JPH0413133A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH0413133A JPH0413133A JP11705690A JP11705690A JPH0413133A JP H0413133 A JPH0413133 A JP H0413133A JP 11705690 A JP11705690 A JP 11705690A JP 11705690 A JP11705690 A JP 11705690A JP H0413133 A JPH0413133 A JP H0413133A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- antistatic
- silver halide
- polymer
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims description 32
- 239000000463 material Substances 0.000 title claims description 22
- 229910052709 silver Inorganic materials 0.000 title claims description 21
- 239000004332 silver Substances 0.000 title claims description 21
- 239000004816 latex Substances 0.000 claims abstract description 12
- 229920000126 latex Polymers 0.000 claims abstract description 12
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 11
- 239000004593 Epoxy Substances 0.000 claims abstract description 7
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 4
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 abstract description 13
- 238000011282 treatment Methods 0.000 abstract description 12
- 125000000542 sulfonic acid group Chemical group 0.000 abstract description 2
- 230000006866 deterioration Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract 1
- 239000004848 polyfunctional curative Substances 0.000 abstract 1
- 208000028659 discharge Diseases 0.000 description 25
- 238000000034 method Methods 0.000 description 21
- 238000011161 development Methods 0.000 description 14
- 239000000839 emulsion Substances 0.000 description 14
- 108010010803 Gelatin Proteins 0.000 description 12
- 229920000159 gelatin Polymers 0.000 description 12
- 239000008273 gelatin Substances 0.000 description 12
- 235000019322 gelatine Nutrition 0.000 description 12
- 235000011852 gelatine desserts Nutrition 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 229920001600 hydrophobic polymer Polymers 0.000 description 7
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 238000003851 corona treatment Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 229960000633 dextran sulfate Drugs 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000007720 emulsion polymerization reaction Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- OXLXSOPFNVKUMU-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid Chemical class CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC OXLXSOPFNVKUMU-UHFFFAOYSA-N 0.000 description 1
- WZZBNLYBHUDSHF-DHLKQENFSA-N 1-[(3s,4s)-4-[8-(2-chloro-4-pyrimidin-2-yloxyphenyl)-7-fluoro-2-methylimidazo[4,5-c]quinolin-1-yl]-3-fluoropiperidin-1-yl]-2-hydroxyethanone Chemical compound CC1=NC2=CN=C3C=C(F)C(C=4C(=CC(OC=5N=CC=CN=5)=CC=4)Cl)=CC3=C2N1[C@H]1CCN(C(=O)CO)C[C@@H]1F WZZBNLYBHUDSHF-DHLKQENFSA-N 0.000 description 1
- NXVHEHXRZVQDCR-UHFFFAOYSA-N 1-n,1-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1C NXVHEHXRZVQDCR-UHFFFAOYSA-N 0.000 description 1
- AHABMLPWPUZVOI-UHFFFAOYSA-N 1-n,1-n-diethylbenzene-1,2,4-triamine Chemical compound CCN(CC)C1=CC=C(N)C=C1N AHABMLPWPUZVOI-UHFFFAOYSA-N 0.000 description 1
- XIROXSOOOAZHLL-UHFFFAOYSA-N 2',3',4'-Trihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C(O)=C1O XIROXSOOOAZHLL-UHFFFAOYSA-N 0.000 description 1
- XIWRQEFBSZWJTH-UHFFFAOYSA-N 2,3-dibromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1Br XIWRQEFBSZWJTH-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- XQHGAEQBYRZJIX-UHFFFAOYSA-N 2-amino-4-chloro-6-phenylphenol Chemical compound NC1=CC(Cl)=CC(C=2C=CC=CC=2)=C1O XQHGAEQBYRZJIX-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- LRZSAGKIMYFLHY-UHFFFAOYSA-N 2-hydroxypropane-1,2,3-tricarboxylic acid;dihydrate Chemical compound O.O.OC(=O)CC(O)(C(O)=O)CC(O)=O LRZSAGKIMYFLHY-UHFFFAOYSA-N 0.000 description 1
- YBMTWYWCLVMFFD-UHFFFAOYSA-N 3-methylbutyl 3,4,5-trihydroxybenzoate Chemical compound CC(C)CCOC(=O)C1=CC(O)=C(O)C(O)=C1 YBMTWYWCLVMFFD-UHFFFAOYSA-N 0.000 description 1
- FJWJYHHBUMICTP-UHFFFAOYSA-N 4,4-dimethylpyrazolidin-3-one Chemical compound CC1(C)CNNC1=O FJWJYHHBUMICTP-UHFFFAOYSA-N 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- INVVMIXYILXINW-UHFFFAOYSA-N 5-methyl-1h-[1,2,4]triazolo[1,5-a]pyrimidin-7-one Chemical compound CC1=CC(=O)N2NC=NC2=N1 INVVMIXYILXINW-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- RPWFJAMTCNSJKK-UHFFFAOYSA-N Dodecyl gallate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 RPWFJAMTCNSJKK-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- NWBJYWHLCVSVIJ-UHFFFAOYSA-N N-benzyladenine Chemical compound N=1C=NC=2NC=NC=2C=1NCC1=CC=CC=C1 NWBJYWHLCVSVIJ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004069 aziridinyl group Chemical group 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- XOPOEBVTQYAOSV-UHFFFAOYSA-N butyl 3,4,5-trihydroxybenzoate Chemical compound CCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 XOPOEBVTQYAOSV-UHFFFAOYSA-N 0.000 description 1
- IYCOKCJDXXJIIM-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1.CCCCOC(=O)C=C IYCOKCJDXXJIIM-UHFFFAOYSA-N 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 229940125810 compound 20 Drugs 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical group C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 239000000555 dodecyl gallate Substances 0.000 description 1
- 235000010386 dodecyl gallate Nutrition 0.000 description 1
- 229940080643 dodecyl gallate Drugs 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- JAXFJECJQZDFJS-XHEPKHHKSA-N gtpl8555 Chemical compound OC(=O)C[C@H](N)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](C(C)C)C(=O)N1CCC[C@@H]1C(=O)N[C@H](B1O[C@@]2(C)[C@H]3C[C@H](C3(C)C)C[C@H]2O1)CCC1=CC=C(F)C=C1 JAXFJECJQZDFJS-XHEPKHHKSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- OZSMDXCTZNLHPP-FJOGWHKWSA-M sodium;(z)-but-2-enedioic acid;2-phenylethenesulfonate Chemical compound [Na+].OC(=O)\C=C/C(O)=O.[O-]S(=O)(=O)C=CC1=CC=CC=C1 OZSMDXCTZNLHPP-FJOGWHKWSA-M 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000000626 sulfinic acid group Chemical group 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical class 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Chemical class 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、帯電防止層を有するハロゲン化銀写真感光材
料に関し、特に帯電防止能及び膜付きに優れたハロゲン
化銀写真感光材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a silver halide photographic material having an antistatic layer, and particularly to a silver halide photographic material having excellent antistatic ability and film adhesion.
一般にプラスチイックフィルムは帯電性が強く、これが
使用上多くの制約を与えている例は多い。Generally, plastic films have strong electrostatic properties, and this often imposes many restrictions on their use.
