JPH04111240A - Optical disk - Google Patents
Optical diskInfo
- Publication number
- JPH04111240A JPH04111240A JP2229920A JP22992090A JPH04111240A JP H04111240 A JPH04111240 A JP H04111240A JP 2229920 A JP2229920 A JP 2229920A JP 22992090 A JP22992090 A JP 22992090A JP H04111240 A JPH04111240 A JP H04111240A
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- organic protective
- layer
- org
- volume shrinkage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 24
- 239000011241 protective layer Substances 0.000 claims abstract description 74
- 239000010410 layer Substances 0.000 claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 229920003023 plastic Polymers 0.000 claims description 2
- 238000000034 method Methods 0.000 description 8
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 101710148027 Ribulose bisphosphate carboxylase/oxygenase activase 1, chloroplastic Proteins 0.000 description 1
- 101710201629 Ribulose bisphosphate carboxylase/oxygenase activase 2, chloroplastic Proteins 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- -1 oxynitrides Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は光学的に情報の記録、再生あるいは消去を行う
のに好適な光ディスクに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical disc suitable for optically recording, reproducing, or erasing information.
［従来の技術］
光ディスクは情報記録層に入射された光の反射強度の変
化を情報として読み取る。このために、光ディスクの歪
み、すなわち、ＴＩＬＴ角の値が大きくなると、読取り
時にフォーカスエラーおよびトラッキングエラーを生じ
てしまう。[Prior Art] An optical disc reads changes in the reflected intensity of light incident on an information recording layer as information. For this reason, when the distortion of the optical disc, that is, the value of the TILT angle becomes large, focus errors and tracking errors occur during reading.
ＴＩＬＴ角は、基板が吸湿するために生じる歪み、基板
上にスパッタにより情報記録層などを形成するときに生
じる歪み等の和である。The TILT angle is the sum of distortions caused by the substrate absorbing moisture, distortions caused when an information recording layer or the like is formed on the substrate by sputtering, and the like.
ＴＩＬＴ角を小さくする方法としては、例えば、基板を
構成する材質の含水率を下げる、スパッタリングの条件
をマイルドにする等が挙げられる。Examples of methods for reducing the TILT angle include lowering the water content of the material constituting the substrate and milder sputtering conditions.
さらにアニーリングを行い、ディスク全体の歪みを緩和
する方法ら検討されている。Furthermore, methods are being considered to reduce the distortion of the entire disk by performing annealing.
し発明が解決しようとする課顕］
しかし、上記従来技術は必ずしも満足いくらのではなく
、これら技術を組み合わせても、読取り時にフォーカス
エラーおよびトラッキングエラーが発生してしまうこと
があった。また長期保存性能を調べるために、高温高湿
下にて強制劣化を行うと、ＴＩＬＴ角が大きくなってし
まう。Problems to be Solved by the Invention] However, the above-mentioned conventional techniques are not necessarily satisfactory, and even when these techniques are combined, focus errors and tracking errors may occur during reading. Furthermore, when forced deterioration is performed under high temperature and high humidity to examine long-term storage performance, the TILT angle becomes large.
本発明の目的は、光ディスクのＴＩＬＴ角の値が小さく
かつ長期保存性能の優れた、安定した読取り性能を有す
る光ディスクを提供することにある。An object of the present invention is to provide an optical disc having a small TILT angle value, excellent long-term storage performance, and stable reading performance.
［課題を解決するための手段］
本発明の要旨は、
透明プラスチック基板上に、情報記録層と有機保護層と
防湿層とが形成された光ディスクにおいて、前記有機保
護層は第１の有機保護層と第２の有機保護層とからなり
、第１の有機保護層は第２の有機保護層より情報記録層
に近接して設けられ、第１の有機保護層の体積収縮率は
第２の有機保護ｑム稿ギ
（−＼−−′
層の体積よりも小さいかまたは等しいことを特徴とする
光ディスクである。[Means for Solving the Problems] The gist of the present invention is to provide an optical disc in which an information recording layer, an organic protective layer, and a moisture-proof layer are formed on a transparent plastic substrate, wherein the organic protective layer is a first organic protective layer. and a second organic protective layer, the first organic protective layer is provided closer to the information recording layer than the second organic protective layer, and the volume shrinkage rate of the first organic protective layer is higher than that of the second organic protective layer. It is an optical disc characterized in that the volume of the protective layer is smaller than or equal to the volume of the layer.
