JPH038328A - Substrate surface cleaning apparatus - Google Patents
Substrate surface cleaning apparatusInfo
- Publication number
- JPH038328A JPH038328A JP14206989A JP14206989A JPH038328A JP H038328 A JPH038328 A JP H038328A JP 14206989 A JP14206989 A JP 14206989A JP 14206989 A JP14206989 A JP 14206989A JP H038328 A JPH038328 A JP H038328A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gas
- ice particles
- injection means
- injected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 51
- 238000004140 cleaning Methods 0.000 title claims description 11
- 239000002245 particle Substances 0.000 claims abstract description 34
- 238000002347 injection Methods 0.000 claims abstract description 20
- 239000007924 injection Substances 0.000 claims abstract description 20
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 2
- 239000012498 ultrapure water Substances 0.000 claims description 2
- 239000000356 contaminant Substances 0.000 abstract description 10
- 230000003749 cleanliness Effects 0.000 abstract description 7
- 239000007779 soft material Substances 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 17
- 230000000694 effects Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002277 temperature effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、超微細な氷粒子を半導体等の基板表面に噴
射することにより基板表面を洗浄するための基板表面の
洗浄装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention relates to a substrate surface cleaning device for cleaning the substrate surface by spraying ultrafine ice particles onto the surface of a substrate such as a semiconductor. .
第３図は従来の基板表面の洗浄装置を示し、図において
、微細氷粒子を生成するための製氷部（１）に、冷却用
の液体窒素等の冷媒体を送給する手段（２）および純水
を噴霧するノズル（３）が設けられており、生成された
微細氷粒子（４）は噴射手段（５）から半導体等の基板
（６）表面に噴射される。FIG. 3 shows a conventional substrate surface cleaning device, in which means (2) for feeding a cooling medium such as liquid nitrogen for cooling to an ice making section (1) for producing fine ice particles; A nozzle (3) for spraying pure water is provided, and the generated fine ice particles (4) are sprayed from a spraying means (5) onto the surface of a substrate (6) such as a semiconductor.
以上の構成により、断熱材で囲まれた製氷部（１）内に
、液体窒素等の冷媒体（２）を注入し、スプレーノズル
（３）より超純水等の被凍結体を微噴霧して微細氷粒子
（４）を得る。こうして得られた微細氷粒子（４）は、
気体の噴流によるエジェクタ一方式によって噴射手段（
５）に送られ、半導体等の基板（６）表面に噴射される
。基板（６）表面上の汚染物は噴射された＠細氷粒子（
４）の衝突と、低温効果により除去される。噴射の際、
微細氷粒子（４）が基板（６）の表面全体に噴射される
ように、噴射手段（５）または基板（６）がスキャニン
グされる機構となっている。With the above configuration, a cooling medium (2) such as liquid nitrogen is injected into the ice making section (1) surrounded by a heat insulating material, and a substance to be frozen such as ultrapure water is sprayed finely from the spray nozzle (3). to obtain fine ice particles (4). The fine ice particles (4) thus obtained are
The injection means (
5) and is sprayed onto the surface of a substrate (6) such as a semiconductor. Contaminants on the surface of the substrate (6) are removed by sprayed @fine ice particles (
4) It is removed by collision and low temperature effect. During injection,
The mechanism is such that the spraying means (5) or the substrate (6) is scanned so that the fine ice particles (4) are sprayed over the entire surface of the substrate (6).
以上のような従来の基板表面の洗浄装置は、Ｎ２ガスや
、乾燥空気をキャリヤガスとして微細氷粒子のみを噴射
していた。この方式では基板表面の汚染物は氷粒子によ
り一旦は除去されるが、微細氷粒子が噴射されていない
基板表面部位に移動または再付着して洗浄効果を低下さ
せるという問題点があった。また、基板の材質（例えば
アルミ材）によっては表面のダメージが生じるという問
題点もあった。The conventional substrate surface cleaning apparatus described above injects only fine ice particles using N2 gas or dry air as a carrier gas. In this method, contaminants on the substrate surface are once removed by ice particles, but there is a problem in that the fine ice particles move or re-adhere to areas of the substrate surface that have not been sprayed, reducing the cleaning effect. Additionally, there is a problem in that the surface may be damaged depending on the material of the substrate (for example, aluminum).
