JPH0363910A - Magnetic head and production thereof - Google Patents
Magnetic head and production thereofInfo
- Publication number
- JPH0363910A JPH0363910A JP19978389A JP19978389A JPH0363910A JP H0363910 A JPH0363910 A JP H0363910A JP 19978389 A JP19978389 A JP 19978389A JP 19978389 A JP19978389 A JP 19978389A JP H0363910 A JPH0363910 A JP H0363910A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- magnetic
- magnetic head
- track width
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 235000012431 wafers Nutrition 0.000 claims abstract description 50
- 238000004804 winding Methods 0.000 claims abstract description 25
- 239000011521 glass Substances 0.000 claims abstract description 9
- 238000005520 cutting process Methods 0.000 claims abstract description 6
- 238000003466 welding Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 11
- 238000003825 pressing Methods 0.000 claims 3
- 239000003082 abrasive agent Substances 0.000 claims 1
- 238000002788 crimping Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 6
- 238000005498 polishing Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000006247 magnetic powder Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はVTRなどに用いる磁気ヘッド及びてれの製法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a magnetic head and a beam used in a VTR or the like.
(従来の技術)
従来VTR等に用いられる磁気ヘッドにおいて特にダブ
ルアジマスヘッドの場合は、チップベースの上へ2つの
磁気ヘッドチップが接近して並べて配置されている。磁
気テープは2つの磁気ヘッドの摺接面に跨がって密接し
て移動し、この時磁気ヘッドの内側エツジ部分がテープ
と強く接するため、本来は記録再生に関与してはならな
い箇所であるにも拘らず、一種の擬似ギャップとして作
用し、同一アジマスヘッドの信号を拾って画面に縦縞カ
ラーノイズを発生する。これを防止するため第22図、
第23図に示す如く摺接面の内側エツジをカットするこ
とが行なわれている。(Prior Art) Conventionally, in the case of a double azimuth head in a magnetic head used in a VTR or the like, two magnetic head chips are arranged close to each other on a chip base. The magnetic tape moves closely across the sliding surfaces of the two magnetic heads, and at this time the inner edge of the magnetic head comes into strong contact with the tape, so this is a part that should not normally be involved in recording and playback. Nevertheless, it acts as a kind of pseudo gap, picking up signals from the same azimuth head and generating vertical striped color noise on the screen. To prevent this, Fig. 22,
As shown in FIG. 23, the inner edge of the sliding surface is cut.
第22図の例は磁性ウェハーがブロック状態にあるとき
、ブロックのエツジヘ一連にグラインダー加工を施した
ものである。ブロック状態の段階で加工する製法である
から、製造が簡単であり、複数の磁気ヘッドに対し一挙
に実施出来るメリットがある。しかし加工後のエツジ(
13)はギャップ部(3)のアジマス角と同じ角度で平
行に形成されるため、ノイズ防止効果は充分とは言い難
い。In the example shown in FIG. 22, when the magnetic wafer is in a block state, the edges of the block are subjected to a series of grinding processes. Since this is a manufacturing method in which processing is performed in the block state, manufacturing is simple and has the advantage that it can be applied to a plurality of magnetic heads at once. However, the edge after processing (
13) is formed parallel to the azimuth angle of the gap portion (3), so the noise prevention effect cannot be said to be sufficient.
第23図の例では、先ず磁性ウェハーから一対のヘッド
チップ(1) (2)及び(la) (2a)を未加工
の状態で作り出し、ヘッドベース上へ固着して完成した
後、ダイヤモンドグラインダー(28)をヘッドチップ
の内側エツジへ当て、チップベースと平行に移動させる
ことにより、ギャップ部(3)とは平行でないカットエ
ツジ(13)を形成するものである。In the example shown in Fig. 23, a pair of head chips (1), (2), and (la), (2a) are first produced in an unprocessed state from a magnetic wafer, and then fixed onto a head base to complete the process. 28) is applied to the inner edge of the head chip and moved parallel to the chip base, thereby forming a cut edge (13) that is not parallel to the gap portion (3).
この実施例はカットエツジ(13)がギャップ部(3)
とは非平行であるから、ノイズの防止効果は高く、性能
の高い磁気ヘッドを製作出来る。しかし製造工程の途中
で、ブロック状態の段階で実施することは出来ず、ヘッ
ドチップを完成してヘッドベースへ固着した後、最終段
階として実施するから手間が掛かり、生産効率が低い。In this embodiment, the cut edge (13) is the gap part (3).
Since they are non-parallel, the noise prevention effect is high and a magnetic head with high performance can be manufactured. However, this cannot be carried out at the block state stage in the middle of the manufacturing process, and is carried out as the final stage after the head chip is completed and fixed to the head base, which is time-consuming and has low production efficiency.
