JPH02256051A - Polyester base having antistatic layer - Google Patents
Polyester base having antistatic layerInfo
- Publication number
- JPH02256051A JPH02256051A JP4410689A JP4410689A JPH02256051A JP H02256051 A JPH02256051 A JP H02256051A JP 4410689 A JP4410689 A JP 4410689A JP 4410689 A JP4410689 A JP 4410689A JP H02256051 A JPH02256051 A JP H02256051A
- Authority
- JP
- Japan
- Prior art keywords
- polyester base
- antistatic layer
- latex
- antistatic
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000728 polyester Polymers 0.000 title claims abstract description 16
- 239000004816 latex Substances 0.000 claims abstract description 22
- 229920000126 latex Polymers 0.000 claims abstract description 22
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000000470 constituent Substances 0.000 claims abstract description 4
- 229920001940 conductive polymer Polymers 0.000 claims description 10
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 230000002209 hydrophobic effect Effects 0.000 claims description 2
- -1 alkyl methacrylate Chemical compound 0.000 abstract description 31
- 238000011161 development Methods 0.000 abstract description 16
- 125000005250 alkyl acrylate group Chemical group 0.000 abstract description 6
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- 150000001336 alkenes Chemical class 0.000 abstract description 5
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000178 monomer Substances 0.000 abstract description 3
- 230000006866 deterioration Effects 0.000 abstract 2
- 239000000463 material Substances 0.000 description 17
- 229910052709 silver Inorganic materials 0.000 description 15
- 239000004332 silver Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 229920000642 polymer Polymers 0.000 description 12
- 239000000839 emulsion Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 108010010803 Gelatin Proteins 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- 229920000159 gelatin Polymers 0.000 description 9
- 239000008273 gelatin Substances 0.000 description 9
- 235000019322 gelatine Nutrition 0.000 description 9
- 235000011852 gelatine desserts Nutrition 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 229920001600 hydrophobic polymer Polymers 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 208000028659 discharge Diseases 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000007720 emulsion polymerization reaction Methods 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 229920001567 vinyl ester resin Chemical class 0.000 description 2
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- HATRZINXSXGGHD-UHFFFAOYSA-N 1,1-dichloroethene;2-methylidenebutanedioic acid;methyl prop-2-enoate Chemical compound ClC(Cl)=C.COC(=O)C=C.OC(=O)CC(=C)C(O)=O HATRZINXSXGGHD-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- NXVHEHXRZVQDCR-UHFFFAOYSA-N 1-n,1-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1C NXVHEHXRZVQDCR-UHFFFAOYSA-N 0.000 description 1
- XIROXSOOOAZHLL-UHFFFAOYSA-N 2',3',4'-Trihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C(O)=C1O XIROXSOOOAZHLL-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- IQMGXSMKUXLLER-UHFFFAOYSA-N 2-hydroxy-5-sulfobenzoic acid;sodium Chemical compound [Na].OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O IQMGXSMKUXLLER-UHFFFAOYSA-N 0.000 description 1
- YBMTWYWCLVMFFD-UHFFFAOYSA-N 3-methylbutyl 3,4,5-trihydroxybenzoate Chemical compound CC(C)CCOC(=O)C1=CC(O)=C(O)C(O)=C1 YBMTWYWCLVMFFD-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- DSQWWSVOIGUHAE-UHFFFAOYSA-N 4-chloro-2-phenylphenol Chemical compound OC1=CC=C(Cl)C=C1C1=CC=CC=C1 DSQWWSVOIGUHAE-UHFFFAOYSA-N 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- BQCIJWPKDPZNHD-UHFFFAOYSA-N 5-bromo-2h-benzotriazole Chemical compound C1=C(Br)C=CC2=NNN=C21 BQCIJWPKDPZNHD-UHFFFAOYSA-N 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- RPWFJAMTCNSJKK-UHFFFAOYSA-N Dodecyl gallate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 RPWFJAMTCNSJKK-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- NWBJYWHLCVSVIJ-UHFFFAOYSA-N N-benzyladenine Chemical compound N=1C=NC=2NC=NC=2C=1NCC1=CC=CC=C1 NWBJYWHLCVSVIJ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- VOVLASAYEAYVHD-UHFFFAOYSA-N benzene-1,4-diol;1-phenylpyrazolidin-3-one Chemical compound OC1=CC=C(O)C=C1.N1C(=O)CCN1C1=CC=CC=C1 VOVLASAYEAYVHD-UHFFFAOYSA-N 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- XOPOEBVTQYAOSV-UHFFFAOYSA-N butyl 3,4,5-trihydroxybenzoate Chemical compound CCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 XOPOEBVTQYAOSV-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IYCOKCJDXXJIIM-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1.CCCCOC(=O)C=C IYCOKCJDXXJIIM-UHFFFAOYSA-N 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 229960000633 dextran sulfate Drugs 0.000 description 1
- 239000000555 dodecyl gallate Substances 0.000 description 1
- 235000010386 dodecyl gallate Nutrition 0.000 description 1
- 229940080643 dodecyl gallate Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 235000011389 fruit/vegetable juice Nutrition 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical class [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- OZSMDXCTZNLHPP-FJOGWHKWSA-M sodium;(z)-but-2-enedioic acid;2-phenylethenesulfonate Chemical compound [Na+].OC(=O)\C=C/C(O)=O.[O-]S(=O)(=O)C=CC1=CC=CC=C1 OZSMDXCTZNLHPP-FJOGWHKWSA-M 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical class 0.000 description 1
- WAGFXJQAIZNSEQ-UHFFFAOYSA-M tetraphenylphosphonium chloride Chemical compound [Cl-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 WAGFXJQAIZNSEQ-UHFFFAOYSA-M 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、プラスチックフィルム用の帯電防止層に関し
、特にハロゲン化銀写真感光材料用ポリエステルベース
に関スル。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an antistatic layer for plastic films, and particularly to a polyester base for silver halide photographic materials.
一般にプラスチイックフィルムは帯電性が強く、これが
使用上多くの制約を与えている例は多い。Generally, plastic films have strong electrostatic properties, and this often imposes many restrictions on their use.
