JPH0412402A - Extremely thin conductor and extremely thin enamel wire - Google Patents
Extremely thin conductor and extremely thin enamel wireInfo
- Publication number
- JPH0412402A JPH0412402A JP11452590A JP11452590A JPH0412402A JP H0412402 A JPH0412402 A JP H0412402A JP 11452590 A JP11452590 A JP 11452590A JP 11452590 A JP11452590 A JP 11452590A JP H0412402 A JPH0412402 A JP H0412402A
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- extremely thin
- purity
- wire
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 title claims abstract description 64
- 210000003298 dental enamel Anatomy 0.000 title 1
- 238000007747 plating Methods 0.000 claims abstract description 16
- 239000010949 copper Substances 0.000 claims abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052802 copper Inorganic materials 0.000 claims abstract description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 12
- 229910052737 gold Inorganic materials 0.000 claims description 12
- 239000010931 gold Substances 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 229910000881 Cu alloy Inorganic materials 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000008054 signal transmission Effects 0.000 abstract description 5
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 239000012535 impurity Substances 0.000 abstract description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- 239000013585 weight reducing agent Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 13
- 238000004804 winding Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000005491 wire drawing Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は、高品位の信号伝送を行う導体に関し、特に、
磁気記録続出用磁気ヘットのコイルなとに用いられる極
細導体および極細エナメル線に関する。[Detailed Description of the Invention] "Industrial Application Field" The present invention relates to a conductor that transmits high-quality signals, and in particular,
The present invention relates to an ultrafine conductor and an ultrafine enameled wire used in the coil of a magnetic head for continuous magnetic recording.
従来の技術」
従来、コンピュータの磁気ディスク装置の磁気ヘット用
コイルに用L)られるエナメル線として、一般の電気銅
あるいは無酸素銅からなる導体部に、絶縁層を設けに構
造の極細エナメル線か用L)られている。ここで前記導
体部としては、直径50〜55μm程度のものか用いら
れ、絶縁層としては、厚さ3〜5μm程度のボリウレタ
ノなとの樹脂力らなるものか用いられている。まr二、
特にデノタル信号続出用の導体なとにおいては、高品位
の信号伝送か必要であり、導体部の導電率も十分に高く
なくてはならない関係から、ifj記導体部として高純
度のCuを使用することもなされている。Conventional technology: Conventionally, enameled wires used in coils for magnetic heads of magnetic disk drives in computers have a structure in which an insulating layer is provided on a conductor portion made of general electrolytic copper or oxygen-free copper. used L). Here, the conductor portion is used having a diameter of about 50 to 55 μm, and the insulating layer is made of polyurethane resin and having a thickness of about 3 to 5 μm. Mar 2,
Especially in the case of conductors for continuous signal transmission, high-quality signal transmission is required and the conductivity of the conductor part must be sufficiently high, so high-purity Cu is used for the conductor part. Things are also being done.
「発明が解決しようとする課題」
しかしながら、最近の磁気ディスク装置の小型化に伴い
、磁気ヘット自体も小型化か要求されてきているので、
磁気ヘット用のエナメル線も極細化することが要求され
ている。``Problem to be solved by the invention'' However, with the recent miniaturization of magnetic disk drives, there has been a demand for miniaturization of the magnetic head itself.
Enameled wires for magnetic heads are also required to be made extremely fine.
具体的サイズとしては、現用の導体径50μm程度に対
して20〜30μm程度のものか求められている。As for the specific size, a diameter of about 20 to 30 μm is required, compared to the current conductor diameter of about 50 μm.
ところが、導体径を50μmから30μmにすると、当
然のことながら導体の引張強度が低下する問題がある。However, when the conductor diameter is increased from 50 μm to 30 μm, there is a problem that the tensile strength of the conductor decreases.
