JPH04138639A - Phosphor screen forming method - Google Patents

Phosphor screen forming method

Info

Publication number
JPH04138639A
JPH04138639A JP26267790A JP26267790A JPH04138639A JP H04138639 A JPH04138639 A JP H04138639A JP 26267790 A JP26267790 A JP 26267790A JP 26267790 A JP26267790 A JP 26267790A JP H04138639 A JPH04138639 A JP H04138639A
Authority
JP
Japan
Prior art keywords
film
phosphor
forming
phosphor screen
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26267790A
Other languages
Japanese (ja)
Inventor
Eriko Nakamoto
中本 恵里子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP26267790A priority Critical patent/JPH04138639A/en
Publication of JPH04138639A publication Critical patent/JPH04138639A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve brightness of a phosphor screen by forming an organic film after a hardened film of sensitive resin is formed in a central part of a phosphor picture element. CONSTITUTION:A black matrix film 12 and a phosphor picture element 13 are formed in an internal surface of a panel 11. Next, sensitizing liquid, formed of 1.0 to 5.0% polyvinyl alcohol and 0.1 to 5.0% dichromate, is applied to form a coating film 14. Then, the film 14 is exposed for a short time through a shadow mask 15 and developed to form a hardened film 14a of polyvinyl alcohol and ammonium dichromate in only a central part of the phosphor picture screen 13. An organic film 16 and a metal evaporation film 17 are formed by applying acrylic system emulsion, to remove an organic component by baking. In this way, a stable phosphor screen of high brightness can be formed without generating inferiority of swelling and exfoliation in the metal evaporation film 17.

Description

【発明の詳細な説明】 産1Lヒの千Lll磐− この発明は、陰極線管の蛍光面形成方法、特に蛍光体層
と金属蒸着膜層とを介する有機被膜層の形成方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a phosphor screen of a cathode ray tube, and more particularly to a method for forming an organic coating layer via a phosphor layer and a metal vapor deposition layer.

従来q1折 陰極線管の蛍光面は、蛍光体画素上にアクリル系有機被
膜を介して金属蒸着膜を形成することにより、金属蒸着
膜を鏡面に近づけ、蛍光面の輝度を向上させている。
In the conventional phosphor screen of a Q1-folding cathode ray tube, a metal vapor deposited film is formed on the phosphor pixels via an acrylic organic coating, thereby making the metal vapor deposit film close to a mirror surface and improving the brightness of the phosphor screen.

第2図はこの種のアクリル系有機被膜の形成フローを示
す概略図であるが、パネル1内面でブラックマトリック
ス膜2の開口に蛍光体画素3が形成され(第2図A参照
)、この蛍光体画素3上に直接アクリル系樹脂のエマル
ジョンを塗布し、これを加熱溶融させてアクリル系有機
被膜6を形成している(第2図E参照)。次いで、この
有機被膜6上に金属蒸着膜7が形成され(第2図F参照
)、最後に有機被膜6が焼成により除去される(第2図
G参照)。
FIG. 2 is a schematic diagram showing the formation flow of this type of acrylic organic film. Phosphor pixels 3 are formed in the openings of the black matrix film 2 on the inner surface of the panel 1 (see FIG. 2A), and the fluorescent An acrylic resin emulsion is applied directly onto the body pixels 3 and heated and melted to form an acrylic organic coating 6 (see FIG. 2E). Next, a metal vapor deposition film 7 is formed on this organic film 6 (see FIG. 2F), and finally, the organic film 6 is removed by firing (see FIG. 2G).

よ゛ ところで、上記方法によるとアクリル系エマルジョンが
蛍光体間に浸透しやすいため、蛍光体の凹凸がそのまま
有機被膜に現れて、十分に平滑な金属蒸着膜が得られな
いという欠点があった。また、蛍光体の凹凸をカバーす
るために下地膜を形成すると、有機膜の平滑性が高くな
りすぎて焼成により金属蒸着膜にふくれやはがれが生じ
るという欠点があった。
However, according to the above method, since the acrylic emulsion easily penetrates between the phosphors, the irregularities of the phosphors appear as they are in the organic coating, and a sufficiently smooth metal vapor deposited film cannot be obtained. Furthermore, when a base film is formed to cover the unevenness of the phosphor, the smoothness of the organic film becomes too high, which causes the metal vapor deposited film to blister or peel off when fired.

したがって、この発明は上記問題を解決するために提案
されたものであり、金属蒸着膜のふくれやはがれを生じ
ることなく蛍光面の輝度を向上できる有機被膜形成方法
の提供を目的とするものである。
Therefore, this invention was proposed to solve the above problem, and aims to provide a method for forming an organic film that can improve the brightness of a phosphor screen without causing blistering or peeling of the metal vapor deposited film. .