前記第１の有機保護層の体積収縮率は７％以下であり、
かつ、前記第２の有機保護層の体積収縮率は１３％以下
であることか望ましい。The volume shrinkage rate of the first organic protective layer is 7% or less,
Further, it is desirable that the volumetric shrinkage rate of the second organic protective layer is 13% or less.
前記第１の有機保護層の膜厚Ａと前記第２の有機保護層
の膜厚Ｂとは、以下の関係式を漏すことが好ましい。It is preferable that the thickness A of the first organic protective layer and the thickness B of the second organic protective layer satisfy the following relational expression.
本発明でいう体積収縮率とは、以下のようにして求める
。The volumetric shrinkage rate in the present invention is determined as follows.
有機保護層に用いる樹脂の硬化前の比重をＪＩＳ Ｋ
−６８３５で測定し、硬化後の比重をＪＩＳ Ｋ−６
９１１で測定する。硬化前の比重を層、硬化後の比重を
ｍとした時に、体積収縮率は、
である。JIS K specifies the specific gravity of the resin used for the organic protective layer before curing.
-6835, and the specific gravity after curing is JIS K-6
Measure with 911. When the specific gravity before curing is layer and the specific gravity after curing is m, the volumetric shrinkage rate is as follows.
本発明の光ディスクの第１の有機保護層および第２の有
機保護層の体積収縮率は、
第１の有機保護層の体積収縮率≦７％
第２の有機保護層の体積収縮率≦１３％の条件を満たす
ことが望ましい。さらに、第１の有機保護層の体積収縮
率は６％以下がより好ましく、第２の有機保護層の体積
収縮率は１０％以下がより好ましい。The volume shrinkage rates of the first organic protective layer and the second organic protective layer of the optical disc of the present invention are as follows: Volume shrinkage rate of the first organic protective layer≦7% Volume shrinkage rate of the second organic protective layer≦13% It is desirable to meet the following conditions. Furthermore, the volume shrinkage rate of the first organic protective layer is more preferably 6% or less, and the volume shrinkage rate of the second organic protective layer is more preferably 10% or less.
第１の有機保護層として用いられる樹脂としては、ＸＮ
Ｒ−５４６１（長瀬チバ（株）製）、アロニックスＵＶ
−３３３３、アロニックスＵＶ３６０７ （東亜合成化
学工業（株）製） 、Ｌｉｇｈｔ−Ｗｅｌｄｌ ８３
（東洋インキ製造（株）製）等があげられる。The resin used as the first organic protective layer is XN
R-5461 (manufactured by Nagase Chiba Co., Ltd.), Aronix UV
-3333, Aronix UV3607 (manufactured by Toagosei Chemical Industry Co., Ltd.), Light-Weldl 83
(manufactured by Toyo Ink Manufacturing Co., Ltd.).
第２の有機保護層として用いられる樹脂としては、ＸＮ
Ｒ−５４６１（長瀬チバ（株）製）、ダイヤビームＭＨ
−７００５、ダイヤビームＵＲ−４５５２（三菱レイヨ
ン（株）製）、ダイキュアクリア５Ｄ−１７、同５Ｄ−
１０１、同５Ｄ３０１（大日本インキ化学工業（株）製
）等があけられる。The resin used as the second organic protective layer is XN
R-5461 (manufactured by Nagase Chiba Co., Ltd.), Diamond Beam MH
-7005, Diabeam UR-4552 (manufactured by Mitsubishi Rayon Co., Ltd.), Daicure Clear 5D-17, 5D-
101, 5D301 (manufactured by Dainippon Ink & Chemicals Co., Ltd.), etc.
