JPH036488A - Fine adjustment device - Google Patents

Abstract

PURPOSE:To make possible fine adjustment in a wide range by providing the device with a second table finely adjustable in a specified direction in accordance with the movement of a movement edge part of a micrometer mounted and fixed on a first coarsely movable table. CONSTITUTION:A coarsely movable stage 10 relatively sliding in the rotation direction in an X direction and on an X-Y plane is mounted on an anchor block 10 of a device body 2 to provide an X stage 30 relatively movable in the X direction on a stage 20, a Y stage 40 relatively movable in the Y direction on the stage 30 and a Z stage 50 relatively movable in the Z direction on the stage 40 further so as to fix a probe fixing arm 60 on the stage 50. And the stage 30 is allowed to move a micrometer 21 of a movement accuracy of about 1/100mm fixed on the stage 20 to that fine adjustment can be performed in the X direction to the stage 20. The stages 40, 50 are allowed to perform the fine adjustment by micrometers 31, 41 fixed on the stages 30, 40. If this device, for instance, is applied to an inspection probe of a semiconductor device, its measurement range can be widened.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a fine adjustment device, and more particularly, to a fine adjustment device that performs coarse and fine adjustment and enables fine adjustment over a wide range.

[Conventional technology]

A micromanipulator (
A measuring needle (probe) is brought into contact with a minute area on a semiconductor wafer using a manipulator (hereinafter simply referred to as a manipulator) to test electrical characteristics.

In order to bring this probe into precise contact with a predetermined minute region, it is necessary to precisely move the probe minutely. In order to make this precise fine adjustment, a fine movement device using a micrometer is mounted on the manipulator, and the probe is fixed to the moving table of this fine movement device to perform minute movement of the probe.

Conventional fine movement devices generally use a cross guide to provide xSy,
Each moving table is moved in the z direction.

[Problem to be solved by the invention]

In recent years, as semiconductor integrated circuits have become more highly integrated, the size of semiconductor chips has also become larger.

Therefore, it has become necessary to finely adjust the probe of the manipulator over a wide range.

However, with conventional fine movement devices, the probe can only be moved 1:1 with respect to the movement of the micrometer, so the range of movement is limited.

Therefore, when measuring the electrical characteristics of integrated circuits and the like on a semiconductor wafer, it is becoming difficult to test them all at once without moving the entire fine movement device or moving the semiconductor wafer. Furthermore, if a micrometer with a long stroke is used to widen the movement range, the overall size of the fine movement device will become too large, which may result in poor operability.

SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the above-mentioned problems and provide a small fine movement device that can be accurately moved over a wide range and has high operability.

[Means to solve the problem]

In the fine movement device of the present invention, the first table is fixed to the fixed base and is movable coarsely in the rotational direction and a predetermined direction, and the first table is fixed to the fixed base and moves in accordance with the movement of the moving tip of the micrometer fixed to the fixed base. It is characterized in that the second table is moved slightly.

The present invention is characterized by comprising a second table that is slightly movable with respect to the first table.

[Effect]

In the fine movement device of the present invention, configured as described above, the first table can be largely moved in the rotational direction and in a predetermined direction with respect to the fixed base. Also, the second
The table can be moved by a micrometer with respect to the first stage. Fine adjustment can be made over a wide range by combining coarse relative movement and fine movement between the first table and the fixed base.

〔Example〕

Embodiments according to the present invention will be described below with reference to the drawings.

Elements with the same reference numerals have the same functions, so duplicate explanations will be omitted.

FIG. 1 shows an external perspective view of a fine movement device according to an embodiment of the present invention.

As shown in FIG. 1, the fine movement device 1 includes a fixing base 10 fixed to a main body 2 of the device such as a prober (part of which is shown by a dashed line). A coarse movement stage 20 is mounted on the fixed base 10 and slides relatively in the X direction and in the rotational direction on the XY plane in FIG. Furthermore, this fine movement device 1 further includes an X stage 30 that is relatively movable in the X direction on the coarse movement stage 20, a Y stage 40 that is relatively movable in the X direction on this X stage 30, and furthermore, this Y stage 40. Z stage 50 that can be moved relatively in the Z direction on the top
It is equipped with A probe fixing arm 60 is fixed to the Z stage 50. Further, the X stage 30 can be finely moved in the X direction with respect to the coarse movement stage 20 by moving the micrometer 21 (movement accuracy of 1/100 mm) fixed on the coarse movement stage 20.

Furthermore, the Y stage 40 and Z stage 50 can also be moved slightly by micrometers 31 and 41 fixed to the X stage 30 and Y stage 40, respectively.

