JPH0411259A - Dampening-waterless photosensitive planographic printing plate - Google Patents
Dampening-waterless photosensitive planographic printing plateInfo
- Publication number
- JPH0411259A JPH0411259A JP11392490A JP11392490A JPH0411259A JP H0411259 A JPH0411259 A JP H0411259A JP 11392490 A JP11392490 A JP 11392490A JP 11392490 A JP11392490 A JP 11392490A JP H0411259 A JPH0411259 A JP H0411259A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- weight
- silicone rubber
- substrate
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 63
- 229920002379 silicone rubber Polymers 0.000 claims abstract description 42
- 239000004945 silicone rubber Substances 0.000 claims abstract description 42
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 35
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 35
- 239000011148 porous material Substances 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 43
- 206010034972 Photosensitivity reaction Diseases 0.000 claims 1
- 230000036211 photosensitivity Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 77
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- 239000002904 solvent Substances 0.000 abstract description 4
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- 229920005989 resin Polymers 0.000 description 24
- 239000011347 resin Substances 0.000 description 24
- -1 isocyanate compounds Chemical class 0.000 description 23
- 239000000203 mixture Substances 0.000 description 18
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- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000010407 anodic oxide Substances 0.000 description 12
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- 239000007864 aqueous solution Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
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- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
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- 229910052739 hydrogen Inorganic materials 0.000 description 3
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- 239000003112 inhibitor Substances 0.000 description 3
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- 238000012545 processing Methods 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
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- 108010010803 Gelatin Proteins 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
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- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
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- 239000003350 kerosene Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 239000007793 ph indicator Substances 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000011907 photodimerization Methods 0.000 description 1
- 230000002165 photosensitisation Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical class [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 239000005019 zein Substances 0.000 description 1
- 229940093612 zein Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、湿し水不要感光性平版印刷版に関し、特に現
像処理時ウェット状態でアルミニウム基板とその上に設
けたコーティング層との密着性が改良された湿し水不要
感光性平版印刷版に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a photosensitive lithographic printing plate that does not require dampening water, and in particular to the adhesion between an aluminum substrate and a coating layer provided thereon in a wet state during development processing. This invention relates to a photosensitive lithographic printing plate that does not require dampening water and has been improved.
シリコーンゴム層を非画像部とする湿し水不要感光性平
版印刷版については、例えば、特公昭44−23042
号、特公昭46−16044号、特公昭54−2692
3号、特公昭61−54222号、特開昭63−265
247号等において、すでに種々のものが提案されてい
る。For photosensitive lithographic printing plates that do not require dampening water and have a silicone rubber layer as a non-image area, for example, Japanese Patent Publication No. 44-23042
No., Special Publication No. 46-16044, Special Publication No. 54-2692
No. 3, JP 61-54222, JP 63-265
Various methods have already been proposed in No. 247 and the like.
これらの湿し水不要感光性平版印刷版の支持体としては
アルミニウム板が広く用いろれている。Aluminum plates are widely used as supports for these photosensitive lithographic printing plates that do not require dampening water.
その理由は次のようなものである。すなわち、現在平版
印刷版の大部分を占めている、湿し水を用いる感光性平
版印刷版の支持体がアルミニウム板であり、このため、
現在市場において稼動している平版印刷機の大半がアル
ミニウム板を装着するのに適した構造となっている。従
って、湿し水不要平版印刷版においてもアルミニウムを
支持体として用いることにより、印刷機の版装着のため
の装置を特別に改造することなく使用することが可能と
なる。又平版印刷版の製版現場においてプレートの取扱
いを行う作業者はアルミニウム支持体からなる刷版の取
扱いに習熟しているため、アルミニウムの有する強度、
例えばクニックの発生のしにくさ、圧力等による変形の
しにくさ、現像処理前後の寸度安定性、金属支持体の割
に比較的軽量であるなどのアルミニウム支持体の有する
メリットを維持することを強く望んでいる。以上の様な
事情が湿し水不要平版印刷版においてもアルミニウムが
支持体として用いられている理由である。The reason is as follows. That is, the support of photosensitive lithographic printing plates that use dampening water, which currently makes up the majority of lithographic printing plates, is an aluminum plate.
Most of the lithographic printing presses currently in operation on the market have a structure suitable for mounting an aluminum plate. Therefore, by using aluminum as a support even in a lithographic printing plate that does not require dampening water, it becomes possible to use the plate mounting device of a printing press without special modification. In addition, workers who handle plates at the plate-making site of lithographic printing plates are familiar with handling printing plates made of aluminum supports, so the strength of aluminum,
For example, maintaining the advantages of an aluminum support, such as resistance to formation of nicks, resistance to deformation due to pressure, etc., dimensional stability before and after development processing, and relatively light weight for a metal support. I strongly desire. The above circumstances are the reasons why aluminum is used as a support even in lithographic printing plates that do not require dampening water.
一方、特に湿し水不要平版印刷版においては、アルミニ
ウム基板と、その表面上に設置されたコーティング層と
の十分な密着力が望まれる。すなわち、湿し水不要平版
印刷版においては、コーティング層のうち、シリコーン
ゴム層のインキ反撥性を利用して非画像部を形成し、感
光層もしくはプライマー層のインキ受容性を利用して画
像部を形成するため、例えば現像時に、コーティング層
の一部が支持体から剥離し、支持体表面が露出すると正
常な印刷物を得ることはできなし1゜この様な観点から
、アルミニウム板の表面上に設置するコーティング層と
アルミニウム基板との接着性を向上させる方法として、
該コーティング層中に種々の接着性向上効果を有する化
合物を含有させることが提案されている。例えば特開昭
63−305360号には支持体上に隣接して設けた硬
膜したゼラチンからなるブライマー層中にシランカップ
リング剤を含有させることにより接着性を向上させ得る
ことが開示されている。On the other hand, particularly in planographic printing plates that do not require dampening water, sufficient adhesion between the aluminum substrate and the coating layer provided on the surface thereof is desired. That is, in a planographic printing plate that does not require dampening water, the non-image area is formed using the ink repellency of the silicone rubber layer of the coating layer, and the image area is formed using the ink receptivity of the photosensitive layer or primer layer. For example, during development, if part of the coating layer peels off from the support and the surface of the support is exposed, normal printed matter cannot be obtained. As a method to improve the adhesion between the coating layer to be installed and the aluminum substrate,
It has been proposed that the coating layer contain various compounds that have the effect of improving adhesion. For example, JP-A-63-305360 discloses that adhesion can be improved by incorporating a silane coupling agent into a brimer layer made of hardened gelatin provided adjacent to a support. .
しかしながら、シランカップリング剤を用lJすること
による密着力向上の効果は、カップリング剤とコーティ
ング層との特定の組み合わせでのみ発現されるものであ
り、材料設計の観点かみは、大きな制約をうける。さら
に、特に、特開昭61−275759号に記載されてい
る様な水を主体とする現像液や、特公昭63−3314
0号に記載されている様なシリコーン層を膨潤させる前
処理液で処理した後に、水又は水を主成分とする処理液
中でブラシでこすりながら現像処理を行う場合には、そ
の効果は、満足できるものではなく、現像液の温度、ブ
ラシのこすり圧などの条件によって、プレートの周辺部
において、コーティング層がアルミニウム表面から剥離
するという問題が生じる。However, the effect of improving adhesion by using a silane coupling agent is only achieved with a specific combination of the coupling agent and the coating layer, and the material design perspective is subject to significant restrictions. . Furthermore, in particular, water-based developers such as those described in JP-A No. 61-275759 and JP-A No. 63-3314
When a silicone layer is treated with a pretreatment liquid that swells as described in No. 0, and then developed while being rubbed with a brush in water or a treatment liquid whose main component is water, the effect is as follows. This is not satisfactory, and a problem arises in that the coating layer peels off from the aluminum surface at the periphery of the plate depending on conditions such as the temperature of the developer and the rubbing pressure of the brush.
したがって本発明の目的は、アルミニウム基板とその上
に設けたコーティング層との密着性が改良された湿し水
不要感光性平版印刷版を提供することである。Therefore, an object of the present invention is to provide a photosensitive lithographic printing plate that does not require dampening water and has improved adhesion between an aluminum substrate and a coating layer provided thereon.
本発明者らは種々研究を重ねた結果、直径200Å〜2
000人のポアを有する陽極酸化皮膜を備えたアルミニ
ウム基板の該皮膜上に、感光層及びシリコーンゴム層又
はプライマー層、感光層およびシリコーンゴム層をこの
順に設けたことを特徴とする湿し水不要感光性平版印刷
版において、上記目的が達成されることを見い出し、本
発明を完成するに到った。As a result of various studies, the present inventors found that diameters of 200 Å to 2
A photosensitive layer, a silicone rubber layer or a primer layer, a photosensitive layer and a silicone rubber layer are provided in this order on an aluminum substrate having an anodized film having 0,000 pores, and no dampening water is required. The inventors have discovered that the above object can be achieved in a photosensitive lithographic printing plate, and have completed the present invention.
