JPH0365327A - Manufacture of stamper - Google Patents
Manufacture of stamperInfo
- Publication number
- JPH0365327A JPH0365327A JP20168689A JP20168689A JPH0365327A JP H0365327 A JPH0365327 A JP H0365327A JP 20168689 A JP20168689 A JP 20168689A JP 20168689 A JP20168689 A JP 20168689A JP H0365327 A JPH0365327 A JP H0365327A
- Authority
- JP
- Japan
- Prior art keywords
- original plate
- stamper
- glass original
- glass
- glass master
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000011521 glass Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000011347 resin Substances 0.000 claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 19
- 238000003825 pressing Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 abstract description 7
- 238000000465 moulding Methods 0.000 abstract description 3
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 235000014121 butter Nutrition 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 208000031513 cyst Diseases 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光デイスク用スタンパの製造方法に関し、特に
ゾルゲル法を用いた光デイスク用ガラス基板作製のため
のワークスタンパの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a stamper for an optical disk, and particularly to a method for manufacturing a work stamper for manufacturing a glass substrate for an optical disk using a sol-gel method.
従来のゾルゲル法を用いた光デイスク用ガラス基板の作
製プロセスについて説明する。A process for manufacturing a glass substrate for an optical disk using a conventional sol-gel method will be described.
まず、所望のデータに基づきガラス原盤にマスクライテ
ィングを行う。次に、ガラス原盤にＮｉのスパッタ及び
電鋳処理を施すことにより、Ｎｉスタンパ（マスタ〉を
おこす。次いで、Ｎｉスタンパ（マスタ〉を型にして再
度電鋳処理を行い、Ｎｉスタンパ（マザー）を作成する
。この様にして作成したＮｉスタンバ（マザー）を用い
て、射出成形あるいは２ＰＩｔ形により樹脂製のゾルゲ
ル用ワークスタンパを得る。First, mask writing is performed on the glass master based on desired data. Next, a Ni stamper (master) is created by subjecting the glass master to Ni sputtering and electroforming.Next, electroforming is performed again using the Ni stamper (master) as a mold to form a Ni stamper (mother). Using the Ni stamper (mother) thus produced, a resin work stamper for sol-gel is obtained by injection molding or 2PIt molding.
次に、ガラス基板上に、スピンコード法により金属アル
コレート、ポリエチレングリコール、塩酸を含むアル゛
：７−・ル溶液（ゾルゲル溶液）を塗布し、ゾルゲル層
を形成する。先程のワークスタンパをこのゾルゲル面（
１こ押し当で、微細なバター〉・を転写する。重ね合り
せたまま一次焼成を行った後、ワークスタンパから離を
Ｌまた微細パターン付きガラス基板を更に二次焼成する
。このようなプロセスを経て、光デイスク用ガラス基板
を作製していた。Next, an alcohol solution (sol-gel solution) containing metal alcoholate, polyethylene glycol, and hydrochloric acid is applied onto the glass substrate by a spin-coating method to form a sol-gel layer. Place the previous work stamper on this sol-gel surface (
Transfer the fine butter with one press. After primary firing is performed while the glass substrates are overlapped, they are separated from the work stamper and the fine patterned glass substrates are further fired for secondary firing. Glass substrates for optical disks have been manufactured through such processes.
先述［、たように、ゾルゲル用ワークスタンパを作製す
るには７．現状ではかなりのプロセスを必要どする。こ
れは、ゾルゲル用ワークスタンパとして、直接Ｎｉスタ
ンパ（マスタ〉が使用できないにとによる。ずなわち、
ゾルゲル
パをそのまま密着さぜ゛７７ーヘ次焼戒を行・うと、離
型の際、ゾルゲル層の一部がＮｉスタンパ面に付着し、
正確なパターン転写かて゛きない。As mentioned above, to create a work stamper for sol-gel 7. Currently, it requires a considerable process. This is because the Ni stamper (master) cannot be used directly as a work stamper for sol-gel.
If you apply the sol-gel pad as it is and then perform the next baking command, part of the sol-gel layer will adhere to the Ni stamper surface when the mold is released.
Accurate pattern transfer is impossible.
