JPH04116958A - Pin grid array type semiconductor device - Google Patents

Pin grid array type semiconductor device

Info

Publication number
JPH04116958A
JPH04116958A JP23741990A JP23741990A JPH04116958A JP H04116958 A JPH04116958 A JP H04116958A JP 23741990 A JP23741990 A JP 23741990A JP 23741990 A JP23741990 A JP 23741990A JP H04116958 A JPH04116958 A JP H04116958A
Authority
JP
Japan
Prior art keywords
pins
grid
solder
pin
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23741990A
Other languages
Japanese (ja)
Inventor
Chikayuki Kato
加藤 周幸
Seiichi Nishino
西野 誠一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP23741990A priority Critical patent/JPH04116958A/en
Publication of JPH04116958A publication Critical patent/JPH04116958A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To dispense with a solder dip process and to suppress the generation of a failure with time of wettability of solder by a method wherein a conductor circuit and grid pins are electrically connected with each other and are fixed via local conductive paths, which are formed by pressure welding and deforming an anisotropic conductive film. CONSTITUTION:An anisotropic conductive film 4 is applied all over the whole surface of a wiring board 1 excluding the formation part of a recess 1a for semiconductor chip mounting use in the board 1 and rid pins 2 are inserted in through holes in such a way as to break through this film 4. Moreover, the pins 2 are firmly bonded in a connection process for applying a local pressure to the heads of the pins 2 under a high temperature (about 180 deg.C). When this connection process ends, local conductive paths, through which fellow conductive particles are connected with each other, are formed only on parts, which are located in the vicinities of the pins 2 and are pushed by the heads of the pins 2, of the film 4. As a result, the pins 2 and a copper foil wiring 5 on the substrate can be respectively connected independently and electrically with each other in a state that an insulation property is held between the pins 2 and the other pins 2 adjacent to the pins 2.

Description

【発明の詳細な説明】 〔産業上の利用分野1 本発明はピングリッドアレイ型半導体装置に関し、特に
グリッドピンとパッケージ基板配線との電気的接続構造
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application 1] The present invention relates to a pin grid array type semiconductor device, and particularly to an electrical connection structure between grid pins and package substrate wiring.

〔従来の技術〕[Conventional technology]

第5図は従来のピングリッドアレイ型半導体装置におけ
るパッケージ配線基板とグリッドピンの電気的接続構造
を示す断面図である。この図から明らかなように、パッ
ケージ配線基板lのスルーホール径はグリッドピン2の
基板挿入部径よりやや大きく形成されており、グリッド
ピン2はまずプレスによりスルーホール内に機械的に仮
固定された後、半田融液内に漬ける所謂半田デイツプ法
で固着される。〔例えば、特開昭61−104651 
 rピングリッドアレイ用パッケージのリード端子の半
田付方法」、および「半導体搭載用基板」に関する特開
昭62−257754 。
FIG. 5 is a sectional view showing an electrical connection structure between a package wiring board and grid pins in a conventional pin grid array type semiconductor device. As is clear from this figure, the diameter of the through hole in the package wiring board l is formed slightly larger than the diameter of the board insertion part of the grid pin 2, and the grid pin 2 is first mechanically temporarily fixed in the through hole by pressing. After that, it is fixed using the so-called solder dip method, in which it is immersed in solder melt. [For example, JP-A-61-104651
Japanese Patent Laid-Open No. 62-257754 relating to ``Method for soldering lead terminals of r-pin grid array package'' and ``Semiconductor mounting board.''

特開昭62−257755 、特開昭62−26685
8 、特開昭63−285961の各特許出願明細書参
照〕。
JP-A-62-257755, JP-A-62-26685
8, JP-A No. 63-285961].

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

この際、パッケージ配線基板のスルーホール内に機械的
に仮固定される銅系または鉄−ニッケル金属線材からな
るグリッドピン2には、その表面に半田メツキが施され
ているのが通常であるが、この半田メツキ被膜は仮固定
後の半田デイツプ工程で溶は出してしまうので、当初こ
の半田メッキ厚を相当程度厚くつけておいたとしても、
半田デイツプ工程後では僅か1μm程度のものとなって
しまうことが多々生じる。半田厚がこのように薄(なっ
てしまうと、表面酸化の影響で半田の濡れ性に問題が生
じるので、プリント基板への実装に当ってしばしばオー
ブン不良事故を起すようになる。
At this time, the surface of the grid pin 2 made of copper or iron-nickel metal wire that is temporarily fixed mechanically in the through hole of the package wiring board is usually soldered. This solder plating film will melt during the solder dipping process after temporary fixing, so even if the solder plating thickness is initially applied to a considerable thickness,
After the solder dip process, the thickness often ends up being only about 1 μm. When the solder thickness becomes this thin, problems occur in solder wettability due to surface oxidation, which often causes oven failures when mounting on printed circuit boards.