ここで例えば、導体径を50μmから30μmに変更す
ると、引張強度は半分以下に低下することが知られてい
る。Here, for example, it is known that when the conductor diameter is changed from 50 μm to 30 μm, the tensile strength decreases to less than half.
従って、従来の線径では問題にならなかった伸線時、メ
ッキ処理時、絶縁被覆時、磁気ヘッドへの接続時などの
加工工程において、導体が断線し易くなる問題が生じて
いる。Therefore, a problem has arisen in which the conductor becomes easily disconnected during processing steps such as wire drawing, plating, insulation coating, and connection to a magnetic head, which did not pose a problem with conventional wire diameters.
なお、磁気ヘッドに対するエナメル線の巻線加工方法は
、従来の顕微鏡下での低速手巻き加工から自動巻線機械
による高速巻線加工に移行しつつあるので、前述のよう
に導体径が小さくなった場合、自動巻線機械による巻線
加工の際に、エナメル線が異常に延びて導体抵抗か増加
したり、場合によっては断線する問題を生じている。更
に、導体径が小さくなった場合、磁気ヘッドのアッセン
ブリ加工時に、エナメル線の端末を引き回してホンディ
ングする工程で断線する問題もあった。The method of winding enameled wire for magnetic heads is shifting from the conventional low-speed manual winding under a microscope to high-speed winding using automatic winding machines, so the conductor diameter has become smaller as mentioned above. In such a case, during the winding process using an automatic winding machine, the enamelled wire is stretched abnormally, resulting in an increase in conductor resistance and, in some cases, wire breakage. Furthermore, when the diameter of the conductor is reduced, there is a problem that the end of the enameled wire is broken during the process of routing and bonding the end of the enameled wire during assembly of the magnetic head.
本発明は前記課題を解決するためになされたもので、破
断強度が高く、製造工程における断線のおそれを少なく
てきるとともに、高品位な信号伝送を行うことかでき、
ボンディングも容易な極細導体および極細エナメル線を
提供することを目的とする。The present invention has been made to solve the above problems, and has high breaking strength, reduces the risk of wire breakage in the manufacturing process, and can perform high-quality signal transmission.
The purpose of the present invention is to provide an ultrafine conductor and an ultrafine enameled wire that are easy to bond.
「課題を解決するための手段」
請求項1に記載した発明は前記課題を解決するために、
純度99.99%以上のCuに0.03〜0.5重量%
のAgを添加してなる無酸素銅からなる導体部と、この
導体部に被覆された金メッキ層とを具備してなるもので
ある。"Means for solving the problem" In order to solve the problem, the invention described in claim 1 has the following features:
0.03-0.5% by weight in Cu with purity 99.99% or more
The conductor part is made of oxygen-free copper added with Ag, and the conductor part is coated with a gold plating layer.
請求項2に記載した発明は前記課題を解決するために、
請求項1に記載の金メッキ層の厚さを1〜4μmにした
ものである。In order to solve the above problem, the invention described in claim 2 has the following features:
The gold plating layer according to claim 1 has a thickness of 1 to 4 μm.
請求項3に記載した発明は請求項1または請求項2に記
載の導体に絶縁被覆を施してなるものである。The invention described in claim 3 is obtained by applying an insulating coating to the conductor according to claim 1 or claim 2.
「 作゛用 」
Agを含む高純度のCu合金から導体部を構成するため
に、導体抵抗が低く、高品位な信号伝送がなされる。A
gの含有量が特別な量に限定されているので、導体強度
の向上効果か十分に発揮されると同時にAg添加による
コストの上昇が抑えられる。更に、特別な厚さの金メッ
キ層が被覆されているので、ボンディング時に適切な接
着力か得られると同時に金メッキ層の形成によるコスト
の上昇が抑えられる。Since the conductor portion is made of a high-purity Cu alloy containing Ag, conductor resistance is low and high-quality signal transmission is achieved. A
Since the content of g is limited to a specific amount, the effect of improving the conductor strength is sufficiently exhibited, and at the same time, the increase in cost due to the addition of Ag can be suppressed. Furthermore, since the gold plating layer is coated with a special thickness, an appropriate adhesion force can be obtained during bonding, and at the same time, an increase in cost due to the formation of the gold plating layer can be suppressed.
