JPS62244616A - Polyester film - Google Patents
Polyester filmInfo
- Publication number
- JPS62244616A JPS62244616A JP8896486A JP8896486A JPS62244616A JP S62244616 A JPS62244616 A JP S62244616A JP 8896486 A JP8896486 A JP 8896486A JP 8896486 A JP8896486 A JP 8896486A JP S62244616 A JPS62244616 A JP S62244616A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polyester
- ratio
- polyester film
- organic siloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920006267 polyester film Polymers 0.000 title claims abstract description 22
- 229920000728 polyester Polymers 0.000 claims abstract description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000002344 surface layer Substances 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 230000007547 defect Effects 0.000 abstract description 20
- -1 siloxane compound Chemical class 0.000 abstract description 17
- 238000000034 method Methods 0.000 abstract description 15
- 238000009826 distribution Methods 0.000 abstract description 8
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010410 layer Substances 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 150000001721 carbon Chemical group 0.000 abstract 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 9
- 239000005020 polyethylene terephthalate Substances 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 238000005266 casting Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000001125 extrusion Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 4
- 150000002500 ions Chemical group 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- WOZVHXUHUFLZGK-UHFFFAOYSA-N terephthalic acid dimethyl ester Natural products COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 4
- 238000005809 transesterification reaction Methods 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000012760 heat stabilizer Substances 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical group [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- PDXRQENMIVHKPI-UHFFFAOYSA-N cyclohexane-1,1-diol Chemical compound OC1(O)CCCCC1 PDXRQENMIVHKPI-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、ポリエステルフィルムに関するもので、ざら
に詳しくは、表面欠点や、微小な表面凹凸、特に長手方
向に連続した厚みむらのない表面特性の優れたポリエス
テルフィルムに関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a polyester film, and more specifically, the present invention relates to a polyester film. The invention relates to an excellent polyester film.
[従来の技術]
ポリエステルフィルムの表面欠点をなくするために、従
来までは次のようなことが行なわれてきた。[Prior Art] In order to eliminate surface defects of polyester films, the following methods have been used so far.
(1)押出系でポリマーが異常2FH沼することのない
ようにデッドスペースをなくする。(1) Eliminate dead space in the extrusion system so that the polymer does not become an abnormal 2FH swamp.
(2)溶融ポリマーが押出系の壁面に付着しにくいある
いは腐蝕しにくい材質をポリマー系に使う。(2) Use a material for the polymer system that prevents the molten polymer from adhering to or corroding the walls of the extrusion system.
(3) ポリマー系の表面仕上げ精度を向上させ、ポ
リマーの流動挙動を均一にさせ、かつ、微小異物の付着
を防止する。(3) Improve the surface finish accuracy of polymer systems, make the flow behavior of the polymer uniform, and prevent the adhesion of minute foreign matter.
(4) 延伸糸あるいは、フィルム搬送糸で、フィル
ムとロールなどとの表面周速差が出ない様にする。(4) Make sure that there is no difference in surface peripheral speed between the film and the roll using the drawn yarn or the film conveyance yarn.
[発明が解決しようとする問題点]
しかし、これらの種々の対策にもかかわらず、ポリエス
テルフィルムの表面の微小なキズや長手方向の固定すじ
、ざらには表面の微小な凹凸は解めできないのが現状で
おる。特に、近年は、蒸着記録用の原反ヤ、写真記録用
の原反では、表面の完全無欠点化が望まれており、この
様な分野では従来の方法では製造が不可能に近かった。[Problems to be solved by the invention] However, despite these various measures, it is still not possible to resolve minute scratches on the surface of polyester film, fixation lines in the longitudinal direction, and minute irregularities on the surface. is the current situation. In particular, in recent years, it has been desired to have completely defect-free surfaces for raw paper for vapor deposition recording and raw paper for photographic recording, and production in such fields has been nearly impossible using conventional methods.
E問題点を解決するための手段]
本発明は、ポリエステル100重量部に対し、ポリ有機
シロキサン化合物を1〜iooppm含有させてなるポ
リエステルフィルムに於て、該ポリエステルフィルム表
層での炭素原子に対するケイ素原子の質量比rsと、フ
ィルム表層から100人での同質量比r との比R−r
s/rsが、0.8〜10の範囲にあることを特徴とす
るポリエステルフィルムに関するものである。Means for Solving Problem E] The present invention provides a polyester film containing 1 to iooppm of a polyorganosiloxane compound based on 100 parts by weight of polyester, in which the silicon atoms relative to the carbon atoms in the surface layer of the polyester film are The ratio R-r between the mass ratio rs and the same mass ratio r of 100 people from the film surface layer
The present invention relates to a polyester film characterized in that s/rs is in the range of 0.8 to 10.