本発明の目的は、上記の情況に鑑み、パッケージ配線基
板とグリッドピンとの電気的接続段階においてグリッド
ピンの半田濡れ性に経時的劣化を生ぜしめる従来のグリ
ッドピン接続構造の問題点を解決したピングリッドアレ
イ型半導体装置を提供することである。
In view of the above circumstances, an object of the present invention is to provide a pin that solves the problem of the conventional grid pin connection structure that causes deterioration of the solder wettability of the grid pin over time during the electrical connection stage between the package wiring board and the grid pin. An object of the present invention is to provide a grid array type semiconductor device.

〔課題を解決するための手段] 本発明によれば、ピングリッドアレイ型半導体装置は、
基板上に半導体チップ搭載用くぼみと導体回路をそれぞ
れ設けるパッケージ配線基板と、前記半導体チップ搭載
用くぼみ内に載置される半導体チップと、前記パッケー
ジ配線基板の裏面に前記導体回路と接続されて突出配列
される複数個のグリッドピンとを備えるピングリッドア
レイ型半導体装置において、前記導体回路とグリッドピ
ンとは、異方導電性フィルムが圧接変形により形成する
局部的導電路を介して電気的に接続固定されることを含
んで構成される。
[Means for Solving the Problems] According to the present invention, a pin grid array type semiconductor device has the following features:
A package wiring board having a recess for mounting a semiconductor chip and a conductor circuit on the substrate, a semiconductor chip placed in the recess for mounting the semiconductor chip, and a protrusion connected to the conductor circuit on the back side of the package wiring board. In a pin grid array type semiconductor device comprising a plurality of grid pins arranged in an array, the conductor circuit and the grid pins are electrically connected and fixed via local conductive paths formed by pressure contact deformation of an anisotropic conductive film. It consists of:

[作  用  J 本発明によれば、パッケージ配線基板の1!4箔配線と
グリッドピンとの間は、従来のデイツプ半田に代えて異
方導電性フィルムが形成する局部的導電路で接続される
ので、従来必要とされる半田デイツプ工程が不要となる
。従って、従来問題とされたグリッドピン表面からの半
田メツキ膜厚の溶は出しがなく、初期のメッキ厚をその
まま残すことができるので、半田濡れ性の経時的不良の
発生を根本的に解決し得る。
[Function J According to the present invention, the 1!4 foil wiring of the package wiring board and the grid pins are connected by local conductive paths formed by an anisotropic conductive film instead of the conventional dip solder. This eliminates the need for the conventional solder dip process. Therefore, the solder plating film thickness does not melt from the grid pin surface, which was a problem in the past, and the initial plating thickness can be left as is, which fundamentally solves the problem of poor solder wettability over time. obtain.

〔実施例〕〔Example〕

次に本発明について図面を参照して詳細に説明する。 Next, the present invention will be explained in detail with reference to the drawings.