このノコめ、−Ｌ述し７ｔ′：ような長いプロセスを採
り入れているが、特に微細なパターンを比較的大面積に
渡って何度も転写するので、歩留り、コスＩ・の面で問
題となる。This method uses a long process like -L7t': However, since particularly fine patterns are transferred many times over a relatively large area, there are problems in terms of yield and cost I. Become.
本発明は、いわゆる２Ｐ成形により、ガラス原盤から直
接ゾルゲル用ワークスタンパを製作することができるス
タンパの容易な製造方法を提供するものである。The present invention provides an easy method for manufacturing a stamper, which allows a sol-gel work stamper to be manufactured directly from a glass master by so-called 2P molding.
本発明によるスタンパの製造方法は、ガラス原盤上にレ
ジストを塗布する工程、レーザービームを用いて所望の
パターンを露光する工程、微細なパターンを有するレジ
スト・屑を形成するための現像工程、残存するレジス１
−層をマスクと１７でガラス原盤をエツチングする工程
、残存するレジスト・層を除去する工程、微細なパター
ンを有する前記ガラス原盤に透光性基板を押１〜当てこ
のガラス原盤ε透光性基板との間に紫外線硬化樹脂を充
填する工程、前記透光性基板を通して紫外線を照射する
工程、前記ガラス原盤から微細な凹１１）を有する紫外
線硬化樹脂層を設けた前記透光性基板を離型する工程と
を有する。The method for manufacturing a stamper according to the present invention includes a step of applying a resist onto a glass master, a step of exposing a desired pattern using a laser beam, a developing step to form resist and debris having a fine pattern, and a step of applying a resist onto a glass master, a step of exposing the resist to a desired pattern using a laser beam, a developing step to form resist and scraps having a fine pattern, Regis 1
- Step of etching the glass master with a layer mask 17; Step of removing the remaining resist/layer; pressing a transparent substrate onto the glass master having a fine pattern; pressing this glass master ε transparent substrate; a step of filling an ultraviolet curable resin between the transparent substrate, a step of irradiating ultraviolet rays through the transparent substrate, and a step of releasing the transparent substrate provided with the ultraviolet curable resin layer having minute depressions 11) from the glass master disk. and a step of doing so.
まず、鏡面に磨かれているガラス原盤上にホ）・ｌ／シ
ストをスビンコー・Ｉ・法により１０００へ一３０００
人塗布する。次いで、マスタライタでレーザービーム露
光を行い、専用の現像液を用いて現像する。次に、ホト
レジストをマスクと１７で、ＣＦ４などのガスを用いた
反応性イオンエッチ〉′グ法によりガラス原盤をエツチ
ングする。その後、アッシング装置を用いてレジスト・
層を除去する。このようにして微細なパターンを有する
ガラス原盤が作製できる。First, on a mirror-polished glass master disk, 1000 to 13000 cysts were added using the Svinkow I method.
People apply. Next, laser beam exposure is performed using a master writer, and development is performed using a dedicated developer. Next, using the photoresist as a mask 17, the glass master disk is etched by a reactive ion etching method using a gas such as CF4. After that, use an ashing device to remove the resist.
Remove layers. In this way, a glass master disk having a fine pattern can be produced.
このガラス原盤の上に、ディスベンザを用いて紫外線硬
化樹脂をリング状に吐出させる。次に、透光性のエポキ
シ基板を、紫外線硬化樹脂がエポキシ基板とガラス原盤
との間に充分展開するように、ガラス原盤に押し当てる
。その後、エポキシ基板側からＵＶ照射を行い、紫夕［
線硬化樹脂を硬化させる。硬化しまた紫外線硬化樹脂層
をガラス原盤から離型することにより、微細な凹凸を有
する紫外線硬化樹脂層をエポキシ基板」二に形成するこ
とができる。このようにしてゾルゲル用ワークスタンパ
が作製できる。An ultraviolet curing resin is discharged in a ring shape onto this glass master using a dispenser. Next, a translucent epoxy substrate is pressed against the glass master so that the ultraviolet curing resin is sufficiently spread between the epoxy substrate and the glass master. After that, UV irradiation was performed from the epoxy board side, and Shiyu [
Cure the line curing resin. By releasing the cured ultraviolet curable resin layer from the glass master, an ultraviolet curable resin layer having fine irregularities can be formed on the epoxy substrate. In this way, a sol-gel work stamper can be produced.
