JPH0411309A - Manufacture of magnetic head - Google Patents

Manufacture of magnetic head

Info

Publication number
JPH0411309A
JPH0411309A JP11272590A JP11272590A JPH0411309A JP H0411309 A JPH0411309 A JP H0411309A JP 11272590 A JP11272590 A JP 11272590A JP 11272590 A JP11272590 A JP 11272590A JP H0411309 A JPH0411309 A JP H0411309A
Authority
JP
Japan
Prior art keywords
magnetic
core
halves
core half
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11272590A
Other languages
Japanese (ja)
Inventor
Hideki Yoshikawa
秀樹 吉川
Isao Yasuda
安田 伊佐雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP11272590A priority Critical patent/JPH0411309A/en
Publication of JPH0411309A publication Critical patent/JPH0411309A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)

Abstract

PURPOSE:To minimize the size of a core half and to reduce inductance of the magnetic head by forming at least one of coils to be wound on the core halves by a thin film formation technique. CONSTITUTION:A magnetic film 5 as one core half is formed on a lower conductive body pattern 4 of a substrate 1 with an insulating film interposed, while another magnetic film 5 for the other core half is formed apart from the first core half. Then belt-like upper conductive layers 72 are repeatedly provided on the magnetic film 5 and lower conductive layer 44 to form an upper conductive stripe pattern 7. Thus, a coil conductor with the coil helically wound around the core half is formed. Then this substrate is cut to separate the two core halves, the cut edge surfaces are polished, and these core halves are joined into one body with interposing a gas spacer. By this method, all of the lower conductive pattern 4, insulating film 31, magnetic films 5, 51 and upper conductive pattern 7 are formed by a thin film formation technique, which realizes a small-sized magnetic head with low inductance.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、VTR等の磁気記録再生装置に装備される磁
気ヘッドに関し、特に磁気回路を構成するコイルが薄膜
形成技術によって形成される磁気ヘッドの製造方法に関
するものである。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a magnetic head installed in a magnetic recording/reproducing device such as a VTR, and particularly to a magnetic head in which a coil constituting a magnetic circuit is formed by thin film forming technology. The present invention relates to a manufacturing method.

(従来の技術) ハイビジョン用のVTR等、高密度の磁気記録が行なわ
れる記録再生装置においては、磁路が金属磁性薄膜によ
って形成されている磁気ヘッドが用いられる(特開平1
−232508 [G11B5/127] )。該磁気
ヘッドは、第14図の如く一対のヘッド半体(100)
 (101)をギャップスペーサ(102)を介して突
き合せ、接合ガラス部(107) (108)によって
一体化してなり、各ヘッド半体は、非磁性基板(103
)上に、Fe−Al−5i系等の金属磁性薄膜と5i0
2等の非磁性膜とを交互に積層して、所定のトラック幅
を有するコア半体(104)を形成し、該コア半体上に
接合ガラス層(105)を介して非磁性の保護板(10
6)を固定したものである。
(Prior Art) In recording and reproducing devices that perform high-density magnetic recording, such as high-definition VTRs, magnetic heads are used whose magnetic path is formed by a metal magnetic thin film (Japanese Patent Laid-Open No.
-232508 [G11B5/127]). The magnetic head includes a pair of head halves (100) as shown in FIG.
(101) are butted together via a gap spacer (102) and integrated by bonding glass parts (107) and (108), and each head half is made up of a non-magnetic substrate (103).
), a magnetic thin film of metal such as Fe-Al-5i and 5i0
A core half body (104) having a predetermined track width is formed by alternately laminating non-magnetic films such as No. (10
6) is fixed.

一方のヘッド半体(100)にはコイル窓(109)が
開設され、該コイル窓を通して両ヘッド半体(100)
(101)にウレメット線等のコイル導線(110)が
巻回されている。
A coil window (109) is opened in one head half (100), and both head halves (100) are passed through the coil window.
A coil conducting wire (110) such as uremet wire is wound around (101).

(解決しようとする課題) しかし、ハイビジョン用のVTR等では磁気ヘッドのイ
ンダクタンスを低くする必要から、ヘッド半体及びコイ
ル窓が小形化する傾向にあり、例えば数百ミクロン程度
の小さなコイル窓(109)に直径が20〜30μm程
度の導線(110)を巻数20前後に巻回する必要があ
る。従って、この巻線作業は手作業に頼らざるを得ず、
組立工数の増加のみならず、磁気ヘッドの小形化にも限
界があった。
(Problem to be solved) However, in high-definition VTRs, etc., the inductance of the magnetic head needs to be lowered, so the head halves and coil windows tend to become smaller. ) It is necessary to wind a conducting wire (110) having a diameter of about 20 to 30 μm around 20 turns. Therefore, this winding work has to be done manually.
Not only did the number of assembly steps increase, but there were also limits to miniaturization of the magnetic head.

