JPH0347579A - Method for washing electronic machinery member - Google Patents
Method for washing electronic machinery memberInfo
- Publication number
- JPH0347579A JPH0347579A JP18004389A JP18004389A JPH0347579A JP H0347579 A JPH0347579 A JP H0347579A JP 18004389 A JP18004389 A JP 18004389A JP 18004389 A JP18004389 A JP 18004389A JP H0347579 A JPH0347579 A JP H0347579A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- particles
- cleaning
- hoop material
- ice particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000005406 washing Methods 0.000 title 1
- 239000002245 particle Substances 0.000 claims abstract description 40
- 238000005507 spraying Methods 0.000 claims abstract description 7
- 238000004140 cleaning Methods 0.000 claims description 35
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 17
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 15
- 239000000463 material Substances 0.000 abstract description 13
- 238000011109 contamination Methods 0.000 abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 8
- 239000007789 gas Substances 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 5
- 239000001569 carbon dioxide Substances 0.000 abstract description 5
- 235000011089 carbon dioxide Nutrition 0.000 abstract description 5
- 239000003595 mist Substances 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000000126 substance Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000005422 blasting Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 241000218645 Cedrus Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Landscapes
- Manufacture Of Switches (AREA)
- Cleaning In General (AREA)
- Special Spraying Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
（イ）産業上の利用分野
この発明は、電気機器部材の洗浄方法に関し、さらに詳
しくは、電気機器部材の、例えば、接点片の表面の付着
物を除去するような洗浄方法に関する。Detailed Description of the Invention (a) Industrial Application Field The present invention relates to a method for cleaning electrical equipment members, and more particularly, to a method for cleaning electrical equipment members, such as removing deposits on the surface of a contact piece. Regarding cleaning method.
（ロ）従来の技術
一般に、リレー スイッチなどの電気機器において、そ
の接点端子等に固着した接点片の表面に有機物質等から
なる付着物が付いていると、初期接触抵抗が上昇するば
かりではなく、使用中においても接触不良を生じやすく
なる。(b) Conventional technology In general, in electrical devices such as relay switches, if there is deposits made of organic substances on the surface of the contact pieces fixed to the contact terminals, etc., not only will the initial contact resistance increase, but also the initial contact resistance will increase. , poor contact is likely to occur even during use.
特に信号用リレーやスイッチ等に使用される電気接点に
あっては、接点開閉時における信号電圧、電流が微弱な
ため、接点片の表面に有機物質がわずかでも付着してい
ると接触不良が発生する。Especially for electrical contacts used in signal relays and switches, the signal voltage and current when opening and closing the contacts are weak, so if even a small amount of organic material adheres to the surface of the contact piece, contact failure will occur. do.
そのために、信号用リレー等の接点片の表面には、大電
力を開閉するリレーよりも高い洗浄度が要求された。For this reason, the surfaces of contact pieces such as signal relays are required to have a higher degree of cleaning than relays that switch on and off high power.
かかる要求を満たそうとする従来の洗浄法は、例えば、
フレオンなどの有機溶剤で超音波を用いて洗浄槽内で洗
浄する湿式洗浄法が知られている。Conventional cleaning methods that attempt to meet such requirements include, for example,
A wet cleaning method is known in which cleaning is performed in a cleaning tank using ultrasonic waves with an organic solvent such as Freon.
（ハ）発明が解決しようとする問題点
しかるに、上述の湿式洗浄法では洗浄液に溶解しない付
着物、特に有機物質等が除去しにくいと共に、−旦洗浄
液で洗浄除去した付着物が再付着して２次汚染を生じや
すいため、被洗浄物の接点表面から付着物を完全に除去
することが困難であった。(c) Problems to be Solved by the Invention However, with the above-mentioned wet cleaning method, it is difficult to remove deposits that do not dissolve in the cleaning solution, especially organic substances, and deposits that have been removed by cleaning with the cleaning solution may re-adhere. Since secondary contamination is likely to occur, it has been difficult to completely remove deposits from the contact surfaces of objects to be cleaned.
