JPH04106835A - Exposure light source device - Google Patents

Abstract

PURPOSE:To carry out exposure within a short-period by which a printing pattern with little size unevenness is obtained by conducting exposure with beam scanning by movement of an exposure light source. CONSTITUTION:Linear light sources 20, 21 which are practically longer than one side of a mask pattern are moved reciprocally near photo-resist films 11, 12 to carry out local exposure of the photo-resist films 11, 12 and thus the photo-resist films 11, 12 are exposed by means of beam scanning. That is, pattern printing plates 16, 17 are completely and closely stuck to the photo-resist films 11, 12 of a shadow mask material 10 in vacuum and then the light sources 20, 21 which are put close the printing plates 16, 17 are turned on and moved up and down reciprocally to radiate light to the resist films 11, 12 locally to perform beam scanning. As a result, a light source device for exposure which is able to carry out exposure to form a latent image within a short period and by which size differences of the print of the mask become very small is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION Object of the Invention (Industrial Field of Application) The present invention relates to an exposure light source device used in an exposure process such as manufacturing a shadow mask for a color picture tube.

(Prior technology) A shadow mask for a color picture tube is a color-selecting electrode that selectively excites multiple electron beams onto a screen that has phosphors of three colors that emit red, green, and blue, respectively. A large number of electron beam passage holes are formed in the hole.

Shadow mask holes are generally manufactured using a photoetching method, which involves applying a photoresist solution to both sides of a thin, flat continuous metal plate and drying it to form a resist film of a predetermined thickness. The shadow mask pattern corresponding to the ambidextrous surface of the plate is printed by placing a negative plate in close contact with the plate, and using a light source such as ultraviolet light to print the shadow mask pattern on the resist film. It consists of a step of spraying and dissolving and removing it, a step of subjecting the remaining resist film to high-temperature heat treatment to improve its etching resistance, and a step of spraying an etching solution using the remaining resist film as a mask to form a shadow mask hole.

In the exposure step, as shown in FIG. 7, two opposing mask patterns are printed on the iron plate 40, which has been coated with a resist film in the previous step and wound up into a hoop shape, through a plate 4142. For printing, place the plates in close contact with each other and irradiate light from both sides.For light source 43.44, use an ultra-high pressure mercury lamp (see JP-A-57-148859) or a metal halide lamp (JP-A-62-2471). 85) is used.

(Problems to be Solved by the Invention) The light source device has an aluminum reflector plate 45.4B arranged around the light source 43.44, and the printing plate is installed at a distance of 50c+a or more from the printing plate 44.45. The lamp is 1
A book or two are used to increase the light intensity and make the light distribution uniform, but even if the angle and position of the reflector are adjusted, the printing is still the same in the center and periphery of the plate. It is impossible to obtain light distribution, and the illuminance of the peripheral area is 70-8 compared to the central area.
It is 0%. As a result, in the production of shadow masks for high-definition tubes, dimensional differences occur due to differences in illuminance, and a decline in the quality of mask hole unevenness is unavoidable. In addition, if there is slight unevenness in the adhesion between the plate and the iron plate 40, obliquely incident light may change the dimensions of the printing, causing mask hole unevenness and degrading the quality. Although there is a method of separating the light source device from the object to be exposed in order to reduce the exposure, the light illuminance decreases and long exposure is required, which reduces production efficiency and increases the size of the device.

The present invention solves these inconveniences and provides an exposure light source device that can print a mask with very little dimensional difference and can form a latent image in a short time exposure. An exposure light source device that prints a mask pattern on a deposited photoresist film using an exposure light source includes an exposure light source that is longer than one side of the mask pattern, and a drive that moves the exposure light source back and forth in the direction of the other side of the mask pattern. The exposure light source device is characterized in that the exposure light source device is characterized in that the mask pattern is exposed to the photoresist film by optical scanning.

(Operation) A substantially linear light source that is longer than one side of the mask pattern is moved back and forth close to the photoresist film to apply local exposure to the photoresist film, and the photoresist film is exposed by light scanning. By exposing the entire area to light, exposure printing can achieve less variation in dimensions and a short exposure time.

(Example) Hereinafter, the present invention will be described in detail with reference to the drawings.

FIG. 1 shows the configuration of an embodiment of the present invention, and FIG. 2 is a partially enlarged view thereof. A photoresist film 11 , 12 made of milk casein and dichromate with a thickness of 10 μm is applied to both sides of the band-shaped aluminum killed steel shadow mask material 10 in a coating process, and after drying, it is wound up with a winding frame and exposed to an exposure device 13 . will be installed on the

This exposure device 13 includes a mask material winding mechanism 14 and a feeding mechanism 15. Two shadow mask patterns are printed on plates 1B and 1.
7 and an exposure light source 20.21.

