JPH041511B2 - - Google Patents
Info
- Publication number
- JPH041511B2 JPH041511B2 JP58044692A JP4469283A JPH041511B2 JP H041511 B2 JPH041511 B2 JP H041511B2 JP 58044692 A JP58044692 A JP 58044692A JP 4469283 A JP4469283 A JP 4469283A JP H041511 B2 JPH041511 B2 JP H041511B2
- Authority
- JP
- Japan
- Prior art keywords
- type
- amorphous silicon
- silicon carbide
- silane
- heterojunction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Carbon And Carbon Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58044692A JPS58217414A (ja) | 1983-03-16 | 1983-03-16 | 新規アモルフアスシリコンカ−バイド |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58044692A JPS58217414A (ja) | 1983-03-16 | 1983-03-16 | 新規アモルフアスシリコンカ−バイド |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56012313A Division JPS57126175A (en) | 1980-12-03 | 1981-01-29 | Amorphous silicon carbide/amorophous silicon hetero junction optoelectric element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58217414A JPS58217414A (ja) | 1983-12-17 |
JPH041511B2 true JPH041511B2 (enrdf_load_stackoverflow) | 1992-01-13 |
Family
ID=12698467
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58044692A Granted JPS58217414A (ja) | 1983-03-16 | 1983-03-16 | 新規アモルフアスシリコンカ−バイド |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58217414A (enrdf_load_stackoverflow) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4109271A (en) * | 1977-05-27 | 1978-08-22 | Rca Corporation | Amorphous silicon-amorphous silicon carbide photovoltaic device |
-
1983
- 1983-03-16 JP JP58044692A patent/JPS58217414A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58217414A (ja) | 1983-12-17 |
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