JPH0410968B2 - - Google Patents
Info
- Publication number
- JPH0410968B2 JPH0410968B2 JP7082584A JP7082584A JPH0410968B2 JP H0410968 B2 JPH0410968 B2 JP H0410968B2 JP 7082584 A JP7082584 A JP 7082584A JP 7082584 A JP7082584 A JP 7082584A JP H0410968 B2 JPH0410968 B2 JP H0410968B2
- Authority
- JP
- Japan
- Prior art keywords
- objective lens
- hue
- magnification
- detecting
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007547 defect Effects 0.000 claims description 52
- 235000012431 wafers Nutrition 0.000 claims description 28
- 238000001514 detection method Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000007689 inspection Methods 0.000 description 20
- 230000008569 process Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7082584A JPS60214209A (ja) | 1984-04-11 | 1984-04-11 | ウエハ上のパターン検出方法およびその装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7082584A JPS60214209A (ja) | 1984-04-11 | 1984-04-11 | ウエハ上のパターン検出方法およびその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60214209A JPS60214209A (ja) | 1985-10-26 |
| JPH0410968B2 true JPH0410968B2 (enrdf_load_stackoverflow) | 1992-02-27 |
Family
ID=13442740
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7082584A Granted JPS60214209A (ja) | 1984-04-11 | 1984-04-11 | ウエハ上のパターン検出方法およびその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60214209A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2609638B2 (ja) * | 1987-11-13 | 1997-05-14 | 株式会社日立製作所 | 異物検査装置 |
| JPH02247507A (ja) * | 1989-03-22 | 1990-10-03 | Takaoka Electric Mfg Co Ltd | 位置決め用レンズ |
| JPH04318446A (ja) * | 1991-04-17 | 1992-11-10 | Hitachi Electron Eng Co Ltd | 異物検査方式 |
| US6407404B1 (en) | 1999-03-15 | 2002-06-18 | Denso Corporation | Apparatus for the examining defect of monolithic substrate and method for examining the same |
-
1984
- 1984-04-11 JP JP7082584A patent/JPS60214209A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60214209A (ja) | 1985-10-26 |
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