しかも、カットエツジ(13)はテープの摺接方向と直
交しているためカットエツジ(13)の部分に汚れが付
着し易い問題がある。Furthermore, since the cut edge (13) is perpendicular to the sliding direction of the tape, there is a problem in that dirt tends to adhere to the cut edge (13).
特開昭62−60104号公報、62−60105号公
報(JIIB 5/127)には第24図aSbSc
に示す磁気ヘッドの例が説明されている。第24図aの
例は、内側のヘッドチップ(2)の内側エツジ(13)
をギャップ部(3)に対し非平行に設けてノイズの減少
を計ったのである。24 aSbSc
An example of the magnetic head shown in FIG. The example in Figure 24a shows the inner edge (13) of the inner head tip (2).
was provided non-parallel to the gap portion (3) in order to reduce noise.
第24図すの例は、内側のヘッドチップ(2)の両側を
対称的に傾斜させ、ギャップ部(3)に対し非平行とし
たものである。In the example shown in FIG. 24, both sides of the inner head chip (2) are symmetrically inclined and are non-parallel to the gap portion (3).
第24図Cの磁気ヘッドは、内側のヘッドチップ(2)
をギャップ部(3)の幅と同程度に細くし、内側エツジ
(13)をギャップ部(3)に対し非平行としたもので
ある。The magnetic head in Figure 24C has an inner head chip (2).
is made as thin as the width of the gap portion (3), and the inner edge (13) is made non-parallel to the gap portion (3).
第24図aSbScの磁気ヘッドについては、それの製
造方法は開示されておらず、しかも第24図すのヘッド
部は内側エツジ(13)がV字状に尖っているため、磁
気テープがヘッド摺接面に接しながら摺動するとき、内
側エツジの先端がテープを傷付は易い問題がある。As for the magnetic head shown in FIG. 24 aSbSc, the manufacturing method thereof is not disclosed, and furthermore, since the inner edge (13) of the head portion shown in FIG. When sliding in contact with the contact surface, there is a problem in that the tip of the inner edge easily damages the tape.
第24図Cの磁気ヘッドは内側のヘッドチップ(2)が
トラック幅と同程度の細幅に削られるため、強度を下げ
、且つ摩耗し易い問題がある。In the magnetic head shown in FIG. 24C, the inner head chip (2) is cut to a narrow width comparable to the track width, which reduces its strength and makes it prone to wear.
(解決すべき問題点)
本発明はダブルアジマスヘッド方式の磁気ヘッドにおい
て、内側ヘッドチップのエツジが磁気テープに摺接した
時に、それがノイズの原因となること及び磁気テープの
傷付けを防止することを目的とし、更に該磁気ヘッドの
製造方法を明らかにするものである。(Problems to be Solved) An object of the present invention is to prevent the edge of the inner head chip from causing noise and damaging the magnetic tape when it comes into sliding contact with the magnetic tape in a double azimuth head type magnetic head. The purpose of this paper is to clarify the manufacturing method of the magnetic head.
(解決するための手段1)
本発明の磁気ヘッドの第1例(第1図)は、内側へヘッ
ドチップ(2)のテープ摺接面の内側エツジの両側方か
ら中央へ向けて先細に且つギャップ部(3)に対し非平
行に傾斜させ、内側エツジ(5)(5)の先端に平坦面
(6)を備えたものである。(Means for Solving the Problem 1) A first example of the magnetic head of the present invention (FIG. 1) has a tape-sliding surface of the head chip (2) tapered inward from both sides of the inner edge toward the center. It is inclined non-parallel to the gap portion (3) and has a flat surface (6) at the tip of the inner edge (5).
上記磁気ヘッドの製造は、磁性ウェハー(8)(9)の
表面に非磁性膜(14)を形成した後(第4図)、一方
の磁性ウェハー(9)の非磁性膜側の表面に対し、巻線
窓用溝(17)及び硝子溶着用溝(16)を平行に形成
する(第5図)。The above magnetic head is manufactured by forming the non-magnetic film (14) on the surfaces of the magnetic wafers (8) and (9) (Fig. 4), and then applying the , a winding window groove (17) and a glass welding groove (16) are formed in parallel (FIG. 5).