第１の有機保護層の膜厚Ａと第２の有機保護層の膜厚Ｂ
とは、以下の関係にあることが望ましい。Thickness A of the first organic protective layer and thickness B of the second organic protective layer
It is desirable that the relationship be as follows.
上記値が０．３未満あるいは０．８を越えるとＴ Ｉ
Ｌ Ｔ角は強制劣化を行うと大きくなってしま本発明の
光ディスクは、情報記録層が設けられた基板面と反対面
に防湿層を設けている。さらに、防湿層は、基板上の情
報記録層側に設けられた各層の端部にも設けるとよい、
防湿層としては、透明な無機物の酸化物、窒化物、酸窒
化物、弗化物、弗素樹脂等を使用することかできる。防
湿層は、スパッタ法や真空蒸着法等の真空成膜法、スピ
ンコード法、スプレーコート法、浸漬法等で形成するこ
とができる。If the above value is less than 0.3 or exceeds 0.8, T I
The L T angle becomes larger when forced deterioration is performed. The optical disc of the present invention has a moisture-proof layer provided on the surface opposite to the substrate surface on which the information recording layer is provided. Furthermore, the moisture-proof layer may also be provided at the end of each layer provided on the information recording layer side on the substrate.
As the moisture-proof layer, transparent inorganic oxides, nitrides, oxynitrides, fluorides, fluororesins, etc. can be used. The moisture-proof layer can be formed by a vacuum film forming method such as a sputtering method or a vacuum evaporation method, a spin cord method, a spray coating method, a dipping method, or the like.
また、本発明の光ディスクにアニーリングを行い、さら
に、ＴＩＬＴ角を小さくすることもできる。アニーリン
グの方法としては、温湿度一定、温湿度サイクル、温度
サイクル湿度一定、温度−定湿度サイクル等がある。Furthermore, the optical disc of the present invention can be annealed to further reduce the TILT angle. Examples of annealing methods include constant temperature and humidity, temperature and humidity cycles, temperature and humidity constant cycles, and temperature-constant humidity cycles.
［実施例］
以下実施例について説明するが、本発明はこれに限定さ
れることはない。[Example] Examples will be described below, but the present invention is not limited thereto.
第１図は本発明により製造される光ディスクの一実施例
を示す断面図である。FIG. 1 is a sectional view showing an embodiment of an optical disc manufactured according to the present invention.
ポリカーボネートからなる基板１上に、ＳｉＯ、ＳｉＯ
などからなる膜厚０．０７μｍの×
ｙ
誘電体層２、ＴｂＦｅＣｏからなる膜厚０．０８μｎの
情報記録層３、ＳｉＯ、ＳｉＮ、などからなる無機保護
層４が順次積層されている。なお、基板１には図示して
いないが、スパイラル涌が形成されている。On the substrate 1 made of polycarbonate, SiO, SiO
A film with a thickness of 0.07 μm consisting of
y A dielectric layer 2, an information recording layer 3 made of TbFeCo with a thickness of 0.08 μm, and an inorganic protective layer 4 made of SiO, SiN, etc. are laminated in this order. Although not shown in the drawings, the substrate 1 has a spiral spiral formed thereon.
無機保護膜４上には、第１の有機保護層５と第２の有機
保護層６とが積層されている。第１の有機保護層５は構
成する樹脂として、体積収縮率が６％であるＸＮＲ−５
４６１（長瀬チバ（株）製）を使用し、膜厚は１８μｔ
とした。第２の有機保護層６は構成する樹脂として、エ
ポキシアクリレートを主成分とする体積収縮率９．７％
の樹脂（以下、この樹脂をＲＡ−１と略称する。）を使
用し、膜厚は１５μｔとした。第１の有機保護層５およ
び第２の有機保護層６の膜厚の和に対する、第１の有機
保護層５の膜厚比は０．５５である。A first organic protective layer 5 and a second organic protective layer 6 are laminated on the inorganic protective film 4. The first organic protective layer 5 is composed of XNR-5, which has a volume shrinkage rate of 6%.