FIG. 2 shows the detailed structure of the fine movement device according to the above embodiment.

The detailed structure of this embodiment will be explained using FIG. 2.

FIG. 2(a) is a view from the rear of the fine movement device, that is, the rear surface of the probe fixing arm 60, FIG. 2(b) is a view of the fine movement device as seen from the side, and FIG. 2(c) is a view of the fine movement device as seen from the rear side. shows the state viewed from above.

First, the fixing table 10 is provided on the main body 2 of the apparatus shown by the two-dot chain line in FIG.
It is fixed at a. This fixation is carried out by inserting the fixing guide pin 15a in the shape of an inverted truncated cone provided on the fixing base 10 and the fixing guide portion 2a using the rod 11 for pressing.

A coarse movement stage 20 is mounted on this fixed base 1o, and this coarse movement stage 2o is
In FIGS. 1 and 2, it is movable in the X direction and rotational direction. A sliding groove 22a extending in the X direction is provided in the coarse movement stage 20, and the cross-sectional shape of the sliding groove 22a is an internally enlarged shape as shown in FIG. 2(a). It's getting wider. Such a sliding groove 22
a consists of two members 22 and 23 as shown in FIG. 2(a).
Although it is common to form them in combination, they may also be formed all at once by machining within the coarse movement stage 2o.

On the other hand, a through hole 15 is formed approximately in the center of the fixed base 1o, and a leg portion 12a of the sliding member 12 is inserted into the through hole 15. The head 12b of the sliding member 12 has the shape of a rotating body. Then, the sliding groove 22a and the sliding member 1
2 are slidably engaged with each other.

FIG. 3 shows the state of engagement between the fixed base 10 and the coarse movement stage 20. As shown in FIG. 3, the coarse movement stage 20 is not only slidable in the X direction with respect to the fixed base 10, but also slidable in the rotational direction R. Such sliding occurs between the lower surface 12c of the head 12b of the sliding member 12 and the sliding groove 22.
Since this is performed between the lower surface 22b of the lower surface 22b of the lower surface 22b of the lower surface 22b of the lower surface 22b of the surface 12a, it is necessary to grind these surfaces 12c and 22b with high precision in order to perform this sliding smoothly.

In the above embodiment, sliding in the linear direction and sliding in the rotational direction are performed by one mechanism, but they may be performed by using two different mechanisms.

Next, a mechanism for fixing the fixed stage 10 and the coarse movement stage 20 will be explained using FIG. 4.

FIGS. 4(a) and 4(b) show cross sections of the fixing mechanism, and as shown in these figures, the sliding member 12 is slidable in the Z direction within the through hole 15 provided in the fixing base 10. , its head 12
The part on the opposite side from b penetrates the lower side of the fixing base 10. A cam 14, a wave washer 14e, a washer 14a, and a disc spring 14b are inserted into the penetrating portion 12d. A screw hole 12f is formed in the end surface of the penetrating portion 12d, and a bolt 12e is screwed into the screw hole 12f.
It is held at 2d.

- A cam pin 16 is fixed to the blade fixing base 10.

FIG. 4(C) shows the structure of the cam 14. As shown in the figure, the inner surface of the cam 14 is provided with an inclined groove 16a on its outer periphery. This inclined groove 16a is inclined over a rotational angle of about 60 degrees of the cam. The cam pin 16 slides within this inclined groove 16a. A rotating arm 13 for rotating the cam 14 is fixed to the outer circumference of the cam 14.

First, when the fixed base 10 and the coarse movement stage 20 are in a relatively slidable state, the state shown in FIG. ) of P
It is located at In this state, the cam pin 16 is connected to the cam 14.
The cam 14 does not come into contact with the sliding surface of the inclined groove 16a and is in a floating state, and does not push the cam 14 downward in the Z direction.

As a result, the upper surface of the cam 14 is attached to the surface of the fixed base 10 by the disc spring 1.
4a and the wave washer 14e. In this state, the lower surface of the head 12b of the sliding member 12 is pressed against the sliding groove 22a with a desired pressing force, and the sliding member 12 is adjusted so that it can move smoothly within the sliding groove 22a. There is.

This adjustment is performed using the bolt 12e. In this state, the coarse movement stage 20 can smoothly move relative to the fixed base 10. The reason why the wave washer 14e is used here is to enable delicate adjustment of the desired pressing force.