本発明の目的は、コイルを薄膜形成技術によって形成出
来る磁気ヘッドの製造方法を提供し、これによって磁気
ヘッドの小形化、低インダクタンス化を図ることである
An object of the present invention is to provide a method for manufacturing a magnetic head in which a coil can be formed using a thin film forming technique, and thereby to reduce the size and inductance of the magnetic head.

(課題を解決する為の手段) 本発明に係る磁気ヘッドの製造方法は、第1工程におい
て、非磁性基板(1)上に、磁路を構成すべき一対のコ
ア半体の内、少なくとも一方のコア半体が設置されるべ
き領域へ、該コア半体の磁路とは直交する方向へ伸び、
該コア半体の前記直交方向の幅よりも長い帯状の下部導
電体層(44)を、前記磁路方向へ間隔をおいて繰返し
設けて、縞状の下部導電体パターン(4)を形成する。
(Means for Solving the Problems) In the method for manufacturing a magnetic head according to the present invention, in a first step, at least one of a pair of core halves that should constitute a magnetic path is placed on a non-magnetic substrate (1). extending in a direction perpendicular to the magnetic path of the core half to the area where the core half is to be installed;
A strip-shaped lower conductor layer (44) longer than the width of the core half in the orthogonal direction is repeatedly provided at intervals in the magnetic path direction to form a striped lower conductor pattern (4). .

次の第2工程では、前記基板(1)の下部導電体パター
ン(4)上へ、前記各導電体層(44)の両端部を露出
させる位置に、絶縁膜(31)を介して一方のコア半体
となる磁性膜(5)を形成すると共に、該磁性膜(5)
とは離れた位置に他方のコア半体となる磁性膜(51)
を形成する。
In the next second step, one of the conductor layers (44) is placed on the lower conductor pattern (4) of the substrate (1) at a position where both ends of each conductor layer (44) are exposed through an insulating film (31). While forming a magnetic film (5) that will become the core half, the magnetic film (5)
A magnetic film (51) that becomes the other core half is located away from the
form.

第3工程では、前記下部導電体パターン(4)上に形成
された磁性膜(5)及び該磁性膜の両側部に突出した前
記下部導電体層(44)の上面へ、隣接する一対の下部
導電体層の相反する方向の端部を互いに連結する帯状の
上部導電体層(72)を、絶縁膜(6)を介して繰返し
設けて、縞状の上部導電体パターン(7)を形成し、前
記上部及び下部導電体パターン(4) (7)によって
、コア半体の周囲に螺旋状に巻回されたコイル導体(4
0)を構成する。
In the third step, a pair of adjacent lower conductor patterns are applied to the upper surface of the magnetic film (5) formed on the lower conductor pattern (4) and the lower conductor layer (44) protruding from both sides of the magnetic film. A strip-shaped upper conductor layer (72) connecting opposite ends of the conductor layer to each other is repeatedly provided via an insulating film (6) to form a striped upper conductor pattern (7). , a coil conductor (4) spirally wound around the core half by the upper and lower conductor patterns (4) (7).
0).

更に第4工程では、前記工程を経た基板(1)を切断し
て両コア半体を分離し、夫々コア半体を具えた一対のブ
ロック半体(83)(84)を作製する。
Furthermore, in the fourth step, the substrate (1) that has gone through the above steps is cut to separate both core halves to produce a pair of block halves (83) and (84) each having a core half.

第5工程では、前記両ブロック半体(83)(84)の
切断面を研磨して、ギャップ形成面となるコア半体の端
面が露出した突合せ面(85) (86)を形成し、両
突合せ面(85) (86)間にギャップスペーサ(9
)を介して両ブロック半体(83) (84)を接合一
体化する。
In the fifth step, the cut surfaces of both the block halves (83) and (84) are polished to form abutting surfaces (85) and (86) in which the end surfaces of the core halves, which serve as gap forming surfaces, are exposed. A gap spacer (9) is placed between the abutting surfaces (85) and (86).
), the two block halves (83) and (84) are joined and integrated.

その後、第6工程では、前記第5工程を経て得られた接
合体に機械加工を施して磁気ヘッドチップを作製する。
Thereafter, in a sixth step, the assembled body obtained through the fifth step is machined to produce a magnetic head chip.

