JPH0382210A - Method of adding weight to crystal resonator - Google Patents

Method of adding weight to crystal resonator

Info

Publication number
JPH0382210A
JPH0382210A JP21918589A JP21918589A JPH0382210A JP H0382210 A JPH0382210 A JP H0382210A JP 21918589 A JP21918589 A JP 21918589A JP 21918589 A JP21918589 A JP 21918589A JP H0382210 A JPH0382210 A JP H0382210A
Authority
JP
Japan
Prior art keywords
weight
crystal resonator
frequency
accuracy
added
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21918589A
Other languages
Japanese (ja)
Inventor
Kiyoshi Aratake
潔 荒武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Electronic Components Ltd
Original Assignee
Seiko Electronic Components Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Electronic Components Ltd filed Critical Seiko Electronic Components Ltd
Priority to JP21918589A priority Critical patent/JPH0382210A/en
Publication of JPH0382210A publication Critical patent/JPH0382210A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve the accuracy of a position with a weight added thereto by adopting the dry method for the addition of the weight, and limiting the range of the addition according to a resist pattern having the plasma resistant characteristic by the photolithography. CONSTITUTION:A metallic film 15 is formed with sputtering on the surface of a protection film comprising a photo resist 13 with high plasma resistance performance while a crystal wafer 10, an electrode film 11 and the resist 13 are laminated. Then the metallic film 15 is lifted off together with the photo resist 13 to leave the metallic film only in the center 15 in figure. Thus, the metallic film 15 as the added weight formed in such a ray is uniform and placed with high accuracy. Thus, the accuracy of the position for adding a weight is improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、マイクロコンピュータ、コードレステレフォ
ン等の情報a器及び通信機並びに時計などに使用される
水晶振動子の重量物付加法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for adding heavy objects to crystal resonators used in microcomputers, information devices such as cordless telephones, communication devices, watches, and the like.

〔発明の概要〕[Summary of the invention]

本発明は、水晶振動子において周波数調整用として付加
する重量物を範囲を限定し、均一に付着させることによ
って、周波数、周波数温度特性の調整の精度を向上させ
ることを目的とする。
An object of the present invention is to improve the accuracy of adjusting frequency and frequency-temperature characteristics by limiting the range of a heavy object added for frequency adjustment in a crystal resonator and uniformly depositing it.

〔従来の技術〕[Conventional technology]

第1図は、音叉型水晶振動子の形状を斜視図で示してい
る。第1図において1,2は振動部である。3,4は周
波数調整部であり、Auなどの金属によって重量を付加
しである。従来このAuなどの金属を湿式メツキによっ
て付着させていた。
FIG. 1 shows a perspective view of the shape of a tuning fork type crystal resonator. In FIG. 1, 1 and 2 are vibrating parts. Numerals 3 and 4 are frequency adjustment sections, which are made of metal such as Au to add weight. Conventionally, this metal such as Au was attached by wet plating.

この為に、ネガ型レジストを用いて付着面3.4以外の
部分を保護していた。
For this reason, a negative resist was used to protect the parts other than the attachment surface 3.4.

また、第2図はGTカット水晶振動子の形状を斜視図で
示している。第2図において5.6は支持部であり、こ
の部分を台座に接着する。7は振動部である。また、8
.9は周波数調整部兼温度特性調整部であり、この部分
に重量を付加して上記の2つの特性を調節する。GTカ
フト水晶振動子の場合、振動部7に対して調整部8.9
の位置は精度よく決定されなければならない。従来89
の部分への重量の付加はAgの蒸着で行われ、それ以外
の部分は非抵触の金属マスクによって保護されていた。
Further, FIG. 2 shows a perspective view of the shape of the GT-cut crystal resonator. In FIG. 2, reference numeral 5.6 indicates a support portion, and this portion is glued to the pedestal. 7 is a vibrating section. Also, 8
.. Reference numeral 9 denotes a frequency adjustment section and a temperature characteristic adjustment section, and weight is added to this section to adjust the above two characteristics. In the case of the GT Kaft crystal resonator, the adjusting section 8.9 is connected to the vibrating section 7.
The position of must be determined with high precision. Conventional 89
Weight was added to the area by vapor deposition of Ag, and other areas were protected by a non-contact metal mask.