以下に本発明を更に詳細に説明する。The present invention will be explained in more detail below.
第1図は本発明の極細導体の一実施例を示すもので、こ
の例の極細導体lは、純度99.99%以上の高純度の
無酸素銅に0.03〜0.5重量%のAgを添加してな
るCu合金からなる導体部2と、この導体部2の外周面
を被覆して設けられた厚さ1〜4μmの金メッキ層3と
から構成されている。FIG. 1 shows an embodiment of the ultrafine conductor of the present invention. The ultrafine conductor l of this example is made of high-purity oxygen-free copper with a purity of 99.99% or more and 0.03 to 0.5% by weight. It consists of a conductor part 2 made of a Cu alloy with added Ag, and a gold plating layer 3 with a thickness of 1 to 4 μm provided to cover the outer peripheral surface of the conductor part 2.
前記導体部2の直径は、極細導体lが適用される磁気ヘ
ッドの小型軽量化に合わせて極細化されるので、40μ
m以下であることが好ましい。また、極細導体lは、磁
気ヘッドなどの磁気装置に用いられることから、導体部
2に含まれる不純物として、Fe、Ni、Coなどの磁
性元素は極力避けるへきである。従って前記磁性元素の
含有量を10ppm以下とすることが好ましい。The diameter of the conductor portion 2 is 40 μm because the diameter of the conductor portion 2 is made ultra-thin in accordance with the miniaturization and weight reduction of magnetic heads to which the ultra-fine conductor l is applied.
It is preferable that it is below m. Further, since the ultrafine conductor 1 is used in a magnetic device such as a magnetic head, magnetic elements such as Fe, Ni, and Co should be avoided as much as possible as impurities contained in the conductor portion 2. Therefore, it is preferable that the content of the magnetic element is 10 ppm or less.
前記導体部2を構成するCu合金において、無酸素銅の
純度を9999%以上としたのは、それ未満ては導体抵
抗か大きくなって、高品位伝送に支障を来したり、軟化
温度か高くなる問題を生しるためである。また、無酸素
銅の酸素含有量は、重量比で30ppm以下であり、3
0ppmを越えるようでは、酸化物が生成するために、
極細径に伸線加工する際に断線しやすくなる。Agの添
加量を003〜05重量%にしたのは、003重量%未
満では引張り強度の向上効果がなく、0.5重量%を越
えると導体抵抗が大きくなるとともにコストも高くなる
ので好ましくない。金メッキ層3の厚さを1〜4μmと
したのは、厚さ1μm未満では磁気ヘットへのホンディ
ング接続の際に接着力が低くなったり、接着力がばらつ
いたりするので好ましくなく、厚さ4μmを越えるとコ
スト高になるので好ましくない。The reason why the purity of the oxygen-free copper in the Cu alloy constituting the conductor part 2 is set to 9999% or more is that if the purity is less than that, the conductor resistance will increase, which may impede high-quality transmission, or the softening temperature will rise. This is because it causes a problem. In addition, the oxygen content of oxygen-free copper is 30 ppm or less by weight, and 3
If it exceeds 0 ppm, oxides are generated, so
Wires tend to break when drawing them to ultra-thin diameters. The reason why the amount of Ag added is 0.03 to 0.05% by weight is not preferable because if it is less than 0.03% by weight, there is no effect of improving the tensile strength, and if it exceeds 0.5% by weight, the conductor resistance increases and the cost increases. The reason why the thickness of the gold plating layer 3 is set to 1 to 4 μm is that a thickness of less than 1 μm is undesirable because the adhesive strength will be low or the adhesive strength will vary when bonding to a magnetic head. Exceeding this is not preferable because it increases the cost.