461 (manufactured by Nagase Chiba Co., Ltd.), the film thickness is 18 μt.
And so. The second organic protective layer 6 is mainly composed of epoxy acrylate and has a volume shrinkage rate of 9.7%.
(hereinafter, this resin will be abbreviated as RA-1), and the film thickness was 15 μt. The ratio of the thickness of the first organic protective layer 5 to the sum of the thicknesses of the first organic protective layer 5 and the second organic protective layer 6 is 0.55.
なお、後述する実施例−７の第２の有機保護層で使用し
たＲＡ−２は、エポキシアクリレートを主成分とする体
積収縮率１３．４％の樹脂である。Note that RA-2 used in the second organic protective layer of Example 7, which will be described later, is a resin having a volume shrinkage rate of 13.4% and containing epoxy acrylate as a main component.
さらに、上記各層が設けられた面と異なる基板１０面お
よび上記各層の端部は、８１０１．２からなる膜厚７０
０Ａの防湿層７が設けられている。Further, the surface of the substrate 10 that is different from the surface on which each of the above layers is provided and the end portions of each of the above layers have a film thickness of 70 mm of 8101.2.
A moisture proof layer 7 of 0A is provided.
上記各層の製造方法について説明する。The manufacturing method of each of the above layers will be explained.
誘電体層２と情報記録層３と無機保護層４とは基板１上
に、順次、スパッタ法により積層した。The dielectric layer 2, the information recording layer 3, and the inorganic protective layer 4 were sequentially laminated on the substrate 1 by sputtering.
第１の有機保護層５および第２の有機保護層６はスピン
コード法により積層した。第１の有機保護層５の塗布条
件は３５００ｒｐｎ ２０ｓｅｃであり、第２の有機保
護層６の塗布条件は３０００ ｒｐｎ２０ ｓｅｃとし
た。The first organic protective layer 5 and the second organic protective layer 6 were laminated by a spin cord method. The coating conditions for the first organic protective layer 5 were 3500 rpn 20 sec, and the coating conditions for the second organic protective layer 6 were 3000 rpn 20 sec.
防湿層７は真空蒸着法により積層した、蒸着源として純
度９９．９９９％以上のＳｉＯを用い、蒸着装置の動作
圧を約１ ｘ １０ ’Ｔｏｒｒとした。膜厚は蒸着時
間を制御することにより設定した。The moisture-proof layer 7 was laminated by vacuum evaporation, using SiO with a purity of 99.999% or more as a evaporation source, and setting the operating pressure of the evaporation apparatus to about 1 x 10' Torr. The film thickness was set by controlling the deposition time.
また、防湿層７をスパッタ法により積層してもよい。タ
ーゲットとして純度９９．９９９％以上の単結晶シリコ
ンを用い、導入ガスとして純度９９．９９９％以上のア
ルゴンガスおよび酸素ガスを用い、スパッタ室内の動作
圧を５１１１■０「「とする、ＳｉＯのＳｉ対０の含有
比は、アルゴンガスおよび酸素ガスの分圧を制御するこ
とによって設定できる。Alternatively, the moisture-proof layer 7 may be laminated by sputtering. Single crystal silicon with a purity of 99.999% or more is used as the target, argon gas and oxygen gas with a purity of 99.999% or more are used as the introduced gases, and the operating pressure in the sputtering chamber is set to 5111cm0. The content ratio of 0 to 0 can be set by controlling the partial pressures of argon gas and oxygen gas.
上述の製造方法により得られた試料を実施例−１とする
。さらに、有機保護層の構成を変えて、実施例−２，３
，４，５，６，７および比較例−１，２，３を作成した
。製造方法は上述した方法に従った０作成した試料をま
とめて第１表に示す。The sample obtained by the above-mentioned manufacturing method is referred to as Example-1. Furthermore, by changing the structure of the organic protective layer, Examples-2 and 3
, 4, 5, 6, 7 and Comparative Examples 1, 2, and 3 were prepared. Table 1 summarizes the samples prepared according to the method described above.