以下本発明について順を追って詳しく説明する。The present invention will be explained in detail below.
〈アルミニウム基板〉
本発明に用いる、直径200Å〜2.000人のポアを
有する陽極酸化皮膜を備えたアルミニウム基板としては
、特公昭46−26521号公報に記載されているりん
酸電解アルミニウム基板、特開昭49−8428号、特
開昭49−12903号や特開昭50−138903号
公報に記載されている硫酸電解後、りん酸やポリりん酸
を用いてエツチング処理したアルミニウム基板、特開昭
50−138903号公報や特開昭49−93101号
公報に記載されている硫酸電解後アルカリ液を用いてエ
ツチング処理したアルミニウム基板や特公昭54−32
424号公報に記載されているりん酸第3ナトリウム電
解アルミニウム基板がある。<Aluminum substrate> As the aluminum substrate equipped with an anodized film having pores of 200 Å to 2,000 in diameter, which is used in the present invention, the phosphate electrolytic aluminum substrate described in Japanese Patent Publication No. 46-26521, Aluminum substrates etched using phosphoric acid or polyphosphoric acid after sulfuric acid electrolysis described in JP-A-49-8428, JP-A-49-12903 and JP-A-50-138903; Aluminum substrates etched using an alkaline solution after sulfuric acid electrolysis as described in Japanese Patent Publication No. 50-138903 and Japanese Patent Application Laid-Open No. 1984-93101,
There is a tertiary sodium phosphate electrolytic aluminum substrate described in Japanese Patent No. 424.
その他硫酸・りん酸混合液で陽極酸化してアルミニウム
基板や水酸化ナトリウム水溶液で陽極酸化したアルミニ
ウム基板もあげることが出来る。これらの陽極酸化皮膜
量は0.2g/m〜2 g/n(、好ましくは0.5
g / m〜1.5 g /耐である。Other examples include aluminum substrates anodized with a sulfuric acid/phosphoric acid mixture and aluminum substrates anodized with an aqueous sodium hydroxide solution. The amount of these anodic oxide films is 0.2 g/m to 2 g/n (preferably 0.5
g/m to 1.5 g/m.
尚、通常用いられる硫酸を用いた陽極酸化皮膜ではポア
の直径は50Å〜150人であるが、この様な陽極酸化
皮膜支持体では、コーティング層との密着力は不十分で
あり、現像時や、印刷時にコーティング層が@離すると
いう問題が生じる。In addition, in the commonly used anodic oxide film using sulfuric acid, the diameter of the pores is 50 Å to 150 Å, but with such an anodic oxide film support, the adhesion with the coating layer is insufficient, and during development and , the problem arises that the coating layer separates during printing.
しかし、本発明のごとく、アルミニウム基板の陽極酸化
皮膜のポアの直径を200Å〜2.000人、好ましく
は300Å〜1000人にすることによって基板とコー
ティング層とが強固に密着し、上記問題点が解決される
。However, as in the present invention, by setting the diameter of the pores in the anodic oxide film of the aluminum substrate to 200 Å to 2,000 Å, preferably 300 Å to 1000 Å, the substrate and the coating layer are firmly adhered to each other, and the above-mentioned problems can be solved. resolved.
更に本発明で用いるアルミニウム基板には所望により親
水化処理を行ってもよい。親水化処理としては、特開昭
48−83902号、特開昭4963501号、特開昭
49−96803号、特開昭49−102403号各公
報に記載されるような水溶性セルロース誘導体の下塗、
特公昭475125号、特公昭48−9007号各公綴
じ記載されているシリケート処理、特公昭561251
8号公報に記載されている熱水処理等をあげることがで
きる。その他親水化処理としてはポリビニルスルホン酸
またはスルホン酸基を側鎖に有する重合体および共重合
体やポリアクリル酸等の下塗も好適である。Furthermore, the aluminum substrate used in the present invention may be subjected to a hydrophilic treatment if desired. Hydrophilic treatments include undercoating of water-soluble cellulose derivatives as described in JP-A-48-83902, JP-A-4963501, JP-A-49-96803, and JP-A-49-102403;
Silicate treatment described in Tokoku No. 475125 and No. 48-9007, Tokoku No. 561251
Examples include hot water treatment described in Publication No. 8. Other suitable hydrophilic treatments include polyvinylsulfonic acid, polymers and copolymers having sulfonic acid groups in their side chains, and undercoating of polyacrylic acid.
また、基板を種々のシランカップリング剤で表面処理す
ることにより、コーティング層との密着性をさらに向上
させることができる。処理方法としてはシランカップリ
ング剤を0.1〜3重量%の水溶液にして用いるのが一
般的であるが、さらに高濃度であってもなんら差しつか
えなく、シランカップリング剤の種類や処理時間等によ
ってはさらに低濃度であっても充分な密着性の向上が認
められる。シランカップリング剤の塗布量は乾燥重量で
5■/ m1〜100■/ m’が適当である。またこ
れらの基板の表面にはハレーション防止及びその他の目
的で更にブライマー層などを設けてもよい。Furthermore, by surface treating the substrate with various silane coupling agents, the adhesion with the coating layer can be further improved. As a treatment method, it is common to use a silane coupling agent in an aqueous solution of 0.1 to 3% by weight, but even higher concentrations are acceptable, and the type of silane coupling agent and treatment time are acceptable. In some cases, sufficient improvement in adhesion is observed even at lower concentrations. The appropriate amount of the silane coupling agent to be applied is 5 .mu./m1 to 100 .mu./m' in terms of dry weight. Further, a brimer layer or the like may be further provided on the surface of these substrates for the purpose of preventing halation and for other purposes.
ブライマー層としては、基板と光重合性感光層との接着
性の向上の他に、ハレーション防止、印刷特性の向上、
場合によっては画像の染色の向上のために、種々のもの
を利用することが出来る。In addition to improving the adhesion between the substrate and the photopolymerizable photosensitive layer, the brimer layer can also prevent halation, improve printing properties,
Various methods can be used to improve the staining of images as the case may be.
例えば、特開昭60−22903号公報に開示されてい
るような種々の感光性ポリマーを、光重合性感光層を積
層する前に露光して硬化せしめたもの、特開昭62−5
0760号公報に開示されているエポキシ樹脂を熱硬化
せしめたもの、更に特開昭63−133151号公報に
開示されているゼラチンを硬膜せしめたもの、その他力
ゼインを硬膜させたもの、ポリウレタン、ポリアミド、
スチレン/ブタジェンゴム、カルボキシ変性スチレン/
ブタジェンゴム、アクリロニトリル/ブタジェンゴム、
カルボキシ変性アクリロニトリル/ブタジェンゴム、ポ
リイソプレン、及びアクリレートゴム等を挙げることが
出来る。また、これらのものは任意に混合して用いても
よく、その上目的に応じて、染料、pH指示薬、焼き出
し剤、光重合開始剤、接着助剤(例えば、重合性モノマ
ー、ジアゾ樹脂、シランカップリング剤、チタネートカ
ップリング剤、アルミカップリング剤、イソシアネート
化合物、カルボン酸含有樹脂)、白色顔料やシリカ粉末
等の添加剤を含有させてもよい。For example, various photosensitive polymers as disclosed in JP-A No. 60-22903 are cured by exposure to light before laminating a photopolymerizable photosensitive layer, and JP-A No. 62-5
0760, a heat-cured epoxy resin, a hardened gelatin disclosed in JP-A-63-133151, other hardened zein, and polyurethane. ,polyamide,
Styrene/butadiene rubber, carboxy-modified styrene/
Butadiene rubber, acrylonitrile/butadiene rubber,
Examples include carboxy-modified acrylonitrile/butadiene rubber, polyisoprene, and acrylate rubber. Furthermore, these materials may be used in any arbitrary mixture, and depending on the purpose, dyes, pH indicators, print-out agents, photopolymerization initiators, adhesion aids (e.g., polymerizable monomers, diazo resins, Additives such as silane coupling agents, titanate coupling agents, aluminum coupling agents, isocyanate compounds, carboxylic acid-containing resins), white pigments, and silica powder may also be included.
般にブライマー層の塗布量は乾燥重量で0.5〜20g
/耐である。In general, the coating amount of the brimer layer is 0.5 to 20 g in dry weight.
/It is durable.