;      ための この発明は上記課題を解決するために、パネル内面に形
成した蛍光体画素上に感光性樹脂液を塗布してこの塗布
膜を所定部分のみ露光し、現像して硬化膜とする。
In order to solve the above problems, this invention applies a photosensitive resin liquid onto the phosphor pixels formed on the inner surface of the panel, exposes only a predetermined portion of this coating film, and develops it to form a cured film.

すなわち、シャドウマスクを介して蛍光体画素の部分を
弱く露光した後、現像することにより蛍光体画素の中央
部のみに感光性樹脂の硬化膜を形成し、この上にアクリ
ル系エマルジョンを塗布して有機被膜を形成することを
特徴とする陰極線管の蛍光面形成方法を開示する。
That is, after exposing the phosphor pixel portion weakly to light through a shadow mask, a cured film of photosensitive resin is formed only in the center of the phosphor pixel by development, and an acrylic emulsion is applied on top of this. Disclosed is a method for forming a phosphor screen of a cathode ray tube, which is characterized by forming an organic film.

具体的には感光性樹脂液としてポリビニルアルコールと
ニクロム酸アンモニウムが用いられ、それぞれの濃度を
1.0〜5.0%および0.1〜5.0%の範囲内に選
択される。
Specifically, polyvinyl alcohol and ammonium dichromate are used as the photosensitive resin liquid, and the respective concentrations are selected within the ranges of 1.0 to 5.0% and 0.1 to 5.0%.

1且 上記方法によると、蛍光体画素の中央部のみ感光性樹脂
の硬化膜が形成され蛍光体の凹凸が緩和されるが、蛍光
体画素周辺部は蛍光体の凹凸がそのまま残っているので
、蛍光体画素中央部のみに平滑性の高い有機被膜を形成
できる。この結果、蛍光体画素中央部にはより鏡面に近
い金属蒸着膜が形成さ、蛍光面の輝度を向上させ、一方
で蛍光体画素周辺部の金属蒸着膜には蛍光体による細孔
やつなぎが残り、焼成によって金属蒸着膜にふくれやは
がれが生じることもない。
1. According to the above method, a cured film of photosensitive resin is formed only in the central part of the phosphor pixel, and the unevenness of the phosphor is alleviated, but the unevenness of the phosphor remains as it is in the peripheral part of the phosphor pixel. A highly smooth organic film can be formed only in the center of the phosphor pixel. As a result, a metal vapor deposition film that is closer to a mirror surface is formed in the center of the phosphor pixel, improving the brightness of the phosphor screen, while the metal vapor deposition film around the phosphor pixel has pores and connections caused by the phosphor. In addition, the metal vapor deposited film does not swell or peel due to firing.

爽凰医 以下、この発明について図面を参照して説明する。Soho doctor The present invention will be explained below with reference to the drawings.

第1図はこの発明の一実施例を示す概略断面図である。FIG. 1 is a schematic sectional view showing an embodiment of the present invention.

図によれば、パネル11の内面にブラックマトリックス
膜12と、蛍光体画素13を形成する工程(A)、1.
0〜5.0%のポリビニルアルコールと0.1〜5.0
%のニクロム酸からなる感光液を塗布して塗布膜14を
形成する工程(B)、シャドウマスク15を介して短時
間露光する工程(C)、これを現像することによって蛍
光体画素13中央部のみにポリビニルアルコールとニク
ロム酸アンモニウムの硬化膜14aを形成する工程(D
)、アクリル系エマルジョンを塗布して有機被膜16を
形成する工程(E)、金属蒸着膜17を形成する工程(
F)、および焼成により宵機分を除去する工程(G)と
からなる。上記構成によれば、蛍光体画素13の中央部
のみに形成された硬化膜14aにより、この部分の平滑
性の高い金属蒸着膜17が得られ、また蛍光体画素13
周辺部の蛍光体の凹凸により金属蒸着膜17に適度な細
孔とつなぎが形成される。それ故に、金属蒸着膜17に
ふくれやはがれの不良が生じることなく、輝度の高い安
定な蛍光面が形成できる。
According to the figure, a step (A) of forming a black matrix film 12 and a phosphor pixel 13 on the inner surface of the panel 11;
0-5.0% polyvinyl alcohol and 0.1-5.0%
% dichromic acid to form the coating film 14 (B), a step (C) of exposing for a short time through the shadow mask 15, and developing this to form the coating film 14 at the center of the phosphor pixel 13. Step (D) of forming a cured film 14a of polyvinyl alcohol and ammonium dichromate only on
), a step (E) of applying an acrylic emulsion to form an organic film 16, and a step (E) of forming a metal vapor deposition film 17 (
F), and a step (G) of removing the residual material by firing. According to the above configuration, the cured film 14a formed only in the central part of the phosphor pixel 13 allows the metal vapor deposited film 17 with high smoothness to be obtained in this part, and the phosphor pixel 13
Appropriate pores and connections are formed in the metal vapor deposited film 17 due to the unevenness of the phosphor in the peripheral area. Therefore, a stable phosphor screen with high brightness can be formed without causing defects such as blistering or peeling in the metal vapor deposited film 17.

