JPH04156985A - Washing device - Google Patents
Washing deviceInfo
- Publication number
- JPH04156985A JPH04156985A JP27817390A JP27817390A JPH04156985A JP H04156985 A JPH04156985 A JP H04156985A JP 27817390 A JP27817390 A JP 27817390A JP 27817390 A JP27817390 A JP 27817390A JP H04156985 A JPH04156985 A JP H04156985A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- partition wall
- cleaning liquid
- washing
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 title abstract 11
- 239000007788 liquid Substances 0.000 claims abstract description 42
- 238000005192 partition Methods 0.000 claims abstract description 19
- 238000004140 cleaning Methods 0.000 claims description 89
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
洗浄装置の洗浄槽の改良に関し、
洗浄液の流れを層流にし、洗浄槽内の洗浄液の置換を良
好にすることが可能となる洗浄槽を具備する洗浄装置の
提供を目的とし、
洗浄液導入口を備えた本体の内部に、噴出孔を有する仕
切り壁を備えた洗浄槽を具備する洗浄装置において、前
記仕切り壁の面に対して前記噴出孔を傾斜させて形成し
たことを特徴とする洗浄槽を具備するよう構成する。[Detailed Description of the Invention] [Summary] Regarding the improvement of the cleaning tank of a cleaning device, the present invention relates to a cleaning device equipped with a cleaning tank that makes the flow of the cleaning liquid laminar and makes it possible to improve the replacement of the cleaning liquid in the cleaning tank. The purpose of the present invention is to provide a cleaning device comprising a cleaning tank having a partition wall having a jet hole inside a main body having a cleaning liquid inlet, the jet hole being inclined with respect to the surface of the partition wall. The cleaning tank is characterized in that it is formed by:
本発明は、洗浄装置の洗浄槽の改良に関するものである
。The present invention relates to an improvement in a cleaning tank of a cleaning device.
近年の半導体装置の微細化に伴い、洗浄工程における洗
浄の品質向上が求められ、この要求に対応するために超
音波発振器などを配置した洗浄槽が使用されているが、
更に洗浄効果を向上させるためには槽内の洗浄液の流れ
を層流にすることが必要になっている。With the miniaturization of semiconductor devices in recent years, there is a demand for improved cleaning quality in the cleaning process, and to meet this demand, cleaning tanks equipped with ultrasonic oscillators and the like are being used.
Furthermore, in order to improve the cleaning effect, it is necessary to make the flow of the cleaning liquid in the tank a laminar flow.
以上のような状況から、洗浄槽内の洗浄液の流れを層流
にすることが可能な洗浄槽を備えた洗浄装置が要望され
ている。Under the above circumstances, there is a demand for a cleaning device having a cleaning tank that can make the flow of cleaning liquid in the cleaning tank laminar.
従来の洗浄装置の洗浄槽を第２図により詳細に説明する
。The cleaning tank of the conventional cleaning device will be explained in detail with reference to FIG.
第２図は従来の洗浄槽を示す側断面図である。FIG. 2 is a side sectional view showing a conventional cleaning tank.
圓に示すように、洗浄槽１１の本体１１ａの下部には洗
浄液導入口１１ｂが設けられており、この洗浄液導入口
１１ｂから導入された洗浄液は洗浄槽１１の中を図にお
いて矢印にて示すように流れ、洗浄槽１１の上部からオ
ーバーフローしている。As shown in the circle, a cleaning liquid inlet 11b is provided at the bottom of the main body 11a of the cleaning tank 11, and the cleaning liquid introduced from the cleaning liquid inlet 11b flows inside the cleaning tank 11 as indicated by the arrow in the figure. and overflows from the upper part of the cleaning tank 11.
このため洗浄槽１１の下部の隅部に洗浄液のよどみが生
二、その部分に汚染された洗浄液が停滞するようになる
。As a result, the cleaning liquid stagnates in the lower corner of the cleaning tank 11, and the contaminated cleaning liquid stagnates in that area.
また液面が波立つことがあると、液面において空気中の
二酸化炭素が洗浄液中に取りこまれるようになり、この
イオンが洗浄液中に生じている。Further, when the liquid surface is rippled, carbon dioxide in the air is taken into the cleaning liquid at the liquid level, and these ions are generated in the cleaning liquid.
