JPH0381295B2 - - Google Patents

Info

Publication number
JPH0381295B2
JPH0381295B2 JP4821882A JP4821882A JPH0381295B2 JP H0381295 B2 JPH0381295 B2 JP H0381295B2 JP 4821882 A JP4821882 A JP 4821882A JP 4821882 A JP4821882 A JP 4821882A JP H0381295 B2 JPH0381295 B2 JP H0381295B2
Authority
JP
Japan
Prior art keywords
processing container
heat
top plate
base
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4821882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58164222A (ja
Inventor
Juichiro Yamada
Shinichi Mizuguchi
Hirozo Shima
Junichi Nozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57048218A priority Critical patent/JPS58164222A/ja
Publication of JPS58164222A publication Critical patent/JPS58164222A/ja
Publication of JPH0381295B2 publication Critical patent/JPH0381295B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
JP57048218A 1982-03-25 1982-03-25 加熱処理装置 Granted JPS58164222A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57048218A JPS58164222A (ja) 1982-03-25 1982-03-25 加熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57048218A JPS58164222A (ja) 1982-03-25 1982-03-25 加熱処理装置

Publications (2)

Publication Number Publication Date
JPS58164222A JPS58164222A (ja) 1983-09-29
JPH0381295B2 true JPH0381295B2 (cs) 1991-12-27

Family

ID=12797268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57048218A Granted JPS58164222A (ja) 1982-03-25 1982-03-25 加熱処理装置

Country Status (1)

Country Link
JP (1) JPS58164222A (cs)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0237744A (ja) * 1988-07-27 1990-02-07 Tokyo Electron Ltd 搬送装置
US5324684A (en) * 1992-02-25 1994-06-28 Ag Processing Technologies, Inc. Gas phase doping of semiconductor material in a cold-wall radiantly heated reactor under reduced pressure
US5445675A (en) * 1992-07-09 1995-08-29 Tel-Varian Limited Semiconductor processing apparatus
DE4242154C2 (de) * 1992-12-14 1995-04-20 United Carr Gmbh Trw Verschlußdeckel
CN112041627B (zh) * 2018-11-14 2022-07-05 株式会社爱发科 真空加热装置、反射器装置

Also Published As

Publication number Publication date
JPS58164222A (ja) 1983-09-29

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