JPS6042581B2 - How to make a pattern for a graded type shadow mask - Google Patents

How to make a pattern for a graded type shadow mask

Info

Publication number
JPS6042581B2
JPS6042581B2 JP52115115A JP11511577A JPS6042581B2 JP S6042581 B2 JPS6042581 B2 JP S6042581B2 JP 52115115 A JP52115115 A JP 52115115A JP 11511577 A JP11511577 A JP 11511577A JP S6042581 B2 JPS6042581 B2 JP S6042581B2
Authority
JP
Japan
Prior art keywords
pattern
plate
shadow mask
film
lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52115115A
Other languages
Japanese (ja)
Other versions
JPS5449061A (en
Inventor
門出 奥村
徳雄 生方
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP52115115A priority Critical patent/JPS6042581B2/en
Publication of JPS5449061A publication Critical patent/JPS5449061A/en
Publication of JPS6042581B2 publication Critical patent/JPS6042581B2/en
Expired legal-status Critical Current

Links

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  • Preparing Plates And Mask In Photomechanical Process (AREA)

Description

【発明の詳細な説明】 この発明はクレーゼット型シヤドウマスク用のパターン
製作方法の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a pattern manufacturing method for a crazet type shadow mask.

シヤドウマスク型のカラーテレビ用受像管に用いられる
シヤドウマスクの製造方法は、感光性被膜の形成された
鉄板に網点パターンにて焼付けを行ない、然る後現象な
ど所定の工程を経て透孔を形成しシヤドウマスクを得る
The manufacturing method of the shadow mask used in the shadow mask type picture tube for color television is to print a halftone dot pattern on an iron plate on which a photosensitive coating has been formed, and then to form through holes through a predetermined process such as phenomenon. Obtain the Shadow Mask.

このシヤドウマスクの開孔部はそのマスクの有効面の中
心部分においてはその径が大きく周辺に行くにしたがつ
て連続的に小さくなるいわゆるグレーデツドマスクに形
成すると前記受像管の性能は向上するものである。この
グレーデツド型シヤドウマスクを形成する−wv A倉
tl ″−、 、、ゝ)−91 ツ1、゛ れ゛
10ードを付ける方法としては、1州蝕刻性感光液を塗
布したマスクの素材の金属板への焼付け用パターン自体
にグレードをつける方法と、2寸法の均一なパターンか
ら金属板への焼付け以後の工程でグレードをつける方法
の2つがある。
The performance of the picture tube can be improved by forming the apertures of this shadow mask into a so-called graded mask, in which the diameter is large in the center of the effective surface of the mask and becomes successively smaller toward the periphery. It is. To form this graded type shadow mask, the method for attaching the marks is as follows: There are two methods: one is to grade the pattern itself for printing onto the plate, and the other is to grade the pattern after it is baked onto the metal plate from a two-dimensional uniform pattern.

この内1の方法は従来は次のようにして行なわれている
。すなわちこの場合に用いられる装置は第1図に示すよ
うにランプハウス1内にランプ2と乳白色拡散板3と絞
り4が配設され、このランプハウス1の前面にこれと対
向して透過率が中心部では高く周辺部に行くにしたがつ
て低くなるクロム蒸着フィルタ5を固定して置き、さら
にたとえば第2図に示すような透明な網点群8をもつ円
形ドット乾板6を前記フィルタ5の後方に配設し、これ
にフィルムなどの感光材料7を固定して配置された装置
である。この装置の光源となるランプを点灯して、これ
から放射される光が絞りをとおつてフィルムに照射され
、フィルムにパターンを形成する。
The first method has conventionally been carried out as follows. That is, the device used in this case has a lamp 2, a milky white diffuser plate 3, and an aperture 4 disposed in a lamp house 1, as shown in FIG. A chromium-deposited filter 5, which is high in the center and becomes low toward the periphery, is fixedly placed, and a circular dot dry plate 6 having a transparent halftone dot group 8 as shown in FIG. This is a device that is disposed at the rear, and a photosensitive material 7 such as a film is fixed thereto. A lamp that serves as a light source for this device is turned on, and the light emitted from it passes through an aperture and irradiates the film, forming a pattern on the film.

