrial Field of Application) This invention is a method for cleaning ultraviolet wafers by mounting several to several tens of uncleaned wafers in a wafer cassette and introducing the wafers together with the cassette into a cleaning tank. The present invention relates to an improvement of a mounting table suitable for use in sonic cleaning.

(Conventional technology) When ultrasonically cleaning a semiconductor wafer, first,
Multiple wafers are sequentially loaded into a wafer cassette, placed on a slatted quartz table (for chemical resistance and prevention of impurity contamination) that has been placed in advance in a cleaning tank, and then placed in a predetermined position. The cleaning process was carried out according to the following conditions.

(Problem to be Solved by the Invention) By the way, in ultrasonic cleaning of semiconductor wafers, an ultrasonic oscillator is usually installed at the bottom of the cleaning tank, and ultrasonic waves are propagated from there toward the top of the cleaning tank. Therefore, there was a disadvantage that the constituent members of the table on which the wafer cassette was placed became an obstacle, making it impossible to perform a uniform cleaning process over the entire surface of the wafer.

A wafer cassette with a new structure that eliminates the conventional problems mentioned above and achieves uniform cleaning of the entire wafer surface! It is an object of the invention to propose a stand for the device.

(Means for Solving the Problems) The present invention is a stand on which a wafer cassette that holds a plurality of semiconductor wafers almost vertically at equal intervals is placed in a cleaning tank, in which all the semiconductor wafers held in the wafer cassette are The wafer cassette mounting table is characterized in that it includes a frame that allows semiconductor wafers to be viewed directly at the bottom of a cleaning tank, and that the frame has a retaining portion that engages with the wafer cassette.

Now, FIG. 1 shows an example of a mounting table for a wafer cassette according to the present invention, in which number 1 is an uncleaned semiconductor wafer, and 2 is a wafer cassette provided with a plurality of grooves 2a for holding the wafer 1. , 3 is semiconductor wafer 1
4 is an ultrasonic generator placed at the bottom of the cleaning tank 3; 5 is placed in the cleaning tank 3, and contains a cleaning liquid 2, such as pure water, for example. This mounting table 5 is a table made of a material such as quartz.
is equipped with a frame 5a that allows all of the wafers 1 held in the cassette 2 to directly face the ultrasonic oscillator 4, and the frame 5a has a holding portion 5b on which the wafer cassette 2 is placed. has. Here, the engaging portion 5b of the mounting table 5 may be integrally connected to the frame 5a, or may have a detachable structure.

FIG. 2 clearly shows the state in which the wafer cassette 2 is placed on the mounting table 5 having the above structure.

(Function) In the conventional method, a slat-shaped stand configured by arranging a plurality of components at predetermined intervals is used, and this stand is placed in a cleaning tank, and the wafer cassette 2 is placed there for cleaning. In this method, as shown in FIG. 3, a part of the member 6a constituting the mounting table 6 became an obstacle, making it impossible to effectively clean the semiconductor wafer. However, in this invention, the mounting table 5 is constituted by the frame 5a, and the wafer cassette 2
is supported only by the engaging portion 5b provided on the frame 5a, thereby eliminating obstacles between the semiconductor wafer 1 and the ultrasonic generator 4, so that the ultrasonic cleaning effect on the wafer is uniform. It can be done.

Note that in configuring the mounting table according to the present invention,
By providing a pair of stoppers S on the frame 5a, the position of the wafer cassette 2 can be easily and quickly set, and it is advantageous to prevent the cassette from falling off the mounting base 5.

(Effects of the Invention) Thus, according to the present invention, since there is no obstacle between the ultrasonic generator and the wafer, good cleaning by ultrasonic waves when cleaning semiconductor wafers can be expected.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram of the structure of a wafer cassette mounting table according to the present invention. FIG. 2 is a perspective view of a wafer cassette mounting table according to the present invention. FIG. 3 is a diagram showing a conventional type of mounting table. l...Semiconductor wafer 2...Wafer cassette 3
...Cleaning tank 4...Ultrasonic oscillator 5...
Mounting table 5a...Frame 6...Conventional type mounting table S...Stopper Fig. 2

Claims (1)

[Claims] 1. A stand on which a wafer cassette holding a plurality of semiconductor wafers almost vertically at equal intervals is placed in a cleaning tank, wherein all the semiconductor wafers held in the wafer cassette are 1. A wafer cassette mounting stand, comprising a frame that is positioned directly at the bottom of a cleaning tank, and the frame has an engaging portion that engages with a wafer cassette.