例えばハロゲン化銀写真感光材料においては、ポリエチ
レンテレフタレートのような支持体が一般に使用される
が、特に冬季の如き低湿度において帯電し易い。最近の
ように高感度写真乳剤を高速度で塗布したり、高感度の
感光材料を自動プリンターを通して露光処理をする場合
、特に帯電防止対策が重要である。For example, supports such as polyethylene terephthalate are generally used in silver halide photographic light-sensitive materials, but they are easily charged, especially at low humidity such as in winter. Antistatic measures are especially important when high-speed photographic emulsions are coated at high speeds or when high-sensitivity photosensitive materials are exposed to light using automatic printers, as has been the case recently.
感光材料が帯電すると、その放電によりスタチンクマー
クがでたり、またはゴミ等の異物を付着し、これにより
ピンホールを発生させたりして著しく品質を劣化し、そ
の修正のため非常に作業性をおとしてしまう。このため
、一般に感光材料では帯電防止剤が使用され、最近では
、含フツ素界面活性剤、カチオン界面活性剤、両性界面
活性剤、ポリエチレンオキサイド基を含有する界面活性
剤ないし高分子化合物、スルホン酸又はリン酸基を分子
内に有するポリマー等が用いられている。When a photosensitive material is charged, static marks appear due to the discharge, or foreign substances such as dust adhere to it, which causes pinholes and significantly degrades the quality. It will be. For this reason, antistatic agents are generally used in photosensitive materials, and recently, fluorine-containing surfactants, cationic surfactants, amphoteric surfactants, surfactants or polymer compounds containing polyethylene oxide groups, and sulfonic acid Alternatively, a polymer having a phosphoric acid group in the molecule is used.
特にフッ素系界面活性剤による帯電列調整、あるいは導
電性ポリマーによる導電性向上が多く使用されてきてお
り、例えば特開昭49−91165号およヒ同49−1
21523号にはポリマー主鎖中に解離基を有するイオ
ン型ポリマーを適用する例が開示されている。In particular, fluorosurfactants are often used to adjust the charge series, or conductive polymers are used to improve conductivity.
No. 21523 discloses an example in which an ionic polymer having a dissociative group in the polymer main chain is applied.
しかしながら、これらの従来技術では、現像処理により
、帯電防止能が大幅に劣化してしまう。However, in these conventional techniques, the antistatic ability is significantly deteriorated by the development process.
これはアルカリを用いる現像工程、酸性の定着工程、水
洗等の工程を経ることにより帯電防止能が失われるもの
と思われる。したがって印刷感光材料等のように、処理
済みフィルムをさらに用いてプリントするような場合に
、ゴミの付着によるピンホール発生等の問題を生ずる。This is thought to be because the antistatic ability is lost through processes such as a developing process using an alkali, an acidic fixing process, and washing with water. Therefore, when a processed film is further used for printing, such as with printing photosensitive materials, problems such as pinholes occur due to adhesion of dust.
このため例えば特開昭55−84658号、同61−1
74542号ではカルボキシル基を有する水溶性導電性
ポリマー カルボキシル基を有する疎水性ポリマー及び
多官能アジリジンからなる帯電防止層が提案されている
。この方法によれば処理後にも帯電防止能を残すことが
できるが、この帯電防止層は、その上に塗布されるハロ
ゲン化銀乳剤層及びバッキング層等との接着性が悪いと
いう欠点を有している。この傾向は高温になると顕著に
なり、23℃、60%RH以上では使用に耐えないレベ
ルまで劣化してしまう。このような導電性層の膜付きを
改良する効果的な方法としては、導電性層重設面へのコ
ロナ放電が挙げられ、この処理により膜付きは大幅に改
良された。For this reason, for example, JP-A Nos. 55-84658 and 61-1
No. 74542 proposes an antistatic layer comprising a water-soluble conductive polymer having a carboxyl group, a hydrophobic polymer having a carboxyl group, and a polyfunctional aziridine. Although this method allows antistatic properties to remain after treatment, this antistatic layer has the disadvantage of poor adhesion to the silver halide emulsion layer, backing layer, etc. applied thereon. ing. This tendency becomes more noticeable at high temperatures, and at temperatures above 23° C. and 60% RH, it deteriorates to a level that makes it unusable. An effective method for improving the film adhesion of such a conductive layer is corona discharge to the surface on which the conductive layer is overlaid, and this treatment significantly improved the film adhesion.
しかしながら新たな問題として、裏放電ムラが発生する
ようになった。However, a new problem has arisen: back discharge unevenness.
裏放電ムラとは、支持体上にコロナ放電をかけた際に、
裏面の濡れ性が部分的に変わってしまい、その上に塗布
した乳剤層及びバッキング層の塗布故障となって現れる
ムラのことであり、コロナ放電圧が高くなる程、ムラの
出方は激しくなる。Back discharge unevenness is when corona discharge is applied on the support.
This is an unevenness that appears when the wettability of the back side changes partially, resulting in a coating failure of the emulsion layer and backing layer coated on top of it, and the higher the corona discharge voltage, the more severe the unevenness becomes. .
ムラの形状としては、様々であるが、特にスポ・7ト状
に丸くでるムラが主である。このようなムラの発生を抑
えるには、コロナ放電圧の低下が必要であるが、膜付き
良化の点からすれば放電圧を下げるわけにはゆかず、早
急な対策が必要であった。The shape of the unevenness varies, but the main one is a spot-shaped round unevenness. In order to suppress the occurrence of such unevenness, it is necessary to lower the corona discharge voltage, but from the viewpoint of improving film adhesion, it is impossible to lower the discharge voltage, and urgent measures are required.
上記のような問題に対し、本発明の目的は、高湿でも帯
電防止能の劣化が起こらず、かつ裏放電ムラのない帯電
防止能に優れたノ10ゲン化銀写真感光材料を提供する
ことである。In order to solve the above-mentioned problems, an object of the present invention is to provide a silver decagenide photographic material that does not deteriorate in antistatic ability even at high humidity and has excellent antistatic ability without uneven back discharge. It is.
本発明の上記目的は、支持体上に、少なくとも1層の水
溶性導電性ポリマー、疎水性ラテックス及びエポキシ系
硬化剤の反応生成物からなる帯電防止層を有し、かつ該
帯電防止層塗設面の裏側が紫外光処理されていることを
特徴とするハロゲン化銀写真感光材料により達成される
。The above-mentioned object of the present invention is to have an antistatic layer on a support, comprising at least one layer of a reaction product of a water-soluble conductive polymer, a hydrophobic latex, and an epoxy curing agent, and to coat the antistatic layer. This is achieved by using a silver halide photographic material whose back side is treated with ultraviolet light.
以下、本発明の詳細について説明する。The details of the present invention will be explained below.
本発明の水溶性導電性ポリマーについては、スルホン酸
基、硫酸エステル基、4級アンモニウム塩、3級アンモ
ニウム塩、カルボキシル基、から選ばれる少なくとも1
つの導電性基を有するポリマーが挙げられる。導電性基
はポリマー1分子当たり5重量%以上を必要とする。水
溶性の導電性ポリマー中には、ヒドロキシ基、アミン基
、エポキシ基、アジリジン基、活性メチレン基、スルフ
ィン酸基、アルデヒド基、ビニルスルホン基を含んでい
てもよい。The water-soluble conductive polymer of the present invention has at least one group selected from sulfonic acid groups, sulfuric acid ester groups, quaternary ammonium salts, tertiary ammonium salts, and carboxyl groups.