第1図および第2図はそれぞれ本発明の一実施例を示す
ピングリッドアレイ型半導体装置のパッケージ配線基板
とグリッドピンの電気的接続構造の断面図およびそのグ
リッドピン近傍の拡大図である。本実施例によれば、パ
ッケージ配線基板lにはガラス布エポキシ系またはガラ
ス布トリアジン系或いはガラス布ポリイミド系の銅張積
層絶縁板が用いられ、その中央付近には半導体チップ搭
載用のくぼみlaが、また、端部にはボンディングワイ
ヤをグリッドピン2に接続するためのスルーホールと配
線回路とがそれぞれ形成される。ここで、配線基板1の
半導体チップ搭載用くぼみ1aの形成部分を除く全面に
は異方導電性フィルム4が張りつめられ、グリッドピン
2がスルーホール内にこの異方導電性フィルム4を突き
破るように挿入され、更に局部的圧力を高温下(約18
0℃)でグリッドピン2の頭部にかける接続工程で固着
される。この接続工程を終えると、グリッドピン近傍の
異方導電性フィルム4は、第2図の拡大図から明らかな
ように、グリッドピン2の頭部に押された部分のみに導
電性粒子同士が互いに接続し合う局部的導通路を形成す
るので、隣接する他のグリッドピン2との間に絶縁性を
保持した状態でグリッドピン2と基板上の銅箔配線5と
の間をそれぞれ独立に電気接続することができる。この
際、異方導電性フィルム4の厚さは導通性と密着性等を
考慮して0.5〜1.OIlmとされ、グリッドピン2
にはあらかじめ半田メツキ被膜2aが、半田濡れ性の経
時劣化をおこさない程度の厚さ(5〜8um)で施され
ている。ここで、6および7はソルダーレジストおよび
基板銅箔配線5のニッケルー金メツキ被膜をそれぞれ示
す。
1 and 2 are a sectional view of an electrical connection structure between a package wiring board and grid pins of a pin grid array type semiconductor device and an enlarged view of the vicinity of the grid pins, respectively, showing an embodiment of the present invention. According to this embodiment, a copper-clad laminated insulating board made of glass cloth epoxy, glass cloth triazine, or glass cloth polyimide is used for the package wiring board l, and a recess la for mounting a semiconductor chip is provided near the center of the copper-clad laminated insulating board. Furthermore, through holes and wiring circuits for connecting the bonding wires to the grid pins 2 are formed at the ends, respectively. Here, an anisotropically conductive film 4 is stretched over the entire surface of the wiring board 1 except for the area where the recess 1a for mounting the semiconductor chip is formed, and the grid pins 2 are arranged so that the grid pins 2 break through this anisotropically conductive film 4 into the through holes. inserted, and further local pressure is applied at high temperature (approximately 18
It is fixed in the connection process by attaching it to the head of the grid pin 2 at 0°C). After this connection process is completed, the anisotropically conductive film 4 near the grid pin has conductive particles that are mutually connected only in the portion pushed by the head of the grid pin 2, as is clear from the enlarged view in FIG. Since a local conductive path is formed that connects each other, the grid pins 2 and the copper foil wiring 5 on the board can be electrically connected independently while maintaining insulation with other adjacent grid pins 2. can do. At this time, the thickness of the anisotropic conductive film 4 is set to 0.5 to 1.0 mm, taking into consideration conductivity, adhesion, etc. OIlm and grid pin 2
A solder plating film 2a is applied in advance to a thickness (5 to 8 um) that does not cause deterioration of solder wettability over time. Here, 6 and 7 indicate the solder resist and the nickel-gold plating film of the substrate copper foil wiring 5, respectively.

本実施例におけるスルーホール径とグリッドピン径との
関係は相互に全く任意である。すなわち、グリッドピン
径の方をスルーホール径より小さくすればスルーホール
に大きな力がかからないようにすることができ、他方グ
リッドピン径の方を少し大きくすれば、フィルムの接着
力に押込みによる機械的支持力が加わり取付は強度を上
げることができるので、適宜選択が可能である。
The relationship between the through hole diameter and the grid pin diameter in this embodiment is completely arbitrary. In other words, by making the grid pin diameter smaller than the through-hole diameter, you can prevent a large force from being applied to the through-hole, and on the other hand, by making the grid pin diameter slightly larger, the mechanical force caused by indentation will be reduced by the adhesive force of the film. The mounting strength can be increased by adding supporting force, so it can be selected as appropriate.

第3図は本発明の他の実施例を示すパッケージ配線基板
とグリッドピンの電気的接続構造の断面図である。本実
施例では異方導電性フィルム4を基板側面に張り、クリ
ップ型のグリッドピン2を用いて、内部および表面の銅
箔配線とそれぞれ電気的接続を行ったもので、前実施例
と同様の効果をあげることが可能である。
FIG. 3 is a sectional view of an electrical connection structure between a package wiring board and grid pins showing another embodiment of the present invention. In this example, an anisotropic conductive film 4 is applied to the side surface of the board, and electrical connections are made to the internal and surface copper foil wiring using clip-type grid pins 2, similar to the previous example. It is possible to be effective.

上記実施例から明らかなように、本発明によれば、パッ
ケージ配線基板とグリッドピンとの間の電気的接続は異
方導電性フィルムが形成する局部的導通路によって行わ
れる。すなわち、従来の如くデイツプ半田工程を全く不
要とするので、グリッドピンに当初形成した半田メッキ
厚に変化が生じることはない。
As is clear from the above embodiments, according to the present invention, the electrical connection between the package wiring board and the grid pins is achieved through local conductive paths formed by the anisotropically conductive film. That is, since the conventional dip soldering process is completely unnecessary, there is no change in the thickness of the solder plating originally formed on the grid pins.

第4図は本発明の効果を従来構造の半導体装置との比較
で示すグリッドピン半田濡れ性の高温保管経時変化特性
図である。この実験は150℃の高温下におけるゼロク
ロスタイムの変化を500時間にわたり記録したもので
あり、本発明半導体装置のデータAと従来半導体装置の
データBとを比較すれば両者の違いは明白である。
FIG. 4 is a graph showing the characteristics of grid pin solder wettability over time during high-temperature storage, showing the effects of the present invention in comparison with a semiconductor device having a conventional structure. In this experiment, changes in zero cross time at a high temperature of 150° C. were recorded over 500 hours, and if data A of the semiconductor device of the present invention is compared with data B of the conventional semiconductor device, the difference between the two is obvious.