例えばハロゲン化銀写真感光材料においてはポリエチレ
ンテレフタレートのような支持体が一般に使用されるが
1、特に冬季の如き低湿度において帯電し易い。最近の
ように高感度写真乳剤を高速度で塗布したり、高感度の
感光材料を自動プリンターを通して露光処理をする場合
、特に帯電防止対策が重要である。For example, supports such as polyethylene terephthalate are generally used in silver halide photographic materials, but they tend to become electrically charged, especially at low humidity such as in winter. Antistatic measures are especially important when high-speed photographic emulsions are coated at high speeds or when high-sensitivity photosensitive materials are exposed to light using automatic printers, as has been the case recently.
感光材料が帯電すると、その放電によりスタチックマー
クがでたり、またはゴミ等の異物を付着し、これにより
ピンホールを発生させたりして著しく品質を劣化し、そ
の修正のため非常に作業性をおとしてしまう。このため
、一般に感光材料では帯電防止剤が使用され、最近では
、含フツ素界面活性剤、カチオン界面活性剤、両性界面
活性剤、ポリエチレンオキサイド基を含有する界面活性
剤ないし高分子化合物、スルホン酸又はリン酸基を分子
内に有するポリマー等が用いられている。When a photosensitive material is charged, static marks appear due to the discharge, or foreign matter such as dust adheres to it, which causes pinholes and significantly degrades the quality, making it extremely difficult to repair. I'll put it down. For this reason, antistatic agents are generally used in photosensitive materials, and recently, fluorine-containing surfactants, cationic surfactants, amphoteric surfactants, surfactants or polymer compounds containing polyethylene oxide groups, and sulfonic acid Alternatively, a polymer having a phosphoric acid group in the molecule is used.
特にフッ素系界面活性剤による帯電列調整、あるいは導
電性ポリマーによる導電性向上が多く使用されてきてお
り、例えば特開昭49−91165号および同49−1
21523号にはポリマー主鎖中に解離基を有するイオ
ン型ポリマーを適用する例が開示されている。In particular, adjusting the charge series using fluorine-based surfactants or improving conductivity using conductive polymers has been widely used, for example, in JP-A-49-91165 and JP-A-49-1.
No. 21523 discloses an example in which an ionic polymer having a dissociative group in the polymer main chain is applied.
しかしながら、これらの従来技術では、現像処理により
、帯電防止能が大幅に劣化してしまう。However, in these conventional techniques, the antistatic ability is significantly deteriorated by the development process.
これはアルカリを用いる現像工程、酸性の定着工程、水
洗等の工程を経ることにより帯電防止能が失われるもの
と思われる。したがって印刷感光材料等のように、処理
済みフィルムをさらに用いてプリントするような場合に
、ゴミの付着によるピンホール発生等の問題を生ずる。This is thought to be because the antistatic ability is lost through processes such as a developing process using an alkali, an acidic fixing process, and washing with water. Therefore, when a processed film is further used for printing, such as with printing photosensitive materials, problems such as pinholes occur due to adhesion of dust.
このため例えば特開昭55−84658号、同61−
174542号ではカルボキシル基を有する水溶性導電
性ポリマー カルボキシル基を有する疎水性ポリマー及
び多官能アジリジンからなる帯電防止層が提案されてい
る。この方法によれば処理後にも帯電防止能を残すこと
ができるが、この帯電防止層は、この層の上に塗布され
る親水性コロイド層との接着性が悪く、現像処理中に膜
はがれを生ずるという欠点があった。For this reason, for example, JP-A-55-84658, JP-A-61-
No. 174542 proposes an antistatic layer comprising a water-soluble conductive polymer having a carboxyl group, a hydrophobic polymer having a carboxyl group, and a polyfunctional aziridine. Although this method allows antistatic properties to remain after processing, this antistatic layer has poor adhesion to the hydrophilic colloid layer coated on top of this layer, and the film may peel off during development. There was a drawback that it occurred.
そのため前記特許実施例では、ポリエステルベースを火
炎処理したり、下引き用ラテックスを塗布したりしてそ
の欠点を補っている。Therefore, in the above-mentioned patent examples, the polyester base is flame-treated or coated with latex for undercoating to compensate for the drawbacks.
該特許実施例で用いられているラテックスはビニルクロ
ライド系であり、これはポリエステルベースに対しては
接着性が良好であるが、水溶性導電性ポリマーとの接着
性は不充分であった。The latex used in the patent examples is vinyl chloride, which has good adhesion to polyester bases, but poor adhesion to water-soluble conductive polymers.
上記のような問題に対し、本発明の目的は、現像処理等
の処理後も帯電防止能の劣化が起こらず、しかも接着性
の優れたプラスチイックフィルム用の帯電防止層を提供
することであり、別の目的としては、帯電防止に優れた
ハロゲン化銀写真感光材料用ポリエステルベースを提供
することである。In order to solve the above-mentioned problems, an object of the present invention is to provide an antistatic layer for a plastic film that does not deteriorate in antistatic ability even after processing such as development and has excellent adhesive properties. Another object of the present invention is to provide a polyester base for silver halide photographic materials that has excellent antistatic properties.
本発明の上記目的は、帯電防止層を有するポリエステル
ベースにおいて、ポリエステルベースと帯電防止層の間
にスチレンを構成成分として含むラテックス下引層を設
けたことを特徴とするポリエステルベースにより達成さ
れた。また上記、帯電防止層は、■水溶性導電性ポリマ
ー ■疎水性ラテックス ■多官能アジリジンの反応生
成物からなることが好ましい。The above object of the present invention has been achieved by a polyester base having an antistatic layer, characterized in that a latex subbing layer containing styrene as a constituent is provided between the polyester base and the antistatic layer. The antistatic layer is preferably made of a reaction product of (1) a water-soluble conductive polymer, (2) a hydrophobic latex, and (2) a polyfunctional aziridine.
以下、本発明の詳細について説明する。The details of the present invention will be explained below.
本発明の下引き用ラテックスは下記−数式(I)で表わ
される。The undercoating latex of the present invention is represented by the following formula (I).
一数式CI) 以上含有されているのが好ましい。one formula CI) It is preferable that the content is above.
このラテックスポリマーの分子量は接着性にほとんど影
響がなく、10000以上であれば良い。The molecular weight of this latex polymer has little effect on adhesion and may be 10,000 or more.
一般の乳化重合で得られたものは、はとんど10000
以上の分子量をもつ。The amount obtained by general emulsion polymerization is approximately 10,000
It has a molecular weight of more than
本発明の下引き用ラテックスの具体例を示す。A specific example of the latex for undercoating of the present invention is shown below.
l。l.
