JPH0363921A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPH0363921A JPH0363921A JP20092889A JP20092889A JPH0363921A JP H0363921 A JPH0363921 A JP H0363921A JP 20092889 A JP20092889 A JP 20092889A JP 20092889 A JP20092889 A JP 20092889A JP H0363921 A JPH0363921 A JP H0363921A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- vacuum
- substrate
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 239000012535 impurity Substances 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 230000001681 protective effect Effects 0.000 claims abstract description 12
- 239000000956 alloy Substances 0.000 claims abstract description 4
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims 1
- 239000000696 magnetic material Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 15
- 230000003647 oxidation Effects 0.000 abstract description 9
- 238000007254 oxidation reaction Methods 0.000 abstract description 9
- 229910052804 chromium Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 81
- 238000000034 method Methods 0.000 description 14
- 238000004544 sputter deposition Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 229910007880 ZrAl Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910002441 CoNi Inorganic materials 0.000 description 1
- -1 Zr + s Chemical compound 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
本発明は、基板上に磁性記録膜等を形成した磁気記録媒
体及びその製造方法に間するものである。
さらに詳しく述べると、下地膜と磁性膜の成膜の前後の
過程に、真空中の不純物ガスを吸着により排気する非磁
性金属の中間膜を設けて、成膜室の中、特に下地膜と磁
性膜が成膜される場所、の不純物ガスを吸着により排気
し、下地膜及び磁性膜の成膜過程においての酸化を防い
だ磁気記録媒体及びその製造方法に関するものである。The present invention relates to a magnetic recording medium in which a magnetic recording film or the like is formed on a substrate, and a method for manufacturing the same. More specifically, before and after the formation of the base film and magnetic film, a non-magnetic metal intermediate film is provided to exhaust impurity gases in vacuum by adsorption, and the inside of the deposition chamber, especially between the base film and the magnetic film, is installed. The present invention relates to a magnetic recording medium in which impurity gases in a region where a film is formed are exhausted by adsorption to prevent oxidation during the film formation process of a base film and a magnetic film, and a method for manufacturing the same.
磁気ディスク装置の磁気記録媒体は様々な技術を利用し
て製造されているが、近年、ガラス基板の表面にスパッ
タ技術により磁性薄膜を形成したガラスディスクが開発
されている。この様な′８１気記録媒体としては、例え
ば第４図に示すように、ガラス基板（１０）上にＣｒ下
地Ｍ （１２）とＣｏＮｉＣｒやＣｏＮ ｉ等の記録膜
（！４）とＣ保護膜を順次積層した構造がある。
磁気記録媒体は、第６図に示すようなインライン型スパ
ッタ装置により効率よく製造される。プロセス室（２０
）の入口側と出口側にそれぞれ搬入室（２２）、 搬
出室（２４）とが設けられる。プロセス室（２０〉の内
部を高真空に維持するｋめ、搬入室（２２）及び搬出室
（２４）との間はそれぞれアイソレーションバルブ（２
６）、 （２８）で仕切られている。ガラス基板はパ
レットと呼ばれる搬送用の治具に装着されて装置内部を
矢印方向に移動する。プロセス室（２０）内ではまずヒ
ーターによりガラス基板を所定温度に加熱し、ついでＣ
ｒターゲットを持つスパッタステージ（３０）、ＣｏＮ
ｉＣｒターゲットを持つスパッタステージ（３２）、Ｃ
ターゲットを持つスパッタステージ（３４）で順次成膜
が行われる。
Ｃｒはその上に成膜される記録膜の結晶性を向上するた
めに用いられる。
特性の良好な磁気記録媒体を得るために次のような点に
注意にが払われている。
■プロセス室内の到達真空度の向上
■スパッタガスの高純度化
■スパッタリングターゲット材の高純度化Ｃ膜は保護膜
であり、ヘッドとの摩擦から記録膜を保護すると同時に
、記録膜の大気中での腐食を防ぐ。Magnetic recording media for magnetic disk drives are manufactured using various techniques, and in recent years, glass disks have been developed in which a magnetic thin film is formed on the surface of a glass substrate by sputtering technology. For example, as shown in FIG. 4, such a 1981 recording medium includes a glass substrate (10), a Cr base M (12), a recording film (!4) of CoNiCr or CoNi, etc., and a C protective film. There is a structure in which layers are sequentially laminated. Magnetic recording media are efficiently manufactured using an in-line sputtering apparatus as shown in FIG. Process chamber (20
) are provided with a loading chamber (22) and a loading chamber (24) on the entrance and exit sides, respectively. In order to maintain a high vacuum inside the process chamber (20), isolation valves (2
6) and (28). The glass substrate is mounted on a transport jig called a pallet and moved inside the apparatus in the direction of the arrow. In the process chamber (20), the glass substrate is first heated to a predetermined temperature using a heater, and then
Sputter stage (30) with r target, CoN
Sputter stage (32) with iCr target, C
Film formation is performed sequentially on a sputtering stage (34) having a target. Cr is used to improve the crystallinity of the recording film formed thereon. In order to obtain a magnetic recording medium with good characteristics, attention is paid to the following points. ■Improvement of the ultimate vacuum in the process chamber ■High purity of sputtering gas ■High purity of sputtering target material The C film is a protective film that protects the recording film from friction with the head, and at the same time prevent corrosion.
この様な工程管理を厳重に行うのは、下地膜や記録膜の
成膜過程において、それらの膜の酸化をできる限り抑制
するためである。それらの膜の酸化は磁気特性等の劣化
をもたらすため、真空度を１０−’Ｔｏｒｒ以下の高真
空度に保つことが望ましい。
しかしながら、実際の生産においては、上記真空度を高
く保つことは難しく、そのため磁気特性が予想値となら
ず、比較的低い値となってしまうという問題点があった
。
本発明の目的は、下地膜と記録膜の成膜中の酸化が起こ
りにくく、そのため磁気特性が良好である磁気記録媒体
及びその製造方法を提供することである。
ｒａｍを解決するための手段】
本発明は、上記従来の問題点を解決するためになされた
ものであって、基板上に下地膜と記録膜と保護膜とを＊
ｌＬ／た磁気記録媒体において、基板と下地膜との間お
よび記録膜と保護膜との間に、真空中の不純物ガスを吸
着する非磁性金属の中間膜を形成した磁気記録媒体であ
る。
上記磁気記録媒体は、例えば、真空装置内で、基板上に
下地膜と記録膜と保護膜とを積層する磁気記録媒体の製
造方法において、下地膜積層前に基板に真空中の不純物
ガスを吸着し閉じこめ得る非磁性金属の第１中間膜を形
成し、かつ記録膜形成後に真空中の不純物ガスを吸着し
閉じこめ得る非磁性金属の第２中間膜を形成することに
より製造できる。
該非磁性金属の中間膜としては、真空中の不純物ガスを
吸着し閉じこめ得る金属であれば、Ｚｒ。
Ｔｉ、Ｃｒ、Ｍｇ、Ｍｏ等またはこれ等を主成分とする
合金等、任意のものが使用できる。中でもＡｌを含有す
るＺ ｒ、 特にＺ ｒ 自４Ａ ｌ ＋ｓ等Ａｌを
５〜３１５ａｔ％、望ましくは１３〜２０ａ ｔ％金含
有るＺｒを主成分とする合金が、真空中の不純物ガスを
吸着し閉じこめる効果が大きいので好ましい。
又、これ等の中でも酸化により耐食性のある酸化皮膜を
形成するものは耐候性の面でも有効である０例えば、記
録膜の上の該非磁性膜に含まれているＺｒは、成膜後、
大気中にて、保護膜中を通過して浸入してきた０２．Ｈ
２Ｏ等と反応して不動態となり、より強力な保護膜とな
る。
該中間膜の膜厚は、あまり厚いと生産性が低下し、また
あまり薄いと発明の効果が現れにくくなる。そこで例え
ば１１００ｎ〜７００ｎｍの厚さで設けることが好まし
い。The reason why such process control is strictly performed is to suppress oxidation of the base film and recording film as much as possible during the process of forming these films. Since oxidation of these films causes deterioration of magnetic properties, etc., it is desirable to maintain the degree of vacuum at a high degree of vacuum of 10-' Torr or less. However, in actual production, it is difficult to maintain the above-mentioned degree of vacuum at a high level, and as a result, there is a problem in that the magnetic properties do not reach the expected values, but end up being relatively low values. An object of the present invention is to provide a magnetic recording medium that is less prone to oxidation during film formation of a base film and a recording film, and thus has good magnetic properties, and a method for manufacturing the same. [Means for Solving RAM] The present invention was made to solve the above-mentioned problems of the conventional technology.
This is a magnetic recording medium in which a non-magnetic metal intermediate film that adsorbs impurity gas in vacuum is formed between the substrate and the base film and between the recording film and the protective film. For example, in a method for manufacturing a magnetic recording medium in which a base film, a recording film, and a protective film are laminated on a substrate in a vacuum apparatus, impurity gases in vacuum are adsorbed onto the substrate before the base film is laminated. It can be manufactured by forming a first intermediate film of a non-magnetic metal that can absorb and confine impurity gas in a vacuum, and then forming a second intermediate film of a non-magnetic metal that can adsorb and confine impurity gas in a vacuum after forming the recording film. The non-magnetic metal intermediate film may be Zr as long as it is a metal that can adsorb and confine impurity gas in vacuum. Any material can be used, such as Ti, Cr, Mg, Mo, etc., or alloys containing these as main components. Among them, Zr containing Al, especially Zr-based alloys containing 5 to 315 at% Al, preferably 13 to 20 at% gold, such as Zr + s, adsorb impurity gases in vacuum. This is preferable because it has a large confining effect. Among these, those that form a corrosion-resistant oxide film through oxidation are also effective in terms of weather resistance.For example, Zr contained in the non-magnetic film on the recording film is
02. which penetrated through the protective film in the atmosphere. H
It reacts with 2O and becomes passive, forming a stronger protective film. If the thickness of the intermediate film is too thick, productivity will decrease, and if it is too thin, the effects of the invention will not be apparent. Therefore, it is preferable to provide the layer with a thickness of, for example, 1100 nm to 700 nm.
本発明は真空装置内の真空度の向上を計るものであるが
、真空度の低下をもたらす原因としては、外気のリーク
の外、基板からの脱ガスの効果も大きい、特にガラス基
板の場合、基板の表面にはＨ２Ｏ１０ｔ＋ ＯＨ基等
が吸着している。そして一般に下地膜形成前には下地膜
の結晶性を増加させ、記録膜のエピタキシャル成長を向
上させるため基板加熱を行う、この時、基板加熱によっ
てガラス基板に吸着していたＨ２Ｏ，０２，ＯＨ基等の
一部はガラス基板から解離してプロセス室内に拡散し、
成膜時の雰囲気ガス（Ａｒガス）中の酸素分圧が高くな
る。そのため、ターゲットからスパッタされた原子は基
板表面に到達する前に酸化したり、基板に到達した段階
で雰囲気中の酸素を取り込んで酸化する問題が生じる。
本発明によれば、ガラス等の基板上及び記録膜上に形成
した非磁性中間膜は、不純物ガスを吸着するゲッター作
用により、真空室内の活性ガスを吸着して排気し、不純
物ガス分圧を下げる。すなわち、基板上に、ゲッターポ
ンプのヘッドを形成したのと同様の効果を持つ。
これによって、下地膜と記録膜を成膜する場所の前後で
不純物ガスだけが選択的に排気され、下地膜と記録膜が
成膜される場所の不純物ガス分圧が下がり、磁気特性に
特に影響を与える下地膜および磁性膜成膜中の酸化が防
止される。
膜の酸化が防止されることにより、下地膜の結晶性は向
上し、膜厚が薄くてもその上に良好な記録膜を成長させ
ることができる。また、記録膜自体も成膜中の不純物ガ
スの取り込みがなく、高純度である。The present invention aims to improve the degree of vacuum within a vacuum device, but the cause of the decrease in the degree of vacuum is not only the leakage of outside air but also the effect of degassing from the substrate, especially in the case of a glass substrate. H2O10t+ OH groups and the like are adsorbed on the surface of the substrate. Generally, before forming the base film, the substrate is heated to increase the crystallinity of the base film and improve the epitaxial growth of the recording film. Some of it dissociates from the glass substrate and diffuses into the process chamber,
The oxygen partial pressure in the atmospheric gas (Ar gas) during film formation increases. Therefore, the problem arises that the atoms sputtered from the target are oxidized before reaching the substrate surface, or that they take in oxygen from the atmosphere and oxidize upon reaching the substrate. According to the present invention, the nonmagnetic intermediate film formed on the substrate such as glass and the recording film adsorbs and exhausts the active gas in the vacuum chamber by the getter action that adsorbs the impurity gas, thereby reducing the partial pressure of the impurity gas. Lower it. In other words, it has the same effect as forming the head of a getter pump on the substrate. As a result, only the impurity gas is selectively exhausted before and after the location where the base film and recording film are formed, reducing the partial pressure of the impurity gas at the location where the base film and recording film are deposited, which particularly affects the magnetic properties. This prevents oxidation during the formation of the underlying film and magnetic film. By preventing oxidation of the film, the crystallinity of the base film is improved, and even if the film is thin, a good recording film can be grown thereon. Furthermore, the recording film itself does not incorporate impurity gases during film formation and is highly pure.
第１図は本発明にかかる磁気記録媒体の一実施例を示す
拡大断面図である。ｉｌ磁気記録媒体４ｏ）は、ガラス
基板（１０）上にまず第１中間膜０４）をもうけ、その
上に順次Ｃ「下地膜（１２）、ＣｏＮｉＣｒ記録膜（１
４〉、第２中間膜（５の、Ｃ保護膜（１６）を形成した
構造である。
本発明の特徴は、ＣｒとＣｏＮｉＣｒをはさむ中間膜を
設けた点である。
この様な磁気記録媒体は、例えば第２図に示す様な、搬
送装置を内蔵し１つの真空系容器の中に複数のターゲッ
トを持つ、インライン型スパッタ装置を使用して製造で
きる。このスパッタ装置では、基本的には従来の場合と
同様、プロセス室（６０）の入口側及び出口側にそれぞ
れガラスディスク基板の搬入室（２２）と搬出室（２４
）とが設けられ、それらの間にアイソレーションパルプ
（２６）、 （２８）が取り付けられている。プロセ
ス室（６０）内には搬入側から搬出側に向かって順次Ｚ
ｒ ｓａＡ ｌ ＋ａケタ−ットを持つ第一のスパッ
タステージ（７４）、Ｃｒターゲットを持つ第二のスパ
ッタステージ（３の、ＣｏＮ１ｃｒターゲツトを持つ第
三のスパッタステージ（３２）、Ｚ ｒ Ａ ｌターゲ
ットを持つ第四のスパッタステージ（８の、Ｃターゲッ
トを持つ第五のスパッタステージ（３４）が配列されで
いる。
ガラスディスク基板（１０）は、搬入室（２２）から真
空室内に搬入され、真空室内を移動しながら順次Ｚ ｒ
Ａ Ｉ膜（４４）、 Ｃｒ膜（＋２）、ＣｏＮｉＣ
ｒ膜（１４）、第２ＺｒＡ１膜（５０）、 Ｃ膜（１
６）が被覆される。
実施例の作成諸条件は、以下の通りとした。
基板加熱温度 ３５０℃基板搬送速度
１８０ｍｍ／ｍ ｉ ｎ第１ＺｒＡ１ターゲツ
ト投入パワー
１．１Ｗ／ｃｍ２
Ｃｒターゲット投入パワー
３、 ７−６、 ５Ｗ／ｃｍ２
ＣｏＮｉＣｒターゲット投入パワー
２、 ３ Ｗ／ ｃ ｍ２
第２ＺｒＡｌターゲツト投入パワー
０．３Ｗ／ｃｍ２
Ｃターゲット投入パワー １．５Ｗ／ｃｍ２到達真空度
５Ｘ１０−７ＴｏｒｒスパツタＡｒガス圧
力 １Ｏ−２Ｔｏｒｒ膜厚
第１ＺｒＡｌ ３５ｎｍ
Ｃｒ ８０〜１４０ｎｍＣｏＮｉＣｒ
６０ｎｍ
第２２ｒＡｌ １０ｎｍ
Ｃ３０ｎｍ
この様な製造方法によって試作したｍ気記録媒体の静磁
気特性を第３図に示す、また、第３図に、実施例の条件
とほぼ同様の排気条件、スパッタ条件で作製した、非磁
性中間膜を持たない前記従来構造の磁気記録媒体の特性
を同様に示す。
第３図から本実施例により作製されに磁気記録媒体は、
良好な８１ス特性を有し、従来品に較べて薄いＣｒ膜厚
て同程度の静磁気特性が得られることがわかる。
ここでは加熱前に非磁性膜を基板上に設けたが、加熱後
でもよい。加熱用のステージで発生した不純物ガスは、
下地膜を成膜するステージに達する前に、非磁性膜上に
吸着され、排気される。
しかしながら、加熱前に成膜したほうが、吸着している
Ｈ２Ｏ等を基板上にある状態で吸着すること、及び、Ｚ
ｒＡｌが２００℃以上で吸着作用が大きいこと等から望
ましい。
上記実施例においては、基板としてガラス基板を用いて
いるが、ガラス基板は基板からのガス脱着が多く本発明
の効果が大きく表れる。しかしながら、該基板はガラス
基板に限られず、無機質基板等任意の基板が使用できる
。FIG. 1 is an enlarged sectional view showing an embodiment of a magnetic recording medium according to the present invention. In the magnetic recording medium 4o), a first intermediate film 04) is first formed on a glass substrate (10), and then a C base film (12) and a CoNiCr recording film (12) are sequentially formed on the first intermediate film 04).
4> This is a structure in which a second intermediate film (5, C protective film (16) is formed. The feature of the present invention is that an intermediate film sandwiching Cr and CoNiCr is provided. Such a magnetic recording medium can be manufactured using, for example, an in-line type sputtering device as shown in Fig. 2, which has a built-in conveyance device and multiple targets in one vacuum container.In this sputtering device, basically, As in the conventional case, there are a loading chamber (22) and an unloading chamber (24) for glass disk substrates at the entrance and exit sides of the process chamber (60), respectively.
), and isolation pulps (26) and (28) are installed between them. Inside the process chamber (60), there is a Z
A first sputter stage (74) with a r saA l +a digit target, a second sputter stage (32) with a Cr target, a third sputter stage (32) with a CoN1 cr target, a Z r A l target A fifth sputtering stage (34) having a C target is arranged.The glass disk substrate (10) is carried into the vacuum chamber from the loading chamber (22), and is placed in a vacuum chamber. Z r sequentially while moving around the room
AI film (44), Cr film (+2), CoNiC
r film (14), second ZrA1 film (50), C film (1
6) is coated. The conditions for creating the example were as follows. Substrate heating temperature 350℃ Substrate transfer speed
180mm/min 1st ZrA1 target input power 1.1W/cm2 Cr target input power 3, 7-6, 5W/cm2 CoNiCr target input power 2, 3 W/cm2 2nd ZrAl target input power 0.3W/cm2 C Target input power 1.5W/cm2 Ultimate vacuum 5X10-7 Torr Sputtering Ar gas pressure 1O-2 Torr Film thickness 1st ZrAl 35 nm Cr 80-140 nm CoNiCr
60nm 22rAl 10nm C30nm Figure 3 shows the magnetostatic characteristics of the m-air recording medium prototyped using this manufacturing method. The characteristics of the magnetic recording medium of the conventional structure without a non-magnetic intermediate film are similarly shown. From FIG. 3, the magnetic recording medium produced according to this example is as follows:
It can be seen that the product has good 81-stance characteristics, and that comparable magnetostatic properties can be obtained with a thinner Cr film than the conventional product. Although the nonmagnetic film was provided on the substrate before heating here, it may be provided after heating. The impurity gas generated on the heating stage is
Before reaching the stage where the base film is formed, it is attracted onto the nonmagnetic film and evacuated. However, it is better to form the film before heating because the adsorbed H2O, etc. can be adsorbed on the substrate, and the Z
It is desirable that rAl has a strong adsorption effect at temperatures above 200°C. In the above embodiments, a glass substrate is used as the substrate, and the effect of the present invention is greatly exhibited in the case of a glass substrate, in which a large amount of gas is desorbed from the substrate. However, the substrate is not limited to a glass substrate, and any substrate such as an inorganic substrate can be used.