しかしJながらこの方法によるときは、蒸着フィルター
の透過率の同心円上の差がそのままパターンに中心から
周辺へと変化として出てしまい、シヤドウマスク用とし
ての所望のパターンとして用いるには十分でないという
欠点がある。第3図に示すもの・が従来の蒸着フィルタ
の透過率曲線の一例であつて、標準曲線(図のa)に対
して各軸、たとえばx軸(図のb)とP軸(図のc)と
では同心円上で±1.5%ほどの差があり、パターンと
して焼きつけたとき、4〜5pの寸法差として出てしま
う。これは製品マスクのむらの要因となつて、カラー受
像管の品位すなわちホワイトユニホミテイを下げてしま
う原因となり、好ましくない。そのために次にような装
置がパターン形成に用いられる。すなわち第4図に示す
ような装置を用いる。図に示すようにランプハウス11
内に光源となるランプ12と乳白色の拡散板13と絞り
14とが装着され、その前方にしや光板15が配置され
、さらにその前方に円形ドット乾板16とフィルムなど
の感光材料17とが固定して配置されている装置である
。この装置における前記しや光板15は第5図に示すよ
うな切りぬき孔20を有し、枠18にとりつけられてい
て、この枠が回転装置19によつて回転させられるもの
である。この装置によつてフィルムにパターンを形成す
るには、回転装置を駆動させて枠にとりつけられたしや
光板を回転させ、ランプからの放射光がこのしや光板の
孔をとおることによつて中心部と周辺部とでの光の透過
量が連続的に変えられ、そのためにそのように変化した
光がフィルムに照射されて、フィルムにパターンが焼き
つけられること−になる。この場合は中心からの同心円
上でのグレードの差を小さくすることができても、各軸
ごとにグレード曲線を変えることは出来ず、またフィル
ター方式と同じように一品一つのしや光板が必要であj
つて、その製作がむずかしいなどのためにマスクの品位
およびグレードの任意性に末だ問題があつた。
However, when this method is used, the concentric difference in the transmittance of the vapor-deposited filter appears as a change in the pattern from the center to the periphery, and the disadvantage is that it is not sufficient to be used as a desired pattern for a shadow mask. be. The one shown in Figure 3 is an example of the transmittance curve of a conventional vapor-deposited filter. ), there is a difference of about ±1.5% on the concentric circles, and when printed as a pattern, it appears as a dimensional difference of 4 to 5p. This is undesirable because it causes unevenness in the product mask and lowers the quality of the color picture tube, that is, the white uniformity. For this purpose, the following apparatus is used for pattern formation. That is, a device as shown in FIG. 4 is used. Lamp house 11 as shown in the figure
A lamp 12 serving as a light source, a milky-white diffuser plate 13, and an aperture 14 are installed inside the lamp, and a light plate 15 is placed in front of the lamp 12, and a circular dot dry plate 16 and a photosensitive material 17 such as a film are fixed in front of the lamp 12. This is a device that is located at The shield light plate 15 in this device has a cutout hole 20 as shown in FIG. 5, and is attached to a frame 18, which is rotated by a rotating device 19. To form a pattern on a film using this device, a rotary device is driven to rotate a light plate attached to a frame, and the light emitted from the lamp passes through the holes in the light plate. The amount of light transmitted between the center and the periphery is continuously changed, and the thus changed light is irradiated onto the film, thereby burning a pattern onto the film. In this case, even if it is possible to reduce the difference in grade on concentric circles from the center, it is not possible to change the grade curve for each axis, and as with the filter method, a light plate is required for each product. Dej
However, due to the difficulty of manufacturing, there were problems with the quality and optionality of the grade of the mask.

この発明は前述の欠点を除去するためになされたもので
あつて、開孔を有するしやへい板を光源3と感光材料と
の間を前後に移動できるように配設して、感光材料に所
望のグレードのパターンを形成する方法を提供するもの
である。
This invention was made to eliminate the above-mentioned drawbacks, and a shield plate having an opening is disposed so as to be movable back and forth between the light source 3 and the photosensitive material. The present invention provides a method for forming a pattern of a desired grade.