第１表には、第１の有機保護層および第２の有機保護層
に使用した樹脂の名称と体積収縮率が記載されている。Table 1 lists the names and volumetric shrinkage rates of the resins used for the first and second organic protective layers.
また、比較例−２および同一３は一層の有機保護層から
なり、膜厚は３３μｍである。Moreover, Comparative Example 2 and Same 3 consist of a single organic protective layer, and the film thickness is 33 μm.
第１表に示した試料を用いて光ディスクのＴＩＬＴ角を
ＩＳＯ規格ＤＩＳ−１００８９準拠した評価装置を用い
て測定しな。Using the samples shown in Table 1, measure the TILT angle of the optical disc using an evaluation device compliant with ISO standard DIS-10089.
第１表には得られた試料のＴＩＬＴ角の値と、前記試料
を温度８０℃、湿度８５％ＲＨの環境下に２０００時間
放置して強制劣化した後の試料のＴＩＬＴ角の値とを示
した。Table 1 shows the TILT angle values of the obtained samples and the TILT angle values of the samples after forced deterioration by leaving the samples in an environment with a temperature of 80°C and a humidity of 85% RH for 2000 hours. Ta.
結果を第１表に示す。The results are shown in Table 1.
第１表より明らかなように、第１の有機保護層の体積収
納率が第２の有機保護層の体積収縮率よりも小さいかま
たは等しい実施例の光ディスクは比較例の光ディスクに
対して、ＴＩＬＴ角が減少し、強制劣化を行ってもＴＩ
ＬＴ角の変化幅は小さい。また、第１の有機保護層の体
積収縮率か７％以下でかつ第２の有機保護層の体積収縮
率か１３％以下である、実施例−１，２，３，４はＴ１
１丁角の値が小さく好ましく、第１の有機保護層の体積
収縮率か６％以下でかつ第２有機保護層の体積収縮率が
１０％以下である、実施例−１，３は１１１■角の値が
さらに小さくなっている
第２表にあるように実施例−１に対して、二層の有機保
護層の膜厚を変えた試料を作成しな。これら試料の、Ｔ
ＩＬＴ角の値および強制劣化後のＴＩＬＴ角の値を第２
表に示す。As is clear from Table 1, the optical disks of the examples in which the volumetric shrinkage rate of the first organic protective layer is smaller or equal to the volumetric shrinkage rate of the second organic protective layer are TILT Even if the angle decreases and forced deterioration is performed, the TI
The range of change in the LT angle is small. In addition, Examples 1, 2, 3, and 4 are T1 in which the volume shrinkage rate of the first organic protective layer is 7% or less and the volumetric shrinkage rate of the second organic protective layer is 13% or less.
The value of 1 square inch is preferably small, and Examples 1 and 3 have a volume shrinkage of 6% or less of the first organic protective layer and 10% or less of the second organic protective layer. As shown in Table 2, where the angle value is even smaller, samples were prepared in which the thickness of the two organic protective layers was changed from Example-1. Of these samples, T
The value of the ILT angle and the value of the TILT angle after forced deterioration are
Shown in the table.
第２表に明らかなように、第１および第２の有機保護層
の膜厚Ａ＋Ｂに対する第１の有機保護層の膜厚Ａの比が
０．３〜０．８の場合には、ＴＩＬＴ角か大きく減少し
、また、強制劣化を行ってもＴＩＬＴ”角の変動は小さ
い。しかし、上記値が０．３未満あるいは０，８を越え
ると、ＴＩＬＴ角は大きくなり、強制劣化を行うとさら
に大きくなってしまう。As is clear from Table 2, when the ratio of the thickness A of the first organic protective layer to the thickness A+B of the first and second organic protective layers is 0.3 to 0.8, the TILT angle Also, even if forced aging is performed, the variation in the TILT angle is small. However, if the above value is less than 0.3 or exceeds 0.8, the TILT angle will increase, and if forced aging is performed, the TILT angle will increase further. It gets bigger.