Examples include polymers having two electrically conductive groups. The amount of conductive groups required is 5% by weight or more per polymer molecule. The water-soluble conductive polymer may contain a hydroxy group, an amine group, an epoxy group, an aziridine group, an active methylene group, a sulfinic acid group, an aldehyde group, and a vinyl sulfone group.
ポリマーの分子量は、3000〜100000であり、
好ましくは3500〜50000である。The molecular weight of the polymer is 3000 to 100000,
Preferably it is 3500-50000.
以下、本発明に用いられる水溶性導電性ポリマーの化合
物例を挙げるがこれに限定されるものではない。Examples of water-soluble conductive polymer compounds used in the present invention are listed below, but the present invention is not limited thereto.
SO,Na CH3 CH。SO, Na CH3 CH.
SO、Na CH。SO, Na CH.
SO,K
デキスト
ラ
ンサル7エ
イ
ト
置換度
3.0
Mn−500000
So 、 Na
デキストランサルフエイ
ト
置換度
2.0
Mn−100000
A−21
So 、 Na
Mn=10000
尚、上記A−1−A−21において、Mnは平均分子量
(本明細書中、平均分子量とは数平均分子量を示す。)
を表し、ポリエチレングリコール換算で表したGPCに
よる測定値によるものである。SO,K Dextran sulfate substitution degree 3.0 Mn-500000 So, Na Dextran sulfate substitution degree 2.0 Mn-100000 A-21 So, Na Mn=10000 In addition, in the above A-1-A-21, Mn is average molecular weight (in this specification, average molecular weight indicates number average molecular weight)
It is based on the measured value by GPC expressed in terms of polyethylene glycol.
本発明の水溶性導電性ポリマー層中に含有させる疎水性
ポリマー粒子は、実質的に水に溶解しない所謂ラテック
スで構成されている。この疎水性ポリマーは、スチレン
、スチレン誘導体、アルキルアクリレート、アルキルメ
タクリレート、オレフィン誘導体、ハロゲン化エチレン
誘導体、ビニルエステル誘導体、アクリルニトリル等の
中から任意の組み合わせで選ばれるモノマーを重合して
得られる。特にスチレン誘導体、アルキルアクリレート
、アルキルメタクリレートが少なくとも30モル%含有
されているのが好ましい。特に50モル%以上が好まし
い。The hydrophobic polymer particles contained in the water-soluble conductive polymer layer of the present invention are composed of so-called latex, which is substantially insoluble in water. This hydrophobic polymer is obtained by polymerizing monomers selected from styrene, styrene derivatives, alkyl acrylates, alkyl methacrylates, olefin derivatives, halogenated ethylene derivatives, vinyl ester derivatives, acrylonitrile, etc. in any combination. In particular, it is preferable that at least 30 mol% of styrene derivatives, alkyl acrylates, and alkyl methacrylates are contained. Particularly preferred is 50 mol% or more.
本発明のラテックスに含存させるアミド基を有する七ツ
マ−としては、下記−数式1’l)で表されるものが好
ましい。As the hexamer having an amide group to be included in the latex of the present invention, those represented by the following formula 1'l) are preferable.
一般式CI)
CH2=C
〔式中、Rは水素原子、炭素数1〜4の低級アルキル基
を表す。Lは2価の基、3は0又はlを表す。RI+R
2は水素原子、炭素数1〜6の低級アルキル基を表す。General formula CI) CH2=C [In the formula, R represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms. L represents a divalent group, and 3 represents 0 or l. RI+R
2 represents a hydrogen atom or a lower alkyl group having 1 to 6 carbon atoms.
〕 本発明の七ツマ−の具体例を挙げる。] Specific examples of the seven potions of the present invention will be given below.
l 。l.
CH,−CH ONHZ CB、冨C ONH2 3。CH, -CH ONHZ CB, Tomi C ONH2 3.
C)I、=CH
C0NHCHs
疎水性ポリマーをラテックス状にするには乳化重合をす
る、固体状のポリマーを低瀦点溶媒に溶かして微分散後
、溶媒を情夫するという2つの方法があるが、粒径が細
かくしかもそろったものができるという点で乳化重合す
ることが好ましい。C) I, =CH C0NHCHs There are two methods to make a hydrophobic polymer into latex form: emulsion polymerization, dissolving a solid polymer in a low-temperature solvent, finely dispersing it, and then using the solvent. Emulsion polymerization is preferred because it produces particles with fine and uniform particle sizes.
疎水性ポリマーの分子量は3000以上であれば良く、
分子量による透明性の差はほとんどない。The molecular weight of the hydrophobic polymer may be 3000 or more,
There is almost no difference in transparency depending on molecular weight.
本発明の疎水性ポリマーラテックスにポリアルキレンオ
キシド鎖を導入する方法としては、ポリアルキレンオキ
シド鎖を有するモノマーを共重合させることによる方法
が好ましい。As a method for introducing a polyalkylene oxide chain into the hydrophobic polymer latex of the present invention, a method by copolymerizing a monomer having a polyalkylene oxide chain is preferred.
七ツマ−としては下記−数式〔M〕で表されるものが好
ましい。As the 7-mer, those represented by the following formula [M] are preferred.
一般式CM) RI
CI、麿C
−X
ここでRは、水素原子、ハロゲン原子、低級アルキル基
、−CH,−L−Xを表し、Lは、−COO−R。General formula CM) RI CI, Maro C -X Here, R represents a hydrogen atom, a halogen atom, a lower alkyl group, -CH, -L-X, and L is -COO-R.
−CON−1又は炭素数6から12のアリール基を表す
。R,は、水素原子、アリール基、低級アルキル基、X
、を表し、Xは、fR2−Of nR3を表す。R2は
−(J、CH2−
CHzCHiCHzCl(z −C)IzCHCHz−
から選ばれる少なく
と
も
1種からなり、
R1は水素原子、
低級ア
ルキル基アルキルスルホン酸又はその塩、アルキ
ルカルボン酸基又はその塩を表す。-CON-1 or an aryl group having 6 to 12 carbon atoms. R is a hydrogen atom, an aryl group, a lower alkyl group,
, and X represents fR2-Of nR3. R2 is -(J, CH2- CHzCHiCHzCl(z -C)IzCHCHz-
R1 represents a hydrogen atom, a lower alkyl group, an alkylsulfonic acid or a salt thereof, an alkylcarboxylic acid group or a salt thereof.
nは2以上で 70以下の整数である。n is 2 or more It is an integer less than or equal to 70.
Ctl、−CH
α幻(CH,C)1.0)i−(CH,CICl0)−
扉
CH3
CH。Ctl, -CH αphantom(CH,C)1.0)i-(CH,CICl0)-
Door CH3 CH.
CH。CH.
■ CH。■ CH.
C0N))(CH,CH,0)−ssO3N&CH。C0N))(CH,CH,0)-ssO3N&CH.
M−26 CH。M-26 CH.
CH。CH.
CH。CH.
CH3 以下に本発明のラテックスの具体例を挙げる。CH3 Specific examples of the latex of the present invention are listed below.
CH。CH.
CH。CH.
CH。CH.
B−13 B−17 Hr CHl Coo(CJmO)isO3Na Hs CO。B-13 B-17 Hr CHl Coo(CJmO)isO3Na Hs C.O.
