JPH0410952U - - Google Patents

Info

Publication number
JPH0410952U
JPH0410952U JP5010290U JP5010290U JPH0410952U JP H0410952 U JPH0410952 U JP H0410952U JP 5010290 U JP5010290 U JP 5010290U JP 5010290 U JP5010290 U JP 5010290U JP H0410952 U JPH0410952 U JP H0410952U
Authority
JP
Japan
Prior art keywords
wafer
belt
support base
inclined portion
holding mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5010290U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5010290U priority Critical patent/JPH0410952U/ja
Publication of JPH0410952U publication Critical patent/JPH0410952U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の実施例を示す部分断面図、
第2図は同平面図、第3図はベルトの正面図、第
4図はイオン注入装置の回転盤の平面図、第5図
は同正面図、第6図は従来構成の部分断面図であ
る。 1……盤、3……保持部、4……ウエーハ、6
……支持台、10……ベルト、14……傾斜部。
FIG. 1 is a partial sectional view showing an embodiment of this invention.
Fig. 2 is a plan view of the same, Fig. 3 is a front view of the belt, Fig. 4 is a plan view of the rotary disk of the ion implanter, Fig. 5 is a front view of the same, and Fig. 6 is a partial sectional view of the conventional configuration. be. 1... Board, 3... Holding section, 4... Wafer, 6
... Support stand, 10 ... Belt, 14 ... Inclined part.

Claims (1)

【実用新案登録請求の範囲】 回転する盤に円周方向に沿つてウエーハを保持
する複数の保持部を設けてなるウエーハ保持機構
において、 前記保持部に、ウエーハを表面に載せる支持台
と、前記支持台の外周を添纏するように配置され
てあり、両端に傾斜部が設けてあるベルトと、前
記支持台の表面に対して傾斜している軸を中心と
して回転自在の回転ローラとを具備せしめ、前記
回転ローラに、前記ベルトの傾斜部を巻取自在と
してなる ウエーハ保持機構。
[Claims for Utility Model Registration] A wafer holding mechanism in which a rotating disk is provided with a plurality of holding parts that hold a wafer along the circumferential direction, the holding part having a support base on which the wafer is placed; The belt is disposed so as to wrap around the outer periphery of the support base, and includes a belt provided with an inclined portion at both ends, and a rotary roller rotatable about an axis inclined with respect to the surface of the support base. and a wafer holding mechanism that allows the rotating roller to freely wind up the inclined portion of the belt.
JP5010290U 1990-05-14 1990-05-14 Pending JPH0410952U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5010290U JPH0410952U (en) 1990-05-14 1990-05-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5010290U JPH0410952U (en) 1990-05-14 1990-05-14

Publications (1)

Publication Number Publication Date
JPH0410952U true JPH0410952U (en) 1992-01-29

Family

ID=31568364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5010290U Pending JPH0410952U (en) 1990-05-14 1990-05-14

Country Status (1)

Country Link
JP (1) JPH0410952U (en)

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