(作 用) 上記磁気ヘッドの製造方法においては、第1工程での下
部導電体パターン(4)の形成、第2工程での絶縁膜(
31)及び一対の磁性膜(5)(51)の形成、及び第
3工程での上部導電体パターン(7)の形成が、全て周
知の薄膜形成技術によって行なわれる。
(Function) In the above method for manufacturing a magnetic head, the lower conductor pattern (4) is formed in the first step, and the insulating film (4) is formed in the second step.
31) and the pair of magnetic films (5) (51), and the formation of the upper conductor pattern (7) in the third step are all performed by well-known thin film forming techniques.

又、第5工程での両ブロック半体(83) (84)の
接合には、周知のガラス接合を用いることが出来る。
Moreover, well-known glass bonding can be used to bond both block halves (83) and (84) in the fifth step.

(発明の効果) 本発明に係る磁気ヘッドの製造方法によれば、少なくと
も一方のコア半体に巻装すべきコイルを薄膜形成技術に
よって形成出来るから、コア半体の小形化が可能であり
、磁気ヘッドの低インダクタンス化を図ることが出来る
(Effects of the Invention) According to the method for manufacturing a magnetic head according to the present invention, since the coil to be wound around at least one core half can be formed by thin film forming technology, it is possible to downsize the core half. The inductance of the magnetic head can be reduced.

(実施例) 実施例は本発明を説明するためのものであって、特許請
求の範囲に記載の発明を限定し、或は範囲を減縮する様
に解すべきではない。
(Examples) Examples are provided to explain the present invention, and should not be construed as limiting the invention described in the claims or reducing its scope.

第12図は、後述の本発明に係る製造方法により作製さ
れる磁気ヘッドの構造を示しており、非磁性基板(12
)上には、一対のコア半体(8)(81)が磁気ギャッ
プ部(90)を介して突き合わせて設置され、これらの
コア半体(8)(81)の上面に、ガラス接合層(図示
省略)を介して非磁性の保護板(13)が固定される。
FIG. 12 shows the structure of a magnetic head manufactured by a manufacturing method according to the present invention, which will be described later.
), a pair of core halves (8) (81) are placed abutting against each other via a magnetic gap (90), and a glass bonding layer ( A non-magnetic protection plate (13) is fixed via a (not shown).

一方のコア半体(8)にはコイル窓(87)が開設され
、該コイル窓を通して両コア半体(8)(81)に、C
uの薄膜からなるコイル導体(40)が螺旋状に巻装さ
れている。
A coil window (87) is provided in one of the core halves (8), and the C
A coil conductor (40) made of a thin film of U is spirally wound.

第13図は、上記コイル導体(40)の長手方向とは直
交する向きに切断した磁気ヘッドの断面を示しており、
前記コイル導体(40)は非磁性基板(12)上に形成
された下部導電体パターン(4)と、コア半体(8)上
に絶縁膜(6)を介して形成された上部導電体パターン
(7)とから構成され、下部導電体パターン(4)を覆
って絶縁膜(31)が形成されると共に、絶縁膜(6)
及び上部導電体パターン(7)と保護板(13)との間
には、接合用の封着ガラス(14)が充填されている。
FIG. 13 shows a cross section of the magnetic head cut in a direction perpendicular to the longitudinal direction of the coil conductor (40).
The coil conductor (40) includes a lower conductor pattern (4) formed on a non-magnetic substrate (12) and an upper conductor pattern formed on the core half (8) via an insulating film (6). (7), an insulating film (31) is formed covering the lower conductor pattern (4), and an insulating film (6)
A sealing glass (14) for bonding is filled between the upper conductor pattern (7) and the protection plate (13).

下部及び上部導電体パターン(4)(7)の断面積は例
えば、夫々50μm2以上に形成される。
The cross-sectional areas of the lower and upper conductor patterns (4) and (7) are each formed to be, for example, 50 μm 2 or more.

以下、上記磁気ヘッドの製造方法について説明する。尚
、説明の簡略化のため、最終的に1個の磁気ヘッドか得
られるまでの工程について図示及び説明を行なうが、同
一の工程を経て、同時に多数の磁気ヘッドを作製するこ
とも可能である。
Hereinafter, a method for manufacturing the above magnetic head will be explained. In order to simplify the explanation, the steps to finally obtain one magnetic head will be illustrated and explained, but it is also possible to simultaneously manufacture a large number of magnetic heads through the same process. .