Next, the fixed state of the fixed base 10 and the coarse movement stage 20 is adjusted to the fourth position.
This will be explained using FIG. 4(b) and FIG. 4(c). Fixed stand 1
0 and the coarse movement stage 2o, the rotary arm 13 is also rotated about 60 degrees. This rotation causes the cam pin 16 to move from position P to position S in FIG. 4(C). In this state, the cam 14 is forcibly pushed downward in the Z direction by Δd by the cam pin 16, as shown in FIG. 4(b). This forced downward movement of the cam 14 compresses the disc spring 14a, and its repulsive force pushes the sliding member 12 downward. This pushing down causes the lower surface 12c of the head 12b of the sliding member 12 to be pressed against the upper surface 22b of the sliding groove 22a in the coarse movement stage 20, thereby fixing the fixed base 10 and the coarse movement stage 20.

Note that the amount of rotation of the rotary arm 13 is limited by the cam pin 16 and the area where the inclined groove 16a on the cam 14 is formed.

Furthermore, in the fine movement device 1 of the above embodiment, the coarse movement stage 20
An X stage 30 that can be moved finely in the X direction is mounted on top, and a cross guide 24 is provided between the X stage 30 and the coarse movement stage 20. One side 24a of this cross guide 24 is fixed to the coarse movement stage 20, and the other side 24b is fixed to the X stage 30, and a bearing, etc., for example, is inserted between them in order to slide easily and accurately. .

A fixed arm 27 is fixed to the coarse movement stage 20, and a micrometer 21 is fixed to this fixed arm 27. By moving this micrometer 21, the X stage 3o can be finely moved relative to the coarse movement stage 2°. A second lever 28 is provided on the side surface of the coarse movement stage 2o so as to be rotatable about a shaft 29b. One side of the free end of this lever 28 is in contact with the moving tip 27a of the micrometer 21. A long hole 28a extending in the radial direction is provided in the middle portion of the louver 28, and an X-stage moving pin 29a is fixed in the long hole 2ga. This X
A portion of the stage moving pin 29a, that is, a portion extending from the first lever in a direction perpendicular to the rotational direction, is in contact with a side surface 30a of a block fixed to a side surface of the X stage 30.

The X stage 3o is engaged with the coarse movement stage 2o via a spring spring 126, one end of which is fixed to a protrusion provided on the coarse movement stage 2o, and the other end is fixed to the X stage. has been done. These protrusions can be easily formed by fixing bolts on the coarse movement stage 20.times.stage 30. The spring 26 always urges the coarse movement stage 2o and the X stage 30 relative to each other in a constant direction along the X direction. Therefore, micrometer 2
The tip end 27a of the first lever 27a is always kept pressed against the side surface of the first lever 28. Also, X stage moving pin 2
The side surface of 9a is also always pressed against a part of the X stage 30.

With this configuration, the X stage 30 can be moved in accordance with the amount of movement of the tip portion 27a of the micrometer 21.

Next, the mechanism of the above configuration will be explained in detail using FIG. 5. Note that in FIG. 5, elements given the same reference numbers as in FIGS. 1 and 2 indicate the same elements.

] 2 In FIG. 5, by rotating the operating portion of the micrometer 21, the tip portion 27a moves in the X direction by a movement ff1p corresponding to the amount of rotation. And this tip 2
7a is in contact with the side surface of the louver 28, so the louver 28 rotates around the axis 29b. Therefore, the X stage moving pin 29a fixed in the elongated hole 28a of the second lever 28 is moved in the X direction by approximately pXρ2/p1. The side surface of a part of this X stage moving pin 29a is the side m 30 of the block fixed on the X stage 30.
As a result, this X stage moving pin 29a moves the X stage 3o in the X direction by approximately pXρ2/ρ1
move by the amount. That is, by operating the micrometer 21, the tip 2 of the micrometer 21
The X stage 30 can be moved relative to the coarse movement stage 2o by an amount obtained by reducing the amount of movement of 7a by a predetermined ratio (approximately (12/II l ).In the above embodiment, the amount of movement is reduced. Micrometer 2
The abutting position of the tip end 27a of the first lever 28 on the first lever 28 and the X stage 30 of the X stage moving pin 29a of the second lever 28
By reversing the contact position with respect to the position of contact with the
You can also move 0. In addition, the X stage moving pin 3
By moving the position of 9a within the louver 28 in the radial direction A, the magnification etc. can be easily changed.

For example, Ω1. = 4mm When Sβ2 = 1.3mm,
The magnification is approximately 0.3, and ΩI = 1.5 mm.

If J72=13mm, the magnification is about 1.1, which is about 3.
The magnification can be changed over 7 times. In this way, the amount of movement of the tip of the micrometer is enlarged or reduced by a predetermined magnification, and the X stage or the like can be moved slightly.