本発明におけるポリエステルとは、ジカルボン酸とジオ
ールから縮重合により得られるエステル結合を有したポ
リマーであり、ジカルボン酸成分としては、テレフタル
酸、フタル酸、イソフタル酸、アジピン酸、セパチン酸
、ナフタレンジカルボン酸、およびその誘導体などがあ
り、またジオール成分としては、エチレングリコール、
ジエチレングリコール、プロピレングリコール、ブチレ
ングリコール、シクロヘキサンジメタツール、ジヒドロ
キシシクロヘキサン、レゾルシン、ハイドロキノン、ジ
ヒドロキシナフタレン、ポリエチレングリコールなどが
あり、ざらに、P−(βヒドロキシエトキシ)安息香酸
、P−オキシ安息香酸、などのようなオキシ酸からもポ
リエステルが得られる。ポリエステルの極限粘度は0.
4以上、好ましくは0.6〜1.0の範囲のものがよい
。本発明に適したポリエステルとしては、ポリエチレン
テレフタレート、ポリエチレンナフタレート、ポリブチ
レンテレフタレートなどがある。勿論、該ポリエステル
に任意の添加剤、例えば、すべり剤、熱安定剤、ブロッ
キング防止剤、酸化防止剤、着色剤、帯電防止剤、紫外
線吸収剤、増(減)粘剤、などを含有させてもよい。The polyester in the present invention is a polymer having ester bonds obtained by condensation polymerization from a dicarboxylic acid and a diol, and the dicarboxylic acid component includes terephthalic acid, phthalic acid, isophthalic acid, adipic acid, sepatic acid, naphthalene dicarboxylic acid. , and its derivatives, and diol components include ethylene glycol,
Diethylene glycol, propylene glycol, butylene glycol, cyclohexane dimetatool, dihydroxycyclohexane, resorcinol, hydroquinone, dihydroxynaphthalene, polyethylene glycol, etc. Polyesters can also be obtained from such oxyacids. The intrinsic viscosity of polyester is 0.
4 or more, preferably in the range of 0.6 to 1.0. Polyesters suitable for the present invention include polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, and the like. Of course, the polyester may contain optional additives, such as slip agents, heat stabilizers, anti-blocking agents, antioxidants, colorants, antistatic agents, ultraviolet absorbers, thickening (lowering) agents, etc. Good too.
静電印加キャスト法を適用してキャストする場合は、本
ポリエステルに対して、Z、、Mg、Ml、00などの
金属化合物をポリエステルに対して原子換算重置として
20〜’+oooppm程度含有させておくのが好まし
い。ポリ有機シロキサンはケイ素と酸素との結合よりな
るシロキサン結合を有する有機高分子化合物の総称であ
り、ジメチルポリシロキサン、メチルフェニルポリシロ
キサン、メチルエチルポリシロキサン、メチルブチルポ
リシロキサン、などのアルキル、アリル、アルアルキル
、フェニルなどを含有ポリシロキサン、ざらには他のポ
リ有機シロキサンやその共重合体、ブレンド対などがあ
るが、本発明の場合、ジメチルポリシロキサン、メチル
フェニルポリシロキサンが、ざらにはメチルフェニルポ
リシロキサンが特に好ましい。ポリ有機シロキサンの添
加時期はポリエステルの重合前、特にエステル化反応前
に“添加するのが好ましいが、必ずしもこれに限定され
ず、少々効果は弱くなるが、重合侵で溶融押出し前に添
加してもよい。When casting by applying an electrostatic application casting method, the present polyester should contain metal compounds such as Z, Mg, Ml, 00, etc. in an amount of about 20~'+oooppm in terms of atomic superposition relative to the polyester. It is preferable to leave it there. Polyorganosiloxane is a general term for organic polymer compounds having a siloxane bond consisting of a bond between silicon and oxygen, and includes alkyl, allyl, There are polysiloxanes containing aralkyl, phenyl, etc., and other polyorganosiloxanes, their copolymers, blend pairs, etc. In the case of the present invention, dimethyl polysiloxane, methyl phenyl polysiloxane, Particularly preferred are phenylpolysiloxanes. It is preferable to add polyorganosiloxane before the polymerization of polyester, especially before the esterification reaction, but it is not necessarily limited to this.Although the effect will be slightly weaker, it can be added before melt extrusion due to polymerization. Good too.