発肌亘対果 以上説明したように、この発明は蛍光体画素の中央部に
感光性樹脂の硬化膜を形成してから有機被膜を形成する
ことにより、蛍光体画素中央部のみ平滑性が高く、周辺
部には適度な細孔やつなぎを有する金属蒸着膜が形成さ
れるため、焼成によって金属蒸着膜にふくれやはがれの
不良が生じることなく輝度の高い蛍光面を形成できると
いう効果がある。
As explained above, this invention forms a cured film of photosensitive resin at the center of the phosphor pixel, and then forms an organic film, so that only the center of the phosphor pixel has high smoothness. Since a metal vapor deposited film having appropriate pores and connections is formed in the peripheral area, a high brightness phosphor screen can be formed without causing blistering or peeling defects in the metal vapor deposited film during firing.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の実施例である蛍光面形成方法のフロ
ー概略図、および第2図は従来の蛍光面の形成フロー概
略図である。 11・・・・・・パネル、 12・・・・・・ブラックマトリックス膜、13・・・
・・・蛍光体画素、 14・・・・・・感光性樹脂塗布膜、 15・・・・・・マスク、 16・・・・・・有機被膜、 17・・・・・・蒸着膜。 箇 図 く aコ b」 ロー ○
FIG. 1 is a schematic flow diagram of a method for forming a phosphor screen according to an embodiment of the present invention, and FIG. 2 is a schematic flow diagram of a conventional method for forming a phosphor screen. 11...Panel, 12...Black matrix film, 13...
... Phosphor pixel, 14 ... Photosensitive resin coating film, 15 ... Mask, 16 ... Organic film, 17 ... Vapor deposition film. ``Kazuku Ako B'' Low ○

Claims (3)

【特許請求の範囲】[Claims] (1)パネル内面にシャドウマスクを介して蛍光体画素
を形成する工程と、該蛍光体画素を覆う有機被膜を形成
する工程と、該有機被膜上に金属蒸着膜を形成する工程
と、該有機被膜を焼成除去する工程とを含む陰極線管の
蛍光面形成方法において、上記有機被膜の形成に先立ち
、感光性樹脂を塗布し、シャドウマスクを介して露光し
、未露光部分を現像し、蛍光体画素の中央部に硬化膜を
形成したことを特徴とする蛍光面形成方法。
(1) A step of forming a phosphor pixel on the inner surface of the panel via a shadow mask, a step of forming an organic film covering the phosphor pixel, a step of forming a metal vapor deposition film on the organic film, and a step of forming the organic film on the organic film. In a method for forming a phosphor screen of a cathode ray tube, which includes a step of removing the coating by baking, prior to forming the organic coating, a photosensitive resin is applied, exposed through a shadow mask, and unexposed areas are developed, and the phosphor is removed. A method for forming a phosphor screen characterized by forming a cured film in the center of a pixel.
(2)前記感光性樹脂がポリビニルアルコールとニクロ
ム酸アンモニウムである特許請求の範囲第1項に記載の
蛍光面形成方法。
(2) The method for forming a phosphor screen according to claim 1, wherein the photosensitive resin is polyvinyl alcohol and ammonium dichromate.
(3)前記ポリビニルアルコールの濃度が1.0〜5.
0%、ニクロム酸アンモニウムの濃度が0.1〜5.0
%である特許請求の範囲第2項に記載の蛍光面形成方法
(3) The concentration of the polyvinyl alcohol is 1.0 to 5.
0%, ammonium dichromate concentration 0.1-5.0
%. The method for forming a phosphor screen according to claim 2.
JP26267790A 1990-09-28 1990-09-28 Phosphor screen forming method Pending JPH04138639A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26267790A JPH04138639A (en) 1990-09-28 1990-09-28 Phosphor screen forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26267790A JPH04138639A (en) 1990-09-28 1990-09-28 Phosphor screen forming method

Publications (1)

Publication Number Publication Date
JPH04138639A true JPH04138639A (en) 1992-05-13

Family

ID=17379061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26267790A Pending JPH04138639A (en) 1990-09-28 1990-09-28 Phosphor screen forming method

Country Status (1)

Country Link
JP (1) JPH04138639A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100313102B1 (en) * 1994-10-25 2001-12-28 김순택 Filming liquid composite for cathode ray tube and method of manufacturing screen film using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100313102B1 (en) * 1994-10-25 2001-12-28 김순택 Filming liquid composite for cathode ray tube and method of manufacturing screen film using the same

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