=26 SO,Na 本発明のエポキシ化合物としては、 ヒドロキシ 基又はエーテル縮合を含有するものが好ましい。=26 SO, Na The epoxy compound of the present invention includes: hydroxy Those containing groups or ether condensations are preferred.
本発明のエポキシ化合物の具体例を挙げる。Specific examples of the epoxy compound of the present invention will be given below.
α力CH。α force CH.
C00C,H,OH
α力(C1l(40)l。H
HO
E−5
本発明の導電性層の膜面pHとしては、8.0以下が好
ましいが、低すぎても膜の安定性から好ましくない。特
に好ましくは3.0〜7.5である。C00C,H,OH α force (C1l(40)l.H HO E-5 The film surface pH of the conductive layer of the present invention is preferably 8.0 or less, but even if it is too low, it is preferable from the viewpoint of film stability. No. Particularly preferably 3.0 to 7.5.
本発明の導電性層は感光性層より支持体側にあってもよ
いし、感光層に対し支持体の反対側、いわゆる背面にあ
ってもよい。The conductive layer of the present invention may be located closer to the support than the photosensitive layer, or may be located on the opposite side of the support to the photosensitive layer, ie, on the back surface.
本発明では導電性層が透明支持体上に塗設される。In the present invention, a conductive layer is coated on a transparent support.
透明支持体は写真用のもの全てが使えるが好ましくは、
可視光を90%以上透過するように作られたポリエチレ
ンテレフタレート又セルローストリアセテートである。Any transparent support for photography can be used, but preferably,
Polyethylene terephthalate or cellulose triacetate made to transmit more than 90% of visible light.
これらの透明支持体は、当業者に良く知られた方法で作
成されるものであるが、場合によっては光透過を実質的
に阻害しないように染料を若干添加して青味付けしたり
しても良い。These transparent supports are prepared by methods well known to those skilled in the art, but in some cases, a slight amount of dye may be added to give them a blue tint so as not to substantially inhibit light transmission. good.
本発明の支持体は、コロナ放電処理をした後ラテックス
ポリマーを含有する下引層が塗設されていてもよい。コ
ロナ放電処理は、エネルギー値としてI W= l K
W/ (m”・■in)が特に好ましく適用される。又
特に好ましくは、ラテックス下引層塗布後巻電性層を塗
設する前にコロナ放電処理を再度行うとよい。The support of the present invention may be coated with a subbing layer containing a latex polymer after being subjected to a corona discharge treatment. Corona discharge treatment has an energy value of I W = l K
W/ (m"·■in) is particularly preferably applied. Also, it is particularly preferable to perform a corona discharge treatment again after coating the latex undercoat layer and before coating the rollable layer.
導電性層に施すコロナ放電処理はエネルギー値として5
W= l KJ/ (1・+nin)が特に好まシく
適用される。The energy value of the corona discharge treatment applied to the conductive layer is 5.
W=l KJ/(1·+nin) is particularly preferably applied.
又、導電性層重設面の裏面に施す紫外光処理はその波長
ピークが185na+及び235nmである紫外光か好
ましく適用される。Further, the ultraviolet light treatment applied to the back surface of the conductive layer overlapping surface is preferably applied with ultraviolet light having wavelength peaks of 185 na+ and 235 nm.
尚、紫外光処理には話オーク製作所低圧水銀灯か好まし
く用いられ、処理時間は1秒〜lO分が好ましく、更に
好ましくは5秒〜2分である。Incidentally, a low-pressure mercury lamp manufactured by Oak Manufacturing Co., Ltd. is preferably used for the ultraviolet light treatment, and the treatment time is preferably 1 second to 10 minutes, more preferably 5 seconds to 2 minutes.
本発明は、支持体上に形成される感光材料金てに応用す
ることができる。例えばハロゲン化銀カラー感光材料、
レントゲン用感光材料、製版用感光材料等である。The present invention can be applied to photosensitive materials formed on a support. For example, silver halide color photosensitive materials,
These include photosensitive materials for X-rays and photosensitive materials for plate making.
本発明に用いられるハロゲン化銀乳剤は、例えば米国特
許路2.444.607号、同第2.716.062号
、同第3、512,982号、西独国出願公告第1.1
89.380号、同第2、058,626号、同第2,
118.411号、特公昭43−4133号、米国特許
路3.342.596号、特公昭47−4417号、西
独国出願公告第2,149,789号、特公昭39−2
825号、特公昭49−13566号等の各明細書また
は公報に記載されている化合物、好ましくは、例えば5
.6−ドリメチレンー7−ヒドロキシンーS−トリアゾ
ロ(1,5−a)ピリミジン、5.6−チトラメチレン
ー7−ヒドロキシーSトリアゾロ(1,5−a)ピリミ
ジン、5−メチル−7−ヒドロキシ−5−トリアゾロ(
1,5−8)ピリミジン、5−メチル−7−ヒドロキシ
−S−トリアゾロ(1,5−a)ピリミジン、7−ヒド
ロキシン−S−+−リアゾロン(1、5−a)ピリミジ
ン、5−メチル−6−プロモーフ−ヒドロキシ=S−)
リアゾロ(1,5−a)ピリミジン、没食子酸エステル
(例えば没食子酸イソアミル、没食子酸ドデシル、没食
子酸プロピル、没食子酸ナトリウム)、メルカプタン類
(l−7エニルー5−メルカプトテトラゾール、2−メ
ルカプトベンツチアゾール)、ベンゾトリア1−ルl!
(5−ブロムペンツトリアゾール、5−メチルベンツト
リアゾール)、ベンツイミダゾール類(6ニトロペンツ
イミダゾール)等を用いて安定化することができる。The silver halide emulsions used in the present invention are, for example, U.S. Pat.
No. 89.380, No. 2, No. 058,626, No. 2,
No. 118.411, Japanese Patent Publication No. 43-4133, U.S. Pat.
Compounds described in specifications or publications such as No. 825 and Japanese Patent Publication No. 49-13566, preferably, e.g.
.. 6-drimethylene-7-hydroxy-S-triazolo(1,5-a)pyrimidine, 5.6-titramethylene-7-hydroxy-S-triazolo(1,5-a)pyrimidine, 5-methyl-7-hydroxy-5-triazolo(
1,5-8) Pyrimidine, 5-methyl-7-hydroxy-S-triazolo(1,5-a)pyrimidine, 7-hydroxyn-S-+-riazolone(1,5-a)pyrimidine, 5-methyl -6-promorph-hydroxy=S-)
Riazolo(1,5-a)pyrimidine, gallic acid esters (e.g. isoamyl gallate, dodecyl gallate, propyl gallate, sodium gallate), mercaptans (l-7enyl-5-mercaptotetrazole, 2-mercaptobenzthiazole) , benzotria 1-l!
(5-bromopenzitriazole, 5-methylbenzitriazole), benzimidazoles (6-nitropenzimidazole), etc. can be used for stabilization.
本発明に係るハロゲン化銀写真感光材料及び/又は現像
液中には、アミノ化合物を含有することができる。The silver halide photographic material and/or developer according to the present invention may contain an amino compound.