式中、Aはスチレンと共重合可能な七ツマ−であり1種
類以上を表わす。In the formula, A represents one or more types of heptamers copolymerizable with styrene.
x : 10〜95モル%
y: 5〜90モル%
Aとしては、アルキルアクリレート、アルキルメタクリ
レート、オレフィン誘導体、ハロゲン化エチレン誘導体
、アクリルアミド誘導体、メタクリルアミド誘導体、ビ
ニルエステル誘導体、アクリロニトリル等があげられる
が、アルキルアクリレート、アルキルメタクリレート、
オレフィン誘導体が少なくとも20モル%以上、特には
30モル%2 。x: 10-95 mol% y: 5-90 mol% Examples of A include alkyl acrylates, alkyl methacrylates, olefin derivatives, halogenated ethylene derivatives, acrylamide derivatives, methacrylamide derivatives, vinyl ester derivatives, acrylonitrile, etc. Alkyl acrylate, alkyl methacrylate,
The olefin derivative is at least 20 mol% or more, especially 30 mol%2.
CI。C.I.
以下余や CH。The rest below CH.
CH。CH.
5 。5.
H2CQ 7 。H2CQ 7.
本発明の水溶性の導電性ポリマーとしては、スルホン酸
基、硫酸エステル基、4級アンモニウム塩、3級アンモ
ニウム塩、カルボキシル基、ポリエチレンオキシド基か
ら選ばれる、少なくとも一つの導電性基を有するポリマ
ーが挙げられる。これらの基のうちスルホン酸基、硫酸
エステル基、−(: CH。The water-soluble conductive polymer of the present invention includes a polymer having at least one conductive group selected from a sulfonic acid group, a sulfuric acid ester group, a quaternary ammonium salt, a tertiary ammonium salt, a carboxyl group, and a polyethylene oxide group. Can be mentioned. Among these groups, sulfonic acid group, sulfuric acid ester group, -(: CH.
C1l汁rr−f、CO−CH)−r−17−3O,N
a
4級アンモニウム塩基が好ましい。導電性基はポリマー
−分子当り5重量%以上を必要とする。導03Na
電性ポリマーの分子量は問わないが、3000〜100
000が好ましい。C1l juice rr-f, CO-CH)-r-17-3O,N
a Quaternary ammonium base is preferred. Conductive groups require at least 5% by weight per polymer molecule. Conductive 03Na The molecular weight of the conductive polymer does not matter, but it is between 3000 and 100.
000 is preferred.
本発明に用いられる水溶性導電性ポリマーの具体例を挙
げる。Specific examples of water-soluble conductive polymers used in the present invention will be given below.
03Lj CH。03Lj CH.
Mζ1万
デキストランサルフエイト M−50万置換度3
.0
本発明の水溶性導電性ポリマー層中に含有させる疎水性
ポリマー粒子は、実質的に水に溶解しない所謂ラテック
スで構成されている。この疎水性ポリマーは、スチレン
、スチレン誘導体、アルキルアクリレート、アルキルメ
タクリレート、オレフィン誘導体、ハロゲン化エチレン
誘導体、アクリルアミド誘導体、メタクリルアミド誘導
体、ビニルエステル誘導体、アクリルニトリル等の中か
ら任意の組み合わせで選ばれるモノマーを重合して得ら
れる。特にスチレン誘導体、アルキルアクリレート、ア
ルキルメタクリレートが少なくとも30モル%含有され
ているのが好ましい。特に50モル%以上が好ましい。Mζ10,000 dextran sulfate M-500,000 degree of substitution 3
.. 0 The hydrophobic polymer particles contained in the water-soluble conductive polymer layer of the present invention are composed of so-called latex which is substantially insoluble in water. This hydrophobic polymer contains monomers selected from styrene, styrene derivatives, alkyl acrylates, alkyl methacrylates, olefin derivatives, halogenated ethylene derivatives, acrylamide derivatives, methacrylamide derivatives, vinyl ester derivatives, acrylonitrile, etc. in any combination. Obtained by polymerization. In particular, it is preferable that at least 30 mol% of styrene derivatives, alkyl acrylates, and alkyl methacrylates are contained. Particularly preferred is 50 mol% or more.
疎水性ポリマーをラテックス状にするには乳化重合をす
る、固体状のポリマーを低沸点溶媒に溶かして微分牧後
、溶媒を留去するという2つの方法があるが粒径が細か
く、シかもそろったものができるという点で乳化重合す
ることが好ましい。There are two methods to make a hydrophobic polymer into a latex, one is to perform emulsion polymerization, and the other is to dissolve the solid polymer in a low-boiling point solvent, differentiate it, and then distill off the solvent. Emulsion polymerization is preferable because it allows the production of
乳化重合の際に用いる界面活性剤としては、アニオン性
、ノニオン性を用いるのが好ましく、モノマーに対し1
0重量%以下が好ましい。多量の界面活性剤は導電性層
をくもらせる原因となる。As the surfactant used during emulsion polymerization, it is preferable to use an anionic or nonionic surfactant.
It is preferably 0% by weight or less. A large amount of surfactant causes clouding of the conductive layer.
ポリマー粒子の平均粒径はコールタ−社製コールタ−N
4を用いて測定した。The average particle size of the polymer particles is Coulter N manufactured by Coulter Co.
Measured using 4.
疎水性ポリマーの分子量は3000以上であれば良く、
分子量による透明性の差はほとんどない。The molecular weight of the hydrophobic polymer may be 3000 or more,
There is almost no difference in transparency depending on molecular weight.
本発明の疎水性ポリマーの具体例を挙げる。Specific examples of the hydrophobic polymer of the present invention will be given below.
C11゜ ■ 6 。C11゜ ■ 6.
CH。CH.
0OCH3
COOC,H,−n
OOH
13゜
C00CH5
COOC2H60
0OH
14,
15゜
本発明では導電性層が透明支持体上に塗設される。透明
支持体は写真用のもの全てが使えるが好ましくは、可視
光を90%以上透過するように作られたポリエチレンテ
レフタレート又セルローストリアセテートである。0OCH3 COOC,H, -n OOH 13° C00CH5 COOC2H60 0OH 14, 15° In the present invention, a conductive layer is coated on a transparent support. As the transparent support, any photographic support can be used, but polyethylene terephthalate or cellulose triacetate, which is made to transmit 90% or more of visible light, is preferred.