また、フレオンなどの有機溶剤の洗浄液がオゾン層を破
壊するという要因があるため、使用規制の対象になって
、使用困難という問題点がある。In addition, since organic solvent cleaning solutions such as Freon destroy the ozone layer, they are subject to usage regulations and have the problem of being difficult to use.
そこで、この発明は２次汚染の心配なく、また、使用の
規制を受けることなく、被洗浄物を完全に洗浄すること
ができる電気機器部材の洗浄方法の提供を目的とする。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a method for cleaning electrical equipment members that can completely clean an object to be cleaned without worrying about secondary contamination and without being subject to restrictions on use.
（ニ）発明が解決しようとする問題点
この発明の第１発明は、電気機器部材の被洗浄面に、氷
粒子を不燃性ガスで高速度に吹付けて洗浄する電気機器
部材の洗浄方法である。(d) Problems to be Solved by the Invention The first invention of the present invention is a method for cleaning electrical equipment parts by spraying ice particles at high speed with a nonflammable gas onto the surface of the electrical equipment parts to be cleaned. be.
この発明の第２発明は、電気機器部材の被洗浄面に、氷
粒子および昇華物粒子を不燃性ガスで高速度に吹付けて
洗浄する電気機器部材の洗浄方法である。A second invention of the present invention is a method of cleaning an electrical equipment member by spraying ice particles and sublimate particles with a nonflammable gas at high speed onto the surface of the electrical equipment member to be cleaned.
（ホ）作用
この発明によれば、氷粒子を、または、氷粒子と昇華物
粒子を不燃性ガスで高速度に吹付けたエネルギーにより
、電気機器部材の表面の付着物が飛散除去される。(E) Effect According to the present invention, deposits on the surface of electrical equipment members are scattered and removed by the energy generated by spraying ice particles or ice particles and sublimate particles with a nonflammable gas at high speed.
（へ）発明の効果
この発明は、有機物質および無機物質の付着物の除去に
、水粒子および該氷粒子とドライアイスのような昇華物
粒子を用いるから、次のような効果を奏するに至る。(f) Effects of the invention This invention uses water particles, ice particles, and sublimate particles such as dry ice to remove deposits of organic and inorganic substances, resulting in the following effects. .
氷粒子または氷粒子および昇華物粒子と共に、付着物が
吹き飛ばされて洗浄除去されるので、洗浄面には付着物
の再付着がなく、２次汚染が確実に防止される。Since the deposits are blown off and removed together with the ice particles or ice particles and sublimate particles, the deposits do not re-adhere to the cleaning surface and secondary contamination is reliably prevented.
従来のように、大型の洗浄槽を設ける必要がないので、
洗浄槽内での上述の２次汚染を防止できると同時に、装
置の大型化を防止すると共に、洗浄液の交換がないので
、洗浄の連続作業ができる。Unlike conventional methods, there is no need to install a large cleaning tank.
It is possible to prevent the above-mentioned secondary contamination within the cleaning tank, and at the same time prevent the device from becoming larger, and since there is no need to replace the cleaning liquid, continuous cleaning operations can be performed.
有機物質、無機物質等の付着物の組成に影響なく付着物
を確実に洗浄することができる。It is possible to reliably clean deposits without affecting the composition of the deposits, such as organic substances and inorganic substances.
氷粒子や昇華物粒子が接点表面に衝突することによりブ
ラスト効果が生まれ、接点表面を粗すことで、表面硬化
による接触安定性が得られる。A blasting effect is created when ice particles and sublimate particles collide with the contact surface, and by roughening the contact surface, contact stability is achieved through surface hardening.
従来の有機溶剤のようなオゾン層破壊の問題が生じない
。It does not cause the problem of ozone layer depletion like conventional organic solvents.
（ト）実施例 この発明の一実施例を以下図面に基づいて詳述する。(g) Examples An embodiment of the present invention will be described in detail below based on the drawings.
