JPH04155215A - Manufacture of grating, and grating - Google Patents
Manufacture of grating, and gratingInfo
- Publication number
- JPH04155215A JPH04155215A JP2278609A JP27860990A JPH04155215A JP H04155215 A JPH04155215 A JP H04155215A JP 2278609 A JP2278609 A JP 2278609A JP 27860990 A JP27860990 A JP 27860990A JP H04155215 A JPH04155215 A JP H04155215A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- grating
- magnetic
- lattice
- magnetization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000012530 fluid Substances 0.000 claims abstract description 17
- 239000002245 particle Substances 0.000 claims abstract description 16
- 230000005415 magnetization Effects 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 4
- 229910000684 Cobalt-chrome Inorganic materials 0.000 abstract description 3
- 239000010952 cobalt-chrome Substances 0.000 abstract description 3
- 229910052742 iron Inorganic materials 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 238000010030 laminating Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 230000035939 shock Effects 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 19
- 239000002609 medium Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- BLBNEWYCYZMDEK-UHFFFAOYSA-N $l^{1}-indiganyloxyindium Chemical compound [In]O[In] BLBNEWYCYZMDEK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Transform (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は格子作製方法及び格子に関する。[Detailed description of the invention] [Industrial application field] TECHNICAL FIELD The present invention relates to a grid manufacturing method and a grid.
[従来の技術]
基体上に薄層状に形成された磁気記録媒体に貫録ヘッド
を用いて所望の格子のパターンを書き良み、パターンに
従う磁化パターンを形成し、こQ磁化パターンのピッチ
に比して十分に粒径の小2い酸化鉄粒子を含む磁性コロ
イド流体を上記磁化パターンに塗布して磁化パターンを
顕像化する制子作製方法が提案されている(特開平t−
3ogQ1g士公報)。[Prior Art] A desired lattice pattern is written on a magnetic recording medium formed in a thin layer on a substrate using a penetrating head, a magnetization pattern is formed according to the pattern, and the pitch of the Q magnetization pattern is A magnetic colloidal fluid containing iron oxide particles with a sufficiently small particle size is applied to the magnetization pattern to visualize the magnetization pattern.
3ogQ1g Official Gazette).
[発明が解決しようとする課題]
上記方法によれば極めてピッチの細かい格子壱作製する
ことができるが、磁性コロイド流体にJり顕像化された
格子パターンは基体に対する定電力が必ずしも十分に強
くはなく、機械的な接触吋衝撃により格子パターンが損
なわれ易いという…題があった・
本発明は上述した事情に鑑みてなされたものてあって、
基体側への定着性に優れた新規な格子及び格子作製方法
の提供を目的とする。[Problems to be Solved by the Invention] According to the above method, it is possible to fabricate a grating with an extremely fine pitch, but the constant force applied to the substrate is not necessarily strong enough for the grating pattern visualized by magnetic colloidal fluid. However, there was a problem that the grid pattern was easily damaged by mechanical contact and impact.The present invention was made in view of the above-mentioned circumstances.
The purpose of the present invention is to provide a novel grid and a method for producing the grid that have excellent fixation properties on the substrate side.
[課題を解決する手段]
請求項1乃至4の方法は「位相格子パターンを己 有
する格子の作製方法」である。[Means for Solving the Problems] The methods of claims 1 to 4 are "methods for producing a grating having a phase grating pattern."
! 請求項1,2の方法とも「基体上に薄層状に形
) 成された磁気記録媒体に記録ヘッドを用いて所望
1 の格子のパターンを書き込んで上記パターンに従
う磁化パターンを形成し、この磁化パターンを磁4
性コロイド流体で顕像化する」点は従来の方法とト
同様である。! Both of the methods of claims 1 and 2 include writing a desired lattice pattern on a magnetic recording medium formed in a thin layer on a substrate using a recording head to form a magnetization pattern according to the above pattern; Magnet 4
The difference between the conventional method and the method of “visualizing with a colloidal fluid” is that
The same is true.
[基体)は金属やガラス、樹脂等で形成できる。[Substrate) can be formed of metal, glass, resin, etc.
「磁気記録媒体」はCoCr等の垂直磁化膜やFe2O
3゛ 等の水平磁化膜として形成できる。"Magnetic recording medium" is a perpendicularly magnetized film such as CoCr or Fe2O.
It can be formed as a horizontally magnetized film such as 3゛.