く感光層〉
本発明で使用される感光性樹脂層は一般的には露光によ
って現像液に対する溶解性に差が生じるか、又は上層の
シリコーンゴム層との界面で接着性に変化を生じるもの
であればいかなるものであっても使用することができる
。画像形成は、ネガ型でもポジ型でもよい。Photosensitive layer> The photosensitive resin layer used in the present invention generally has a difference in solubility in a developer due to exposure, or a change in adhesiveness at the interface with the upper silicone rubber layer. You can use whatever you have. Image formation may be negative type or positive type.
このような感光層を構成する化合物又は組成物には、次
のものが含まれる。Compounds or compositions constituting such a photosensitive layer include the following.
(^)光重合型感光性組成物:
(1) オレフィン性不飽和二重結合基を有するモノ
マー又はオリゴマー、(2)必要に応じて使用される、
フィルム形成能を有する高分子化合物及び(3)光重合
開始剤からなる光重合型感光物よりなる。(^) Photopolymerizable photosensitive composition: (1) Monomer or oligomer having an olefinically unsaturated double bond group, (2) used as necessary,
It consists of a photopolymerizable photosensitive material consisting of a polymer compound having film-forming ability and (3) a photopolymerization initiator.
上記成分(11〜(3)を含む感光性樹脂層の中で成分
(11と(2)が結合した高分子化合物、即ち、側鎖に
光重合可能又は光架橋可能でかつオレフィン性の不飽和
二重結合基を有するとともにフィルム形成能を有する高
分子化合物を含む感光性樹脂層も本発明に用いるのに好
適である。また、成分(1)と(2)が結合した化合物
に、更に成分(1)のモノマー又はオリコマ−を添加し
た感光性樹脂層は更に好適である。In the photosensitive resin layer containing the above components (11 to (3)), a polymer compound in which components (11 and (2)) are bonded, that is, a side chain that is photopolymerizable or photocrosslinkable and has an olefinic unsaturated A photosensitive resin layer containing a polymer compound having a double bond group and a film-forming ability is also suitable for use in the present invention. A photosensitive resin layer to which the monomer or olicomer of (1) is added is more suitable.
上8己の如き感光性樹脂用の組成物は例えば、特願平1
−301568号に記載されている様なポリウレタン樹
脂またはポリアミド樹脂を含むものが好適に使用される
。さらに、特開平1−214839号に記載されたもの
も好適である。Compositions for photosensitive resins such as those described above are disclosed in, for example, Japanese Patent Application No. 1999.
Polyurethane resins or polyamide resins such as those described in Japanese Patent No. 301,568 are preferably used. Furthermore, those described in JP-A-1-214839 are also suitable.
(B)光二量化型感光惟組成吻:
重合体の主鎖又は側鎖に
(R:炭素数1から10のアルキル基)(R,、R2は
それぞれアルキル基を示し、R,とR2とが一緒になっ
て5員環又は6員環を形成してもよい)、又は
(R:炭素数1から10のアルキル基)を含む高分子化
合物からなるものが含まれる。(B) Photodimerization type photosensitive composition: In the main chain or side chain of the polymer (R: alkyl group having 1 to 10 carbon atoms) (R, and R2 each represent an alkyl group, and R and R2 are may be taken together to form a 5-membered ring or 6-membered ring), or (R: an alkyl group having 1 to 10 carbon atoms).
重合体主鎖又は側鎖に感光性基として
類、ポリアミド類、ポリカーボネート類のような感光性
重合体を主成分とするものく例えば米国特許第3,03
0,208号、同第3,707,373号及び同第3.
453,237号の各明細書に記載されているような化
合物);シンナミリデンマロン酸等の(2−プロペニリ
デン)マロン酸化合物及び二官能性グリコール類から誘
導される感光性ポリエステル類を主成分としたもの(例
えば、米国特許第2,956゜878号及び同第3,1
73,787号の各明細書に記載されているような感光
性重合体);ポリビニルアルコール、澱粉、セルロース
及びその類似物のような水酸基含有重合体のケイ皮酸エ
ステル類(例えば、米国特許第2.690,966号、
同第2,752,372号、同第2,732,301号
等の各明細書に記載されているような感光性重合体)、
更に特開昭58−25302号、同59−17550号
公報に記載されている重合体等が包含される。For example, polymers whose main component is a photosensitive polymer such as polyamides, polycarbonates, etc. as photosensitive groups in the main chain or side chain of the polymer, such as U.S. Patent No. 3,03
No. 0,208, No. 3,707,373 and No. 3.
Compounds such as those described in the specifications of No. 453,237); Main components are photosensitive polyesters derived from (2-propenylidene) malonic acid compounds such as cinnamylidene malonic acid and difunctional glycols. (e.g., U.S. Pat. No. 2,956°878 and U.S. Pat. No. 3,1
73,787); cinnamate esters of hydroxyl-containing polymers such as polyvinyl alcohol, starch, cellulose, and the like (e.g., U.S. Pat. 2.690,966,
2,752,372, 2,732,301, etc.),
Furthermore, the polymers described in JP-A-58-25302 and JP-A-59-17550 are also included.
(C)光硬化性ジアヅ樹脂あるいはアジド樹脂と、必要
ならば光増感側と、若干の充填材添加物とからなる組成
物:
光硬化性ジアゾ樹脂としては、バラジアゾジフェニルア
ミン、パラジアヅモノエチルアニリン、パラジアゾベン
ジルエチルアニリンなどのジアゾ系アミンとホルムアル
デヒドとの縮合物の塩化亜鉛複塩を挙げることができる
。(C) A composition consisting of a photocurable diazo resin or azide resin, a photosensitizing side if necessary, and some filler additives: As the photocurable diazo resin, paradiazo diphenylamine, paradiazu monoethyl Examples include zinc chloride double salts of condensates of formaldehyde and diazo amines such as aniline and paradiazobenzylethylaniline.
この感光性樹脂層は光重合性不飽和二重結合基を有する
化合物を含有しない点で(A)で挙げた感光性樹脂層と
は本質的に異なるものである。This photosensitive resin layer is essentially different from the photosensitive resin layer mentioned in (A) in that it does not contain a compound having a photopolymerizable unsaturated double bond group.
光硬化性アジド樹脂としては、ポリビニルアルコールの
アジドフタル酸エステル、あるいはアジド安息香酸エス
テル、スチレン−無水マレイン酸共重合体と、芳香族ア
ジド系アルコール、例えばβ−(4−アジドフェノール
)エタノールのエステルなどがあげられる。Examples of the photocurable azide resin include azidophthalate ester of polyvinyl alcohol, azidobenzoate ester, ester of styrene-maleic anhydride copolymer, and aromatic azido alcohol such as β-(4-azidophenol)ethanol. can be given.
(D)0−キノンジアジド化合物からなる組成物:特に
好ましい0−キノンジアジド化合物は0ナフトキノンジ
アジド化合物であり、例えば米国特許第2.766、1
18号、同第2.767、092号、同第2、772.
972号、同第2.859.112号、同第2.907
.665号、同第3.046.110号、同第3.04
6.111号、同第3、046.115号、同第3.0
46.118号、同第3.046,119号、同第3.
046.120号、同第3.046.121号、同第3
、046.122号、同第3.046.123号、同第
3.061.430号、同第3.102.809号、同
第3.106.465号、同第3、635.709号、
同第3.647.443号の各明細書をはじ緬、多数の
刊行物に記されており、これらは好適に使用することが
できる。これらの内でも、特に芳香族ヒドロキシ化合物
のO−ナフトキノンジアジドスルホン酸エステル又はO
−ナフトキノンジアジドカルボン酸エステノベ及び芳香
族アミン化合物のO−ナフトキノンジアジドスルホン酸
アミドまたはQ−ナフトキノンジアジドカルボン酸アミ
ドが好ましい。(D) Composition comprising an 0-quinonediazide compound: A particularly preferred 0-quinonediazide compound is an 0-naphthoquinonediazide compound, for example, U.S. Pat.
No. 18, No. 2.767, No. 092, No. 2, 772.
No. 972, No. 2.859.112, No. 2.907
.. No. 665, No. 3.046.110, No. 3.04
No. 6.111, No. 3, No. 046.115, No. 3.0
No. 46.118, No. 3.046,119, No. 3.
No. 046.120, No. 3.046.121, No. 3
, No. 046.122, No. 3.046.123, No. 3.061.430, No. 3.102.809, No. 3.106.465, No. 3, 635.709 ,
The specifications of Patent No. 3,647,443 are described in numerous publications, and these can be suitably used. Among these, O-naphthoquinonediazide sulfonic acid esters of aromatic hydroxy compounds or O-
-Naphthoquinonediazidecarboxylic acid esters and O-naphthoquinonediazide sulfonic acid amides or Q-naphthoquinonediazidecarboxylic acid amides of aromatic amine compounds are preferred.