次に2つのウェハー(8) (9)の非磁性膜側の表面
へ巻線窓用溝(17)と直交する方向へトラック幅の小
条(20)を残してトラック幅加工の溝(18)を夫々
平行に形成する(第6図)。2つの磁性ウェハー(8)
(9)を、非磁性膜(14)の面を重ね合わせ、トラ
ック幅の小条(20)が互いに一致する様、位置決めし
て圧力と熱を加え、両者を圧着する(第7図)。Next, track width grooves (18) are left on the non-magnetic film side surfaces of the two wafers (8) (9) in a direction perpendicular to the winding window groove (17). ) are formed parallel to each other (Fig. 6). 2 magnetic wafers (8)
(9) are placed on top of each other with the surfaces of the non-magnetic film (14), positioned so that the track width stripes (20) coincide with each other, and pressure and heat are applied to bond them together (FIG. 7).
圧着した2枚のウェハーの内、巻線窓用溝(17)を有
しない側のウェハー(8)の外表面に対しギャップ部(
3)のピッチで三角山の凹凸加工を行ない(第8図)、
両側の傾斜面(5) (5)はギャップ部(3)に対し
傾斜すると共に傾斜面(5) (5)の先端は尖らさず
に細幅の平坦面(6)を残す。Of the two wafers crimped together, the gap portion (
3) Process the unevenness of the triangular ridge at the pitch (Fig. 8),
The sloped surfaces (5) (5) on both sides are sloped with respect to the gap (3), and the tips of the sloped surfaces (5) (5) are not sharp, leaving a narrow flat surface (6).
ウェハーの圧着体を巻線窓用溝(17)のピッチで、三
角山の凹凸と直交して切断(24) L第9図の棒状ブ
ロック体を得る。これに摺接面の曲面加工(h)を施し
た後、ギャップ部(3)のピッチで且つ所定アジマス角
αで切断(26) L、第1図に示す1個の磁気ヘッド
を製造する。The crimped wafer body is cut (24) at the pitch of the winding window grooves (17) and perpendicular to the unevenness of the triangular ridges to obtain a rod-shaped block body as shown in FIG. After the sliding surface is curved (h), the magnetic head is cut at the pitch of the gap portion (3) and at a predetermined azimuth angle α (26).One magnetic head shown in FIG. 1 is manufactured.
第2図は第1図すの磁気ヘッドに於ける硝子溶触部(4
)の他の実施例を示しており、磁気ヘッドを正面から見
ると硝子溶融部(4)の幅はテープ摺接面から巻線窓用
溝(17)側に徐々に縮小しており、平面図は第1図a
と同様である。Figure 2 shows the glass melting part (4) in the magnetic head shown in Figure 1.
), and when the magnetic head is viewed from the front, the width of the glass melting part (4) gradually decreases from the tape sliding contact surface to the winding window groove (17) side, making it a flat surface. The figure is Figure 1a
It is similar to
(手段1の作用効果)
磁気ヘッドは内側チップ(2)のエツジ(5)の両側が
対称的に且つギャップ部(3)に対し、非平行に傾斜し
、先端に細幅(トラック幅の約3分の1)の平坦部(6
)を形成しているから、磁気テープが摺接面を移動して
も内側エツジは先端が平坦部(6)であるから、テープ
を傷付けることはなく、又ヘッドに磁性粉の付着等ヘッ
ドの汚れを防止出来る。(Operation and Effect of Means 1) In the magnetic head, both sides of the edge (5) of the inner chip (2) are inclined symmetrically and non-parallel to the gap part (3), and the tip has a narrow width (approximately the track width). 1/3) of the flat part (6
), even if the magnetic tape moves on the sliding surface, the inner edge has a flat tip (6), so the tape will not be damaged, and the head will not be damaged by magnetic powder adhering to the head. Can prevent dirt.
(解決するための手段2)
本発明の磁気ヘッドの第2例(第10図)は、内側ヘッ
ドチップ(2)の内側エツジ(30)を放物線状或いは
楕円状に形成し、且つエツジ(30)の高さは摺接面よ
り低めた磁気ヘッドを特徴とする。(Means for Solving 2) In a second example (FIG. 10) of the magnetic head of the present invention, the inner edge (30) of the inner head chip (2) is formed in a parabolic or elliptical shape, and the edge (30) is formed in a parabolic or elliptical shape. ) is characterized by a magnetic head whose height is lower than the sliding surface.