第１図は、第２図のような接点片を有するフープ材１０
をこの発明方法で洗浄処理する場合の洗浄装置の構成図
で、洗浄処理されるフープ材１０は複数の可動接触片１
１を所定間隔で平行に配列したリン青銅製のものからな
り、可動接触片１１は幅方向に２分割してなる先端部に
接点片１２゜１２を溶接でそれぞれ固着したツイン接点
構造を有している。FIG. 1 shows a hoop material 10 having a contact piece as shown in FIG.
1 is a block diagram of a cleaning device for cleaning a material by the method of the present invention, in which a hoop material 10 to be cleaned is made up of a plurality of movable contact pieces 1.
The movable contact piece 11 is made of phosphor bronze and has contact pieces 12 and 12 arranged in parallel at predetermined intervals.The movable contact piece 11 has a twin contact structure in which the movable contact piece 11 is divided into two parts in the width direction and contact pieces 12 and 12 are each fixed by welding to the tip. ing.
第１図の洗浄装置において、洗浄を行うためのメインノ
ズル１３は下方に噴出方向を向けて設け、このメインノ
ズル↓３の下方には、横方向に向けてフープ材１０の搬
送経路を設定している。In the cleaning device shown in FIG. 1, a main nozzle 13 for cleaning is provided with its ejection direction directed downward, and a transport path for the hoop material 10 is set below the main nozzle ↓3 in a lateral direction. ing.
上述のメインノズル１３の内部には、３本のノズル１４
．１５．１６を集合配設している。Inside the main nozzle 13 mentioned above, there are three nozzles 14.
．． 15.16 are arranged collectively.
第１のノズル１４は、純水タンク１７の純水を加圧器１
８で加圧し、バルブ１９を介して霧状に噴出する。The first nozzle 14 supplies pure water from the pure water tank 17 to the pressurizer 1.
8 and sprays it out in the form of mist through a valve 19.
第２のノズル１５は、液化炭酸ガスタンク２０の液化炭
酸ガスをバルブ２１，２２、ノズル調整器２３を介して
霧状に噴出する。The second nozzle 15 jets out the liquefied carbon dioxide gas in the liquefied carbon dioxide tank 20 in the form of mist through the valves 21 and 22 and the nozzle regulator 23 .
第３のノズル１６は、液化窒素タンク２４の液化窒素を
バルブ２５，２６、ノズル調整器２７を介して霧状に噴
出する。The third nozzle 16 sprays liquefied nitrogen from the liquefied nitrogen tank 24 in the form of a mist through valves 25 and 26 and a nozzle regulator 27.
そして、上述のノズル調整器２３．２７は、それぞれに
対応するノズル１５．１６の上下位置を調整する。The above-mentioned nozzle adjusters 23.27 then adjust the vertical positions of the corresponding nozzles 15.16.
すなわち、第３のノズル１６が液化窒素を噴出すると、
メインノズル１３の内部がマイナス低温に冷却されるの
で、第１のノズル１４から噴出された霧状の純水は氷粒
子となり、さらに、第２のノズル１５から噴出された液
化炭酸ガス（ドライアイス）も粒子状となり、これらの
粒子がメインノズル１３から噴出されることになる。That is, when the third nozzle 16 spouts liquefied nitrogen,
Since the inside of the main nozzle 13 is cooled to a minus temperature, the mist of pure water ejected from the first nozzle 14 becomes ice particles, and furthermore, the liquefied carbon dioxide gas (dry ice) ejected from the second nozzle 15 turns into ice particles. ) also becomes particulate, and these particles are ejected from the main nozzle 13.
なお、それぞれの粒子の大きさは、各バルブ１９．２１
．２２，２５．２６の開口量を調整することで、変更す
ることができ、さらに、ノズル調整器２３．２７による
ノズル１５．１６の上下位置の調整により良好な粒子化
の調整ができる。In addition, the size of each particle is 19.21 for each valve.
．． This can be changed by adjusting the opening amounts of the nozzles 22, 25, and 26, and further, fine graining can be adjusted by adjusting the vertical position of the nozzle 15, 16 using the nozzle adjuster 23, 27.