「磁性コロイド流体」は酸化鉄の微粉末を界面[活性剤
とともに分散媒(石油系の溶剤や水等)中に1 分散
させたもので、酸化鉄粒子の粒径は磁化バタ! −ン
のピッチに比して十分に小さく (100乃至200人
)設定されている。"Magnetic colloidal fluid" is a product in which fine powder of iron oxide is dispersed in a dispersion medium (petroleum solvent, water, etc.) along with an activator at the interface, and the particle size of the iron oxide particles is large enough to be magnetized! - The pitch is set to be sufficiently small (100 to 200 people) compared to the pitch of the venue.
磁化パターンに磁性コロイド流体を塗布すると磁性パタ
ーンが顕像化される。When a magnetic colloid fluid is applied to the magnetized pattern, the magnetic pattern becomes visible.
請求項1の方法では「顕像化された格子パターンの上に
透明な酸化物の層を特徴とする請求項2の方法では「顕
像化された格子パターンの上に、この格子パターンの凹
凸に倣って薄い金属膜を反射膜として形成し、この金属
膜上に透明な酸化物の層を形成」する。In the method of claim 1, ``a transparent oxide layer is formed on the visualized lattice pattern.'' In the method of claim 2, ``a transparent oxide layer is formed on the visualized lattice pattern. A thin metal film is formed as a reflective film in accordance with the method described above, and a transparent oxide layer is formed on top of this metal film.
反射膜を「格子パターンの凹凸に倣って薄い金属膜とし
て形成する」とは形成された金属膜の表面に、顕像化さ
れた格子パターンの凹凸がそのまま金属膜の凹凸として
現れるような薄さに反射膜を形成することを意味する。``Form a reflective film as a thin metal film that follows the unevenness of a lattice pattern'' means that the reflective film is so thin that the visualized unevenness of the lattice pattern appears as the unevenness of the metal film on the surface of the formed metal film. This means forming a reflective film on the surface.
透明な酸化物はSiO□またはInk、とすることがで
きる(請求項3,4)。The transparent oxide can be SiO□ or Ink (claims 3 and 4).
また反射膜として形成される金属膜の材料は金が好適で
ある(請求項4)が、外にアルミニウムやクロム、ニッ
ケル等を用いることができる。Further, the material of the metal film formed as the reflective film is preferably gold (claim 4), but aluminum, chromium, nickel, etc. can also be used.
請求項5の格子は上記方法で作製される格子自体である
。なお1本明細書に言う格子のパターンは単周期的なも
のに限らずコンピュータホログラムのパターン等をも含
む。The lattice according to claim 5 is the lattice itself produced by the above method. Note that the lattice pattern referred to in this specification is not limited to a single period pattern, but also includes a computer hologram pattern and the like.
本発明の格子作製方法は、各種エンコーダのスケールの
作製、特に回折による影絵パターンを利用するエンコー
ダ用のスケールの作製に有効である。The grating manufacturing method of the present invention is effective for manufacturing scales for various encoders, particularly for manufacturing scales for encoders that utilize shadow patterns by diffraction.
[作 用コ
上記のように、本発明では磁性コロイド流体により顕像
化された格子パターンの上に直接もしくは金属膜を介し
て透明な酸化物による層が形成される。この層は顕像化
された格子パターンを基体に対して強く定着せしめ、同
時に格子パターンに対する強力な保護層として機能する
。[Function] As described above, in the present invention, a transparent oxide layer is formed directly or via a metal film on the lattice pattern visualized by the magnetic colloidal fluid. This layer firmly fixes the visualized grating pattern to the substrate and at the same time functions as a strong protective layer for the grating pattern.
[実施例コ 以下、具体的な実施例に即して説明する。[Example code] Hereinafter, description will be given based on specific examples.
第1図乃至第4図は請求項1,3の発明の詳細な説明す
るための図である。FIGS. 1 to 4 are diagrams for explaining the invention of claims 1 and 3 in detail.
第1図に於いて、符号1は格子形成部材を示している。In FIG. 1, reference numeral 1 indicates a grid forming member.
格子形成部材lは、鉄等の円筒体の局面にCoCr等の
垂直磁化物質をスパッタリング等により厚さ数1000
人程度0薄層状の磁気記録媒体として形成したもので、
図示されない回転駆動手段により軸の回りに等速回転す
るようになっている。The lattice forming member l is made by sputtering a perpendicularly magnetized substance such as CoCr onto the curved surface of a cylindrical body made of iron or the like to a thickness of several thousand.
It is formed as a thin layered magnetic recording medium,
It is configured to rotate at a constant speed around an axis by a rotational drive means (not shown).
