JPH0383870A - Electric bonding of metal si-containing silicon carbide ceramic - Google Patents

Electric bonding of metal si-containing silicon carbide ceramic

Info

Publication number
JPH0383870A
JPH0383870A JP21953689A JP21953689A JPH0383870A JP H0383870 A JPH0383870 A JP H0383870A JP 21953689 A JP21953689 A JP 21953689A JP 21953689 A JP21953689 A JP 21953689A JP H0383870 A JPH0383870 A JP H0383870A
Authority
JP
Japan
Prior art keywords
metal
members
bonding
silicon carbide
containing silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21953689A
Other languages
Japanese (ja)
Inventor
Koji Okuda
浩司 奥田
Tokuzo Nishi
西 徳三
Hiroshi Takai
高井 博史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daihen Corp
Original Assignee
Daihen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daihen Corp filed Critical Daihen Corp
Priority to JP21953689A priority Critical patent/JPH0383870A/en
Publication of JPH0383870A publication Critical patent/JPH0383870A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To shorten bonding time and to reduce power consumption in bonding the title ceramic members mutually or the member to a metallic member by previously removing metallic Si from the butting surfaces of the ceramic members and making the surfaces porous. CONSTITUTION:In bonding square pillar Si metal-containing silicon carbide ceramic members 1a and 1b, metal Si is removed from the butting surfaces of both the members by a hydrofluoric acid-based etching solution and the surfaces are made porous. Consequently, the surfaces are subjected to a surface treatment so as to form about 1-2mm modification layers 3a and 3b to be made into high resistance. Then the surfaces of both the members to be treated are coated with a pasty electroconductive binder 4 comprising Si, SiC, C and a binder, both the members are butted and fixed by applying given pressure. Then, when an electric current is sent to both the members in an Ar gas atmosphere, since resistivity of the modification layers 3a and 3b is larger than that of other parts, the part is concentrically heated by joule heat to a high temperature and the binder 4 is melted to complete bonding.

Description

【発明の詳細な説明】 (産業上の利用分野〉 本発明は、セラミックス部材同士またはセラミックス部
材と金属部材との接合に際して、これらの部材間の突合
せ部を局部加熱する電気接合方法に関するものである。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to an electrical joining method for locally heating the butt portion between ceramic members or a ceramic member and a metal member when these members are joined together. .

〈従来技術と発明が解決しようとする問題点〉例えば、
セラミックスと金属とを接合する場合、従来は第3図に
示すように、導電性セラミックス部材1aと金属部材2
とを、導電性接合剤4を介在させて突合せ、これらを図
示しない電源装置に接続きれた2つの電極5a、5bが
挾むように、突合せ面方向に加圧しつつ対向配置される
。接合時は、突合せ面に垂直方向の電流を流して、導電
性セラミックス部材1aで発生するジュール熱によって
、接合剤4を溶融させてセラミックスと金属とを接合し
ている。
<Problems to be solved by the prior art and the invention> For example,
When joining ceramics and metal, conventionally, as shown in FIG. 3, a conductive ceramic member 1a and a metal member 2 are connected.
are butted together with a conductive bonding agent 4 interposed therebetween, and these are placed facing each other while being pressed in the direction of the abutting surfaces so that the two electrodes 5a and 5b, which are fully connected to a power supply device (not shown), are sandwiched between them. During bonding, a vertical current is passed through the abutting surfaces, and Joule heat generated in the conductive ceramic member 1a melts the bonding agent 4 to bond the ceramic and metal.

しかし、この場合及び導電性セラミックス同士を上記の
ように接合する場合においても、導電性セラミックス部
材1a(、lb)全体が−様なジュール熱を発生し加熱
されるために、特にセラミックス部材が長尺の場合、電
極5a。5bが突合せ部から離れることになり、突合せ
部のみを集中的に所望の接合温度に効率よく加熱させる
ことができないために、電力消費の点で無駄が多い。
However, in this case and in the case where conductive ceramics are joined together as described above, the entire conductive ceramic member 1a (, lb) generates Joule heat and is heated. In the case of shaku, the electrode 5a. 5b is separated from the abutting portion, and since only the abutting portion cannot be efficiently heated to the desired bonding temperature in a concentrated manner, there is a lot of waste in terms of power consumption.