前述のメインノズル１３の搬送方向後段には第４のノズ
ル２８を配設し、このノズル２８は前述の液化窒素タン
ク２４の液化窒素をバルブ２５゜２９を介して噴射し、
さらに、該液化窒素はヒータ３０で加温されることで、
完全に気化される。A fourth nozzle 28 is disposed downstream of the main nozzle 13 in the transport direction, and this nozzle 28 injects the liquefied nitrogen from the liquefied nitrogen tank 24 through the valve 25° 29.
Furthermore, the liquefied nitrogen is heated by the heater 30, so that
completely vaporized.
上述のように構成した洗浄装置は、メインノズル１３と
フープ材１０の搬送経路との間隔を３０ｍｍに設定し、
混合粒子の噴出量を１０ｍ１／秒に設定し、さらに、フ
ープ材１０の搬送速度を３０ｍ＠／秒に設定し、さらに
、第４のノズル２８と搬送経路との間隔を１０ｍｍに設
定している。In the cleaning device configured as described above, the distance between the main nozzle 13 and the conveyance path of the hoop material 10 is set to 30 mm,
The ejection amount of the mixed particles is set to 10 m/sec, the conveyance speed of the hoop material 10 is set to 30 m@/sec, and the distance between the fourth nozzle 28 and the conveyance path is set to 10 mm. .
このように設定してメインノズル１３から氷粒子および
ドライアイス粒子の混合粒子を高速でフープ材１０に吹
付けると、接点片表面上の付着物を吹飛ばして洗浄する
ことができる。By setting in this manner and spraying mixed particles of ice particles and dry ice particles from the main nozzle 13 onto the hoop material 10 at high speed, deposits on the surface of the contact piece can be blown away and cleaned.
さらに、第４のノズル２８は完全に気化した窒素ガスを
フープ材１０に吹付けることで、氷粒子の吹付けによる
濡れを乾燥させることができる。Further, the fourth nozzle 28 can spray completely vaporized nitrogen gas onto the hoop material 10 to dry the wetting caused by the sprayed ice particles.
また、粒子による洗浄は氷粒子のみでもよく、ドライア
イス粒子（昇華物粒子）を混合して噴出した場合、氷粒
子の比抵抗を下げると共に、噴出によって生じる接点上
の帯電防止になる。In addition, cleaning with particles may be performed using only ice particles, and if dry ice particles (sublimate particles) are mixed and ejected, the resistivity of the ice particles is lowered and the electrostatic charge on the contacts caused by the ejection is prevented.
氷粒子または氷粒子および昇華物粒子と共に、付着物が
吹き飛ばされて洗浄除去されるので、洗浄面には付着物
の再付着がなく、２次汚染が確実に防止される。Since the deposits are blown off and removed together with the ice particles or ice particles and sublimate particles, the deposits do not re-adhere to the cleaning surface and secondary contamination is reliably prevented.
従来のように、大型の洗浄槽を設ける必要がないので、
洗浄槽内での上述の２次汚染を防止できると同時に、装
置の大型化を防止すると共に、洗浄液の交換がないので
、洗浄の連続作業ができる。Unlike conventional methods, there is no need to install a large cleaning tank.
It is possible to prevent the above-mentioned secondary contamination within the cleaning tank, and at the same time prevent the device from becoming larger, and since there is no need to replace the cleaning liquid, continuous cleaning operations can be performed.
有機物質、無機物質等の付着物の組成に影響なく付着物
を確実に洗浄することができる。It is possible to reliably clean deposits without affecting the composition of the deposits, such as organic substances and inorganic substances.
氷粒子や昇華物粒子が接点表面に衝突することによりブ
ラスト効果が生まれ、接点表面を粗すことで、表面硬化
による接触安定性が得られる。A blasting effect is created when ice particles and sublimate particles collide with the contact surface, and by roughening the contact surface, contact stability is achieved through surface hardening.
従来の有機溶剤のようなオゾン層破壊の問題が生じない
。It does not cause the problem of ozone layer depletion like conventional organic solvents.