上記磁気ヘッドの製造は、本発明の磁気ヘッド第1例の
製造と途中まで同一である。2枚のウェハー(8) (
9)に非磁性膜を形成すると共に、一方のウェハー表面
にはギヤツブ部加工を施し、他方のウェハー表面にはギ
ヤツブ部加工及び巻線窓用溝及び溶融硝子用溝を施し、
2つのウェハーの凸条を位置決めして圧着し、圧着体を
形成する(第7図)。該圧着体の表面に溝加工をせず、
そのまま巻線窓用溝のピッチでスライスし、棒状のブロ
ック(第11図)を得る。該棒状ブロックのテープ摺接
面に曲面加工を施した後、内側チップ(8)の内側エツ
ジ(30)に相当する部分へギャップ部(3)のピッチ
で斜めに切込溝(32)を施し、ギャップ部(3)より
稍広い幅の凸条(34)をギャップ部(3)と同じ等間
隔に形成する(第12図)。The manufacturing of the magnetic head described above is the same as that of the first example of the magnetic head of the present invention. Two wafers (8) (
In addition to forming a non-magnetic film on 9), one wafer surface is processed with a gear part, and the other wafer surface is processed with a gear part and a groove for a winding window and a groove for molten glass,
The protrusions of the two wafers are positioned and crimped to form a crimped body (FIG. 7). No grooves are formed on the surface of the crimped body,
It is then sliced at the pitch of the winding window groove to obtain a bar-shaped block (Fig. 11). After applying a curved surface to the tape sliding contact surface of the rod-shaped block, cut grooves (32) are formed diagonally at the pitch of the gap portion (3) in a portion corresponding to the inside edge (30) of the inside tip (8). , protrusions (34) having a slightly wider width than the gap portion (3) are formed at the same regular intervals as the gap portion (3) (FIG. 12).
凸条(34)に対し、研磨テープ(36)を斜めに当て
テープを移動して凸条(34)の摺接面及び先端と両側
エツジを包むように研磨する(第13図)。The polishing tape (36) is applied diagonally to the protrusion (34) and the tape is moved so as to cover the sliding surface, tip, and both edges of the protrusion (34) (FIG. 13).
各凸条は切削加工によって形成されたときは、長方形の
角張った形状であったが、研磨テープ(36)による研
磨加工を受けることによって、各凸条(34)は摺接面
が研磨されて高さが低まり且つ両側エツジと先端エツジ
は放物線或いは楕円状の曲面となる。When each protrusion was formed by cutting, it had a rectangular and angular shape, but by polishing with the polishing tape (36), the sliding contact surface of each protrusion (34) was polished. The height decreases and the edges on both sides and the top edge become parabolic or elliptical curved surfaces.
(手段2の作用効果)
磁気ヘッドの内側チップの凸条(34)は摺接面が研磨
されて高さが低まるから磁気ヘッドの摺接面を通過する
磁気テープは内側エツジ(30)には接触せず、従って
磁気テープの傷付き及び磁気粉の付着は起こらない。し
かも、内側チップのエツジ(30)は放物線又は楕円状
であるから、エツジ部(3)とは非平行となり、ノイズ
防止効果を高めることが出来る。(Effect of Means 2) Since the sliding contact surface of the convex strip (34) on the inner chip of the magnetic head is polished and its height is reduced, the magnetic tape passing through the sliding contact surface of the magnetic head is placed on the inner edge (30). do not come into contact with each other, so the magnetic tape will not be scratched or magnetic powder will stick to it. Moreover, since the edge (30) of the inner chip has a parabolic or elliptical shape, it is non-parallel to the edge part (3), and the noise prevention effect can be enhanced.
(解決するための手段3)
本発明の磁気ヘッドの第3例(第15図)は内側ヘッド
チップ(2)の先端エツジ(36)がギャップ部(3)
に対し逆アジマス角度に形成したものである。本発明の
方法によれば、エツジ部(36)がギャップ部(3)の
アジマス角度の傾斜に対し、逆アジマス角のエツジ直線
A又はギャップ部(3)と平行なエツジC又はチップベ
ースに対し垂直方向直線Bの如く任意の角度に形成出来
るものである。エツジ(36)が直線Cの場合は、第2
2図aの形状に相当する。直線Bの場合は第23図aの
形状に相当する。(Means for Solving 3) In the third example (FIG. 15) of the magnetic head of the present invention, the tip edge (36) of the inner head chip (2) is connected to the gap portion (3).
It is formed at a reverse azimuth angle. According to the method of the present invention, the edge portion (36) is formed with respect to the edge straight line A at the opposite azimuth angle with respect to the inclination of the azimuth angle of the gap portion (3), or with respect to the edge C parallel to the gap portion (3) or the chip base. It can be formed at any angle like a vertical straight line B. If the edge (36) is a straight line C, the second
It corresponds to the shape in Figure 2a. The straight line B corresponds to the shape shown in FIG. 23a.