また、接合温度が高い場合、セラミックス部材の中央部
では当然それ以上にもなり、セラミックスの分解が発生
し始めて、劣化がセラミックス部材全体に及ぶ虞れが生
じる。
Furthermore, if the bonding temperature is high, the temperature at the center of the ceramic member will naturally be higher than that, and the ceramic will begin to decompose, raising the possibility that deterioration will extend to the entire ceramic member.

そこで、電極5a、5bを突合せ部の近傍に配設するこ
とによって、突合せ部を効率よく加熱きせることができ
るが、電極5a、5bへの熱伝導による熱放散のために
、所望の接合温度に加熱するのに多くの電力を必要とす
る。また、接合温度が高い場合は、電極が溶損して、安
定した通電ができなくなる問題が生じる。
Therefore, by arranging the electrodes 5a, 5b near the abutting part, the abutting part can be heated efficiently, but due to heat dissipation by heat conduction to the electrodes 5a, 5b, the desired bonding temperature cannot be achieved. Requires a lot of electricity to heat up. Furthermore, if the bonding temperature is high, the electrodes will be melted and damaged, causing a problem that stable current flow will not be possible.

く問題点を岬決するための手段〉 上記の問題点を解決するために、本発明においては、金
属Si含有炭化ケイ素セラミックス部材間または金属S
1含有炭化ケイ素セラミックス部材と金属部材との間に
導電性接合剤を介在させて突合せ、これらの部材間に電
流を通じることによるジュール熱によって、接合剤を溶
融させて接合する金属Si含有炭化ケイ素セラミックス
の電気接合方法において、セラミックス部材の少な(と
も一方の突合せ面を、予め金属siを除去し多孔質にす
ることによって高抵抗化した改質層を形成するように表
面処理した後に、部材間に電流を通じることによって、
改質層により多く生じるジュール熱により突合せ部をよ
り高温に加熱して、接合剤を溶融させ、改質層の一部ま
たは全部に、溶融した接合剤を充填して接合することを
特徴としている。
Means for Resolving the Problems> In order to solve the above problems, in the present invention, the metal Si-containing silicon carbide ceramic members or the metal Si
1-containing silicon carbide ceramic member and a metal member are butted together with a conductive bonding agent interposed therebetween, and the bonding agent is melted and bonded by Joule heat generated by passing an electric current between these members. In the electrical bonding method for ceramics, after surface treatment is performed to form a modified layer with high resistance by removing metal Si from the abutting surfaces of the ceramic members in advance and making them porous, the bonding between the members is performed. By passing a current through the
It is characterized by heating the butt part to a higher temperature using the Joule heat generated in the modified layer to melt the bonding agent, and then filling part or all of the modified layer with the molten bonding agent and bonding. .

く作 用〉 以上のような方法とすることにより、金属Si含有炭化
ケイ素セラミックス部材の突合せ部近傍の改質層の抵抗
率が他よりも大きくなるので、部材間に電流を通じるこ
とによるジュール熱を上記の突合せ部近傍により多く発
生させることができ、突合せ部がより高温に加熱される
By using the method described above, the resistivity of the modified layer near the butt part of the metallic Si-containing silicon carbide ceramic members becomes larger than that of the other parts, so that the Joule heat caused by passing the current between the members is reduced. can be generated more near the abutting portion, and the abutting portion is heated to a higher temperature.