第1図に示す構造の極細導体lを製造する場合、導体部
2を製造するには、例えば前記組成のCu合金インゴッ
トから通常の線引方法で得ることかできるとともに、金
メッキ層3を形成するには、例えば電気メッキ法を採用
すれば良い。When manufacturing the ultra-fine conductor l having the structure shown in FIG. 1, the conductor portion 2 can be obtained by, for example, a normal wire drawing method from a Cu alloy ingot having the above composition, and a gold plating layer 3 is formed. For example, electroplating may be used.
第2図は本発明の極細エナメル線の一実施例を示すもの
で、この例の極細エナメル線5は、第1図に示す構造の
極細導体lの外周面に絶縁被覆層6を形成してなるもの
である。FIG. 2 shows an embodiment of the ultra-fine enameled wire of the present invention. The ultra-fine enameled wire 5 of this example has an insulating coating layer 6 formed on the outer peripheral surface of an ultra-fine conductor l having the structure shown in FIG. It is what it is.
前記絶縁被覆層6を構成する材料として例えば、ポリウ
レタン、ポリエステル、ポリアミド、ポリイミド、ポリ
アミドイミド、ポリエステルイミド、ポリビニルブチラ
ール、エポキシなどを例示することができる。なお、極
細エナメル線5の加工工程において、半田付けを行う場
合は、前記材料のうち、ポリウレタンを選択することか
望ましい。Examples of the material constituting the insulating coating layer 6 include polyurethane, polyester, polyamide, polyimide, polyamideimide, polyesterimide, polyvinyl butyral, and epoxy. Note that when soldering is performed in the process of processing the ultrafine enameled wire 5, it is preferable to select polyurethane from among the above-mentioned materials.
その際にポリウレタンに必要に応じて着色できることは
勿論である。Of course, the polyurethane can be colored if necessary.
ところで、第1図と第2図に記載した実施例においては
導体部2の断面形状として丸型の例について説明したか
、導体部2の断面形状は多角形状、楕円形、異形断面形
状なと、任會の断面形状でも差し支えないのは勿論であ
る。Incidentally, in the embodiments shown in FIGS. 1 and 2, the cross-sectional shape of the conductor portion 2 is round, but the cross-sectional shape of the conductor portion 2 may be polygonal, elliptical, or irregularly shaped. Of course, the cross-sectional shape of the board may also be used.
「実施例」
純度99.97%および純度9999%の無酸素銅を用
意し、これらの無酸素銅に、種々の割合でAgを添加し
、導体部の径か40μmと20μmの極細導体を複数製
造し、更にこれらに種々の厚さの金メッキ層を形成した
後、ポリウレタン塗料を塗布し、焼き付けし′て厚さ2
85μmの絶縁層を形成し複数の極細エナメル線試料を
得た。"Example" Oxygen-free copper with purity of 99.97% and purity of 9999% was prepared, Ag was added in various proportions to these oxygen-free copper, and multiple ultrafine conductors with conductor diameters of 40 μm and 20 μm were formed. After manufacturing and forming gold plating layers of various thicknesses on these, polyurethane paint is applied and baked to a thickness of 2.
A plurality of ultrafine enameled wire samples were obtained by forming an 85 μm insulating layer.
以上のように製造された各極細エナメル線試料について
、導体抵抗、引張強度を測定した。また、一部の試料に
おいては超音波ポノダーによる接着を行い、その結果か
ら接着性を評価した。これらの測定結果と評価結果を合
わせて後記する第1表に示した。The conductor resistance and tensile strength of each of the ultrafine enameled wire samples produced as described above were measured. In addition, some samples were bonded using an ultrasonic ponoder, and the adhesive properties were evaluated based on the results. These measurement results and evaluation results are shown in Table 1 below.