又現像性を高めるために、フェニドンやハイドロキノン
のような現像主薬、ベンゾトリアゾールのような抑制剤
を乳剤側に含有せしめることができる。あるいは処理液
の処理能力を上げるために、バッキング層に現像主薬や
抑制剤を含有せしめることができる。Further, in order to improve the developability, a developing agent such as phenidone or hydroquinone or an inhibitor such as benzotriazole may be contained in the emulsion. Alternatively, in order to increase the processing ability of the processing solution, the backing layer can contain a developing agent or an inhibitor.
本発明番こ特に有利に用いられる親水性コロイドはゼラ
チンである。A hydrophilic colloid which is particularly advantageously used in the present invention is gelatin.
本発明に用いられるゼラチンは、アルカリ処理、酸処理
いずれも用いることが出来るが、オセインゼラチンを用
いる場合にはカルシウムあるいは鉄分を取り除くことが
好ましい。好ましい含有量としてカルシウム分は1〜9
99ppmであるが、更に好ましくはl 〜500pp
mであり、鉄分は0.01〜50ppmが好ましく、更
に好ましくは(Ll−10pp■である。このようにカ
ルシウム分や鉄分の量を調節する方法は、ゼラチン水溶
液をイオン交換装置に通すことにより達成することがで
きる。The gelatin used in the present invention can be treated with either alkali treatment or acid treatment, but when using ossein gelatin, it is preferable to remove calcium or iron. The preferred content of calcium is 1 to 9.
99 ppm, more preferably 1 to 500 ppm
m, and the iron content is preferably 0.01 to 50 ppm, more preferably (Ll - 10 ppm).The method for adjusting the amount of calcium and iron in this way is to pass an aqueous gelatin solution through an ion exchanger. can be achieved.
本発明に係るハロゲン化銀写真感光材料の現像に用いら
れる現像主薬としてはカテコール、ピロガロール及びそ
の誘導体ならびにアスコルビン酸、クロロハイドロキノ
ン、ブロモハイドロキノン、メチルハイドロキノン、2
,3−ジブロモハイドロキノン、 2.5−ジエチルハ
イドロキノン、カテコール、4−クロロカテコール、4
−7エニルーカテコール、3−メトキシ−カテコール、
4−アセチル−ピロガロール、アスコルビン酸ソーダ等
がある。Developing agents used in developing the silver halide photographic material according to the present invention include catechol, pyrogallol and its derivatives, ascorbic acid, chlorohydroquinone, bromohydroquinone, methylhydroquinone, 2
, 3-dibromohydroquinone, 2.5-diethylhydroquinone, catechol, 4-chlorocatechol, 4
-7enylcatechol, 3-methoxy-catechol,
Examples include 4-acetyl-pyrogallol and sodium ascorbic acid.
又、HO(CH= CH)、 NHw型現像剤として
は、オルト及びパラのアミノフェノールが代表的なもの
で、4−アミノフェノール、2−アミノ−6−フェニル
フェノール、2−アミノ−4−クロロ−6−フェニルフ
ェノール、N−メチル−p−アミノフェニール等がある
。Further, as HO (CH=CH), NHw type developers, ortho and para aminophenols are typical, and 4-aminophenol, 2-amino-6-phenylphenol, 2-amino-4-chloro -6-phenylphenol, N-methyl-p-aminophenyl, etc.
更に、H,N−(CH−C11)、−NH,型現像剤と
しては例えば4−アミノ−2−メチル−N、N−ジエチ
ルアニリン、2.4−ジアミノ−N、N−ジエチルアニ
リン、N−(4−アミノ−3−メチルフェニル
ンジアミン等がある。Further, examples of H,N-(CH-C11), -NH, type developers include 4-amino-2-methyl-N,N-diethylaniline, 2,4-diamino-N,N-diethylaniline, and N-diethylaniline. -(4-amino-3-methylphenylindiamine, etc.).
ヘテロ環型現像剤としては、l−フェニル−3−ピラゾ
リドン、l−7二二ルー4.4−ジメチル−3−ピラゾ
リドン、l−7zニル−4−メチル−4−ヒドロキシメ
チル−3−ピラゾリドンのような3−ピラゾリドン類、
l−フェニル−4−アミノ−5−ピラゾロン、5−アミ
ノラウシル等を挙げることができる。Examples of the heterocyclic developer include l-phenyl-3-pyrazolidone, l-722-4,4-dimethyl-3-pyrazolidone, and l-7znyl-4-methyl-4-hydroxymethyl-3-pyrazolidone. 3-pyrazolidones such as
Examples include l-phenyl-4-amino-5-pyrazolone and 5-aminolaucil.
T− H.ジェームス著ザ・セオリイ・オブ・ザ・ホト
グラフィック・プロセス第4版(The Theory
of Photographic Process F
ourth Edition)第291〜334頁及び
ジャーナル・オブ・ジ・アメリカン・ケミカル・ソサエ
ティ(Journal of the America
nChe+iical Society)第73巻、第
3.100頁(1951)に記載されているごとき現像
剤が本発明に有効に使用し得るものである。これらの現
像剤は単独で使用しても2種以上組み合わせてもよいが
、2種以上を組み合わせて用いる方が好ましい。また本
発明にかかる感光材料の現像に使用する現像液には保恒
剤として、例えば亜硫酸ソーダ、亜硫酸カリ、等の亜硫
酸塩を用いても、本発明の効果が損なわれることはない
。又保恒剤としてヒドロキシルアミン、ヒドラジド化合
物を用いることができ、この場合その使用量は現像液l
Q当たり5〜500gが好ましく、より好ましくは20
〜200gである。T-H. The Theory of the Photographic Process, 4th Edition, by James.
of Photographic Process F
291-334 and Journal of the American Chemical Society.
Developers such as those described in Che+iical Society, Vol. 73, p. 3.100 (1951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more types, but it is preferable to use two or more types in combination. Further, even if a sulfite salt such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the photosensitive material according to the invention, the effects of the invention will not be impaired. Hydroxylamine and hydrazide compounds can also be used as preservatives, and in this case, the amount used should be the same as that of the developer.
5 to 500 g per Q is preferred, more preferably 20
~200g.
又現像液には有機溶媒としてグリコール類を含有させて
もよく、そのようなグリコール類としてはエチレングリ
コール、ジエチレングリコール、プロピレングリコール
、トリエチレングリコール、1.4−ブタンジオール、
l、5−ベンタンジオール等があるが、ジエチレングリ
コールが好ましく用いられる。そしてこれらグリコール
類の好ましい使用量は現像液lQ当たり5〜500gで
、より好ましくは20〜200gである。これらの有機
溶媒は単独でも併用しても用いることができる。Further, the developer may contain glycols as an organic solvent, and such glycols include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol,
Among them, diethylene glycol is preferably used. The amount of these glycols used is preferably 5 to 500 g, more preferably 20 to 200 g per 1Q of developer solution. These organic solvents can be used alone or in combination.
本発明に係るハロゲン化銀写真感光材料は、上記の如き
現像抑制剤を含んだ現像液を用いて現像処理することに
より極めて保存安定性に優れた感光材料を得ることがで
きる。By developing the silver halide photographic material according to the present invention using a developer containing the above-mentioned development inhibitor, a photographic material having extremely excellent storage stability can be obtained.