これらの透明支持体は、当業者に良く知られた方法で作
成されるものであるが、場合によりでは光透過を実質的
に阻害しないように染料を若干添加して青味付けしたり
しても良い。These transparent supports are prepared by methods well known to those skilled in the art, but in some cases, a small amount of dye may be added to give them a blue tint so as not to substantially inhibit light transmission. good.
本発明の支持体は、コロナ放電処理をした後ラテックス
ポリマーを含有する下引層が塗設されていてもよい。コ
ロナ放電処理は、エネルギー値としてl mW〜l K
W/a”αinが特に好ましく適用される。The support of the present invention may be coated with a subbing layer containing a latex polymer after being subjected to a corona discharge treatment. Corona discharge treatment has an energy value of l mW to l K
W/a''αin is particularly preferably applied.
又持に好ましくは、ラテックス下引m塗布後導電性層を
塗設する前Iこコロナ放電処理を再度行うとよい。It is also preferable to carry out corona discharge treatment again after applying the latex undercoat and before applying the conductive layer.
本発明の導電性層を硬化する化合物としては、多官能の
アジリジンが好ましい。特に2官能、3官能で分子量が
600以下のものが好ましい。As the compound for curing the conductive layer of the present invention, polyfunctional aziridine is preferred. Particularly preferred are those having bifunctional or trifunctional properties and a molecular weight of 600 or less.
本発明の導電性層は感光性層より支持体側にあってもよ
いし、感光層に対し支持体の反対側、いわゆる背面にあ
ってもよい。The conductive layer of the present invention may be located closer to the support than the photosensitive layer, or may be located on the opposite side of the support to the photosensitive layer, ie, on the back surface.
本発明は、支持体上に形成される感光材料金てに応用す
ることができる。例えばハロゲン化銀カラー感光材料、
レントゲン用感光材料、製版用感光材料等である。The present invention can be applied to photosensitive materials formed on a support. For example, silver halide color photosensitive materials,
These include photosensitive materials for X-rays and photosensitive materials for plate making.
本発明に用いられるハロゲン化銀乳剤は、例えば米国特
許第2.444.607号、同第2,716.062号
、同第3.512.982号、西独国出願公告第1.1
89.380号、同第2,058,626号、同第2,
118.411号、特公昭43−4133号、米国特許
第3.342.596号、特公昭47−4417号、西
独国出願公告第2,149.789号、特公昭39−2
825号、特公昭49−13566号等の各明細書また
は公報に記載されている化合物、好ましくは、例えば5
゜6−トリメチレンー7−ヒドロキシンーS−トリアゾ
ロ (1,5−a)ピリミジン、5,6−テトラメチレ
ンー7−ヒドロキシーS−トリアゾロ (1,5−a)
ピリミジン、5−メチル−7−ヒドロキシ−5−トリア
ゾロ(1,5−a)ピリミジン、5−メチル−7−ヒド
ロキシルS−トリアゾロ (1,5−a)ピリミジン、
′7−ヒドロキシンーs−トリアシロン(1,5−a)
ピリミジン、5−メチル−6−プロモーフ−ヒドロキシ
−S−トリアゾロ(1,5−a)ピリミジン、没食子酸
エステル(例えば没食子酸イソアミル、没食子酸ドデシ
ル、没食子酸プロピル、没食子酸ナトリウム)、メルカ
プタン類(l−フェニル−5−メルカプトテトラゾール
、2−メルカプトベンツチアゾール)、ベンゾトリアゾ
ール類(5−ブロムベンツトリアゾール、5−メチルベ
ンツトリアゾール)、ベンツイミダゾール類(6−ニド
ロペンツイミダゾール)等を用いて安定化することがで
きる。The silver halide emulsion used in the present invention is, for example, US Pat. No. 2.444.607, US Pat. No. 2,716.062, US Pat.
No. 89.380, No. 2,058,626, No. 2,
No. 118.411, Japanese Patent Publication No. 43-4133, U.S. Patent No. 3.342.596, Japanese Patent Publication No. 4417-1987, West German Publication No. 2,149.789, Japanese Patent Publication No. 39-2
Compounds described in specifications or publications such as No. 825 and Japanese Patent Publication No. 49-13566, preferably, e.g.
゜6-trimethylene-7-hydroxyne-S-triazolo (1,5-a) pyrimidine, 5,6-tetramethylene-7-hydroxy-S-triazolo (1,5-a)
Pyrimidine, 5-methyl-7-hydroxy-5-triazolo(1,5-a)pyrimidine, 5-methyl-7-hydroxyl S-triazolo(1,5-a)pyrimidine,
'7-hydroxyne-s-triacylone (1,5-a)
Pyrimidine, 5-methyl-6-promorph-hydroxy-S-triazolo(1,5-a)pyrimidine, gallic acid esters (e.g. isoamyl gallate, dodecyl gallate, propyl gallate, sodium gallate), mercaptans (l -Phenyl-5-mercaptotetrazole, 2-mercaptobenzthiazole), benzotriazoles (5-bromobenztriazole, 5-methylbenztriazole), benzimidazoles (6-nidropenzimidazole), etc. for stabilization. be able to.
本発明に係るハロゲン化銀写真感光材料及び/又は現像
液中には、アミノ化合物を含有することができる。The silver halide photographic material and/or developer according to the present invention may contain an amino compound.
又現像性を高めるために、フェニドンやハイドロキノン
のような現像主薬、ベンゾトリアゾールのような抑制剤
を乳剤側に含有せしめることができる。あるいは剋理液
の処理能力を上げるために、バッキング層に現像主薬や
抑制剤を含有せしめることができる。Further, in order to improve the developability, a developing agent such as phenidone or hydroquinone or an inhibitor such as benzotriazole may be contained in the emulsion. Alternatively, the backing layer may contain a developing agent or an inhibitor in order to increase the processing ability of the processing solution.
本発明に特に有利に用いられる親水性コロイドはゼラチ
ンである。A hydrophilic colloid used with particular advantage in the present invention is gelatin.
本発明に用いられるゼラチンは、アルカリ九埋、酸処理
いずれも用いることが出来るが、オセインゼラチンを用
いる場合にはカルシウムあるいは鉄分を取り除くことが
好ましい。好ましい含有量としてカルシウム分は1〜9
99ppmであるが、更に好ましくは11−500pp
であり、鉄分は0.001−50ppが好ましく、更に
好ましくは0.1〜1OPPffiである。このように
カルシウム分や鉄分の量を調節する方法は、ゼラチン水
溶液をイオン交換装置に通すことにより達成することが
できる。The gelatin used in the present invention can be treated with alkali or acid, but when using ossein gelatin, it is preferable to remove calcium or iron. The preferred content of calcium is 1 to 9.
