JPH0360858B2 - - Google Patents
Info
- Publication number
- JPH0360858B2 JPH0360858B2 JP61088964A JP8896486A JPH0360858B2 JP H0360858 B2 JPH0360858 B2 JP H0360858B2 JP 61088964 A JP61088964 A JP 61088964A JP 8896486 A JP8896486 A JP 8896486A JP H0360858 B2 JPH0360858 B2 JP H0360858B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- polyester
- less
- present
- polyester film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920000728 polyester Polymers 0.000 claims description 19
- 229920006267 polyester film Polymers 0.000 claims description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- 239000002344 surface layer Substances 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 230000007547 defect Effects 0.000 description 17
- -1 hydroxyethoxy Chemical group 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 229920000642 polymer Polymers 0.000 description 9
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 238000005266 casting Methods 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 4
- 238000001125 extrusion Methods 0.000 description 4
- 150000002500 ions Chemical group 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- WOZVHXUHUFLZGK-UHFFFAOYSA-N terephthalic acid dimethyl ester Natural products COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 4
- 238000005809 transesterification reaction Methods 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000012760 heat stabilizer Substances 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ORLQHILJRHBSAY-UHFFFAOYSA-N [1-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1(CO)CCCCC1 ORLQHILJRHBSAY-UHFFFAOYSA-N 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical group [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- PDXRQENMIVHKPI-UHFFFAOYSA-N cyclohexane-1,1-diol Chemical compound OC1(O)CCCCC1 PDXRQENMIVHKPI-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
Description
[産業上の利用分野]
本発明は、ポリエステルフイルムに関するもの
で、さらに詳しくは、表面欠点や、微小な表面凹
凸、特に長手方向に連続した厚みむらのない表面
特性の優れたポリエステルフイルムに関するもの
である。
[従来の技術]
ポリエステルフイルムの表面欠点をなくするた
めに、従来までは次のようなことが行なわれてき
た。
(1) 押出系でポリマーが異常滞留することのない
ようにデツトペースをなくする。
(2) 溶融ポリマーが押出系の壁面に付着しにくい
あるいは腐蝕しにくい材質をポリマー系に使
う。
(3) ポリマー系の表面仕上げ精度を向上させ、ポ
リマーの流動挙動を均一にさせ、かつ、微小異
物の付着を防止する。
(4) 延伸系あるいは、フイルム搬送系で、フイル
ムとロールなどとの表面周速差が出ない様にす
る。
[発明が解決しようとする問題点]
しかし、これらの種々の対策にもかかわらず、
ポリエステルフイルムの表面の微小なキズや長手
方向の固定すじ、さらには表面の微小な凹凸は解
消できないのが現状である。特に、近年は、蒸着
記録用の原反や、写真記録用の原反では、表面の
完全無欠点化が望まれており、この様な分野では
従来の方法では製造が不可能に近かつた。
[問題点を解決するための手段]
本発明は、ポリエステル100重量部に対し、ポ
リ有機シロキサン化合物を1〜100ppm含有させ
てなるポリエステルフイルムに於て、該ポリエス
テルフイルム表層での炭素原子に対するケイ素原
子の質量比rsと、フイルム表層から100Åでの同