上記の組成になる現像液のpH値は好ましくは9〜13
であるが、保恒性及び写真特性上からpH値はlO〜1
2の範囲が更に好ましい。現像液中の陽イオンについて
は、ナトリウムよりカリウムイオンの比率が高い程現像
液の活性度を高めることができるので好ましい。The pH value of the developer having the above composition is preferably 9 to 13.
However, from the viewpoint of storage stability and photographic properties, the pH value is 1O~1
A range of 2 is more preferred. Regarding cations in the developer, it is preferable that the ratio of potassium ions is higher than that of sodium because the activity of the developer can be increased.
本発明に係るハロゲン化銀写真感光材料は、種々の条件
で処理することができる。処理温度は、例えば現像温度
は50℃以下が好ましく、特に25℃〜40℃前後が好
ましく、又現像時間は2分以内に終了することが一般的
であるが、特に好ましくは10秒〜50秒が好効果をも
たらすことが多い。又現像以外の処理工程、例えば水洗
、停止、安定、定着、更に必要に応じて前硬膜、中和等
の工程を採用することは任意であり、これらは適宜省略
することもできる。更にまた、これらの処理は皿現像、
枠現像などいわゆる手現像処理でも、ローラー現像、ハ
ンガー現像など機械現像であってもよい。The silver halide photographic material according to the present invention can be processed under various conditions. As for the processing temperature, for example, the development temperature is preferably 50°C or lower, particularly preferably around 25°C to 40°C, and the developing time is generally completed within 2 minutes, particularly preferably 10 seconds to 50 seconds. often has positive effects. Furthermore, it is optional to employ processing steps other than development, such as washing with water, stopping, stabilizing, fixing, and if necessary, prehardening and neutralization, and these steps can be omitted as appropriate. Furthermore, these processes include plate development,
It may be a so-called manual development process such as frame development, or a mechanical development process such as roller development or hanger development.
以下実施例によって本発明を具体的に説明する。 EXAMPLES The present invention will be specifically explained below with reference to Examples.
なお、当然のことではあるが、本発明は以下述べる実施
例に限定されるものではない。Note that, as a matter of course, the present invention is not limited to the embodiments described below.
実施例1
コロナ放電した後、下引処理したポリエチレンテレフタ
レートに再びコロナ放電した後、下記組成の帯電防止液
に表1に示すエポキシ系硬化剤(E)を10cc/@2
になるように50m/+inの速さでエアーナイフコー
ターにより塗布した。Example 1 After corona discharge, the undercoated polyethylene terephthalate was corona discharged again, and 10 cc/@2 of the epoxy curing agent (E) shown in Table 1 was added to the antistatic liquid having the following composition.
It was coated with an air knife coater at a speed of 50 m/+in so that
水溶性導電性ポリマー(A) 疎水性ポリマー粒子 (B) 硫酸アンモニウム 硬化剤(E) 上記組成でlQとする。Water-soluble conductive polymer (A) Hydrophobic polymer particles (B) ammonium sulfate Hardening agent (E) The above composition is defined as lQ.
尚、Eは塗布しながら添加した。Note that E was added while coating.
乾燥風温90℃、総括伝熱係数25Kcal/(+n2
・hr・℃)の平行流乾燥条件で、30秒間乾燥した。Drying air temperature 90℃, overall heat transfer coefficient 25Kcal/(+n2
・hr・°C) under parallel flow drying conditions for 30 seconds.
次に前記導電柱層塗設面の裏面にコロナ放電した後、下
引処理し、再びコロナ放電をほどこした後、下記組成の
ゼラチン液を導電性層と同じ条件になるように塗布した
後、140℃、90秒間熱処理した。Next, after performing corona discharge on the back side of the conductive column layer coating surface, subbing treatment, and corona discharge again, a gelatin solution having the following composition was applied under the same conditions as the conductive layer. Heat treatment was performed at 140°C for 90 seconds.
オセインゼラチン 9g/Qドデシルベ
ンゼンスルホン
60g/Q
0gIQ
0、5g/Q
12g/ff
200■g/Q
α)CH = CH 2
上記組成でH2に仕上げる。Ossein gelatin 9g/Q Dodecylbenzenesulfone 60g/Q 0gIQ 0, 5g/Q 12g/ff 200g/Q α) CH = CH 2 Finish to H2 with the above composition.
このようにして得られた支持体を3分割し、■未処理
■導電性層にコロナ放電をかけ、裏面は無処理■導電性
層にコロナ放電をかけ、その後、裏面に紫外光処理を行
う。The support obtained in this way is divided into three parts, and the back side is untreated, the conductive layer is subjected to corona discharge, the back side is untreated, the conductive layer is subjected to corona discharge, and then the back side is treated with ultraviolet light. .
の3種類の処理を施した。Three types of treatments were performed.
これらの試料について、下記方法で裏放電ムラの評価を
行い、結果を表−1に示す。These samples were evaluated for back discharge unevenness by the following method, and the results are shown in Table 1.
裏放電ムラ試験
各支持体のゼラチン層塗設面に蒸気を当てると、濡れ性
の違いによりムラがみえる。この数、太き硬膜剤(H)
120mg#t
表−1
◎:裏放電ムラ無し。 O:出てはいるが使用可
△:問題のあるレベル X:使用不可表−1の結果
から本発明の試料は裏放電ムラの発生がないことがわか
る。Back discharge unevenness test When steam is applied to the gelatin layer coated surface of each support, unevenness can be seen due to differences in wettability. This number, thick hardening agent (H) 120mg#t Table-1 ◎: No back discharge unevenness. O: Appears but can be used △: Problematic level
実施例2
(試料作成)
実施例1と同じ条件で、厚さ100μ−のポリエチレン
テレフタレートペース上に、それぞれ導電性層及びゼラ
チン層を塗設した支持体を5分割し、以下の処理を行っ
た。Example 2 (Sample Preparation) Under the same conditions as Example 1, a support consisting of a 100μ-thick polyethylene terephthalate paste coated with a conductive layer and a gelatin layer was divided into 5 parts and subjected to the following treatment. .
導電性層重設面 裏面
11未処理 未処理
2、コロナlOW 未処理3、コロナ5
0W 未処理4、コロナ101
紫外光処理5、コロナ50W
紫外光処理向、導電性層は乳剤層(E C)側に塗設す
る場合とバッキング層(BC)側に塗設する場合につい
て行った。下記表2におけるOはこの塗設面を表す。Conductive layer overlapping side Back side 11 Untreated Untreated 2, Corona lOW Untreated 3, Corona 5
0W Untreated 4, Corona 101
Ultraviolet light treatment 5, Corona 50W
For ultraviolet light processing, the conductive layer was coated on the emulsion layer (EC) side and the backing layer (BC) side. O in Table 2 below represents this coating surface.
(乳剤調製)
pH3,0の酸性雰囲気下でコントロールダブルジェッ
ト法によりロジウムを銀1モル当たり10−’モル含有
する粒子を作成した。粒子の成長は、ベンジルアデニン
を1%のゼラチン水溶液1a当たり301Ig含有する
系で行った。銀とハライドの混合後6−メチルー4〜ヒ
ドロキシ−1,3,3a、7テトラザインデンをハロゲ
ン化銀1モル当たり600+sg加え、その後水洗、脱
塩した。(Emulsion Preparation) Grains containing 10-' mol of rhodium per mol of silver were prepared by the controlled double jet method in an acidic atmosphere at pH 3.0. Particle growth was performed in a system containing 301 Ig of benzyladenine per 1 a of 1% aqueous gelatin solution. After mixing silver and halide, 6-methyl-4-hydroxy-1,3,3a,7tetrazaindene was added in an amount of 600+sg per mole of silver halide, followed by washing with water and desalting.