99 ppm, more preferably 11-500 ppm
The iron content is preferably 0.001-50 pp, more preferably 0.1-1 OPPffi. The amount of calcium and iron can be adjusted in this way by passing an aqueous gelatin solution through an ion exchange device.
本発明に係るハロゲン化銀写真感光材料の現像に用いら
れる現像主薬としてはカテコール、ピロガロール及びそ
の誘導体ならびにアスコルビン酸、クロロハイドロキノ
ン、フロモハイドロキノン、メチルハイドロキノン、2
.3−ジブロモハイドロキノン、2.5−ジエチルハイ
ドロキノン、カテコール、4−クロロカテコール、4−
フェニル−カテコール、3−メトキシ−カテコール、4
−アセチル−ピロガロール、アスコルビン酸ソーダ等が
ある。Developing agents used in developing the silver halide photographic material according to the present invention include catechol, pyrogallol and its derivatives, ascorbic acid, chlorohydroquinone, furohydroquinone, methylhydroquinone, 2
.. 3-dibromohydroquinone, 2,5-diethylhydroquinone, catechol, 4-chlorocatechol, 4-
Phenyl-catechol, 3-methoxy-catechol, 4
-Acetyl-pyrogallol, sodium ascorbic acid, etc.
又、HO−(CH−CH)、−NH2型現像現像剤ては
、オルト及びパラのアミノフェノールが代表的なもので
、4−アミンフェノール、2−アミノ−6−フェニルフ
ェノール、2−アミノ−4−クロロ−6−フェニルフェ
ノール、N−メチル−p−アミノフェニール等がある。In addition, typical examples of HO-(CH-CH), -NH2 type developers include ortho and para aminophenols, such as 4-aminephenol, 2-amino-6-phenylphenol, and 2-amino- Examples include 4-chloro-6-phenylphenol and N-methyl-p-aminophenyl.
更に、H2N (CH= CM)、 Nth型現像
現像剤ては例えば4−アミノ−2−メチル−N、N−ジ
エチルアニリン、2.4−ジアミノ−N、N−ジエチル
アニリン、N−(4−アミノ−3−メチルフェニル)−
モルホリン、p−フェニレンジアミン等がある。Furthermore, H2N (CH= CM), Nth type developer such as 4-amino-2-methyl-N, N-diethylaniline, 2.4-diamino-N, N-diethylaniline, N-(4- amino-3-methylphenyl)-
Examples include morpholine and p-phenylenediamine.
ヘテロ環を現像剤としては、l−フェニル−3−ピラゾ
リドン、l−フェニル−4,4−ジメチル−3−ピラゾ
リドン、1−フェニル−4−メチル−4−ヒドロキシメ
チル−3−ピラゾリドンのような3−ピラゾリドン類、
l−フェニル−4−アミノ−5−ピラゾロン、5−アミ
ノラウシル等を挙げることができる。Examples of heterocyclic developers include 3-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, etc. -pyrazolidones,
Examples include l-phenyl-4-amino-5-pyrazolone and 5-aminolaucil.
T、H,ジェームス著ザ・セオリイ・オブ・ザ・ホトグ
ラフィック・プロセス第4版(The TheorVo
f Photographic Process Fo
urth Edition)第291〜334頁及びジ
ャーナル・オプ・ジ・アメリカン・ケミカル拳ンサエテ
ィ(Journal of the American
Chea+1cal 5ociety)第73巻、第3
,100頁(1951)に記載されているごとき現像剤
が本発明に有効に使用し得るものである。これらの現像
剤は単独で使用しても2種以上組み合わせてもよいが、
2種以上を組み合わせて用いる方が好ましい。また本発
明にかかる感光材料の現像に使用する現像液には保恒剤
として、例えば亜硫酸ソーダ、亜硫酸カリ、等の亜硫酸
塩を用いても、本発明の効果が損なわれることはない。The Theory of the Photographic Process, 4th Edition, by T. H. James
f Photographic Process Fo
urth Edition), pp. 291-334 and Journal of the American Chemical Society.
Chea+1cal 5ociety) Volume 73, No. 3
, p. 100 (1951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more, but
It is preferable to use two or more types in combination. Further, even if a sulfite salt such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the photosensitive material according to the invention, the effects of the invention will not be impaired.
又保恒剤としてヒドロキシルアミン、ヒドラジド化合物
を用いることができ、この場合その使用量は現像液IQ
当たり5〜500gが好ましく、より好ましくは20〜
200gである。Hydroxylamine and hydrazide compounds can also be used as preservatives, and in this case, the amount used depends on the developer IQ.
It is preferably 5 to 500g, more preferably 20 to 500g.
It is 200g.
又現像液には有機溶媒としてグリコール類を含有させて
もよく、そのようなグリコール類としてはエチレングリ
コール、ジエチレングリコール、プロピレングリコール
、トリエチレングリコール、1.4−ブタンジオール、
l、5−ベンタンジオール等があるが、ジエチレングリ
コールが好ましく用いられる。そしてこれらグリコール
類の好ましい使用量は現像液lQ当たり5〜500gで
、より好ましくは20〜200gである。これらの有機
溶媒は単独でも併用しても用いることができる。Further, the developer may contain glycols as an organic solvent, and such glycols include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol,
Among them, diethylene glycol is preferably used. The amount of these glycols used is preferably 5 to 500 g, more preferably 20 to 200 g per 1Q of developer solution. These organic solvents can be used alone or in combination.
本発明に係るハロゲン化銀写真感光材料は、上記の如き
現像抑制剤を含んだ現像液を用いて現像処理することに
より極めて保存安定性に優れた感光材料を得ることがで
きる。By developing the silver halide photographic material according to the present invention using a developer containing the above-mentioned development inhibitor, a photographic material having extremely excellent storage stability can be obtained.
上記の組成になる現像液のpH値は好ましくは9〜13
であるが、保恒性及び写真特性上からpH値はlO〜1
2の範囲が更に好ましい。現像液中の陽イオンについて
は、ナトリウムよりカリウムイオンの比率が高い程現像
液の活性度を高めることができるので好ましい。The pH value of the developer having the above composition is preferably 9 to 13.