ポリ有機シロキサンの粘度は本発明の場合10〜5,0
00センチストークス(CS)が好ましい。10C5未
満のときは溶融体シートのスジ状などの表面の欠点改良
効果が弱いのみならず、得られたフィルム透明性・接着
性が悪化しやすくなるためであり、逆に5.0OOcs
を越えるときは、ポリエチレンテレフタレートとの相溶
性、分散性が悪くなり、上記スジ状の表面欠点改良効果
もほとんどなくなってしまうためである。In the case of the present invention, the viscosity of the polyorganosiloxane is 10 to 5.0.
00 centistokes (CS) is preferred. This is because when it is less than 10C5, not only is the effect of improving surface defects such as streaks on the melt sheet weak, but also the resulting film transparency and adhesion tend to deteriorate;
This is because, if it exceeds the above range, the compatibility and dispersibility with polyethylene terephthalate will deteriorate, and the effect of improving the above-mentioned streaky surface defects will almost disappear.
ポリ有機シロキサン化合物の含有量は、ポリエステルに
対して1〜1100Dp、好ましくは、2〜20 pD
mの範囲になくてはならない。含有量がlppm未満に
なると、本発明の目的であるポリエステルフィルムの表
面欠点を皆無に出きず、例えば、ポリエステル溶融体シ
ート上に長手方向のスジ状の欠点が表われ、ひどい時に
はスジの近傍の溶融体と冷却体表面の間に空気・泡を噛
み込み、均一な厚みむらのない、表面欠点のないシート
が得られないのみならず、このシートを延伸、特に幅方
向に延伸した時に延伸むら・表面欠点が顕著に表われる
ようになる。一方、1100ppを越えると、溶融体が
冷却体表面から剥離しやすく、強い密着力が得られない
ばかりか得られたフィルムにクレータ−状の欠点の発生
や、接着不良、透明性悪化、表面の粗れ、表面のうねり
などが顕在化してくる。The content of the polyorganosiloxane compound is 1 to 1100 Dp, preferably 2 to 20 pD relative to the polyester.
Must be within the range of m. If the content is less than lppm, the surface defects of the polyester film, which is the object of the present invention, cannot be completely eliminated. For example, longitudinal streak-like defects appear on the polyester melt sheet, and in severe cases, defects near the streaks may appear. Air/bubbles are trapped between the molten material and the cooling material surface, which not only makes it impossible to obtain a sheet with a uniform thickness and no surface defects, but also causes uneven stretching when the sheet is stretched, especially in the width direction.・Surface defects become noticeable. On the other hand, if it exceeds 1,100 pp, the melt tends to peel off from the surface of the cooling element, and not only will strong adhesion not be obtained, but the resulting film may develop crater-like defects, poor adhesion, deteriorated transparency, and Roughness and surface waviness become apparent.
このように、単にポリ有機シロキサン化合物を特定量含
有させても、ポリエステルフィルム表面を完全無欠点化
することは出来ず、ポリ有機シロキサン化合物に起因す
るケイ素原子Siの表面濃度が特定の分布を有したもの
でないと本発明の表面完全無欠点化することは出来ない
のである。特定のSi表面濃度分布とは、炭素原子Cに
対するケイ素原子S・の質量比rの表面層での比r3と
、表面から100人入ったところでの比r。との比R=
rs/roが、0.8〜10好ましくは1゜2〜5.0
の範囲になければならないのである。In this way, simply containing a specific amount of a polyorganosiloxane compound does not make the polyester film surface completely defect-free, and the surface concentration of silicon atoms caused by the polyorganosiloxane compound has a specific distribution. Otherwise, the surface of the present invention cannot be made completely defect-free. The specific Si surface concentration distribution is the ratio r3 of the mass ratio r of silicon atoms S to carbon atoms C in the surface layer and the ratio r when 100 people enter from the surface. Ratio R=
rs/ro is 0.8 to 10, preferably 1°2 to 5.0
It must be within the range of
すなわち、Si原子は、フィルム最表層である程度高濃
度に存在していることが必須になるのである。That is, it is essential that Si atoms exist at a relatively high concentration in the outermost layer of the film.