質量比rcとの比R=rs/rcが、1.2〜10の範囲にあ
ることを特徴とするポリエステルフイルムに関す
るものである。
本発明におけるポリエステルとは、ジカルボン
酸とジオールから縮重合により得られるエステル
結合をしたポリマーであり、ジカルボン酸成分と
しては、テレフタル酸、フタル酸、イソフタル
酸、アジピン酸、セバチン酸、ナフタレンジカル
ボン酸、およびその誘導体などがあり、またジオ
ール成分としては、エチレングリコール、ジエチ
レングリコール、プロピレングリコール、ブチレ
ングリコール、シクロヘキサンジメタノール、ジ
ヒドロキシシクロヘキサン、レゾルシン、ハイド
ロキノン、ジヒドロキシナフタレン、ポリエチレ
ングリコールなどがあり、さらに、P−(βヒド
ロキシエトキシ)安息香酸、P−オキシ安息香
酸、などのようなオキシ酸からもポリエステルが
得られる。ポリエステルの極限粘度は0.4以上、
好ましくは0.6〜1.0の範囲のものがよい。本発明
に適したポリエステルとしては、ポリエチレンテ
レフタレート、ポリエチレンナフタレート、ポリ
ブチレンテレフタレートなどがある。勿論、該ポ
リエステルに任意の添加剤、例えば、すべり剤、
熱安定剤、ブロツキング防止剤、酸化防止剤、着
色剤、帯電防止剤、紫外線吸収剤、増(減)粘
剤、などを含有させてもよい。
静電印加キヤスト法を適用してキヤストする場
合は、本ポリエステルに対して、Zn、Mg、Mn、
Coなどの金属化合物をポリエステルに対して原
子換算重量として20〜1000ppm程度含有させてお
くのが好ましい。ポリ有機シロキサンはケイ素と
酸素との結合よりなるシロキサン結合を有する有
機高分子化合物の総称であり、ジメチルポリシロ
キサン、メチルフエニルポリシロキサン、メチル
エチルポリシロキサン、メチルブチルポリシロキ
サン、などのアルキル、アリル、アルアルキル、
フエニルなどを含有ポリシロキサン、さらには他
のポリ有機シロキサンやその共重合体、ブレンド
対などがあるが、本発明の場合、ジメチルポリシ
ロキサン、メチルフエニルポリシロキサンが、さ
らにはメチルフエニルポリシロキサンが特に好ま
しい。ポリ有機シロキサンの添加時期はポリエス
テルの重合前、特にエステル化反応前に添加する
のが好ましいが、必ずしもこれに限定されず、
少々効果は弱くなるが、重合後で溶融押出し前に
添加してもよい。
ポリ有機シロキサンの粘度は本発明の場合10〜
5000センチストークス(cs)が好ましい。10cs未
満のときは溶融体シートのスジ状などの表面の欠
点改良効果が弱いのみならず、得られたフイルム
透明性・接着性が悪化しやすくなるためであり、
逆に5000csを越えるときは、ポリエチレンテレフ
タレートとの相溶性、分散性が悪くなり、上記ス
ジ状の表面欠点改良効果もほとんどなくなつてし
まうためである。
ポリ有機シロキサン化合物の含有量は、ポリエ
ステルに対して1〜100ppm、好ましくは、2〜
20ppmの範囲になくてはならない。含有量が
1ppm未満になると、本発明の目的であるポリエ
ステルフイルムの表面欠点を皆無に出きず、例え
ば、ポリエステル溶融体シート上に長手方向のス
ジ状の欠点が表われ、ひどい時にはスジの近傍の
溶融体と冷却体表面に間に空気・泡を噛み込み、
均一な厚みむらのない、表面欠点のないシートが
得られないのみならず、このシートを延伸、特に
幅方向に延伸した時に延伸むら・表面欠点が顕著
に表われるようになる。一方、100ppmを越える
と、溶融体が冷却体表面から剥離しやすく、強い
密着力が得られないばかりか得られたフイルムに
クレーター状の欠点の発生や、接着不良、透明性
悪化、表面の粗れ、表面のうねりなどが顕在化し
てくる。
このように、単にポリ有機シロキサン化合物を
特定定量含有させても、ポリエステルフイルム表
面を完全無欠点化することは出来ず、ポリ有機シ
ロキサン化合物に起因するケイ素原子Siの表面濃
度が特定の分布を有したものでないと本発明の表
面完全無欠点化することは出来ないのである。特
定のSi表面濃度分布とは、炭素原子Cに対するケ
イ素原子Siの質量比rの表面層での比rsと、表面
から100Å入つたところでの比rcとの比R=rs/rp
が、1.2〜10好ましくは1.2〜5.0の範囲になければ
ならないのである。すなわち、Si原子は、フイル
ム最表層である程度高濃度に存在していることが
必須になるのである。
上記Si原子およびC原子のフイルム中での濃度
分布は、後述するSIMS法により求める。
Rの値が1.2未満であると、本発明の目的であ
る表面無欠点が達成できないのみならず、微小凹
凸による厚みむらが解消できないためであり、逆
に、Rの値が10を越えると、フイルム表面にクレ
ーター状の欠点の発生や、接着不良、透明性悪
化、表面のうねりや、さらには、溶融時の流動ム
ラなどが発生するためである。
次に本発明のポリエステルフイルムの製造方法
について説明する。
ポリエチレンテレフタレート、ポリエチレンナ
フタレートなどで代表されるポリエステルを常法
のエステル交換法(DMT法)あるいは直接重合
法により、ジカルボン酸成分とジオール成分とか
ら縮重合反応により得る。本発明の場合、特に直
接重合法ポリエステルに顕著な効果があり、有効
である。ポリエステルに含有されるポリ有機シロ
キサン化合物の添加時期は、DMT法の場合、エ
ステル交換反応前が好ましいが、特にこれに限定
されることはなく、重合反応前、あるいは完了後
に添加してもよく、さらには、押出機投入時に添
加してもよいが、本発明の添加量から考えた場
合、微量添加量を均一に含有させるには、ポリエ
ステル重合前に添加するのが好ましい。もちろ
ん、ポリ有機シロキサンを高濃度に含有したマス
ターペレツトを、ポリ有機シロキサンを高濃度に
含有しないバーヂンペレツトで希釈してもよいこ
とは明らかである。さらに、ポリエステルに公知
の添加剤、例えば滑剤、酸化防止剤、顔料、染