(実施例〉 第1図(A)、(B)は、それぞれ本発明の第1の実施
例における接合前の表面処理状態及び接合前の突合せ状
態を示す概略断面図であって、角柱状の金属Si含有炭
化ケイ素セラミックス部材同士を接合する場合を示して
いる。まず、接合させる前に、第1図(A)に示すよう
に、金属S1を20%含有するセラミックス部材1m、
1b(10van X 10a+m X 20關)間の
突合せ面を、予めフッ酸系エツチング液により、金属S
iを除去し多孔質にすることによって高抵抗化する改質
層3a、3bを、約1〜21■形成するように表面処理
した後、水洗して乾燥させる。表面処理としては、上記
のフッ酸などの酸処理の他、カセイソーダなどのアルカ
リ処理、真空熱処理方法があり、また改質層の厚みは接
合部材の寸法、形状、接合剤の111゜接合温度などに
より、最適値を選ぶ、必要があるが、51−以下が好ま
しい。
(Example) FIGS. 1(A) and 1(B) are schematic cross-sectional views showing a surface treatment state before joining and a butt state before joining, respectively, in the first example of the present invention, in which a prismatic This shows the case of joining metal Si-containing silicon carbide ceramic members.First, before joining, as shown in FIG. 1(A), 1 m of ceramic members containing 20% metal S1,
1b (10van x 10a+m x 20mm), the abutting surfaces between the metal S
The modified layers 3a and 3b, which have a high resistance by removing i and making them porous, are surface treated to form about 1 to 21 cm, and then washed with water and dried. In addition to the above-mentioned acid treatment such as hydrofluoric acid, surface treatment includes alkali treatment such as caustic soda, and vacuum heat treatment.The thickness of the modified layer depends on factors such as the size and shape of the bonding member, the 111° bonding temperature of the bonding agent, etc. Therefore, it is necessary to select an optimal value, but 51- or less is preferable.

つぎに、第1図(B)に示すように、セラミックス部材
1a、lbの処理面にsi、sic、c。
Next, as shown in FIG. 1(B), si, sic, and c are applied to the treated surfaces of the ceramic members 1a and lb.

バインダーからなるペースト状の導電性接合剤4を塗布
し、これらを突合せて約50kg/cdの圧力Pを加え
て固定した。接合剤としては、Si、Ti。
A paste-like conductive bonding agent 4 made of a binder was applied, and these were butted together and fixed by applying a pressure P of about 50 kg/cd. As the bonding agent, Si and Ti are used.

Zr、Ni、Geなどの活性金属、SiC,ZrCなと
の炭化物、MoSiなどのケイ化物及びカーボンなどを
単独または混合物として使用できる。
Active metals such as Zr, Ni, and Ge, carbides such as SiC and ZrC, silicides such as MoSi, and carbon can be used alone or as a mixture.

その後、接合雰囲気をArガスとし、セラミックス部材
1a、lbの端部にそれぞれ当接した電極5a、5b間
に電圧を印加すると、セラミックス部材1a、lb間に
流れる電流によって、セラミックス部材1a、改質層3
a、接合剤4.改質層3b、セラミックス部材1bにそ
れぞれの抵抗率に応じたジュール熱が発生する。ところ
で、セラミックス部材1a、lbの突合せ部近傍の改質
層3a、3bの抵抗率が他よりも大きいために、この部
分が集中的により高温に加熱され、突合せ部を約145
0℃、10分間保持する間に、溶融した接合剤4が多孔
質化したセラミックス部材の孔の部分に充填され、その
後は室温まで冷却し接合を完了した。接合部を光学顕微
鏡で観察した結果、改質層の孔は接合剤により充填され
ており、良好な接合層が形成されていることがわかった
。また、接合強度は常温曲げ試験で約20kg / w
a 2以上であった。
Thereafter, when the bonding atmosphere is set to Ar gas and a voltage is applied between the electrodes 5a and 5b that are in contact with the ends of the ceramic members 1a and lb, the current flowing between the ceramic members 1a and lb causes the ceramic member 1a to be modified. layer 3
a. Bonding agent 4. Joule heat is generated in the modified layer 3b and the ceramic member 1b according to their respective resistivities. By the way, since the resistivity of the modified layers 3a and 3b near the abutting part of the ceramic members 1a and lb is higher than that of the other parts, this part is intensively heated to a higher temperature, and the abutting part is heated to about 145%.
While the ceramic member was held at 0° C. for 10 minutes, the molten bonding agent 4 was filled into the pores of the porous ceramic member, and then the ceramic member was cooled to room temperature to complete the bonding. As a result of observing the bonded portion with an optical microscope, it was found that the pores in the modified layer were filled with the bonding agent, and a good bonding layer was formed. In addition, the joint strength is approximately 20 kg/w in a room temperature bending test.
a It was 2 or more.