（発明が解決しようとする課題〕
以上説明した従来の洗浄装置の洗浄槽においては、洗浄
液の流れが乱流になるため洗浄槽内の洗浄液の置換が悪
化し、汚染された洗浄液が洗浄槽の隅部に停滞するよう
になるという問題点があり、また液面の波立ちのために
二酸化炭素が洗浄液中に取りこまれると、このイオンが
洗浄液中に生して洗浄液の比抵抗値が低下するから、洗
浄液の比抵抗の測定Ｓこより洗浄完了時点を検出してい
る場合Ｓこは、この時点の検出を行うのが困難になると
いう問題点があった。(Problems to be Solved by the Invention) In the cleaning tank of the conventional cleaning device described above, the flow of the cleaning liquid becomes turbulent, which deteriorates the replacement of the cleaning liquid in the cleaning tank, and the contaminated cleaning liquid flows into the cleaning tank. There is a problem that carbon dioxide gets stuck in the corners, and when carbon dioxide is taken into the cleaning liquid due to the ripples on the liquid surface, these ions are generated in the cleaning liquid and the specific resistance value of the cleaning liquid decreases. Therefore, when the point of completion of cleaning is detected by measuring the specific resistance of the cleaning liquid, there is a problem that it becomes difficult to detect this point.
本発明は以上のような状況から、洗浄液の流れを層流↓
こし、洗浄槽内の洗浄液の置換を良好にすることが可能
となる洗浄槽を具備する洗浄装置の提供を目的としたも
のである。The present invention solves the above-mentioned situation by changing the flow of the cleaning liquid to a laminar flow↓
The object of the present invention is to provide a cleaning device equipped with a cleaning tank that can effectively replace the cleaning liquid in the cleaning tank.
３課題を解決するための手段］
本発明の洗浄装置は、洗浄液導入口を備えた本体の内部
に、噴出孔を有する仕切り壁を備えた洗浄槽を具備する
洗浄装置において、この仕切り壁の面に対してこの噴出
孔を傾斜させて形成したことを特徴とする洗浄槽を具備
するよう構成する。3. Means for Solving the Problems] The cleaning device of the present invention includes a cleaning tank provided with a partition wall having an ejection hole inside a main body provided with a cleaning liquid inlet. The structure includes a cleaning tank characterized in that the jet hole is formed at an angle with respect to the cleaning tank.
５作用〕
即ち本発明においては、洗浄装置の内部に設けた仕切り
壁の面に対して洗浄液を噴出する多数の噴出孔を傾斜さ
せて形成するので、この噴出孔から噴出する洗浄液が層
流となり、洗浄槽内の洗浄液の置換が良好になり、被洗
浄物を完全に洗浄することが可能となる。5 Effects] That is, in the present invention, since a large number of jetting holes for spouting cleaning liquid are formed at an angle to the surface of a partition wall provided inside the cleaning device, the cleaning liquid spouted from these jetting holes forms a laminar flow. This improves the replacement of the cleaning liquid in the cleaning tank, making it possible to completely clean the object to be cleaned.
以下第１図により本発明による一実施例の洗浄槽につい
て詳細に説明する。Hereinafter, a cleaning tank according to an embodiment of the present invention will be explained in detail with reference to FIG.
第１図（ａ）は本発明による一実施例の洗浄槽を示す側
断面図であり、第１図（ｂｌはＡ−Ａ矢視図である。FIG. 1(a) is a side sectional view showing a cleaning tank according to an embodiment of the present invention, and FIG. 1 (bl is a view taken along the line A-A).
第１図（ａ）に示すように、洗浄槽１の容積が１０ｊ２
の本体１ａの下部には洗浄液導入口１ｂが設けられてお
り、この洗浄槽ｌの内部には図に示すように仕切り壁１
ｃが底面及び側壁に沿って設けられている。As shown in FIG. 1(a), the volume of the cleaning tank 1 is 10j2.
A cleaning liquid inlet 1b is provided at the lower part of the main body 1a, and a partition wall 1 is provided inside the cleaning tank l as shown in the figure.
c are provided along the bottom and side walls.
この仕切り壁ＩＣには洗浄液を導入して内部に噴出する
内径が５１ＴＩＩｎの噴出孔１ｄが各面に２５個づつ合
計１２５個設けられている。This partition wall IC is provided with a total of 125 ejection holes 1d each having an inner diameter of 51TIIn for introducing and ejecting cleaning liquid into the interior, 25 on each side.