One of the printings is plate 1B with a small hole pattern printed on it, and the other printing is plate 17 with a large hole pattern printed on it,
A black negative pattern 16b, 17b is formed on one side of the glass plate IEla, 17a. For example, the technique disclosed in Japanese Patent Publication No. 5B-13298, in which one side is in close contact with a fixed frame and the other side is in close contact with a movable frame, can be used for the close contact with the shadow mask material. Large and small hole pattern printing is plate 16.17
After completely adhering to the resist film of the shadow mask material 10 using a vacuum, the light source 20.21 placed close to the plate at 30cIIl is turned on, and the upper Yu and lower Yd are illuminated as shown by the arrows in the figure. It moves up and down from position A to positions B and C, and scans with light while locally irradiating the resist films 11 and 12 with light. The exposure time is determined in such a way that the light is turned off when the amount of light received by integrating light meters 18 and 19 attached to the printing plate reaches the set light amount. As a result, pattern images 11a and 12a are printed on the photoresist film 11.12 as latent images in which portions of the plate 16.17 corresponding to the transparent portions 16c117c are exposed to light and are rendered insoluble.

The exposure light sources 20 and 21 are moved up and down by a drive device 22, and the scanning speed can be varied by a changeover switch 23, and the scanning range is controlled by a light source moving support (not shown).
Adjust the limit switch 24 by moving the position of the limit switch 24 provided at the position.

FIG. 3 is a plan view of the exposure light source 20, which is viewed from the printing plate 16 side. A plurality of 2kw mercury lamps 2B are arranged at an angle.

In this case, since the light intensity at both ends of the mercury lamp is weak, it is preferable to set the arrangement so that the effective length of the mercury lamp is 80% of the lamp length. The same applies to the light source 21.

As a modification of the light source 20, as shown in FIG. 4, a plurality of mercury lamps 26 may be arranged in a staggered manner, that is, perpendicular to the vertical movement direction and alternately shifted.

As shown in FIG. 5, in order to make the light distribution of the exposure light source 20 uniform, it is effective to provide a diffuser plate 27 and a honeycomb board 28 in front of the exposure light source. /X Nikum board 28
is a thick board with a large number of adjacent hexagonal light transmission holes, and is a light distribution control board that blocks oblique light from the light source and increases the light intensity in the direction perpendicular to the surface. In addition to making the printing uniform, printing can prevent blurring of latent image formation due to oblique light incident on the printing plate when a gap occurs between the printing plate and the resist film. On the other hand, since the combination of the diffuser plate 27 and the non-nicum board 28 reduces the light intensity of the light source, its transmittance and plate thickness must be selected in consideration of the shadow mask quality and production efficiency.

Additionally, the exposure light source generates considerable heat, which can cause thermal expansion of the printing plate and reduce printing accuracy. Therefore, air cooling fins or a water cooling mechanism may be provided behind the light source to cool the light source, or a heat absorption filter may be provided in front of the light source to prevent heat from being applied to the plate during printing. Table 1 shows exposure time and 2
The pattern printing of a 1-inch rectangular shadow mask shows a comparison between this example, which combines six 2-kw mercury lamps and a honeycomb board, and a conventional device, which uses one 5-kw ultra-high-pressure mercury lamp, with regard to size variations.

Table 1 and FIG. 6 show another embodiment of the present invention, in which the printing has a structure in which two exposure light sources 30 and 31 are arranged at regular intervals in the vertical direction of the plate, and these light sources are masked. Place each on both sides with the material in between.

In the embodiment described above, a series of exposure light sources are provided, and the exposure light sources are moved back and forth from the top to the bottom of the plate during printing.
In this embodiment, both light sources reciprocate about one half of the sides of plate 32 simultaneously. That is, each light source has an upper half and a lower half for exposing the resist film, so that the exposure time can be shortened. Note that the number of light sources is not limited to two, and it goes without saying that it may be more than two.

Furthermore, it is of course possible to scan the light source not only in the vertical direction as in the embodiment described above, but also in the horizontal direction in which the mask material travels, depending on the configuration of the exposure machine.

[Effects of the Invention] As described in the embodiments above, according to the present invention, by performing exposure by light scanning by moving the exposure light source, it is possible to perform printing with less variation in pattern dimensions and to perform exposure for a short time. Therefore, the quality of the shadow mask and the production efficiency can be improved, and since the exposure light source can be placed close to the object to be exposed, the space around the exposure table can be narrowed.

[Brief explanation of the drawing]

FIG. 1 is a perspective view showing one embodiment of the present invention, and FIG. 2 is a perspective view showing one embodiment of the present invention.
3 is a plan view of the light source in FIG. 1; FIG. 4 is a plan view of a modified example of the light source; FIG. 5 is a sectional view of the light source; FIG. 6 is a schematic side view showing another embodiment of the present invention, and FIG. 7 is a schematic diagram illustrating a conventional example. IO... Shadow mask material, 11.12... Photoresist film, 16.17... Printing plate, 20.21... Exposure light source, 22... Drive device agent, patent attorney Nori Ogo Husband figure figure figure

Claims (1)

[Claims] (1) In an exposure light source device that uses an exposure light source to print a mask pattern on a photoresist film deposited on the surface of a mask material, an exposure light source that is longer than one side of the mask pattern, and a an exposure light source device comprising: a drive device that reciprocates in the other side direction; the exposure light source device is configured to expose the photoresist film by light scanning the mask pattern;