以下図を参照してこの発明の一実施例について説明する
。感光材料たとえばフィルムにグレーデツド型シ4,ヤ
ドウマスク用のパターンを形成する装置の一例を第6図
に示す。ランプハウス21をランプ台22に固定し、こ
のランプハウス21は光を外部へはしや断する構造にし
て、その中に光源としてのランプ23とコンデンサレン
ズ24と乳白色拡散板25とを備え、絞り26がその前
に配置され、ランプハウス21のさらに前方には動力で
駆動される移動装置30にとりつけられた円形孔をもつ
7しやへい板27が配設される。このしやへい板27の
ランプハウス21とは反対側の前方にその上に網点ポジ
と称する均一なパターンの円形孔を有するパターン板2
8をとりつけたフィルム29が配置される。前記のしや
へい板27は移動装置3ク0を駆動させることによつて
フィルムとランプハウスの間を矢印のように前後に移動
する。このような装置でフィルムにパターンを焼きつけ
るには、ランプハウス内のランプを点火し、ここから放
射される光線がコンデンサレンズ、乳白7色拡散板、絞
りを通り、しやへい板の円形孔を通過して円形光となつ
て、さらにパターン板を通過してフィルムに到達し、フ
ィルムにパターンが焼き付けられる。
An embodiment of the present invention will be described below with reference to the drawings. FIG. 6 shows an example of an apparatus for forming a pattern for a graded type mask 4 or a shaded mask on a photosensitive material such as a film. A lamp house 21 is fixed to a lamp stand 22, and this lamp house 21 has a structure that cuts off light to the outside, and includes a lamp 23 as a light source, a condenser lens 24, and a milky white diffuser plate 25 therein. A diaphragm 26 is arranged in front of it, and further in front of the lamp house 21 a seven-sided shield plate 27 with a circular hole is arranged, which is attached to a moving device 30 driven by power. A pattern plate 2 having a uniform pattern of circular holes called halftone dots on the front side of this thin plate 27 opposite to the lamp house 21
A film 29 to which 8 is attached is placed. The shield plate 27 is moved back and forth between the film and the lamp house in the direction of the arrow by driving the moving device 30. To print a pattern on a film with such a device, a lamp in the lamp house is lit, and the light emitted from it passes through a condenser lens, a milky-white seven-color diffuser, and an aperture, and then passes through a circular hole in a shield plate. The light passes through, becomes circular light, and then passes through a pattern plate to reach the film, where a pattern is printed onto the film.

この際しやへい板を保持する移動装置を駆動させてしや
へい板を例えばAからKNの位置まで移動させながら光
源からの光をフィルムに照射するので、パターン板を通
過する光量は中央部と周辺部とでは固定させていたとき
に比べ連続的に変化させることができてグレードの付い
た所望のパターンが得られる。又、しやへい板の移動を
A″からAの方向にしてもよく、AとA″間をすなわち
ランプハウスとフィルム間を往復するように移動させて
行うこともある。さらにこのようにある距離を移動させ
る時間を変えることによつて、第7図に示すようにそれ
ぞれ異なつたグレードのパターンを得ることができる。
すなわち図中1のようなグレードを付けることもできる
し、図中2のようなグレードも付けることができる。上
述したようにしやへい板をどのように移動させるかによ
つて光量を任意にかえることができるので、種々のシヤ
ドウマスクとして要求される所望のグレードの付けらら
れたパターンをしやへい板を適切に移動させることによ
つて容易に得られるこになる。
At this time, the moving device that holds the shield plate is driven and the film is irradiated with light from the light source while moving the shield plate, for example, from position A to KN, so the amount of light passing through the pattern plate is limited to the central part. Compared to when they are fixed, they can be changed continuously, and a desired graded pattern can be obtained. Further, the shield plate may be moved in the direction from A'' to A, or may be moved back and forth between A and A'', that is, between the lamp house and the film. Furthermore, by changing the time for moving a certain distance in this manner, patterns of different grades can be obtained as shown in FIG.
That is, a grade such as 1 in the figure can be given, or a grade such as 2 in the figure can also be given. As mentioned above, the amount of light can be changed arbitrarily by changing the way the shielding plate is moved, so the shielding plate can be suitably patterned with the desired grade required for various shadow masks. This can be easily obtained by moving it to