料、核剤、ブロツキング防止剤、熱安定剤、充填
材、可塑剤、帯電防止剤、紫外線吸収剤、着色防
止剤、などを含有させてもよい。
該ポリエステルを以下に述べるように従来とは
異なつた二軸延伸製膜を行ない、ケイ素原子が選
択的にポリエステルフイルム表層に配列するよう
にするのが、本発明の場合、特に好ましい。
即ち、ポリエステルを充分乾燥させ、溶融押出
時の吐出圧力pを110〜250Kg/cm2と高くし、しか
もポリマーの滞留時間を20〜60分と長くして実質
上加水分解および熱分解反応が進行しない様にし
て溶融押出しを行ない、次に該溶融ポリマーを口
金から吐出し、静電気を荷電させた電気的に絶縁
されたキヤストドラム上に落下密着させ帯電状態
のまま冷却固化させ、キヤストシートを得る。該
シートを長手方向に85〜130℃で1段または多段
階で3〜8倍延伸し、続いて幅方向に80〜200℃
で3〜6倍延伸し、100〜240℃で熱処理する。
必要に応じて、さらに長手方向および/または
幅方向に再度延伸後熱処理を行なつてもよい。
かしくて得られたポリエテルフイルムに含有さ
れたケイ素原子は選択的に表層に配列している。
またポリエステルフイルムの厚さは0.5〜125μm
好ましくは3〜80μm程度のものが効果がありよ
く用いられる。
[用途]
かくして得られた本発明ポリエステルフイルム
は、表面欠点を特に問題視する磁気記録、光記録
用ベースフイルムとして、また、表面の微小厚み
むらを問題視するコンデンサー用記録体フイルム
として、あるいは、蒸着用ベースフイルムとして
特に優れた特性を有したフイルムとなりうる。
[発明の効果]
このようにポリエステルに添加するポリ有機シ
ロキサンの含有濃度を限定し、しかもそのフイル
ム断面方向の濃度分布を特定化したので得られた
フイルム表面にはクレータ、泡状マーク、スジ、
うねり、キズなどの表面欠点のない、微小厚みむ
らの小さい高品質なキヤストフイルムとなるばか
りか、高速度でも安定したキヤストが出来、表面
欠点のない均一な極薄物ポリエステルフイルムも
得られる。
さらに、本発明ポリエステルフイルムは、延伸
性に優れているばかりか、また、スリツト適性や
巻取特性にも優れたフイルムになる。
[特性の測定方法、効果の評価方法)
本発明の特性値の測定方法、評価方法は次のと
おりである。
(1) 炭素(ケイ素)原子の質量濃度分布は、二次
イオン質量分析(Secondary lon Mass
Spectrometry、以下SIMS)によつて求める。
SIMSは5〜15Kev程度のエネルギーのイオ
ンビームは試料表面にあて、スパツタリングに
よつて試料から発生する二次イオンを質量分析
する方法である。装置としては西独、
ATOMIKA社製A−DIDA3000を用い、一次
イオン種にO2 +、一次イオン加速電圧12KV、
一次イオン電流200nA、ラスター領域400μ2、
測定真空度1×10-8Torr、E−gun0、5KV−
3Aの条件で測定した。
ケイ素原子Si、およびポリエステル構成原子
(C)の深さ方向の測定を行なう。測定深さは、
SIMS測定後のスパツタ部のクレーターの深さ
を表面粗さ計(スローン社製DEKTAK)で求
めその値を採用する。かくして得られた各原子
の厚さ方向の濃度分布から、Si/cの比率をフ
イルムの深さ方向に再プロツトして、フイルム
厚さに対してSi/cの濃度分布rを求める。
(2) 表面粗さ:Ra(μm)
触針式表面粗さ計による測定値で示した(カ
ツトオフ値c/o0.25mm、測定長4mm、ただし、
JIS−B−0601に従つた。)
表面粗さ(μm) (c/o0.25mm):
0.10以上 ×
0.05以上〜0.10未満 △
0.01以上〜0.05未満 ○
0.01未満 ◎
(3) 滑り性
ASTM−D−1894−63この方法に従いスリ
ツプテスターを用いて、静摩擦係数(μs)なら
びに動摩擦係数(μd)を測定した。
通常、フイルムとして易滑性に優れていると
される範囲は、μsで1.0以下、μdで0.8以下であ
る。
滑り性(μs):
1.6以上 ×
1.0以上〜1.6未満 △
0.7以上〜1.0未満 ○
0.7未満 ◎
(4) 表面欠点
サンプルにAIを200Å相当蒸着し、60倍の実
体顕微鏡で20視野の表面を観察し、その表面キ
ズの程度によつて判定する。
分 類
◎ 全くキズがない
○ キズのあるのが1〜2視野
△ 〃 3〜5視野
× 全視野にキズがある
(5) 固定すじ
フイルムを直交ニロル下においた時、回りの
部分より厚さ変動に起因する長手方向に連続し
たスジ状の着色ムラが表われる時、その程度に
より次の様に分類する。
分 類 厚さ変動値(mμ)着色ムラ
◎ 100未満なし
○ 〃わずかに確認できる
△ 500未満あり
× 500以上あり
(6) 接着性
測定するフイルムを70℃に保たれた熱風オー
ブン中にて72時間処理し、そのフイルムの表面
ぬれ張力γcAと、処理前のフイルムの表面ぬれ
張力γcをJIS K6768−1971にしたがつて測定
し、次の基準で接着性を求める。
判 定 γcA |γc−γcA|
◎ 38以上 1未満
○ 同 上 1〜3
△ 30以上、38未満 3以上、10未満
× 30未満 10以上
[実施例]
以下、本発明の効果を明確にするために以下に
比較実施例をあげて説明する。
実施例 1
平均粒径300mμコロイダルシリカSiO2を均一
に分散させ、6μ以上の粗粒を除去したエチレン
グリコールと、ジメチルテレフタレートとを酢酸
リチウムをエステル交換反応触媒としてまた、
500センチストークスのメチルフエニルポリシロ
キサンを表面欠点改良剤として混合させ、加熱昇
温し、脱メタノール反応でエステル交換反応を行
なつた。次にこの反応生成物にリン酸、トリエチ
ルホスフエートと共に三酸化アンチモンを添加
し、常法に従つて重合を完了し極限粘度[η]=
0.65のポリエチレンテレフタレートを得た。