上記Si原子およびC原子のフィルム中での濃度分布は
、侵述する31MS法により求める。The concentration distribution of the Si atoms and C atoms in the film is determined by the 31MS method described above.
Rの値が0.8未満であると、本発明の目的である表面
無欠点が達成できないのみならず、微小凹凸による厚み
むらが解消できないためであり、逆に、Rの値が10を
越えると、フィルム表面にクレータ−状の欠点の発生や
、接着不良、透明性悪化、表面のうねりや、さらには、
溶融時の流動ムラなどが発生するためである。If the value of R is less than 0.8, not only the surface defect-free which is the objective of the present invention cannot be achieved, but also the thickness unevenness due to minute irregularities cannot be eliminated, and conversely, the value of R exceeds 10. This can cause crater-like defects on the film surface, poor adhesion, deterioration of transparency, surface waviness, and even
This is because fluidity unevenness occurs during melting.
次に本発明のポリエステルフィルムの製造方法 ゛に
ついて説明する。Next, the method for manufacturing the polyester film of the present invention will be explained.
ポリエチレンテレフタレート、ポリエチレンナフタレー
トなどで代表されるポリエステルを常法のエステル交換
法(DMT法)あるいは直接重合法により、ジカルボン
酸成分とジオール成分とから縮重合反応により得る。本
発明の場合、特に直接重合法ポリエステルに顕著な効果
があり、有効である。ポリエステルに分有させるポリ有
機シロキサン化合物の添加時期は、DMT法の場合、エ
ステル交換反応前が好ましいが、特にこれに限定される
ことはなく、重合反応前、あるいは完了後に添加しても
よく、ざらには、押出殿投入時に添加してもよいが、本
発明の添加量から考えた場合、微量添加量を均一に含有
させるには、ポリエステル重合前に添加するのが好まし
い。もちろん、ポリ有機シロキサンを高濃度に含有した
マスターベレットを、ポリ有機シロキサンを高濃度に含
有しないバーヂンペレットで希釈してもよいことは明ら
かである。ざらに、ポリエステルに公知の添加剤、例え
ば滑剤、酸化防止剤、顔料、染料、核剤、ブロッキング
防止剤、熱安定剤、充填材、可塑剤、帯電防止剤、紫外
線吸収剤、着色防止剤、などを含有させてもよい。A polyester represented by polyethylene terephthalate, polyethylene naphthalate, etc. is obtained by a polycondensation reaction from a dicarboxylic acid component and a diol component by a conventional transesterification method (DMT method) or a direct polymerization method. In the case of the present invention, it is particularly effective for direct polymerization polyesters. In the case of the DMT method, the timing of addition of the polyorganosiloxane compound to be partitioned into the polyester is preferably before the transesterification reaction, but is not particularly limited to this, and may be added before the polymerization reaction or after the completion of the polymerization reaction. In general, it may be added at the time of charging into the extrusion chamber, but considering the amount added in the present invention, it is preferable to add it before polyester polymerization in order to uniformly contain a small amount added. Of course, it is clear that master pellets containing a high concentration of polyorganosiloxane may be diluted with virgin pellets that do not contain a high concentration of polyorganosiloxane. In addition, known additives to polyester, such as lubricants, antioxidants, pigments, dyes, nucleating agents, antiblocking agents, heat stabilizers, fillers, plasticizers, antistatic agents, ultraviolet absorbers, color inhibitors, etc. may be included.
該ポリエステルを以下に述べるように従来とは異なった
二軸延伸製膜を行ない、ケイ素原子が選択的にポリエス
テルフィルム表層に配列するようにするのが、本発明の
場合、特に好ましい。In the case of the present invention, it is particularly preferred in the present invention that the polyester is subjected to a biaxial stretching process different from the conventional method, as described below, so that silicon atoms are selectively arranged on the surface layer of the polyester film.