第1表に示す結果から、本発明の極細エナメル線の試料
No1=No8は、比較例の試料No9〜Nol 3に
比べ、導体抵抗が低く、引張強度か高く、接着性も良好
であることが判明した。From the results shown in Table 1, it can be seen that samples No. 1 and No. 8 of the ultrafine enamelled wire of the present invention have lower conductor resistance, higher tensile strength, and better adhesion than samples No. 9 to No. 3 of the comparative example. found.
F発明の効果号
以上説明しfコように本発明は、特別な量のAgを含む
純度99.99%のCu合金から導体部を構成している
ので、導体抵抗か低く、高品位な信号伝送かできる特徴
がある。また、導体部にAgを003〜0.5重量%添
加しているので、破断強度が大きくなり、製造時の各工
程において断線することが少なくなる。更に、導体部に
金メッキ層を被覆しているので、結線の際のボンディン
グを良好な接着性で極めて容易に行うことができる。Effects of the Invention As explained above, the present invention has a conductor part made of a 99.99% pure Cu alloy containing a special amount of Ag, so the conductor resistance is low and high quality signals can be obtained. It has the feature of being able to transmit data. Furthermore, since 0.03 to 0.5% by weight of Ag is added to the conductor portion, the breaking strength is increased and wire breakage is reduced in each manufacturing process. Furthermore, since the conductor portion is coated with a gold plating layer, bonding during connection can be performed extremely easily with good adhesiveness.
第1図は本発明の極細導体の一実施例を示す断面図、第
2図は本発明の極細エナメル線の一実施例を示す断面図
である。
l・・極細導体、2・・導体部、3・・金メッキ層、5
・・極細エナメル線、6・・・絶縁被覆層。FIG. 1 is a sectional view showing an embodiment of the ultrafine conductor of the present invention, and FIG. 2 is a sectional view showing an embodiment of the ultrafine enameled wire of the present invention. l... Ultrafine conductor, 2... Conductor part, 3... Gold plating layer, 5
...Extra-fine enameled wire, 6...Insulating coating layer.
Claims (3)
重量%のAgを添加してなる無酸素銅からなる導体部と
、この導体部に被覆された金メッキ層とを具備してなる
極細導体。(1) 0.03 to 0.5 for Cu with purity of 99.99% or more
An ultra-fine conductor comprising a conductor part made of oxygen-free copper added with % by weight of Ag, and a gold plating layer covering the conductor part.
であることを特徴とする極細導体。(2) The thickness of the gold plating layer according to claim 1 is 1 to 4 μm.
An ultrafine conductor characterized by:
覆を施してなる極細エナメル線。(3) An ultrafine enameled wire obtained by applying an insulating coating to the conductor according to claim 1 or 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11452590A JPH0412402A (en) | 1990-04-27 | 1990-04-27 | Extremely thin conductor and extremely thin enamel wire |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11452590A JPH0412402A (en) | 1990-04-27 | 1990-04-27 | Extremely thin conductor and extremely thin enamel wire |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0412402A true JPH0412402A (en) | 1992-01-17 |
Family
ID=14639937
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11452590A Pending JPH0412402A (en) | 1990-04-27 | 1990-04-27 | Extremely thin conductor and extremely thin enamel wire |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0412402A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2822288A1 (en) * | 2001-03-19 | 2002-09-20 | Astrium Gmbh | Cryogenic installation metallic superconductor having central conductor width between 1 and 0.01 mm and precious metal/precious metal alloy width between 1 micron and 1 nm |
-
1990
- 1990-04-27 JP JP11452590A patent/JPH0412402A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2822288A1 (en) * | 2001-03-19 | 2002-09-20 | Astrium Gmbh | Cryogenic installation metallic superconductor having central conductor width between 1 and 0.01 mm and precious metal/precious metal alloy width between 1 micron and 1 nm |
GB2375880A (en) * | 2001-03-19 | 2002-11-27 | Astrium Gmbh | A conductor for a cryogenic device |
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