先ず第1図(a)に示す様に、非磁性基板(1)上に、
後述の如く一対のコア半体が間隔をおいて設置されるべ
き領域へ、磁性薄膜(2)(20)を夫々スパッタリン
グ等の薄膜形成技術によって形成する。
First, as shown in FIG. 1(a), on a nonmagnetic substrate (1),
As will be described later, magnetic thin films (2) and (20) are respectively formed in areas where a pair of core halves are to be installed at intervals by a thin film forming technique such as sputtering.

これらの磁性薄膜(2)(20)は夫々、コア半体の磁
路とは直交する方向に長い帯状パターン部(23)(2
4)を前記磁路方向へ一定間隔で繰返し形成すると共に
、これらのパターン部(23) (24)のヘッド頭部
側にフロント部(21) (22)、前記パターン部(
23)(24)のフロント部(21)とは反対側にバッ
ク部(25)(26)を形成して構成される。第1図(
b)の如く各帯状パターン部(23)(24)間には溝
部(27)が形成されることなる。
These magnetic thin films (2) (20) have long strip pattern parts (23) (2) in a direction perpendicular to the magnetic path of the core half.
4) are repeatedly formed at regular intervals in the direction of the magnetic path, and the front portions (21) (22) and the pattern portions (22) are formed on the head head side of these pattern portions (23) (24).
The back parts (25) and (26) are formed on the opposite side of the front part (21) of 23) and (24). Figure 1 (
As shown in b), grooves (27) are formed between the respective strip pattern parts (23) and (24).

前記溝部(27)を包囲する壁面に、第2図(a)(b
)に示す如(5i02等からなる絶縁膜(3)を蒸着等
によって形成する。
On the wall surrounding the groove (27), there are
) An insulating film (3) made of 5i02 or the like is formed by vapor deposition or the like.

次に第3図(a )(b )に示す如く、両コア半体が
設置されるべき領域へ、前記絶縁膜(3)を覆って夫々
下部導電体パターン(4)(41)をスパッタリング等
によって形成する。一方の下部導電体パターン(4)は
、前記絶縁膜(3)を覆って該絶縁膜の長手方向へ伸び
、更に該絶縁膜の両側へ突出する複数の帯状下部導電体
層(44)と、前記磁性薄膜(2)のバック部(25)
に沿う下部導電体層(44)の外側の端部に形成された
端子部(42)と、その他の複数の下部導電体層(44
)の内側の端部に夫々形成された逆り字状の接続部(4
5)とを具えている。
Next, as shown in FIGS. 3(a) and 3(b), lower conductor patterns (4) and (41) are formed by sputtering, etc., covering the insulating film (3), respectively, in the area where both core halves are to be installed. formed by One lower conductor pattern (4) covers the insulating film (3) and extends in the longitudinal direction of the insulating film, and further includes a plurality of band-shaped lower conductor layers (44) protruding to both sides of the insulating film; Back portion (25) of the magnetic thin film (2)
A terminal part (42) formed at the outer end of the lower conductor layer (44) along the other lower conductor layers (44)
) are respectively formed at the inner ends of the inverted-shaped connection parts (4
5).

又、他方の下部導電体パターン(41)は、前記絶縁膜
(3)を覆って該絶縁膜の長手方向へ伸び、更に該絶縁
膜の両側へ突出する複数の帯状下部導電体層(44)と
、前記磁性薄膜(20)のバック部(26)に沿う下部
導電体層(44)の外側の端部に形成された端子部(4
3)と、その他の複数の下部導電体層(44)の外側の
端部に夫々形成された逆り字状の接続部(45)と、前
記磁性薄膜(20)のフロント部(22)に沿う下部導
電体層(44)の内側の端部に突設された連結部(46
)とを具えている。
The other lower conductor pattern (41) covers the insulating film (3) and extends in the longitudinal direction of the insulating film, and further includes a plurality of strip-shaped lower conductor layers (44) protruding to both sides of the insulating film. and a terminal portion (4) formed at the outer end of the lower conductive layer (44) along the back portion (26) of the magnetic thin film (20).
3), inverted-shaped connection portions (45) formed at the outer ends of the other plurality of lower conductor layers (44), and the front portion (22) of the magnetic thin film (20). A connecting portion (46) protruding from the inner end of the lower conductive layer (44) along
).

前記端子部(42)(43)が外部回路と接続されて、
コイルに通電されることになる。
The terminal portions (42) and (43) are connected to an external circuit,
The coil will be energized.