図面はこの発明の一実施例を示し、 第１図は洗浄装置の構成図、 第２図はフープ材の平面図である。 １０・・・フープ材 １３・・・メインノズル １４．１５．１６・・・ノズル １７・・・純水タンク ２０・・・液化炭酸ガスタンク ２４・・・液化窒素タンク 樽・・・ツーＺａ １３・・・ノインノス゛ル 猛、１５．１６・・ヅズル １７・・・廁りにタンク ｉ＆！Ｌｎ鵬図 ７ 第２図 フープ杉の平面図 １０・・・フープｎ The drawings show an embodiment of the invention, Figure 1 is a configuration diagram of the cleaning device. FIG. 2 is a plan view of the hoop material. 10... Hoop material 13... Main nozzle 14.15.16... Nozzle 17...Pure water tank 20...Liquefied carbon dioxide tank 24...Liquid nitrogen tank Barrel...Two Za 13...Noinnosuru Takeshi, 15.16... Zuzuru 17...tank around the corner i&! Lnpeng tu 7 Figure 2 Hoop cedar plan view 10... hoop n
Claims (2)
で高速度に吹付けて洗浄する 電気機器部材の洗浄方法。(1) A method of cleaning electrical equipment parts by spraying ice particles with a nonflammable gas at high speed onto the surface of the electrical equipment parts to be cleaned.
粒子を不燃性ガスで高速度に吹付けて洗浄する 電気機器部材の洗浄方法。(2) A method of cleaning electrical equipment parts by spraying ice particles and sublimate particles at high speed with a nonflammable gas onto the surface of the electrical equipment parts to be cleaned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18004389A JPH0347579A (en) | 1989-07-11 | 1989-07-11 | Method for washing electronic machinery member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18004389A JPH0347579A (en) | 1989-07-11 | 1989-07-11 | Method for washing electronic machinery member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0347579A true JPH0347579A (en) | 1991-02-28 |
Family
ID=16076487
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18004389A Pending JPH0347579A (en) | 1989-07-11 | 1989-07-11 | Method for washing electronic machinery member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0347579A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100389015B1 (en) * | 2001-02-19 | 2003-06-25 | 한국전력공사 | CO2 snow decontamination equipments |
| KR20040021174A (en) * | 2002-09-03 | 2004-03-10 | 권대영 | Dryice cleaning machine |
| JP2007212320A (en) * | 2006-02-10 | 2007-08-23 | Espec Corp | Accelerated surface deterioration test method and device |
| CN106269704A (en) * | 2016-08-24 | 2017-01-04 | 国网山东省电力公司蓬莱市供电公司 | Charged electric power apparatus insulation cleaning plant |
| WO2020174769A1 (en) * | 2019-02-26 | 2020-09-03 | 富士フイルム株式会社 | Method and device for dust removing from rubbing roller and method and device for rubbing processing |
-
1989
- 1989-07-11 JP JP18004389A patent/JPH0347579A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100389015B1 (en) * | 2001-02-19 | 2003-06-25 | 한국전력공사 | CO2 snow decontamination equipments |
| KR20040021174A (en) * | 2002-09-03 | 2004-03-10 | 권대영 | Dryice cleaning machine |
| JP2007212320A (en) * | 2006-02-10 | 2007-08-23 | Espec Corp | Accelerated surface deterioration test method and device |
| JP4727439B2 (en) * | 2006-02-10 | 2011-07-20 | エスペック株式会社 | Surface state deterioration promotion test method and surface state deterioration promotion test apparatus |
| CN106269704A (en) * | 2016-08-24 | 2017-01-04 | 国网山东省电力公司蓬莱市供电公司 | Charged electric power apparatus insulation cleaning plant |
| WO2020174769A1 (en) * | 2019-02-26 | 2020-09-03 | 富士フイルム株式会社 | Method and device for dust removing from rubbing roller and method and device for rubbing processing |
| JPWO2020174769A1 (en) * | 2019-02-26 | 2021-10-14 | 富士フイルム株式会社 | Rubbing roller dust removal method and equipment, and rubbing processing method and equipment |
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