However, from the viewpoint of storage stability and photographic properties, the pH value is 1O~1
A range of 2 is more preferred. Regarding cations in the developer, it is preferable that the ratio of potassium ions is higher than that of sodium because the activity of the developer can be increased.
本発明に係るハロゲン化銀写真感光材料は、種々の条件
で処理することができる。処理温度は、例えば現像温度
は50°C以下が好ましく、特に25℃〜40℃前後が
好ましく、又現像時間は2分以内に終了することが一般
的であるが、特に好ましくは10秒〜50秒が好効果を
もたらすことが多い。又現像以外の処理工程、例えば水
洗、停止、安定、定着、更に必要に応じて前硬膜、中和
等の工程を採用することは任意であり、これらは適宜省
略することもできる。更にまた、これらの処理は皿現像
、枠環像などいわゆる手現像処理でも、ローラー現像、
ハンガー現像などI!械現像であってもよい。The silver halide photographic material according to the present invention can be processed under various conditions. As for the processing temperature, for example, the development temperature is preferably 50°C or less, particularly preferably around 25°C to 40°C, and the developing time is generally completed within 2 minutes, particularly preferably 10 seconds to 50°C. Seconds often have a positive effect. Furthermore, it is optional to employ processing steps other than development, such as washing with water, stopping, stabilizing, fixing, and if necessary, prehardening and neutralization, and these steps can be omitted as appropriate. Furthermore, these processes include so-called manual development processes such as plate development and frame ring image, roller development,
Hanger development etc.I! Mechanical development may also be used.
以下実施例によって本発明を具体的に説明する。 EXAMPLES The present invention will be specifically explained below with reference to Examples.
なお、当然のことではあるが、本発明は以下述べる実施
例に限定されるものではない。Note that, as a matter of course, the present invention is not limited to the embodiments described below.
実施例−1
コロナ放電処理したポリエチレンテレフタレートに下記
組成のラテックス下引きを施した。Example 1 Polyethylene terephthalate treated with corona discharge was coated with latex of the following composition.
本発明の下引き用ラテックス(A) 10cc(3Q%固形分) 全てあわせて100ccなる様に水を加える。Latex for undercoating of the present invention (A) 10cc (3Q% solids) Add water to make a total of 100cc.
20μ腸の厚さで塗布し、100℃で1分間乾燥させた
。この下引き層の上にコロナ放電した後、下記組成の帯
電防止液と、33s/winの速さでa−ルフィットコ
ーティングバン及びエアーナイフを用い10−g/am
’になる様に塗布し、90°02分間乾燥後、140℃
90秒間熱処理をした。It was coated at a thickness of 20 μm and dried at 100° C. for 1 minute. After corona discharge on this undercoat layer, 10-g/am was applied using an antistatic liquid with the following composition and an a-rufit coating van and an air knife at a speed of 33 s/win.
' After drying at 90°C for 2 minutes, apply at 140°C.
Heat treatment was performed for 90 seconds.
水溶性導電性ポリマー(B) 6g/(1ラテツクス
(C) 4g/Q硬膜剤H1,5g/12
水を加えて la
この試料について膜付試験を行った。Water-soluble conductive polymer (B) 6g/(1 Latex (C) 4g/Q Hardener H1.5g/12 Water was added la A film formation test was conducted on this sample.
(1)接着力試験
〈乾燥膜付試験ン
試料の乳剤面に、カミソリで浅傷を基盤の目状につけ、
その上にセロハン接着テープを圧着しI;のち該テープ
を急激に剥離したときの、セロハンテープの接着面積に
対する乳剤膜の残存率を百分率で示した。(1) Adhesion test <On the emulsion surface of the test sample with a dry film, make shallow scratches in the shape of the base with a razor.
When a cellophane adhesive tape was pressure-bonded thereon and then the tape was rapidly peeled off, the residual rate of the emulsion film relative to the adhesive area of the cellophane tape was expressed as a percentage.
く処理膜付試験〉
処理浴中で試料の乳剤面にキリ状の鋭利な先端で基盤の
目状に傷をつけて、その面をこすり、乳剤膜の残存率を
百分率で示した。実用上、この百分率が8.0%以上で
あれば支障ない。Treatment film test> In a processing bath, the emulsion surface of the sample was scratched in the shape of a substrate with a sharp end, and the surface was rubbed, and the residual rate of the emulsion film was expressed as a percentage. In practice, there is no problem if this percentage is 8.0% or more.
(2)ヘーズ試験
東京電色株式会社製濁度計MODEL T−260OD
Aを用いフィルム支持体を測定してヘーズを百分率で示
した。(2) Haze test Turbidity meter MODEL T-260OD manufactured by Tokyo Denshoku Co., Ltd.
The film support was measured using A and the haze was expressed as a percentage.
表−1
(A)(B)(C)乾燥(%)処理(%)本発明 (3
) (5) (8) 100 100//
(4)(4) // 100 100/
! (6)(4) // too
100// (8)(4) //
100 100// (/1)(5)
(7) 100 100// (//
)(11)(12) 100 100//
(// )(12)(6) 100
100比 較 (a)(4)(8) 80
75a:特開昭55−84658記載の
ポリ(ビニリデンクロライドメチルアクリレート−イタ
コン酸)
表−1の結果より、本発明の試料は比較に対して膜付が
良好で、しかも処理後でも膜付が劣化しないことが明ら
かである。Table-1 (A) (B) (C) Drying (%) Treatment (%) Present invention (3
) (5) (8) 100 100//
(4) (4) // 100 100/
! (6) (4) // too
100// (8) (4) //
100 100// (/1) (5)
(7) 100 100// (//
)(11)(12) 100 100//
(// ) (12) (6) 100
100 comparison (a) (4) (8) 80
75a: Poly(vinylidene chloride methyl acrylate-itaconic acid described in JP-A-55-84658) From the results in Table 1, the sample of the present invention had better film adhesion compared to the comparison, and the film adhesion deteriorated even after treatment. It is clear that it does not.