たとえば中央部分と周辺部分とでは0〜50pまでの差
をつけることができる。このようにしてこの発明の方法
によると、シヤドウマスク用パターンとしてきわめて有
用なものが容易に得られるものである。次に一実施例を
述べる。
For example, a difference of 0 to 50p can be made between the central part and the peripheral part. In this way, according to the method of the present invention, a pattern that is extremely useful as a shadow mask pattern can be easily obtained. Next, an example will be described.

光源ランプとしては500W白色ランプを用い、乳白色
拡散板の厚さは27r1f!lとし、絞りは半径25顛
で、しやへい板の開孔部の半径は25wnとする。網点
ポジドットの寸法は100μのものを用い、しやへい板
の移動量を1.3rr1としてパターン撮影を行なつた
。第2図に示したような均一な網点群をもつパターン板
に当る円形光の大きさは円の半径が357rrmから3
50wsLまでの範囲に変えることができ、このときパ
ターン板とフィルムとの距離を2T!r!nおくことに
よつて有効径600mmまでのパターンをフィルムに焼
きつけることができた。このときのパターンは中央で1
30μ、周辺で100μの寸法となり、したがつて約3
0Pのグレードを得ることができた。前記したもののほ
かこの発明の要旨に従い、変形構造のものが得られるこ
と勿論である。
A 500W white lamp is used as the light source lamp, and the thickness of the milky white diffuser plate is 27r1f! 1, the aperture has a radius of 25 mm, and the radius of the opening in the shield plate is 25 wn. The pattern was photographed using halftone positive dots having a size of 100 μm and the displacement of the shield plate being 1.3rr1. The size of the circular light hitting a pattern plate with a uniform halftone dot group as shown in Figure 2 is as follows: The radius of the circle is 357 rrm.
It can be changed to a range up to 50wsL, and at this time the distance between the pattern board and the film is 2T! r! By setting the temperature at n, it was possible to print a pattern with an effective diameter of up to 600 mm on the film. The pattern at this time is 1 in the center.
30μ, with dimensions of 100μ at the periphery, thus approx.
I was able to get a grade of 0P. It goes without saying that in addition to the above-mentioned structure, other structures having modified structures can be obtained according to the gist of the present invention.

さらにこの発明のしやへい板の切り抜き形状を変えるこ
とによつて、従来の蒸着フィルタを用いて行なつていた
方法では制御不可能であつたドットサイズのグレーデイ
ング曲線を各軸ごとに、例えば第8図に示すように、X
軸、Y軸、P軸、Q軸ごとに制御することができるとい
うすぐれた効果を示すことができる。
Furthermore, by changing the cut-out shape of the shield plate of this invention, the dot size grading curve, which could not be controlled using conventional methods using vapor-deposited filters, can be adjusted for each axis, for example. As shown in Figure 8,
It is possible to exhibit excellent effects in that each axis, Y axis, P axis, and Q axis can be controlled individually.