くシリコーンゴム層〉
本発明において好ましく用いちれるシリコーンゴム層は
線状又は部分的に架橋したポリンオルガ/シロキサンで
あり、次のような繰返し単位を有する。Silicone Rubber Layer> The silicone rubber layer preferably used in the present invention is a linear or partially crosslinked polyolga/siloxane and has the following repeating units.
+5i−0+−
ここで、Rはアルキル基、アリール基、アルケニル基又
はこれらの組み合わされた一価の基を表わし、それらは
ハロゲン原子、アミン基、ヒドロキシ基、アルコキシ基
、アリーロキシ基、(メタ)アクリロキシ基、チオール
基などの官能基を有していてもよい。なお、シリコーン
ゴム中には必要に応じ、シリカ、炭酸カルシウム、酸化
チタンなどの無機物の微粉末、前記のシランカップリン
グ剤、チタネート系カップリング剤やアルミニウム系カ
ップリング剤等の接着助剤や光重合開始剤を添加しても
よい。+5i-0+- Here, R represents an alkyl group, an aryl group, an alkenyl group, or a combination of these monovalent groups, and these include a halogen atom, an amine group, a hydroxy group, an alkoxy group, an aryloxy group, a (meth) It may have a functional group such as an acryloxy group or a thiol group. In addition, the silicone rubber may contain fine powders of inorganic substances such as silica, calcium carbonate, and titanium oxide, adhesion aids such as the silane coupling agents, titanate coupling agents, and aluminum coupling agents, and light. A polymerization initiator may also be added.
上記ポリシロキサンを主たる骨格とする高分子重合体(
シリコーンゴム)の原料としては分子量数千ないし数十
万で末端に官能基を有するポリシロキサンが使用され、
これを次に示すような方法で架橋硬化してシリコーンゴ
ム層が得られる。即ち、具体的には両末端にあるいは片
末端のみに水酸基を有する上記ポリシロキサンに次のよ
うな一般式で示されるシラン系架橋剤を混入し、必要に
応じて有機金属化合物、例えば有機スズ化合物、無機酸
、アミン等の触媒を添加して、ポリシロキサンとシラン
系架橋剤とを加熱し、又は常温で縮合硬化せしめる。High molecular weight polymer whose main skeleton is the above-mentioned polysiloxane (
Polysiloxane, which has a molecular weight of several thousand to several hundred thousand and has a functional group at the end, is used as a raw material for silicone rubber.
This is crosslinked and cured in the following manner to obtain a silicone rubber layer. Specifically, a silane crosslinking agent represented by the following general formula is mixed into the polysiloxane having a hydroxyl group at both ends or only at one end, and if necessary, an organometallic compound such as an organotin compound is added. A catalyst such as an inorganic acid or an amine is added, and the polysiloxane and the silane crosslinking agent are heated or condensed and cured at room temperature.
RIISIX4−Fl
ここで、nは1〜3の整数、Rは先に示したRと同様の
置換基であり、Xは一0H1−OR”R’
などの置換基を表わす・。ここで、R2、R3は、先に
説明したRと同じ意味であり、R2、R3はそれぞれ同
じであっても異なっていても良い。また、此はアセチル
基を表わす。RIISIX4-Fl Here, n is an integer of 1 to 3, R is the same substituent as R shown above, and X represents a substituent such as 10H1-OR"R'. Here, R2 , R3 have the same meaning as R described above, and R2 and R3 may be the same or different. Also, this represents an acetyl group.
その他末端に水酸基を有するオルガノポリシロキサン、
ハイドロジエンポリシロキサン架橋剤と必要に応じて上
記のシラン系架橋剤とを縮合硬化せしめる。Other organopolysiloxanes with hydroxyl groups at the ends,
The hydrogen polysiloxane crosslinking agent and, if necessary, the above-mentioned silane crosslinking agent are condensed and cured.
この他テSIH基と−CH=CH−基との付加反応によ
って架橋させた付加型シリコーンゴム層も有用である。In addition, an addition-type silicone rubber layer crosslinked by an addition reaction between a SIH group and a -CH=CH- group is also useful.
付加型シリコーンゴム層は硬化時比較的湿度の影響を受
けにくく、その上高速で架橋させることが出来、一定の
物性を容易に得ることが出来るという利点がある。縮合
型のシリコーンゴム層の場合、感光性樹脂層中にカルボ
ン酸が存在すれば、用いる架橋剤によっては硬化不良が
起るのに対して、付加型ではカルボン酸が存在しても十
分に硬化が起る。このように感光性樹脂層にカルボン酸
を存在させることが8来るので、水又はアルカリ水を主
体とする現像液で現像出来る感光性印刷版を容易に設計
することが可能である。ここで用いる付加型シリコーン
ゴム層は多価ハイドロジエンオルガノポリシロキサンと
、1分子中に2個以上の−CH=CH−結合を有するポ
リシロヰサン化合物との反応によって得られるもので、
望ましくは以下の成分:
(1)1分子中にケイ素原子に直接結合したアルケニル
基(望ましくはビニル基)を少なくとも2個有するオル
ガノポリシロキサン
100重量部
(2)1分子中に少なくともアS i H結合を2個有
するオルガノハイドロジエンポリシロキサン0.1〜1
000重量部
(3)付加触媒 0.00001〜10重量
部からなる組成物を硬化架橋したものである。成分(1
)のアルケニル基は分子鎖末端、中間のいずれにあって
もよく、アルケニル基以外の有機基としては、置換もし
くは非置換のアルキル基、了り−ル基である。成分(1
)は水酸基を微量有することも任意である。成分(2)
は成分+11と反応してシリコーンゴム層を形成するが
、感光性樹脂層に対する接着性の付与の役割も果たす。The addition-type silicone rubber layer has the advantage that it is relatively unaffected by humidity during curing, can be crosslinked at high speed, and can easily obtain certain physical properties. In the case of a condensation type silicone rubber layer, if carboxylic acid is present in the photosensitive resin layer, curing failure may occur depending on the crosslinking agent used, whereas with an addition type silicone rubber layer, curing is sufficient even in the presence of carboxylic acid. happens. Since carboxylic acid is present in the photosensitive resin layer as described above, it is possible to easily design a photosensitive printing plate that can be developed with a developer mainly containing water or alkaline water. The addition-type silicone rubber layer used here is obtained by a reaction between a polyvalent hydrogen organopolysiloxane and a polysilosane compound having two or more -CH=CH- bonds in one molecule.
Desirably the following components: (1) 100 parts by weight of an organopolysiloxane having at least two alkenyl groups (preferably vinyl groups) directly bonded to silicon atoms in one molecule (2) At least a S i H in one molecule Organohydrodiene polysiloxane with 2 bonds 0.1-1
000 parts by weight (3) Addition catalyst A composition consisting of 0.00001 to 10 parts by weight is cured and crosslinked. Ingredients (1
The alkenyl group in ) may be located either at the end or in the middle of the molecular chain, and organic groups other than the alkenyl group include substituted or unsubstituted alkyl groups and aryl groups. Ingredients (1
) may optionally have a trace amount of hydroxyl group. Ingredient (2)
reacts with component +11 to form a silicone rubber layer, but also plays the role of imparting adhesiveness to the photosensitive resin layer.
成分(2)の水素基は分子鎖末端、中間のいずれにあっ
てもよく、水素以外の有機基としては成分(11と同様
のものから選ばれる。成分(1)と成分(2)の有機基
はインキ反発性の向上の点で総じて基数の60%以上が
メチル基であることが好ましい。成分(1)及び成分(
2)の分子構造は直鎖状、環状、分枝状いずれでもよく
、どちらか少なくとも一方の分子量が1 、000を超
えることがゴム物性の面から好ましく、更に成分(1)
の分子量が1 、000を超えることが好ましい。The hydrogen group in component (2) may be located either at the end or in the middle of the molecular chain, and organic groups other than hydrogen are selected from those similar to component (11). From the viewpoint of improving ink repulsion, it is preferable that 60% or more of the groups are methyl groups.Component (1) and component (
The molecular structure of component (2) may be linear, cyclic, or branched, and it is preferred that the molecular weight of at least one of them exceeds 1,000 from the viewpoint of rubber physical properties.
The molecular weight of preferably exceeds 1,000.
成分(11としては、α、ω−ジビニルポリジメチルシ
ロキサン、両末端メチル基の(メチルビニルシロキサン
)(ジメチルシロキサン)共重合体などが例示され、成
分(2)としては、両末端水素基のポリジメチルシロキ
サン、α、ω−ジメチルポリメチルハイドロジエンシロ
キサン、両末端メチル基のくメチルハイドロジエンシロ
キサン) (ジメチルシロキサン)共重合体、環状ポリ
メチルハイドロジエンシロキサンなどが例示される。Examples of component (11) include α,ω-divinylpolydimethylsiloxane, (methylvinylsiloxane)(dimethylsiloxane) copolymer having methyl groups at both ends, and component (2) such as polydivinylpolydimethylsiloxane having methyl groups at both ends. Examples include dimethylsiloxane, α,ω-dimethylpolymethylhydrodienesiloxane, (dimethylsiloxane) copolymer having methyl groups at both ends, and cyclic polymethylhydrodienesiloxane.