該ポリエチレンテレフタレートを180℃で2時
間真空乾燥させたのち、押出機に供給し、285℃
で溶融させ、吐出圧力p=150Kg/cm2、ポリマー
の滞留時間40分の条件でTダイ口金から吐出さ
せ、電気的に絶縁され高電圧を印加されたキヤス
テイングドラム(冷媒にフロントガス使用)に密
着冷却させた。即ち、溶融体シートに帯電させた
状態のままでポリエチレンテレフタレートのガラ
ス転移温度70℃以下に冷却させた。
かくして得られたキヤストシートを長手方向に
125℃で1.8倍、さらに同方向に90℃で3.1倍延伸
し、つづいて幅方向に95℃で4倍延伸後、150℃
で3秒間熱固定し、さらに、同時2軸延伸テンタ
ー内で、長手方向に1.4倍、幅方向に1.1倍同時2
軸延伸後、185℃で長手方向、幅方向とも2%の
リラツクスさせながら、2秒間熱固定した。かく
して得られた厚さ9μmのポリエチレンテレフタ
レートのフイルム品質は第1表の通りである。
[Industrial Field of Application] The present invention relates to a polyester film, and more specifically, to a polyester film that has excellent surface characteristics, including no surface defects or minute surface irregularities, and particularly no continuous thickness unevenness in the longitudinal direction. be. [Prior Art] In order to eliminate surface defects of polyester films, the following methods have been conventionally carried out. (1) Eliminate dead paste to prevent abnormal retention of polymer in the extrusion system. (2) Use a material for the polymer system that prevents the molten polymer from adhering to or corroding the walls of the extrusion system. (3) Improve the surface finish accuracy of polymer systems, make the flow behavior of the polymer uniform, and prevent the adhesion of minute foreign matter. (4) In the stretching system or film transport system, ensure that there is no difference in surface peripheral speed between the film and the roll. [Problems to be solved by the invention] However, despite these various measures,
At present, it is impossible to eliminate minute scratches on the surface of polyester film, fixation lines in the longitudinal direction, and even minute irregularities on the surface. In particular, in recent years, it has become desirable to have completely defect-free surfaces for substrates for vapor deposition recording and for photographic recording, and it has become nearly impossible to manufacture such materials using conventional methods. . [Means for Solving the Problems] The present invention provides a polyester film containing 1 to 100 ppm of a polyorganosiloxane compound based on 100 parts by weight of polyester, in which the silicon atoms relative to the carbon atoms in the surface layer of the polyester film are The present invention relates to a polyester film characterized in that the ratio R=rs/ rc of the mass ratio r s of R to the same mass ratio r c at 100 Å from the surface layer of the film is in the range of 1.2 to 10. The polyester in the present invention is a polymer with ester bonds obtained by condensation polymerization from dicarboxylic acid