以上の方法では、音叉型水晶振動子のような場合、1枚
又は10ツト内での付加重量のバラツキによる周波数の
バラツキが、またGTカット水晶振動子の場合では、蒸
着位置の偏差による周波数及び温度特性の、変化量のバ
ラツキが課題であった。
In the above method, in the case of a tuning fork type crystal resonator, the frequency variation due to the variation in the added weight within one or 10 pieces, and in the case of a GT cut crystal resonator, the frequency and The problem was the variation in the amount of change in temperature characteristics.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明は、スパッタによる重量の付加を可能とし、付加
重量の均一化を行うことによって、周波数のバラツキを
抑え、さらに重量付加の位置精度をも向上させることを
目的とするものである。
An object of the present invention is to make it possible to add weight by sputtering and to make the added weight uniform, thereby suppressing variations in frequency and further improving the positional accuracy of weight addition.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は上記目的を達成するために、フォトリソグラフ
により形成される水晶振動子の周波数調整部に重量物を
付加する方法において、重量物の付加を、スパッタ、蒸
着などの乾式法によって行い、かつその付加の範囲をフ
ォトリソグラフによる耐プラズマ性を有するレジストパ
ターンによって限定することにより重量付加の位置精度
の向上を得るものである。
In order to achieve the above object, the present invention provides a method for adding a heavy object to the frequency adjustment section of a crystal resonator formed by photolithography, in which the addition of the heavy object is performed by a dry method such as sputtering or vapor deposition, and By limiting the range of weight addition using a photolithographic resist pattern having plasma resistance, the positional accuracy of weight addition can be improved.

〔作用〕[Effect]

重量付加の範囲を、フォトリソグラフによるフォトレジ
ストパターンによって限定する方法は、従来の湿式メツ
キ法による重量の付加でも行っていたが、本発明では耐
プラズマ性の高いフォトレジストを用いることによって
、スパッタによる金属の付着を行い、フォトレジストの
リフトオフによって、限定部分以外の金属膜を取り除く
方法を用いた。
The method of limiting the range of weight addition using a photoresist pattern using photolithography was also carried out by adding weight using the conventional wet plating method, but in the present invention, by using a photoresist with high plasma resistance, it is possible to limit the range of weight addition using a photoresist pattern using photolithography. A method was used in which metal was deposited and the metal film other than the limited portions was removed by lift-off of the photoresist.

〔実施例〕〔Example〕

まず、本発明に適用する重量付加について説明する。 First, weight addition applied to the present invention will be explained.

第3図は、本発明における重量付加の第1の例である。FIG. 3 is a first example of weight addition in the present invention.

 10は水晶ウェハー、11は電極膜、13フオトレジ
ストによる保護膜である。この状態で表面にスパッタリ
ングすれば、15のように金属膜を形成できる。この後
、13のフォトレジストとともに、15の金属膜をリフ
トオフすれば図面中央の15の部分のみ、金属膜を残す
ことができる。この残された15の部分は、第1図の3
.4及び第2図の8゜9の部分に相当する。このように
して形成された付加重量としての、金属膜15は非常に
均一で位置精度の良いものが得ることができた。
10 is a crystal wafer, 11 is an electrode film, and 13 is a protective film made of photoresist. If sputtering is performed on the surface in this state, a metal film as shown in 15 can be formed. Thereafter, by lifting off the metal film 15 along with the photoresist 13, the metal film can be left only in the portion 15 in the center of the drawing. These remaining 15 parts are 3 in Figure 1.
.. 4 and corresponds to the 8°9 part in FIG. The metal film 15 as an additional weight thus formed was extremely uniform and had good positional accuracy.

このような金属膜を音叉型水晶振動子に形成する方法は
2通りある。1つは、振動子外形を形成する前にウェハ
ー上に、重量付加をする第1の例の方法。もう1つは振
動子外形を水晶のエンチングによって形成した後、ウェ
ハー上にて周波数を測定し、第4図の断面図に示すよう
に、振動子全体にフォトレジスト13をコーティングし
てパターンを形成した後、スパッタにより重量付加を行
う方法で第2の例として第4図に示す、18は水晶の振
動部、11は電極膜、13はフォトレジスト、15は付
加重量として膜付けされた金属膜である。この金属Wj
415の形成は必要に応じて蒸着法を用いることもでき
る。ここで、フォトレジストとともに金属膜をリフトオ
フすれば所定の金属膜部分のみ残される。水晶振動子の
性質上、付加重量が増加すると周波数は低下するため、
上記の方法で周波数既知のウェハー上の振動子の所定位
置に重量を付加し、全ての振動子の周波数を狙い値以下
とする。
There are two methods for forming such a metal film on a tuning fork type crystal resonator. The first method is to add weight to the wafer before forming the external shape of the vibrator. The other method is to form the external shape of the vibrator by etching the crystal, measure the frequency on the wafer, and then coat the entire vibrator with photoresist 13 to form a pattern, as shown in the cross-sectional view of Figure 4. After that, a second example of the method of adding weight by sputtering is shown in FIG. 4, where 18 is a crystal vibrating part, 11 is an electrode film, 13 is a photoresist, and 15 is a metal film attached as an additional weight. It is. This metal Wj
415 can be formed using a vapor deposition method if necessary. Here, if the metal film is lifted off together with the photoresist, only a predetermined portion of the metal film remains. Due to the nature of crystal oscillators, as the added weight increases, the frequency decreases.
Using the method described above, a weight is added to a predetermined position of a vibrator on a wafer whose frequency is known, and the frequencies of all the vibrators are set to be equal to or lower than the target value.