即ち、ポリエステルを充分乾燥させ、溶融押出時の吐出
圧力pを110〜250kcJ/−と高くし、しかもポ
リマーの滞留時間を20〜60分と長くして実質上加水
分解および熱分解反応が進行しない様にして溶融押出し
を行ない、次に該溶融ポリマーを口金から吐出し、静電
気を荷電させた電気的に絶縁されたキャストドラム上に
落下密着させ帯電状態のまま冷却固化させ、キャストシ
ートを1qる。該シートを長手方向に85〜130℃で
1段または多段階で3〜8倍延伸し、続いて幅方向に8
0〜200℃で3〜6倍延伸し、100〜240℃で熱
処理する。That is, the polyester is sufficiently dried, the discharge pressure p during melt extrusion is increased to 110 to 250 kcJ/-, and the residence time of the polymer is increased to 20 to 60 minutes, so that hydrolysis and thermal decomposition reactions do not substantially proceed. Then, the molten polymer is discharged from the die, dropped onto an electrically insulated cast drum charged with static electricity, and cooled and solidified in the charged state to form a cast sheet of 1 q. . The sheet is stretched in the longitudinal direction at 85 to 130°C by 3 to 8 times in one or multiple stages, and then stretched in the width direction at 85 to 130°C.
It is stretched 3 to 6 times at 0 to 200°C and heat treated at 100 to 240°C.
必要に応じて、ざらに長手方向および/または幅方向に
再度延伸後熱処理を行なってもよい。If necessary, heat treatment may be performed again after stretching roughly in the longitudinal direction and/or width direction.
かしくて得られたポリエテルフィルムに含有されたケイ
素原子は選択的に表層に配列している。The silicon atoms contained in the polyether film thus obtained are selectively arranged on the surface layer.
またポリエステルフィルムの厚さは0.5〜125μm
好ましくは3〜80μm程度のものが効果がありよく用
いられる。In addition, the thickness of the polyester film is 0.5 to 125 μm.
Preferably, those having a diameter of about 3 to 80 μm are effective and often used.
[用途]
かくして得られた本発明ポリエステルフィルムは、表面
欠点を特に問題視する磁気記録、光記録用ベースフィル
ムとして、また、表面の微小厚みむらを問題視するコン
デンサー用記録体フィルムとして、あるいは、蒸着用ベ
ースフィルムとして特に優れた特性を有したフィルムと
なりうる。[Applications] The thus obtained polyester film of the present invention can be used as a base film for magnetic recording or optical recording, where surface defects are a particular problem, or as a recording film for a capacitor, where minute unevenness in surface thickness is a problem, or It can be a film with particularly excellent properties as a base film for vapor deposition.
[発明の効果]
このようにポリエステルに添加するポリ有機シロキサン
の含有濃度を限定し、しかもそのフィルム断面方向の濃
度分布を特定化したので得られたフィルム表面にはクレ
ータ、泡状マーク、スジ、うねり、キズなどの表面欠点
のない、微小厚みむらの小さい高品質なキャストフィル
ムとなるばかりか、高速度で、も安定したキャストが出
来、表面欠点のない均一な極薄物ポリエステルフィルム
も得られる。[Effects of the Invention] In this way, the concentration of polyorganosiloxane added to polyester is limited, and the concentration distribution in the cross-sectional direction of the film is specified, so that the surface of the resulting film has no craters, bubble marks, streaks, or Not only can a high-quality cast film with no surface defects such as waviness or scratches and small thickness unevenness be obtained, but also a uniform ultra-thin polyester film can be obtained that can be cast stably at high speed and has no surface defects.
ざらに、本発明ポリエステルフィルムは、延伸性に優れ
ているばかりか、また、スリット適性や巻取特性にも優
れたフィルムになる。In general, the polyester film of the present invention not only has excellent stretchability, but also has excellent slitting suitability and winding properties.
[特性の測定方法、効果の評価方法)
本発明の特性値の測定方法、評価方法は次のとおりであ
る。[Method for Measuring Characteristics, Method for Evaluating Effects] Methods for measuring and evaluating characteristic values of the present invention are as follows.
(1) 炭素(ケイ素)原子の質量濃度分布は、二次
イオン質量分析(Secondary IonMass
3p、ectrometry、以下SIMS>によ
って求める。(1) The mass concentration distribution of carbon (silicon) atoms is determined by secondary ion mass spectrometry.
3p, electrometry, hereinafter SIMS>.
SIMSは5〜15Kev程度のエネルギーのイオンビ
ームを試料表面にあて、スパッタリングによって試料か
ら発生する二次イオンを質量分析する方法である。装置
としては西独、ATOMIKA社製A−DIDA300
0を用い、−次イオン種に02+、−次イオン加速電圧
12にV、−次イオン電流200nA、ラスター領域4
00μ2、測定真空度1 Xl 0−8Torrs E
−gu no、 5KV−3Aの条件で測定した。SIMS is a method in which an ion beam with an energy of about 5 to 15 Kev is applied to the surface of a sample, and secondary ions generated from the sample are subjected to mass spectrometry by sputtering. The device is A-DIDA300 manufactured by ATOMIKA, West Germany.
0, 02+ for the -order ion species, V for the -order ion acceleration voltage 12, -order ion current 200nA, raster region 4
00μ2, measurement vacuum level 1Xl 0-8Torrs E
-guno, measured under the conditions of 5KV-3A.
ケイ素原子SL、およびポリエステル構成原子(C)の
深さ方向の測定を行なう。測定深さは、SIMS測定後
のスパッタ部のクレータ−の深さを表面粗さ計(スロー
ン社製DEKTAK)で求めその値を採用する。かくし
て)qられた各原子の厚さ方向の濃度分布から、S;
/Cの比率をフィルムの深さ方向に再プロットして、フ
ィルム厚さに対してSt /Cの濃度分布rを求める。The silicon atom SL and the polyester constituent atoms (C) are measured in the depth direction. As the measurement depth, the depth of the crater in the sputtered portion after SIMS measurement is determined using a surface roughness meter (DEKTAK, manufactured by Sloan), and the value thereof is used. From the concentration distribution of each atom in the thickness direction q), S;
The ratio of St 2 /C is re-plotted in the depth direction of the film to determine the concentration distribution r of St 2 /C with respect to the film thickness.
(2) 表面粗さ:Ra(μm)
触針式表面粗さ計による測定値で示したくカットオフ値
C100,25mm、測定長4nyn、ただし、J l
5−B−0601に従った。)
表面粗さくμm > (C100,25mm>:
0.10以上 X
0.05以上〜0.10未満 △
0.01以上〜0.05未満 0
0.01未満 ◎
(3〉 滑り性
ASTM−D−1894−63この方法に従いスリップ
テスターを用いて、静摩擦係数(μS)ならびに動摩擦
係数(μm)を測定した。(2) Surface roughness: Ra (μm) Measured value using a stylus type surface roughness meter, cutoff value C100, 25mm, measurement length 4nyn, however, J l
5-B-0601. ) Surface roughness μm > (C100, 25mm>:
0.10 or more , the static friction coefficient (μS) and the dynamic friction coefficient (μm) were measured.
通常、フィルムとして易滑性に優れているとされる範囲
は、μSで1.0以下、μmで0.8以下である。Generally, the range in which a film is considered to have excellent slipperiness is 1.0 or less in μS and 0.8 or less in μm.
豆立挟ユ旦しエユ
1.6以上 X
1.0以上〜1.6未満 Δ
0.7以上〜1.0未満 O
0,7未満 ◎
(4) 表面欠点
サンプルにAIを200人相当蒸着し、60倍の実体顕
微鏡で20視野の表面を観察し、その表面キズの程度に
よって判定する。1.6 or more X 1.0 or more to less than 1.6 Δ 0.7 or more to less than 1.0 O Less than 0.7 ◎ (4) Depositing AI equivalent to 200 people on surface defect samples Then, the surface is observed in 20 fields of view using a stereomicroscope with a magnification of 60 times, and judgment is made based on the degree of surface scratches.
分類
◎ 全くキズがない
0 キズのあるのが1〜2視野△
〃 3〜5視野X 全視
野にキズがある
(5) 固定すじ
フィルムを直交二ロル下においた時、回りの部分より厚
さ変動に起因する長手方向に連続したスジ状の着色ムラ
が表われる時、その程度により次の様に分類する。Classification ◎ No scratches at all 0 1 or 2 scratches △
〃 3 to 5 fields of view Depending on the time and severity, it is classified as follows.
分類 厚さ変動値(mμ) 着色ムラ
0 100未満 なし
0 わずかに確認できる〃
Δ 500未満 あり
X 500以上 あり
(6) 接着性
測定するフィルムを70℃に保たれた熱風オーブン中に
て72時間処理し、そのフィルムの表面ぬれ張力γCA
と、処理前のフィルムの表面ぬれ張力γ。をJIS
K6768−1971にしたがって測定し、次の基準で
接着性を求める。Classification Thickness variation value (mμ) Coloring unevenness 0 Less than 100 None 0 Slightly visible〃 Δ Less than 500 Yes The surface wetting tension γCA of the film
and the surface wetting tension γ of the film before treatment. JIS
Measurements are made in accordance with K6768-1971, and adhesion is determined based on the following criteria.
判定 T。A 1γ。−γ。A1◎ 3
8以上 1未満
○同上 1〜3
△ 30以上、38未満 3以上、10未満X 30
未満 10以上
[実施例]
以下、本発明の効果を明確にするために以下に比較実施
例をあげて説明する。Judgment T. A 1γ. −γ. A1◎ 3
8 or more, less than 1○ Same as above 1-3 △ 30 or more, less than 38 3 or more, less than 10X 30
Less than 10 or more [Examples] In order to clarify the effects of the present invention, comparative examples will be given and explained below.
実施例1
平均粒径300mμコロイダルシリカS i02を均一
に分散させ、6μ以上の粗粒を除去したエチレングリコ
ールと、ジメチルテレフタレートとを酢酸リチウムをエ
ステル交換反応触媒としてまた、500センチストーク
スのメチルフェニルポリシロキサンを表面欠点改良剤と
して混合させ、加熱昇温し、脱メタノール反応でエステ
ル交換反応を行なった。次にこの反応生成物にリン酸、
トリエチルホスフェートと共に三酸化アンチモンを添加
し、常法に従って重合を完了し極限粘度[η]−〇、6
5のポリエチレンテレフタレートを得た。Example 1 Colloidal silica SiO2 with an average particle size of 300 mμ was uniformly dispersed, and ethylene glycol from which coarse particles of 6 μm or more were removed was transesterified with dimethyl terephthalate using lithium acetate as a transesterification catalyst. Siloxane was mixed as a surface defect improving agent, the temperature was raised, and a transesterification reaction was carried out by removing methanol. Next, this reaction product contains phosphoric acid,
Add antimony trioxide together with triethyl phosphate, complete the polymerization according to a conventional method, and obtain an intrinsic viscosity [η]-〇, 6
Polyethylene terephthalate No. 5 was obtained.
該ポリエチレンテレフタレートを180’Cで2時間真
空乾燥させたのち、押出機に供給し、285℃で溶融さ
せ、吐出圧力1)=150kq/cnf、ポリマーの滞
留時間40分の条件でTダイ口金から吐出させ、電気的
に絶縁され高電圧を印加されたキャスティングドラム(
冷媒にフロントガス使用)に密着冷却させた。即ち、溶
融体シートに帯電させた状態のままでポリエチレンテレ
フタレートのガラス転移温度70℃以下に冷却させた。After drying the polyethylene terephthalate under vacuum at 180'C for 2 hours, it was supplied to an extruder, melted at 285°C, and extruded from a T-die nozzle under the conditions of discharge pressure 1) = 150 kq/cnf and polymer residence time of 40 minutes. A casting drum that is electrically insulated and has a high voltage applied to it (
Front gas is used as the refrigerant) for close cooling. That is, the molten sheet was cooled to the glass transition temperature of polyethylene terephthalate, which is 70° C. or lower, while it remained charged.
かくして得られたキャストシートを長手方向に125℃
で1.8倍、ざらに同方向に90℃で3゜1倍延伸し、
つづいて幅方向に95°Cで4倍延伸後、150℃で3
秒間熱固定し、ざらに、同時2軸延伸テンター内で、長
手方向に1.4倍、幅方向に1.1倍同時2軸延伸俊、
185℃で長手方向、幅方向とも2%のリラックスをさ
せながら、2秒間熱固定した。かくして得られた厚さ9
μmのポリエチレンテレフタレートのフィルム品質は第
1表の通りである。The cast sheet thus obtained was heated to 125°C in the longitudinal direction.
Stretched roughly 1.8 times at 90°C in the same direction,
Next, after stretching 4 times in the width direction at 95°C, 3x stretching at 150°C.
Heat set for seconds, then roughly biaxially stretched 1.4 times in the longitudinal direction and 1.1 times in the width direction in a simultaneous biaxial stretching tenter.