磁気記録媒体は、その厚み方向の所定の向きに磁化され
ている。A magnetic recording medium is magnetized in a predetermined direction in its thickness direction.
格子形成部材1を等速回転させつつ、符号2で示す垂直
磁化用の磁気ヘッドにクロック信号3を入力して1.0
に従って格子形成部材1の全周にわたって書き込みを行
うと、一定のピッチを持った格子のパターンを磁化パタ
ーンとして形成できる。While rotating the grating forming member 1 at a constant speed, the clock signal 3 is inputted to the magnetic head for perpendicular magnetization indicated by the reference numeral 2,
By writing over the entire circumference of the grating forming member 1, a grating pattern with a constant pitch can be formed as a magnetization pattern.
第2図は、磁化パターンが形成された状態を模式的に示
している。FIG. 2 schematically shows a state in which a magnetization pattern is formed.
符号5は基体、符号6は磁気記録媒体を示す。Reference numeral 5 indicates a substrate, and reference numeral 6 indicates a magnetic recording medium.
図の左右方向は格子形成部材1の回転方向に対応する。The left-right direction in the figure corresponds to the rotation direction of the grid-forming member 1.
磁気記録媒体6には厚み方向の磁化の向きが交互に反転
した微小な磁区の配列により格子のパターンが磁化パタ
ーンとして形成されている。In the magnetic recording medium 6, a lattice pattern is formed as a magnetization pattern by an arrangement of minute magnetic domains in which the direction of magnetization in the thickness direction is alternately reversed.
このように垂直磁化により書き込まれるパターンのピッ
チは最小で0.1μm程度であり、この実施例の場合は
0.1乃至2μm程度である。なお第2図の図面に直行
する方向には第2図の状態が有限寸法続いている。The pitch of the pattern written by perpendicular magnetization is about 0.1 .mu.m at the minimum, and in this embodiment, it is about 0.1 to 2 .mu.m. Note that in the direction perpendicular to the drawing of FIG. 2, the state of FIG. 2 continues for a finite dimension.
このように形成された磁化パターンに対し粒径100乃
至200人の酸化鉄粒子を含む磁性コロイド流体を塗布
すると、第3図に示すように磁性コロイド流体7により
磁化パターンが格子パターンとして顕像化される。即ち
、磁性コロイド流体7に含まれる酸化鉄粒子は磁化パタ
ーンにおける磁区の境界部に集まり磁化パターンに従っ
て分布し、磁化パターンを顕像化するのである。この状
態で磁性コロイド流体7の分散媒を加熱により蒸発させ
る。When a magnetic colloidal fluid containing iron oxide particles with a particle size of 100 to 200 particles is applied to the magnetized pattern thus formed, the magnetic colloidal fluid 7 visualizes the magnetized pattern as a lattice pattern, as shown in FIG. be done. That is, the iron oxide particles contained in the magnetic colloidal fluid 7 gather at the boundaries of magnetic domains in the magnetization pattern and are distributed according to the magnetization pattern, thereby visualizing the magnetization pattern. In this state, the dispersion medium of the magnetic colloidal fluid 7 is evaporated by heating.
続いて、第4図に示すように顕像化された格子パターン
の上に酸化物による透明な層8を形成する。この例では
酸化物はSiO□であり層8はスパッタリングにより形
成される。Subsequently, as shown in FIG. 4, a transparent layer 8 of oxide is formed on the visualized lattice pattern. In this example, the oxide is SiO□ and layer 8 is formed by sputtering.
酸化物の層8は格子パターン7を磁気記録媒体6上に強
固に定着する。かくして所望の格子を作製できる。The oxide layer 8 firmly fixes the grating pattern 7 onto the magnetic recording medium 6 . In this way, a desired grid can be produced.
第5回乃至第8@は、請求項2,4の方法の実施例を説
明するための図である。The fifth to eighth @ are diagrams for explaining embodiments of the methods of claims 2 and 4.
格子作製部材1^は、ガラス等による円板状の基体の片
面にFe2O,等の塗布等により薄層状の磁気記録媒体
を厚み数1000人の水平磁化膜として形成してなり、
図示されない回転駆動手段により矢印方向へ等速回転さ
れる。The grid making member 1^ is made by forming a thin layer of magnetic recording medium as a horizontally magnetized film of several thousand layers on one side of a disk-shaped base made of glass or the like by coating Fe2O, etc.
It is rotated at a constant speed in the direction of the arrow by a rotation drive means (not shown).