第2図は本発明の第2の実施例における接合前の突合せ
状態を示す概略断面図であって、共に同寸の角柱状の金
属S五含有炭化ケイ素セラミックス部材と金属部材とを
接合する場合を示している。
FIG. 2 is a schematic cross-sectional view showing a butt state before joining in a second embodiment of the present invention, in which a prismatic metal S5-containing silicon carbide ceramic member and a metal member, both of which have the same size, are joined. It shows.

まず、接合させる前に第1図(A)に示すように、金属
Siを20%含有するセラミックス部材1a(10關X
 10mm X 20mm)の突合せ面を、予めフッ酸
系エツチング液により、金属Siを除去した改質層3a
を約1〜2−1形成するように表面処理した後、水洗し
て乾燥させる。
First, before joining, as shown in FIG. 1(A), a ceramic member 1a (10%
10 mm x 20 mm) is coated with a modified layer 3a from which metal Si has been removed using a hydrofluoric acid etching solution.
After the surface is treated to form about 1 to 2-1, it is washed with water and dried.

つぎに、セラミックス部材1aの処理面と金属部材2例
えば鋼との間に、活性金属ろう材の導電性接合剤4を挿
入し、これらを突合せて約50−/C−の圧力Pを加え
て固定した。
Next, a conductive bonding agent 4 of active metal brazing material is inserted between the treated surface of the ceramic member 1a and the metal member 2, for example, steel, and these are butted together and a pressure P of about 50-/C- is applied. Fixed.

その後、接合雰囲気をArガスとし、セラミックス部材
1a及び金属部材2の端部にそれぞれ当接した電極5a
、5b間に電圧を印加すると、セラミックス部材1aと
金属部材2との間に流れる電流によって、セラミックス
部材1a、改質層3a、接合剤4.金属部材2にそれぞ
れの抵抗率に応じたジュール熱が発生する。ところで、
セラミックス部材1aの突合せ部近傍の改質層3aの抵
抗率が他よりも大きいために、この部分がより高温に加
熱され、突合せ部を約1000℃、1o分間保持する間
に、溶融した接合剤4が多孔質化したセラミックス部材
の孔の部分に充填され、その後は室温まで冷却し接合を
完了した。接合部を光学顕微鏡で観察した結果、改質層
の孔は接合剤により充填されており、良好な接合層が形
成きれていることがわかった。また、接合強度は常温曲
げ試験で約10kg/am2以上であった。
Thereafter, the bonding atmosphere is changed to Ar gas, and the electrodes 5a are brought into contact with the ends of the ceramic member 1a and the metal member 2, respectively.
, 5b, the current flowing between the ceramic member 1a and the metal member 2 causes the ceramic member 1a, the modified layer 3a, the bonding agent 4. Joule heat is generated in the metal member 2 according to its resistivity. by the way,
Since the resistivity of the modified layer 3a near the butt part of the ceramic member 1a is higher than that of the other parts, this part is heated to a higher temperature, and while the butt part is held at about 1000°C for 10 minutes, the molten bonding agent melts. 4 was filled into the pores of the porous ceramic member, and then cooled to room temperature to complete the bonding. As a result of observing the bonded portion with an optical microscope, it was found that the pores in the modified layer were filled with the bonding agent, indicating that a good bonding layer had been formed. Furthermore, the bonding strength was approximately 10 kg/am2 or more in a normal temperature bending test.