上記実施例にみられるように、ＣｒとＣｏＮｉＣｒの前
後でゲッタースパッタを行うことは、不純物ガス分圧を
下げることができる点で好ましい。As seen in the above embodiment, it is preferable to perform getter sputtering before and after Cr and CoNiCr because the impurity gas partial pressure can be lowered.
第１図は実施例で作製しに磁気記録媒体の断面構造を示
す断面図、第２図は実施例で使用したスパッタリング装
置の構成を示す構成図、第３図は実施例および従来例の
Ｃｒ下地膜の膜厚と保磁力の間係を示す図、第４図は従
来の磁気記録媒体の断面構造を示す瞬断図、第５図は従
来のスパッタリング装置の構成を示す構成図である。
Ｃｒ下地膜の膜厚６］
第３図
第２図Fig. 1 is a cross-sectional view showing the cross-sectional structure of the magnetic recording medium produced in the example, Fig. 2 is a block diagram showing the configuration of the sputtering apparatus used in the example, and Fig. 3 is a Cr FIG. 4 is a cross-sectional view showing the cross-sectional structure of a conventional magnetic recording medium, and FIG. 5 is a diagram showing the configuration of a conventional sputtering apparatus. Film thickness of Cr base film 6] Fig. 3 Fig. 2
Claims (3)
気記録媒体において、基板と下地膜との間および記録膜
と保護膜との間に、真空中の不純物ガスを吸着する非磁
性金属の中間膜を形成したことを特徴とする磁気記録媒
体。(1) In a magnetic recording medium in which a base film, a recording film, and a protective film are laminated on a substrate, there is a non-containing material that adsorbs impurity gases in vacuum between the substrate and the base film and between the recording film and the protective film. A magnetic recording medium characterized by forming an intermediate film of magnetic metal.
ａｔ％含有するＺｒを主成分とする合金を用いる磁気記
録媒体。(2) As the intermediate film of the non-magnetic metal, 13 to 20% Al
A magnetic recording medium using an alloy whose main component is Zr containing at%.
とを積層する磁気記録媒体の製造方法において、下地膜
積層前に基板に真空中の不純物ガスを吸着し閉じこめ得
る非磁性金属の第１中間膜を形成し、かつ記録膜形成後
に真空中の不純物ガスを吸着し閉じこめ得る非磁性金属
の第２中間膜を形成することを特徴とする磁気記録媒体
の製造方法。(3) In a method of manufacturing a magnetic recording medium in which a base film, a recording film, and a protective film are laminated on a substrate in a vacuum device, a non-magnetic material that can adsorb and trap impurity gases in vacuum on the substrate before laminating the base film is used. A method of manufacturing a magnetic recording medium, comprising forming a first intermediate film of metal, and forming a second intermediate film of non-magnetic metal capable of adsorbing and trapping impurity gas in vacuum after forming the recording film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20092889A JP2819637B2 (en) | 1989-08-02 | 1989-08-02 | Magnetic recording medium and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20092889A JP2819637B2 (en) | 1989-08-02 | 1989-08-02 | Magnetic recording medium and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0363921A true JPH0363921A (en) | 1991-03-19 |
| JP2819637B2 JP2819637B2 (en) | 1998-10-30 |
Family
ID=16432616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20092889A Expired - Fee Related JP2819637B2 (en) | 1989-08-02 | 1989-08-02 | Magnetic recording medium and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2819637B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013149320A (en) * | 2012-01-19 | 2013-08-01 | Fuji Electric Co Ltd | Method for manufacturing magnetic recording medium |
-
1989
- 1989-08-02 JP JP20092889A patent/JP2819637B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013149320A (en) * | 2012-01-19 | 2013-08-01 | Fuji Electric Co Ltd | Method for manufacturing magnetic recording medium |
| US9928866B2 (en) | 2012-01-19 | 2018-03-27 | Fuji Electric Co., Ltd. | Method for manufacturing magnetic recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2819637B2 (en) | 1998-10-30 |
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