格子形成部材l^を等速回転させつつ、水平磁化用の磁
気ヘッド2人にクロック信号3を入力させることにより
格子形成部材IAの周縁部に1.0に従ったパターンを
書き込んで磁化パターンを形成する。While rotating the grating forming member l^ at a constant speed, by inputting the clock signal 3 to two magnetic heads for horizontal magnetization, a pattern according to 1.0 is written on the periphery of the grating forming member IA to create a magnetization pattern. Form.
第6図は形成された磁化パターンを模式的に示している
。符号5Aは基体、符号6Aが磁気記録媒体を示してお
り、磁化パターンは基体表面に平行な磁化の向き(矢印
で示す)が交互に反転したパターンとして形成される。FIG. 6 schematically shows the formed magnetization pattern. Reference numeral 5A indicates a substrate, and reference numeral 6A indicates a magnetic recording medium, and the magnetization pattern is formed as a pattern in which the direction of magnetization (indicated by arrows) parallel to the substrate surface is alternately reversed.
第6図の左右方向は格子形成部材IAの回転方向に対応
し、図面に直交する方向には第6図の状態が有限連続し
ている。この場合の磁化パターンのピッチは1乃至数μ
mである。The left-right direction in FIG. 6 corresponds to the rotational direction of the grid forming member IA, and the state shown in FIG. 6 is finitely continuous in the direction perpendicular to the drawing. In this case, the pitch of the magnetization pattern is 1 to several μ
It is m.
この磁化パターンに磁性コロイド流体7を塗布すること
により格子パターンとして顕像化できる。By applying magnetic colloidal fluid 7 to this magnetized pattern, it can be visualized as a lattice pattern.
第7図は磁化パターンを顕像化した状態を模式的に示し
ている。FIG. 7 schematically shows a visualized state of the magnetization pattern.
磁性コロイド流体7の分散媒を蒸発させたのち、反射率
の高い金を蒸着等により反射膜として成膜する。さらに
この反射膜の上にIn2O,の透明な層をスパッタリン
グ等により形成する。After the dispersion medium of the magnetic colloidal fluid 7 is evaporated, gold having a high reflectance is formed as a reflective film by vapor deposition or the like. Furthermore, a transparent layer of In2O is formed on this reflective film by sputtering or the like.
第8図は、このようにして作製された格子を模式的に示
している。FIG. 8 schematically shows the lattice produced in this way.
符号9は金により形成された反射膜を示し、符号10は
In、03による透明な層を示す6反射膜9は。Reference numeral 9 indicates a reflective film made of gold, and reference numeral 10 indicates a transparent layer made of In, 03. 6 Reflective film 9.
極く薄く形成し、反射膜9の表面形状が格子パターン7
の凹凸をそのまま表すようにする。層9の方は適当な厚
みにすることができる。It is formed extremely thin, and the surface shape of the reflective film 9 has a lattice pattern 7.
The unevenness of the image should be expressed as is. Layer 9 can be of any suitable thickness.
かくして所望の格子を得ることができる。In this way, a desired grid can be obtained.
[発明の効果コ
以上、本発明によれば新規な格子及び格子作製方法を提
供できる。[Effects of the Invention] As described above, according to the present invention, a novel lattice and a method for producing a lattice can be provided.
本発明の方法により作製される格子は格子パタ−ンが強
固に基体側に定着され、また酸化物の層が格子パターン
を有効に保護するので機械的な接触や衝撃により格子パ
ターンが損なわれることがない。なお格子パターンを基
体側に定着する方法として分散媒を蒸発させた後の格子
パターンに透明な樹脂を浸漬法やスプレー法でコーティ
ングして固化する方法も本発明による酸化物の層を形成
するのと同様に有効である。In the grating produced by the method of the present invention, the grating pattern is firmly fixed to the substrate side, and since the oxide layer effectively protects the grating pattern, the grating pattern will not be damaged by mechanical contact or impact. There is no. Furthermore, as a method of fixing the grid pattern on the substrate side, a method of coating the grid pattern with a transparent resin by dipping or spraying and solidifying it after the dispersion medium has been evaporated may also be used to form the oxide layer according to the present invention. is equally valid.