次に第4図(a )(b )に示す如く、前記各導電体
層(44)上へ、前記絶縁膜(3)と同一領域に、5i
02等の絶縁膜(31)を蒸着等によって形成する。こ
れによって、絶縁膜(31)の表面と帯状パターン部(
23) (24)の表面とが同一平面に揃えられること
になる。
Next, as shown in FIGS. 4(a) and 4(b), 5i
An insulating film (31) such as 02 is formed by vapor deposition or the like. As a result, the surface of the insulating film (31) and the strip pattern portion (
23) The surface of (24) will be aligned on the same plane.

第5図(a)(b)に示す如く、前記磁性薄膜(2)(
20)及び絶縁膜(31)を覆って、主コアとなる一対
の磁性膜(5)(51)をスパッタリング等によって夫
々所定形状に形成する。
As shown in FIGS. 5(a) and 5(b), the magnetic thin film (2) (
20) and the insulating film (31), a pair of magnetic films (5) and (51) to serve as the main core are formed into predetermined shapes by sputtering or the like.

更に第6図(a)(b)の如く、磁性膜(5)(51)
の全表面に、SiO++等の絶縁膜(6)(61)を蒸
着等によって形成する。
Furthermore, as shown in FIGS. 6(a) and (b), magnetic films (5) (51)
An insulating film (6) (61) of SiO++ or the like is formed on the entire surface by vapor deposition or the like.

その後、絶縁膜(6)(61)の上面、及び磁性膜(5
)(51)の両側部に突出した下部導電体層(44)の
端部及び接続部(45)の上面へ、第7図(a)(b)
の如く夫々上部導電体パターン(7)(71)を形成す
る。これらの上部導電体パターン(7)(74)は夫々
、絶縁膜(6)(61)上に、前記下部導電体層(44
)とは食違い位置に、間隔をおいて繰返し形成された帯
状の上部導電体層(72)を具えている。
After that, the upper surfaces of the insulating films (6) and (61) and the magnetic film (5
) (51) to the ends of the lower conductor layer (44) protruding from both sides and the upper surface of the connecting portion (45), as shown in FIGS. 7(a) and (b).
Upper conductor patterns (7) and (71) are respectively formed as shown in FIG. These upper conductor patterns (7) (74) are arranged on the lower conductor layer (44) on the insulating films (6) (61), respectively.
) is provided with a strip-shaped upper conductive layer (72) repeatedly formed at intervals.

一方の上部導電体パターン(7)の各導電体層(72)
の内側の端部は、磁性膜(5)から突出して前記下部導
電体パターン(4)の接続部(45)と重なると共に、
各導電体層(72)の外側の端部には、下部導電体層(
44)の外側の端部と重なる逆り字状の接続部(73)
が突設される。更に前記フロント部に最も近い上部導電
体層(72)の内側の端部には連結部(74)が形成さ
れる。
Each conductor layer (72) of one upper conductor pattern (7)
The inner end protrudes from the magnetic film (5) and overlaps the connection part (45) of the lower conductor pattern (4),
At the outer end of each conductor layer (72), a lower conductor layer (
Inverted-shaped connection part (73) that overlaps the outer edge of 44)
is installed protrudingly. Further, a connecting portion (74) is formed at the inner end of the upper conductive layer (72) closest to the front portion.

これによって、磁性膜(5)を包囲して螺旋状に巻回さ
れた第1のコイル導体部が形成されることになる。
As a result, a first coil conductor portion is formed that is spirally wound around the magnetic film (5).

又、他方の上部導電体パターン(71)の各上部導電体
層(72)の外側の端部は、磁性膜(51)から突出し
て前記下部導電体パターン(41)の接続部(45)と
重なると共に、各導電体層(72)の内側の端部には、
下部導電体層(44)の内側の端部と重なる逆り字状の
接続部(73)が形成される。
Further, the outer end of each upper conductor layer (72) of the other upper conductor pattern (71) protrudes from the magnetic film (51) and connects with the connecting portion (45) of the lower conductor pattern (41). While overlapping, at the inner end of each conductor layer (72),
An inverted-shaped connection portion (73) is formed that overlaps the inner end of the lower conductor layer (44).

これによって、磁性膜(51)を包囲して、前記第1の
コイル導体部とは逆向きの螺旋状に巻回された第2のコ
イル導体部が形成されることになる。
As a result, a second coil conductor part is formed surrounding the magnetic film (51) and spirally wound in the opposite direction to the first coil conductor part.

第8図に示す如く、前記工程を経て形成された一対のコ
ア半体(8)(81)の上に、低融点の接合ガラス(図
示省略)を介して非磁性の保護板(11)を固定し、第
9図に示す一体のブロック(82)を作製した後、該ブ
ロック(82)を図中の鎖線に沿って切断して、夫々コ
ア半体(8)(81)を具えた一対のブロック半体を作
製する。
As shown in FIG. 8, a non-magnetic protective plate (11) is placed on the pair of core halves (8) (81) formed through the above steps via a low melting point bonded glass (not shown). After fixing and producing the integral block (82) shown in FIG. 9, the block (82) is cut along the chain line in the figure to form a pair of core halves (8) and (81), respectively. Create half a block.

