JPH0410335U - - Google Patents
Info
- Publication number
- JPH0410335U JPH0410335U JP5205290U JP5205290U JPH0410335U JP H0410335 U JPH0410335 U JP H0410335U JP 5205290 U JP5205290 U JP 5205290U JP 5205290 U JP5205290 U JP 5205290U JP H0410335 U JPH0410335 U JP H0410335U
- Authority
- JP
- Japan
- Prior art keywords
- lower electrode
- chamber
- exhaust
- exhaust port
- dispersion plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000006185 dispersion Substances 0.000 claims description 5
- 239000012495 reaction gas Substances 0.000 claims description 2
Landscapes
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990052052U JPH087627Y2 (ja) | 1990-05-18 | 1990-05-18 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990052052U JPH087627Y2 (ja) | 1990-05-18 | 1990-05-18 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0410335U true JPH0410335U (ru) | 1992-01-29 |
| JPH087627Y2 JPH087627Y2 (ja) | 1996-03-04 |
Family
ID=31572030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990052052U Expired - Lifetime JPH087627Y2 (ja) | 1990-05-18 | 1990-05-18 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH087627Y2 (ru) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59144132A (ja) * | 1983-02-07 | 1984-08-18 | Hitachi Ltd | 反応装置 |
| JPS6129126A (ja) * | 1984-07-20 | 1986-02-10 | Hitachi Ltd | プラズマ処理方法 |
| JPS6350127U (ru) * | 1986-09-19 | 1988-04-05 | ||
| JPS6393114A (ja) * | 1986-10-08 | 1988-04-23 | Tokuda Seisakusho Ltd | ドライエツチング装置 |
| JPS63141318A (ja) * | 1986-12-04 | 1988-06-13 | Oki Electric Ind Co Ltd | 試料処理用ガス排気装置 |
| JPS63194335A (ja) * | 1987-02-09 | 1988-08-11 | Tokuda Seisakusho Ltd | プラズマ処理方法 |
| JPS63227021A (ja) * | 1987-03-17 | 1988-09-21 | Toshiba Corp | ドライエツチング装置 |
| JPH01189126A (ja) * | 1988-01-25 | 1989-07-28 | Tokyo Electron Ltd | エッチング装置 |
| JPH01258428A (ja) * | 1988-04-08 | 1989-10-16 | Nec Corp | 半導体製造装置 |
| JPH01283391A (ja) * | 1988-05-09 | 1989-11-14 | Tokyo Electron Ltd | エッチング装置 |
-
1990
- 1990-05-18 JP JP1990052052U patent/JPH087627Y2/ja not_active Expired - Lifetime
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59144132A (ja) * | 1983-02-07 | 1984-08-18 | Hitachi Ltd | 反応装置 |
| JPS6129126A (ja) * | 1984-07-20 | 1986-02-10 | Hitachi Ltd | プラズマ処理方法 |
| JPS6350127U (ru) * | 1986-09-19 | 1988-04-05 | ||
| JPS6393114A (ja) * | 1986-10-08 | 1988-04-23 | Tokuda Seisakusho Ltd | ドライエツチング装置 |
| JPS63141318A (ja) * | 1986-12-04 | 1988-06-13 | Oki Electric Ind Co Ltd | 試料処理用ガス排気装置 |
| JPS63194335A (ja) * | 1987-02-09 | 1988-08-11 | Tokuda Seisakusho Ltd | プラズマ処理方法 |
| JPS63227021A (ja) * | 1987-03-17 | 1988-09-21 | Toshiba Corp | ドライエツチング装置 |
| JPH01189126A (ja) * | 1988-01-25 | 1989-07-28 | Tokyo Electron Ltd | エッチング装置 |
| JPH01258428A (ja) * | 1988-04-08 | 1989-10-16 | Nec Corp | 半導体製造装置 |
| JPH01283391A (ja) * | 1988-05-09 | 1989-11-14 | Tokyo Electron Ltd | エッチング装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH087627Y2 (ja) | 1996-03-04 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |