JPH0364487A - Production of amorphous superfine metal wire - Google Patents

Abstract

PURPOSE:To steadily and continuously produce a superfine wire or a very thin strip by keeping an etching soln. at a specified low temp. and specifying the etching rate of the etching soln. having high concn. CONSTITUTION:An amorphous metal wire 2 is wound around a quartz tube 3, this tube 3 is put in a vessel 1 contg. an etching soln. and the vessel 1 is put in a vessel 4 contg. ice and water. When the wire 2 is converted into a superfine wire by chemical etching, the etching soln. in the vessel 1 is kept at a low temp. of 0-20 deg.C and the etching rate of the etching soln. having high concn. is regulated to <=0.1mum/min. The amorphous metal wire may be converted into a very thin strip. Chemical etching can be carried out without roughening the surface of the formed superfine wire or very thin strip.

Description

[Detailed Description of the Invention] [Industrial Application 9'f] The present invention is directed to the commercialization of inductors and transformers using magnetic cores, and the application of high magnetic permeability amorphous magnetism required in wide field applications. The non-^IIl quality planning lines such as invitation fees have been made into thinner lines, ultra-thin.
1: Concerning the il system of ultrafine amorphous metal wires.

[Traditional Fujutsu] The 77 method of thinning and thinning the wire by chemical etching is VL.
It has been held frequently since then. However, these methods use high-concentration etching lfk with a fast etching speed, and are etched at room temperature or under heating.
It was held under 441. Using this method, etching is necessary to create thin or thin lines.
It is necessary to strictly control the agricultural degree, etching & temperature, and ultra-fine wire or ultra-M 4. It cannot be said that this is sufficient for producing jF on a regular basis. Also manufactured ultra-fine wire or poles? '-'j': The surface roughness of 1'l is rough, for example, chemical etching of mesen, jjp may cause local holes, or lines may be formed. or difficult.

[Problems to be solved by Koukyo] Conventional chemical etching uses a relatively highly concentrated etching solution, and etching is performed at room temperature or at a high temperature above the left point. It is not easy to obtain the Law.

The present invention was made in order to solve the above-mentioned scum, and does not make the surface of thin lines and extremely thin lines 12 rough.
, i:i, target, ultra-fine wire, ultra-thin; iii;
(The purpose is to

[One step and action for resolving the problem] The present invention provides a method for manufacturing an amorphous fully bent ultra-fine wire in which an amorphous metal wire is made ultra-fine by chemical etching in order to rapidly produce the above-mentioned IN characteristics. Etching 11k at 0~20℃
It is characterized by keeping the etching rate at 0.1 μm/min or less for highly concentrated etched skin by keeping it at a temperature of It can be manufactured steadily and continuously.

[Length example] Embodiments of the present invention will be described in detail below with reference to the drawings.

The solid line in Fig. 1 indicates the JQ56 etching process using nitric acid I as the etching solution in the room temperature chemical etching of the Co-Fe-3i-B amorphous alloy.
The relationship between force (X) and etching speed is explained by Mizu.

Lj etching speed in 30% area of X is 2μm/
minutes or less. In the 4096<X<70%fn region, etching 1lJ2 concentration is added to jj. In conventional etching, 40% of the area like X was removed, so the ultra-fine lines and poles of the steady machining method were removed by 40%. In order to do this, it was necessary to strictly control the concentration of the etching solution. In the present invention, by lowering the etching wave to a relatively low temperature, the etching liquid is kept at a relatively low temperature of 1ErIl'jj' or the etching speed is set to 0.17Im/min or less, and ultrafine wires with a surface roughness as low as 7:i' are formed. Or ultra-thin (1)? I made it possible to get 1 no. The dotted line and dotted line in FIG. 1 represent the relationship between etching wave density and etching progress at T1 and T2 temperatures, respectively. Here, T1 and T2 have a relationship of T,>room temperature>T2>0°C. As can be seen from the figure, the lower the temperature, the less sensitive to changes in concentration, and the easier it is to control. Using a low-temperature constant temperature 111ii, instill an etching solution with a relatively high concentration at 20℃>T>(,)
By maintaining the temperature at 0.degree. C., it is possible to steadily and continuously obtain a framework of 1 line or extremely thin ÷1) by rubbing the surface.