and diol, and dicarboxylic acid components include terephthalic acid, phthalic acid, isophthalic acid, adipic acid, sebacic acid, naphthalene dicarboxylic acid, Diol components include ethylene glycol, diethylene glycol, propylene glycol, butylene glycol, cyclohexanedimethanol, dihydroxycyclohexane, resorcinol, hydroquinone, dihydroxynaphthalene, polyethylene glycol, etc. Polyesters can also be obtained from oxyacids such as hydroxyethoxy)benzoic acid, p-oxybenzoic acid, and the like. The intrinsic viscosity of polyester is 0.4 or more,
It is preferably in the range of 0.6 to 1.0. Polyesters suitable for the present invention include polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, and the like. Of course, optional additives such as slip agents,
A heat stabilizer, an antiblocking agent, an antioxidant, a coloring agent, an antistatic agent, an ultraviolet absorber, a viscosity increasing (reducing) agent, etc. may be contained. When casting using the electrostatic casting method, Zn, Mg, Mn,
It is preferable to contain a metal compound such as Co in an amount of about 20 to 1000 ppm in terms of atomic weight based on the polyester. Polyorganosiloxane is a general term for organic polymer compounds having a siloxane bond consisting of a bond between silicon and oxygen, and includes alkyl, allyl, etc. , aralkyl,
There are polysiloxanes containing phenyl, as well as other polyorganosiloxanes, their copolymers, blend pairs, etc. In the case of the present invention, dimethylpolysiloxane, methylphenylpolysiloxane, and further methylphenylpolysiloxane are used. is particularly preferred. It is preferable to add the polyorganosiloxane before the polymerization of the polyester, especially before the esterification reaction, but the timing is not necessarily limited to this.
It may be added after polymerization and before melt extrusion, although the effect will be a little weaker. In the case of the present invention, the viscosity of polyorganosiloxane is 10~
5000 centistokes (cs) is preferred. When it is less than 10 cs, not only is the effect of improving surface defects such as streaks on the melt sheet weak, but also the transparency and adhesion of the obtained film tend to deteriorate.
On the other hand, if it exceeds 5000 cs, the compatibility and dispersibility with polyethylene terephthalate will deteriorate, and the effect of improving the above-mentioned streak-like surface defects will almost disappear. The content of the polyorganosiloxane compound is 1 to 100 ppm, preferably 2 to 100 ppm, based on the polyester.