成分(3)の付加触媒は、公知のもののなかから任意に
選ばれるが、特に白金系の化合物が望ましく、白金単体
、塩化白金、塩化白金酸、オレフィン配位白金などが例
示される。これらの組成物の硬化速度を制御する目的で
、テトラシクロ(メチルビニル)シロキサンなどのビニ
ル基含有のオルガノポリシロキサン、炭素−炭素三重結
合含有のアルコール、アセトン、メチルエチルケトン、
メタノール、エタノール、プロピレングリコールモノメ
チルエーテルなどの架橋抑制剤を添加することも可能で
ある。The addition catalyst of component (3) is arbitrarily selected from known ones, but platinum-based compounds are particularly preferred, and examples include simple platinum, platinum chloride, chloroplatinic acid, and olefin-coordinated platinum. For the purpose of controlling the curing rate of these compositions, vinyl group-containing organopolysiloxanes such as tetracyclo(methylvinyl)siloxane, carbon-carbon triple bond-containing alcohols, acetone, methyl ethyl ketone,
It is also possible to add crosslinking inhibitors such as methanol, ethanol, propylene glycol monomethyl ether.
これらの組成物は、3成分を混合した時点において付加
反応が起き、硬化が始まるが、硬化速度は反応温度が高
くなるに従い急激に大きくなる特徴を有する。故に組成
物のゴム化までのポットライフを長くし、かつ感光性樹
脂層上での硬化時間を短くする目的で、組成物の硬化条
件は、基板、感光性樹脂層の特性が変らない範囲の温度
条件で、かつ完全に硬化するまで高温に保持しておくこ
とが、感光性樹脂層との接着力の安定性の面で好ましい
。In these compositions, an addition reaction occurs and curing begins when the three components are mixed, but the curing rate is characterized by rapidly increasing as the reaction temperature increases. Therefore, in order to lengthen the pot life of the composition until it turns into a rubber and shorten the curing time on the photosensitive resin layer, the curing conditions for the composition are set within a range that does not change the characteristics of the substrate and the photosensitive resin layer. From the viewpoint of stability of adhesive force with the photosensitive resin layer, it is preferable to maintain the temperature condition at a high temperature until completely cured.
これらの組成物の他に、アルケニルトリアルコキシシラ
ンなどの公知の接着付与剤を添加することや、縮合型シ
リコーンゴム層の組成物である水酸基含有オルガノポリ
シロキサン、加水分解性官能基含有シラン(もしくはシ
ロキサン)を添加することも任意であり、またゴム強度
を向上させる目的で、シリカなどの公知の充てん剤を添
加することも任意である。In addition to these compositions, known adhesion promoters such as alkenyltrialkoxysilanes may be added, or organopolysiloxanes containing hydroxyl groups, silanes containing hydrolyzable functional groups (or It is also optional to add siloxane), and it is also optional to add a known filler such as silica for the purpose of improving the rubber strength.
本発明におけるシリコーンゴム層は印刷インキ反発層と
なるものであり、厚さが小さいとインキ反発性の低下、
傷が入りやすいなどの問題があり、厚さが大きい場合、
現像性が悪くなるという点から、厚みとしては0.5μ
mから5μmが好適である。The silicone rubber layer in the present invention serves as a printing ink repellent layer, and if the thickness is small, the ink repellency decreases,
If there are problems such as easy scratches and the thickness is large,
The thickness should be 0.5 μm because the developability will deteriorate.
m to 5 μm is suitable.
ここに説明した湿し水不要感光性平版印刷版においてシ
リコーンゴム層上に、更に種々のシリコーンゴム層を塗
工することも任意であり、また感光性樹脂層とシリコー
ンゴム層との間の接着力を上げる目的、もしくはシリコ
ーンゴム組成物中の触媒の被毒を防止する目的で、感光
性樹脂層とシリコーンゴム層の間に接着層を設けること
も任意である。シリコーンゴム層の表面保護のために、
シリコーンゴム層上に、透明なフィルム、例えばポリエ
チレン、ポリプロピレン、ポリ塩化ビニル、ポリ塩化ビ
ニリデン、ポリビニルアルコール、ポリエチレンテレフ
タレート、セロファン等をラミネートしたり、ポリマー
のコーティングを施してもよい。In the photosensitive lithographic printing plate that does not require dampening water as described herein, it is optional to further coat various silicone rubber layers on the silicone rubber layer, and the adhesion between the photosensitive resin layer and the silicone rubber layer is also optional. It is also optional to provide an adhesive layer between the photosensitive resin layer and the silicone rubber layer for the purpose of increasing the strength or preventing poisoning of the catalyst in the silicone rubber composition. For surface protection of silicone rubber layer,
On the silicone rubber layer, a transparent film such as polyethylene, polypropylene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polyethylene terephthalate, cellophane, etc. may be laminated or a polymer coating may be applied.
〈現像〉
本発明による湿し水不要感光性平版印刷版は原画を通し
て露光されたのち画像部の感光性樹脂層の一部あるいは
全部を溶解あるいは膨潤しうる現像液、あるいはシリコ
ーンゴム層を膨潤しうる現像液で現像される。この場合
画像部の感光性樹脂層及びその上のシリコーンゴム層が
除去される場合と画像部のシリコーンゴム層のみが除去
される場合がありこれは現像液の強さによって制御する
ことができる。<Development> The photosensitive lithographic printing plate that does not require dampening water according to the present invention is exposed to light through the original image, and is then treated with a developer that can dissolve or swell part or all of the photosensitive resin layer in the image area, or a developer that can swell the silicone rubber layer. Developed with a moist developer. In this case, there are cases in which the photosensitive resin layer in the image area and the silicone rubber layer thereon are removed, and cases in which only the silicone rubber layer in the image area is removed, and this can be controlled by the strength of the developer.
本発明において用いられる現像液としては、湿し水不要
感光性平版印刷版の現像液として公知のものが使用でき
る。例えば、脂肪族炭化水素類(ヘキサン、ヘプタン、
“アイソパーE、H,G″(エッソ化学■製脂肪族炭化
水素類の商品名)あるいはガソリン、灯油など)、芳香
族炭化水素類(トルエン、キシレンなど)、あるいはハ
ロゲン化炭化水素(トリクレンなど)に下記の極性溶媒
を添加したものや極性溶媒そのものが使用できる。As the developer used in the present invention, those known as developers for photosensitive lithographic printing plates that do not require dampening water can be used. For example, aliphatic hydrocarbons (hexane, heptane,
“Isopar E, H, G” (trade name of aliphatic hydrocarbons manufactured by Esso Chemical ■, gasoline, kerosene, etc.), aromatic hydrocarbons (toluene, xylene, etc.), or halogenated hydrocarbons (triclene, etc.) The following polar solvents can be added to the solvent, or the polar solvent itself can be used.
アルコール類(メタノール、エタノール、プロパツール
、ベンジルアルコール、エチレングリコールモノフェニ
ルエーテル、2−メトキシエタノール、2−エトキシエ
タノール、カルピトールモノエチルエーテル、カルピト
ールモノメチルエーテル、トリエチレングリコールモノ
エチルエーテル、プロピレングリコールモノメチルエー
テル、プロピレングリコールモノエチルエーテル、ジプ
ロピレングリコールモノメチルエーテル、ポリエチレン
グリコールモノメチルエーテル、プロピレングリコール
、ポリプロピレングリコール、トリエチレングリコール
、テトラエチレングリコール)
ケトン類(アセトン、メチルエチルケトン)エステル類
(酢酸エチル、乳酸メチル、乳酸エチル、乳酸ブチル、
プロピレングリコールモノメチルエーテルアセテート、
カルピトールアセテート、ジメチルフタレート、ジエチ
ルフタレート)
その他(トリエチルフォスフェート、トリクレジルフォ
スフェート)
また本発明に好適な現像液として上記有機溶剤系現像液
に水を添加したり、上記有機溶剤を界面活性剤等を用い
て水に可溶化したものや、更にその上にアルカリ剤、例
えば炭酸す) IJウム、モノエタノールアミン、ジェ
タノールアミン、トリエタノールアミン、ケイ酸ナトリ
ウム、ケイ酸カリウム、水酸化ナトリウム、水酸化カリ
ウム、ホウ酸す) Uラム等を添加したものや、場合に
よっては単に水道水やアルカリ水を現像液として使用す
ることが出来る。Alcohols (methanol, ethanol, propatool, benzyl alcohol, ethylene glycol monophenyl ether, 2-methoxyethanol, 2-ethoxyethanol, carpitol monoethyl ether, carpitol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl Ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, polyethylene glycol monomethyl ether, propylene glycol, polypropylene glycol, triethylene glycol, tetraethylene glycol) Ketones (acetone, methyl ethyl ketone) Esters (ethyl acetate, methyl lactate, lactic acid) ethyl, butyl lactate,
propylene glycol monomethyl ether acetate,
carpitol acetate, dimethyl phthalate, diethyl phthalate) Others (triethyl phosphate, tricresyl phosphate) In addition, as a developer suitable for the present invention, water may be added to the above organic solvent-based developer, or the above organic solvent may be surface activated. Solubilized in water using an alkali agent, such as carbonic acid), monoethanolamine, jetanolamine, triethanolamine, sodium silicate, potassium silicate, sodium hydroxide. , potassium hydroxide, boric acid), or in some cases, tap water or alkaline water can be used as the developer.