上記磁気ヘッドの製造は本発明の第1例に於ける製法と
較べて2枚のウェハー(8) (9)を圧着する第7図
の工程までは同一である。その後巻線窓用溝(17)を
施さない側のウェハー外表面に対し、ギャップ部(3)
のピッチで鋸歯状溝(38)を形成する(第17図)。The manufacturing method of the magnetic head described above is the same as the manufacturing method in the first example of the present invention up to the step shown in FIG. 7 in which two wafers (8) and (9) are bonded together. After that, the gap part (3) is formed on the outer surface of the wafer on the side where the winding window groove (17) is not formed.
Serrated grooves (38) are formed at a pitch of (Fig. 17).
次に圧着ウェハーを巻線窓用溝のピッチでスライスし棒
状ブロック(第18図)を得る。これをギャップ部(3
)を含み所定アジマス角でスライスして鋸歯溝(38)
の斜面を先端エツジとする第15図のエツトチップを得
る。該ヘッドチップは第19′図a、bに示すとおり先
端エツジ(36)の角度で上下高さ全長に亘って鋸歯溝
の斜面(38)が形成されている。Next, the crimped wafer is sliced at the pitch of the winding window grooves to obtain bar-shaped blocks (FIG. 18). This is the gap part (3
) and slice it at a predetermined azimuth angle to form a sawtooth groove (38).
The etching tip shown in FIG. 15 is obtained, with the slope of the tip as the tip edge. As shown in FIGS. 19'a and 19'b, the head chip has a sawtooth groove slope (38) formed at an angle of the tip edge (36) over the entire vertical height.
第20図、第21図は上記第3例を変形したものであっ
て、上記ウェハーの圧着体に対し内側ウェハー(8)の
先端エツジに相当する部分にのみ鋸歯溝加工(40)を
施したものである。これをスライスして棒状ブロック体
を作り更にカットして第21図aSbの磁気ヘッドピー
スを得る。該磁気ヘッドの内側ヘッドチップ(2)の先
端エツジ(36)は途中の段(42)までは鋸歯溝の斜
面であるが、それから下方はヘッドチップ(2)の厚さ
になる。Figures 20 and 21 show a modification of the third example, in which sawtooth grooves (40) are applied only to the portion of the wafer crimped body that corresponds to the tip edge of the inner wafer (8). It is something. This is sliced to form a rod-shaped block and further cut to obtain the magnetic head piece shown in FIG. 21aSb. The tip edge (36) of the inner head chip (2) of the magnetic head is a slope of a sawtooth groove up to a step (42) in the middle, but the thickness below is the thickness of the head chip (2).
(第3手段の作用効果)
本発明第3例の製法はウェハー圧着体の外表面に形成す
る鋸歯溝(38)の斜面を適当な希望する角度に設定す
ることによって磁気ヘッドチップの先端エツジの角度を
自由に変えることが出来るのである。(Operation and Effect of the Third Means) The manufacturing method of the third example of the present invention is such that the tip edge of the magnetic head chip is formed by setting the slope of the sawtooth groove (38) formed on the outer surface of the wafer crimped body to an appropriate desired angle. The angle can be changed freely.
例えば第15図の如く先端エツジ(36)がギャップ部
(3)に対し逆アジマス角に傾いているとき、最早第2
3図の如くダイヤモンドグラインダー(28)による研
磨では加工出来ない形状であるが、本発明では製造工程
の途中でウェハーがブロック状態の段階で加工出来るか
ら、多数の磁気ヘッドチップに対し一挙に加工が出来、
生産能率が向上する。For example, as shown in FIG.
As shown in Figure 3, the shape cannot be processed by polishing with a diamond grinder (28), but with the present invention, the wafer can be processed while it is in a block state during the manufacturing process, so a large number of magnetic head chips can be processed at once. Done,
Production efficiency improves.
(実施例)
上記第1〜第8手段の説明で本願の詳細は明らかなので
、改めて実施例を説明することは省略する。(Example) Since the details of the present application are clear from the description of the first to eighth means, a new description of the example will be omitted.
尚、磁性ウェハー(8) (9)の材質はフェライトを
用い、該磁性ウェハー(8) (9)の表面に施す非磁
性膜は、二酸化シリコン(Sing)をスパッタリング
蒸着等によって膜付けした。The material of the magnetic wafers (8) and (9) is ferrite, and the non-magnetic film formed on the surface of the magnetic wafers (8) and (9) is made of silicon dioxide (Sing) by sputtering deposition or the like.
又、第5図に示す、ウェハー(8)(9)の側面(lO
)(12)は、トラック幅加工の溝(18)、巻線窓用
溝(17)及び巻線窓用溝(17)の加工用の基準面と
して、非磁性膜加工面に対して直角に鏡面仕上げされて
いる。Also, the side surfaces (lO
)(12) is a reference plane for processing the track width processing groove (18), the winding window groove (17), and the winding window groove (17) at right angles to the nonmagnetic film processing surface. It has a mirror finish.