前記ブロック半体の切断面を研磨して、第10図の如く
コア半体(8)(81)の端面が露出した突合せ面(8
5) (8B)を形成する。両突合せ面(85) (8
6)の内、両コア半体(8)(81)の端面(ギャップ
形成面)には夫々5i02等からなるギャップスペーサ
(9)を形成する。又、一方のブロック半体(83)の
基板端面には、前記連結部(74)と接続して導電膜(
91)を、他方のブロック半体(84)の基板端面には
、前記連結部(46)と接続して導電膜(92)を、夫
々蒸着等によって形成する。
The cut surfaces of the block halves are polished to form an abutting surface (8) where the end surfaces of the core halves (8) and (81) are exposed as shown in FIG.
5) Form (8B). Both butt surfaces (85) (8
In step 6), gap spacers (9) made of 5i02 or the like are formed on the end surfaces (gap forming surfaces) of both core halves (8) (81), respectively. Further, on the end surface of the substrate of one block half (83), a conductive film (
91), and a conductive film (92) is formed on the end surface of the substrate of the other block half (84) by vapor deposition or the like in connection with the connecting portion (46).

その後、両ブロック半体(83)(84)を突合せ面(
85) (86)にて接合し一体化する。これによって
、一方のブロック半体(83)の導電膜(91)と他方
のブロック半体(84)の導電膜(92)とが密着し、
第7図(a)に示す右側の磁性膜(5)に形成された上
部導電体パターン(7)の連結部(74)と左側の磁性
膜(51)に形成された下部導電体パターン(41)の
連結部(46)とが前記導電膜(91)(92)を介し
て互いに連結され、第12図に示すコイル導体(40)
が形成されることになる。
After that, the two block halves (83) (84) are joined to the butt surface (
85) Join and integrate at (86). As a result, the conductive film (91) of one block half (83) and the conductive film (92) of the other block half (84) are brought into close contact with each other.
The connecting portion (74) of the upper conductive pattern (7) formed on the right magnetic film (5) and the lower conductive pattern (41) formed on the left magnetic film (51) shown in FIG. 7(a). ) are connected to each other via the conductive films (91) and (92), forming the coil conductor (40) shown in FIG.
will be formed.

尚、両ブロック半体(83) (84)の接合固定には
、例えば第11図に示す如く、一方のブロック半体(8
3)の突合せ面(85)には垂直方向にガラス溝(80
)を凹設し、他方のブロック半体(84)の突合せ面(
86)には基板(1)及び保護(11)の端面に沿って
ガラス溝(89) (89)を凹設し、両ブロック半体
(83)(84)を突き合せた状態で、これらのガラス
溝(80)(89) (89)に夫々溶着用の低融点ガ
ラス(80)を充填するガラス接合を採用することが出
来る。
In addition, to join and fix both block halves (83) (84), for example, as shown in FIG.
3) has a vertical glass groove (80) on the abutting surface (85).
) is recessed, and the abutting surface (
86) has glass grooves (89) (89) recessed along the end faces of the substrate (1) and protection (11), and with both block halves (83) (84) butted against each other, Glass bonding can be employed in which the glass grooves (80), (89), and (89) are filled with low melting point glass (80) for welding, respectively.

最後に、前記ガラス接合工程を経て得られた接合体に、
切断、曲面研磨等の機械加工を施して、第12図に示す
如き磁気ヘッドチップを完成する。
Finally, in the bonded body obtained through the glass bonding process,
Machining such as cutting and curved surface polishing is performed to complete a magnetic head chip as shown in FIG.

上記磁気ヘッドの製造方法によれば、両コア半体(8)
(81)に巻装すべきコイル導体(40)を薄膜形成技
術によって形成出来るから、磁気ヘッドの小形化が可能
であり、これによって低インダクタンス化を図ることが
出来る。又、磁気ヘッド製造工程の大部分が薄膜形成技
術によって構成されるから、従来よりも生産能率が向上
する。
According to the above method for manufacturing a magnetic head, both core halves (8)
Since the coil conductor (40) to be wound around the magnetic head (81) can be formed by thin film forming technology, the magnetic head can be made smaller, and thereby the inductance can be lowered. Further, since most of the magnetic head manufacturing process is performed using thin film forming technology, production efficiency is improved compared to the conventional method.