すなわち第8図の曲線1はX軸の、曲線2はY軸の、曲
線3はP軸、Q軸のグレーデ゛インク曲線であつて、パ
ターンのグレードの任意性にも十分対応できるものであ
る。このようにこの発明の方法によれば、中央部から周
辺部へ行くにしたがつて連続的に所望通り小さくされた
パターンを誤差なく、きわめて容易に形成することがで
き、かつ各軸ごとにでも所望通り異なつたグレード曲線
のパターンを得ることができる。しやがつてこの発明に
よるパターンにより形成されたシヤドウマスクを用いた
製品の品位は格段に向上し、実用上の利益の大きいもの
である。
In other words, curve 1 in FIG. 8 is a grade ink curve for the X axis, curve 2 for the Y axis, and curve 3 for the P and Q axes, which can sufficiently accommodate the arbitrariness of the grade of the pattern. . As described above, according to the method of the present invention, it is possible to form a pattern that is successively smaller as desired from the center to the periphery without any error, and even for each axis. Different grade curve patterns can be obtained as desired. As a result, the quality of products using the shadow mask formed by the pattern according to the present invention is significantly improved, and there are great practical benefits.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のグレーデツド型シヤドウマスク用パター
ンの製造装置の側面図、第2図は網点ポジを示すドット
乾板のaは正面図、bは側面図、第3図は従来の装置に
おける蒸着フィルタの透過率曲線を示す図、第4図は従
来のグレーデツド型シヤドウマスク用パターンの他の製
造装置の側面図、第5図は第4図の装置に用いられるし
や光板の正面図、第6図はこの発明の装置の一実施例を
示す斜視図、第7図はこの発明によつて得られたグレー
デツド型パターンの1例を示す図、第8図はこの発明に
よるサイズグレーデングの各軸ごとに異なるパターンを
示す図である。 21・・・・・・ランプハウス、23・・・・・・ラン
プ、24・・コンデンサレンズ、25・・・・・拡散板
、26・・・・・絞り、27・・・・・化やへい板、2
8・・・・・・パターン板、29・・・・フィルム、3
0・・・・・・移動装置。
Fig. 1 is a side view of a conventional graded type shadow mask pattern manufacturing device, Fig. 2 is a front view of a dot dry plate showing halftone positives, b is a side view, and Fig. 3 is a vapor deposition filter in the conventional device. FIG. 4 is a side view of another conventional graded shadow mask pattern manufacturing device, FIG. 5 is a front view of a shadow light plate used in the device shown in FIG. 4, and FIG. 6 is a diagram showing the transmittance curve of FIG. 7 is a perspective view showing an embodiment of the apparatus of this invention, FIG. 7 is a view showing an example of a graded pattern obtained by this invention, and FIG. 8 is a diagram showing each axis of size grading according to this invention. FIG. 3 is a diagram showing different patterns in FIG. 21... Lamp house, 23... Lamp, 24... Condenser lens, 25... Diffusion plate, 26... Aperture, 27... Conversion Hei board, 2
8... Pattern board, 29... Film, 3
0...Moving device.

Claims (1)

【特許請求の範囲】[Claims] 1 グレーデツド型シヤドウマスク用のパターンを製作
するにあたり、光源とそれに対向して配設された感光材
料との間に開孔部の設けられたしやへい板を配置し、前
記光源と感光材料との間において前記しやへい板を移動
させながらその開孔部をとおり感光材料に到達する露光
量を制御して所定のグレードのパターンを得ることを特
徴とするグレーデツド型シヤドウマスク用パターンの製
造方法。
1. When producing a pattern for a graded type shadow mask, a shield plate with an opening is placed between a light source and a photosensitive material placed opposite to it, and a shield plate with an opening is placed between the light source and the photosensitive material. A method for producing a pattern for a graded shadow mask, characterized in that a pattern of a predetermined grade is obtained by controlling the amount of exposure that passes through the opening and reaches the photosensitive material while moving the shadow plate between the two.
JP52115115A 1977-09-27 1977-09-27 How to make a pattern for a graded type shadow mask Expired JPS6042581B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52115115A JPS6042581B2 (en) 1977-09-27 1977-09-27 How to make a pattern for a graded type shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52115115A JPS6042581B2 (en) 1977-09-27 1977-09-27 How to make a pattern for a graded type shadow mask

Publications (2)

Publication Number Publication Date
JPS5449061A JPS5449061A (en) 1979-04-18
JPS6042581B2 true JPS6042581B2 (en) 1985-09-24

Family

ID=14654604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52115115A Expired JPS6042581B2 (en) 1977-09-27 1977-09-27 How to make a pattern for a graded type shadow mask

Country Status (1)

Country Link
JP (1) JPS6042581B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS633306A (en) * 1986-06-23 1988-01-08 Mitsubishi Electric Corp Numerical controller

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60163333A (en) * 1984-02-02 1985-08-26 Toppan Printing Co Ltd Manufacture of pattern for graded type shadow mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS633306A (en) * 1986-06-23 1988-01-08 Mitsubishi Electric Corp Numerical controller

Also Published As

Publication number Publication date
JPS5449061A (en) 1979-04-18

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