基板としてポリカーホネート以外の材質、たとえば、ア
クリル、エポキシ、ポリメチルメタアクリレート、非品
性ポリオレフィンを使用した光ディスクも同様に優れた
効果があった。Optical disks using materials other than polycarbonate as substrates, such as acrylic, epoxy, polymethyl methacrylate, and non-grade polyolefin, also had similar excellent effects.
また、本実施例は片面の光ディスクについて述べている
が、両面貼り合せ型の光ディスクにも適用できる。Further, although this embodiment describes a single-sided optical disc, it can also be applied to a double-sided bonded optical disc.
［発明の効果コ
以上説明したように、本発明の製造方法により製造され
た光ディスクは、ＴＩＬＴ角の値が小さくかつ高温高温
での変化も少ない、安定した読取り性能を有する光ディ
スクを提供できる。[Effects of the Invention] As explained above, the optical disc manufactured by the manufacturing method of the present invention can provide an optical disc having a small TILT angle value, little change at high temperatures, and stable reading performance.
第１図は、本発明の一実施例を示す概略断面図である。
１・・・基板、２・・・誘電体層、３・・・情報記録層
、４・・・無機保護層、５・・・第１有機保護層、６・
・・第２の有機保護層、７・・・防湿層。
第
図FIG. 1 is a schematic sectional view showing one embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Dielectric layer, 3... Information recording layer, 4... Inorganic protective layer, 5... First organic protective layer, 6...
... Second organic protective layer, 7... Moisture-proof layer. Diagram
Claims (1)
層と防湿層とが形成された光ディスクにおいて、 前記有機保護層は第１の有機保護層と第２の有機保護層
とからなり、第１の有機保護層は第２の有機保護層より
情報記録層に近接して設けられ、第１の有機保護層の体
積収縮率は第２の有機保護層の体積収縮率よりも小さい
かまたは等しいことを特徴とする光ディスク。 ２、前記第１の有機保護層の体積収縮率は７％以下であ
り、かつ、前記第２の有機保護層の体積収縮率は１３％
以下であることを特徴とする請求項１記載の光ディスク
。 ３、前記第１の有機保護層の膜厚Ａと前記第２の有機保
護層の膜厚Ｂとは、以下の関係式を満すことを特徴とす
る請求項１および２記載の光ディスク。 ０．３≦Ａ／（Ａ＋Ｂ）≦０．８[Claims] 1. An optical disc in which an information recording layer, an organic protective layer, and a moisture-proof layer are formed on a transparent plastic substrate, wherein the organic protective layer is a first organic protective layer and a second organic protective layer. The first organic protective layer is provided closer to the information recording layer than the second organic protective layer, and the volume shrinkage rate of the first organic protective layer is lower than the volume shrinkage rate of the second organic protective layer. An optical disc characterized in that it is also smaller or equal to. 2. The volume shrinkage rate of the first organic protective layer is 7% or less, and the volume shrinkage rate of the second organic protective layer is 13%.
The optical disc according to claim 1, characterized in that: 3. The optical disc according to claim 1, wherein the thickness A of the first organic protective layer and the thickness B of the second organic protective layer satisfy the following relational expression. 0.3≦A/(A+B)≦0.8
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2229920A JP2933236B2 (en) | 1990-08-31 | 1990-08-31 | optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2229920A JP2933236B2 (en) | 1990-08-31 | 1990-08-31 | optical disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04111240A true JPH04111240A (en) | 1992-04-13 |
| JP2933236B2 JP2933236B2 (en) | 1999-08-09 |
Family
ID=16899812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2229920A Expired - Fee Related JP2933236B2 (en) | 1990-08-31 | 1990-08-31 | optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2933236B2 (en) |
-
1990
- 1990-08-31 JP JP2229920A patent/JP2933236B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2933236B2 (en) | 1999-08-09 |
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