〔発明の効果〕〔Effect of the invention〕

以上詳細に説明したように、本発明によれば、基板の配
線とグリッドピンとは、従来の如く半田デイツプ工程に
よらず、圧接された異方導電性フィルムが形成する局部
的導電路を介しそれぞれ全(独立に電気接続される。従
って、グリッドピンに最初に形成した半田メッキ厚をそ
のまま残すことができるので、半田の濡れ性が経時劣化
することなき、長期保管可能なピングリッドアレイ型半
導体装置を提供することができる。
As described in detail above, according to the present invention, the wiring on the board and the grid pins are connected to each other through local conductive paths formed by pressure-welded anisotropic conductive films, without using the conventional solder dip process. All pins are electrically connected independently. Therefore, the thickness of the solder plating initially formed on the grid pins can remain as is, so the solder wettability does not deteriorate over time, and the pin grid array type semiconductor device can be stored for a long time. can be provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図はそれぞれ本発明の一実施例を示す
パッケージ配線基板とグリッドピンの電気的接続構造の
断面図およびそのグリッドピン近傍の拡大図、第3図は
本発明の他の実施例を示すパッケージ配線基板とグリッ
ドピンの電気的接続構造の断面図、第4図は本発明の効
果を従来構造の半導体装置との比較で示すグリッドピン
半田濡れ性の高温保管経時変化特性図、第5図は従来の
ピングリッド型半導体装置におけるパッケージ配線基板
とグリッドピンの電気的接続構造を示す断面図である。 ■・・・パッケージ配線基板、 la・・・半導体チップ搭載用くぼみ、2・・・グリッ
ドピン、 2a・・・半田メツキ被膜、 4・・・異方導電性フィルム、 5・・・基板上の銅箔配線、 6・・・ソルダーレジスト、 7・・・ニッケルー金メツキ被膜。
1 and 2 are a cross-sectional view of an electrical connection structure between a package wiring board and a grid pin and an enlarged view of the vicinity of the grid pin, respectively, showing one embodiment of the present invention, and FIG. 3 is another embodiment of the present invention. FIG. 4 is a cross-sectional view of an electrical connection structure between a package wiring board and a grid pin showing an example; FIG. FIG. 5 is a sectional view showing an electrical connection structure between a package wiring board and grid pins in a conventional pin grid type semiconductor device. ■...Package wiring board, la...Semiconductor chip mounting recess, 2...Grid pin, 2a...Solder plating film, 4...Anisotropic conductive film, 5...On board Copper foil wiring, 6...Solder resist, 7...Nickel-gold plating film.

Claims (1)

【特許請求の範囲】[Claims]  基板上に半導体チップ搭載用くぼみと導体回路をそれ
ぞれ設けるパッケージ配線基板と、前記半導体チップ搭
載用くぼみ内に載置される半導体チップと、前記パッケ
ージ配線基板の裏面に前記導体回路と接続されて突出配
列される複数個のグリッドピンとを備えるピングリッド
アレイ型半導体装置において、前記導体回路とグリッド
ピンとは、異方導電性フィルムが圧接変形により形成す
る局部的導電路を介して電気的に接続固定されることを
特徴とするピングリッドアレイ型半導体装置。
A package wiring board having a recess for mounting a semiconductor chip and a conductor circuit on the substrate, a semiconductor chip placed in the recess for mounting the semiconductor chip, and a protrusion connected to the conductor circuit on the back side of the package wiring board. In a pin grid array type semiconductor device comprising a plurality of grid pins arranged in an array, the conductor circuit and the grid pins are electrically connected and fixed via local conductive paths formed by pressure contact deformation of an anisotropic conductive film. A pin grid array type semiconductor device characterized by:
JP23741990A 1990-09-07 1990-09-07 Pin grid array type semiconductor device Pending JPH04116958A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23741990A JPH04116958A (en) 1990-09-07 1990-09-07 Pin grid array type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23741990A JPH04116958A (en) 1990-09-07 1990-09-07 Pin grid array type semiconductor device

Publications (1)

Publication Number Publication Date
JPH04116958A true JPH04116958A (en) 1992-04-17

Family

ID=17015079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23741990A Pending JPH04116958A (en) 1990-09-07 1990-09-07 Pin grid array type semiconductor device

Country Status (1)

Country Link
JP (1) JPH04116958A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100401146B1 (en) * 2000-12-04 2003-10-10 앰코 테크놀로지 코리아 주식회사 Manufacturing method of substrate for manufacturing semiconductor package

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100401146B1 (en) * 2000-12-04 2003-10-10 앰코 테크놀로지 코리아 주식회사 Manufacturing method of substrate for manufacturing semiconductor package

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