なお、応力緩和の目的で、上記の導電性接合剤4と金属
部材2との間に、セラミックス部材及び金属部材の熱膨
張率の中間的な値を有する材料、またはCu、Niなど
の軟金属を銀ろうを介して挿入することにより、さらに
強度を高めることができる。
In addition, for the purpose of stress relaxation, a material having a coefficient of thermal expansion intermediate between the ceramic member and the metal member, or a soft metal such as Cu or Ni, is used between the conductive bonding agent 4 and the metal member 2. By inserting it through silver solder, the strength can be further increased.

〈発明の効果〉 以上のように、本発明によれば、接合に際しての突合せ
部をジュール熱により効果的に加熱させたので、特にセ
ラミックス部材が長尺の場合、より短時間接合が可能と
なり、また電力消費に伴うランニングコストの低減が図
られ、さらに特殊な電極材料を考慮しなくてもよく、通
常使用される材料でよいので、コスト面で有利である。
<Effects of the Invention> As described above, according to the present invention, since the abutting portions during joining are effectively heated by Joule heat, joining can be performed in a shorter time, especially when the ceramic members are long. In addition, running costs associated with power consumption can be reduced, and there is no need to consider special electrode materials, and commonly used materials can be used, which is advantageous in terms of cost.

また、接合温度が高い場合、セラミックス部材の劣化が
全体に及ぶことを防止できる。
Furthermore, when the bonding temperature is high, it is possible to prevent the ceramic member from deteriorating as a whole.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(A)、(B)は、それぞれ本発明の第1の実施
例における接合前の表面処理状態及び接合前の突合せ状
態を示す概略断面図である。 12図は、本発明の第2の実施例における接合前の突合
せ状態を示す概略断面図である。 第3図は従来方法における接合前の突合せ状態を示す概
略断面図である。 la、lb・・・金属Si含有炭化ケイ素セラミックス
部材、 2・・・金属部材、 3a。 b・・・改質層、 4・・・導電性接合剤、 5 a。 b・・・電極。 代理°人
FIGS. 1A and 1B are schematic sectional views showing a surface treatment state before joining and a butt state before joining, respectively, in a first embodiment of the present invention. FIG. 12 is a schematic cross-sectional view showing a butted state before joining in the second embodiment of the present invention. FIG. 3 is a schematic cross-sectional view showing a butt state before joining in a conventional method. la, lb...metal Si-containing silicon carbide ceramic member, 2...metal member, 3a. b... Modified layer, 4... Conductive bonding agent, 5 a. b...electrode. agent person

Claims (1)

【特許請求の範囲】[Claims]  金属Si含有炭化ケイ素セラミックス部材間または金
属Si含有炭化ケイ素セラミックス部材と金属部材との
間に導電性接合剤を介在させて突合せ、前記部材間に電
流を通じることによるジュール熱によって、前記接合剤
を溶融させて接合する金属Si含有炭化ケイ素セラミッ
クスの電気接合方法において、前記セラミックス部材の
少なくとも一方の突合せ面を、予め金属Siを除去し多
孔質にすることによって高抵抗化した改質層を形成する
ように表面処理した後に、前記部材間に電流を通じるこ
とによって、前記改質層により多く生じるジュール熱に
より前記突合せ部をより高温に加熱して、前記接合剤を
溶融させ、前記改質層の一部または全部に、溶融した前
記接合剤を充填して接合する金属Si含有炭化ケイ素セ
ラミックスの電気接合方法。
A conductive bonding agent is interposed between metal Si-containing silicon carbide ceramic members or a metal Si-containing silicon carbide ceramic member and a metal member, and the bonding agent is bonded by Joule heat caused by passing an electric current between the members. In an electrical bonding method for metal Si-containing silicon carbide ceramics that is bonded by melting, at least one abutting surface of the ceramic member is made porous by removing metal Si in advance to form a modified layer with high resistance. After the surface treatment as described above, by passing an electric current between the members, the Joule heat generated in the modified layer heats the abutting portion to a higher temperature, melting the bonding agent, and removing the bonding agent from the modified layer. A method for electrically bonding metal Si-containing silicon carbide ceramics, in which a part or all of the metal Si-containing silicon carbide ceramics is filled with the molten bonding agent and bonded.
JP21953689A 1989-08-25 1989-08-25 Electric bonding of metal si-containing silicon carbide ceramic Pending JPH0383870A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21953689A JPH0383870A (en) 1989-08-25 1989-08-25 Electric bonding of metal si-containing silicon carbide ceramic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21953689A JPH0383870A (en) 1989-08-25 1989-08-25 Electric bonding of metal si-containing silicon carbide ceramic