この発明は上記のような問題点を解消するためになされ
たもので、微細粒子により一旦除去された汚染物を速や
かに吹き飛ばし、基板表面に再付着するのを防ぎ、かつ
、アルミ材等の柔らかい材質の基板に対してダメージを
生じない基板表面の洗浄装置を得ることを目的とする。This invention was made in order to solve the above-mentioned problems. It quickly blows away contaminants that have been removed by fine particles, prevents them from re-adhering to the surface of the substrate, and makes it possible to remove contaminants from soft materials such as aluminum. An object of the present invention is to obtain a cleaning device for the surface of a substrate that does not cause damage to the material of the substrate.
この発明に係る基板表面の洗浄装置は、微細氷粒子を基
板表面に噴射する氷粒子噴射手段と、同時に基板表面に
任意の温度の高清浄度ガスを噴射するガス噴射手段とを
備えている。The substrate surface cleaning apparatus according to the present invention includes ice particle injection means for ejecting fine ice particles onto the substrate surface, and gas injection means for simultaneously ejecting high cleanliness gas at a desired temperature onto the substrate surface.
この発明においては、ガス噴射手段から噴射される高純
度不活性ガスは微細氷粒子による基板表面上の汚染物除
去の効果を高めるように機能し、また、ガスのもつ熱量
によって微細氷粒子を軟化させ、基板表面へのダメージ
を和らげる。In this invention, the high-purity inert gas injected from the gas injection means functions to enhance the effect of fine ice particles in removing contaminants on the substrate surface, and also softens the fine ice particles due to the heat of the gas. to reduce damage to the substrate surface.
第１図はこの発明の一実施例を示し、（７）は任意の温
度をもつ高清浄度ガス、（８）は高清浄度ガス（７）を
基板（６）表面に噴射するガス噴射手段である。FIG. 1 shows an embodiment of the present invention, in which (7) is a high cleanliness gas having an arbitrary temperature, and (8) is a gas injection means for injecting the high cleanliness gas (7) onto the surface of a substrate (6). It is.
その他、第３図におけると同一符号は同一部分を示して
おり、説明を省略する。In addition, the same reference numerals as in FIG. 3 indicate the same parts, and the explanation will be omitted.
次に動作について説明する。微細氷粒子（４）を生成し
、氷粒子噴射手段（５）によって基板（６）の面に噴射
するまでは従来技術と同様である。これに加えて、ガス
噴射手段（８）によって温度制御（Ｏ℃〜２００℃）さ
れた高清浄度のガス（例えばＮ２等）（７）を基板（６
）の表面またはその上部へ噴射する。基板（６）表面へ
の微細氷粒子（４）と高清浄度ガス〈７）の噴射の様子
を第２図に示す。氷粒子噴射手段（５）によって噴射さ
れた微細氷粒子（４）が基板（６）表面に当たる基板表
面上の軌跡（９）は、氷粒子噴射手段（５）または基板
（６）を移動させることによりスキャンされる。高清浄
度ガス（７）はガス噴射手段（８）によって基板（６）
表面もしくはその上部へ同時に噴射され、基板（６）表
面へ噴射された微細氷粒子（４）と、これと衝突して飛
ばされた基板（６）表面上の汚染物、および微細氷粒子
（４）が基板（６）表面上で溶けた後の液体を基板（６
）表面の上から吹き飛ばす作用をする。また、温度制御
（例えば０℃〜２００℃）された高清浄度ガス（７）は
微細氷粒子（４）の温度を高めて軟化させ、基板（６）
表面のダメージを低減させる。Next, the operation will be explained. The steps up to generating fine ice particles (4) and injecting them onto the surface of the substrate (6) by the ice particle injection means (5) are the same as in the prior art. In addition, a highly clean gas (for example, N2, etc.) (7) whose temperature is controlled (0°C to 200°C) is applied to the substrate (6) by the gas injection means (8).