本発明の磁気ヘッドの各寸法は、斯種従来の磁気ヘッド
と大きく変わるものはないので、具体的寸法についても
省略する。Since the dimensions of the magnetic head of the present invention are not significantly different from those of conventional magnetic heads of this type, specific dimensions will also be omitted.
更に、第7図に示す如く、2つのウェハー(8)(9)
の非磁性膜の面を重ね合せて圧着した際、両ウェハー(
8) (9)の厚みが同じ場合、巻線窓用溝を有しない
側のウェハー(8)を研磨加工して第8図に示す如く所
望のブロック幅lに仕上げる。これは、第2及び第3の
手段でも同様である。Furthermore, as shown in FIG. 7, two wafers (8) (9)
When the surfaces of the non-magnetic films of
8) If the thicknesses of (9) are the same, polish the wafer (8) on the side that does not have the winding window groove to obtain the desired block width l as shown in FIG. This also applies to the second and third means.
尚、図面及び上記説明は本発明の理解のためにするもの
であって、特許請求の範囲を狭く解釈するためにもちい
てはならない。Note that the drawings and the above description are provided for understanding the present invention, and should not be used to narrowly interpret the scope of the claims.
第1図aSbは本発明第1例の磁気ヘッドの正面図及び
平面図、第2図は第1図すの磁気ヘッドに於ける硝子溶
融部(4)の他の実施例の平面図、第3図乃至第9図は
製法の説明図で第10図a1bは本発明に係る磁気ヘッ
ド第2例の正面図、平面図、第11図乃至第14図は製
法を示す説明図、第15図及び第16図は本発明方法の
第3例を実施した製品の正面図、第17図乃至第19図
は製法を示す説明図、第20図、第21図は本発明方法
の第3例の他の実施例の説明図、第22図a1b乃至第
24図a、b、cは従来公知の磁気ヘッドの正面図、平
面図である。
(8)(9)・・・磁性ウェハー
(16)・・・硝子溶着用溝
(18)・・・トラック幅加工
(32)・・・切込溝
(36)・・・研磨テープ
(14)・・・非磁性膜
(17)・・・巻線窓用溝
(30)・・・先端エツジ
(34)・・・凸 条
(38)・・・鋸歯溝1aSb is a front view and a plan view of the magnetic head of the first example of the present invention, FIG. 2 is a plan view of another embodiment of the glass melting part (4) in the magnetic head of FIG. 3 to 9 are explanatory diagrams of the manufacturing method, FIG. 10 a1b is a front view and a plan view of a second example of the magnetic head according to the present invention, FIGS. 11 to 14 are explanatory diagrams showing the manufacturing method, and FIG. 15 16 is a front view of a product obtained by implementing the third example of the method of the present invention, FIGS. 17 to 19 are explanatory views showing the manufacturing method, and FIGS. 20 and 21 are front views of a product obtained by implementing the third example of the method of the present invention. The explanatory diagrams of other embodiments, FIG. 22 a1b to FIG. 24 a, b, and c, are front and plan views of conventionally known magnetic heads. (8) (9) ... Magnetic wafer (16) ... Glass welding groove (18) ... Track width processing (32) ... Cut groove (36) ... Polishing tape (14) ...Nonmagnetic film (17)...Window window groove (30)...Tip edge (34)...Protrusion (38)...Sawtooth groove