次いで、ハロゲン化銀1モル当たり60mgの6−メチ
ル−4−ヒドロキシ−1,3,3a、7−チトラザイン
デンを加えた後、イオウ増感をした。イオウ増感後安定
剤として6−メチル−4−ヒドロキシ−1,3,3a、
7−チトラザインデンを加えた。Next, 60 mg of 6-methyl-4-hydroxy-1,3,3a,7-titrazaindene was added per mole of silver halide, followed by sulfur sensitization. 6-methyl-4-hydroxy-1,3,3a as a stabilizer after sulfur sensitization;
7-Chitrazaindene was added.
(ハロゲン化銀乳剤層)
前記各乳剤に添加剤を下記の付量になるよう調整添加し
、前記、支持体上に塗布した。(Silver Halide Emulsion Layer) Additives were added to each of the above emulsions in the amounts shown below, and coated onto the support.
ラテックスポリマー:スチレン−ブチルアクリレート−
アクリル酸3元共重合
ポリマー 1.0g/■2テト
ラフェニルホスホニウムクロライド30mg/+”
サポニン 200■g/lI2
ポリエチレングリコール 100■g / @
1ドデシルベンゼンスルホン酸ナトリウム100mg/
i+”
ハイドロキノン 200mg/m”
フェニドン 100曹gets”
スチレンスルホン酸ナトリウム−マレイン酸重合体(M
w=25万) 200mg/+m”没食
子酸ブチルエステル 500mg/m”ヒドラ
ジン化合物 20 m g / I@
25−メチルベンゾトリアゾール 30mg/
■22−メルカプトベンツイミダゾール−
スルホン酸 30a+g/+a
”イナートオセインゼラチン (等電点4.9)1、5
g/m”
1−(p−アセチルアミドフェニル)−5メルカプトテ
トラゾール
銀量
テトラゾリウム化合物
30+ag/m2
2、8g/m”
(乳剤層保護膜)
乳剤層保護膜として、下記の付量になるよう調製部布し
た。Latex polymer: styrene-butyl acrylate
Acrylic acid ternary copolymer polymer 1.0g/■2Tetraphenylphosphonium chloride 30mg/+"Saponin 200■g/lI2
Polyethylene glycol 100g / @
1 Sodium dodecylbenzenesulfonate 100mg/
i+”Hydroquinone 200mg/m”
Phenidone 100 Sou gets”
Sodium styrene sulfonate-maleic acid polymer (M
w=250,000) 200mg/+m" Gallic acid butyl ester 500mg/m" Hydrazine compound 20 mg/I@
25-methylbenzotriazole 30mg/
■22-mercaptobenzimidazole-sulfonic acid 30a+g/+a
“Inert ossein gelatin (isoelectric point 4.9) 1, 5
g/m" 1-(p-acetylamidophenyl)-5-mercaptotetrazole Silver amount Tetrazolium compound 30 + ag/m2 2.8 g/m" (Emulsion layer protective film) Prepared as an emulsion layer protective film to have the following amount. It was distributed.
弗素化ジオクチルスルホコハク酸エステル3001g/
la″
マット剤:ポリメタクリル酸メチル
(平均粒径3.5μm) 100mg
/m”硝酸リチウム塩 30+g/
m”酸処理ゼラチン(等電点7−0) 1.2
g/ls”コロイダルシリカ 50m
g/■2スチレンスルホン酸ナトリウム−
マレイン酸共重合体 100■g/■2(
バッキング層)
乳剤層とは反対側の支持体に、下記組成のバッキング染
料を含有するバッキング層を塗布した。Fluorinated dioctyl sulfosuccinate 3001g/
la'' Matting agent: Polymethyl methacrylate (average particle size 3.5 μm) 100 mg
/m” lithium nitrate salt 30+g/
m” acid-treated gelatin (isoelectric point 7-0) 1.2
g/ls” colloidal silica 50m
g/■2 Sodium styrene sulfonate-maleic acid copolymer 100 g/■2 (
Backing layer) A backing layer containing a backing dye having the following composition was coated on the support opposite to the emulsion layer.
ゼラチン層はグリオキザール及びl−オキシ−3,5−
ジクロロ−5−)リアジンナトリウム塩及びヒドロキシ
含有エポキシ化合物であるE−5で硬膜した。The gelatin layer contains glyoxal and l-oxy-3,5-
It was hardened with dichloro-5-)riazine sodium salt and E-5, a hydroxy-containing epoxy compound.
(バッキング層組成)
ハイドロキノン 100mg/m”
フェニドン 30mg/+”ラ
テックスポリマー:ブチルアクリレート−スチレン共重
合体 0.5g/+*”スチレン−マレ
イン酸共1 合体100■gem”クエン酸
40■g / s !ベンゾトリアゾ
ール 100mg/■2スチレンスルホ
ン酸−
マレイン酸共重合体 100mg/m”
硝酸リチウム塩 30mg/m”バ
ッキング染料(a )(b Xc )オセインゼラチン
2−0g1■2以上のようにして得
られた試料を全面露光し下記に示す現像液、定着液を使
用して現像処理した膜付き試験及び裏放電ムラ
後、表面比抵抗試験、
評価を行った。(Backing layer composition) Hydroquinone 100mg/m"
Phenidone 30mg/+" Latex polymer: Butyl acrylate-styrene copolymer 0.5g/+*"Styrene-maleic acid 1 combination 100 gems" Citric acid
40g/s! Benzotriazole 100mg/■2 Styrenesulfonic acid-maleic acid copolymer 100mg/m”
Lithium nitrate salt 30mg/m" Backing dye (a) (b After the treated film test and back discharge unevenness, a surface resistivity test and evaluation were performed.
〈現像液処方〉
ハイドロキノン
1−フェニル−4,4ジメチル−3
ピラゾリドン
臭化ナトリウム
5−メチルベンゾトリアゾール
5−ニトロインダゾール
ジエチルアミノプロパン−1,2−ジオール亜硫酸カリ
ウム
5−スルホサリチル酸ナトリウム
エチレンジアミン四酢酸ナトリウム
水でlaに仕上げ′た。<Developer formulation> Hydroquinone 1-phenyl-4,4 dimethyl-3 Pyrazolidone Sodium bromide 5-Methylbenzotriazole 5-Nitroindazole Diethylaminopropane-1,2-diol Potassium sulfite 5-Sulfosalicylate Sodium ethylenediaminetetraacetate In water It was finished in la.
pHは、苛性ソーダで11.5とした。The pH was adjusted to 11.5 with caustic soda.