Must be in the 20ppm range. The content is
If it is less than 1 ppm, the surface defects of the polyester film, which is the objective of the present invention, cannot be completely eliminated. For example, longitudinal streak-like defects appear on the polyester melt sheet, and in severe cases, the melt near the streaks and Air/bubbles are trapped on the surface of the cooling body,
Not only is it not possible to obtain a sheet with a uniform thickness and no surface defects, but when this sheet is stretched, especially in the width direction, stretching unevenness and surface defects become noticeable. On the other hand, if it exceeds 100 ppm, the molten material tends to peel off from the surface of the cooling material, making it impossible to obtain strong adhesion, and the resulting film may have crater-like defects, poor adhesion, poor transparency, and surface roughness. As a result, surface undulations become apparent. In this way, simply containing a specific amount of a polyorganosiloxane compound does not make the polyester film surface completely defect-free, and the surface concentration of silicon atoms caused by the polyorganosiloxane compound has a specific distribution. Otherwise, the surface of the present invention cannot be made completely defect-free. A specific Si surface concentration distribution is the ratio of the mass ratio r of silicon atoms Si to carbon atoms C in the surface layer r s to the ratio r c at a depth of 100 Å from the surface R = r s / r p
must be in the range of 1.2 to 10, preferably 1.2 to 5.0. In other words, it is essential that Si atoms exist at a fairly high concentration in the outermost layer of the film. The concentration distribution of the Si atoms and C atoms in the film is determined by the SIMS method described below. If the value of R is less than 1.2, not only the surface defect-free which is the objective of the present invention cannot be achieved, but also the thickness unevenness due to minute irregularities cannot be eliminated. Conversely, if the value of R exceeds 10, This is due to the occurrence of crater-like defects on the film surface, poor adhesion, deterioration of transparency, surface waviness, and even uneven flow during melting. Next, the method for manufacturing the polyester film of the present invention will be explained. A polyester represented by polyethylene terephthalate, polyethylene naphthalate, etc. is obtained by a condensation reaction from a dicarboxylic acid component and a diol component by a conventional transesterification method (DMT method) or a direct polymerization method. In the case of the present invention, it is particularly effective for direct polymerization polyesters. In the case of the DMT method, the timing of addition of the polyorganosiloxane compound contained in the polyester is preferably before the transesterification reaction, but is not particularly limited to this, and may be added before the polymerization reaction or after completion. Further, it may be added at the time of charging the extruder, but considering the amount added in the present invention, it is preferable to add it before polyester polymerization in order to uniformly contain a small amount added. Of course, it is clear that master pellets containing a high concentration of polyorganosiloxane may be diluted with virgin pellets that do not contain a high concentration of polyorganosiloxane. Additionally, known additives to polyester may be added, such as lubricants, antioxidants, pigments, dyes, nucleating agents, antiblocking agents, heat stabilizers, fillers, plasticizers, antistatic agents, ultraviolet absorbers, color inhibitors, etc. may be included. In the case of the present invention, it is particularly preferable to subject the polyester to a biaxial stretching film different from the conventional method as described below so that silicon atoms are selectively arranged on the surface layer of the polyester film. That is, the polyester is sufficiently dried, the discharge pressure p during melt extrusion is increased to 110 to 250 kg/ cm2 , and the residence time of the polymer is increased to 20 to 60 minutes, so that the hydrolysis and thermal decomposition reactions substantially proceed. Then, the molten polymer is discharged from the die, dropped onto an electrically insulated cast drum charged with static electricity, and cooled and solidified in the charged state to obtain a cast sheet. . The sheet is stretched 3 to 8 times in one or multiple stages at 85 to 130°C in the longitudinal direction, and then stretched at 80 to 200°C in the width direction.
The film is stretched 3 to 6 times and heat treated at 100 to 240°C. If necessary, heat treatment may be performed again after stretching in the longitudinal direction and/or width direction. The silicon atoms contained in the polyether film thus obtained are selectively arranged on the surface layer.
Also, the thickness of the polyester film is 0.5 to 125 μm.
Preferably, those having a diameter of about 3 to 80 μm are effective and often used. [Applications] The thus obtained polyester film of the present invention can be used as a base film for magnetic recording or optical recording, where surface defects are a particular problem, or as a recording film for capacitors, where minute unevenness in surface thickness is a problem, or The film can have particularly excellent properties as a base film for vapor deposition. [Effects of the Invention] In this way, the concentration of polyorganosiloxane added to polyester is limited, and the concentration distribution in the cross-sectional direction of the film is specified, so that the surface of the obtained film has no craters, bubble marks, streaks, etc.
Not only can a high-quality cast film with small thickness unevenness and no surface defects such as waviness or scratches be obtained, but also stable casting can be achieved even at high speeds, and a uniform ultra-thin polyester film without surface defects can be obtained. Furthermore, the polyester film of the present invention not only has excellent stretchability, but also has excellent slitting suitability and winding properties. [Method for Measuring Characteristics, Method for Evaluating Effects] Methods for measuring and evaluating characteristic values of the present invention are as follows. (1) The mass concentration distribution of carbon (silicon) atoms is determined by secondary ion mass spectrometry.