) onto or onto the surface. Figure 2 shows the injection of fine ice particles (4) and highly clean gas (7) onto the surface of the substrate (6). The locus (9) on the substrate surface where the fine ice particles (4) ejected by the ice particle ejecting means (5) hit the surface of the substrate (6) moves the ice particle ejecting means (5) or the substrate (6). scanned by. High cleanliness gas (7) is applied to the substrate (6) by gas injection means (8).
The fine ice particles (4) are simultaneously injected onto the surface or above the substrate (6), the contaminants on the surface of the substrate (6) that are blown away by colliding with the fine ice particles (4), and the fine ice particles (4). ) has melted on the surface of the substrate (6), and then the liquid is transferred to the substrate (6).
) acts to blow away from above the surface. In addition, the highly clean gas (7) whose temperature is controlled (for example, 0°C to 200°C) increases the temperature of the fine ice particles (4) and softens them, thereby forming the substrate (6).
Reduce surface damage.
以上のように、この発明によれば、凍結氷噴射手段とガ
ス噴射手段とを併用したことにより、基板表面で一旦除
去された汚染物の再付着を防いで、汚染物の除去効果を
高めると共に、柔らかい材質の基板表面に対してダメー
ジを低減させて洗浄を行うことができるという効果があ
る。As described above, according to the present invention, by using the frozen ice injection means and the gas injection means in combination, contaminants that have been once removed on the substrate surface are prevented from re-adhering, and the contaminant removal effect is enhanced. This has the effect that cleaning can be performed with less damage to the surface of a substrate made of a soft material.
第１図はこの発明の一実施例の概略立断面図、第２図は
第１図のものの動作説明のための要部斜視図、第３図は
従来の基板表面の洗浄装置の概略立断面図である。
（１） ・・製氷部、（４） ・・微細氷粒子、（
５）・・・氷粒子噴射手段、（６） ・・基板、（７
）・・高清浄度ガス、（８）・・ガス噴射手段。
なお、各図中、同一符号は同−又は相当部分を示す。FIG. 1 is a schematic elevational sectional view of an embodiment of the present invention, FIG. 2 is a perspective view of a main part of the device shown in FIG. 1 for explaining the operation, and FIG. 3 is a schematic elevational sectional view of a conventional substrate surface cleaning device. It is a diagram. (1) ...Ice making section, (4) ...Fine ice particles, (
5) ...Ice particle injection means, (6) ...Substrate, (7
)...High cleanliness gas, (8)...Gas injection means. In each figure, the same reference numerals indicate the same or corresponding parts.
Claims (1)
粒子を基板表面上に噴射する氷粒子噴射手段と、高清浄
度のガスを前記基板表面に噴射するガス噴射手段とを備
えてなる基板表面の洗浄装置An ice making unit that makes ice particles that are ultrafine than ultrapure water, an ice particle injection device that injects the ice particles onto the substrate surface, and a gas injection device that injects highly clean gas onto the substrate surface. Cleaning equipment for substrate surfaces
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14206989A JPH038328A (en) | 1989-06-06 | 1989-06-06 | Substrate surface cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14206989A JPH038328A (en) | 1989-06-06 | 1989-06-06 | Substrate surface cleaning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH038328A true JPH038328A (en) | 1991-01-16 |
Family
ID=15306707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14206989A Pending JPH038328A (en) | 1989-06-06 | 1989-06-06 | Substrate surface cleaning apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH038328A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9534990B2 (en) | 2011-03-18 | 2017-01-03 | Ge Healthcare Uk Limited | Arrangement for preservation of biological samples |
-
1989
- 1989-06-06 JP JP14206989A patent/JPH038328A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9534990B2 (en) | 2011-03-18 | 2017-01-03 | Ge Healthcare Uk Limited | Arrangement for preservation of biological samples |
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