また、クリスタルバイオレット、アストラゾンレッドな
どの染料を現像液に加えて現像と同時に画像部の染色化
を行なうことが出来る。Furthermore, dyes such as crystal violet and astrazone red can be added to the developer to dye the image area simultaneously with development.
現像;ま、例えば上記のような現像液を含む現像用パッ
ドで版画をこすったり、現像液を版面に注いだ後に水中
にて現像ブラシでこするなど、公知の方法で行なうこと
ができる。これにより画像部のシリコーンゴム層と感光
性樹脂層が除がれ、プライマー層の表面が露出し、その
部分がインク受容部となるか、あるいは画像部のシリコ
ーンゴム層のみが除かれ感光層が露出しその部分がイン
ク受容部となる
〈発明の効果〉
本発明によれば、アルミニウム基板とその上に設けたコ
ーティング層との間に強固な密着が゛得られ、有機溶剤
系または水系現像液での強いこすりに耐えられるという
利点が得られる。とくに耐水性にもすぐれることから、
有機溶剤系現像液に比べて安全上有利であり、また自動
現像機の設計上も有利である水系現像液中で強くこすり
こむことができるため、ハイライトの細い点や、細線迄
良く再現できるという利点が得られる。Development: Well-known methods can be used, for example, by rubbing the print with a developing pad containing a developer as described above, or by pouring the developer onto the printing plate and then rubbing it with a developing brush in water. As a result, the silicone rubber layer and photosensitive resin layer in the image area are removed, exposing the surface of the primer layer, which becomes the ink receiving area, or only the silicone rubber layer in the image area is removed and the photosensitive layer is exposed. The exposed portion becomes an ink receiving area (Effects of the Invention) According to the present invention, strong adhesion can be obtained between the aluminum substrate and the coating layer provided thereon, and organic solvent-based or aqueous developers can be used. It has the advantage of being able to withstand strong rubbing. Especially since it has excellent water resistance,
It has safety advantages compared to organic solvent-based developers, and is also advantageous in terms of the design of automatic processing machines.Since it can be rubbed strongly in an aqueous developer, it is possible to reproduce fine highlights and fine lines. This is an advantage.
以下実施例により更に本発明について説明するが、本発
明はこれらの実施例に限定されるものではない。The present invention will be further explained below with reference to Examples, but the present invention is not limited to these Examples.
合成例1
市販のポリエステルポリオール(OD−X−105:ア
ジピン酸/エチレングリコール/ブタンジオールからな
る分子量2,000の縮合物:大日本インキ化学工業(
株)′製)40.06重量部、l。Synthesis Example 1 Commercially available polyester polyol (OD-X-105: condensate with a molecular weight of 2,000 consisting of adipic acid/ethylene glycol/butanediol: Dainippon Ink & Chemicals (
Co., Ltd.) 40.06 parts by weight, l.
4−ブタンジオール6.50重量部、インホロンジイソ
シアネート23.34重量部をジメチルアセトアミド4
6.6重量部に溶解し、90℃で6時間反応させ、60
%溶液のポリウレタン樹脂液(1)を得た。6.50 parts by weight of 4-butanediol, 23.34 parts by weight of inphorone diisocyanate, and 4 parts by weight of dimethylacetamide.
Dissolved in 6.6 parts by weight, reacted at 90°C for 6 hours,
% solution of polyurethane resin liquid (1) was obtained.
合成例2
市販のポリエステルポリオール(OD−X−105:大
日本インキ化学工業(株)製) 40.06重量部、1
,4−ブタンジオール3.25重量部、イソホロンジイ
ソシアネート23.34重量部をジメチルアセトアミド
45.57重量部に溶解し、90℃で6時間反応させた
。その後、さらに鎖延長剤としてイソホロンジアミン1
.71重量部を加えて90℃で2時間反応させ、60%
溶液のポリウレタン樹脂液(n)を得た。Synthesis Example 2 Commercially available polyester polyol (OD-X-105: manufactured by Dainippon Ink and Chemicals Co., Ltd.) 40.06 parts by weight, 1
, 3.25 parts by weight of 4-butanediol and 23.34 parts by weight of isophorone diisocyanate were dissolved in 45.57 parts by weight of dimethylacetamide and reacted at 90°C for 6 hours. After that, isophoronediamine 1 was added as a chain extender.
.. 71 parts by weight was added and reacted at 90°C for 2 hours, resulting in a concentration of 60%
A polyurethane resin solution (n) was obtained.
くアルミニウム基板のイ乍製〉
(基板1)
厚さ0.30 mmのアルミニウム板を、10%水酸化
ナトリウムに70℃で60秒間浸漬して脱脂した後、流
水で水洗後20%HNO3で中和洗浄、水洗した。ひき
つづ5)で20%83P口、水溶液中、電流密度2A/
dm2において陽極酸化皮膜量が1.2g / m′に
なるように5分間陽極酸化処理したく陽極酸化皮膜のポ
アの直径1000A)。このようにして得られた基板を
(基板1)とする。(Substrate 1) An aluminum plate with a thickness of 0.30 mm was degreased by immersing it in 10% sodium hydroxide at 70°C for 60 seconds, then rinsed with running water, and soaked in 20% HNO3. Japanese wash and water wash. 5) 20% 83P, in aqueous solution, current density 2A/
The pore diameter of the anodic oxide film is 1000 A) to be anodized for 5 minutes so that the amount of the anodic oxide film is 1.2 g/m' in dm2. The substrate thus obtained is referred to as (substrate 1).
(基板2〉
(基板1)の作製において、83PO4陽極酸化の代り
に20%)+23O4水溶液中に、電流密度2A/dm
2において厚さが2.7g/m’になるように2分間陽
極酸化を行った。その後1%NaOH水溶液で25℃、
20秒開エツチングを行った。エツチング後の陽極酸化
皮膜量は1.5g/m’であった(陽極酸化皮膜のポア
の直径800人)。このようにして得られた基板を(基
板2)とする。(Substrate 2> In the preparation of (Substrate 1), 20% instead of 83PO4 anodic oxidation)
2, anodic oxidation was performed for 2 minutes so that the thickness became 2.7 g/m'. Then, 25°C with 1% NaOH aqueous solution.
Open etching was performed for 20 seconds. The amount of the anodic oxide film after etching was 1.5 g/m' (the pore diameter of the anodic oxide film was 800 mm). The substrate thus obtained is referred to as (substrate 2).
(基板3)
(基板1)の作製において、1(3P口、陽極酸化の代
りに、1%Na[]H水溶液中、電流密度5A/drn
2において陽極酸化皮膜量が1.2g/m’になるよう
に1分間陽極酸化を行った(陽極酸化皮膜のポアの直径
800人)。このようにして得られた基板を(基板3)
とする。(Substrate 3) In the preparation of (Substrate 1), 1 (3P port, instead of anodic oxidation, a current density of 5A/drn in a 1% Na[]H aqueous solution) was used.
In No. 2, anodic oxidation was performed for 1 minute so that the amount of the anodic oxide film was 1.2 g/m' (the pore diameter of the anodic oxide film was 800 mm). The substrate obtained in this way (substrate 3)
shall be.
(基板4)
(基板1)を更に70℃のケイ酸ソーダ2.5%水溶液
に1分間浸漬し、水洗し乾燥させた。この様にして得ら
れた基板を(基板4)とする。(Substrate 4) (Substrate 1) was further immersed in a 2.5% aqueous solution of sodium silicate at 70° C. for 1 minute, washed with water, and dried. The substrate thus obtained is referred to as (substrate 4).