第1図乃至第4図は請求項1,3の発明の詳細な説明す
るための図、第5図乃至第8図は、請求項2,4の発明
の詳細な説明するための図である。
1 、 IA、、、格子形成部材、2.2A、、、磁気
ヘッド、700.磁性コロイド流体、9010反射膜の
層、6゜10、、、酸化物の層1 to 4 are diagrams for explaining in detail the inventions of claims 1 and 3, and FIGS. 5 to 8 are diagrams for explaining the inventions of claims 2 and 4 in detail. . 1. IA, grating forming member, 2.2A, magnetic head, 700. Magnetic colloidal fluid, layer of 9010 reflective film, 6°10, oxide layer
Claims (1)
、 基体上に薄層状に形成された磁気記録媒体に記録ヘッド
を用いて所望の格子のパターンを書き込み、上記パター
ンに従う磁化パターンを形成し、 上記磁化パターンのピッチに比して十分に粒径の小さい
酸化鉄粒子を含む磁性コロイド流体を上記磁化パターン
に塗布して上記磁化パターンを顕像化し、 顕像化された格子パターンの上に透明な酸化物の層を形
成することを特徴とする格子作製方法。 2、位相格子パターンを有する格子の作製方法であって
、 基体上に薄層状に形成された磁気記録媒体に記録ヘッド
を用いて所望の格子のパターンを書き込み、上記パター
ンに従う磁化パターンを形成し、 上記磁化パターンのピッチに比して十分に粒径の小さい
酸化鉄粒子を含む磁性コロイド流体を上記磁化パターン
に塗布して上記磁化パターンを顕像化し、 顕像化された格子パターンの上に、この格子パターンの
凹凸に倣って薄い金属膜を反射膜として形成し、この金
属膜上に透明な酸化物の層を形成することを特徴とする
格子作製方法。 3、請求項1に於いて、 透明な酸化物はSiO_2またはInO_2であること
を特徴とする格子作製方法。 4、請求項2に於いて、 金属膜の材料が金であり、透明な酸化物はSiO_2ま
たはInO_3であることを特徴とする格子作製方法。 5、請求項1または2または3または4の方法で作製さ
れた格子。[Claims] 1. A method for producing a grating having a phase grating pattern, which comprises writing a desired grating pattern onto a magnetic recording medium formed in a thin layer on a substrate using a recording head, and following the pattern. forming a magnetization pattern, applying a magnetic colloidal fluid containing iron oxide particles whose particle size is sufficiently smaller than the pitch of the magnetization pattern to the magnetization pattern, and visualizing the magnetization pattern; A method for producing a lattice, characterized by forming a layer of transparent oxide on a lattice pattern. 2. A method for producing a grating having a phase grating pattern, which comprises writing a desired grating pattern on a magnetic recording medium formed in a thin layer on a substrate using a recording head to form a magnetization pattern according to the pattern; A magnetic colloidal fluid containing iron oxide particles whose particle size is sufficiently small compared to the pitch of the magnetization pattern is applied to the magnetization pattern to visualize the magnetization pattern, and on the visualized lattice pattern, A method for producing a lattice, characterized by forming a thin metal film as a reflective film following the irregularities of the lattice pattern, and forming a transparent oxide layer on the metal film. 3. The method for producing a lattice according to claim 1, wherein the transparent oxide is SiO_2 or InO_2. 4. The method for producing a lattice according to claim 2, wherein the material of the metal film is gold and the transparent oxide is SiO_2 or InO_3. 5. A lattice produced by the method of claim 1 or 2 or 3 or 4.
Priority Applications (1)
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JP27860990A JP3061847B2 (en) | 1990-10-17 | 1990-10-17 | Lattice manufacturing method and lattice |
Applications Claiming Priority (1)
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JP27860990A JP3061847B2 (en) | 1990-10-17 | 1990-10-17 | Lattice manufacturing method and lattice |
Publications (2)
Publication Number | Publication Date |
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JPH04155215A true JPH04155215A (en) | 1992-05-28 |
JP3061847B2 JP3061847B2 (en) | 2000-07-10 |
Family
ID=17599662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP27860990A Expired - Lifetime JP3061847B2 (en) | 1990-10-17 | 1990-10-17 | Lattice manufacturing method and lattice |
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JP (1) | JP3061847B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6090026A (en) * | 1997-11-13 | 2000-07-18 | Toshiba Kikai Kabushiki Kaisha | Automatic tool exchanging machine |
-
1990
- 1990-10-17 JP JP27860990A patent/JP3061847B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6090026A (en) * | 1997-11-13 | 2000-07-18 | Toshiba Kikai Kabushiki Kaisha | Automatic tool exchanging machine |
Also Published As
Publication number | Publication date |
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JP3061847B2 (en) | 2000-07-10 |
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