次に、ゾルゲル法を用いたガラス基板の作製方法につい
て述べる。Next, a method for manufacturing a glass substrate using the sol-gel method will be described.
ガラス基板上にテトう王トキシシラン、ポリ−”ｒ−チ
）／ングリコール、塩酸を含むヱチルアルコール溶液牙
スピンコード法により塗布し、ゾルゲル層を２０００−
３０００人形成した。次いで、先程のワークスタンパを
減圧下で重ね合わせて押圧する。そのままの状態で、１
００°Ｃ、ｌＯｍｉｎの一次焼成を行−）た。その後、
ガラス基板をワークスタンパより離型し、３５０°Ｃ，
ｌＯｍｉｎの二次焼成を行い、所望の微細パターンを
有するガラス基板を得た。A sol-gel layer was coated onto a glass substrate using an ethyl alcohol solution containing polysilane, poly(r-thi)/glycol, and hydrochloric acid using a spin-coating method.
3,000 people were formed. Next, the previous work stampers are overlapped and pressed under reduced pressure. As it is, 1
Primary firing was performed at 00°C and lOmin. after that,
Release the glass substrate from the work stamper, heat at 350°C,
A glass substrate having a desired fine pattern was obtained by performing secondary firing of 1Omin.
以」ユ述べてきたように、本発明によるスタンパの製造
方法は、従来の方法に比べて短い工程で済み、又、ゾル
ゲル用スタンパとしてＮｉスタンパを使用１−ないで済
むため、ゾルゲル層がスタンパに付着することもなくな
り、その工業上の意義は大きい。As described above, the method for manufacturing a stamper according to the present invention requires shorter steps than conventional methods, and also eliminates the need to use a Ni stamper as a sol-gel stamper, so that the sol-gel layer can be used as a stamper. This has great industrial significance.
Claims (1)
ムを用いて所望のパターンを露光する工程、微細なパタ
ーンを有するレジスト層を形成するための現像工程、残
存するレジスト層をマスクとしてガラス原盤をエッチン
グする工程、残存するレジスト層を除去する工程、微細
なパターンを有する前記ガラス原盤に透光性基板を押し
当てこのガラス原盤と透光性基板との間に紫外線硬化樹
脂を充填する工程、前記透光性基板を通して紫外線を照
射する工程、前記ガラス原盤から微細な凹凸を有する紫
外線硬化樹脂層を設けた前記透光性基板を離型する工程
からなるスタンパの製造方法。A process of applying resist onto the glass master, a process of exposing a desired pattern using a laser beam, a developing process to form a resist layer with a fine pattern, and etching of the glass master using the remaining resist layer as a mask. a step of removing the remaining resist layer; a step of pressing a light-transmitting substrate against the glass master having a fine pattern and filling an ultraviolet curable resin between the glass master and the light-transmitting substrate; A method for manufacturing a stamper, comprising the steps of: irradiating ultraviolet rays through the transparent substrate; and releasing the transparent substrate provided with the ultraviolet curable resin layer having fine irregularities from the glass master.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1201686A JP2995755B2 (en) | 1989-08-02 | 1989-08-02 | Manufacturing method of stamper |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1201686A JP2995755B2 (en) | 1989-08-02 | 1989-08-02 | Manufacturing method of stamper |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0365327A true JPH0365327A (en) | 1991-03-20 |
| JP2995755B2 JP2995755B2 (en) | 1999-12-27 |
Family
ID=16445222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1201686A Expired - Lifetime JP2995755B2 (en) | 1989-08-02 | 1989-08-02 | Manufacturing method of stamper |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2995755B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101367662B1 (en) | 2006-11-22 | 2014-03-03 | 엘아이지에이디피 주식회사 | Manufacturing process for imprint-stamp |
-
1989
- 1989-08-02 JP JP1201686A patent/JP2995755B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2995755B2 (en) | 1999-12-27 |
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