(比較基板1)
(基板1)の作製において、83PO,陽極酸化の代り
に、20%H2諏。水溶液中、電流密度2A/dm2に
おいて陽極酸化皮膜量が2.7 g / m”になるよ
うに2分間陽極酸化した(陽極酸化皮膜のポアの直径1
50A>。この様にして得られた基板を(比較基板1)
とする。(Comparative Substrate 1) In the preparation of (Substrate 1), 20% H2 sulfur was used instead of 83PO and anodic oxidation. Anodizing was carried out in an aqueous solution for 2 minutes at a current density of 2 A/dm2 so that the amount of the anodic oxide film was 2.7 g/m'' (the pore diameter of the anodic oxide film was 1
50A>. The board obtained in this way (comparison board 1)
shall be.
(比較基板2)
(基板1)の作製において、陽極酸化処理を行なわなか
った。この様にして得られた基板を(比較基板2)とす
る。(Comparative Substrate 2) In the production of (Substrate 1), anodization treatment was not performed. The substrate thus obtained is referred to as (comparative substrate 2).
〈湿し水不要感光住平版印刷版の作製および評価〉(実
施例1)
(基板1)上に下記組成よりなるブライマー液を塗布し
、100℃で2分間乾燥させ、乾燥重量4 g / m
’のプライマー層を得た。<Preparation and evaluation of a photosensitive lithographic printing plate that does not require dampening water> (Example 1) A brimer solution having the following composition was applied onto (Substrate 1) and dried at 100°C for 2 minutes to give a dry weight of 4 g/m
'A primer layer was obtained.
合成例1のポリウレタン樹脂液 10重量部(1)
(60%N、N−ジメチルホルムアミド溶液)
TlO20,12重量部
メチルエチルケトン 30重量部プロピ
レングリコールモノメチル 21rl+1エーテル
フッ素系界面活性剤 0.01重量部この
プライマー層上に、下記の光重合性感光物よりなる感光
液を乾燥重量で3g/m″となるように塗布し、100
℃、1分間乾燥させた。Polyurethane resin liquid of Synthesis Example 1 10 parts by weight (1)
(60% N,N-dimethylformamide solution) 20.12 parts by weight of TlO 30 parts by weight of methyl ethyl ketone 30 parts by weight of propylene glycol monomethyl 21 rl+1 ether fluorine surfactant 0.01 part by weight On this primer layer, the following photopolymerizable photosensitive material was applied. Apply the photosensitive liquid to a dry weight of 3 g/m'',
℃ for 1 minute.
合成例2のポリウレタン樹脂液 2.5重量部(H)
(60%N、N−ジメチル
ホルムアミド溶液)
キシレンジアミ2エ
ジルメタクリレート4モル付加物
ポリエチレングリコール 0.4重量部(分子
量400)ジアクリレート
エチルミヒラーズケトン 0,2重量部ジメチ
ルチオキサントン 0.1重量部ビクトリアビ
ニアブルー 0. 005重量部BOHのナフタ
レンスルホン酸塩
フッ素系界面活性剤 0.01重量部メチ
ルエチルケトン 10重量部プロピレング
リコールモノ 1o 重Isメチルエーテル
次に、上記の感光層上に、下記のシリコーンゴム組成液
を乾燥重量で2. 0 g /.m’になるよう塗布し
、140℃、2分間乾燥させシリコーンゴム層を得た。Polyurethane resin liquid of Synthesis Example 2 2.5 parts by weight (H)
(60% N,N-dimethylformamide solution) 4 mole adduct of xylene diamide 2 ethyl methacrylate Polyethylene glycol 0.4 parts by weight (molecular weight 400) Diacrylate Ethyl Michler's ketone 0.2 parts by weight Dimethylthioxanthone 0.1 part by weight Victoria Near Blue 0. 005 parts by weight BOH naphthalene sulfonate fluorine surfactant 0.01 parts by weight Methyl ethyl ketone 10 parts by weight Propylene glycol mono 1o heavy Is methyl ether Next, on the above photosensitive layer, the following silicone rubber composition liquid was applied by dry weight. So 2. 0 g/. m' and dried at 140°C for 2 minutes to obtain a silicone rubber layer.
α,ω−ジビニルポリジメチル 9シロキサン(重
合度約700)
CH. C11. C)13CH3CH3−
3i−0 + SiO +−1T−fSiO ←TSi
−CH。α,ω-Divinylpolydimethyl 9 siloxane (degree of polymerization approximately 700) CH. C11. C) 13CH3CH3-
3i-0 + SiO +-1T-fSiO ←TSi
-CH.
CH3C1(3 8 CH3重量部
1重量部
ポリジメチルシロキサン 0.5重量部(重合
度約8, 000)
オレフィン−塩化白金酸触媒溶液 0.2重量部抑制剤
0.15重量部アイソパー
G 140重量部(エッソ化学■
製:石油系溶媒)
上記のようにして得られたシリコーンゴム層の表面に厚
さ9μmの片面マット化二粕延伸ポリプロピレンフィル
ムをマット化されていない面がシリコーンゴム層に接す
るようにラミネートし、水なしPS版を得た。CH3C1 (3 8 parts by weight CH3 1 part by weight Polydimethylsiloxane 0.5 parts by weight (degree of polymerization approximately 8,000) Olefin-chloroplatinic acid catalyst solution 0.2 parts by weight Inhibitor 0.15 parts by weight Isopar G 140 parts by weight (Esso Chemistry■
(manufactured by petroleum solvent) A 9 μm thick single-sided matted two-reel stretched polypropylene film was laminated on the surface of the silicone rubber layer obtained as described above so that the unmatted surface was in contact with the silicone rubber layer, A PS version without water was obtained.
このPS版に200線/インチの網点ポジフィルムを重
ね、市販の真空焼枠を用いて画像露光した後、ラミネー
トフィルムを剥離し、トリプロピレングリコールの40
℃の液に1分間浸漬させた。A 200 lines/inch dot positive film was layered on this PS plate, and after image exposure using a commercially available vacuum printing frame, the laminated film was peeled off and
It was immersed in a solution at ℃ for 1 minute.
その後水中で現像パッドによりこすって、湿し水不要平
版印刷版(A>を得た。結果を表1に示す。Thereafter, it was rubbed with a developing pad in water to obtain a lithographic printing plate (A> that does not require dampening water). The results are shown in Table 1.
(実施例2)
実施例1.において(基板1)の代わりに(基板2)を
用い、全く同様にして湿し水不要平版印刷版(B)を得
た。結果を表1に示す。(Example 2) Example 1. A lithographic printing plate (B) requiring no dampening water was obtained in exactly the same manner using (Substrate 2) instead of (Substrate 1). The results are shown in Table 1.
(実施例3)
実施例1.において(基板1)の代わりに(基板3)を
用い、全く同様にして湿し水不要平版印刷版(C)を得
た。結果を表1に示す。(Example 3) Example 1. A lithographic printing plate (C) without dampening water was obtained in exactly the same manner using (Substrate 3) instead of (Substrate 1). The results are shown in Table 1.
(実施例4)
実施例1.において(基板1)の代わりに(基板4)を
用い、全く同様にして湿し水不要平版印刷版(D)を得
た。結果を表1に示す。(Example 4) Example 1. A lithographic printing plate (D) requiring no dampening water was obtained in exactly the same manner using (Substrate 4) instead of (Substrate 1). The results are shown in Table 1.
(実施例5)
(基板1)上に、下言己の光重合性感光物よりなる感光
液を乾燥重量で3 g / m’となるように塗布し、
100℃、1分間乾燥させた。(Example 5) On (substrate 1), a photosensitive liquid made of a photopolymerizable photosensitive material was applied to a dry weight of 3 g/m',
It was dried at 100°C for 1 minute.
合成例2のポリウレタン樹脂液 2.5重量部(n)
(60%N,Nージメチル
ホルムアミド溶液)
キシレンジアミ2エ
ジルメタクリレート4モル付加物
ポリエチレングリコール 0.4重量部(分子
量400)ジアクリレート
エチルミヒラーズケトン 0.2重量部ジメチ
ルチオキサントン 0.1重量部ビクトリアビ
ニアブルー 0. 005重1部BO)lのナフ
タレンスルホン酸塩
フッ素系界面活性剤 0.01重量部メチ
ルエチルケトン 10重量部プロピレング
リコールモノ 10 重1部メチルエーテル
次に、上記の感光層上に、下記のシリコーンゴム組成液
を乾燥重量で2.0g/m’になるよう塗布し、140
℃、2分間乾燥させシリコーンゴム層を得た。Polyurethane resin liquid of Synthesis Example 2 2.5 parts by weight (n)
(60% N,N-dimethylformamide solution) 4 mole adduct of xylene diamide 2 ethyl methacrylate Polyethylene glycol 0.4 parts by weight (molecular weight 400) Diacrylate Ethyl Michler's ketone 0.2 parts by weight Dimethylthioxanthone 0.1 part by weight Victoria Near Blue 0. 005 weight 1 part BO) 1 naphthalene sulfonate fluorine surfactant 0.01 weight part Methyl ethyl ketone 10 weight parts Propylene glycol mono 10 weight 1 part Methyl ether Next, the following silicone rubber composition was applied on the above photosensitive layer. Apply the liquid to a dry weight of 2.0 g/m',
It was dried for 2 minutes at ℃ to obtain a silicone rubber layer.