In the above embodiment, as shown in FIGS. 1 and 2, an X stage 40 that can be moved slightly in the Y direction is further provided on the X stage 30. This X stage 40 and X stage 30
The relationship between them is the same as the relationship between the X stage 30 and the coarse movement stage 20 described above. That is, X stage 3
A micrometer 31 is fixed at 0, and the tip 37a of this micrometer 31 is in contact with the side surface of a second lever 38 whose rotation center is on the X stage 40. At a predetermined position in the middle of this second lever 38, an
A stage moving pin 39a is fixed, and the side surface of this X stage moving pin 39a is in contact with a block 40a fixed on the X stage 40. And X stage 40
A cross guide 34 is provided between the X stage 30 and the X stage 30 to allow relatively smooth movement.

Further, the X stage 40 and the X stage 30 are connected to each other via a spring 36, and the X stage 40 is always urged in the direction along the Y direction with respect to the X stage 30. Therefore, the tip 37a of the micrometer 31 is always pressed against the side surface of the second lever 38.

Further, the side surface of the X-stage moving pin 39a is always kept pressed against a part of the X-stage 40. With this configuration, the X stage 40 can be moved in accordance with the amount of movement of the tip 37a of the micrometer 31.

Here, the expansion/reduction of the amount of movement of the tip portion 37a of the micrometer 31 is the same as in the case of the X stage 30 described above, so a detailed explanation will be omitted.

Further, a Z stage 50 is provided above the Y stage 40 and is movable slightly in the Z direction with respect to the X stage 40.

This Z stage 50 comes into contact with the tip 47a of the micrometer 41 fixed on the X stage 40, and moves in the Z direction in accordance with the movement of the movable tip 47a. This Z stage 50 is engaged with the X stage 40 via a spring 56, and due to the action of this spring 56, the side surface 50a of the Z stage 50 is
It is pressed against the tip 47a of the. With this configuration, the Z stage 50 moves in the Z direction by the same amount as the amount of movement of the tip 47a of the micrometer 41.

The present invention is not limited to the above embodiments, and various modifications may be made.

Specifically, in the above embodiment, only the X stage is configured to be able to make coarse and fine movements, but the Y stage and Z stage are each provided with a coarse movement stage so that they can also make coarse and fine movements. It's okay.

Further, in the above embodiment, a mechanism for reducing and enlarging the amount of movement using levers is provided for fine adjustment of the X stage and the Y stage, but a similar mechanism for reducing the amount of movement may be provided for the Z stage as well. Furthermore, in the above embodiment, both the X stage and the Y stage are provided with mechanisms for reducing and enlarging the amount of movement.
A movement amount reduction mechanism may be provided only on either one, or a movement amount reduction/enlargement mechanism may not be provided as in the Z stage.

〔Effect of the invention〕

As explained above, in the fine adjustment device of the present invention, by combining the coarse adjustment mechanism and the fine adjustment mechanism, fine adjustment can be made over a wide range. As a result, by applying such a fine movement device to the main body of a measuring device, for example, a prober for testing semiconductor devices, the measurement range thereof can be expanded. Also, by using such a fine movement device,
For example, IM with high integration degree and large chip size.
.

The workability of measuring semiconductor memories such as 4M and 16M is significantly improved.

[Brief explanation of drawings]

1 is an external perspective view of an embodiment of the fine movement device according to the present invention, FIG. 2 is a rear, side and top view of the fine movement device shown in FIG. 1, and FIG. 3 is a view of the fine movement device shown in FIG. 1. 4 is a diagram explaining the fixing mechanism of the coarse movement stage of the fine movement device shown in FIG. 1, and FIG. 5 is a diagram explaining the movement of the coarse movement stage of the fine movement device shown in It is a figure explaining the fine movement mechanism which makes it. 1... Fine movement device, 2... Device body (prober), 1
0...Fixed base, 20...Coarse movement stage, 30...
X stage, 40...Y stage, 50...2 stage, 21.31.41...micrometer. 1 Fixing mechanism diagram

Claims (1)

[Scope of Claims] 1. A fixed base, a first table that can be fixed to the fixed base and coarsely movable in the rotational direction and a predetermined direction, and a micrometer mounted and fixed on the first table. A fine movement device comprising: a second table that can be finely moved in the predetermined direction with respect to the first table in accordance with movement of a moving tip of a meter. 2. The first table has a linear groove, the fixing base has a protrusion in the shape of a rotating body whose outer diameter approximately matches the longitudinal cross-sectional shape of the groove, and the fixing base and the first 2. The fine movement device according to claim 1, wherein said table is movably and rotatably engaged with said groove and said protrusion. 3. The fine movement device according to claim 1 or 2, further comprising a second stage that can be finely moved in a direction orthogonal to the predetermined direction with a micrometer with respect to the first table.