Specific examples of this invention will be shown below.

Concrete Example-1 Figure 2 shows an overall diagram of the apparatus for chemically etching amorphous metal beams of limited length into multi-station wood.

Add 20% acid to an acid-resistant container and add 1. (1 m) of amorphous metal gland with a diameter of 3 ()7 (m) and a length of 1 m.
A bundle of 0 wires (4"l), 1 and 2 pieces of quality wire, are placed in a transparent quartz frame 3 and placed in a container containing etching solution.':"5
'＋! :I 1 is placed in a warm 1ri/1□ mountain or covered with a container 4 containing ice and water, and the etched skin is kept at 2±0.5°.With this device, Co-Fc-5i-B with a diameter of 10 μ[D], a line with a diameter of 6 μm was rjed by rinsing IIE quality line group 2 3 times, and the surface 111 thickness was ±0.05 μm.
There are 100.

It goes without saying that the etching process should be quickly washed with water and dried. According to this manufacturing method, green 11 yen after thinning is N7
Compared to the public method that composes the method, the production of ultra-fine 11 B,j becomes much easier.

”-L Physical Length Example-2 100.3 figure is Lll-line amorphous total bending 41 or thin:1
FIG. 2 is an overall view of the apparatus when etching is performed continuously using a etchant. Amorphous metal wire or thin; jB: 7 to bobbin 5
The etching liquid contained in the acid-resistant container 6 is guided using the pulley 3 so that it passes through the line or thin film 4 (7).The container 6 is covered with 1G heat to control the temperature of the etching liquid. Rinse the lines quickly with water.
After passing through the container 11 containing the alcoholic liquid, blower] 2
Dry quickly with a drying wind and remove the pillars] 3
Wind it up. The rotational speed of the l1i1 rotation motor 14 is determined by the etching ++:7, that is, the time the line is immersed in the etching 11, the thickness of the line, and the thickness of the line J11! Rikoma 1
4 blood the diameter of 3, 7,! Table FIL by adjusting J
Continuously ultra-fine or ultra-thin without reducing i; 17 or 11I. Etching l (k thick 1 pattern and ?MM
Ta.

[Effects of the Invention] As described above, according to the invention, ultra-fine wires and ultra-thin strips can be processed using chemical elastomers without irradiating the surface.11
j:'; It can be produced continuously. By bundling these wires or stacking them with insulators between them, it is possible to increase the frequency, widen the wires by layering them.
・It became possible to supply 11 (11) magnetic cores needed for the castle.

4. Simple explanation of i+i'j of the eye surface Figure 1 is a characteristic diagram showing the relationship between the etching ratio and the etching liquid level. A diagram showing an example of the entire device for etching metal wire into a large number of wires 11+j. − is.

]... resistance capacity i1:, + , /) ,,, non-1'l
lJ pawn 1! '4,'' = -i'j IIJI quartz tube,
4... Container with ice and water, 5... Hobbin, 6...
Acid-resistant container containing etching solution, 7. Amorphous metal wire or thin, total, 3. Non-slip, 9. ↑ mouth' JR tank, ] 0. Water shower ] 1. Container containing alcohol solution, ]2・
・Blower, 13・Rewinder, 14 Dochuun motor

Claims (3)

[Claims] (1) In a method for manufacturing ultrafine amorphous metal wires in which an amorphous metal wire is made ultrafine by chemical etching, the etching solution is kept at a low temperature of 0 to 20°C, and the etching rate of the high concentration etching solution is set to 0. A method for producing an ultrafine amorphous metal wire, characterized in that the wire is 1 μm/min or less. (2) The method for producing an ultrafine amorphous metal wire according to claim 1, wherein the amorphous metal wire is used as a wire group. (3) The method for producing an ultrafine amorphous metal wire according to claim 1, wherein the amorphous metal wire is a thin ribbon.