Publications (1)

Publication Number Publication Date
JPH0383870A true JPH0383870A (en) 1991-04-09

Family

ID=16737025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21953689A Pending JPH0383870A (en) 1989-08-25 1989-08-25 Electric bonding of metal si-containing silicon carbide ceramic

Country Status (1)

Country Link
JP (1) JPH0383870A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0664974A (en) * 1992-08-17 1994-03-08 Mitsui Eng & Shipbuild Co Ltd Method for jointing ceramic member
KR100379743B1 (en) * 2000-06-12 2003-04-11 (주)글로벌코센테크 Method for Jointing Porous SiC Body
US7235506B2 (en) 2002-06-18 2007-06-26 Kabushiki Kaisha Toshiba Silicon carbide matrix composite material, process for producing the same and process for producing part of silicon carbide matrix composite material
KR100919271B1 (en) * 2006-09-28 2009-09-30 코바렌트 마테리얼 가부시키가이샤 Method of joining a porous silicon carbide body and a silicon carbide-silicon composite

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0664974A (en) * 1992-08-17 1994-03-08 Mitsui Eng & Shipbuild Co Ltd Method for jointing ceramic member
KR100379743B1 (en) * 2000-06-12 2003-04-11 (주)글로벌코센테크 Method for Jointing Porous SiC Body
US7235506B2 (en) 2002-06-18 2007-06-26 Kabushiki Kaisha Toshiba Silicon carbide matrix composite material, process for producing the same and process for producing part of silicon carbide matrix composite material
US8568650B2 (en) 2002-06-18 2013-10-29 Kabushiki Kaisha Toshiba Silicon carbide matrix composite material, process for producing the same and process for producing part of silicon carbide matrix composite material
KR100919271B1 (en) * 2006-09-28 2009-09-30 코바렌트 마테리얼 가부시키가이샤 Method of joining a porous silicon carbide body and a silicon carbide-silicon composite

Similar Documents

Publication Publication Date Title
JPH0383870A (en) Electric bonding of metal si-containing silicon carbide ceramic
WO1992006054A1 (en) Method of electrically joining objects to be joined including ceramics
JP2773257B2 (en) Electric bonding method between Si-containing silicon carbide ceramics
JP2870822B2 (en) Bonding method between silicon and glass
JPH09172057A (en) Electrostatic chuck
JP2706726B2 (en) Electric joining method of ceramics
JP2841598B2 (en) Electrical joining method of ceramics and insert material for electrical joining
JP3602582B2 (en) Manufacturing method of electrode for resistance welding
JPH01176283A (en) Method for electrically joining ceramics
JPS63225583A (en) Ceramic joining method
JP2745538B2 (en) Electric joining method between ceramics and insert material for joining
JP2745522B2 (en) Electrical joining method of ceramics and heating member for joining
JPH08279550A (en) Electrostatic chuck
JPH03193675A (en) Electric joining method for ceramics and insert material for electric joining
JPH0333072A (en) Method for electrically joining ceramics
JPH0538920Y2 (en)
JPS6297341A (en) Bonding device
JP3352823B2 (en) Joining method between silicon carbide ceramics and silicon
JPS6418245A (en) Ceramic substrate having metal pin and its manufacture
JPH04209765A (en) Electric joining of ceramics
JPH08340176A (en) Connecting method of lead wire
JP3891886B2 (en) Electric resistance welding method
JPH0679469A (en) Welding method for foil-like conductive materials
JP3292767B2 (en) Joining method of silicon carbide ceramics and silicon
JPH0615464A (en) Diffusion brazing method