Claims (1)
)を介し突合せ圧着して形成した一対の磁気ヘッドピー
スを同一線上に近接して配置してなるダブルアジマス磁
気ヘッドに於いて、各磁気ヘッドピースの内側磁気ヘッ
ドピースの内側エッジ(5)(5)を両側方から中央へ
向けて先細に且つギャップ部(3)とは非平行に斜めに
設け、先細に細幅の平坦部(6)を備えたことを特徴と
する磁気ヘッド。 [2]磁性ウェハー(8)(9)の表面に非磁性膜(1
4)を形成する工程、 一方のウェハー(9)の非磁性膜側の表面に巻線窓用溝
(17)及び硝子溶着用溝(16)を平行に形成すると
共に該巻線窓用溝(17)と直交方向にトラック幅の山
条(20)を残してトラック幅加工の溝(18)を形成
する工程、 他方のウェハー(8)の非磁性膜側の表面に、同様なト
ラック幅加工の溝(18)を形成する工程、2つのウェ
ハー(8)(9)の非磁性膜の面を重ね合わせ、トラッ
ク幅の山条(20)を互いに一致する様、位置決めして
圧着する工程、 圧着した2枚のウェハーの内、巻線窓用溝を有しない側
のウェハー(8)の外表面にギャップ部(3)のピッチ
で三角山の凹凸加工を行ない、各山の両側の傾斜面(5
)(5)はギャップ部(3)に対し傾斜すると共に傾斜
面(5)(5)の先端は尖らさずに細幅の平坦面(6)
を残す工程、 ウェハーの圧着体を巻線窓用溝(17)のピッチで、三
角山の凹凸と直交して切断し棒状ブロック体を形成する
工程、 棒状ブロック体のギャップ部(3)を含む端面にテープ
摺接面の曲面加工を施す工程、 棒状ブロック体をギャップ部(3)のピッチで且つ所定
アジマス角で切断し、磁気ヘッドピースとする工程、 を特徴とする磁気ヘッドの製法。 [3]内外ヘッドチップ(1)(2)をギャップ部(3
)を介し突合せて圧着しギャップ部(3)を含む磁気テ
ープの摺接面を形成した磁気ヘッドピースを同一線上に
近接し配置してなるダブルアジマス磁気ヘッドに於いて
、各磁気ヘッドピースの内側磁気ヘッドピースの内側エ
ッジ(30)を放射線又は楕円状の曲面に形成し、且つ
エッジ(30)の高さは摺接面より低めてなるを特徴と
する磁気ヘッド。 [4]磁性ウェハー(8)(9)の表面に非磁性膜(1
4)を形成する工程、 一方のウェハー(9)の非磁性膜側の表面に巻線窓用溝
(17)及び硝子溶着用溝(16)を平行に形成すると
共に該巻線窓用溝(17)と直交方向にトラック幅の山
条(20)を残してトラック幅加工の溝(18)を形成
する工程、 他方のウェハー(8)の非磁性膜側の表面に、同様なト
ラック幅加工の溝(18)を形成する工程、2つのウェ
ハー(8)(9)の非磁性膜の面を重ね合わせ、トラッ
ク幅の山条(20)を互いに一致する様、位置決めして
圧着する工程、 圧着した2枚のウェハーの内、巻線窓用溝を有しない側
のウェハー(8)のエッジ部に、ギャップ部(3)のピ
ッチで、且つ深さがギャップ部(3)側は深くなる斜め
切込溝(32)を施し、ギャップ部(3)に対応して溝
(32)間に凸条(34)を形成する工程、各凸条(3
4)に対し、弾性研磨材(36)を当てて研磨し、凸条
(34)の上面を摺接面より低めると共に、凸条(34
)の両側及び先端エッジ(30)を曲面に形成する工程
、 を特徴とする磁気ヘッドの製法。 [5]磁性ウェハー(8)(9)の表面に非磁性膜(1
4)を形成する工程、 一方のウェハー(9)の非磁性膜側の表面に巻線窓用溝
(17)及び硝子溶着用溝(16)を平行に形成すると
共に該巻線窓用溝(17)と直交方向にトラック幅の山
条(20)を残してトラック幅加工の溝(18)を形成
する工程、 他方のウェハー(8)の非磁性膜側の表面に、同様なト
ラック幅加工の溝(18)を形成する工程、2つのウェ
ハー(8)(9)の非磁性膜の面を重ね合わせ、トラッ
ク幅の山条(20)を互いに一致する様、位置決めして
圧着する工程、 圧着した2枚のウェハーの中、巻線窓用溝を有しない側
のウェハー(8)の外表面に、ギャップ部(3)のピッ
チで、且つ巻線窓用溝の方向と直交方向に所定傾斜角殿
鋸歯溝(38)を形成する工程、 ウェハーの圧着体を巻線窓用溝(17)のピッチで、鋸
歯溝(38)と直交して切断し棒状ブロック体を形成す
る工程、 棒状ブロック体のギャップ部(3)を含む端面にテープ
摺接面の曲面加工を施す工程、 棒状ブロック体をギャップ部(3)のピッチで且つ所定
アジマス角で切断し、磁気ヘッドピースを形成する工程
、 を特徴とする磁気ヘッドの製法。[Claims] [1] The inner and outer head chips (1) and (2) are connected to the gap portion (3).