実施例−2
pH3,0の酸性雰囲気下でフントロールダブルジェッ
ト法によりロジウムを銀1モル当たりto−’モル含有
する粒子を作成した。粒子の成長は、ベンジルアデニン
を1%のゼラチン水溶液14当たり30mg含有する系
で行った。銀とハライドの混合後6メチルー4−ヒドロ
キシ−1,3,3a、7テトラザインデンをハロゲン化
銀1モル当たり600mg加え、その後水洗、脱塩した
。Example 2 Particles containing to-' mol of rhodium per mol of silver were prepared by the Funtrol double jet method in an acidic atmosphere with a pH of 3.0. Particle growth was carried out in a system containing 30 mg of benzyladenine per 14 1% aqueous gelatin solution. After mixing silver and halide, 600 mg of 6-methyl-4-hydroxy-1,3,3a,7-tetrazaindene was added per mole of silver halide, followed by washing with water and desalting.
次いで、ハロゲン化銀1モル当たり60mgの6−メチ
ル−4−ヒドロキシ−1,3,3a、7−テトラザイン
デンを加えた後、イオウ増感をした。イオウ増感後安定
剤として6−メチル−4−ヒドロキシ−1,3゜3a、
7−テトラザインデンを加えた。Next, 60 mg of 6-methyl-4-hydroxy-1,3,3a,7-tetrazaindene per mole of silver halide was added, followed by sulfur sensitization. 6-methyl-4-hydroxy-1,3°3a as a stabilizer after sulfur sensitization;
7-Tetrazaindene was added.
(ハロゲン化銀乳剤層)
前記各乳剤に添加剤を下記の付量になるよう調整添加し
、ラテックス下引処理した(100μ烟厚さ)ポリエチ
レンテレフタレート支持体上に塗布しtこ。(Silver halide emulsion layer) Additives were added to each of the above emulsions in the amounts shown below, and coated on a polyethylene terephthalate support (100 μm thick) that had been subjected to latex subbing treatment.
ラテックスポリマー:スチレン−ブチルアクリレート−
アクリル酸3元共重合
ポリマー 1.0g/m”テト
ラフェニルホスホニウムクロライド30mg/a”
サポニン 200mg/m”ポ
リエチレングリコール 100mg/+m”ド
テシルベンゼンスルホン酸ナトリウム100膓g/−2
ハイドロキノン 200+mg/論
2フェニドン 100mg/m’
スチレンスルホン酸ナトリウム−マレイン酸重合体(M
y−25万) 200mg/m”没食子
酸ブチルエステル 500ag/m”テトラゾ
リウム塩 20+++g/m”5−メ
チルベンゾトリアゾール 30+sg/畷22−メ
ルカプトベンツイミダゾール−5スルホン酸
30−g/m”イナートオセインゼラチ
ン (等電点4.9)1.5g/m”
1−(p−アセチルアミドフェニル)−5メルカプトテ
トラゾール 30mg/m”銀量
2.8g/m”テトラゾリ
ウム化合物
(乳剤層保護膜)
乳剤層保護膜として、下記の付量になるよう調製塗布し
た。Latex polymer: styrene-butyl acrylate
Acrylic acid ternary copolymer 1.0g/m"Tetraphenylphosphonium chloride 30mg/a"Saponin 200mg/m"Polyethylene glycol 100mg/+m"Sodium dotecylbenzenesulfonate 100g/-2Hydroquinone 200+mg/2 phenidone 100mg/m'
Sodium styrene sulfonate-maleic acid polymer (M
y-250,000) 200mg/m" gallic acid butyl ester 500ag/m" tetrazolium salt 20+++g/m"5-methylbenzotriazole 30+sg/naw 22-mercaptobenzimidazole-5 sulfonic acid
30-g/m" Inatoossein gelatin (isoelectric point 4.9) 1.5 g/m" 1-(p-acetylamidophenyl)-5 mercaptotetrazole 30 mg/m" Silver amount
2.8 g/m'' tetrazolium compound (emulsion layer protective film) The following amount was prepared and coated as an emulsion layer protective film.
弗素化ジオクチルスルホコハク酸エステル300a+g
/m”
マット剤:ポリメタクリル酸メチル(平均粒径3゜5μ
”) 100mg/m”硝
酸リチウム塩 30■g / m
1酸処理ゼラチン(等電点7.0) 1.2g
/+a”コロイダルシリカ 50mg
/+*”スチレンスルホン酸ナトリウム−マレイン酸共
重合体
100mg/+*”
媒染剤
CHs CQe
染料
シー3.5−ジクロロ−5−トリアジンナト膜 し を
二 。Fluorinated dioctyl sulfosuccinate ester 300a+g
/m” Matting agent: Polymethyl methacrylate (average particle size 3゜5μ
”) 100mg/m”Lithium nitrate salt 30g/m
1 acid-treated gelatin (isoelectric point 7.0) 1.2g
/+a” colloidal silica 50mg
/+*"Sodium styrene sulfonate-maleic acid copolymer 100mg/+*" Mordant CHs CQe Dye sea 3.5-dichloro-5-triazine sodium membrane Shiwo 2.
(バッキング層)
ハイドロキノン
フェニドン
ラテックスポリマー:ブチルアク
スチレン共重合体
スチレン−マレイン酸共11体
クエン酸
ベンゾトリアゾール
硝酸リチウム塩
バッキング染料
オセインゼラチン
リウム塩で硬
100−g/rs’
30mg/■8
リレート
0.5g/m’
100mg/m’
40mg/@’
■0011g/11!
30mg/n’
2.0g/w2
(バッキング層)
乳剤層とは反対側の支持体に、あらかじめ30W/s”
+sinのパワーでコロナ放電した後、本発明の下引き
層と帯電防止層を施しついでこの層上に下記組成のバッ
キング染料を含有するバッキング層を塗布した。ゼラチ
ン層はグリオキザール及びl−オキ以上のようにして得
られた試料を全面露光し下記に示す現像液、定着液を使
用して現像処理した後、ヘーズ、膜付試験を行った。(Backing layer) Hydroquinone phenidone latex polymer: butyl axtyrene copolymer styrene-maleic acid co-11 units citric acid benzotriazole nitrate lithium salt backing dye ossein gelatin lithium salt hardness 100-g/rs' 30 mg/■8 lylate 0.5g/m'100mg/m'40mg/@' ■0011g/11! 30mg/n' 2.0g/w2 (Backing layer) 30W/s"
After corona discharge with +sin power, the undercoat layer and antistatic layer of the present invention were applied, and then a backing layer containing a backing dye having the following composition was applied on this layer. The gelatin layer was prepared by exposing the entire surface of the sample obtained above with glyoxal and l-oxal, developing it using the developer and fixer shown below, and then conducting haze and film tests.