この噴出孔１ｄの仕切り壁１ｃに対する傾斜角度は３０
″である。The angle of inclination of this jet hole 1d with respect to the partition wall 1c is 30
”.
このようにして仕切り壁１ｃに噴出孔１ｄを穿孔し、こ
の噴出孔１ｄの近傍に糸を固定して洗浄液を洗浄液導入
口１ｂから導入すると、洗浄液が仕切り璧１ｃの噴出孔
１ｄから内部に噴出し、これらのすべての糸が噴出した
洗浄液に沿って上方に滑らかに上昇することが確認され
た。In this way, when the spout hole 1d is bored in the partition wall 1c, the thread is fixed near the spout hole 1d, and the cleaning liquid is introduced from the cleaning liquid inlet 1b, the cleaning liquid is spouted inside from the spout hole 1d of the partition wall 1c. However, it was confirmed that all of these threads rose smoothly upward along the jetted cleaning fluid.
［発明の効果］
以上の説明から明らかなように本発明によれば、仕切り
壁に設ける洗浄液の噴出孔をこの仕切り壁の面Ｓこ傾斜
させて設けるので、これらの噴出孔から噴出する洗浄液
を仕切り壁の内部において層流にすることが可能となり
、乱流になるのを防止することができる利点があり、著
しく洗浄効率を向上させることが可能な洗浄槽を具備す
る洗浄装置の提供が可能となる。[Effects of the Invention] As is clear from the above description, according to the present invention, the cleaning liquid jet holes provided in the partition wall are provided at an angle to the surface S of the partition wall, so that the cleaning liquid spouted from these jet holes is It is possible to provide a cleaning device equipped with a cleaning tank that has the advantage of being able to create a laminar flow inside the partition wall and prevent turbulent flow, and can significantly improve cleaning efficiency. becomes.
第１図は本発明による一実施例の洗浄槽を示す図、 第２図は従来の洗浄槽を示す側断面図、を示す。 図において、 １は洗浄槽、 ｌａは本体、 １ｂは洗浄液導入口、 １ｃは仕切り壁、 １ｄは噴出孔、 である。 ｉａｌ 側断面図 山Ｉ Ａ−Ａ矢視図 本発明による一実施例の洗浄槽を示す図第１図 FIG. 1 is a diagram showing a cleaning tank according to an embodiment of the present invention; FIG. 2 shows a side sectional view of a conventional cleaning tank. In the figure, 1 is a cleaning tank, la is the main body, 1b is a cleaning liquid inlet; 1c is a partition wall, 1d is a blowhole, It is. ial side sectional view Mountain I A-A arrow view FIG. 1 is a diagram showing a cleaning tank according to an embodiment of the present invention.
Claims (1)
噴出孔（１ｄ）を有する仕切り壁（１ｃ）を備えた洗浄
槽（１）を具備する洗浄装置において、 前記仕切り壁（１ｃ）の面に対して前記噴出孔（１ｄ）
を傾斜させて形成したことを特徴とする洗浄槽（１）を
具備する洗浄装置。[Claims] Inside the main body (1a) provided with the cleaning liquid inlet (1b),
In a cleaning device comprising a cleaning tank (1) equipped with a partition wall (1c) having a spout hole (1d), the spout hole (1d) is attached to a surface of the partition wall (1c).
A cleaning device comprising a cleaning tank (1) characterized in that the cleaning tank (1) is formed at an angle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27817390A JPH04156985A (en) | 1990-10-16 | 1990-10-16 | Washing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27817390A JPH04156985A (en) | 1990-10-16 | 1990-10-16 | Washing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04156985A true JPH04156985A (en) | 1992-05-29 |
Family
ID=17593610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27817390A Pending JPH04156985A (en) | 1990-10-16 | 1990-10-16 | Washing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04156985A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2008038486A1 (en) * | 2006-09-26 | 2010-01-28 | 株式会社アイ・ウェーブ | Excrement disposal device |
-
1990
- 1990-10-16 JP JP27817390A patent/JPH04156985A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2008038486A1 (en) * | 2006-09-26 | 2010-01-28 | 株式会社アイ・ウェーブ | Excrement disposal device |
| JP4627800B2 (en) * | 2006-09-26 | 2011-02-09 | 株式会社アイ・デイ・ケイ・デザイン研究所 | Excrement disposal device |
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