α ω−ジビニルポリジメチル 9重量部シロキサ
ン(重合度約700)
CH3CH3CH3Cl13
CH3−3i−0+SiO’)=丁子SiO廿o 5l
−CH3C113CH,HCH3
1重量部
ポリジメチルシロキサン 0.5重量部(重合
度約8.000>
オレフィン−塩化白金酸触媒溶液 0.2重量部抑制剤
0.15重量部アイソパー
0140重量部
(エッソ化学■製:石油系溶媒)
上記のようにして得られたシリコーンゴム層の表面に厚
さ9μmの片面マット化二軸延伸ポリプロピレンフィル
ムをマット化されていない面がシリコーンゴム層に接す
るようにラミネートし、水なしPS版を得た。α ω-Divinylpolydimethyl 9 parts by weight Siloxane (degree of polymerization approximately 700) CH3CH3CH3Cl13 CH3-3i-0+SiO') = Clove SiO - 5l
-CH3C113CH,HCH3 1 part by weight Polydimethylsiloxane 0.5 parts by weight (degree of polymerization approximately 8.000> Olefin-chloroplatinic acid catalyst solution 0.2 parts by weight Inhibitor 0.15 parts by weight Isopar 0140 parts by weight (Esso Chemical ■ (manufactured by petroleum solvent) A biaxially oriented polypropylene film having a thickness of 9 μm on one side and matted on one side was laminated on the surface of the silicone rubber layer obtained as above so that the unmatted surface was in contact with the silicone rubber layer, A PS version without water was obtained.
このPS版に200線/インチの網点ポジフィルムを重
ね、市販の真空焼枠を用いて画像露光した後、ラミネー
トフィルムを剥離し、トリプロピレングリコールの40
℃の液に1分間浸漬させた。A 200 lines/inch dot positive film was layered on this PS plate, and after image exposure using a commercially available vacuum printing frame, the laminated film was peeled off and
It was immersed in a solution at ℃ for 1 minute.
その後水中で現像パッドによりこすって、湿し水不要平
版印刷版(E)を得た。結果−を表1に示す。Thereafter, the plate was rubbed with a developing pad in water to obtain a lithographic printing plate (E) that did not require dampening water. The results are shown in Table 1.
(比較例1)
実施例1において(基板1)の代わりに(比較基板l)
を用い、全く同様にして湿し水不要平版印刷版(F)を
得た。結果を表1に示す。(Comparative example 1) In Example 1, instead of (substrate 1) (comparative substrate 1)
A lithographic printing plate (F) that does not require dampening water was obtained in exactly the same manner. The results are shown in Table 1.
(比較例2)
実施例2において(基板1)の代わりに(比較基板2)
を用い、全く同様にして湿し水不要平版印刷版(G)を
得た。結果を表1に示す。(Comparative example 2) In Example 2, instead of (substrate 1) (comparative substrate 2)
A lithographic printing plate (G) that does not require dampening water was obtained in exactly the same manner. The results are shown in Table 1.
(比較例3)
実施例5において(基板1)の代わりに(比較基板2)
を用い、全く同様にして湿し水不要平版印刷版(H)を
得た。結果を表1に示す。(Comparative example 3) In Example 5, instead of (substrate 1) (comparative substrate 2)
A lithographic printing plate (H) which did not require dampening water was obtained in exactly the same manner. The results are shown in Table 1.
表1)
評価結果
以上の結果より、本発明による密着力向上の効果は明ら
かである。Table 1) Evaluation Results From the above results, it is clear that the present invention is effective in improving adhesion.
Claims (2)
化皮膜を備えたアルミニウム基板の該皮膜上に、感光層
及びシリコーンゴム層をこの順に設けたことを特徴とす
る湿し水不要感光性平版印刷版。(1) A photosensitive lithographic printing plate that does not require dampening water and is characterized in that a photosensitive layer and a silicone rubber layer are provided in this order on an aluminum substrate having an anodized film having pores with a diameter of 200 Å to 2000 Å. .
化皮膜を備えたアルミニウム基板の該皮膜上に、プライ
マー層、感光層及びシリコーンゴム層をこの順に設けた
ことを特徴とする湿し水不要感光性平版印刷版。(2) Photosensitivity without dampening water, characterized in that a primer layer, a photosensitive layer, and a silicone rubber layer are provided in this order on an aluminum substrate having an anodized film having pores with a diameter of 200 Å to 2000 Å. Lithographic printing plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11392490A JPH0411259A (en) | 1990-04-27 | 1990-04-27 | Dampening-waterless photosensitive planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11392490A JPH0411259A (en) | 1990-04-27 | 1990-04-27 | Dampening-waterless photosensitive planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0411259A true JPH0411259A (en) | 1992-01-16 |
Family
ID=14624604
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11392490A Pending JPH0411259A (en) | 1990-04-27 | 1990-04-27 | Dampening-waterless photosensitive planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0411259A (en) |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498428A (en) * | 1972-03-28 | 1974-01-25 | ||
JPS4912903A (en) * | 1972-05-15 | 1974-02-04 | ||
JPS4993101A (en) * | 1972-10-05 | 1974-09-05 | ||
JPS5013890A (en) * | 1973-06-11 | 1975-02-13 | ||
JPS54103102A (en) * | 1978-01-30 | 1979-08-14 | Fuji Photo Film Co Ltd | Photosensitive slat printing block and its preparation |
JPS6299198A (en) * | 1985-10-10 | 1987-05-08 | イ−ストマン コダツク カンパニ− | Anodized aluminum substrate, manufacture thereof and lithographic printing board including said substrate |
JPH01215591A (en) * | 1988-02-24 | 1989-08-29 | Kobe Steel Ltd | Method for roughening lithographic substrate |
JPH0213956A (en) * | 1988-07-01 | 1990-01-18 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH02216152A (en) * | 1989-02-17 | 1990-08-29 | Mitsubishi Kasei Corp | Damping-waterless photosensitive planographic printing plate |
JPH02254449A (en) * | 1989-03-29 | 1990-10-15 | Konica Corp | Planographic printing plate material unnecessitating dampening water |
JPH0359558A (en) * | 1989-07-28 | 1991-03-14 | Konica Corp | Production of damping-waterless photosensitive planographic printing plate |
JPH0359556A (en) * | 1989-07-28 | 1991-03-14 | Konica Corp | Production of damping-waterless photosensitive planographic printing plate |
JPH03146955A (en) * | 1989-11-02 | 1991-06-21 | Konica Corp | Method for developing photosensitive planographic printing plate |
-
1990
- 1990-04-27 JP JP11392490A patent/JPH0411259A/en active Pending
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498428A (en) * | 1972-03-28 | 1974-01-25 | ||
JPS4912903A (en) * | 1972-05-15 | 1974-02-04 | ||
JPS4993101A (en) * | 1972-10-05 | 1974-09-05 | ||
JPS5013890A (en) * | 1973-06-11 | 1975-02-13 | ||
JPS54103102A (en) * | 1978-01-30 | 1979-08-14 | Fuji Photo Film Co Ltd | Photosensitive slat printing block and its preparation |
JPS6299198A (en) * | 1985-10-10 | 1987-05-08 | イ−ストマン コダツク カンパニ− | Anodized aluminum substrate, manufacture thereof and lithographic printing board including said substrate |
JPH01215591A (en) * | 1988-02-24 | 1989-08-29 | Kobe Steel Ltd | Method for roughening lithographic substrate |
JPH0213956A (en) * | 1988-07-01 | 1990-01-18 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH02216152A (en) * | 1989-02-17 | 1990-08-29 | Mitsubishi Kasei Corp | Damping-waterless photosensitive planographic printing plate |
JPH02254449A (en) * | 1989-03-29 | 1990-10-15 | Konica Corp | Planographic printing plate material unnecessitating dampening water |
JPH0359558A (en) * | 1989-07-28 | 1991-03-14 | Konica Corp | Production of damping-waterless photosensitive planographic printing plate |
JPH0359556A (en) * | 1989-07-28 | 1991-03-14 | Konica Corp | Production of damping-waterless photosensitive planographic printing plate |
JPH03146955A (en) * | 1989-11-02 | 1991-06-21 | Konica Corp | Method for developing photosensitive planographic printing plate |
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