又、上記工程を経て得られた第12図の磁気ヘッドにお
いては、両コア半体(8)(81)に対して夫々コイル
導体(40)が所謂バランス巻きされているから、ヘッ
ド効率の点でも優れている。
In addition, in the magnetic head shown in FIG. 12 obtained through the above steps, the coil conductor (40) is wound in balance around both core halves (8) and (81), so that the head efficiency is improved. But it's excellent.

上記実施例の説明は、本発明を説明するためのものであ
って、特許請求の範囲に記載の発明を限定し、或は範囲
を減縮する様に解すべきではない。
The above description of the embodiments is for illustrating the present invention, and should not be construed to limit or reduce the scope of the invention described in the claims.

又、本発明の各部構成は上記実施例に限らず、特許請求
の範囲に記載の技術的範囲内で種々の変形が可能である
ことは勿論である。
Further, it goes without saying that the configuration of each part of the present invention is not limited to the above-mentioned embodiments, and various modifications can be made within the technical scope of the claims.

例えば上記磁気ヘッドの製造方法では、一対のコア半体
(8)(81)の両方にコイル導体(40)を巻装して
いるが、何れか一方のコア半体にのみ、同様な薄膜形成
工程でコイル導体を形成することも可能である。
For example, in the magnetic head manufacturing method described above, the coil conductor (40) is wound around both of the pair of core halves (8) and (81), but a similar thin film is formed only on one of the core halves. It is also possible to form the coil conductor in the process.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a )(b )乃至第11図は本発明に係る磁
気ヘッドの製造方法を示す一連の工程図を示し、第1図
(a )(b )は夫々基板上に磁性薄膜を形成した状
態の斜視図及び断面図、第2図(a )(b )は夫々
基板上に絶縁膜を形成した状態の斜視図及び断面図、第
8図(a )(b )は夫々下部導電体パターンを形成
した状態の斜視図及び断面図、第4図(a)(b)は夫
々下部導電体層上に絶縁膜を形成した状態の斜視図及び
断面図、第5図(a )(b )は夫々磁性膜を形成し
た状態の斜視図及び断面図、第6図(a )(b )は
磁性膜上に絶縁膜を形成した状態を示す斜視図及び断面
図、第7図(a)(b)は夫々絶縁膜上に上部導電体層
を形成した状態の斜視図及び断面図、第8図は保護板を
固定する工程の斜視図、第9図はブロックの斜視図、第
10図は一対のブロック半体の斜視図、第11図は一対
のブロック半体の接合工程を示す斜視図、第12図は本
発明に係る製造方法によって作製される磁気ヘッドの斜
視図、第13図は該磁気ヘッドの要部を示す断面図、第
14図は従来の磁気ヘッドの斜視図である。 (1)・・・基 板      (11)・・・保護板
(3)(31)・・・絶縁膜    (5)(51)・
・・磁性膜(4) (41)・・・下部導電体パターン
(7) (71)・・・上部導電体パターン第9 V!J(b) 茶6図(b) 襲11.@
FIGS. 1(a) to 11 show a series of process diagrams showing a method for manufacturing a magnetic head according to the present invention, and FIGS. 1(a) and 11(b) respectively show the formation of a magnetic thin film on a substrate. 2(a) and 2(b) are respectively perspective views and sectional views of the state in which the insulating film is formed on the substrate, and FIG. 8(a) and (b) are respectively the lower conductor. FIGS. 4(a) and 4(b) are a perspective view and a sectional view of a state in which a pattern has been formed, and FIGS. 6(a) and 6(b) are perspective views and sectional views showing a state in which an insulating film is formed on a magnetic film, and FIG. 7(a) is a perspective view and a sectional view showing a state in which a magnetic film is formed. (b) is a perspective view and a sectional view of the upper conductor layer formed on the insulating film, FIG. 8 is a perspective view of the step of fixing the protective plate, FIG. 9 is a perspective view of the block, and FIG. 10 is a perspective view of a pair of block halves, FIG. 11 is a perspective view showing a process of joining the pair of block halves, FIG. 12 is a perspective view of a magnetic head manufactured by the manufacturing method according to the present invention, and FIG. 13 is a perspective view of a pair of block halves. 1 is a sectional view showing essential parts of the magnetic head, and FIG. 14 is a perspective view of a conventional magnetic head. (1)...Substrate (11)...Protection plate (3) (31)...Insulating film (5) (51)
...Magnetic film (4) (41)...Lower conductor pattern (7) (71)...Upper conductor pattern 9th V! J (b) Cha 6 figure (b) Attack 11. @