く定着液処方〉
(組成A)
チオ硫酸アンモニウム(72,5w%
水溶液)
亜硫酸ナトリウム
5g
0.4g
g
0.3g
0.05g
0g
0g
5g
g
40mQ
7g
酢酸ナトリウム・3水塩 6.5g硼I
!6゜
クエン酸ナトリウム・2水塩 2g酢酸(
90w%水溶液) 13.6+Q(組
成り)
純水(イオン交換水)17■Q
硫酸(50冒%の水溶液) 3.0g
硫酸アルミニウム(AQ20.換算含量が8.1W%の
水溶液)20g
定者液の使用時に水500i中に上記組成A1組成りの
順に溶かし、lQに仕上げて用いた。この定着液のpH
は約5.6であった。Fixer formulation> (Composition A) Ammonium thiosulfate (72.5w% aqueous solution) Sodium sulfite 5g 0.4g g 0.3g 0.05g 0g 0g 5g g 40mQ 7g Sodium acetate trihydrate 6.5g Boron I
! 6゜Sodium citrate dihydrate 2g acetic acid (
90w% aqueous solution) 13.6+Q (composition) Pure water (ion exchange water) 17■Q Sulfuric acid (50w% aqueous solution) 3.0g
20 g of aluminum sulfate (AQ20. aqueous solution with a converted content of 8.1 W%) When using the evaluator solution, it was dissolved in 500 l of water in the order of the above composition A1 and finished to lQ before use. The pH of this fixer
was about 5.6.
〈現像処理条件〉
(工程) (温度) (時間)現像
40℃ 8秒
定着 35℃ 8秒
水洗 常温 lO秒
裏表面比抵抗測定し、膜付き、裏放電ムラを評価し、結
果を表−2に示した。<Development processing conditions> (Process) (Temperature) (Time) Development
Fixing at 40°C for 8 seconds, washing with water at 35°C for 8 seconds, and room temperature for 10 seconds.The back surface specific resistance was measured to evaluate film attachment and back discharge unevenness, and the results are shown in Table 2.
尚、表面比抵抗は川口電気(株)族テラオームメーター
モデルVE−30を用イテ23°O55%RHテ測定し
た。The surface resistivity was measured using a terra ohmmeter model VE-30 manufactured by Kawaguchi Electric Co., Ltd. at 23°O and 55%RH.
膜付評価
23℃、80%RHにて調湿した試料に軽く傷を入れ、
上からセロハンテープを接着し、剥がした時のセロハン
テープの面積に対する剥がれ方の度合いにより評価した
。Evaluation of film attachment: Lightly scratch a sample that has been conditioned at 23°C and 80% RH.
Cellophane tape was attached from above, and when it was peeled off, evaluation was made based on the degree of peeling relative to the area of the cellophane tape.
A:剥がれ無し
B:僅かに剥がれる
C:半分程剥がれる
D=全全面わたって剥がれる
(裏放電ムラの評価)
乳剤層(E C)塗布面:平均ベタ濃度0.7の試料を
作り、目視評価した。A: No peeling B: Slight peeling C: Approximately half peeling D = Peeling over the entire surface (evaluation of back discharge unevenness) Emulsion layer (E C) coated surface: A sample with an average solid density of 0.7 was prepared and visually evaluated. did.
バッキング層(BC)塗布面:明るみで、染料濃度差を
目視により評価した。Backing layer (BC) coated surface: Difference in dye concentration was visually evaluated based on brightness.
目視評価はm!当たりのムラの数で示した。Visual evaluation is m! It is expressed as the number of uneven hits.
a:Ob:1〜2
c : 3−10 d :10個以上表−
2の結果から本発明の方法によれば、現像処理後でも優
れた帯電防止能を保持し、かつ膜付き及び裏放電ムラも
良好であることが分かる。a: Ob: 1-2 c: 3-10 d: 10 or more table-
From the results of 2, it can be seen that according to the method of the present invention, excellent antistatic ability is maintained even after development processing, and film formation and back discharge unevenness are also good.
特に導電性層へのコロナ放電圧を上げ、裏面へのコロナ
放電処理を施しているl−5,1−10,2−5,2−
10,3−5,3−1Oは膜付き、裏放電ムラ共に優れ
ていることが分かる。In particular, the corona discharge voltage to the conductive layer is increased, and the back surface is treated with corona discharge.l-5,1-10,2-5,2-
It can be seen that 10,3-5,3-1O is excellent in both film formation and back discharge unevenness.
また、乳剤層中のテトラゾリウム化合物を下記ヒドラジ
ン化合物に代えても同様な効果があった。Furthermore, similar effects were obtained even when the tetrazolium compound in the emulsion layer was replaced with the following hydrazine compound.
ヒドラジン化合物
〔発明の効果〕
本発明により、高湿でも膜付き性に優れ、裏放電ムラ故
障も起こさず、かつ現像処理後も帯電防止能の劣化のな
い優れたハロゲン化銀写真感光材料の帯電防止層の塗設
方法を提供することができた。Hydrazine Compound [Effects of the Invention] The present invention provides an excellent charging silver halide photographic light-sensitive material that exhibits excellent film-forming properties even at high humidity, does not cause back discharge unevenness failure, and does not deteriorate in antistatic ability even after development processing. A method for applying a preventive layer could be provided.
Claims (1)
疎水性ラテックス及びエポキシ系硬化剤の反応生成物か
らなる帯電防止層を有し、かつ該帯電防止層塗設面の裏
側が紫外光処理されていることを特徴とするハロゲン化
銀写真感光材料。at least one layer of a water-soluble conductive polymer on the support;
1. A silver halide photographic material comprising an antistatic layer made of a reaction product of a hydrophobic latex and an epoxy curing agent, the back side of the surface on which the antistatic layer is coated being treated with ultraviolet light.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11705690A JPH0413133A (en) | 1990-05-07 | 1990-05-07 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11705690A JPH0413133A (en) | 1990-05-07 | 1990-05-07 | Silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0413133A true JPH0413133A (en) | 1992-01-17 |
Family
ID=14702335
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11705690A Pending JPH0413133A (en) | 1990-05-07 | 1990-05-07 | Silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0413133A (en) |
-
1990
- 1990-05-07 JP JP11705690A patent/JPH0413133A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5098822A (en) | Antistatic layer containing hydrophobic polymer particles and conductive polymer | |
JPH02266933A (en) | Antistatic layer | |
US5284741A (en) | Antistatic layer | |
US5094909A (en) | Antistatic layer | |
US5286618A (en) | Method for providing antistatic layer | |
JPH0413133A (en) | Silver halide photographic sensitive material | |
JP2940561B2 (en) | Antistatic layer | |
JPH04440A (en) | Silver halide photosensitive material | |
JPH0367249A (en) | Antistatic layer | |
JPH0481837A (en) | Silver halide photographic sensitive material | |
JPH049046A (en) | Silver halide photographic sensitive material | |
JPH0310243A (en) | Antistatic layer | |
JPH0359553A (en) | Silver halide photographic sensitive material subjected to antistatic treatment | |
JPH02266934A (en) | Antistatic layer | |
JPH03256039A (en) | Antistatic layer | |
JPH02298940A (en) | Antistatic layer | |
JPH02256051A (en) | Polyester base having antistatic layer | |
JPH037934A (en) | Antistatic layer | |
JPH0353241A (en) | Silver halide photographic sensitive material subjected to antistatic treatment | |
JPH0359647A (en) | Silver halide photographic sensitive material subjected to antistatic treatment | |
JPH037935A (en) | Photosensitive material | |
JPH04159539A (en) | Silver halide photographic sensitive material | |
JPH02291552A (en) | Antistatic layer | |
JPH03233445A (en) | Coating method for antistatic layer | |
JPH02298941A (en) | Antistatic layer |