〈現像液処方〉
ハイドロキノン 25g1−フ
ェニル−4,4ジメチル−3−
ビラゾリドン 0.4g臭化
ナトリウム 3g5−メチルベ
ンゾトリアゾール 0.3g5−ニトロインダ
ゾール 0.05g5gジエチルアミノプ
ロパン−2−ジオール 10g亜硫酸カリウム
90g5−スルホサリチル酸ナトリウ
ム 75gエチレンジアミン四酢酸ナトリウム
2g水でIQに仕上げた。<Developer formulation> Hydroquinone 25g 1-phenyl-4,4dimethyl-3-virazolidone 0.4g Sodium bromide 3g 5-methylbenzotriazole 0.3g 5-nitroindazole 0.05g 5g Diethylaminopropane-2-diol 10g Potassium sulfite
90g Sodium 5-sulfosalicylate 75g Sodium ethylenediaminetetraacetate
I made it to IQ with 2g of water.
pl(は、苛性ソーダで11.5とした。pl (was adjusted to 11.5 with caustic soda.
く定着液処方〉
(組成A)
チオ硫酸アンモニウム(72,5v%水溶液)亜硫酸ナ
トリウム 17g酢酸ナトリウム
・3水塩 6.5g硼酸
6gクエン酸ナトリウム・2水
塩 2g酢酸(90w%水溶液)
13.6m4(組成り)
純水(イオン交換水) 17mff
硫酸(50w%の水溶液) 3.0g
硫酸アルミニウム(Ai+20.換算含量が8.11%
の水溶液)20g
定着液の使用時に水500mQ中に上記組成A1組成り
の順に溶かし、112に仕上げて用いた。この定着液の
pi(は約5.6であった。Fixer formulation> (Composition A) Ammonium thiosulfate (72.5v% aqueous solution) Sodium sulfite 17g Sodium acetate trihydrate 6.5g Boric acid
6g sodium citrate dihydrate 2g acetic acid (90w% aqueous solution)
13.6m4 (composition) Pure water (ion exchange water) 17mff
Sulfuric acid (50w% aqueous solution) 3.0g
Aluminum sulfate (Ai + 20. Converted content is 8.11%
20g of aqueous solution) When using a fixer, the above compositions were dissolved in 500mQ of water in the order of composition A1 and finished to 112 before use. The pi of this fixer was about 5.6.
く現像処理条件〉
(工程) (IIi度) (時間)現像
40℃ 8秒
定着 35℃ 8秒水洗 常
温 lO秒
評価は以下のようにして行い、結果を表−2に示した。Development processing conditions> (Process) (IIi degree) (Time) Development
Fixation at 40°C for 8 seconds, washing at 35°C for 8 seconds, room temperature, 10 seconds Evaluation was carried out as follows, and the results are shown in Table 2.
表−2
(A)(B)(C)ヘーズ(%)乾燥(%)処理(%)
本発明(3) (5) (8) 100
95// (4)(4) //
95 90tt (5) /
/ tt 95
95tt (3) tt tt
100 95// // (
5)(7) 100 95
// // (11)(12)
95 90// // (12)
(6) 95 90比
較(a) (4) (8) 75
70表−2の結果より、本発明の試料は実施例1と同様
に、良好な膜付を示し、処理後でも劣化しない、更にヘ
ーズについても良好である。Table-2 (A) (B) (C) Haze (%) Drying (%) Treatment (%)
Present invention (3) (5) (8) 100
95// (4) (4) //
95 90tt (5) /
/tt95
95tt (3) tt tt
100 95// // (
5) (7) 100 95
// // (11) (12)
95 90 // // (12)
(6) 95 90 ratio
comparison (a) (4) (8) 75
From the results shown in Table 2, the samples of the present invention, like Example 1, showed good film adhesion, did not deteriorate even after treatment, and had good haze.
本発明により現像処理後も帯電防止能の劣化が起こらず
、しかも接着材に優れたポリエステルベースを提供する
ことができた。According to the present invention, it was possible to provide a polyester base that does not deteriorate in antistatic ability even after development and is excellent in adhesive properties.
Claims (2)
、ポリエステルベースと帯電防止層の間にスチレンを構
成成分として含むラテックス下引層を設けたことを特徴
とするポリエステルベース。(1) A polyester base having an antistatic layer, characterized in that a latex subbing layer containing styrene as a constituent is provided between the polyester base and the antistatic layer.
]疎水性ラテックス [3]多官能アジリジンの反応生
成物からなることを特徴とする請求項1記載のポリエス
テルベース。(2) The antistatic layer is made of [1] water-soluble conductive polymer [2]
] Hydrophobic latex [3] The polyester base according to claim 1, comprising a reaction product of polyfunctional aziridine.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4410689A JPH02256051A (en) | 1988-12-28 | 1989-02-23 | Polyester base having antistatic layer |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63-330854 | 1988-12-28 | ||
JP33085488 | 1988-12-28 | ||
JP4410689A JPH02256051A (en) | 1988-12-28 | 1989-02-23 | Polyester base having antistatic layer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02256051A true JPH02256051A (en) | 1990-10-16 |
Family
ID=26383958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4410689A Pending JPH02256051A (en) | 1988-12-28 | 1989-02-23 | Polyester base having antistatic layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02256051A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5584658A (en) * | 1978-12-20 | 1980-06-26 | Du Pont | Permanently antistatic layer |
JPS5994756A (en) * | 1982-11-22 | 1984-05-31 | Konishiroku Photo Ind Co Ltd | Photographic support |
JPS61174542A (en) * | 1985-01-16 | 1986-08-06 | イー・アイ・デユポン・ド・ネモアース・アンド・コンパニー | Improved two-layer formation for application of antistatic composition for polyester support |
-
1989
- 1989-02-23 JP JP4410689A patent/JPH02256051A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5584658A (en) * | 1978-12-20 | 1980-06-26 | Du Pont | Permanently antistatic layer |
JPS5994756A (en) * | 1982-11-22 | 1984-05-31 | Konishiroku Photo Ind Co Ltd | Photographic support |
JPS61174542A (en) * | 1985-01-16 | 1986-08-06 | イー・アイ・デユポン・ド・ネモアース・アンド・コンパニー | Improved two-layer formation for application of antistatic composition for polyester support |
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