Claims (1)

【特許請求の範囲】 [1]非磁性の基板上に、磁性膜からなる一対のコア半
体を、ギャップスペーサを介して互いに突き合わせて配
置し、少なくとも一方のコア半体にはコイルが巻装され
ている磁気ヘッドの製造方法において、 非磁性基板(1)上に、少なくとも前記一方のコア半体
が設置されるべき領域へ、該コア半体の磁路とは直交す
る方向へ伸び、該コア半体の前記直交方向の幅よりも長
い帯状の下部導電体層(44)を、前記磁路方向へ間隔
をおいて繰返し設けて、縞状の下部導電体パターン(4
)を形成する第1工程と、 前記基板(1)の下部導電体パターン(4)上へ、前記
各導電体層(44)の両端部を露出させる位置に、絶縁
膜(31)を介して一方のコア半体となる磁性膜(5)
を形成すると共に、該磁性膜(5)とは離れた位置に他
方のコア半体となる磁性膜(51)を形成する第2工程
と、 前記下部導電体パターン(4)上に形成された磁性膜(
5)及び該磁性膜の両側部に突出した前記下部導電体層
(44)の上面へ、隣接する一対の下部導電体層の相反
する方向の端部を互いに連結する帯状の上部導電体層(
72)を、絶縁膜(6)を介して繰返し設けて、縞状の
上部導電体パターン(7)を形成し、前記上部及び下部
導電体パターン(4)(7)によって、コア半体の周囲
に螺旋状に巻回されたコイル導体(40)を構成する第
3工程と、 前記工程を経た基板(1)を切断して両コア半体を分離
し、夫々コア半体を具えた一対のブロック半体(83)
(84)を作製する第4工程と、前記両ブロック半体(
83)(84)の切断面を研磨して、ギャップ形成面と
なるコア半体の端面が露出した突合せ面(85)(86
)を形成し、両突合せ面(85)(86)間にギャップ
スペーサ(9)を介して両ブロック半体(83)(84
)を接合一体化する第5工程と、 第5工程を経て得られた接合体に機械加工を施して磁気
ヘッドチップを作製する第6工程とを具えたことを特徴
とする磁気ヘッドの製造方法。
[Claims] [1] A pair of core halves made of a magnetic film are arranged on a non-magnetic substrate so as to butt against each other with a gap spacer interposed therebetween, and at least one core half is wound with a coil. In a method of manufacturing a magnetic head, a magnetic head is provided on a non-magnetic substrate (1), extending in a direction perpendicular to the magnetic path of the core half to a region where at least one of the core halves is to be installed; A strip-shaped lower conductor layer (44) longer than the width of the core half in the orthogonal direction is repeatedly provided at intervals in the magnetic path direction to form a striped lower conductor pattern (44).
) on the lower conductor pattern (4) of the substrate (1) at a position where both ends of each of the conductor layers (44) are exposed through an insulating film (31). Magnetic film (5) that becomes one core half
a second step of forming a magnetic film (51) which will become the other core half at a position apart from the magnetic film (5); Magnetic film (
5) and a band-shaped upper conductor layer (44) that connects the opposite ends of the pair of adjacent lower conductor layers to the upper surface of the lower conductor layer (44) protruding from both sides of the magnetic film.
72) is repeatedly provided via an insulating film (6) to form a striped upper conductor pattern (7), and the upper and lower conductor patterns (4) and (7) form a periphery of the core half. a third step of configuring a coil conductor (40) wound spirally; and a third step of configuring a coil conductor (40) that is spirally wound in Block half (83)
(84) and a fourth step of producing both block halves (
83) The cut surfaces of (84) are polished to form abutting surfaces (85) and (86) in which the end surfaces of the core halves that will become the gap forming surfaces are exposed.
), and both block halves (83) (84
); and a sixth step of fabricating a magnetic head chip by machining the bonded body obtained through the fifth step. .
JP11272590A 1990-04-27 1990-04-27 Manufacture of magnetic head Pending JPH0411309A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11272590A JPH0411309A (en) 1990-04-27 1990-04-27 Manufacture of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11272590A JPH0411309A (en) 1990-04-27 1990-04-27 Manufacture of magnetic head

Publications (1)

Publication Number Publication Date
JPH0411309A true JPH0411309A (en) 1992-01-16

Family

ID=14593975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11272590A Pending JPH0411309A (en) 1990-04-27 1990-04-27 Manufacture of magnetic head

Country Status (1)

Country Link
JP (1) JPH0411309A (en)

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