Obtained by Spectrometry (hereinafter referred to as SIMS). SIMS is a method in which an ion beam with an energy of about 5 to 15 Kev is applied to the sample surface, and secondary ions generated from the sample are subjected to mass spectrometry by sputtering. West Germany as a device,
Using A-DIDA3000 manufactured by ATOMIKA, O 2 + as the primary ion species, primary ion acceleration voltage 12KV,
Primary ion current 200nA, raster area 400μ 2 ,
Measurement vacuum level 1×10 -8 Torr, E-gun0, 5KV-
Measured under 3A conditions. Silicon atom Si and polyester constituent atoms
(C) Measure in the depth direction. The measurement depth is
After the SIMS measurement, the depth of the crater in the sputter area is determined using a surface roughness meter (DEKTAK, manufactured by Sloan) and that value is used. From the thus obtained concentration distribution of each atom in the thickness direction, the Si/c ratio is replotted in the depth direction of the film to determine the Si/c concentration distribution r with respect to the film thickness. (2) Surface roughness: Ra (μm) Shown as a value measured using a stylus type surface roughness meter (cutoff value c/o 0.25 mm, measurement length 4 mm, however,
In accordance with JIS-B-0601. ) Surface roughness (μm) (c/o0.25mm): 0.10 or more × 0.05 or more to less than 0.10 △ 0.01 or more to less than 0.05 ○ Less than 0.01 ◎ (3) Slip property ASTM-D-1894-63 Slip tester according to this method The static friction coefficient (μs) and the dynamic friction coefficient (μd) were measured using the following. Generally, the range in which a film is considered to have excellent slipperiness is 1.0 or less in μs and 0.8 or less in μd. Slip property (μs): 1.6 or more × 1.0 or more to less than 1.6 △ 0.7 or more to less than 1.0 ○ Less than 0.7 ◎ (4) Surface defects Deposit AI equivalent to 200 Å on the sample and observe the surface in 20 fields of view with a stereomicroscope at 60x magnification Judgment is made based on the degree of surface scratches. Classification ◎ No scratches at all ○ 1 to 2 scratches in the field △ 〃 3 to 5 fields × Scratches in the entire field (5) Fixing streaks When the film is placed under an orthogonal Nirol film, it is thicker than the surrounding area. When continuous streak-like coloring unevenness appears in the longitudinal direction due to fluctuation, it is classified as follows depending on its degree. Classification Thickness variation value (mμ) Coloring unevenness ◎ None less than 100 ○ Slightly visible △ Less than 500 × More than 500 (6) Adhesion The film to be measured was placed in a hot air oven kept at 70°C. The surface wetting tension γ cA of the film and the surface wetting tension γ c of the film before treatment are measured according to JIS K6768-1971, and the adhesion is determined according to the following criteria. Judgment γ cA | γ c - γ cA | ◎ 38 or more, less than 1 ○ Same as above 1 to 3 △ 30 or more, less than 38 3 or more, less than 10 × Less than 30 10 or more [Example] The effects of the present invention will be clearly explained below. In order to achieve this, comparative examples will be given and explained below. Example 1 Colloidal silica SiO 2 with an average particle size of 300 μm was uniformly dispersed, and ethylene glycol from which coarse particles of 6 μm or more were removed was mixed with dimethyl terephthalate using lithium acetate as a transesterification catalyst.
500 centistokes of methylphenylpolysiloxane was mixed as a surface defect improver, heated to an elevated temperature, and a transesterification reaction was performed by removing methanol. Next, antimony trioxide was added to this reaction product together with phosphoric acid and triethyl phosphate, and the polymerization was completed according to a conventional method, and the intrinsic viscosity [η] =
0.65 polyethylene terephthalate was obtained. After vacuum drying the polyethylene terephthalate at 180°C for 2 hours, it was fed to an extruder and heated at 285°C.
and discharged from the T-die nozzle under the conditions of discharge pressure p = 150 Kg/cm 2 and polymer residence time of 40 minutes, and a casting drum that was electrically insulated and applied a high voltage (using front gas as the refrigerant). It was cooled in close contact with the That is, the molten sheet was cooled to the glass transition temperature of polyethylene terephthalate of 70° C. or lower while still being charged. The cast sheet thus obtained is longitudinally
Stretched 1.8 times at 125℃, further stretched 3.1 times in the same direction at 90℃, then stretched 4 times in the width direction at 95℃, then stretched at 150℃
Heat set for 3 seconds at
After axial stretching, it was heat set at 185° C. for 2 seconds while being relaxed by 2% in both the longitudinal and width directions. The quality of the polyethylene terephthalate film thus obtained with a thickness of 9 μm is shown in Table 1.