) In a double azimuth magnetic head in which a pair of magnetic head pieces formed by butting and crimping are arranged close to each other on the same line, the inner edge (5) of the inner magnetic head piece of each magnetic head piece (5) ) is tapered from both sides toward the center and provided obliquely and non-parallel to the gap portion (3), and is provided with a tapered and narrow flat portion (6). [2] Non-magnetic film (1) on the surface of magnetic wafer (8) (9)
4) Forming a winding window groove (17) and a glass welding groove (16) in parallel on the non-magnetic film side surface of one wafer (9), and forming the winding window groove ( Step 17) of forming track width grooves (18) leaving track width grooves (20) in the direction orthogonal to wafer 17); similar track width processing on the non-magnetic film side surface of the other wafer (8); a step of overlapping the surfaces of the nonmagnetic films of the two wafers (8) and (9), positioning and pressing so that the track width ridges (20) coincide with each other; Of the two crimped wafers, the outer surface of the wafer (8) that does not have the winding window groove is processed to have triangular peaks at the pitch of the gap (3), and the slopes on both sides of each peak are formed. (5
) (5) is inclined with respect to the gap part (3) and the inclined surface (5) The tip of (5) is not sharp but a narrow flat surface (6)
A step of cutting the wafer crimped body at the pitch of the winding window groove (17) and perpendicular to the unevenness of the triangular crest to form a bar-shaped block body, including a gap part (3) of the bar-shaped block body. A method for manufacturing a magnetic head, comprising the steps of: applying a curved surface to the tape sliding surface on the end face; and cutting a rod-shaped block body at the pitch of the gap portion (3) and at a predetermined azimuth angle to form a magnetic head piece. [3] Connect the inner and outer head chips (1) and (2) to the gap part (3
) In a double azimuth magnetic head in which magnetic head pieces are butted and crimped to form a sliding contact surface of the magnetic tape including a gap portion (3) and arranged close to each other on the same line, the inner side of each magnetic head piece is A magnetic head characterized in that the inner edge (30) of the magnetic head piece is formed into a radial or elliptical curved surface, and the height of the edge (30) is lower than the sliding surface. [4] Non-magnetic film (1) on the surface of the magnetic wafer (8) (9)
4) Forming a winding window groove (17) and a glass welding groove (16) in parallel on the non-magnetic film side surface of one wafer (9), and forming the winding window groove ( Step 17) of forming track width grooves (18) leaving track width grooves (20) in the direction orthogonal to wafer 17); similar track width processing on the non-magnetic film side surface of the other wafer (8); a step of overlapping the surfaces of the nonmagnetic films of the two wafers (8) and (9), positioning and pressing so that the track width ridges (20) coincide with each other; Of the two wafers that have been crimped together, on the edge of the wafer (8) that does not have the winding window groove, the pitch is the same as that of the gap section (3), and the depth is deeper on the gap section (3) side. A step of forming diagonal cut grooves (32) and forming protrusions (34) between the grooves (32) corresponding to the gap portions (3), each protrusion (3)
4) is polished by applying an elastic abrasive material (36) to lower the upper surface of the protruding strip (34) than the sliding surface, and to lower the upper surface of the protruding strip (34).
) and the tip edge (30) are formed into curved surfaces. [5] Non-magnetic film (1) on the surface of the magnetic wafer (8) (9)
4) Forming a winding window groove (17) and a glass welding groove (16) in parallel on the non-magnetic film side surface of one wafer (9), and forming the winding window groove ( Step 17) of forming track width grooves (18) leaving track width grooves (20) in the direction orthogonal to wafer 17); similar track width processing on the non-magnetic film side surface of the other wafer (8); a step of overlapping the nonmagnetic film surfaces of the two wafers (8) and (9), positioning and pressing so that the track width ridges (20) coincide with each other; Of the two crimped wafers, on the outer surface of the wafer (8) on the side that does not have the winding window groove, a predetermined groove is placed at the pitch of the gap part (3) and in a direction orthogonal to the direction of the winding window groove. A step of forming an inclined sawtooth groove (38), A step of cutting the crimp body of the wafer at the pitch of the winding window groove (17) and perpendicular to the sawtooth groove (38) to form a bar-shaped block body. A process of applying a curved tape sliding surface to the end face including the gap part (3) of the block body. A process of cutting the rod-shaped block body at the pitch of the gap part (3) and at a predetermined azimuth angle to form a magnetic head piece. A method for manufacturing a magnetic head characterized by the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19978389A JPH0363910A (en) | 1989-07-31 | 1989-07-31 | Magnetic head and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19978389A JPH0363910A (en) | 1989-07-31 | 1989-07-31 | Magnetic head and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0363910A true JPH0363910A (en) | 1991-03-19 |
Family
ID=16413539
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19978389A Pending JPH0363910A (en) | 1989-07-31 | 1989-07-31 | Magnetic head and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0363910A (en) |
-
1989
- 1989-07-31 JP JP19978389A patent/JPH0363910A/en active Pending
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