その後、レーザートリミングにより周波数を高くして、
個々の振動子に対して周波数の調整を行うわけである。
After that, the frequency is increased by laser trimming,
The frequency is adjusted for each individual vibrator.

この方法は長辺縦振動子等にも応用できる。This method can also be applied to long-side longitudinal oscillators.

GTカット水晶振動子においても、従来のような蒸着法
による周波数調整ではなく、レーザートリミングによる
周波数調整を行う。レーザートリミングによって本発明
にて付加した金属を蒸発させながら調整するのである。
In the GT-cut crystal resonator as well, frequency adjustment is performed by laser trimming instead of frequency adjustment using the conventional vapor deposition method. Adjustments are made while the metal added in the present invention is evaporated by laser trimming.

この方法によって調整位置の精度は大幅に向上した。This method greatly improved the accuracy of the adjusted position.

〔発明の効果〕〔Effect of the invention〕

この他、本発明は次のような効果をもたらす。 In addition, the present invention brings about the following effects.

■周波数調整部のトリミング用の付加重量を均一とする
ことができる。
■Additional weight for trimming the frequency adjustment section can be made uniform.

0周波数既知の振動子に対して、所望の重量の付加をす
ることができる。
A desired weight can be added to a vibrator with a known zero frequency.

■メツキ液等有害な薬液の使用を減少できる。■Can reduce the use of harmful chemical solutions such as Metsuki liquid.

■付加重量の位置を精度良く決定することにより、トリ
くング精度が向上し、周波数及び温度特性の調整精度が
向上した。
■By accurately determining the position of the added weight, trigging accuracy has been improved, and frequency and temperature characteristic adjustment accuracy has been improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明を適用した音叉型水晶振動子の外形形状
と周波数調整部を示す斜視図、第2図は本発明を適用し
たCTカット水晶振動子の外形形状と周波数調整部を示
す斜視図、第3図は本発明のIi量付加の第1の例を示
す断面図、第4図は本発明の重量付加筆2の例を示す断
面図である。 ・・振動部 ・・周波数調整部 ・・支持部 ・・振動部 ・・周波数及び温度特性調整部 ・・水晶ウェハー ・・電極膜 13・ ・レジスト 15・・・・・金属膜 18・・・・・振動部 以上
FIG. 1 is a perspective view showing the external shape and frequency adjustment section of a tuning fork type crystal resonator to which the present invention is applied, and FIG. 2 is a perspective view showing the external shape and frequency adjustment section of a CT-cut crystal resonator to which the present invention is applied. 3 are sectional views showing a first example of Ii amount addition according to the present invention, and FIG. 4 is a sectional view showing an example of a weight adding brush 2 according to the present invention. ... Vibrating section... Frequency adjusting section... Supporting section... Vibrating section... Frequency and temperature characteristic adjusting section... Crystal wafer... Electrode film 13... Resist 15... Metal film 18...・More than vibrating part

Claims (1)

【特許請求の範囲】[Claims]  フォトリソグラフにより形成される水晶振動子の周波
数調整部に重量物を付加する方法において、重量物の付
加を、スパッタ、蒸着などの乾式法によって行い、かつ
その付加の範囲をフォトリソグラフによる耐プラズマ性
を有するレジストパターンによって、限定したことを特
徴とする水晶振動子の重量物付加方法。
In a method of adding a heavy object to the frequency adjustment section of a crystal resonator formed by photolithography, the addition of the heavy object is performed by a dry method such as sputtering or vapor deposition, and the range of the addition is determined by plasma resistance using photolithography. 1. A method for adding a heavy object to a crystal resonator, characterized in that the method is limited by a resist pattern having a resist pattern.
JP21918589A 1989-08-25 1989-08-25 Method of adding weight to crystal resonator Pending JPH0382210A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21918589A JPH0382210A (en) 1989-08-25 1989-08-25 Method of adding weight to crystal resonator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21918589A JPH0382210A (en) 1989-08-25 1989-08-25 Method of adding weight to crystal resonator

Publications (1)

Publication Number Publication Date
JPH0382210A true JPH0382210A (en) 1991-04-08

Family

ID=16731534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21918589A Pending JPH0382210A (en) 1989-08-25 1989-08-25 Method of adding weight to crystal resonator

Country Status (1)

Country Link
JP (1) JPH0382210A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08154028A (en) * 1994-09-30 1996-06-11 Tokki Kk Frequency adjusting device
JP2013243753A (en) * 2002-01-11 2013-12-05 Piedekku Gijutsu Kenkyusho:Kk Method for manufacturing crystal vibrator, crystal unit and crystal oscillator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08154028A (en) * 1994-09-30 1996-06-11 Tokki Kk Frequency adjusting device
JP2013243753A (en) * 2002-01-11 2013-12-05 Piedekku Gijutsu Kenkyusho:Kk Method for manufacturing crystal vibrator, crystal unit and crystal oscillator

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