【表】
このように、特定のポリ有機シロキサンを添加
し、しかも特定の条件で製膜することにより、表
面欠点のない、表面の平滑・易滑フイルムになる
ことが分る。
比較例 1
実施例1で用いたキヤスト法を変更して、Tダ
イ口金から吐出した溶融シートに口金とキヤステ
イングドラム間に配置してあるタングステンワイ
ヤーから静電荷を印加させ、該溶融シートに帯電
させたのち、アースしてあるキヤステイングドラ
ム(冷媒に水使用)上に密着固定させた。さら
に、、吐出圧力Pと滞留時間とを表2に示した値
にまで変えたがその他の工程は、実施例1と全く
同様にして第2表に示した特性を有した二軸延伸
ポリエチレンテレフタレートフイルムを得た。[Table] It is thus seen that by adding a specific polyorganosiloxane and forming a film under specific conditions, a film with a smooth and easily slippery surface without surface defects can be obtained. Comparative Example 1 The casting method used in Example 1 was changed, and an electrostatic charge was applied to the molten sheet discharged from the T-die die from a tungsten wire placed between the die and the casting drum to charge the molten sheet. After that, it was tightly fixed on a grounded casting drum (using water as a refrigerant). Furthermore, the discharge pressure P and residence time were changed to the values shown in Table 2, but the other steps were carried out in exactly the same manner as in Example 1 to produce biaxially oriented polyethylene terephthalate having the properties shown in Table 2. I got the film.
【表】
このように、同一組成のものであつても、製膜
条件が変わることにより、表面特性は大巾に変わ
ることが判る。
比較例 2
実施例1でのメチルフエニルポリシロキサンの
含有量を8ppmから300ppmに増やす以外は、全く
実施例1と同様にして厚さ9μmのポリエチレン
テレフタレートフイルムを得た。[Table] As shown above, it can be seen that even if the composition is the same, the surface characteristics can vary widely depending on the film forming conditions. Comparative Example 2 A polyethylene terephthalate film with a thickness of 9 μm was obtained in the same manner as in Example 1, except that the content of methylphenylpolysiloxane in Example 1 was increased from 8 ppm to 300 ppm.
【表】
このように、ポリシロキサンを多量に含有させ
ても、表面欠点が解消させないばかりか、接着性
が大巾に低下することが判る。[Table] It is thus seen that even if a large amount of polysiloxane is contained, not only the surface defects are not eliminated, but also the adhesiveness is significantly reduced.
Claims (1)
キサン化合物を、1〜100ppm含有させてなるポ
リエステルフイルムに於て、該ポリエステルフイ
ルム表層での炭素原子に対するケイ素原子の質量
比rsと、フイルム表層から100Åでの同質量比rc
との比R=rs/rcが、1.2〜10の範囲にあることを
特徴とするポリエステルフイルム。1. In a polyester film containing 1 to 100 ppm of a polyorganosiloxane compound based on 100 parts by weight of polyester, the mass ratio r s of silicon atoms to carbon atoms in the surface layer of the polyester film and the Same mass ratio r c
A polyester film characterized in that the ratio R= rs / rc is in the range of 1.2 to 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8896486A JPS62244616A (en) | 1986-04-17 | 1986-04-17 | Polyester film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8896486A JPS62244616A (en) | 1986-04-17 | 1986-04-17 | Polyester film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62244616A JPS62244616A (en) | 1987-10-26 |
JPH0360858B2 true JPH0360858B2 (en) | 1991-09-18 |
Family
ID=13957505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8896486A Granted JPS62244616A (en) | 1986-04-17 | 1986-04-17 | Polyester film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62244616A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5248898A (en) * | 1975-10-16 | 1977-04-19 | Toshiba Corp | Method of trimming work with laser light |
-
1986
- 1986-04-17 JP JP8896486A patent/JPS62244616A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5248898A (en) * | 1975-10-16 | 1977-04-19 | Toshiba Corp | Method of trimming work with laser light |
Also Published As
Publication number | Publication date |
---|---|
JPS62244616A (en) | 1987-10-26 |
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