Heat setting was performed at 185° C. for 2 seconds while relaxing 2% in both the longitudinal and width directions. The thickness thus obtained is 9
The film quality of polyethylene terephthalate in μm is shown in Table 1.
第1表
このように、特定のポリ有機シロキザンを添加し、しか
も特定の条件で製膜することにより、表面欠点のない、
表面の平滑・易滑フィルムになることが分る。Table 1 In this way, by adding a specific polyorganosiloxane and forming a film under specific conditions, a film with no surface defects can be created.
It can be seen that the surface becomes a smooth and easily slippery film.
比較例1
実施例1で用いたキャスト法を変更して、Tダイ口金か
ら吐出した溶融シートに口金とキャスティングドラム間
に配置しであるタングステンワイヤーから静電荷を印加
させ、該溶融シートに帯電させたのち、アースしである
キャスティングドラム(冷媒に水使用)上に密行同化さ
せた。ざらに1、吐出圧力Pと滞留時間とを表2に示し
た値にまで変えたがその他の工程は、実施例1と全く同
様にして第2表に示した特性を有した二輪延伸ポリエチ
レンテレフタレートフィルムを得た。Comparative Example 1 The casting method used in Example 1 was changed, and an electrostatic charge was applied to the molten sheet discharged from the T-die die from a tungsten wire placed between the die and the casting drum to charge the molten sheet. Later, they were secretly assimilated onto a grounded casting drum (using water as a refrigerant). Roughly 1, the discharge pressure P and residence time were changed to the values shown in Table 2, but the other steps were carried out in exactly the same manner as in Example 1 to produce two-wheel stretched polyethylene terephthalate having the properties shown in Table 2. Got the film.
このように、同一組成のものであっても、製膜条件が変
わることにより、表面特性は大巾に変わることが判る。In this way, it can be seen that even if the composition is the same, the surface characteristics can vary widely depending on the film forming conditions.
[比較例2]
実施例1でのメチルフェニルポリシロキサンの含有量を
8ppmから300ppmに増やす以外は、全〈実施例
1と同様にして厚さ9μmのポリエチレンテレフタレー
トフィルムを得た。[Comparative Example 2] A polyethylene terephthalate film with a thickness of 9 μm was obtained in the same manner as in Example 1 except that the content of methylphenylpolysiloxane in Example 1 was increased from 8 ppm to 300 ppm.
このように、ポリシロキサンを多量に含有させても、表
面欠点が解消させないばかりか、接着性が大巾に低下す
ることが判る。Thus, it can be seen that even if a large amount of polysiloxane is contained, not only the surface defects are not eliminated, but also the adhesiveness is significantly reduced.
Claims (1)
合物を、1〜100ppm含有させてなるポリエステル
フィルムに於て、該ポリエステルフィルム表層での炭素
原子に対するケイ素原子の質量比r_sと、フィルム表
層から100Åとの同質量比r_cとの比R=r_s/
r_cが、0.8〜10の範囲にあることを特徴とする
ポリエステルフィルム。In a polyester film containing 1 to 100 ppm of a polyorganosiloxane compound based on 100 parts by weight of polyester, the mass ratio r_s of silicon atoms to carbon atoms in the surface layer of the polyester film is the same as 100 Å from the surface layer of the film. Ratio R with ratio r_c = r_s/
A polyester film characterized in that r_c is in the range of 0.8 to 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8896486A JPS62244616A (en) | 1986-04-17 | 1986-04-17 | Polyester film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8896486A JPS62244616A (en) | 1986-04-17 | 1986-04-17 | Polyester film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62244616A true JPS62244616A (en) | 1987-10-26 |
JPH0360858B2 JPH0360858B2 (en) | 1991-09-18 |
Family
ID=13957505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8896486A Granted JPS62244616A (en) | 1986-04-17 | 1986-04-17 | Polyester film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62244616A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5248898A (en) * | 1975-10-16 | 1977-04-19 | Toshiba Corp | Method of trimming work with laser light |
-
1986
- 1986-04-17 JP JP8896486A patent/JPS62244616A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5248898A (en) * | 1975-10-16 | 1977-04-19 | Toshiba Corp | Method of trimming work with laser light |
Also Published As
Publication number | Publication date |
---|---|
JPH0360858B2 (en) | 1991-09-18 |
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